JPS6045133B2 - Method for manufacturing base material for optical glass fiber - Google Patents
Method for manufacturing base material for optical glass fiberInfo
- Publication number
- JPS6045133B2 JPS6045133B2 JP4332578A JP4332578A JPS6045133B2 JP S6045133 B2 JPS6045133 B2 JP S6045133B2 JP 4332578 A JP4332578 A JP 4332578A JP 4332578 A JP4332578 A JP 4332578A JP S6045133 B2 JPS6045133 B2 JP S6045133B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- center rod
- base material
- layer
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
本発明は光ガラスファイバ用母材の製造方法において
、不純物の混入のない高純度な母材を製造する方法に関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a preform for optical glass fibers, which is highly pure and free of impurities.
一 光ガラスファイバ用母材の製造方法には、石英ガラ
ス内壁面上に屈折率の異なるガラス層を形成 した後、
中心空間を中実化する特開昭50−120352号に記
載されている方法(内付け法)と、円柱状種棒外側面上
ガラス微粒子層を火災加水分解によフリ形成する特開昭
49−100551号に記載の方法(外付け法)が知ら
れている。1. The method for manufacturing a base material for optical glass fiber includes forming glass layers with different refractive indexes on the inner wall surface of quartz glass, and then
The method described in JP-A No. 50-120352 (internal attachment method) for solidifying the central space, and the method described in JP-A-49 for forming a layer of glass fine particles on the outer surface of a cylindrical seed rod by fire hydrolysis. The method described in No. 100551 (external attachment method) is known.
前者の方法はガラス管内壁面上に光の伝ぱんするガラス
層を形成し、ガラス管と、形成したガラス層を一体とし
て光ガラスファイバ母材とするので、ガラス管自体の純
度、形状、品質が直接光ガラスファイバ母材の特性に影
響する。In the former method, a glass layer through which light propagates is formed on the inner wall surface of the glass tube, and the glass tube and the formed glass layer are integrated into an optical glass fiber base material, so the purity, shape, and quality of the glass tube itself are improved. Directly affects the properties of optical glass fiber base material.
しかもガラス管外側面より酸水素炎等の加熱源で、該ガ
ラス管を加熱し、ガラス管の熱伝導によりガラス管内部
を加熱するので、ガラス管の肉厚の変動、楕円等の不均
一性が存在する場合、管内の温度分布が不均一となり、
このため形成されるガラス膜の厚みに変動を生じ、得ら
れる母材の真円度や場所による特性の不均一性の原因と
なる。しかもガラス管を通じての加熱であるから、管径
を一定以上大きくすると、管内の温度は中心軸に近いと
ころで低温となり、原料の反応効率は悪化するなど、石
英管の太さに制約がある。このため1本の母材の大きさ
も制限があり、長尺なファイバ用母材を作製することは
困難である。後者の方法は、ガラスの原料のハロゲン化
物、たとえば四塩化シリコンや四塩化ゲルマニウムなど
を酸水素炎により生じる水分で加水分解反応させるので
、得られる母材には必然的に不純物の一つである0H基
が含まれることになる。Moreover, since the glass tube is heated from the outside surface of the glass tube with a heating source such as an oxyhydrogen flame, and the inside of the glass tube is heated by heat conduction, fluctuations in the wall thickness of the glass tube and non-uniformity such as ellipse can occur. If there is, the temperature distribution inside the tube will be uneven,
This causes variations in the thickness of the glass film that is formed, causing non-uniformity in the roundness of the resulting base material and in its properties depending on location. Moreover, since heating is performed through a glass tube, if the tube diameter is increased beyond a certain level, the temperature inside the tube will become lower near the central axis, which will deteriorate the reaction efficiency of the raw materials, so there are restrictions on the thickness of the quartz tube. For this reason, the size of a single base material is also limited, and it is difficult to produce a long fiber base material. In the latter method, halides, which are raw materials for glass, such as silicon tetrachloride and germanium tetrachloride, are hydrolyzed with moisture generated by an oxyhydrogen flame, so the resulting base material inevitably contains one of the impurities. The 0H group will be included.
ガラスに含まれる0H基は波長2.73μmに基本吸収
帯をもち、1.37μm、0.95μm等の波長に高調
波の吸収帯をもつ。しかもガラスの構成体SiO2と結
合した吸収帯が、波長1.24μMlO.88μmに生
じ、これらの吸収帯は比較的広い裾を引いているので、
光ファイバの損失特性を悪化させる原因になる。.特に
1.37μmにおける0H基の吸収ピークは1ppmの
0H基の存在により60dB/Kmにも達し、長い波長
帯での低損失化には大きな障害となる不純物である。本
発明は前述の従来方法の欠点を解決するた!め、外部か
らの不純物の混入を除き、かつ石英管の品質が光ファイ
バの特性に及ぼさないようにしたもので、ガラスの堆積
を閉管内で行い、かつ光ファイバとなる材料は、すべて
合成したガラスとすることを特徴とし、その目的は不純
物の混入の1ない高品質の光ファイバ用母材を得ること
にある。The OH group contained in glass has a fundamental absorption band at a wavelength of 2.73 μm and harmonic absorption bands at wavelengths such as 1.37 μm and 0.95 μm. Moreover, the absorption band combined with the glass constituent SiO2 has a wavelength of 1.24 μMlO. They occur at 88 μm, and these absorption bands have relatively wide tails, so
This causes deterioration of the loss characteristics of the optical fiber. .. In particular, the absorption peak of OH groups at 1.37 μm reaches as high as 60 dB/Km due to the presence of 1 ppm of OH groups, which is an impurity that poses a major obstacle to reducing loss in long wavelength bands. The present invention solves the drawbacks of the above-mentioned conventional methods! In order to prevent the contamination of impurities from the outside, the quality of the quartz tube does not affect the characteristics of the optical fiber.The glass is deposited in a closed tube, and all the materials used to make the optical fiber are synthetic. It is characterized by being made of glass, and its purpose is to obtain a high quality optical fiber base material that is free from any impurities.
以下図面により本発明を詳細に説明する。実施例1第1
図は本発明の一実施例の概要図で、10は酸素ガスの供
給口、11は供給口10から導入された酸素ガスの流量
を制御する流量制御器、12は主成分であるSiCl4
蒸気を運ぶキャリヤガスの流量を制御する流量制御器、
13は屈折率を制御するための原料GeCl4蒸気を運
ふキャリヤガスの流量を制御する流量制御器、14は屈
折率を制御するとともにガラス溶融温度を下げるための
原料PCl3またはBBr3蒸気を運ぶキャリヤガスの
流量を制御する流量制御器、21は主成分原料SlCl
4フを蓄えた容器、22は屈折率を制御するための原料
GeCl4を蓄えた容器、23は屈折率を制御し、かつ
ガラス溶融温度を下げるための原料PCl3またはBB
r3を蓄えた容器、24はそれぞれの原料蒸気を含むキ
ャリヤガスと酸素ガスとが合流して;原料蒸気と酸素ガ
スとの混合比が所望の値となつた混合ガスを反応容器内
に導く導入口、25は未反応ガスおよび余剰ガスを排出
する排気口、31は反応部を密閉するための反応容器、
32は高周波誘導加熱する出発カーボン棒、33および
34・は出発カーボン棒を固定し、回転するための固定
治具、35は出発カーボン棒表面上に堆積したガラス焼
結体、36は出発カーボン棒に高周波を誘導するための
高周波誘導コイルである。The present invention will be explained in detail below with reference to the drawings. Example 1 1st
The figure is a schematic diagram of an embodiment of the present invention, in which 10 is an oxygen gas supply port, 11 is a flow rate controller that controls the flow rate of oxygen gas introduced from the supply port 10, and 12 is a main component of SiCl4.
a flow controller that controls the flow rate of the carrier gas carrying the vapor;
13 is a flow rate controller that controls the flow rate of a carrier gas that carries raw material GeCl4 vapor for controlling the refractive index, and 14 is a carrier gas that carries raw material PCl3 or BBr3 vapor for controlling the refractive index and lowering the glass melting temperature. 21 is a flow rate controller for controlling the flow rate of the main component raw material SlCl.
22 is a container storing raw material GeCl4 for controlling the refractive index, 23 is a raw material PCl3 or BB for controlling the refractive index and lowering the glass melting temperature.
A container 24 in which R3 is stored is a container in which the carrier gas containing each raw material vapor and oxygen gas are combined; the mixed gas with a desired mixing ratio of raw material vapor and oxygen gas is introduced into the reaction container. 25 is an exhaust port for discharging unreacted gas and surplus gas, 31 is a reaction container for sealing the reaction part,
32 is a starting carbon rod to be heated by high frequency induction; 33 and 34 are fixing jigs for fixing and rotating the starting carbon rod; 35 is a glass sintered body deposited on the surface of the starting carbon rod; 36 is a starting carbon rod. This is a high-frequency induction coil for inducing high-frequency waves.
これを動作させるには、出発カーボン棒32を反応容器
31内に回転する固定治具33,34により固定し、高
周波誘導コイル36に周波数?Hzの高周波電力を流す
。To operate this, the starting carbon rod 32 is fixed in the reaction vessel 31 with rotating fixing jigs 33 and 34, and a high frequency induction coil 36 is connected to the frequency. Flows high frequency power of Hz.
これにより出発カーボン棒32は電磁誘導により高周波
電力が誘導され、反応容器31は加熱される。加熱温度
はコイルに流す電力により変えることができ、1400
゜C程度の温度とするには、約10KWのパワーが必要
であつた。このとき高周波誘導コイル36と出発カーボ
ン棒32を相対的に移動せしめると、加熱されたカーボ
ン棒の領域は、高周波誘導コイル36の移動に伴つて移
動する。移動速度は5〜25c!n/Minで行つた。
導入口24から原料蒸気SiCl4:100cc/Mi
n,C;ECl4:50cc/Min9PCl,:5c
c/Minと酸素ガスを合計1.5e/Min流入せし
め、同時に前記高周波誘導コイル36により、出発カー
ボン棒32に高周波電力を誘導して1200〜1600
℃に加熱すれば、導入された原料ガスと酸素ガスは、化
学反応により該カーボン棒上にガラス焼結体として形成
される。高周波誘導コイル36の往復運動を多数回実行
することにより、形成されるガラス焼結体は順次層状に
成長する。高周波誘導コイルの往復運動を100回繰り
返し、得られたガラス焼結体は外径40Tf0nφ、長
さ40『となつた。次に第2図に示すように原料の供給
を止め、高周波誘導コイル36への供給電力を20KW
に高めると、カーボン棒32は18000Cに加熱され
、加熱されたカーボン棒上に形成されたガラス焼結体3
5は透明なガラス体37になる。高周波誘導コイルを2
〜10Tf1m/Minの速度で移動すると、順次ガラ
ス焼結体は透明なガラス体になる。実施例2
実施例1で述べた方法により、得られるガラス焼結体3
5からカーボン棒32を引き抜き、他の支持棒41(こ
れは石英ガラス棒、カーボン棒等、1800゜C程度に
耐え得る材質であれば、特に制限条件はない)に、前記
カーボン棒を引き取つたガラス焼結体35をピン42で
取り付け、円筒状ヒータ43を有する加熱炉44により
加熱し、透明ガラス体45とする。As a result, high frequency power is induced in the starting carbon rod 32 by electromagnetic induction, and the reaction vessel 31 is heated. The heating temperature can be changed by changing the electric power flowing through the coil.
A power of about 10 KW was required to reach a temperature of about 0.05°C. At this time, when the high-frequency induction coil 36 and the starting carbon rod 32 are moved relative to each other, the area of the heated carbon rod moves as the high-frequency induction coil 36 moves. Movement speed is 5~25c! I went with n/Min.
Raw material vapor SiCl4: 100cc/Mi from the inlet 24
n, C; ECl4:50cc/Min9PCl,:5c
c/Min and oxygen gas at a total of 1.5 e/Min, and at the same time, the high frequency induction coil 36 induces high frequency power to the starting carbon rod 32 to generate a power of 1200 to 1600.
When heated to .degree. C., the introduced raw material gas and oxygen gas form a glass sintered body on the carbon rod through a chemical reaction. By performing the reciprocating motion of the high-frequency induction coil 36 many times, the formed glass sintered body grows in layers one after another. The reciprocating motion of the high-frequency induction coil was repeated 100 times, and the obtained glass sintered body had an outer diameter of 40Tf0nφ and a length of 40''. Next, as shown in Figure 2, the supply of raw materials is stopped and the power supplied to the high frequency induction coil 36 is reduced to 20KW.
The carbon rod 32 is heated to 18000C, and the glass sintered body 3 formed on the heated carbon rod
5 becomes a transparent glass body 37. 2 high frequency induction coils
When moving at a speed of ~10Tf1m/Min, the glass sintered body gradually becomes a transparent glass body. Example 2 Glass sintered body 3 obtained by the method described in Example 1
The carbon rod 32 was pulled out from the support rod 41 (there are no particular restrictions on this as long as it is made of a material such as a quartz glass rod or a carbon rod that can withstand temperatures of about 1800°C). The glass sintered body 35 is attached with pins 42 and heated in a heating furnace 44 having a cylindrical heater 43 to form a transparent glass body 45.
ガラス体を順次下方に2〜10順/Minの速度で移動
すれば、ガラス焼結体全体が透明ガラス体となる。実施
例3
実施例1で述べた方法において、カーボン棒表面に近い
層から順次、ガラス焼結体の屈折率が小さくなるように
、原料蒸気の混合比を変えて、ガラス焼結体層を作製し
てゆけば、ガラス焼結体の中心より外周に向つて次第に
屈折率が小さくなる分布をしたガラス焼結体が得られる
。If the glass body is sequentially moved downward at a speed of 2 to 10 orders/min, the entire glass sintered body becomes a transparent glass body. Example 3 In the method described in Example 1, glass sintered body layers were produced by changing the mixing ratio of raw material vapor so that the refractive index of the glass sintered body decreased sequentially from the layer closer to the surface of the carbon rod. By doing so, a glass sintered body with a distribution in which the refractive index gradually decreases from the center toward the outer periphery can be obtained.
得られたガラス焼結体を実施例1または実施例2に示す
方法で透明ガラス体とする。実施例4
ガラス原料PCl3を蓄えた容器23の代わりにSiO
2の屈折率を下げる原料BBr3を蓄えた容器と取り換
えて実施例1〜3による方法に基づいても、透明ガラス
体が得られる。The obtained glass sintered body is made into a transparent glass body by the method shown in Example 1 or Example 2. Example 4 SiO instead of the container 23 storing glass raw material PCl3
A transparent glass body can also be obtained based on the method according to Examples 1 to 3 by replacing the container storing the raw material BBr3 that lowers the refractive index of 2.
以上説明したように、本発明のガラスファイバ用母材の
製造方法は、ガラス焼結体を作る工程が、水分や他の遷
移金属不純物が混入されることなく、密閉容器内で反応
するので、純度の高い透明なガラス体を得ることができ
、また得られた透明ガラス体はすべて化学反応により合
成され、出発材の石英管を使用しないので、石英管の形
状、品質に依存しないなどの利点がある。As explained above, in the method for manufacturing a glass fiber base material of the present invention, the process of producing a glass sintered body is performed in a closed container without moisture or other transition metal impurities being mixed. A transparent glass body of high purity can be obtained, and since all the obtained transparent glass bodies are synthesized by chemical reactions and no quartz tube is used as a starting material, there are advantages such as being independent of the shape and quality of the quartz tube. There is.
第1図は本発明の一実施例の概要図、第2図は本発明の
方法で得られたガラス焼結体を透明ガラス体とする工程
を示す図、第3図は本発明の方法で得られるガラス焼結
体を透明ガラス体とする他の工程を示す図である。
10・・・・・・酸素ガスの供給口、11,12,13
,14・・・・・・流量制御器、21・・・・・・Si
Cl4を蓄えた原料容器、22・・・・・GeCl4を
蓄えた原料容器、24・・・・・・混合ガスを反応容器
に導く導入口、25・・・・・排気口、31・・・・・
・反応容器、32・・・・・・出発力−ボン棒、33,
34・・・・・・固定治具、35・・・・・・ガラス焼
結体、36・・・・・・誘導コイル、37・・・・・・
透明なガラス体、41・・・・・・支持棒、42・・・
・・ゼン、43・・・・・・ヒータ、44・・・・・・
加熱炉、45・・・・・・透明ガラス体。Figure 1 is a schematic diagram of an embodiment of the present invention, Figure 2 is a diagram showing the process of making a transparent glass body from a glass sintered body obtained by the method of the present invention, and Figure 3 is a diagram showing the process of making a transparent glass body by the method of the present invention. It is a figure which shows the other process of making the obtained glass sintered compact into a transparent glass body. 10...Oxygen gas supply port, 11, 12, 13
, 14...Flow rate controller, 21...Si
Raw material container storing Cl4, 22... Raw material container storing GeCl4, 24... Inlet for introducing mixed gas into the reaction container, 25... Exhaust port, 31...・・・
・Reaction container, 32...Starting force - Bon rod, 33,
34... Fixing jig, 35... Glass sintered body, 36... Induction coil, 37...
Transparent glass body, 41...Support rod, 42...
... Zen, 43... Heater, 44...
Heating furnace, 45...transparent glass body.
Claims (1)
光ファイバ用母材を製造する方法において、ガラス管中
心軸に沿い、グラファイトまたは白金等の電気的導電性
を有する円柱状の中心捧を設け、この中心棒の周囲を覆
うガラス管内に、熱酸化によりガラス微粒子または透明
ガラスとなる原料ガス体を酸素ガスとともに流入せしめ
、該ガラス管外部に取り付けた高周波コイルにより高周
波電力を誘導して加熱し、該中心棒と高周波誘導コイル
の位置を相対的に左右または上下に繰り返し移動させな
がら、加熱された中心棒の外周上にガラス微粒子堆積層
または透明ガラス層を形成することを特徴とする光ガラ
スファイバ用母材の製造方法。 2 特許請求の範囲第1項記載の光ガラスファイバ用母
材の製造方法において、該ガラス管内に流入せしめる原
料ガス体の成分を、該高周波コイルと該中心棒の左右ま
たは上下の相対的な移動に合わせて次第に変化させるこ
とにより、中心棒直外面上から堆積層外周面に向い、堆
積ガラス微粒子または透明ガラス層の屈折率を変化させ
ることを特徴とする光ファイバ用母材の製造方法。 3 特許請求の範囲第1項または第2項記載の光ガラス
ファイバ用母材の製造方法により得られるガラス母材よ
り、該中心棒を取り除き、ついで中心棒を取り除いて形
成される空間を、外部より適当な加熱源により加熱し、
次第に小さくし、完全充実体とすることを特徴とする光
ガラスファイバ用母材の製造方法。[Claims] 1. In a method for manufacturing an optical fiber base material consisting of a core and a coating layer having different refractive indexes, an electrically conductive material such as graphite or platinum is added along the central axis of a glass tube. A raw material gas that becomes glass fine particles or transparent glass through thermal oxidation is introduced into a glass tube that surrounds the center rod, and a raw material gas that becomes glass particles or transparent glass through thermal oxidation is introduced together with oxygen gas. By inducing high-frequency power to heat the center rod and repeatedly moving the positions of the center rod and the high-frequency induction coil from side to side or up and down, a glass fine particle deposit layer or a transparent glass layer is formed on the outer periphery of the heated center rod. A method for producing a base material for optical glass fiber, characterized in that: 2. In the method for manufacturing a preform for optical glass fiber according to claim 1, components of the raw material gas to be flowed into the glass tube are controlled by relative movement of the high-frequency coil and the center rod in the right and left or up and down directions. A method for manufacturing an optical fiber preform, characterized in that the refractive index of the deposited glass fine particles or the transparent glass layer is changed from directly on the outer surface of the center rod toward the outer peripheral surface of the deposited layer by gradually changing the refractive index according to the refractive index of the deposited glass particles or the transparent glass layer. 3. Remove the center rod from a glass preform obtained by the method for manufacturing an optical glass fiber preform according to claim 1 or 2, and then remove the space formed by removing the center rod from the outside. Heating with a more suitable heating source,
A method for producing a base material for optical glass fiber, which is characterized by gradually reducing the size and forming a completely solid body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4332578A JPS6045133B2 (en) | 1978-04-14 | 1978-04-14 | Method for manufacturing base material for optical glass fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4332578A JPS6045133B2 (en) | 1978-04-14 | 1978-04-14 | Method for manufacturing base material for optical glass fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54135811A JPS54135811A (en) | 1979-10-22 |
| JPS6045133B2 true JPS6045133B2 (en) | 1985-10-08 |
Family
ID=12660658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4332578A Expired JPS6045133B2 (en) | 1978-04-14 | 1978-04-14 | Method for manufacturing base material for optical glass fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6045133B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61111356U (en) * | 1984-12-27 | 1986-07-14 | ||
| JPH01150050U (en) * | 1988-03-31 | 1989-10-17 |
-
1978
- 1978-04-14 JP JP4332578A patent/JPS6045133B2/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61111356U (en) * | 1984-12-27 | 1986-07-14 | ||
| JPH01150050U (en) * | 1988-03-31 | 1989-10-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54135811A (en) | 1979-10-22 |
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