JPS6039494B2 - Electrical discharge machining method and equipment - Google Patents
Electrical discharge machining method and equipmentInfo
- Publication number
- JPS6039494B2 JPS6039494B2 JP15241677A JP15241677A JPS6039494B2 JP S6039494 B2 JPS6039494 B2 JP S6039494B2 JP 15241677 A JP15241677 A JP 15241677A JP 15241677 A JP15241677 A JP 15241677A JP S6039494 B2 JPS6039494 B2 JP S6039494B2
- Authority
- JP
- Japan
- Prior art keywords
- halogen compound
- machining
- discharge machining
- electrical discharge
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 26
- 238000009760 electrical discharge machining Methods 0.000 title claims description 14
- 238000003754 machining Methods 0.000 claims description 40
- 239000012530 fluid Substances 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 21
- 150000002366 halogen compounds Chemical class 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 16
- 238000002844 melting Methods 0.000 claims description 14
- 230000008018 melting Effects 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 238000011084 recovery Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims 1
- 238000000605 extraction Methods 0.000 claims 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 11
- 239000003350 kerosene Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241000270708 Testudinidae Species 0.000 description 1
- 229910010342 TiF4 Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000004334 fluoridation Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H1/00—Electrical discharge machining, i.e. removing metal with a series of rapidly recurring electrical discharges between an electrode and a workpiece in the presence of a fluid dielectric
- B23H1/08—Working media
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
【発明の詳細な説明】
本発明は放電加工方法及びその装贋、特に高融点で繁加
工性の材料の加工に適した放電加工方法及び装置に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electric discharge machining method and its equipment, and particularly to an electric discharge machining method and apparatus suitable for machining materials with high melting points and high machinability.
放電加工は、放電熱により被加工体の一部を局部的に融
解すると共に、その融解液化した部分を加工液中に発生
する圧力衝撃波で吹き飛ばし、被加工体表面から除去す
るものであり、畢意熱加工に他ならないから、機械的な
研削、切削加工が困難なTa,W,Ti,Si,Mo等
の金属、合金、炭化物、又は室化物等の高融点材料の加
工が可能ではあると言っても、例えば通常の鉄系材料に
比較すると前記高融点材であると共に溶融状態での粘性
が一般的に高い前記金属、合金等の加工は極めて困難で
あった。Electrical discharge machining is a process in which a part of the workpiece is locally melted by electrical discharge heat, and the melted and liquefied part is blown away by pressure shock waves generated in the machining fluid and removed from the surface of the workpiece. Since it is nothing but heat processing, it is possible to process high melting point materials such as metals such as Ta, W, Ti, Si, Mo, alloys, carbides, and chambers that are difficult to mechanically grind or cut. Needless to say, it has been extremely difficult to process the metals, alloys, etc., which have high melting points and generally have high viscosity in the molten state, compared to, for example, ordinary iron-based materials.
本発明は叙上の観点‘こ立ってなされたものであって、
その目的とするところは、これらの鱗加工性材料を高速
度で加工できる新規な放電加工方法及び装置を提供する
ことにある。The present invention has been made with the above-mentioned viewpoints in mind, and
The purpose is to provide a novel electric discharge machining method and apparatus that can process these scale-processable materials at high speed.
而して、本発明の要旨とするところは、加工液中にハロ
ゲン化合物ガスを吹き込みつつ放電加工を行い、これら
のハロゲン化合物と被加工体とを接触させた状態で、放
電を発生させ、被加工体表面物質をハロゲン化してその
融点を引下げ、次いで、この低融点ハロゲン化物を自然
気化又は放電加工により除去することにある。Therefore, the gist of the present invention is to perform electrical discharge machining while blowing a halogen compound gas into the machining fluid, and to generate an electrical discharge while the halogen compound and the workpiece are in contact with each other. The purpose is to halogenate the surface material of the workpiece to lower its melting point, and then remove this low melting point halide by natural vaporization or electrical discharge machining.
而して、通常の放電加工において加工速度を高めるため
、油性又は水性の加工液中にコロイド状の蟹石(CaF
2)を混合する技術(特公昭31−1050号)及び油
性の加工液中にBrを混入する技術(特公昭40一52
ぴ号)は公知である。Therefore, in order to increase the machining speed in normal electrical discharge machining, colloidal crabstone (CaF) is added to the oil-based or water-based machining fluid.
2) (Japanese Patent Publication No. 31-1050) and technology of mixing Br into oil-based machining fluid (Japanese Patent Publication No. 40-52)
No. P) is publicly known.
然しながら、これら公知の技術は、ハロゲンが陰イオン
を作り易く、そのためハロゲンが存在すると放電ギャッ
プに生じた陽イオンが消滅し加工間隙の絶縁が回復する
のに要する時間が大幅に短縮される点に着目し、加工液
にハロゲンを添加して加工パルスの繰返し周波数を高め
、加工速度を高めようとするものであった。However, these known techniques have the disadvantage that halogens easily create anions, and therefore, when halogens are present, the cations generated in the discharge gap disappear, and the time required for the insulation in the machining gap to be restored is greatly shortened. The idea was to add halogen to the machining fluid to increase the repetition frequency of machining pulses and increase the machining speed.
このCaF2又はBrを添加した加工液を使用すると、
鋼等を加工する場合には確かにパルスのオフタィムを若
干短縮でき、加工速度を高め得るものであるが、これら
の加工液では例えば、Ta,W,Ti,Si又はMo等
の高融点材料は依然として加工困難であった。When using this machining fluid containing CaF2 or Br,
When machining steel etc., it is true that the off-time of the pulse can be slightly shortened and the machining speed can be increased, but with these machining fluids, high melting point materials such as Ta, W, Ti, Si or Mo, It was still difficult to process.
その理由は、これらの高貴融点材料は単位の放電パルス
による除去量そのものが極めて少ないので、たとえ、ハ
ロゲン添加により消イオン時間が短縮されることがあっ
たとしても、それにより加工速度が本質的に早められる
ものでないこと、及び従来公知のこの種加工液では、本
発明方法を実施した際見られるような、被加工体表面の
ハロゲン化が生じないことにある。これに反し、本発明
においては、作業状態で気体であるハロゲン化合物を加
工液中に多量に混合して、放電加工を行なうことにより
、第−段階で被加工体表面物質を低融点のハロゲン化合
物とし、次いでこれを自然気化又は第二次の放電加工で
除去することにより所望の加工を行うものであり、本発
明方法はいわばェレクトロディスチャージ、アンド、エ
レクト〇、エッチング、マシニングと呼ぶべき新規な加
工方法である。以下図面及び実施例により本発明の詳細
を説明する。The reason is that the removal amount of these high melting point materials per unit discharge pulse is extremely small, so even if halogen addition can shorten the deionization time, it will essentially reduce the machining speed. This is because the process is not accelerated, and with conventionally known processing fluids of this type, halogenation of the surface of the workpiece does not occur, as occurs when the method of the present invention is carried out. On the other hand, in the present invention, a large amount of a gaseous halogen compound is mixed into the machining fluid in the working state, and electrical discharge machining is performed, thereby converting the surface material of the workpiece into a low melting point halogen compound in the first step. This is then removed by natural vaporization or secondary electrical discharge machining to perform the desired processing. It is a processing method. The details of the present invention will be explained below with reference to the drawings and examples.
図面は、本発明にかかる放電加工装置の一実施例の要部
を示す説明図であり、図中1は図示されていない加工機
の加工へツド‘こより昇降せしめられる主軸、2は加工
用の電極、3は電極ホルダ、4は加工タンク、5及び6
は加工タンク4を気密に閉鎖する蓋体、7は被加工体、
8は加工液、9は加工用電源、10はスイッチング素子
、11はパルス発振器、12は加工液ポンプ、13はフ
ィル夕、14はコンブレッサ、15は冷却器、16はガ
ス分離器、17は逆止弁、18はテトラフルオロメタン
タンク、19は譲圧弁、20は気液混合弁、21はライ
ンブレンダである。The drawing is an explanatory view showing the main parts of an embodiment of the electric discharge machining apparatus according to the present invention. Electrode, 3 is electrode holder, 4 is processing tank, 5 and 6
7 is a lid body that airtightly closes the processing tank 4; 7 is a workpiece;
8 is a machining fluid, 9 is a power source for machining, 10 is a switching element, 11 is a pulse oscillator, 12 is a machining fluid pump, 13 is a filter, 14 is a compressor, 15 is a cooler, 16 is a gas separator, 17 is a reverse A stop valve, 18 is a tetrafluoromethane tank, 19 is a pressure relief valve, 20 is a gas-liquid mixing valve, and 21 is a line blender.
図示されている加工例は、チタン材からなる被加工体7
に対する穿孔加工例である。The illustrated processing example is a workpiece 7 made of titanium material.
This is an example of drilling process for.
被加工体7は加工タンク4内に取付けられており、また
電極2は電極ホルダ3を介して主軸1に取付けられ、か
つその先端部は加工タンク蓋体6の中央に設けた亀極挿
通孔6aを通って加工タンク4内に挿通されている。ま
た本実施例では、電極2は穿孔用の円筒状電極であり、
その中心孔2aから加工間隙内に加工液8が強制的に供
給されるようになっている。The workpiece 7 is installed in the processing tank 4, and the electrode 2 is attached to the main shaft 1 via the electrode holder 3, and its tip is inserted into the tortoise electrode insertion hole provided in the center of the processing tank lid 6. 6a and is inserted into the processing tank 4. Further, in this embodiment, the electrode 2 is a cylindrical electrode for drilling,
Machining fluid 8 is forcibly supplied into the machining gap from the center hole 2a.
而して、電極2には図中下方に所望の速度で加工送りが
与えられており、またパルス発振器11は所定の周期及
びデューテイフアクタを有するパルスを発振しており、
そのためスイッチング素子10が開閉制御され、被加工
体7に放電加工が施されている。而して、本実施例にお
いては、加工液8は水又はケロシン等の公知の加工液中
に、テトラフルオロメタンCF4を微細気泡状として混
入したものである。The electrode 2 is given a machining feed downward in the figure at a desired speed, and the pulse oscillator 11 oscillates pulses having a predetermined period and duty factor.
Therefore, the switching element 10 is controlled to open and close, and the workpiece 7 is subjected to electrical discharge machining. In this embodiment, the machining fluid 8 is a known machining fluid such as water or kerosene mixed with tetrafluoromethane CF4 in the form of fine bubbles.
而して、加工中加工タンク4内の加工液8は、ポンプ1
2により吸引され、フィル夕13により加工屑等を除去
された後混合弁20}こ送られ、ここでテトラフルオロ
メタンタンク18から供V給され譲圧弁19により適宜
の圧力にまで減圧されたCF4ガスと混合され、ライン
ブレンダ21により激しく凝洋混合された後、電極ホル
ダ3及び電極2の内部を通って加工間隙に供孫合され、
加工タンク4内に還流する。Therefore, the machining fluid 8 in the machining tank 4 during machining is transferred to the pump 1.
2, processed waste etc. are removed by a filter 13, and then sent to a mixing valve 20}, where the CF4 is supplied from a tetrafluoromethane tank 18 and reduced to an appropriate pressure by a pressure concession valve 19. After being mixed with gas and vigorously condensed by the line blender 21, it is fed into the processing gap through the inside of the electrode holder 3 and the electrode 2,
It flows back into the processing tank 4.
加工タンク4内部では、CF4の気泡は、放電加工に伴
って発生した各種ガスと共に浮上し、水又はケロシン等
の液相分と分離する。Inside the machining tank 4, the CF4 bubbles float together with various gases generated during electrical discharge machining, and are separated from the liquid phase such as water or kerosene.
この遊離ガスはコンブレッサ14により吸引、圧縮され
、冷却器15で冷却、液化され、ガス分離器16により
他のガス、例えば比,C02その他の放電分解ガスと分
離され、テトラフルオロメタンタンク18に回収される
。このようにして、チタン材を加工すると、被加工体面
に放電が発生したとき、当該放電点には四弗化チタンT
iF4が生成する。This free gas is sucked and compressed by a compressor 14, cooled and liquefied by a cooler 15, separated from other gases such as carbon dioxide, CO2, and other discharge decomposition gases by a gas separator 16, and recovered in a tetrafluoromethane tank 18. be done. In this way, when titanium material is machined, when a discharge occurs on the surface of the workpiece, the discharge point is filled with titanium tetrafluoride T.
Generated by iF4.
このTiF4の沸点は284oCであり、この値はTi
そのものの沸点3000qo以上、融点約1800qo
という値に比較すれば格段に低いものであり、後にその
近傍で放電が発生すると容易に気化して被加工体表面か
ら除去されるものである。同機なプロセスによりW,M
oその他の高融点材料も加工できるものである。The boiling point of this TiF4 is 284oC, and this value is
The boiling point of itself is 3000 qo or more, the melting point is about 1800 qo
This value is much lower than that, and if a discharge occurs in the vicinity later, it will easily vaporize and be removed from the surface of the workpiece. W, M by the same process
o Other high melting point materials can also be processed.
第1表にはこれらの材料の融点とその発化物塩化物の沸
点、融点とが示されている。第1表に示された数値から
、W,Mo,Si等の場合には、弗化物は生成後自然に
気化し被加工面から除去されることが判明する。Table 1 shows the melting points of these materials and the boiling and melting points of their chlorides. From the values shown in Table 1, it is clear that in the case of W, Mo, Si, etc., fluorides are naturally vaporized after being formed and removed from the processed surface.
またこの表から弗化のみでなく塩化加工も有効であるこ
とが判明する。Moreover, from this table, it is clear that not only fluoridation but also chloride processing is effective.
なお、第1表に示したもののほか、不安定な各種※化物
、塩化物が存在することが知られている。In addition to those listed in Table 1, it is known that there are various unstable* compounds and chlorides.
本発明方法を実施するとそれらの弗化物、塩化物も中間
的に生成されるが、これらは何等加工を阻害するもので
はない。第1表
而して、本発明方法において、利用できるハロゲン化合
物は、加熱してガス化または蒸気化したり、または冷却
して一部蒸気化して使用しても良いが、好ましくは、常
温で気体であることのほか、それ自身はもとよりその放
電分解ガス等も毒性が低く爆発、燃焼等の危険のない、
処理し易いものであること、安価かつ容易に入手できる
ものであること等が必要であり、これらの観点からCC
13F,CC12F2,CCIF3,CF4,CHC1
2F,CC12FCCIF2,又はCH3CI又はこれ
らの共競混合物を利用することが推奨されるものである
。When the method of the present invention is carried out, these fluorides and chlorides are also produced intermediately, but these do not interfere with the processing in any way. First, in the method of the present invention, the halogen compound that can be used may be heated to gasify or vaporize it, or cooled to partially vaporize it, but it is preferable to use it as a gas at room temperature. In addition to this, the material itself, as well as its discharge decomposition gas, are low in toxicity and pose no danger of explosion or combustion.
It is necessary that the material be easy to process, inexpensive, and easily available, and from these points of view, CC
13F, CC12F2, CCIF3, CF4, CHC1
It is recommended to use 2F, CC12FCCIF2, or CH3CI or a cocompetitive mixture thereof.
次にケロシンとCF4とを標準状態容積比で1:1の比
率で混合した加工液と、ケロシンのみの加工液とを用い
て各種サンプルを加工したところ第2表に示す如き結果
が得られた。尚加工条件は下記の通りであった。Next, various samples were processed using a processing solution in which kerosene and CF4 were mixed at a standard state volume ratio of 1:1 and a processing solution containing only kerosene, and the results shown in Table 2 were obtained. . The processing conditions were as follows.
電極材料 WC 加工パルス lp;10山A Ton;8仏S 丁。 Electrode material WC Processing pulse lp; 10 peaks A Ton; 8 Buddha S Ding.
H;4〆S加工液供給量 0.9/mjn(見鶏流量)
第2表失Ta,60Wt%;W,30Wt%;Ni,1
仇の% ここで本発明方法1はケロシンとCF4とを混
合した加工液を用いた場合を、同0はこれに、更にAr
ガスを標準状態容積比で10%添加したものを用いた場
合を示している。H;4〆S processing liquid supply amount 0.9/mjn (watch flow rate)
Table 2 loss Ta, 60Wt%; W, 30Wt%; Ni, 1
Here, method 1 of the present invention uses a processing fluid containing kerosene and CF4;
The case is shown in which 10% of the gas was added in the standard state volume ratio.
ふガスを添加する理由は、加工間隙における被加工体弗
化物ガスの分圧を引下げ、この気化分離を促進すること
にあり、このような不活性ガスを添加すると、W及びM
oの佳工例においては、相当な加工促進効果がみられる
ものである。なお上記不活性ガスとしては、N2,C0
2,K雀等も使用することができる。本発明は叙上の如
く構成されるから、本発明によるときは、公知の方法に
比し約3〜8倍の高速度で、これらの高融点材料を加工
し得るものである。尚、本発明の構成は叙上の実施例に
限定されるものでなく、例えばガス状ハロゲン化合物と
ケロシン又は水の混合比、アルゴンガス等の不活性ガス
の添加、加工間隙へのハロゲン化合物ガス供給方法、ハ
ロゲン化合物ガスその他の回収処理方法等は、加工機並
びに電極の寸法、形状、加工の目的等々により、自由に
設計変更が加えられるものであり、本発明はそれらのす
べてを包摂するものである。The reason for adding inert gas is to reduce the partial pressure of the workpiece fluoride gas in the processing gap and promote this vaporization separation.
In the excellent work example of o, a considerable processing promotion effect is observed. Note that the above inert gas includes N2, C0
2. K-jaku etc. can also be used. Since the present invention is constructed as described above, it is possible to process these high melting point materials at a speed approximately 3 to 8 times higher than that of known methods. Note that the configuration of the present invention is not limited to the above embodiments, and includes, for example, the mixing ratio of the gaseous halogen compound and kerosene or water, the addition of an inert gas such as argon gas, and the introduction of the halogen compound gas into the processing gap. The supply method, the recovery treatment method for halogen compound gas, etc. can be freely changed in design depending on the dimensions, shape, purpose of processing, etc. of the processing machine and electrode, and the present invention encompasses all of them. It is.
図面は本発明にかかる放電加工装置の一実施例の要部を
示す説明図である。
1・・・・・・主軸、2…・・・電極、4・・…・加工
タンク、5,6・・・・・・蓋体、7・・・・・・被加
工体、8……加工液、12・・・・・・加工液ポンプ、
13・・…・フィルタ、14・・・・・・コンブレッサ
、15…・・・冷却器、16・・・・・・ガス分離器、
18・…・・テトラフルオロメタンタンク、20・・・
・・・気液混合弁、21・・・・・・ラインブレンダ。The drawing is an explanatory view showing a main part of an embodiment of an electric discharge machining apparatus according to the present invention. 1...Main shaft, 2...Electrode, 4...Processing tank, 5, 6...Lid, 7...Workpiece, 8... Machining fluid, 12... Machining fluid pump,
13... Filter, 14... Compressor, 15... Cooler, 16... Gas separator,
18...Tetrafluoromethane tank, 20...
... Gas-liquid mixing valve, 21 ... Line blender.
Claims (1)
て、加工液中に、少くとも作業状態においては気相であ
るハロゲン化合物を吹込みつつ放電加工を行うことを特
徴とする上記の放電加工方法。 2 ハロゲン化合物が、CCl_3F,CCl_2F_
2,CClF_3,CF_4,CHCl_2F,CHC
lF_2,CCl_2FCClF_2及びCH_3Cl
から成る群のなかから選ばれた少くとも一種のハロゲン
化合物又は二種以上のハロゲン化合物の混合物である特
許請求の範囲第1項記載の放電加工方法。 3 気密に閉鎖され、かつその内部に加工用電極、被加
工体及び所望の加工液が収容でき、その内部で放電加工
を遂行し得るよう構成された加工タンクと、少くとも作
業状態では気相となるハロゲン化合物を貯蔵する貯蔵タ
ンクと、上記加工タンク内の加工液を上記加工タンク外
に抽出し、これに上記貯蔵タンク内に貯蔵したハロゲン
化合物を気相として混合し再び上記加工タンク内に戻す
加工液循環、ハロゲン化合物添加装置と、上記加工タン
ク内の遊離ガスを上記加工タンク外に抽出し加圧及び/
又は冷却してハロゲン化合物を他の排気ガスから分離し
上記貯蔵タンク内に回収するハロゲン化合物回収装置と
を具備することを特徴とする放電加工装置。[Claims] 1. An electrical discharge machining method for materials with high melting points that are difficult to machine, characterized by performing electrical discharge machining while injecting a halogen compound, which is in a gas phase at least in working conditions, into the machining fluid. The above electrical discharge machining method. 2 Halogen compounds are CCl_3F, CCl_2F_
2, CClF_3, CF_4, CHCl_2F, CHC
IF_2, CCl_2FCClF_2 and CH_3Cl
The electrical discharge machining method according to claim 1, wherein the electrical discharge machining method is at least one halogen compound or a mixture of two or more halogen compounds selected from the group consisting of. 3. A machining tank that is hermetically closed and configured to accommodate a machining electrode, a workpiece, and a desired machining fluid, and to perform electric discharge machining therein, and a gas phase at least in working conditions. A storage tank for storing a halogen compound, and a processing liquid in the processing tank is extracted to the outside of the processing tank, and the halogen compound stored in the storage tank is mixed with this as a gas phase, and the mixture is poured into the processing tank again. Return processing fluid circulation, halogen compound addition device, extraction of free gas in the processing tank to the outside of the processing tank, pressurization and/or
or a halogen compound recovery device that separates the halogen compound from other exhaust gases by cooling and recovers the halogen compound in the storage tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15241677A JPS6039494B2 (en) | 1977-12-20 | 1977-12-20 | Electrical discharge machining method and equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15241677A JPS6039494B2 (en) | 1977-12-20 | 1977-12-20 | Electrical discharge machining method and equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5485497A JPS5485497A (en) | 1979-07-07 |
| JPS6039494B2 true JPS6039494B2 (en) | 1985-09-06 |
Family
ID=15540025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15241677A Expired JPS6039494B2 (en) | 1977-12-20 | 1977-12-20 | Electrical discharge machining method and equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6039494B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58165923A (en) * | 1982-03-25 | 1983-10-01 | Inoue Japax Res Inc | Electric discharge processing |
| CN110605442B (en) * | 2018-06-15 | 2020-09-29 | 南京航空航天大学 | Controllable discharge ablation processing method for combustible difficult-to-process material with adjustable combustion-supporting gas concentration |
-
1977
- 1977-12-20 JP JP15241677A patent/JPS6039494B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5485497A (en) | 1979-07-07 |
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