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JPS6040438B2 - Process for producing 1-oxadethiacephalosporin - Google Patents
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JPS6040438B2 - Process for producing 1-oxadethiacephalosporin - Google Patents

Process for producing 1-oxadethiacephalosporin

Info

Publication number
JPS6040438B2
JPS6040438B2 JP52067025A JP6702577A JPS6040438B2 JP S6040438 B2 JPS6040438 B2 JP S6040438B2 JP 52067025 A JP52067025 A JP 52067025A JP 6702577 A JP6702577 A JP 6702577A JP S6040438 B2 JPS6040438 B2 JP S6040438B2
Authority
JP
Japan
Prior art keywords
days
dethia
parts
water
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52067025A
Other languages
Japanese (ja)
Other versions
JPS543088A (en
Inventor
庄一郎 上尾
美鶴 吉岡
照二 辻
好男 浜島
郁男 橘川
亘 永田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shionogi and Co Ltd
Original Assignee
Shionogi and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shionogi and Co Ltd filed Critical Shionogi and Co Ltd
Priority to JP52067025A priority Critical patent/JPS6040438B2/en
Priority to GB5339/78A priority patent/GB1557552A/en
Priority to AU33164/78A priority patent/AU514377B2/en
Priority to IE298/78A priority patent/IE47711B1/en
Priority to CA296,776A priority patent/CA1099715A/en
Priority to DK060678A priority patent/DK168217B1/en
Priority to NZ186437A priority patent/NZ186437A/en
Priority to PT67648A priority patent/PT67648B/en
Priority to IL54044A priority patent/IL54044A/en
Priority to FI833079A priority patent/FI833079A0/en
Priority to GR55452A priority patent/GR69965B/el
Priority to PL1978204616A priority patent/PL114451B1/en
Priority to BG040118A priority patent/BG32854A3/en
Priority to BG038671A priority patent/BG32853A3/en
Priority to RO78100613A priority patent/RO79398A/en
Priority to BG040119A priority patent/BG32855A3/en
Priority to FI780474A priority patent/FI68401C/en
Priority to YU335/78A priority patent/YU41307B/en
Priority to NO780508A priority patent/NO162343C/en
Priority to CS697078A priority patent/CS196418B2/en
Priority to MX786846U priority patent/MX5479E/en
Priority to HU78SI1619A priority patent/HU177897B/en
Priority to ES466949A priority patent/ES466949A1/en
Priority to CS697178A priority patent/CS196419B2/en
Priority to SE7801697A priority patent/SE443144B/en
Priority to FR7804162A priority patent/FR2380284A1/en
Priority to RO78100612A priority patent/RO78545A/en
Priority to PL21645578A priority patent/PL117503B1/en
Priority to RO78100614A priority patent/RO79886A/en
Priority to NL7801708A priority patent/NL191891C/en
Priority to CH167278A priority patent/CH636618A5/en
Priority to DE19782806457 priority patent/DE2806457A1/en
Priority to PH20789A priority patent/PH15515A/en
Priority to BG040120A priority patent/BG32856A3/en
Priority to ES78475140A priority patent/ES475140A1/en
Priority to ES78475142A priority patent/ES475142A1/en
Priority to ES475141A priority patent/ES475141A1/en
Priority to SU782698999A priority patent/SU1047390A3/en
Priority to SU782698998A priority patent/SU1024009A3/en
Publication of JPS543088A publication Critical patent/JPS543088A/en
Priority to AT617179A priority patent/AT370736B/en
Priority to AT617279A priority patent/AT370105B/en
Priority to PH23439A priority patent/PH15513A/en
Priority to PH23440A priority patent/PH15291A/en
Priority to PH23438A priority patent/PH15294A/en
Priority to US06/322,662 priority patent/US4366316A/en
Priority to AR22786782D priority patent/AR227867A1/en
Priority to US06/374,862 priority patent/US4443598A/en
Priority to YU548/83A priority patent/YU42073B/en
Priority to YU54983A priority patent/YU42074B/en
Priority to FI833080A priority patent/FI70713C/en
Priority to US06/542,520 priority patent/US4604460A/en
Priority to US06/543,939 priority patent/US4504659A/en
Priority to US06/543,664 priority patent/US4478997A/en
Priority to US06/543,940 priority patent/US4533730A/en
Priority to FI843922A priority patent/FI71154C/en
Publication of JPS6040438B2 publication Critical patent/JPS6040438B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D505/00Heterocyclic compounds containing 5-oxa-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. oxacephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Cephalosporin Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)

Description

【発明の詳細な説明】 この発明は3一脱離基置換一1−オキサデチァセフアム
化合物(1)の3位脱離基を脱離させて、1−オキサデ
チアセフアロスポリン(ロ)を製造する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention produces 1-oxadethiacephalosporin (R) by removing the leaving group at the 3-position of the 3-leaving group-substituted 1-1-oxadethiacepham compound (1). ).

(式中、Aはアロイルアミノ、フエニルアセトアミドま
たはフエノキシアセトアミドBはアラルコキシ、 Xは水素、ハロゲンまたは1ーメチルテトラゾール−5
−イルチオ、Yは水素またはメトキシ、 Zは水酸基またはハロゲン、 波線はQ結合または8結合、 点線は2位または3位二重結合、 をそれぞれ示す) (原料製法) この発明の原料物質(1)は、例えば下式の方法により
合成できる。
(In the formula, A is aroylamino, phenylacetamide or phenoxyacetamide, B is aralkoxy, and X is hydrogen, halogen or 1-methyltetrazole-5
(Raw material production method) Raw material of this invention (1) can be synthesized, for example, by the method shown below.

(反応操作) この発明は原料物質1の脱離基Zを水素とともに脱離ご
せて目的物質0を製造することによって実施する。
(Reaction operation) This invention is carried out by producing target substance 0 by eliminating the leaving group Z of raw material 1 together with hydrogen.

脱離する水位の位置により△2と△3の異性体が生成す
るが、条件によっては生成した二重結合が移動して位置
異性体を生成することもある。Zがヒドロキシの場合に
は脱水剤(ハロゲン化チオニル、五酸化りん、無機酸、
有機酸、無機塩基、有機塩基、アルミナ、シリカゲル、
など)、ハロゲン化剤(五ハロゲン化りん、三ハロゲン
化りん、オキシハロゲン化りん、スルフリル・ハロゲニ
ド、など)、アシル化剤(酸無水物、酸ハロゲン化物、
酸ィソシアニド、など)、その他を、要すれば、塩基(
無機または有機塩基)の存在下に作用させる。
The Δ2 and Δ3 isomers are produced depending on the position of the water level at which it is desorbed, but depending on the conditions, the produced double bond may move to produce positional isomers. When Z is hydroxy, a dehydrating agent (thionyl halide, phosphorus pentoxide, inorganic acid,
Organic acids, inorganic bases, organic bases, alumina, silica gel,
), halogenating agents (phosphorus pentahalides, phosphorus trihalides, phosphorus oxyhalides, sulfuryl halogenides, etc.), acylating agents (acid anhydrides, acid halides,
acid isocyanides, etc.), others, if necessary, bases (
(inorganic or organic base).

Zがハロゲンまたはアシルオキシの場合には脱酸剤(有
機または無機塩基、シリカゲル、アルミナ、など)を作
用させる。
When Z is halogen or acyloxy, a deoxidizing agent (organic or inorganic base, silica gel, alumina, etc.) is used.

活性の高い場合には、特定の脱酸剤を作用させることな
しにHZが脱離することもある。前記試薬中、ハロゲン
としては塩素、臭素が好ましく:無機酸としては鉱酸、
ルイス酸、など:有機酸としては強酸性カルポン酸、脂
肪族または芳香族のスルホン酸、ホスホン酸など;無機
塩基としてはアルカリ金属の水酸化物、重炭酸塩、炭酸
塩、弱酸塩、メルカプチド、アルコレート、アルカリ士
類金属の酸化物Y水酸化物、重炭酸塩、炭酸塩など;有
機塩基としては脂肪族または芳香族のアミン、芳香族塩
基、有機弱酸の塩など;アシル化剤のアシル基としては
無機酸または有機酸のアシル基;を例示することができ
る。
When the activity is high, HZ may be desorbed without the action of a specific deoxidizing agent. In the reagent, the halogen is preferably chlorine or bromine; the inorganic acid is mineral acid,
Lewis acids, etc.: Organic acids include strong acidic carboxylic acids, aliphatic or aromatic sulfonic acids, phosphonic acids, etc.; Inorganic bases include alkali metal hydroxides, bicarbonates, carbonates, weak acid salts, mercaptides, Alcoholates, alkali metal oxides, hydroxides, bicarbonates, carbonates, etc.; organic bases include aliphatic or aromatic amines, aromatic bases, salts of organic weak acids; acylating agents, such as acyl Examples of the group include acyl groups of inorganic acids or organic acids.

これらの反応は通常、溶媒中、加温、室温、または低温
下に進行する。
These reactions usually proceed in a solvent, at elevated temperatures, at room temperature, or at low temperatures.

ここに使用する溶媒としては反応、原料および生成物に
不都合な影響のないものであれば、いずれも利用できる
Any solvent can be used here as long as it does not adversely affect the reaction, raw materials, and products.

たとえば、炭化水素(ヘキサン、シクロヘキサン、ベン
ゼン、トルエンなど)、ハロ炭化水素(クロロメタン、
塩化メチレン、クロロホルム、ジクロロエタン、クロロ
ベンゼンなど)、エーテル(ジエチルエーテル、ジオキ
サン、テトラヒドロフラン、など)、エステル(酢酸エ
チル、酢酸ブチル、安息香酸メチル、など)、ケトン(
アセトン、シクロヘキサン、など)、アルコール(メタ
ノール、エタノール、ベンジルアルコール、など)スル
ホキシド(ジメチルスルホキシド、など)、ニトリル(
アセトニトリル、ベンゾニトリル、など)、塩基(トリ
ェチルァミン、ピリジン、キノリン、など)、酸(酢酸
、プロピオン酸、など)、酸無水物(無水酢酸、トリフ
ルオロ酢酸無水物、など)、その他の溶媒またはそれら
の混合物を例示できる。反応中、脱HZ剤、溶媒、など
の作用により、A、COB、X、Y、二重結合、立体配
位などが、原料の対応する基と異る生成物を得ることも
あるが、この様な場合もこの発明の範囲に含めるものと
する。
For example, hydrocarbons (hexane, cyclohexane, benzene, toluene, etc.), halohydrocarbons (chloromethane,
methylene chloride, chloroform, dichloroethane, chlorobenzene, etc.), ethers (diethyl ether, dioxane, tetrahydrofuran, etc.), esters (ethyl acetate, butyl acetate, methyl benzoate, etc.), ketones (
acetone, cyclohexane, etc.), alcohols (methanol, ethanol, benzyl alcohol, etc.), sulfoxides (dimethyl sulfoxide, etc.), nitriles (
acetonitrile, benzonitrile, etc.), bases (triethylamine, pyridine, quinoline, etc.), acids (acetic acid, propionic acid, etc.), acid anhydrides (acetic anhydride, trifluoroacetic anhydride, etc.), and other solvents or them. An example is a mixture of During the reaction, products may be obtained in which A, COB, X, Y, double bonds, steric coordination, etc. are different from the corresponding groups in the raw materials due to the action of de-HZing agents, solvents, etc. Such cases shall also be included within the scope of this invention.

これを利用し、脱虹Z剤、溶媒を適当に選択することに
より二種以上の反応を同時に行なって、効率の高い合成
をすることもできる。たとえば、実施例15と18では
△3の導入と同時にX基を置換でき、実施例17と18
では△3の導入と同時にYを水素からメトキシに変更で
きる。このようにして製造した化合物(mは、例えば濃
縮、抽出、洗浄など、常法により溶媒、未反応物、創生
物などを除去し、再沈澱、クロマトグラフィー、再結晶
など、常法により精製すれば取得できる。△2と△3異
性体が同時に生成したときには精密なクロマトグラフィ
ー、分別再結晶などにより分離することもできる。この
ようにして製造した化合物(ロ)の中、COBがカルボ
キシまたはその塩であるものは抗菌剤として有用であり
、COBが保護カルボキシであるものは、これを脱保護
し、Aを好ましいアシル基、たとえばアリールマロンア
ミド、Xを1−メチルテトラゾールー5−ィルチオに変
更することにより、著しく強力は抗菌剤である1−オキ
サデチアセフアロスポリンに誘導することができる。
Utilizing this, it is also possible to perform two or more reactions at the same time by appropriately selecting the deiriding Z agent and the solvent to achieve highly efficient synthesis. For example, in Examples 15 and 18, the X group can be substituted at the same time as the introduction of Δ3, and in Examples 17 and 18
Then, Y can be changed from hydrogen to methoxy at the same time as introducing Δ3. The compound (m) produced in this way is obtained by removing the solvent, unreacted substances, created substances, etc. by a conventional method such as concentration, extraction, washing, etc., and then purifying it by a conventional method such as reprecipitation, chromatography, recrystallization, etc. When △2 and △3 isomers are produced simultaneously, they can be separated by precise chromatography, fractional recrystallization, etc. In the compound (b) produced in this way, COB is Salts are useful as antibacterial agents, and those where COB is a protected carboxy can be deprotected to change A to the preferred acyl group, e.g. arylmalonamide, and X to 1-methyltetrazol-5-ylthio. By doing so, a highly potent antibacterial agent, 1-oxadethiacephalosporin, can be induced.

これらの反応はペニシリン、セフアロスポリンの化学で
常用されている方法を応用することにより、実施するこ
ともできる。以下に実施例を示し、この発明の態様を説
明する。
These reactions can also be carried out by applying methods commonly used in the chemistry of penicillins and cephalosporins. Examples are shown below to explain aspects of the invention.

実施例 1〜22 原料化合物(1)を溶媒にとかし、脱HX剤を加えて所
定温度に所定時間保ちながら、かきまぜる。
Examples 1 to 22 The raw material compound (1) is dissolved in a solvent, a de-HX agent is added thereto, and the mixture is stirred while being maintained at a predetermined temperature for a predetermined period of time.

反応液を氷水に注ぎ、塩化メチレンなど水に混和しない
溶媒で抽出し、乾燥後、溶媒留去する。残留物を再結晶
するか、クロマトグラフィーにより、精製後、不溶性溶
媒を加えて固化させれば目的物質(ロ)を得る。反応条
件を第1表に、生成物の物理定数を第0表に示す。
The reaction solution is poured into ice water, extracted with a water-immiscible solvent such as methylene chloride, and after drying, the solvent is distilled off. The desired substance (b) is obtained by recrystallizing the residue or purifying it by chromatography and solidifying it by adding an insoluble solvent. The reaction conditions are shown in Table 1, and the physical constants of the products are shown in Table 0.

第1表の反応中、実施例1、10、12、21および2
2の反応操作を以下に詳記する。
During the reactions in Table 1, Examples 1, 10, 12, 21 and 2
The reaction operation in step 2 is detailed below.

実施例 1 7a‐ベンズアミドー3fーヒドロキシー3;ーメチル
−1ーデチア−1−オキサセフアムー4Qーカルポン酸
ジフェニルメチル15.0夕を塩化メチレン100地に
懸濁し、氷冷下にかきまぜながらピリジン6.8の‘と
塩化チオニル3肌を加えて75分間、および室温で2時
間15分かきまぜる反応液を氷水に注入し、有機溶媒層
を水洗、乾燥後溶媒蟹去する。
Example 1 15.0 ml of 7a-benzamide 3f-hydroxy-3;-methyl-1-dethia-1-oxacephamo 4Q-diphenylmethyl carboxylate was suspended in 100 methylene chloride, and while stirring under ice-cooling, pyridine 6.8 chloride was added. Thionyl 3 skin was added and stirred for 75 minutes and at room temperature for 2 hours and 15 minutes. The reaction solution was poured into ice water, and the organic solvent layer was washed with water, dried, and the solvent was removed.

残留物を10%含水シリカゲル350#上クロマトグラ
フし、ベンゼン+酢酸エチル(9:1)混液で溶出する
分画より7Q−ペンズアミドー3−メチル一1−デチア
ー1−オキサ−3ーセフェムー4−カルボン酸ジフェニ
ルメチル2.65夕(収率:25.2%;mp.144
〜146oo)と7Qーベンズアミドー3−メチル一1
ーデチアー1ーオキサ−3ーセフヱムー4Qーカルボン
酸ジフェニルメチル1.05夕(収率:10.8%:I
R:レ常皮133340、1782、1745、167
6、166$b肌‐1)とを得る。なお、両異性体の混
合物も得られる。実施例 10 7Q−ペンズアミドー3Q−ヒドロキシー38ークロロ
メチル−1ーデチアー1−オキサセフアムー4Q−カル
ボン酸ペンジルェステル1夕を塩化チオニル0.905
m‘とピリジン0.825泌とのテトラヒドロフラン2
0M溶液に氷冷下にとかし室温に戻したのち、6斑時間
かきまぜる。
The residue was chromatographed on 10% hydrated silica gel 350 #, and the fractions eluted with a mixture of benzene and ethyl acetate (9:1) yielded 7Q-penzamido-3-methyl-1-dethia-1-oxa-3-cephemu-4-carboxylic acid. Diphenylmethyl 2.65% (yield: 25.2%; mp.144
~146oo) and 7Q-benzamido-3-methyl-1
-dethia 1-oxa-3-cephemu 4Q-carboxylic acid diphenylmethyl 1.05 mg (yield: 10.8%: I
R: Re common skin 133340, 1782, 1745, 167
6. Get 166$b skin-1). Note that a mixture of both isomers can also be obtained. Example 10 7Q-penzamide 3Q-hydroxy-38-chloromethyl-1-dethia-1-oxacefamo 4Q-carboxylic acid pendyl ester 1 to 0.905 thionyl chloride
Tetrahydrofuran 2 with m' and 0.825 pyridine
Dissolve in a 0M solution under ice cooling, return to room temperature, and stir for 6 hours.

析出した結晶を炉取し、酢酸エチル、水、塩化メチレン
、アセトンで順次洗い、乾燥すれば452の夕の結晶を
得る。母液は酢酸エチルlooの‘で抽出し、水洗した
のち、前記結晶の洗液と合して酢酸エチルで抽出し、硫
酸ナトリウムで乾燥すれば389の9の残留物を得、ア
セトンから再結晶すれば236の9の結晶を得る。両結
晶は目的物である7Q−ペンズアミド−3−クロロメチ
ルーデチア−1ーオキサー3−セフヱム−4ーカルボン
酸ペンジルェステルである。mp.187〜18洋○(
分解)。収率;71.2%。実施例127Qーベンズア
ミド−3ーエキソメチレンー1−デチア1ーオキサセフ
アムー4Q−カルボン酸ジフェニルメチルェステル51
9の9を塩化メチレン5泌にとかし、0.7州塩素/四
塩化炭素1.6舷を加え、一20〜一30ooに冷却下
に40分間タングステン灯で照射する。
The precipitated crystals are collected in a furnace, washed successively with ethyl acetate, water, methylene chloride, and acetone, and dried to obtain crystals of 452. The mother liquor was extracted with ethyl acetate, washed with water, combined with the washing solution of the crystals, extracted with ethyl acetate, dried over sodium sulfate, and the residue of 389-9 was obtained, which was recrystallized from acetone. 9 crystals of 236 were obtained. Both crystals are the target product, 7Q-penzamide-3-chloromethyl-dethia-1-oxa-3-cephem-4-carboxylic acid penzyl ester. mp. 187-18 Yo○(
Disassembly). Yield: 71.2%. Example 127Q-benzamide-3-exomethylene-1-dethia-1-oxacephaam 4Q-carboxylic acid diphenylmethyl ester 51
Dissolve 9 of 9 in 5 parts of methylene chloride, add 0.7 degrees of chlorine/1.6 degrees of carbon tetrachloride, and irradiate with a tungsten lamp for 40 minutes while cooling to 120 to 130 degrees.

これにシクロベンテン15A〆を加えて再び照射し、次
いで1・5ージアザビシクロ〔4・3・0〕ノネンー5
の140仏そを加え、一20℃で10分間かきまぜる。
反応液を希塩酸、水で洗い、硫酸マグネシウム上乾燥後
、溶媒留去する。残留物をメタノールから再結晶すれば
7Qーベンズアミド−3−クロロメチルー1ーデチア−
1ーオキサー3−セフェム−4ーカルボン酸ジフェニル
メチルェステル484の9を得る。収率:86%。mp
.120〜12800。実施例 21 7Qーフエニルアセトアミドー3−エキソメチレンー1
−ヂチアー1−オキサセフアムー4ーカルボン酸ペンジ
ルェステル205の9を塩化メチレン4の上にとかし、
一30午0に保ち1.34M塩素/四塩化炭素溶液0.
48の‘を加えてタングステン灯で20分照射、さらに
1.34M塩素/四塩化炭素溶液0.11舷を加えて2
8分間照射する。
Cyclobentene 15A was added to this and irradiated again, then 1,5-diazabicyclo[4.3.0]nonene-5
Add 140 tablespoons of water and stir at -20℃ for 10 minutes.
The reaction solution was washed with dilute hydrochloric acid and water, dried over magnesium sulfate, and the solvent was distilled off. Recrystallization of the residue from methanol yields 7Q-benzamide-3-chloromethyl-1-dethia-
1-oxer 3-cephem-4-carboxylic acid diphenylmethyl ester 484-9 is obtained. Yield: 86%. mp
.. 120-12800. Example 21 7Q-phenylacetamide 3-exomethylene-1
- Dithia 1-oxacephaam 4-carboxylic acid pendyl ester 205 9 is dissolved over methylene chloride 4,
1.34M chlorine/carbon tetrachloride solution kept at 0.
48' was added and irradiated for 20 minutes with a tungsten lamp, and then 0.11 m of 1.34M chlorine/carbon tetrachloride solution was added.
Irradiate for 8 minutes.

反応液にシクロベンテン32仏そを加えて15分間かき
まぜ、ピリジン59一そを加えて氷冷下に1時間かきま
ぜる。ピベリジン20〃そを加えて2.虫時間反応させ
、酢酸エチルで希釈し、氷水と塩酸を加えて洗う。有機
層を水洗、乾燥し、溶媒留去する。残留物221の9を
エーテルで洗えば7Q−フヱニルアセトアミド−3ーク
ロロメチル−1−デチア−1ーオキサ−3−セフェム−
4−カルボン酸ペンジルェステル145の9を得る。m
p.137〜139.500。収率:65.3%。実施
例 22〔原料製造〕 (1} 6Q−フェノキシアセトアミドベニシラン酸ジ
フエニルメチルエステル・1ーオキシド5.042夕、
トリフエニルホスフイン2.73夕、1・2ージクロロ
エタン25.2泌およびトルエン25.2の‘の混合物
を3時間還流し、エーテルを加えて析出物を炉去し、炉
液をシリカゲル上クロマトグラフすれば(波)−3ーメ
チルー2−〔(IR・駅)−3ーフェノキシメチルー7
ーオキソー4ーオキサー2・6−ジアザビシクロ〔3・
2・0〕へプトー2−エンー6−イル〕−3ーブテン酸
フェニルメチルェステル3.303夕を得る。
Add 32 parts of cyclobentene to the reaction mixture and stir for 15 minutes, add 59 parts of pyridine, and stir for 1 hour under ice cooling. Add 20 piveridine 2. React for an hour, dilute with ethyl acetate, and wash with ice water and hydrochloric acid. The organic layer was washed with water, dried, and the solvent was distilled off. Washing residue 9 of 221 with ether yields 7Q-phenylacetamido-3-chloromethyl-1-dethia-1-oxa-3-cephem-
4-carboxylic acid pendyl ester 145-9 is obtained. m
p. 137-139.500. Yield: 65.3%. Example 22 [Production of raw materials] (1) 6Q-phenoxyacetamidobenicillanic acid diphenylmethyl ester 1-oxide 5.042 g,
A mixture of 2.73 hours of triphenylphosphine, 25.2 hours of 1,2-dichloroethane, and 25.2 hours of toluene was refluxed for 3 hours, ether was added to remove the precipitate, and the solution was chromatographed on silica gel. If you graph it, it will be (wave) -3-methyl-2-[(IR/station)-3-phenoxymethyl-7
-Oxo4-Oxor2,6-Diazabicyclo[3.
3.303 mg of 2.0]heptot-2-en-6-yl]-3-butenoic acid phenylmethyl ester are obtained.

収率:72.3%。【21前記mの生成物2.4699
を酢酸エチル74.1泌にとかし、氷袷下2.捌M塩化
水素/エーテル溶液1.1当量を加え、室温にて1.3
8M塩素/四塩化炭素1.5当量を25分間に滴下し、
10分後、反応液を冷水74.1凧【、炭酸水素ナトリ
ウム1.51夕、チオ硫酸ナトリウム2.54夕の混合
物に注入し、アセトン74の【を加えて5時間かきまぜ
る。
Yield: 72.3%. [21 Product of m above 2.4699
Dissolve in 74.1 g of ethyl acetate and add 2. Add 1.1 equivalents of hydrogen chloride/ether solution to 1.3 molar solution at room temperature.
1.5 equivalents of 8M chlorine/carbon tetrachloride were added dropwise over 25 minutes,
After 10 minutes, the reaction solution was poured into a mixture of 74.1 parts of cold water, 1.51 parts of sodium bicarbonate, and 2.54 parts of sodium thiosulfate, and 74 parts of acetone was added, followed by stirring for 5 hours.

混合物を酢酸エチルで抽出し、有機層を水洗、乾燥し、
濃縮する。残留物2.808夕をクロマトグラフして精
製すれば(恋)−3−クロロメチルー2−〔(IR・S
)−3−フエノキシメチル−7ーオキソ−4ーオキサー
2・6−ジアザビシクロ〔3・2・0〕へプトー2−エ
ンー6ーィル〕−3−ブテン酸ジフェニルメチルェステ
ル1.664夕を得る。収率・62.9%。‘3’ 前
記■の生成物749の9、アセトン7.5の‘およびび
よう化ナトリウム760の9の混合物を2時間かきまぜ
たのち、酢酸エチルで抽出する。有機層を水洗、乾燥、
濃縮し、残留物818雌をジメチルスルホキシド7.4
9叫、水1.87の【および酸化第一銅622雌と混合
し、40o○で3時間かきまぜる。反応液を酢酸エチル
50私でうすめ.、析出物を炉去し、炉液を水洗、乾燥
、濃縮する。残留物をクロマトグラフすれば(波)‐3
−ヒドロキシメチルー2一〔(IR・虫)一3−フエノ
キシメチルー7ーオキソ−4ーオキサ−2・6ージアザ
ビシクロ〔3・210〕へプトー2−ェンー6−イル〕
−3−ブテン酸フェニルメチルェステル218m9を得
る。収率:3o.2%‘4} 前記の生成物169の9
を塩化メチレン1.7私にとかし、硫酸鋼を169の9
を加え3.曲時間還流する。不溶物を炉去、反応液を酢
酸エチルでうすめ、水洗、乾燥し、濃縮する。残留物を
クロマトグラフして精製すれば7Qーフェノキシアセト
アミドー3ーメチレンー1ーデチアー1ーオキサセフア
ム−4Qーカルボン酸フェニルメチル78のcを得る。
収率:46.2%。〔実施例22の反応〕 前記‘4ーの生成物68mpを塩化メチレン1.4の‘
にとかし、一50ooてタングステン灯で照射下に1.
8M塩素/四塩化炭素溶液1.3当量を加える。
The mixture was extracted with ethyl acetate, the organic layer was washed with water, dried,
Concentrate. When the residue 2.808% is purified by chromatography, it becomes (Koi)-3-chloromethyl-2-[(IR・S
)-3-phenoxymethyl-7-oxo-4-oxer 2,6-diazabicyclo[3.2.0]hept-2-en-6-yl]-3-butenoic acid diphenylmethyl ester (1.664 g) is obtained. Yield: 62.9%. '3' A mixture of 9 of the product 749, 7.5 of acetone and 9 of sodium biodide 760 was stirred for 2 hours, and then extracted with ethyl acetate. Wash the organic layer with water, dry it,
Concentrate and dissolve the residue 818 in dimethyl sulfoxide 7.4
Mix with 9 parts of water, 1.87 parts of water, and 622 parts of cuprous oxide, and stir at 40 o'clock for 3 hours. Dilute the reaction solution with 50 parts of ethyl acetate. , the precipitate is removed from the furnace, and the furnace liquid is washed with water, dried, and concentrated. If the residue is chromatographed (wave) -3
-Hydroxymethyl-2-[(IR/Insect)-3-phenoxymethyl-7-oxo-4-oxa-2,6-diazabicyclo[3.210]hepto-2-en-6-yl]
218m9 of -3-butenoic acid phenylmethyl ester are obtained. Yield: 3o. 2%'4} 9 of the above products 169
Melt methylene chloride to 1.7 I, sulfuric acid steel to 169 to 9
Add 3. Song time reflux. Insoluble matter was removed in an oven, and the reaction solution was diluted with ethyl acetate, washed with water, dried, and concentrated. The residue is purified by chromatography to obtain phenylmethyl 7Q-phenoxyacetamido-3-methylene-1-dethia-1-oxacefam-4Q-carboxylate 78c.
Yield: 46.2%. [Reaction of Example 22] 68 mp of the above '4-' product was converted into 1.4 methylene chloride.
Comb it and heat it under irradiation with a tungsten lamp at 150 ohms.
Add 1.3 equivalents of 8M chlorine/carbon tetrachloride solution.

30分後、シクロベンテン0.4当量とピべリジン16
仏〆とを加え、氷冷する。
After 30 minutes, 0.4 equivalents of cyclobentene and 16 piberidine
Add Butsuji and chill on ice.

30分したのち、反応液を酢酸エチルで希釈し、冷希塩
酸、炭酸水素ナトリウム水、および水で洗い、乾燥し、
濃縮する。
After 30 minutes, the reaction solution was diluted with ethyl acetate, washed with cold dilute hydrochloric acid, aqueous sodium bicarbonate, and water, and dried.
Concentrate.

残留物70の9をエーテルから再結晶すれば7Qーフヱ
ノキシアセトアミドー3−クロロメチル−1ーデチア−
1−オキサ−3ーセフェムー4ーカルボン酸ジフェニル
メチルェステル63雌を得る。収率:89%。mp16
2〜I64℃。(各工程の生成物の物理定数は次の通り
)‘1) m:レS奴13178ふ17401651伽
‐1。
Recrystallization of residue 70-9 from ether yields 7Q-phenoxyacetamide 3-chloromethyl-1-dethia-
1-Oxa-3-cephemu 4-carboxylic acid diphenylmethyl ester 63 females are obtained. Yield: 89%. mp16
2-I64°C. (The physical constants of the products of each process are as follows)'1) m:ReS 13178fu 17401651 佽-1.

NMR: 6 C0013 1.8碑9日 、 4.5
$2日 、4.8$IH、4.9$IH、5.2〜5.
1m2日、5.87d(4HZ)IH、6.9伍IH、
6.8〜7.8ml細〇【211R:〃忌袋13178
317431658弧‐1。NMR: 6 ooo13
4.1$2日 、 4.6$2日 、5.1伍IH、
5.2の(4HZ)IH、5.2$IH、5.5$IH
、5.8弦(4日2)IH、6.9SI日、6.8〜7
.7ml9日。【31m:レS袋CI33350、17
82、1750、1662弧‐1。
NMR: 6 C0013 1.8 Monument 9th, 4.5
$2 days, 4.8 $IH, 4.9 $IH, 5.2-5.
1m2 days, 5.87d (4HZ) IH, 6.95 IH,
6.8-7.8ml thin [211R: Death bag 13178
317431658 arc-1. NMR: 6ooo13
4.1$2 days, 4.6$2 days, 5.15 IH,
5.2 (4HZ) IH, 5.2$IH, 5.5$IH
, 5.8 string (4 days 2) IH, 6.9 SI days, 6.8-7
.. 7ml 9 days. [31m: Les S bag CI33350, 17
82, 1750, 1662 arc-1.

NMR: 6 CoC13 4.1$2日 、 4.5
$2日 、4.9$IH、5.1$IH、5.2の(4
日2)IH、5.41sIH、5.9の(4HZ)IH
、6.9$IH、6.6〜7.肌凪{4} m:レS髪
1334101777、1742、1691弧‐1。N
MR:60DC134.2本2日、4.5$2日、4.
9紅(8日2)IH、5.1$IH、5.262日、5
.3$IH、6.8$IH、6.6〜7.8h18日。
利用例1 {1) 7Qーフエニルアセトアミドー3−クロロメチ
ルー1ーデチアー1−オキサ−3ーセフエム−4−カル
ボン酸ジフェニルメチル7&夕をテトラヒドロフラン3
叫と塩化メチレン2の‘の混合物にとかし、一40〜一
3yoでかさまぜながら、t−ブチルヒポクリト26し
そと2Nリチウムメトキシド/メタノール10の【とを
加えて15分間かきまぜる。
NMR: 6 CoC13 4.1$2 days, 4.5
$2 days, 4.9 $IH, 5.1 $IH, 5.2 (4
Day 2) IH, 5.41sIH, 5.9 (4HZ) IH
, 6.9$IH, 6.6-7. Skin calm {4} m: Les S hair 1334101777, 1742, 1691 arc-1. N
MR: 60DC134.2 2 days, 4.5$ 2 days, 4.
9 red (8 days 2) IH, 5.1 $ IH, 5.262 days, 5
.. 3$IH, 6.8$IH, 6.6-7.8h18 days.
Application example 1 {1) 7Q-phenylacetamide 3-chloromethyl-1-dethia-1-oxa-3-cephem-4-carboxylic acid diphenylmethyl 7 & tetrahydrofuran 3
Dissolve the solution in a mixture of 2 parts of sodium chloride and methylene chloride, and while stirring at 140 to 13 parts, add 26 parts of t-butylhypocrito and 10 parts of 2N lithium methoxide/methanol, and stir for 15 minutes.

酢酸0.1Mを加えた反応液を氷冷食塩水に注ぎ、酢酸
エチルで抽出する。有機層をチオ硫酸ナトリウム水、炭
酸水素ナトリウム水、食塩水で洗い、硫酸ナトリウム上
乾燥し、溶媒留去すれば73ーフヱニルアセトアミドー
7oーメトキシ−3ークロロメチルー1ーデチアー1ー
オキサー3−セフエムー4−力ルボン酸ジフェニルメチ
ル81雌を得る。IR:〃忌舷133410、1788
1728 1695弧‐INMR:6CDC133.4
$9日、3.6$2日、4.4$十s4日、5.0SI
日、6.581日、6.9$IH、7.1〜7.6ml
9日。
The reaction solution to which 0.1M acetic acid was added was poured into ice-cold brine, and extracted with ethyl acetate. The organic layer was washed with aqueous sodium thiosulfate, aqueous sodium bicarbonate, and brine, dried over sodium sulfate, and the solvent was distilled off to give 73-phenylacetamide 7o-methoxy-3-chloromethyl-1-dethia-1-oxer-3-cefemu-4- Diphenylmethyl carboxylate 81 females were obtained. IR: 133410, 1788
1728 1695 Arc-INMR:6CDC133.4
$9 days, 3.6 $2 days, 4.4 $10s 4 days, 5.0 SI
day, 6.581 days, 6.9$ IH, 7.1-7.6ml
9th.

{2} 前記mの生成物76の9、アセトン2の上、1
−〆チルテトラゾール−5ーチオールのナトリウム塩2
2地の混合物を室温でかさまぜる。
{2} Above m product 76 9, acetone 2, 1
- Sodium salt of tiltetrazole-5-thiol 2
Stir the two mixtures at room temperature.

35分後、反応液を氷水中に注ぎ、酢酸エチルで抽出す
る。
After 35 minutes, the reaction solution is poured into ice water and extracted with ethyl acetate.

有機層を食塩水で洗い、乾燥後、溶媒蟹去する。残留物
88のoを塩化メチレンーェーテルから再結晶すれば7
6−フェニルアセトアミド一7Q−メトキシ−3一(1
ーメチルテトラゾール−5−イル)ーチオメチルー1ー
デチアー1−オキサ−3−セフェム−4−カルポン酸ジ
フェニルメチル57のpを得る。通算収率:67.7%
。mP174〜176q0。(3} 7Q−フエニルア
セトアミド−3−クロロメチル−1−デチアー1−オキ
サ−3−セフエムー4−カルポン酸ジフェニルメチル1
71のo、アセトン5の‘、1ーメチルテトラゾール一
5−イルチオールのナトリウム塩51の9の混合物を室
温で3雌ご間かきまぜる。
The organic layer was washed with brine, dried, and the solvent was removed. If the residue 88 o is recrystallized from methylene chloride ether, 7 is obtained.
6-phenylacetamido-7Q-methoxy-3-(1
-methyltetrazol-5-yl)-thiomethyl-1-dethia-1-oxa-3-cephem-4-carboxylic acid diphenylmethyl 57 p is obtained. Total yield: 67.7%
. mP174-176q0. (3} 7Q-phenylacetamido-3-chloromethyl-1-dethia-1-oxa-3-cefemu-4-carboxylic acid diphenylmethyl 1
A mixture of 71 parts, 5 parts of acetone, and 51 parts of the sodium salt of 1-methyltetrazol-5-ylthiol is stirred at room temperature for 3 minutes.

反応液を酢酸エチルで抽出し、有機層を食塩水で洗い、
硫酸ナトリウムで乾燥し、溶媒留去すれば7Q−フェニ
ルアセトアミド−3−(1−メチルテトラゾール−5ー
イル)チオメチル−1−デチア−1−オキサー3ーセフ
ェムー4−カルボン酸ジフェニルメチル195の夕を得
る。NMR:6CDC133.6$2日、3‐77S母
日、4.2$2日、4.57sが、4.6M(7HZ)
IH、4.9SI日、6.2粕(7HZ)IH、6.9
公IH、7.2〜7.6mlHH。
The reaction solution was extracted with ethyl acetate, and the organic layer was washed with brine.
Drying over sodium sulfate and evaporation of the solvent yields 195 diphenylmethyl 7Q-phenylacetamido-3-(1-methyltetrazol-5-yl)thiomethyl-1-dethia-1-oxa-3-cepheme-4-carboxylate. NMR: 6CDC133.6$2nd, 3-77S Mother's Day, 4.2$2nd, 4.57s, 4.6M (7HZ)
IH, 4.9 SI days, 6.2 lees (7HZ) IH, 6.9
Public IH, 7.2-7.6mlHH.

【4’前記‘3’の生成物90の9を窒素気流中でかき
まぜながら塩化メチレン2の‘にとかし、t−ブチルヒ
ポクロリト19一そと2Mリチウムメトキシド/メタノ
ール溶液94りそとを加える。
[4' 90 parts of the product from '3' above was dissolved in 2 parts of methylene chloride while stirring in a nitrogen stream, and 19 parts of t-butyl hypochlorite and 94 parts of a 2M lithium methoxide/methanol solution were added. Add.

5分後に酢酸50仏〆を加える。After 5 minutes, add 50 grams of acetic acid.

反応液を氷水に注ぎ、酢酸エチルで抽出する。有機層を
10%チオ硫酸ナトリウム水、炭酸水素ナトリウム水、
および食塩水で洗い、硫酸ナトリウム上で乾燥し、濃縮
する。残留物90の9を塩化〆チレンーェーテル混液か
ら結晶化すれば78一フェニルアセトアミド−7Qーメ
トキシー3一(1−メチルテトラゾール−5−イル)チ
オメチル−1ーデチアー1ーオキサ−3−セフェム−4
ーカルボン酸ジフェニルメチル54の夕を得る。収率5
7.5%。mp176−177.yo。NMR:8C。
Pour the reaction solution into ice water and extract with ethyl acetate. The organic layer was diluted with 10% sodium thiosulfate water, sodium bicarbonate water,
and brine, dry over sodium sulfate, and concentrate. When the residue 90-9 is crystallized from a mixture of chlorinated ethylene ether, 78-phenylacetamido-7Q-methoxy-3-(1-methyltetrazol-5-yl)thiomethyl-1-dethia-1-oxa-3-cephem-4 is obtained.
- Diphenylmethyl carboxylate 54 was obtained. Yield 5
7.5%. mp176-177. yo. NMR: 8C.

CI33‐47S母日、3‐67S2日、3‐8$SH
、4.2$2日、4.6本2日、5.0SI日、6.2
$IH、6.9$IH、7.2〜7.8hl9日。IR
:レ富舷13341u1792、1700(br)肌‐
1。
CI33-47S Mother's Day, 3-67S 2nd, 3-8$SH
, 4.2 $2 days, 4.6 books 2 days, 5.0 SI days, 6.2
$IH, 6.9$IH, 7.2-7.8hl 9 days. IR
:Refuyode 13341u1792, 1700(br) skin-
1.

利用例 2‘1} 利用例1醐と同機にして78ーベン
スアミド−7Q−メトキシ−3一(クロルまたはブロム
)メチル−1−デチアー1−オキサ−3ーセフェム−4
−カルボン酸ジフェニルメチルより73ーベンズアミド
ー7ーメトキシー3一(1ーメチルテトラゾール−5−
イル)チオメチルー1ーデチア−3ーセフェム−4−カ
ルボン酸ジフヱニルメチルを得る。
Usage example 2'1} Usage example 1 78-benzamide-7Q-methoxy-3-(chlor or bromo)methyl-1-dethia-1-oxa-3-cephem-4
-73-benzamide 7-methoxy 3-(1-methyltetrazole-5-
diphenylmethyl)thiomethyl-1-dethia-3-cephem-4-carboxylate is obtained.

IR:〃鑑繋133420、2840、1790、17
25、1磯0伽■ 前記{1’と同様にして(7Q−ペ
ンズアミドまたは78−ペンズアミド−7Qーメトキシ
)−3ークooメチル−1−デチア−1ーオキサー3−
セフェムー4ーカルボン酸ペンジルより(7Qーベンズ
アミドまたは78ーベンズアミドー7Q−メトキシ)一
3−(1ーメチルテトラゾール−5−イル)チオメチレ
ー1ーデチア−1ーオキサ−3ーセフェムー4ーカルボ
ン酸ペンジルを得る。
IR: 133420, 2840, 1790, 17
25, 1 Iso 0 Ka■ Similarly to {1' above, (7Q-penzamide or 78-penzamide-7Q-methoxy)-3-koomethyl-1-dethia-1-oxer 3-
Penzyl (7Q-benzamide or 78-benzamide 7Q-methoxy)-1-3-(1-methyltetrazol-5-yl)thiomethyl-1-dethia-1-oxa-3-cephemu-4-carboxylate is obtained from penzyl cephemu-4-carboxylate.

(7Q−ペンズアミド体)mp186〜189午○。(
78−ペンズアミド−7Q−メトキシ体)mp189〜
19100(分解)。略縞 菱 偽 鮒 き 馨 鮒 鰭 柵蝋 三宮 ざふ ;表 主旨 」に 1上 梶 千雌 入‐ ÷さ 一べ さま ミ旨 貝垂 声壷 亨霊 \g 〔セ 。
(7Q-penzamide form) mp186-189pm ○. (
78-penzamide-7Q-methoxy form) mp189~
19100 (decomposition). Approximately striped rhombus false carp, carp, fin, fence, Sannomiya zafu; 1st place in the table subject.

・ 的○熱 官軍 も丈 ト盤 1ン .. 上( フエ 蓋令 ○) 礎 蔓・ Target ○ fever government army Length To board 1. .. Up( Hue cover order ○) foundation vine

Claims (1)

【特許請求の範囲】 1 式Iで表わされるセフアム化合物に脱水剤または脱
ハロゲン化水素剤を作用させることを特徴とする式IIで
表わされるセフアム化合物の製造方法。 ▲数式、化学式、表等があります▼ (式中、 Aはアロイルアミノ、フエニルアセトアミドまたはフエ
ノキシアセトアミド、Bはアラルコキシ、 Xは水素、ハロゲンまたは1−メチルテトラゾール−5
−イルチオ、Yは水素またはメトキシ、 Zは水酸基またはハロゲン、 波線はα結合またはβ結合、 点線は2位または3位二重結合 をそれぞれ示す)。
[Claims] 1. A method for producing a cephalic compound represented by formula II, which comprises reacting a cephalic acid compound represented by formula I with a dehydrating agent or a dehydrohalogenating agent. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, A is aroylamino, phenylacetamide, or phenoxyacetamide, B is aralkoxy, and X is hydrogen, halogen, or 1-methyltetrazole-5
-ylthio, Y is hydrogen or methoxy, Z is a hydroxyl group or halogen, the wavy line represents an α bond or a β bond, and the dotted line represents a double bond at the 2- or 3-position, respectively).
JP52067025A 1977-02-15 1977-06-06 Process for producing 1-oxadethiacephalosporin Expired JPS6040438B2 (en)

Priority Applications (55)

Application Number Priority Date Filing Date Title
JP52067025A JPS6040438B2 (en) 1977-06-06 1977-06-06 Process for producing 1-oxadethiacephalosporin
GB5339/78A GB1557552A (en) 1977-02-15 1978-02-09 1 oxadethiacepham compounds
AU33164/78A AU514377B2 (en) 1977-02-15 1978-02-09 l-OXADETHIACEPHAM COMPOUNDS
IE298/78A IE47711B1 (en) 1977-02-15 1978-02-10 1-oxadethiacepham compounds
CA296,776A CA1099715A (en) 1977-02-15 1978-02-10 1-oxadethiacepham compounds
DK060678A DK168217B1 (en) 1977-02-15 1978-02-10 Process for Preparation of 1-Dethia-1-Oxacepham and Cephalosporin Compounds
NZ186437A NZ186437A (en) 1977-02-15 1978-02-10 1-oxa-dethia-cephalosporins
PT67648A PT67648B (en) 1977-02-15 1978-02-13 Process for preparing 1-oxadethiacepham compounds
IL54044A IL54044A (en) 1977-02-15 1978-02-13 Process for preparing 1-dethia-1-oxacepham compounds,some new compounds of this type,and method of inhibiting growth of bacteria using them
FI833079A FI833079A0 (en) 1977-02-15 1978-02-14 1-dethia-1-OXACEFAMFOERENINGAR
GR55452A GR69965B (en) 1977-02-15 1978-02-14
PL1978204616A PL114451B1 (en) 1977-02-15 1978-02-14 Process for preparing novel 1-oxadethiacephalosporins
BG040118A BG32854A3 (en) 1977-02-15 1978-02-14 METHOD FOR OBTAINING 1- OXADETHIACEPHALOSPORINS
BG038671A BG32853A3 (en) 1977-02-15 1978-02-14 METHOD FOR OBTAINING 1- OXADETHIACEPHALOSPORINS
RO78100613A RO79398A (en) 1977-02-15 1978-02-14 PROCESS FOR THE PREPARATION OF 1-OXA-DETHIACEPHALOSPORINS
BG040119A BG32855A3 (en) 1977-02-15 1978-02-14 METHOD FOR OBTAINING 1-OXADETHIACEPHALOSPORINS
FI780474A FI68401C (en) 1977-02-15 1978-02-14 7BETA-ACYLAMINO-7ALFA-METHOXY-3-SUBSTITUTE METADYL-1-OXADETIA-1-CEFAM-4-CARBOXYLATER ANVAENDBARA SOM MELLANPRODUKTER I FRAMSTAELLNING AV 1-DETIA-1-OXACEFALOSPORINER
YU335/78A YU41307B (en) 1977-02-15 1978-02-14 Process for obtaining 1-oxadethia cepham compounds
NO780508A NO162343C (en) 1977-02-15 1978-02-14 7-ACYLAMINO-1-DETIA-1-OXACEFAM COMPOUNDS SUITABLE AS INTERMEDIATE FOR THE PREPARATION OF 7BETA-ACYLAMINO-1-DETIA-1-OXACEPHALOSPORINES.
CS697078A CS196418B2 (en) 1977-06-06 1978-02-14 Method of producing 1-dethia-1-oxacephamderivatives
MX786846U MX5479E (en) 1977-02-15 1978-02-14 PROCEDURE FOR THE PREPARATION OF DERIVATIVES OF 1-OXADETIACEFALOSPORINAS
HU78SI1619A HU177897B (en) 1977-02-15 1978-02-14 Process for preparing 7-amino-dethia-1-oxa-cefam- and -cefem-4-carboxylic acid derivatives resp.
ES466949A ES466949A1 (en) 1977-02-15 1978-02-14 1-Oxadethiacepham compounds and process for producing said compounds
CS697178A CS196419B2 (en) 1977-06-06 1978-02-14 Method of producing 1-dethia-1-oxacephamderivatives
SE7801697A SE443144B (en) 1977-02-15 1978-02-14 INTERMEDIATES, 1-OXADETIACEFAM SOCIETIES, AND PROCEDURES FOR PRODUCING THEREOF
FR7804162A FR2380284A1 (en) 1977-02-15 1978-02-14 PROCESS FOR THE PREPARATION OF 1-OXADETHIACEPHAM COMPOUNDS AND THEIR USE AS ANTIBACTERIAL PRODUCTS AND AS INTERMEDIARIES FOR THE PREPARATION OF 1-DETHIA-1-OXACEPHALOSPORINS
RO78100612A RO78545A (en) 1977-02-15 1978-02-14 PROCEDURE FOR PREPARING FALOSPORINE 1-OXADETICATION
PL21645578A PL117503B1 (en) 1977-06-06 1978-02-14 Process for preparing novel 1-dethia-1-oxacephame derivativesama
RO78100614A RO79886A (en) 1977-02-15 1978-02-14 PROCEDURE FOR PREPARING FALOSPORINE 1-OXADETICATION
NL7801708A NL191891C (en) 1977-02-15 1978-02-15 Process for the preparation of 1-oxadethiacepham or cephem derivatives.
CH167278A CH636618A5 (en) 1977-02-15 1978-02-15 1-Oxadethiacepham compounds, and a process for preparing them
DE19782806457 DE2806457A1 (en) 1977-02-15 1978-02-15 1-OXADETHIACEPHAM COMPOUNDS AND METHOD FOR THEIR MANUFACTURE
PH20789A PH15515A (en) 1977-02-15 1978-02-15 1-oxadethiacephan compounds
BG040120A BG32856A3 (en) 1977-02-15 1978-06-16 METHOD OF OBTAINING 1-OXADETYLACEPHALOSPORIUM
ES78475140A ES475140A1 (en) 1977-02-15 1978-11-16 1-Oxadethiacepham compounds and process for producing said compounds
ES78475142A ES475142A1 (en) 1977-02-15 1978-11-16 1-Oxadethiacepham compounds and process for producing said compounds
ES475141A ES475141A1 (en) 1977-02-15 1978-11-16 1-Oxadethiacepham compounds and process for producing said compounds
SU782698999A SU1047390A3 (en) 1977-06-06 1978-12-20 Process for froducing 1-dethia-1-oxacephalosporin
SU782698998A SU1024009A3 (en) 1977-06-06 1978-12-20 Method of producing o-dethia-oxacephalosporines
AT617179A AT370736B (en) 1977-06-06 1979-09-19 METHOD FOR PRODUCING NEW 1-OXADETHIACEPHAM COMPOUNDS
AT617279A AT370105B (en) 1977-06-06 1979-09-19 METHOD FOR PRODUCING NEW 1-OXADETHIACEPHAM AND CEPHEM DERIVATIVES
PH23439A PH15513A (en) 1977-02-15 1979-12-20 1-oxadethiacepham compounds
PH23440A PH15291A (en) 1977-02-15 1979-12-20 1-oxadethiacepham compounds
PH23438A PH15294A (en) 1977-02-15 1979-12-20 1-oxadethiacepham compounds
US06/322,662 US4366316A (en) 1977-02-15 1981-11-18 1-Oxadethiacepham compounds and process for producing said compounds
AR22786782D AR227867A1 (en) 1977-02-15 1982-01-01 NEW DERIVATIVES OF ACID 7-AMINO-1-DETIA-1-OXACEFAM-4-CARBOXILICO EXEMPT FROM THERAPEUTIC ACTIVITY AND USEFUL AS INTERMEDIARIES TO OBTAIN 1-OXADETIACEFALOSPORINAS AND PROCEDURE TO PREPARE THEM
US06/374,862 US4443598A (en) 1977-02-15 1982-05-04 1-Oxadethiacepham compounds
YU548/83A YU42073B (en) 1977-02-15 1983-03-07 Process for obtaining 1-oxadethiaceptham compounds
YU54983A YU42074B (en) 1977-06-06 1983-03-07 Process for obtaining 1-oxadethiacepham compounds
FI833080A FI70713C (en) 1977-02-15 1983-08-30 7BETA-ACYLAMINO-1-CEFAM-FOERENINGAR ANVAENDBARA SOM MELLANPRODUKTER I FRAMSTAELLNING AV 7-ACYLAMINO-1-DETIA-1-OKSACEFALOSPORINER
US06/542,520 US4604460A (en) 1977-02-15 1983-10-17 1-oxadethiacepham compounds
US06/543,939 US4504659A (en) 1977-02-15 1983-10-19 1-Oxadethiacepham compounds
US06/543,664 US4478997A (en) 1977-02-15 1983-10-19 1-Oxadethiacepham compounds
US06/543,940 US4533730A (en) 1977-02-15 1983-10-19 1-Oxadethiacepham compounds
FI843922A FI71154C (en) 1977-02-15 1984-10-05 1-dethia-1-OXA-3- (1-methyl-1,2,3,4-tetrazol-5-YL) TIOMETYLCEFAM-4-KARBOXYLATER

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52067025A JPS6040438B2 (en) 1977-06-06 1977-06-06 Process for producing 1-oxadethiacephalosporin

Publications (2)

Publication Number Publication Date
JPS543088A JPS543088A (en) 1979-01-11
JPS6040438B2 true JPS6040438B2 (en) 1985-09-11

Family

ID=13332927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52067025A Expired JPS6040438B2 (en) 1977-02-15 1977-06-06 Process for producing 1-oxadethiacephalosporin

Country Status (5)

Country Link
JP (1) JPS6040438B2 (en)
CS (2) CS196418B2 (en)
PL (1) PL117503B1 (en)
SU (2) SU1024009A3 (en)
YU (1) YU42074B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110003243A (en) * 2019-04-23 2019-07-12 山西千岫制药有限公司 A kind of preparation method of oxacephem parent nucleus

Also Published As

Publication number Publication date
PL117503B1 (en) 1981-08-31
CS196418B2 (en) 1980-03-31
CS196419B2 (en) 1980-03-31
JPS543088A (en) 1979-01-11
YU42074B (en) 1988-04-30
YU54983A (en) 1984-02-29
SU1047390A3 (en) 1983-10-07
SU1024009A3 (en) 1983-06-15

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