JPS6048338B2 - Thermal head manufacturing method - Google Patents
Thermal head manufacturing methodInfo
- Publication number
- JPS6048338B2 JPS6048338B2 JP55185833A JP18583380A JPS6048338B2 JP S6048338 B2 JPS6048338 B2 JP S6048338B2 JP 55185833 A JP55185833 A JP 55185833A JP 18583380 A JP18583380 A JP 18583380A JP S6048338 B2 JPS6048338 B2 JP S6048338B2
- Authority
- JP
- Japan
- Prior art keywords
- glaze layer
- substrates
- substrate
- thick film
- thermal head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Description
【発明の詳細な説明】
この発明は歩留りがよく、信頼性の高いサーマルヘッ
ドの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a thermal head with good yield and high reliability.
感熱記録に用いられるサーマルヘッドは、多数の発熱
抵抗体と、これら発熱抵抗体を駆動する駆動回路とから
構成され、通常これらが同一基板上に配設される。A thermal head used for thermosensitive recording is composed of a large number of heat generating resistors and a drive circuit for driving these heat generating resistors, and these are usually arranged on the same substrate.
第1図はこのようなサーマルヘッドの実装構造を概略的
に示したもので、1はセラミック基板、2は発熱抵抗体
部、3は駆動回路部である。 発熱抵抗体部2において
は、一般に発熱抵抗体の熱が基板1側に逃げるのを防止
するため、熱抵抗層としてのグレーズ層の上に発熱抵抗
体を配設する構造がとられる。FIG. 1 schematically shows the mounting structure of such a thermal head, in which 1 is a ceramic substrate, 2 is a heating resistor section, and 3 is a drive circuit section. The heating resistor section 2 generally has a structure in which the heating resistor is disposed on a glaze layer serving as a thermal resistance layer in order to prevent the heat of the heating resistor from escaping to the substrate 1 side.
グレーズ層は印刷および焼成の工程により形成される。
一方、駆動回路部3についてはマトリクス駆動方式と、
並列駆動方式のものとがあるが、いずれの場合も厚膜回
路を含んだ形で構成される。例えば前者の場合は、マト
リクス配線を形成する多層配線の導体や層間絶縁体に厚
膜導体や厚膜絶縁体が用いられる。これらの厚膜回路も
、発熱抵抗体部2におけるグレーズ層と同様、印刷およ
び焼成の工程を経て形成される。ところが、発熱抵抗体
部2におけるグレーズ層と駆動回路部3における厚膜回
路の各々の焼成温度は必ずしも一致せず、一般には前者
より後者の方が焼成温度が低い。The glaze layer is formed by a printing and baking process.
On the other hand, the drive circuit section 3 uses a matrix drive method,
There is a parallel drive type, but in either case, it is configured to include a thick film circuit. For example, in the former case, thick film conductors and thick film insulators are used as conductors and interlayer insulators of multilayer wiring forming matrix wiring. These thick film circuits are also formed through printing and firing steps, similar to the glaze layer in the heating resistor section 2. However, the firing temperatures of the glaze layer in the heating resistor section 2 and the thick film circuit in the drive circuit section 3 are not necessarily the same, and the firing temperature of the latter is generally lower than that of the former.
従つて製造工程としては、まずクルーズ層を焼成した後
、厚膜回路を焼成する必要がある。しかし、グレーズ層
のガラスは、焼成温度より200〜300’C程度低い
温度に軟化点があるため、厚膜回路の焼成時に、グレー
ズ層に付J着したチリや厚膜回路の印刷時のペースト等
がグレーズ層と反応し、グレーズ層に凹凸ができてしま
う。このため、グレーズ層の上に形成される発熱抵抗体
に抵抗値のバラツキや断線が生じ易く、歩留りおよび信
頼性の低下を招く結果となつていた。このような不都合
を避けるには、厚膜回路の焼成温度をグレーズ層に比し
て500℃位下げればよいのてあるが、厚膜回路の材料
として多層化が可能で、かつこのような温度で焼成可能
な材料を入手するのは困難てある。Therefore, in the manufacturing process, it is necessary to first fire the cruise layer and then fire the thick film circuit. However, the glass in the glaze layer has a softening point at a temperature approximately 200 to 300°C lower than the firing temperature, so when the thick film circuit is fired, dust and paste deposited on the glaze layer and paste during printing of the thick film circuit are removed. etc., react with the glaze layer, causing unevenness in the glaze layer. For this reason, the heating resistor formed on the glaze layer is likely to have variations in resistance value or breakage, resulting in a decrease in yield and reliability. In order to avoid such inconveniences, it is possible to lower the firing temperature of the thick film circuit by about 500°C compared to that of the glaze layer. It is difficult to obtain materials that can be fired.
一方、第2図に示すように基板を発熱抵抗体部2を形成
する基板1,と、駆動回路部3を形成する基板1。On the other hand, as shown in FIG. 2, the substrates include a substrate 1 on which a heating resistor section 2 is formed, and a substrate 1 on which a drive circuit section 3 is formed.
とに分割することも考えられる。しかし、この場合には
分割された基板1,,1。上に.ある発熱抵抗体部2と
駆動回路部3との電気的接続が困難となる。例えばこの
接続にはワイヤボンデングや、銅箔をエッチングしたも
のを用いることになるが、発熱抵抗体の配設密度が8本
/WgTt以上にもなると、その全部をこのような手段
で駆動−回路部3に正しく接続することは非常に難しく
、歩留りが著しく低下する。この発明は上記のような点
に鑑みてなされたもので、その目的は発熱抵抗体が配設
されるグレーズ層に損傷を与えることがなく、しかも発
熱抵抗Z体と駆動回路部との接続を確実、容易に行うこ
とができるサーマルヘッドの製造方法を提供することに
ある。It is also possible to divide it into two parts. However, in this case, the divided substrates 1,,1. above. Electrical connection between a certain heating resistor section 2 and the drive circuit section 3 becomes difficult. For example, wire bonding or etched copper foil may be used for this connection, but if the density of heat generating resistors is 8/WgTt or more, all of them may be driven by such means. Correct connection to the circuit section 3 is very difficult and yields are significantly reduced. This invention was made in view of the above points, and its purpose is to avoid damaging the glaze layer on which the heating resistor is disposed, and to prevent the connection between the heating resistor Z body and the drive circuit section. An object of the present invention is to provide a method for manufacturing a thermal head that can be carried out reliably and easily.
iこの発明は、発熱抵抗体が配設されるグレーズI層を
印刷および焼成により、形成した第1の基板くと、駆動
回路部における厚膜回路を印刷および焼r成により形成
した第2の基板とを各々個別に形成し、これら第1、第
2の基板をグレーズ層および1厚膜回路の各々の焼成温
度よりも低く、かつグレーズ層の軟化点より低い温度で
焼成または硬化されるガラスまたは樹脂により少なくと
も端面どうしを接合して一体化した後、グレーズ層の上
に発熱抵抗体を形成し、次いで第1、第2の基板上に、
蒸着またはスパッタをエッチングにより、発熱抵抗体に
一端が接続され、他端が駆動回路部に接続される薄膜と
からなる導体パターンを第1、第2の基板を跨ぐように
形成することを特徴とする。This invention provides a first substrate in which a glaze I layer on which a heating resistor is disposed is formed by printing and baking, and a second substrate in which a thick film circuit in a drive circuit portion is formed by printing and baking. The first and second substrates are formed separately, and the first and second substrates are fired or hardened at a temperature lower than the firing temperature of each of the glaze layer and the first thick film circuit and lower than the softening point of the glaze layer. Alternatively, after joining and integrating at least the end faces with resin, a heating resistor is formed on the glaze layer, and then on the first and second substrates,
A conductor pattern is formed by vapor deposition or sputtering and etching to straddle the first and second substrates, the conductor pattern consisting of a thin film whose one end is connected to the heating resistor and whose other end is connected to the drive circuit section. do.
このようにすれば、グレーズ層および厚膜回路は予め別
々に形成され、しかも第1、第2の基板を結合するため
のガラスまたは樹脂の焼成または硬化温度が低いことか
ら、工程中に厚膜回路は勿論グレーズ層もなんら損傷を
受けることはない。In this way, the glaze layer and the thick film circuit can be formed separately in advance, and since the firing or curing temperature of the glass or resin for bonding the first and second substrates is low, the thick film can be formed during the process. Not only the circuit but also the glaze layer will not be damaged in any way.
また第1、第2の基板は端面どうしが結合されることに
よつて一枚の基板と等価になるからワイヤボンディング
の如き困難な方法を用いることなく、導体パターンによ
つて発熱抵抗体と駆動回路部との電気的接続を行うこと
ができ、量産性が著しく向上する。以下、この発明の実
施例を説明する。第3図はこの発明の一実施例の工程を
示したものである。まず、グレーズ層11を印刷および
焼成により形成した第1の基板1,と、厚膜回路12(
厚膜導体や厚膜絶縁体)を印刷および焼成により形成し
た第2の基板1。とを各々個別に形成する。基板11,
12の材料は例えばセラミックである。この場合、基板
1,,12の接合される端面は、テーパ加工しておく。
そして、これら第1、第2の基板1,,1。In addition, since the first and second substrates are equivalent to a single substrate by bonding their end faces together, they can be connected to the heat generating resistor using conductor patterns without using difficult methods such as wire bonding. Electrical connection with the circuit section can be made, and mass productivity is significantly improved. Examples of the present invention will be described below. FIG. 3 shows the steps of an embodiment of this invention. First, a first substrate 1, on which a glaze layer 11 is formed by printing and baking, and a thick film circuit 12 (
A second substrate 1 on which a thick film conductor or thick film insulator is formed by printing and firing. and are formed individually. board 11,
The material 12 is, for example, ceramic. In this case, the end surfaces of the substrates 1, 12 to be joined are tapered.
These first and second substrates 1, 1.
のテーパ加工された端面どうしを突合わせ、この突合せ
部の間隙にガラスペーストを印刷し、焼成する。第3図
aはこれまでの工程を終えて、第1、第2の基板1,,
12のテーパ加工された端面がガラスー13を接着層と
して接合され、第1、第2の基板1,,12が一体化さ
れた状態を示している。第1、第2の基板11,12の
接合される端面をテーパ加工するのは、接合面積を大き
くし、接合強度を増大させるためである。ここで、グレ
ーズ層11の焼成温度をIIOOOC)軟化点を900
℃、厚膜回路12の焼成温度を900℃とすると、ガラ
ス13として焼成温度が500’C程度のものを使用す
る。The tapered end surfaces of the glass are butted together, glass paste is printed in the gap between the butts, and then fired. FIG. 3a shows the first and second substrates 1, .
The tapered end faces of 12 are bonded using glass 13 as an adhesive layer, and the first and second substrates 1, 12 are shown integrated. The reason why the end surfaces of the first and second substrates 11 and 12 to be joined are tapered is to increase the joining area and the joining strength. Here, the firing temperature of the glaze layer 11 is IIOOOC) and the softening point is 900.
If the firing temperature of the thick film circuit 12 is 900°C, the glass 13 used has a firing temperature of about 500'C.
従来のようにグレーズ層11を印刷焼成した後、厚膜回
路12を印刷焼成すると、厚膜回路12の焼成時にグレ
ーズ層11が軟化し、グレーズ層11の上に付着物があ
るとその表面に凹凸ができてしまうことは前述した通り
である。これに対し、この発明によれば厚膜回路12の
印刷焼成はグレーズ層11が形される第1の基板11と
は別個の第2の基板12上で予め行なわれるため、この
焼成時にグレーズ層11に凹凸を生じさせる等の損傷を
与えることはない。。また、ガラス13の焼成時におい
ても、ガラス13の焼成温度がグレーズ層11の焼成温
度および軟化点、さらに厚膜回路12の焼成温度よりも
低いため、グレーズ層11や厚膜回路12を損傷させる
おそれはない。そして次に、第3図bのように例えば薄
膜回路技術によつて、グレーズ層11の上に発熱抵抗体
14を形成し、さらに発熱抵抗体14と駆動回路部3と
を接続する薄膜からなる導体パターン15を形成する。If the thick film circuit 12 is printed and fired after printing and firing the glaze layer 11 as in the conventional method, the glaze layer 11 will be softened during firing of the thick film circuit 12, and if there is any deposit on the glaze layer 11, the surface will be damaged. As mentioned above, unevenness is caused. In contrast, according to the present invention, printing and firing of the thick film circuit 12 is performed in advance on the second substrate 12 that is separate from the first substrate 11 on which the glaze layer 11 is formed, so that the glaze layer 12 is 11 will not be damaged by causing unevenness or the like. . Also, when firing the glass 13, the firing temperature of the glass 13 is lower than the firing temperature and softening point of the glaze layer 11, and also the firing temperature of the thick film circuit 12, which may damage the glaze layer 11 and the thick film circuit 12. There's no fear. Next, as shown in FIG. 3b, a heating resistor 14 is formed on the glaze layer 11 by, for example, thin film circuit technology, and a thin film is further formed to connect the heating resistor 14 and the drive circuit section 3. A conductor pattern 15 is formed.
この場合、導体パターン15の形成は蒸着またはスパッ
タ、エッチング等の工程により、容易に高密度にかつ歩
留りよく行うことができる。以上のように、この発明に
よれば従来の方法と比較して歩留りをより向上させ、信
頼性を高めることができる。In this case, the conductor pattern 15 can be easily formed with high density and high yield by a process such as vapor deposition, sputtering, or etching. As described above, according to the present invention, yield can be further improved and reliability can be improved compared to conventional methods.
次にこの発明の他の実施例を説明する。第4図は第1、
第2の基板11,12の裏面をガラス16により第3の
基板17に接着して、全体の機械的強度を高めた例であ
る。なお、発熱抵抗体14から第1の基板1,に伝達し
た熱は速やかに放散されることが望ましいが、第4図で
は第1の基板1,→ガラス16→第3の基板17の経路
で熱が伝達するため、放熱性があまり良好でない。Next, another embodiment of the invention will be described. Figure 4 shows the first
This is an example in which the back surfaces of the second substrates 11 and 12 are bonded to the third substrate 17 using glass 16 to increase the overall mechanical strength. Note that it is desirable that the heat transferred from the heating resistor 14 to the first substrate 1 be dissipated quickly, but in FIG. Because heat is transferred, heat dissipation is not very good.
第5図の実施例はこの点を改良し、第1の基板1,のグ
レーズ層11の下側部分を他の部分より厚くし、薄く延
長させた部分の表面に、第2合基板12の裏面をガラス
16により接着したものである。第6図の実施例は基板
1,,1。The embodiment shown in FIG. 5 improves this point by making the lower part of the glaze layer 11 of the first substrate 1 thicker than the other parts, and applying the second composite substrate 12 to the surface of the thinly extended part. The back surface is bonded with glass 16. The embodiment shown in FIG. 6 includes substrates 1, 1.
の接合される端面に第3図〜第5図とは逆方向に傾斜し
たテーパ加工を行なつて、第1、第2の基板1,,12
の裏面側からガラス13を印刷したものであるなお、以
上の説明では基板間の接合にガラスを用いたが、エポキ
シ、ポリイミド等の樹脂を使用してもよく、その軟化温
度がグレーズ層11の焼成温度、軟化点および厚膜回路
12の焼成温度よりも低いものであれば、同様な効果が
得られる。The end faces of the first and second substrates 1, 12 are tapered in a direction opposite to that shown in FIGS. 3 to 5.
The glass 13 is printed from the back side of the glaze layer 11. In the above explanation, glass is used for bonding between the substrates, but resins such as epoxy and polyimide may also be used, and the softening temperature of the resin is the same as that of the glaze layer 11. Similar effects can be obtained as long as the firing temperature and softening point are lower than the firing temperature of the thick film circuit 12.
第1図および第2図はサーマルヘッドの実装構造を概略
的に示す図、第3図A,bはこの発明の一実施例の工程
を示す断面図、第4図〜第6図はこの発明の他の実施例
を説明するための断面図である。
1,・・・第1の基板、12・・・第2の基板、2 ・
・・発熱抵抗体部、3 ・・・駆動回路部、11・・・
グレーズ層、12・・・厚膜回路、13,16・・・ガ
ラス、14・・・発熱抵抗体、15・・・導体パターン
、17・・・第3の基板。FIGS. 1 and 2 are diagrams schematically showing the mounting structure of a thermal head, FIGS. 3A and 3B are sectional views showing the steps of an embodiment of the present invention, and FIGS. 4 to 6 are diagrams showing the present invention. FIG. 3 is a sectional view for explaining another embodiment of the invention. 1,...first substrate, 12...second substrate, 2.
...Heating resistor section, 3...Drive circuit section, 11...
Glaze layer, 12...Thick film circuit, 13, 16...Glass, 14...Heating resistor, 15...Conductor pattern, 17...Third substrate.
Claims (1)
ズ層と、前記発熱抵抗体を駆動する厚膜回路を含む駆動
回路とを有するサーマルヘッドの製造方法において、前
記グレーズ層を印刷および焼成により形成した第1の基
板と、前記厚膜回路を印刷および焼成により形成した第
2の基板とを各々個別に形成し、これら第1、第2の基
板を前記グレーズ層および前記厚膜回路の各々の焼成温
度よりも低く、かつ前記グレーズ層の軟化点よりも低い
温度で焼成または硬化されるガラスまたは樹脂により少
なくとも端面どうしを接合して一体化した後、前記グレ
ーズ層の上に前記発熱抵抗体を形成し、次いで前記第1
、第2の基板上に、蒸着またはスパッタとエッチングに
より、前記発熱抵抗体に一端が接続され、他端が前記駆
動回路部に接続される薄膜からなる導体パターンを前記
第1、第2の基板を跨ぐように形成することを特徴とす
るサーマルヘッドの製造方法。 2 第1、第2の基板は接合される端面がテーパ加工さ
れていることを特徴とする特許請求の範囲第1項記載の
サーマルヘッドの製造方法。 3 第1、第2の基板の裏面が共通の基板の上に接着さ
れていることを特徴とする特許請求の範囲第1項記載ま
たは第2項記載のサーマルヘッドの製造方法。 4 第1、第2の基板の一方の基板の裏面と他方の基板
の表面とがガラスまたは樹脂により接合されていること
を特徴とする特許請求の範囲第1項記載または第2項記
載のサーマルヘッドの製造方法。[Scope of Claims] 1. A method for manufacturing a thermal head having a heat generating resistor, a glaze layer on which the heat generating resistor is disposed, and a drive circuit including a thick film circuit for driving the heat generating resistor. A first substrate on which a glaze layer is formed by printing and baking, and a second substrate on which the thick film circuit is formed by printing and baking are formed separately, and these first and second substrates are bonded to the glaze layer. and after joining and integrating at least the end faces with glass or resin that is fired or hardened at a temperature lower than the firing temperature of each of the thick film circuits and lower than the softening point of the glaze layer, the glaze layer the heating resistor is formed on the first
, a conductor pattern made of a thin film, one end of which is connected to the heating resistor and the other end of which is connected to the drive circuit section, is formed on the second substrate by vapor deposition or sputtering and etching, and the conductor pattern is formed on the first and second substrates. A method for manufacturing a thermal head, characterized by forming the head so as to straddle the two. 2. The method of manufacturing a thermal head according to claim 1, wherein the end surfaces of the first and second substrates to be joined are tapered. 3. The method of manufacturing a thermal head according to claim 1 or 2, wherein the back surfaces of the first and second substrates are bonded onto a common substrate. 4. The thermal device according to claim 1 or 2, wherein the back surface of one of the first and second substrates and the front surface of the other substrate are bonded by glass or resin. Head manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55185833A JPS6048338B2 (en) | 1980-12-26 | 1980-12-26 | Thermal head manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55185833A JPS6048338B2 (en) | 1980-12-26 | 1980-12-26 | Thermal head manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57107863A JPS57107863A (en) | 1982-07-05 |
| JPS6048338B2 true JPS6048338B2 (en) | 1985-10-26 |
Family
ID=16177671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55185833A Expired JPS6048338B2 (en) | 1980-12-26 | 1980-12-26 | Thermal head manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6048338B2 (en) |
-
1980
- 1980-12-26 JP JP55185833A patent/JPS6048338B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57107863A (en) | 1982-07-05 |
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