JPS6047203B2 - Method for manufacturing α-type silicon nitride - Google Patents
Method for manufacturing α-type silicon nitrideInfo
- Publication number
- JPS6047203B2 JPS6047203B2 JP8626077A JP8626077A JPS6047203B2 JP S6047203 B2 JPS6047203 B2 JP S6047203B2 JP 8626077 A JP8626077 A JP 8626077A JP 8626077 A JP8626077 A JP 8626077A JP S6047203 B2 JPS6047203 B2 JP S6047203B2
- Authority
- JP
- Japan
- Prior art keywords
- nitriding
- weight
- molded
- molded product
- silicon nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
- C01B21/0682—Preparation by direct nitridation of silicon
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Products (AREA)
Description
【発明の詳細な説明】
本発明は、金属珪素(Si)を直接窒化するα型窒化珪
素(S1。DETAILED DESCRIPTION OF THE INVENTION The present invention provides α-type silicon nitride (S1) which directly nitrides metal silicon (Si).
N0)の製造方法に関するものである。従来、51の直
接窒化する方法は公知である。This relates to a manufacturing method of No. Conventionally, the direct nitriding method of 51 is known.
例えば1200〜12500Cの温度で長時間加熱する
方法があるが、反応時間を短縮しようとすると1400
℃以上の高温とする必要があるが、生成したα−Si3
N。がβ−Si、N、に変移する欠点がある。また特開
昭50−128698号にはSi粉末に窒化反応促進剤
としてに)Na)およびLiの化合物を添加する方法が
あるが、これら窒化反応促進剤と51粉末とは部分的に
反応をするので、1時間以上長時間混合しなければこれ
らの窒化反応促進剤が均一混合できない欠点がある。本
発明は、まず粒子100メッシュ以下のSi粉末または
この51粉末に窒化反応促進剤としてアルカリ金属およ
びアルカリ土類金属のハロゲン化物の中から選ばれた1
種以上を0.01〜3重量%含有させた組成物粉末を成
形し、該成形物を窒化炉内に装填し窒素またはアンモニ
アのガス雰囲気下、1100〜1250℃の温度で加熱
窒化し、該成形物中のSi。For example, there is a method of heating at a temperature of 1200 to 12500C for a long time, but if you try to shorten the reaction time,
Although it is necessary to raise the temperature to a high temperature of ℃ or higher, the generated α-Si3
N. has the disadvantage that it changes to β-Si,N. Furthermore, JP-A-50-128698 discloses a method of adding compounds of Na) and Li as nitriding reaction promoters to Si powder, but these nitriding reaction promoters and 51 powder partially react with each other. Therefore, there is a drawback that these nitriding reaction promoters cannot be uniformly mixed unless they are mixed for a long time of one hour or more. In the present invention, first, a Si powder having a particle size of 100 mesh or less or a nitriding reaction promoter is added to a Si powder having a particle size of 100 mesh or less.
A composition powder containing 0.01 to 3% by weight of acetic acid or more is molded, and the molded product is loaded into a nitriding furnace and heated and nitrided at a temperature of 1100 to 1250 ° C. in a nitrogen or ammonia gas atmosphere. Si in the molded product.
N。の含有量を少くとも55重量%とした後、該成形物
を100メッシュ以下に粉砕し、これに前記反応促進剤
を0.01〜3重量%添加混合し、次いでこれを成形し
、該成形物を窒化炉内に装填し、窒素またはアンモニア
のガス雰囲気下、1250〜14000Cの温度て再窒
化することを特徴とするα−Sj3N。の製造方法であ
る。以下さらに本発明を詳しく説明する。N. The content of α-Sj3N characterized in that the material is loaded into a nitriding furnace and re-nitrided at a temperature of 1250 to 14000C in a nitrogen or ammonia gas atmosphere. This is a manufacturing method. The present invention will be further explained in detail below.
本発明は原料として51粉末を窒化反応促進剤の1存在
下又は非存在下成形し、窒化した後、これを粉砕成形し
、再窒化することを特徴とするものてある。The present invention is characterized in that 51 powder as a raw material is molded in the presence or absence of a nitriding reaction promoter, nitrided, then pulverized and molded, and re-nitrided.
一般的に51粉末は熱伝導性が悪く、その窒化は発熱反
応であり、しかもその融点が約1400゜C付近である
ので、窒化反応時の放熱が十分でない・と焼結したり、
溶融したりするので、十分な窒化反応を行うことができ
ない。本発明は、SI粉末を窒化させ、α−Si3N4
を主成分とするSi3N4を製造するにあたり、Si粉
末を成形し主としてα−Si3N4を形成す斧温度で一
次窒化し、次いで窒化反応熱の制御と窒化率を向上させ
るため、一次窒化成形物を粉砕し成形した後、二次窒化
させα−Si3N4の含有量の高いSi3N4を生成さ
せようとするものである。In general, 51 powder has poor thermal conductivity, and its nitriding is an exothermic reaction, and its melting point is around 1400°C, so heat dissipation during the nitriding reaction is not sufficient, and it may sinter.
Since the metal may melt, a sufficient nitriding reaction cannot be carried out. In the present invention, SI powder is nitrided and α-Si3N4
In producing Si3N4, whose main component is After molding, secondary nitriding is performed to generate Si3N4 with a high content of α-Si3N4.
本発明において使用するSiは、市販のSi純度95%
以上で、粒子の大きさは100メッシュ以下の粉末でな
ければならない。The Si used in the present invention is commercially available Si with a purity of 95%.
Above, the powder must have a particle size of 100 mesh or less.
Si粒子が、100メッシュをこえると窒化反応が遅れ
るので好ましくない。If the Si particles exceed 100 mesh, the nitriding reaction will be delayed, which is not preferable.
粒子が100メッシュ以下のSiにポリビニルアルコー
ル、カルボキシメチルセルローズ、メチルセルローズ、
糖密、バルブ廃液、アラビアゴム等の水溶性結合剤を添
加混合し、成形した後、これを窒化炉て窒化する。Si with particles of 100 mesh or less, polyvinyl alcohol, carboxymethyl cellulose, methyl cellulose,
Water-soluble binders such as molasses, valve waste liquid, and gum arabic are added and mixed, and after being molded, this is nitrided in a nitriding furnace.
この他に、Siに窒化反応促進剤としてアルカリ金属お
よびアルカリ土類金属のハロゲン化物の1種以上を0.
01〜3重量%添加すれば、さらにα一Si3N4の含
有量が向上する。In addition, one or more halides of alkali metals and alkaline earth metals may be added to Si as a nitridation reaction accelerator.
If 01 to 3% by weight is added, the content of α-Si3N4 will further increase.
アルカリ金属およびアルカリ土類金属のハロゲン化物は
いずれも使用できるが、本発明において特に弗化物であ
るNaFおよびCaF2が有効であり、その効果が著し
い。Although any of the halides of alkali metals and alkaline earth metals can be used, the fluorides NaF and CaF2 are particularly effective in the present invention, and their effects are remarkable.
窒化反応促進剤の添加量が0.01重量%未満では促進
効果が少なく、3重量%を超えるとその効果が緩慢にな
る。次に、これらの混合原料をドラムによる回転造粒あ
るいは10〜10000k91cItの圧力で圧縮成形
することによつてブロック状、粒状、プリケツト状の.
成形物が得られる。If the amount of the nitriding reaction promoter added is less than 0.01% by weight, the promoting effect will be small, and if it exceeds 3% by weight, the effect will be slow. Next, these mixed raw materials are rotary granulated using a drum or compression molded at a pressure of 10 to 10,000 k91 cIt to form blocks, granules, and prickets.
A molded article is obtained.
成形物は、窒化炉内に装填され1100〜1250℃の
温度て窒化する。The molded product is loaded into a nitriding furnace and nitrided at a temperature of 1100 to 1250°C.
窒化ガスとしては窒素、アンモニア等のガスを使用する
。窒化炉は、固定床式で、加熱方式としては炉中心部に
電極を挿入して!通電加熱による方法により窒化させる
が、これに限られるものではない。この一次窒化反応に
よつてSi3N4を55重量%以上(その中α−Si,
N44呼量%を含有)のものが得られる。As the nitriding gas, a gas such as nitrogen or ammonia is used. The nitriding furnace is a fixed bed type, and the heating method is to insert an electrode into the center of the furnace! Nitriding is carried out by a method using electrical heating, but the method is not limited thereto. Through this primary nitriding reaction, more than 55% by weight of Si3N4 (among which α-Si,
(containing N44 vol.%) is obtained.
本発明において一次窒化反応の終了点っをSi3N45
5重量%以上とした理由はこれ以上窒化反応を継続して
も窒化に時間を要するからである。次に、得られた窒化
物を粉砕機で100メッシュ以下に粉砕する。In the present invention, the end point of the primary nitriding reaction is Si3N45
The reason why the amount is set at 5% by weight or more is that even if the nitriding reaction is continued beyond this point, it takes time for nitriding. Next, the obtained nitride is ground to 100 mesh or less using a grinder.
粉砕機は、通常ボールミル型のものを使用する。この粉
砕物に対し窒化反応促進剤としてアルカリ金属およびア
ルカリ土類金属のハロゲン化物の中から選ばれた1種以
上を0.01〜0.鍾量%添加し、これに水溶性結合剤
を添加混練後、ブロック、プリケツト、粒状に成形する
。なお反応促進剤としては前記のNaFlCaF2が好
ましく用いられる。なお、一次窒化で窒化反応促進剤を
添加した場ク合、二次窒化においても一次窒化と同じ窒
化反応促進剤及び添加量を用いるが、その理由は一次窒
化で一部金属珪素粉末と反応したり、揮散したりして窒
化反応促進剤としての効果が減少するからである。A ball mill type crusher is usually used. To this pulverized material, one or more selected from alkali metal and alkaline earth metal halides are added as a nitriding reaction accelerator in a range of 0.01 to 0.0%. After adding a water-soluble binder and kneading, the mixture is formed into blocks, prickets, and granules. Note that the above-mentioned NaFlCaF2 is preferably used as the reaction accelerator. Note that when a nitriding reaction accelerator is added in the primary nitriding, the same nitriding reaction accelerator and additive amount are used in the secondary nitriding as in the primary nitriding. This is because the effect as a nitriding reaction accelerator decreases due to oxidation or volatilization.
さらにこの他に金属鉄等の鉄化合物をSi7に対し、0
.01〜5重量%添加するとα−Si3N4の生成率が
一層向上する。成形方法は前記と同じ方法による。この
成形物を固定床式の窒化炉に装填し、窒素ガスあるいは
アンモニアガスを吹込んで通電加熱ノして窒化する。Furthermore, in addition to this, iron compounds such as metallic iron are added to Si7.
.. Addition of 01 to 5% by weight further improves the production rate of α-Si3N4. The molding method is the same as described above. This molded product is loaded into a fixed bed type nitriding furnace, and nitrogen gas or ammonia gas is blown into the molded product and nitrided by heating with electricity.
二次窒化温度は一次窒化温度1100〜1250℃より
100〜150℃高い1250〜1400℃である。The secondary nitriding temperature is 1250-1400°C which is 100-150°C higher than the primary nitriding temperature 1100-1250°C.
このように限定した理由は一次窒化で成形物中にSl3
N4が存在するので、反応熱の制御が行われ反応が促進
されるからである。このようにして得られた窒化物は、
Si3N4が95重量%以上、α−Si3N4が8唾量
%以上である。The reason for this limitation is that Sl3 is contained in the molded product due to primary nitriding.
This is because the presence of N4 controls the reaction heat and promotes the reaction. The nitride thus obtained is
Si3N4 is 95% by weight or more, and α-Si3N4 is 8% or more by weight.
以上説明したように本発明の方法は、原料粉末を窒化反
応促進剤存在下又は非存在下成形し、温度1100〜1
250゜CてSl3N4を55重量%以上生成させ、粉
末窒化による異常な発熱を防止し、さらに得られたα−
Sl3N4量を向上させると同時に未窒化物をできるだ
け減少させるため再粉砕し、さらに窒化反応促進剤を添
加し成形して、未窒化の金属珪素を再窒化する方法てあ
る。得られた窒化物は所定の粒度に粉砕して耐火物用、
セラミックス用として使用することができる。又必要に
応じて窒化反応促進剤等は酸処理等の除去手段により除
去することができる。以下実施例、比較例をあけて本発
明を具体的に説明する。As explained above, in the method of the present invention, raw material powder is molded in the presence or absence of a nitriding reaction promoter, and a temperature of 1100 to 1
At 250°C, 55% by weight or more of Sl3N4 is generated, preventing abnormal heat generation due to powder nitriding, and further improving the α-
In order to increase the amount of Sl3N4 and at the same time reduce unnitrides as much as possible, there is a method of re-pulverizing, adding a nitriding reaction accelerator and molding, and re-nitriding unnitrided metallic silicon. The obtained nitride is crushed to a specified particle size and used for refractories.
Can be used for ceramics. Further, if necessary, the nitriding reaction accelerator and the like can be removed by removal means such as acid treatment. The present invention will be specifically described below with reference to Examples and Comparative Examples.
なお実施例、比較例の第1表〜第5表の記載は次のよう
にして行つたものである。The descriptions in Tables 1 to 5 of Examples and Comparative Examples were made as follows.
(1)反応促進剤の配合割合は、内割の重量比(%)で
示す。(1) The blending ratio of the reaction accelerator is expressed as an internal weight ratio (%).
(2)窒化珪素及びα窒化珪素の量は理学電機(株)製
商品名「ジーグラーフレツクス2013」のX線回折装
置を用いて求めた。(2) The amounts of silicon nitride and α-silicon nitride were determined using an X-ray diffraction apparatus manufactured by Rigaku Corporation under the trade name "Ziegler Flex 2013".
実施例1
100メッシュ以下のSi粉末に濃度3重量%ポリビニ
ルアルコール水溶液1轍量%を添加し、充分混練し15
0k9ノdの圧力下30×30×30Tf$Lのブロッ
クに成形し、窒素ガス雰囲気下1200℃の温度で5時
間窒化した。Example 1 1 rut volume % of a 3% concentration polyvinyl alcohol aqueous solution was added to Si powder of 100 mesh or less, and thoroughly kneaded for 15 minutes.
It was molded into a block of 30×30×30 Tf$L under a pressure of 0k9 nod, and nitrided at a temperature of 1200° C. for 5 hours in a nitrogen gas atmosphere.
その成形物を100メッシュ以下に粉砕し、X線回折に
よる分析結果、成形物中のI3N4は55重量%、その
中α−Si3N4は5踵量%でろつた。この窒化物をボ
ールミルで100メッシュ以下に分砕し、第1表に示す
反応促進剤を添加した後、ml度3重量%ポリビニルア
ルコール水溶液15重量名添加混練後150kgノdの
圧力下30×30X30TI$&のブaツクに成形した
。The molded product was pulverized to 100 mesh or less, and as a result of analysis by X-ray diffraction, I3N4 in the molded product was 55% by weight, and α-Si3N4 was 5% by weight. This nitride was crushed to 100 mesh or less using a ball mill, and the reaction accelerator shown in Table 1 was added, followed by addition of 15 mL of a 3% by weight polyvinyl alcohol aqueous solution and kneading. It was molded into a $& book.
このブロックを窒化炉に装填し、窒素ガス雰囲気下13
50℃の温度で4時間窒化し、得られた窒化吻の組成は
第1表に示す。This block was loaded into a nitriding furnace and heated for 13 minutes under nitrogen gas atmosphere.
The composition of the nitrided proboscis obtained by nitriding at a temperature of 50° C. for 4 hours is shown in Table 1.
実施例2
100メッシュ以下のSi粉末に第2表に示す反応促進
剤を添加した後、濃度3重量%ポリビニルアルコール水
溶液1.5重量%を添加混練後、150k91dの圧力
下30×30×30wnのブロックに成形した。Example 2 After adding the reaction accelerator shown in Table 2 to Si powder of 100 mesh or less, adding and kneading 1.5% by weight of a 3% by weight polyvinyl alcohol aqueous solution, a 30 x 30 x 30 wn powder under a pressure of 150k91d Molded into blocks.
このブロックを窒化炉に装填し、窒素ガス雰男気下12
00℃の温度て5時間窒化し、第2表に示1ような窒化
物を得た。この窒化物をボールミルで100メッシュ以
下に粉砕し、これに第3表に示す反応促進剤をそれぞれ
添加し、さらに濃度3重量%ポリビニルアルコール水溶
液15重量%を添加混練後、150k91cI1の圧力
下30×30×(至)朗のブロックに成形した。This block was loaded into a nitriding furnace and heated under nitrogen gas atmosphere for 12 hours.
Nitriding was carried out at a temperature of 00° C. for 5 hours to obtain nitrides as shown in Table 2. This nitride was ground to 100 mesh or less using a ball mill, each of the reaction accelerators shown in Table 3 was added thereto, and a 15% by weight polyvinyl alcohol aqueous solution with a concentration of 3% by weight was added and kneaded. It was molded into a 30 x (to) long block.
この成形物を窒化炉に装填し、窒素ガス雰囲気下135
0′Cの温度で4時間窒化して得られた窒化物の組成は
第3表に示す。実施例3
325メッシュ以下のSi粉末に第4表に示す反応促進
剤を添加し、さらに濃度2重量%のカルボキシメチルセ
ルロース水溶液15重量%を添加混練した。This molded product was loaded into a nitriding furnace and heated for 135 minutes under a nitrogen gas atmosphere.
The composition of the nitride obtained by nitriding for 4 hours at a temperature of 0'C is shown in Table 3. Example 3 A reaction accelerator shown in Table 4 was added to Si powder of 325 mesh or less, and 15% by weight of an aqueous solution of carboxymethyl cellulose having a concentration of 2% by weight was added and kneaded.
これを回転造粒して得た10〜50T$tの粒状物をS
iC製皿台に載せ、窒化炉に装填し、アンモニアガス雰
囲気下1150゜Cの温度で3時間窒化し、第4表に示
す窒化物を得た。この窒化物を振動ミルで325メッシ
ュ以下に粉砕したものに第5表に示す反応促進剤を添加
し、これに濃度5重量%ポリビニルアルコール水溶液.
を2鍾量%添加し造粒機で造粒し10〜50Tf0!L
の粒状物を得た。The granules of 10 to 50 T$t obtained by rotary granulation were
The mixture was placed on an iC plate stand, loaded into a nitriding furnace, and nitrided at a temperature of 1150° C. for 3 hours in an ammonia gas atmosphere to obtain the nitrides shown in Table 4. This nitride was ground to 325 mesh or less using a vibration mill, and the reaction accelerator shown in Table 5 was added thereto, followed by a 5% by weight aqueous polyvinyl alcohol solution.
Add 2% of the amount and granulate it with a granulator to 10-50Tf0! L
granules were obtained.
Claims (1)
素粉末に対し、窒化反応促進剤としてアルカリ金属およ
びアルカリ土類金属のハロゲン化物の中から選ばれた1
種以上を0.01〜3重量%含有させた組成物粉末を成
形し、該成形物を窒素またはアンモニアのガス雰囲気下
、1100〜1250℃の温度で加熱窒化し、該成形物
中の窒化珪素の含有量を少くとも55重量%以上とした
後、該成形物を100メッシュ以下に粉砕し、これに前
記窒化反応促進剤を0.01〜3重量%添加混合し、次
いでこれを成形し、該成形物を窒化炉で1250〜14
00℃の温度で再窒化することを特徴とするα型窒化珪
素の製造方法。1 Metal silicon powder of 100 mesh or less or 1 selected from halides of alkali metals and alkaline earth metals as a nitriding reaction promoter for the metal silicon powder.
A composition powder containing 0.01 to 3% by weight of silicon nitride or more is molded, and the molded product is heated and nitrided at a temperature of 1100 to 1250°C in a nitrogen or ammonia gas atmosphere to remove silicon nitride in the molded product. After making the content of at least 55% by weight or more, the molded product is pulverized to 100 mesh or less, 0.01 to 3% by weight of the nitriding reaction accelerator is added and mixed therein, and then this is molded, The molded product was heated in a nitriding furnace to 1250 to 14
A method for producing α-type silicon nitride, the method comprising re-nitriding at a temperature of 0.0°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8626077A JPS6047203B2 (en) | 1977-07-19 | 1977-07-19 | Method for manufacturing α-type silicon nitride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8626077A JPS6047203B2 (en) | 1977-07-19 | 1977-07-19 | Method for manufacturing α-type silicon nitride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5422000A JPS5422000A (en) | 1979-02-19 |
| JPS6047203B2 true JPS6047203B2 (en) | 1985-10-21 |
Family
ID=13881840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8626077A Expired JPS6047203B2 (en) | 1977-07-19 | 1977-07-19 | Method for manufacturing α-type silicon nitride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6047203B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5888107A (en) * | 1981-11-16 | 1983-05-26 | Denki Kagaku Kogyo Kk | Continuous preparation of alpha-type silicon nitride |
| JPH07102966B2 (en) * | 1989-02-27 | 1995-11-08 | 電気化学工業株式会社 | Method for manufacturing silicon nitride |
-
1977
- 1977-07-19 JP JP8626077A patent/JPS6047203B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5422000A (en) | 1979-02-19 |
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