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JPS6044801B2 - thin film thermistor - Google Patents
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JPS6044801B2 - thin film thermistor - Google Patents

thin film thermistor

Info

Publication number
JPS6044801B2
JPS6044801B2 JP8693480A JP8693480A JPS6044801B2 JP S6044801 B2 JPS6044801 B2 JP S6044801B2 JP 8693480 A JP8693480 A JP 8693480A JP 8693480 A JP8693480 A JP 8693480A JP S6044801 B2 JPS6044801 B2 JP S6044801B2
Authority
JP
Japan
Prior art keywords
temperature
thin film
film
thermistor
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8693480A
Other languages
Japanese (ja)
Other versions
JPS5712502A (en
Inventor
彪 長井
一志 山本
郁夫 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8693480A priority Critical patent/JPS6044801B2/en
Publication of JPS5712502A publication Critical patent/JPS5712502A/en
Publication of JPS6044801B2 publication Critical patent/JPS6044801B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は、サーミスタ、特に絶縁性基板上に電極膜と感
温抵抗体膜とを形成して成る薄膜サーミスタに関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thermistor, and particularly to a thin film thermistor comprising an electrode film and a temperature-sensitive resistor film formed on an insulating substrate.

従来この種薄膜サーミスタには、(l$、Siあるいは
Fe、Ni、Co、Mnなどの複合金属酸化物から成る
感温抵抗体膜が用いられてきた。
Conventionally, this type of thin-film thermistor has used a temperature-sensitive resistor film made of Si or a composite metal oxide such as Fe, Ni, Co, or Mn.

これら感温抵抗体膜のサーミスタ定数(以下、単にB定
数と言う)は前記複合酸化物の感温焼結体から成るバル
クサーミスタと同様、温度によらずほぼ一定であつた。
このため、この種サーミスタを、第1図に示す電気回路
の回路素子として用い、電気的に温度を検出する場合、
出力電圧が温度に対して直線的に変化しない、あるいは
検出感度が温度によつて大巾に変動すると言う欠点があ
つた。第1図において、1はサーミスタで、その抵抗温
度特性R(T)で示す。
The thermistor constants (hereinafter simply referred to as B constants) of these temperature-sensitive resistor films were almost constant regardless of temperature, similar to the bulk thermistors made of the temperature-sensitive sintered body of the composite oxide.
Therefore, when using this type of thermistor as a circuit element of the electric circuit shown in FIG. 1 to electrically detect temperature,
The disadvantages are that the output voltage does not vary linearly with temperature, or that the detection sensitivity varies widely depending on temperature. In FIG. 1, 1 is a thermistor, and its resistance-temperature characteristic R(T) is shown.

2は抵抗値Ro(一定)の固定抵抗器、3は電圧EaV
の電源、4は出力電圧で、その値をEgで示す。
2 is a fixed resistor with a resistance value Ro (constant), 3 is a voltage EaV
4 is the output voltage, and its value is indicated by Eg.

これ等の間には、次式が成立する。目−Ro Ea−Ro+R(T) 以下では簡単化のためにEa■IVとして扱うが、Ea
:IVの場合に、本質的な相違が生じないことは明らか
であろう。
The following equation holds true between these. -Ro Ea-Ro+R(T) Below, for simplicity, it will be treated as Ea■IV, but Ea
It will be clear that in the case of :IV, no essential difference arises.

Roは、ある一定温度Toでのサーミスタ抵抗値R(T
o)と同じ値になるように選ばれる。Toは検出温度範
囲、出力電圧Egを電気的に処理する電気回路の特性な
どによつて決められる。第2〜3図に従来のサーミスタ
について、代表的な出力電圧Egと温度Tの関係、検出
感度dEg/dTと温度Tの関係をTo■150℃とし
た場合″について示す。
Ro is the thermistor resistance value R(T
o) is selected to be the same value. To is determined by the detection temperature range, the characteristics of the electric circuit that electrically processes the output voltage Eg, and the like. FIGS. 2 and 3 show a typical relationship between output voltage Eg and temperature T, and a relationship between detection sensitivity dEg/dT and temperature T for a conventional thermistor when To1 is 150°C.

曲線5、7はB■2000’に)曲線6、8はB:50
00にの場合である。曲線5、6に示すように、出力重
囲kgは温度Tに対して曲線的に変化する。また曲線7
、8に示すように、検出感度dEg/dTは、温度Tに
対して大巾に変動7する。このような温度Tに対する出
力電圧特性、検出感度特性のために、出力重囲kgを処
理する電子回路が複雑になる、回路設計も難かしくなる
などの欠点が派生した。
Curves 5 and 7 are B■2000') Curves 6 and 8 are B:50
This is the case for 00. As shown in curves 5 and 6, the output weight range kg changes in a curved manner with respect to the temperature T. Also curve 7
, 8, the detection sensitivity dEg/dT varies widely 7 with respect to the temperature T. These output voltage characteristics and detection sensitivity characteristics with respect to the temperature T have resulted in drawbacks such as the complexity of the electronic circuit for processing the output weight (kg) and the difficulty in circuit design.

さらにサーミスタで温度を検出し、それと設定温度とを
比較して熱源の発熱量を制御したい場合、通常、設定温
度は可変抵抗器の回転軸の回転角度に対応するように電
気回路が構成される。
Furthermore, if you want to control the amount of heat generated by a heat source by detecting the temperature with a thermistor and comparing it with a set temperature, the electric circuit is usually configured so that the set temperature corresponds to the rotation angle of the rotary shaft of the variable resistor. .

この際、前述の如き出力電圧特性、検出感度特性のため
に、回転角度に対して設定温度を直線的に決められない
という欠点があつた。検出感度の小さな領域では、温度
Tに対する出力電圧Egの変化が平坦な領域であるので
、可変抵抗器の設定回転角度に微少な変化が発生した場
合、すなわち設定出力電圧Egに微少な変化が発生した
場合、大きな温度変動が生じ、他方検出感度の大きな領
域では、逆のことが成り立つ。このように設定温度によ
つて、設定温度精度がばらつくと言う欠点があつた。な
お、感温抵抗体膜にSiC抵抗体膜を用いた場合、その
B定数は温度依存性を有し、必ずしも一定でない。
At this time, there was a drawback that the set temperature could not be determined linearly with respect to the rotation angle due to the output voltage characteristics and detection sensitivity characteristics as described above. In the region where detection sensitivity is small, the change in output voltage Eg with respect to temperature T is flat, so if a slight change occurs in the set rotation angle of the variable resistor, that is, a small change occurs in the set output voltage Eg. In this case, large temperature fluctuations occur, while in regions of high detection sensitivity, the opposite is true. As described above, there was a drawback that the accuracy of the set temperature varied depending on the set temperature. Note that when a SiC resistor film is used as the temperature-sensitive resistor film, the B constant has temperature dependence and is not necessarily constant.

しかしこの場合にも第2〜3図、曲線9,10に示すよ
うに前述の欠点をまぬがれることはできなかつた。本発
明は、これら従来の欠点を解消した新規な薄膜サーミス
タを提供するものである。
However, even in this case, as shown in curves 9 and 10 in FIGS. 2 and 3, the above-mentioned drawbacks could not be avoided. The present invention provides a novel thin film thermistor that eliminates these conventional drawbacks.

本発明の要旨は、少なくとも、感温性基板板上に電極膜
と感温抵抗体膜とを形成し、感温性基板と感温抵抗体膜
との抵抗温度特性が互いに異なる点にある。
The gist of the present invention resides in that at least an electrode film and a temperature-sensitive resistor film are formed on a temperature-sensitive substrate plate, and the resistance-temperature characteristics of the temperature-sensitive substrate and the temperature-sensitive resistor film are different from each other.

本発明の薄膜サーミスタの断面を第4図に示す。FIG. 4 shows a cross section of the thin film thermistor of the present invention.

11は感温性基板、12は電極膜、13は感.温抵抗体
膜である。
11 is a temperature-sensitive substrate, 12 is an electrode film, and 13 is a temperature-sensitive substrate. It is a temperature resistor film.

本発明の薄膜サーミスタの最大の特長は、感温性基板1
1にある。
The greatest feature of the thin film thermistor of the present invention is that the temperature-sensitive substrate 1
It is in 1.

すなわち、従来の薄膜サーミスタは絶縁性基板を用いて
いる。このため、この種サーミスタの特性は、感温抵抗
体膜13のみに!よつて決められる。これに対し本発明
の薄膜サーミスタは、感温性基板11を用いているので
、その特性は感温抵抗体膜13のみならず、感温性基板
11によつても影響をうける。この結果、後述するよう
に出力電圧特性、検出感度特性の優れた4薄膜サーミス
タを得ることができる。感温性基板11は、Fe,Ni
,CO,Mnなどの複合酸化物あるいはNi,Zn,F
e,COlなどの単体金属酸化物のような酸化物半導体
、Si,Geのような元素半導体の群から選ばれたもの
がよい。
That is, conventional thin film thermistors use an insulating substrate. Therefore, the characteristics of this type of thermistor are limited to the temperature-sensitive resistor film 13! You can decide accordingly. On the other hand, since the thin film thermistor of the present invention uses the temperature sensitive substrate 11, its characteristics are affected not only by the temperature sensitive resistor film 13 but also by the temperature sensitive substrate 11. As a result, a four-thin film thermistor with excellent output voltage characteristics and detection sensitivity characteristics can be obtained, as will be described later. The temperature-sensitive substrate 11 is made of Fe, Ni
, CO, Mn, etc. or Ni, Zn, F
The material is preferably selected from the group of oxide semiconductors such as elemental metal oxides such as e and COI, and elemental semiconductors such as Si and Ge.

これらのなかでも、特に、Fe,Ni,CO,Mnの複
合酸化物は、その組成と電気的性質が比較的詳細にわた
り公知であり、またその製造法も確立し、さらに量産性
も優れ、安価であるので、感温性基板11として最適で
ある。電極膜12は、Au−Pt,Ag−Pd,Au−
Pd,Au,Agなどの厚膜電極膜、G−Au,Cr−
Ag,Cr−Cuなどの薄膜電極膜など通常の導電性膜
で)よい。
Among these, composite oxides of Fe, Ni, CO, and Mn are known in particular for their compositions and electrical properties in relatively detailed information, and their production methods have been established, as well as being highly mass-producible and inexpensive. Therefore, it is optimal as the temperature-sensitive substrate 11. The electrode film 12 is made of Au-Pt, Ag-Pd, Au-
Thick film electrode films such as Pd, Au, Ag, G-Au, Cr-
An ordinary conductive film such as a thin film electrode film such as Ag or Cr-Cu may be used.

感温抵抗体膜13は、原理的には感温性基板11と同様
、酸化物半導体、元素半導体、化合物半導体でよい。
In principle, the temperature-sensitive resistor film 13 may be made of an oxide semiconductor, an element semiconductor, or a compound semiconductor, similar to the temperature-sensitive substrate 11.

しかし膜状に形成する際、その形成方法の難易、組成制
御の難などを考慮すると・Ge,Si,SiCl金属酸
化物の群から選ばれたものが優れている。こられのなか
でもSiCは、化学的にも、熱的にも安定であり、さら
にその電気的性質の制御も比較的容易であるので、感温
抵抗体膜13として最適である。以下に実施例で本発明
の薄膜サーミスタの効果を説明する。
However, when forming a film, considering the difficulty of the formation method and the difficulty of controlling the composition, ・Those selected from the group of metal oxides of Ge, Si, and SiCl are excellent. Among these, SiC is most suitable for the temperature-sensitive resistor film 13 because it is chemically and thermally stable and its electrical properties can be controlled relatively easily. The effects of the thin film thermistor of the present invention will be explained below using Examples.

実施例 1 感温性基板11に比抵抗約103Ω−D.,B定数約1
20Cf1<のFe,Ni,CO複合酸化物を用い、そ
の表面にCr−Au薄膜電極膜12を形成した。
Example 1 The temperature-sensitive substrate 11 has a specific resistance of about 103Ω-D. , B constant approximately 1
A Cr--Au thin film electrode film 12 was formed on the surface of a Fe, Ni, CO composite oxide having a density of 20Cf1<.

さらにその上に真空蒸着法により、eの感温抵抗体膜1
3を形成した。G感温抵抗体膜13は、比抵抗約80Ω
一α、B定数約4600Kであつた。このようにして形
成した本発明の薄膜サーミスタの出力電圧特性、検出感
度特性を第2〜3図、曲線14,15に示す。これらの
図から明らかなように、出力電圧Egは、温度Tに対し
て、0〜240こCの広い範囲にわたり、直線的に変化
した。また検出感度DEg/DTも温度Tに対して、同
温度範囲で、1.9±0.14mV/℃で、ほぼ一定で
あつた。この検出感度約1.9TT]V/℃は、比較的
小さな値であるが、実用上この程度であれば電気的に容
易に検出できる範囲内である。実施例 2 感温性基板11に比抵抗約2×103Ω−D..B定数
約5000′KのFe,Ni,CO複合酸化物を用い、
その表面にAu−Pt厚膜電極膜12を形成した。
Furthermore, the temperature-sensitive resistor film 1 of e is coated on top of the film by vacuum evaporation.
3 was formed. The G temperature sensitive resistor film 13 has a specific resistance of approximately 80Ω.
- α, B constant was about 4600K. The output voltage characteristics and detection sensitivity characteristics of the thin film thermistor of the present invention thus formed are shown in curves 14 and 15 in FIGS. 2 and 3. As is clear from these figures, the output voltage Eg varied linearly with respect to the temperature T over a wide range of 0 to 240 degrees Celsius. Furthermore, the detection sensitivity DEg/DT was also approximately constant with respect to the temperature T at 1.9±0.14 mV/°C in the same temperature range. This detection sensitivity of about 1.9 TT]V/° C. is a relatively small value, but in practical terms this level is within a range that can be easily detected electrically. Example 2 The temperature-sensitive substrate 11 has a specific resistance of about 2×10 3 Ω-D. .. Using Fe, Ni, CO composite oxide with a B constant of about 5000'K,
An Au--Pt thick film electrode film 12 was formed on the surface thereof.

さらにその上にスパツタリング法により、SiC感温抵
抗体膜13を形成たした。SiC感温抵抗体膜13は比
抵抗約10Ω−αであつた。またB定数は必ずしも一定
でなく測定温度によつて変わり、測定温度範囲が50〜
140℃の楊合約900K1140〜230℃の場合約
1300′Kであつた。このようにして形成した本発明
の薄膜サーミスタの出力電圧特性、検出感度特性を第2
〜3図、曲線16,17に示す。こられの図から明らか
なように、出力電圧Egは温度Tに対して、0〜240
℃の広い範囲にわたり、直線的に変化した。また検出感
度DEg/DTも温度Tに対して、同温度範囲で1.9
±0.17mV/℃で、ほぼ一定であつた。この検出感
度約1.9rT1V/℃は比較的小さな値であるが、実
用上この程度であれば電気的に容易に検出できる範囲内
である。また本実施例に用いたSiC感温抵抗体膜13
は優れた耐熱性を有する。したがつて耐熱性を要求され
るような使用、たとえばオーブンなどの調理器では零囲
気温度が約350℃になる場合もある、に対しては特に
適する。なお以上の実施例でか感温性基板11としてF
e,Ni,CO複合酸化物を用いた例を示したが、他の
酸化物半導体、たとえばFe,Mg,Cr酸化物、Li
,Ni複合酸化物、Li,CO複合酸化物、Ni,Li
複合酸化物でも同様の効果を得られることは当然である
Furthermore, a SiC temperature-sensitive resistor film 13 was formed thereon by sputtering. The SiC temperature sensitive resistor film 13 had a specific resistance of about 10 Ω-α. In addition, the B constant is not necessarily constant and changes depending on the measurement temperature, and the measurement temperature range is 50~
The temperature at 140°C was about 900K, and the temperature at 1140-230°C was about 1300'K. The output voltage characteristics and detection sensitivity characteristics of the thin film thermistor of the present invention formed in this manner were
Figure 3 shows curves 16 and 17. As is clear from these figures, the output voltage Eg varies from 0 to 240 with respect to the temperature T.
It varied linearly over a wide range of °C. Also, the detection sensitivity DEg/DT is 1.9 in the same temperature range with respect to temperature T.
It was approximately constant at ±0.17 mV/°C. This detection sensitivity of about 1.9rT1V/°C is a relatively small value, but in practical terms this level is within the range that can be easily detected electrically. In addition, the SiC temperature-sensitive resistor film 13 used in this example
has excellent heat resistance. Therefore, it is particularly suitable for uses that require heat resistance, for example, in cookers such as ovens, where the ambient temperature may be about 350°C. In addition, in the above embodiment, F is used as the temperature-sensitive substrate 11.
Although an example using e, Ni, CO composite oxide has been shown, other oxide semiconductors such as Fe, Mg, Cr oxide, Li
, Ni composite oxide, Li, CO composite oxide, Ni, Li
It is natural that similar effects can be obtained with composite oxides.

またGe,Siなどの元素半導体でも同様の効果を得ら
れる。
Similar effects can also be obtained with elemental semiconductors such as Ge and Si.

以上に示したように本発明の薄膜サーミスタは前述した
欠点を解消できることは明らかである。
As shown above, it is clear that the thin film thermistor of the present invention can eliminate the above-mentioned drawbacks.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はサーミスタを用いて温度を検出する電気回路の
一例を示す回路図、第2図は温度Tと出力電圧Egの関
係を示す特性図、第3図は温度Tと検出感度DEg/D
Tとの関係を示す特性図、第4図は本発明の薄膜サーミ
スタの断面図である。 11・・・・・・感温性基板、12・・・・・・電極膜
、13・・・・・感温抵抗体膜。
Figure 1 is a circuit diagram showing an example of an electric circuit that detects temperature using a thermistor, Figure 2 is a characteristic diagram showing the relationship between temperature T and output voltage Eg, and Figure 3 is temperature T and detection sensitivity DEg/D.
A characteristic diagram showing the relationship with T, and FIG. 4 is a sectional view of the thin film thermistor of the present invention. 11... Temperature-sensitive substrate, 12... Electrode film, 13... Temperature-sensitive resistor film.

Claims (1)

【特許請求の範囲】 1 少なくとも、感温性基板上に電極膜と感温抵抗体膜
とを形成し、感温性基板と感温抵抗体膜との抵抗温度特
性が互いに異なることを特徴とする薄膜サーミスタ。 2 少なくとも、感温性基板が酸化物半導体、元素半導
体の群かれ選ばれたことを特徴とする特許請求の範囲第
1項記載薄膜サーミスタ。 3 少なくとも、感温性基板がFe、Ni、Co、Mn
の複合酸化物半導体であることを特徴とする特許請求の
範囲第2項記載薄膜サーミスタ。 4 少なくとも、感温抵抗体膜がSiC抵抗体膜である
ことを特徴とする特許請求の範囲第1項記載薄膜サーミ
スタ。
[Claims] 1. At least an electrode film and a temperature-sensitive resistor film are formed on a temperature-sensitive substrate, and the resistance-temperature characteristics of the temperature-sensitive substrate and the temperature-sensitive resistor film are different from each other. thin film thermistor. 2. The thin film thermistor according to claim 1, wherein at least the temperature-sensitive substrate is selected from the group of oxide semiconductors and elemental semiconductors. 3 At least, the temperature-sensitive substrate is Fe, Ni, Co, Mn
3. The thin film thermistor according to claim 2, wherein the thin film thermistor is a composite oxide semiconductor. 4. The thin film thermistor according to claim 1, wherein at least the temperature sensitive resistor film is a SiC resistor film.
JP8693480A 1980-06-25 1980-06-25 thin film thermistor Expired JPS6044801B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8693480A JPS6044801B2 (en) 1980-06-25 1980-06-25 thin film thermistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8693480A JPS6044801B2 (en) 1980-06-25 1980-06-25 thin film thermistor

Publications (2)

Publication Number Publication Date
JPS5712502A JPS5712502A (en) 1982-01-22
JPS6044801B2 true JPS6044801B2 (en) 1985-10-05

Family

ID=13900690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8693480A Expired JPS6044801B2 (en) 1980-06-25 1980-06-25 thin film thermistor

Country Status (1)

Country Link
JP (1) JPS6044801B2 (en)

Also Published As

Publication number Publication date
JPS5712502A (en) 1982-01-22

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