JPS6059300B2 - Wear-resistant and fracture-resistant multilayer coating material - Google Patents
Wear-resistant and fracture-resistant multilayer coating materialInfo
- Publication number
- JPS6059300B2 JPS6059300B2 JP2058176A JP2058176A JPS6059300B2 JP S6059300 B2 JPS6059300 B2 JP S6059300B2 JP 2058176 A JP2058176 A JP 2058176A JP 2058176 A JP2058176 A JP 2058176A JP S6059300 B2 JPS6059300 B2 JP S6059300B2
- Authority
- JP
- Japan
- Prior art keywords
- resistant
- coating
- wear
- layer
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 title claims description 18
- 239000011248 coating agent Substances 0.000 title claims description 17
- 239000000463 material Substances 0.000 title claims description 15
- 239000010410 layer Substances 0.000 claims description 19
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 239000011247 coating layer Substances 0.000 claims description 10
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000011195 cermet Substances 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 4
- 238000005299 abrasion Methods 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 description 20
- 239000007789 gas Substances 0.000 description 6
- 239000006104 solid solution Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- -1 titanium halides Chemical class 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 101100008044 Caenorhabditis elegans cut-1 gene Proteins 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 101100202505 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) SCM4 gene Proteins 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 102220259718 rs34120878 Human genes 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
本発明は切削工具、耐摩耗工具等に用いられる耐摩耗
耐欠損性材料に係り、特に耐摩耗耐欠損に有効な多層被
覆の施された材料に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a wear-resistant and chipping-resistant material used for cutting tools, wear-resistant tools, etc., and particularly to a material coated with a multilayer coating that is effective for wear and chipping resistance.
Ａｌ２Ｏ３基セラミックス、およびＴｉＮ基サーメッ
トは耐摩耗性にすぐれ、単独ても切削工具、耐摩耗工具
等に用いられるが、さらに耐摩耗耐欠損性を向上させる
ため、ＴｉＣ、ＴｉＮ、ＴｉＣ−ＴｉＮ固溶体、Ａｌ２
Ｏ３等を被覆することが行われてきた。Al2O3-based ceramics and TiN-based cermets have excellent wear resistance and are used alone in cutting tools, wear-resistant tools, etc., but in order to further improve wear and chipping resistance, TiC, TiN, TiC-TiN solid solutions, Al2
Coating with O3 etc. has been practiced.
しカル耐摩耗性を向上させるため充分な厚さに被覆すれ
は、被覆層および被覆接合部分の強度が不充分になりや
すく衝撃を伴なつた用途に充分適用可能であるとはいえ
なかつた。 本発明はこの欠点を除去するためになされ
たもので、Ａｅ２ｏ３基セラミックス、またはＴｉＮ基
サーメットの表面に、ＴｉＣおよびＴｉＮの１種または
２種よりなる被覆層およびＡｌ２Ｏ３よりなる被覆層が
、単層の厚さ１μ以下、好ましくは０．５μ未満で合計
３〜１０μの厚さに３層以上被覆されてなることを特徴
とする耐摩耗耐欠損性多層被覆材料を内容とするものて
ある。However, if the coating is applied to a sufficient thickness to improve the wear resistance, the strength of the coating layer and the bonded portion of the coating tends to be insufficient, and it cannot be said that the coating is sufficiently applicable to applications involving impact. The present invention was made to eliminate this drawback, and consists of a single layer of a coating layer made of one or both of TiC and TiN and a coating layer made of Al2O3 on the surface of Ae2O3-based ceramics or TiN-based cermet. A wear-resistant and chipping-resistant multilayer coating material characterized by being coated with three or more layers with a total thickness of 3 to 10 microns, with a thickness of 1 micron or less, preferably less than 0.5 microns.
本発明材料は前記のように単層の厚さが１μ以下、好
ましくは０．５μ未満であるので、被覆材料層間の歪が
均一に分散して応力集中を排除し耐衝撃性を高めている
。As mentioned above, in the material of the present invention, the single layer thickness is 1μ or less, preferably less than 0.5μ, so the strain between the coating material layers is evenly distributed, eliminating stress concentration and improving impact resistance. .
また被覆層を重ねる順序を適当に選ぶことができるので
、各単層間および母材との間の接合部分の強度も強くす
ることができる。そして被覆層全体の厚さは３〜、１０
μであるから、被覆層の耐摩耗性を充分に発揮させるこ
とができる。 本発明材料の被覆層を重ねる順序は、前
記のような意味で、母材、ＴｉＣ、ＴｉＮ、Ａｌ。Furthermore, since the order in which the coating layers are stacked can be appropriately selected, the strength of the joints between each single layer and the base material can be increased. The thickness of the entire coating layer is 3 to 10
Since it is μ, the abrasion resistance of the coating layer can be fully exhibited. The order in which the coating layers of the present invention material are stacked is as described above: base material, TiC, TiN, Al.
Ｏ。、ＴｉＮ、ＴｉＣ、ＴｉＮ、Ａｌ。Ｏ。、・・・
・・・というもの、および、母材、ＴｉＣ−ＴｉＮ固溶
体、Ａｌ■。Ｏ。、ＴｉＣ−ＴｉＮ固溶体、Ａｌ。Ｏ。
・・・・・・というもの等が好適であるが、これに限定
されるものではない。 本発明材料の製造方法、特に被
覆層の形成方法は、特に限定されるものてはなく周知の
種々の方法を用い得るが、化学気相蒸着法によるのが有
効である。O. , TiN, TiC, TiN, Al. O. ,...
..., base material, TiC-TiN solid solution, Al■. O. , TiC-TiN solid solution, Al. O.
. . . etc. are preferable, but are not limited thereto. The method for producing the material of the present invention, particularly the method for forming the coating layer, is not particularly limited and various known methods may be used, but chemical vapor deposition is effective.
すなわち高温で母材上に、ハロゲン化チタン、水素、炭
化水素を流せはＴｉＣ被覆が生じ、ノ和ゲン化チタン、
水素、窒素を流せιよ１１Ｎ被覆が生じ、ハロゲン化チ
タン、水素、窒素、炭化水素を流せはＴｉＣ−ＴｉＮ固
溶体被覆が生じ、ハロゲン化アルミニウム、水素、水蒸
気を流せばＡｌ２０。が生ずる。気体の流れを切換える
ことによつて連続して任意の順序に被覆ができ、被覆の
厚さも制御しやすく、固溶体被覆中の成分比を次第に変
えることも可能である。実施例１
Ａｆ２０３基セラミック（Ａｆ２Ｏ３−２５重量％Ｔｉ
Ｃ一５重量％ＭｇＯ）からなる切削チップ（ＪＩＳ規格
のＳＮＰ４３２の形状）を１０５０℃に加熱した後．、
ＴｌＣｆ４３％，ＦＩ２９３％，ＣＨ４４％からなる混
合ガスと、Ａ′Ｃ′３５％，Ｈ２７５％，ＣＯ２６％，
ＣＯｌ４％からなる混合ガスとを、圧力８０Ｔ０ｒｒの
もとて、前者を１吟、後者を１０ずつ交互に反応炉中に
導入し、０．２μｍ厚のＴｌＣ層と０．２μｍ厚のＡｅ
２Ｏ３層との交互各１０層の被覆を合計４μｍの厚さに
施した。In other words, if titanium halides, hydrogen, and hydrocarbons are flowed onto the base material at high temperatures, a TiC coating will occur, and titanium halides,
Flowing hydrogen and nitrogen produces a 11N coating; flowing titanium halide, hydrogen, nitrogen, and hydrocarbons produces a TiC-TiN solid solution coating; flowing aluminum halide, hydrogen, and water vapor produces Al20. occurs. By switching the gas flow, coating can be performed continuously in any order, the thickness of the coating can be easily controlled, and the ratio of components in the solid solution coating can be gradually changed. Example 1 Af203-based ceramic (Af2O3-25 wt% Ti
After heating a cutting tip (shape of SNP432 according to JIS standard) made of C-5% by weight MgO to 1050°C. ,
A mixed gas consisting of TlCf43%, FI293%, CH44%, A'C'35%, H275%, CO26%,
A mixed gas consisting of 4% COl was introduced into the reactor at a pressure of 80T0rr, alternately 1 gin of the former and 10 of the latter, forming a 0.2 μm thick TlC layer and a 0.2 μm thick Ae layer.
Coatings of 10 layers each alternating with 2O3 layers were applied to a total thickness of 4 μm.
この切削チップを用いてフライス切削による切削テスト
を行なつた。被削材をＪＩＳ規格のＳ５５Ｃ鋼材（ＨＢ
２７Ｏ）とし、切削速度１００ｍＩｍｉｎ１切り込み１
．５Ｔ１ｒ！ｎで、送りを０．１０Ｔｆ＄Ｌより始めて
、１バス（２００ｎ１）切削後に刃先にチッピングがな
い場合は送り量を増加させるという方法で、チッピング
が起る送り量を測定した。その結果は、３回試験して、
０．３１順，０．３４醒，０．３『であつた。比較例１
実施例１と同じＡｆ２Ｏ３基セラミック切削チップの表
面に、実施例１と同じ混合ガスを用いて、内層が１μｍ
厚のＴｌＣ層、外層が３μｍ厚のＡｅ２Ｏ３層の二層被
覆を行なつた。A cutting test by milling was conducted using this cutting tip. The work material is JIS standard S55C steel (HB
27O), cutting speed 100mImin1 depth of cut 1
．． 5T1r! The feed amount at which chipping occurs was measured by starting the feed from 0.10 Tf$L and increasing the feed amount if there was no chipping on the cutting edge after cutting one bus (200 n1). The results were tested three times,
It was 0.31, 0.34, and 0.3. Comparative example 1
The same mixed gas as in Example 1 was used on the surface of the same Af2O3-based ceramic cutting tip as in Example 1 to form an inner layer with a thickness of 1 μm.
Two-layer coating was carried out: a thick TlC layer and an outer layer of 3 μm thick Ae2O3 layer.
この切削チップを用いて、実施例１と同様に切削テスト
を行なつた。Using this cutting tip, a cutting test was conducted in the same manner as in Example 1.
チッピングが起る送り量は、３回試験して、いずれも０
．２０ｗｎであつた。実施例１の切削チップは、比較例
１の切削チップに比較して明らかにチッピングが起りに
くく、本発明の効果が現れている。実施例２
Ｔ１Ｎ基サーメット（ＴｉＮ−３呼量％−１喧量％ＭＯ
２Ｃ−１５重量％Ｎｌ）の切削チップ（ＪＩＳ規格のＳ
ＮＰ４３２の形状）上にイオンブレーティング装置を使
用してＴｉＣＮ．ｌ５Ａｅ２Ｏ３の積層被覆を行なつた
。The feed rate at which chipping occurs was tested three times and was found to be 0 in all cases.
．． It was 20wn. The cutting tip of Example 1 was clearly less prone to chipping than the cutting tip of Comparative Example 1, demonstrating the effects of the present invention. Example 2 T1N-based cermet (TiN-3 nominal amount %-1 nominal amount % MO
2C-15wt%Nl) cutting tip (JIS standard S
TiCN. A multilayer coating of 15Ae2O3 was performed.
すなわち被処理チップを５００℃に加熱し、チップ表面
をＡｒガスで５分間ボンバードし、次に金属Ｔｉを電子
ビームで溶解、蒸発、イオン化させ、（Ｎ２＋Ｃ２Ｈ２
）分圧０．０８Ｐａの混合ガスを炉内に導し、ＴｉＣＮ
層を０．２ｐｍ蒸着した。次に１×１０−３Ｐａまで排
気した後、蒸発源をＡ′に替え、電子ビームで蒸発イオ
ン化させ、分圧０．０３Ｐａの酸素ガスを炉内に導入し
、Ａｅ２Ｏ３層を０．２μｍ蒸着した。この操作を交互
に各１（２）くり返し、被膜厚を４μｍとした。このサ
ーメットチップを使用して、耐欠損性のテストを行なつ
た。That is, the chip to be processed is heated to 500°C, the chip surface is bombarded with Ar gas for 5 minutes, and then metal Ti is melted, evaporated, and ionized with an electron beam to form (N2+C2H2
) A mixed gas with a partial pressure of 0.08 Pa is introduced into the furnace, and TiCN
A layer of 0.2 pm was deposited. Next, after exhausting to 1 x 10-3 Pa, the evaporation source was changed to A', evaporation and ionization was performed with an electron beam, oxygen gas with a partial pressure of 0.03 Pa was introduced into the furnace, and an Ae2O3 layer of 0.2 μm was evaporated. . This operation was alternately repeated once (2 times) each time to obtain a film thickness of 4 μm. Using this cermet chip, a fracture resistance test was conducted.
被削材をＪＩＳ規格のＳＣＭ４鋼材とし、切削速度１０
０ｒｎＩｍｉｎ１切込み１．５Ｔｎ、送り０．３ｗｆｔ
の条件で転削を行ない、チップが欠損するまでの切削距
離を測定した。結果は、８３０ｍであつた。比較例実施
例２と同じＴｉＮ基サーメットチップの表面に、実施例
２と同様の方法で、内層が２μｍ厚のＴｌＣＮ層、外層
が２ｐｍ厚のＡｅ２Ｏ３層の二層被覆を行なつた。The work material was JIS standard SCM4 steel, and the cutting speed was 10.
0rnImin1 depth of cut 1.5Tn, feed 0.3wft
Milling was performed under these conditions, and the cutting distance until the chip broke was measured. The result was 830m. Comparative Example The surface of the same TiN-based cermet chip as in Example 2 was coated with two layers, the inner layer being a 2 μm thick TlCN layer and the outer layer being a 2 pm thick Ae2O3 layer, using the same method as in Example 2.
この切削チップを用いて、実施例２と同様の耐欠損性の
テストを行なつた。欠損までの切削距離は５９０Ｔｍｎ
であつた。実施例２の切削チップは比較例２の切削チッ
プに比較して明らかに耐欠損性がすぐれており、本発明
の効果が現れている。Using this cutting tip, the same fracture resistance test as in Example 2 was conducted. Cutting distance to defect is 590Tmn
It was hot. The cutting tip of Example 2 clearly has better fracture resistance than the cutting tip of Comparative Example 2, demonstrating the effects of the present invention.
Claims (1)
ーメットの表面に、ＴｉＣおよびＴｉＮの１種または２
種よりなる被覆層およびＡｌ＿２Ｏ＿３基よりなる被覆
層が、単層の厚さ１μ以下、好ましくは０．５μ未満で
合計３〜１０μの厚さに３層以上被覆されてなることを
特徴とする耐摩耗耐欠損性多層被覆材料。1 One or two of TiC and TiN is applied to the surface of Al_2O_3-based ceramics or TiN-based cermet.
A coating layer consisting of a seed and a coating layer consisting of an Al_2O_3 group are coated in three or more layers with a single layer thickness of 1μ or less, preferably less than 0.5μ, and a total thickness of 3 to 10μ. Abrasion-resistant multilayer coating material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2058176A JPS6059300B2 (en) | 1976-02-28 | 1976-02-28 | Wear-resistant and fracture-resistant multilayer coating material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2058176A JPS6059300B2 (en) | 1976-02-28 | 1976-02-28 | Wear-resistant and fracture-resistant multilayer coating material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52105396A JPS52105396A (en) | 1977-09-03 |
| JPS6059300B2 true JPS6059300B2 (en) | 1985-12-24 |
Family
ID=12031170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2058176A Expired JPS6059300B2 (en) | 1976-02-28 | 1976-02-28 | Wear-resistant and fracture-resistant multilayer coating material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6059300B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6338995A (en) * | 1986-08-04 | 1988-02-19 | 松下電器産業株式会社 | Voice recognition equipment |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4490191A (en) * | 1981-12-16 | 1984-12-25 | General Electric Company | Coated product and process |
| JPS58217479A (en) * | 1982-06-08 | 1983-12-17 | 日立金属株式会社 | Multiple coating material and manufacture |
| JPS5925973A (en) * | 1982-08-04 | 1984-02-10 | Hitachi Metals Ltd | Multiply coated material and its manufacture |
| JPS5925968A (en) * | 1982-08-04 | 1984-02-10 | Hitachi Metals Ltd | Multiply coated material and its manufacture |
| JPS60264333A (en) * | 1984-06-13 | 1985-12-27 | Matsushita Electric Ind Co Ltd | Press molding mold for optical glass elements |
| JPS61136928A (en) * | 1984-12-10 | 1986-06-24 | Matsushita Electric Ind Co Ltd | Mold for press-molding optical glass element |
| JP2529190B2 (en) * | 1985-08-28 | 1996-08-28 | 住友電気工業株式会社 | Coated cemented carbide |
-
1976
- 1976-02-28 JP JP2058176A patent/JPS6059300B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6338995A (en) * | 1986-08-04 | 1988-02-19 | 松下電器産業株式会社 | Voice recognition equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52105396A (en) | 1977-09-03 |
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