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JPS6059992B2 - Continuous vacuum evaporation equipment - Google Patents
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JPS6059992B2 - Continuous vacuum evaporation equipment - Google Patents

Continuous vacuum evaporation equipment

Info

Publication number
JPS6059992B2
JPS6059992B2 JP11842378A JP11842378A JPS6059992B2 JP S6059992 B2 JPS6059992 B2 JP S6059992B2 JP 11842378 A JP11842378 A JP 11842378A JP 11842378 A JP11842378 A JP 11842378A JP S6059992 B2 JPS6059992 B2 JP S6059992B2
Authority
JP
Japan
Prior art keywords
evaporation
metal
steel strip
collector plate
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11842378A
Other languages
Japanese (ja)
Other versions
JPS5544580A (en
Inventor
誠治 西川
平三郎 古川
大蔵 山崎
哲義 和田
重夫 板野
義清 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP11842378A priority Critical patent/JPS6059992B2/en
Publication of JPS5544580A publication Critical patent/JPS5544580A/en
Publication of JPS6059992B2 publication Critical patent/JPS6059992B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は長尺の金属材料、特に鋼帯にZn、Al等の金
属を真空中で連続的に蒸着するための装置に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for continuously depositing metals such as Zn and Al on a long metal material, particularly a steel strip, in a vacuum.

この種装置は従来第1図に示す様に鋼帯2の全幅にわた
つて均一な蒸着膜厚を得るために、蒸発用ルツボ3の幅
は鋼帯2の全幅に比べて等しいか若干大きくなつている
Conventionally, in this type of apparatus, the width of the evaporation crucible 3 is equal to or slightly larger than the entire width of the steel strip 2 in order to obtain a uniform evaporated film thickness over the entire width of the steel strip 2, as shown in FIG. ing.

しかも、鋼帯のトラッキング上、高速の鋼帯(鋼帯の移
動方向は紙面に垂直方向である)がルツボに接触しない
ことが必要であるので、鋼帯2の幅方向の端部とルツボ
上端部の間に必然的に間隙を形成しなければならない。
従つて、ルツボ3内の蒸発用溶融金属4より蒸発する蒸
発金属の一部25、26は、この間隙を通過して蒸着室
1の内壁面に到達し、ここで金属固体として堆積し塊状
の堆積物27−28として次第に成長し、ついには鋼帯
2の側端部に接触する様になつたり脱落したりして鋼帯
の正常な運動を妨げる。この様な事態になれば、当然蒸
着装・置の操業を中止して、真空室の真空を破り、この
堆積物を除去する必要があるので、著しく装置の稼動率
が低下し、生産性が低下する欠点があつた。本発明は、
従来装置のこの様な欠点を解消するフために提供するも
ので、鋼帯端部とルツボ上端部とで形成されるクリアラ
ンスを覆うように移動式の漏洩蒸発金属コレクタ板を設
け、かつ、このコレクタ板に付着した蒸着金属を大気中
にて剥離除去した後、再び蒸着室に導入する連続装置を
設けることにより、漏洩蒸発金属を連続的に回収するこ
とが可能となり、生産性に優れた連続真空蒸着装置を提
供するものである。
Moreover, in order to track the steel strip, it is necessary that the high-speed steel strip (the direction of movement of the steel strip is perpendicular to the plane of the paper) does not come into contact with the crucible. A gap must necessarily be formed between the parts.
Therefore, some of the evaporated metal 25, 26 evaporated from the evaporation molten metal 4 in the crucible 3 passes through this gap and reaches the inner wall surface of the evaporation chamber 1, where it is deposited as a metal solid and becomes a lump. The deposits 27-28 gradually grow and eventually come into contact with the side edges of the steel strip 2 or fall off, interfering with the normal movement of the steel strip. If such a situation occurs, it is necessary to stop the operation of the evaporation equipment/equipment, break the vacuum in the vacuum chamber, and remove this deposit, which will significantly reduce the operating rate of the equipment and reduce productivity. There was a drawback that it deteriorated. The present invention
This device is provided to eliminate such drawbacks of the conventional device, and a movable leakage evaporation metal collector plate is provided to cover the clearance formed between the end of the steel strip and the upper end of the crucible. By installing a continuous device that removes the evaporated metal adhering to the collector plate in the atmosphere and then reintroduces it into the evaporation chamber, it becomes possible to continuously recover the leaked evaporated metal, resulting in a continuous process with excellent productivity. A vacuum evaporation device is provided.

以下、本発明を第2〜4図により詳細に説明する。Hereinafter, the present invention will be explained in detail with reference to FIGS. 2 to 4.

第2図において、1は真空蒸着室、2は鋼帯、3は蒸発
用ルツボ、4は蒸発用金属浴を各々示す。
In FIG. 2, 1 is a vacuum deposition chamber, 2 is a steel strip, 3 is an evaporation crucible, and 4 is an evaporation metal bath.

5は漏洩蒸発金属量を減少させるための遮蔽板を示す。5 indicates a shielding plate for reducing the amount of leaked evaporated metal.

すなわち第2図における横(A−A)断面を示す第3図
から明らかな様に、蒸着しようとする鋼帯の巾が狭くな
つた場合は、当然のことながらルツボと鋼帯とで形成さ
れるクリアランスは大きくなり漏洩蒸発金属量が増大す
る。そこで遮蔽板5を鋼帯の端部付近まで移動させるこ
とにより前記クリアランスを小さくすることができ漏洩
蒸発金属量を減少させることが可能となる。6は蒸着金
属との剥離性のよい材質から成るコレクタであり、材質
としてはステンレス鋼などが適しているが、さらに剥離
性を向上させるためには、Ta,MOあるいはBN等の
剥離性の良い物質を被覆させることも効果がある。
In other words, as is clear from FIG. 3 showing the horizontal (A-A) cross section in FIG. As the clearance increases, the amount of leaked evaporated metal increases. Therefore, by moving the shielding plate 5 to near the end of the steel strip, the clearance can be made smaller and the amount of leaked evaporated metal can be reduced. Reference numeral 6 denotes a collector made of a material with good peelability from the deposited metal. Stainless steel is suitable as the material, but to further improve the peelability, it is recommended to use a material with good peelability such as Ta, MO or BN. Coating with substances is also effective.

11〜13はコレクタ板を真空室に導入するための差圧
室であり、14〜16はコレクタ板を大気中に取出すた
めの差圧室である。
11-13 are differential pressure chambers for introducing the collector plate into the vacuum chamber, and 14-16 are differential pressure chambers for taking out the collector plate into the atmosphere.

7〜10および17,18はコレクタ板を駆動するため
のロールであるが、これらはいずれも冷却構造とするこ
とが望ましい。
Rolls 7 to 10 and 17 and 18 are for driving the collector plates, and it is desirable that all of these have a cooling structure.

すなわち、ロールを冷却することによりコレクタ板を冷
却し、低温状態に保持しておくと、漏洩蒸発金属がコレ
クタ板に飛来した際に再蒸発しにくくなり付着効率(補
集効率)が大になる利点、およびコレクタ上の付着層内
に熱応力が発生し付着層が剥離しやすくなる利点がある
。特にZnの様に再蒸発しやすい金属の蒸着の場合には
コレクタ板の冷却は重要であり、このコレクタ板の冷却
効率を上げるためには、冷却装置21により大気中.で
積極的に冷却することも効果がある。コレクタ板6は、
第3図に示す様に鋼帯にできるだけ近づける方が好まし
い。
In other words, if the collector plate is cooled by cooling the roll and maintained at a low temperature, when leaked evaporated metal flies to the collector plate, it will be difficult to re-evaporate and the adhesion efficiency (collection efficiency) will be increased. This has the advantage that thermal stress is generated in the adhesive layer on the collector, making it easier for the adhesive layer to peel off. Cooling of the collector plate is particularly important in the case of vapor deposition of a metal that easily reevaporates, such as Zn. Active cooling is also effective. The collector plate 6 is
It is preferable to place it as close to the steel strip as possible, as shown in FIG.

すなわち、鋼帯に近い方が、漏洩蒸発金属の拡がりが少
ないためコレクタ板への付着効率(補集効率)が大にな
る利点があると共に、鋼帯の冷却作用にも寄与すること
ができる。又、Znの様に蒸気の回り込みの大きい金属
の場合には、裏面への回り込みを防止することも可能と
なり、片面蒸着の場合には有効である。ただし、裏面へ
の回り込み防止や、鋼帯の冷却が問題とならない様な場
合には、第4図に示す様に、コレクタ板を傾斜させてさ
らに漏洩蒸発金属の補集効率を高めることも可能である
。剥離装置19には、ワイヤブラシ付きのロールなどが
適する。剥離効率を高めるためには、22〜24に示す
ロールを設けて、剥離する前に、コレクタ板に曲げ加工
を与えることも効果がある。20は剥離粉を溜めるため
の容器であり、一定時間毎に新しい容器と取替えて漏洩
蒸発金属を回収する。
That is, the closer the leaked evaporated metal is to the steel strip, the less it spreads, which has the advantage of increasing the adhesion efficiency (collection efficiency) to the collector plate, and also contributes to the cooling effect of the steel strip. Further, in the case of a metal such as Zn, which has a large tendency for vapor to wrap around, it is also possible to prevent the vapor from flowing around to the back surface, which is effective in the case of single-sided vapor deposition. However, if preventing the metal from going around to the back surface or cooling the steel strip is not a problem, it is possible to further increase the efficiency of collecting leaked evaporated metal by tilting the collector plate as shown in Figure 4. It is. A roll with a wire brush or the like is suitable for the peeling device 19. In order to increase the peeling efficiency, it is also effective to provide rolls shown in 22 to 24 to bend the collector plate before peeling. Reference numeral 20 denotes a container for collecting peeling powder, which is replaced with a new container at regular intervals to collect leaked evaporated metal.

以上の様に、本発明装置によれは、鋼帯端部とルツボ上
端部とで形成されるクリアランスから漏洩する蒸発金属
を連続的に補集回収することが可能になり、生産性に優
れた連続真空蒸着を行なうことができる。
As described above, the device of the present invention makes it possible to continuously collect and recover evaporated metal leaking from the clearance formed between the end of the steel strip and the upper end of the crucible, resulting in excellent productivity. Continuous vacuum deposition can be performed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来装置の概略構造を示す横断面図、第2図と
第3図は本発明装置の一実施例の概略構造を示す縦断面
図と横A−A断面図、第4図は本発明装置の他の一実施
例の概略構造を示す横断面図である。 1・・・・・・真空蒸着室、2・・・・・・鋼帯、3・
・・・・・ルツボ、4・・・・・・蒸発用溶融金属、5
・・・・・・遮蔽板、6・・・・・・コレクタ板、7〜
10,17,18・・・・・・駆動ロール、11〜16
・・・・・・差圧室、19・・・・・剥離装置、20・
・・・・剥離粉受容器、21・・・・冷却装置、22〜
24・・・・・・曲げ加工用ロール、25,26・・・
・・漏洩蒸発金属、27,28・・・・・・塊状堆積物
FIG. 1 is a cross-sectional view showing a schematic structure of a conventional device, FIGS. 2 and 3 are longitudinal and horizontal sectional views showing a schematic structure of an embodiment of the device of the present invention, and FIG. 4 is a cross-sectional view showing a schematic structure of a conventional device. FIG. 3 is a cross-sectional view showing a schematic structure of another embodiment of the device of the present invention. 1... Vacuum deposition chamber, 2... Steel strip, 3.
... Crucible, 4 ... Molten metal for evaporation, 5
....shielding plate, 6 ....collector board, 7~
10, 17, 18... Drive roll, 11-16
... Differential pressure chamber, 19 ... Peeling device, 20.
... Peeling powder receiver, 21 ... Cooling device, 22 -
24... Roll for bending, 25, 26...
...Leaked evaporated metal, 27,28... Massive deposits.

Claims (1)

【特許請求の範囲】 1 鋼帯等の長尺の金属材料に真空中でZn,Al等の
金属を連続的に蒸着するための装置において、蒸着室内
の蒸発用ルツボの上端部と該ルツボ上を通過する鋼帯の
端部とで形成されるクリアランスを覆うように移動式の
漏洩蒸発金属のコレクタ板を設け、該コレクタ板を差圧
室を経て大気中に導き大気中にて該コレクタ板に付着し
た蒸着金属を剥離除去した後再び差圧室を経て蒸着室に
連続的に導入するための装置を設けたことを特徴とする
連続真空蒸着装置。 2 大気中に導かれた前記コレクタ板を大気中にて冷却
するための装置を設けたことを特徴とする上記特許請求
の範囲1記載の装置。 3 蒸発用ルツボ上端に被蒸着物の幅方向に対して移動
可能な遮蔽板を設け、被蒸着物の幅に応じて遮蔽板の位
置を調節するための装置を設けたことを特徴とする上記
特許請求の範囲1記載の装置。
[Scope of Claims] 1. In an apparatus for continuously vapor depositing a metal such as Zn or Al on a long metal material such as a steel strip in vacuum, the upper end of an evaporation crucible in a vapor deposition chamber and the top of the crucible A movable leakage evaporation metal collector plate is provided so as to cover the clearance formed by the end of the steel strip passing through the collector plate, and the collector plate is introduced into the atmosphere through a differential pressure chamber. 1. A continuous vacuum evaporation apparatus comprising a device for peeling off and removing evaporated metal adhering to the evaporation chamber and then continuously introducing the metal into the evaporation chamber through a differential pressure chamber. 2. The apparatus according to claim 1, further comprising a device for cooling the collector plate introduced into the atmosphere in the atmosphere. 3. The above, characterized in that a shielding plate movable in the width direction of the object to be evaporated is provided at the upper end of the evaporation crucible, and a device for adjusting the position of the shielding plate according to the width of the object to be evaporated is provided. The device according to claim 1.
JP11842378A 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment Expired JPS6059992B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11842378A JPS6059992B2 (en) 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11842378A JPS6059992B2 (en) 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment

Publications (2)

Publication Number Publication Date
JPS5544580A JPS5544580A (en) 1980-03-28
JPS6059992B2 true JPS6059992B2 (en) 1985-12-27

Family

ID=14736265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11842378A Expired JPS6059992B2 (en) 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment

Country Status (1)

Country Link
JP (1) JPS6059992B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS569367A (en) * 1979-06-30 1981-01-30 Nippon Steel Corp Production of one-side plated metal plate by vacuum evaporation

Also Published As

Publication number Publication date
JPS5544580A (en) 1980-03-28

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