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JPS606553B2 - semiconductor light emitting device - Google Patents
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JPS606553B2 - semiconductor light emitting device - Google Patents

semiconductor light emitting device

Info

Publication number
JPS606553B2
JPS606553B2 JP10399377A JP10399377A JPS606553B2 JP S606553 B2 JPS606553 B2 JP S606553B2 JP 10399377 A JP10399377 A JP 10399377A JP 10399377 A JP10399377 A JP 10399377A JP S606553 B2 JPS606553 B2 JP S606553B2
Authority
JP
Japan
Prior art keywords
optical transmission
electrodes
semiconductor
layer
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10399377A
Other languages
Japanese (ja)
Other versions
JPS5437596A (en
Inventor
哲夫 堀松
勝 佐々木
洋介 古田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10399377A priority Critical patent/JPS606553B2/en
Publication of JPS5437596A publication Critical patent/JPS5437596A/en
Publication of JPS606553B2 publication Critical patent/JPS606553B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/0622Controlling the frequency of the radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Semiconductor Lasers (AREA)

Description

【発明の詳細な説明】 本発明は、レーザ発振波長が電気的制御により変化する
波長可変半導体発光装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a wavelength tunable semiconductor light emitting device in which a laser oscillation wavelength is changed by electrical control.

普通のダブルヘテロ型半導体レーザは第1図に示す構造
をしている。この図で1および2はストリップ線路状電
極、3〜6は該電極間に挟まれた半導体の各層で例えば
3はp型GaAs層、4はp型GaAI瓜層、5はn型
CanAs層、6はn型Ga船層である。第2図はこの
半導体素子を上方つまり電極1側から見た状態を示す。
レーザ発振をさせるには順バイアスつまり電極1に電極
2より正の電位を与え、層4と5から成るp−n接合に
順方向電流を流し、小数キャリャの注入を行なう。こう
して電子ホール対が発生し、その再結合により発光する
訳であるが、この時電極1は電流をその幅Wの幅で電極
2へ向って流すと同時に、光もこの電極下にとじ込める
役割りをしている。つまり光は層4のWの中にとじ込め
られ、レーザ発振を行なう。このレーザ装置は両端の面
7と面8のへき開面を反射鏡として使い、この2面の反
射鏡により共振器が構成される。そして出力光は面7あ
るいは面8、または面7,面8の両面からとり出す。こ
の普通のレーザの縦モードは第3図に示すスペクトルを
持つが、これは面7と面8の間隔Lと次式の関係がある
A common double hetero type semiconductor laser has a structure shown in FIG. In this figure, 1 and 2 are strip line electrodes, 3 to 6 are semiconductor layers sandwiched between the electrodes, for example, 3 is a p-type GaAs layer, 4 is a p-type GaAI melon layer, 5 is an n-type CanAs layer, 6 is an n-type Ga carrier layer. FIG. 2 shows this semiconductor element viewed from above, that is, from the electrode 1 side.
In order to cause laser oscillation, a forward bias is applied, that is, a more positive potential is applied to electrode 1 than to electrode 2, a forward current is caused to flow through the pn junction consisting of layers 4 and 5, and fractional carriers are injected. In this way, electron-hole pairs are generated and light is emitted due to their recombination. At this time, electrode 1 has the role of allowing current to flow with a width W toward electrode 2, and at the same time, light is also confined below this electrode. I'm doing a lot of work. In other words, the light is confined within the W of the layer 4 and performs laser oscillation. This laser device uses the cleavage planes of surfaces 7 and 8 at both ends as reflecting mirrors, and these two reflecting mirrors constitute a resonator. Then, the output light is extracted from the surface 7 or the surface 8, or from both the surfaces 7 and 8. The longitudinal mode of this ordinary laser has a spectrum shown in FIG. 3, which is related to the distance L between the surfaces 7 and 8 as shown in the following equation.

q壕=L‐‐側仙 △^=錆△q・・小■ q=1、2、3”“”… ここでqは縦モード数、^は発振波長、nは導波路の屈
折率である。
q trench = L--Lateral △^ = Rust △ q... Small ■ q = 1, 2, 3''''... Here, q is the number of longitudinal modes, ^ is the oscillation wavelength, and n is the refractive index of the waveguide. be.

スペクトル間隔△^は■式で示されるように、共振器長
Lに反比例する。また屈折率nが変化すれば{1}式よ
り発振波長^が、また{2}式よりスペクトル間隔△入
が変化する事がわかる。この事を使って波長可変レーザ
が構成できる。本発明はか〉る点に着目したものであっ
て、その特徴はpn接合を持つ半導体の該pn接合面と
平行な一面に共通電極をまた他面に一対の電極を取付け
てこれらの電極と共通電極の間に一対の平行ストリップ
線路状の光伝送路を形成させ、これらの光伝送路の両端
の半導体へき開面間距離を不等にして光学的に結合する
該一対の光伝送路の長さを異ならせ、前記電極間に電圧
を加えて一方の光伝送路でレーザ発振を生じさせそして
他方の光伝送路の屈折率を電気的に制御して出力光の波
長を変化させるようにしてなる点にある。
The spectral interval △^ is inversely proportional to the resonator length L, as shown by the equation (2). Furthermore, it can be seen that if the refractive index n changes, the oscillation wavelength ^ changes from equation {1}, and the spectral interval Δin changes from equation {2}. Using this fact, a wavelength tunable laser can be constructed. The present invention focuses on the above point, and its feature is that a common electrode is attached to one surface parallel to the pn junction surface of a semiconductor having a pn junction, and a pair of electrodes are attached to the other surface, and these electrodes are connected to each other. A pair of parallel strip line-shaped optical transmission paths are formed between common electrodes, and the distances between semiconductor cleavage planes at both ends of these optical transmission paths are unequal, and the lengths of the pair of optical transmission paths are optically coupled. By applying a voltage between the electrodes to cause laser oscillation in one optical transmission line, and electrically controlling the refractive index of the other optical transmission line, the wavelength of the output light is changed. It is at the point where it becomes.

以下実施例を参照しながらこれを詳細に説明する。第4
図は本発明の実施例を縦断面で示し、第5図はその平面
図を示す。
This will be explained in detail below with reference to Examples. Fourth
The figures show an embodiment of the invention in longitudinal section, and FIG. 5 shows a plan view thereof.

これらの図に示すように本装置は第1図の霞極竃に対応
する電極は平行な2つのストリップ線路状電極9,ID
とし、電極2に対する電極は広中の共通電極11とし、
これらの電極の間にp型Ga偽層1 8、p型GaAI
As層15、n型GaAI瓜層16、n型Ga船層17
からなる半導体を介在させる。このようにすれば前述の
理由で電極9,10の中W,,W2および長さL,,L
2の半導体領域とその両端の電極からなる2つのレーザ
素子が中W3の半導体領域を介して並設されたレーザ装
置が得られる。なお本例ではL<L2、W,=W2であ
る。本発明ではその一方、例えば電極9を有する側を順
バィアスしてレーザ素子として動作させ、他方の電極1
0を有する側は逆バィアスしてレーザ素子としては動作
せず単なる光伝送路とする。
As shown in these figures, this device has two parallel strip-line electrodes 9, ID, which correspond to the haze electrodes shown in FIG.
and the electrode for electrode 2 is Hironaka's common electrode 11,
Between these electrodes there is a p-type Ga pseudolayer 18, a p-type GaAI
As layer 15, n-type GaAI melon layer 16, n-type Ga layer 17
interpose a semiconductor consisting of In this way, for the reason mentioned above, the inside of the electrodes 9 and 10 W, , W2 and the length L, , L
A laser device is obtained in which two laser elements each consisting of a semiconductor region W3 and electrodes at both ends are arranged side by side with a semiconductor region W3 in between. Note that in this example, L<L2, W,=W2. In the present invention, one of them, for example, the side having the electrode 9, is forward-biased to operate as a laser element, and the other electrode 1
The side having 0 is reverse biased so that it does not operate as a laser element and serves as a mere optical transmission line.

両素子の間に介在する中W3の半導体領域は両素子の光
伝送路を結合させる光ガイドとなる。そして電極9,1
0‘こ加える電圧は異なるからその短絡を防ぐため、層
18は2つに分離して間に空隙を介在させ、層15は、
中W3、深さは層15を貫通して層16に対する迄イオ
ン打込みなどにより絶縁物化(真性半導化)する。この
装置で電極9には電極11に対して正の電位を、電極1
0‘こは電極11に対して負の電位を与えると、層15
の中W,の部分12においては層15,16からなるp
n接合(層15をn型CanAsとして層18,15で
pn接合を作ってもよい)に順方向電流が流れてレーザ
発振を生じ、一方層15の中W2の部分13では層15
,16(又は層18,15)からなるpn接合は逆方向
にバイアスされ、半導体中の不純物濃度を適当に選ぶ事
によりp−n接合によってできる空乏層が光のガイド層
となる部分13の中に伸びていく。
The middle semiconductor region W3 interposed between both elements serves as a light guide that couples the optical transmission paths of both elements. and electrodes 9,1
Since the applied voltages are different, in order to prevent short circuits, the layer 18 is separated into two parts with a gap between them, and the layer 15 is
In the middle W3, the layer 15 is made into an insulator (intrinsic semiconductor) by ion implantation to a depth that penetrates the layer 15 and reaches the layer 16. In this device, a positive potential is applied to electrode 9 with respect to electrode 11, and electrode 1 is applied with a positive potential relative to electrode 11.
0' When a negative potential is applied to the electrode 11, the layer 15
In the middle W, the part 12 consists of layers 15 and 16.
A forward current flows through the n-junction (layer 15 may be made of n-type CanAs and a pn junction may be formed with layers 18 and 15), causing laser oscillation, while in the portion W2 inside layer 15, layer 15
, 16 (or layers 18, 15) is biased in the opposite direction, and by appropriately selecting the impurity concentration in the semiconductor, the depletion layer formed by the p-n junction becomes a light guide layer in the portion 13. It grows to.

第7図はこの状態を示し、13aが光伝送路13の空乏
層となった部分、13bは空乏層にはならない通常部分
である。これらの領域12,13は層15の前記絶縁物
化したそして光ガイドとなる領域14で光学的に結合さ
れるので、このレーザ装置は分布結合する2本の光伝送
路12,13を持ち、しかもそれらの長さL,,−が異
なる、従って共振周波数の異なる二つの共振器を持つ複
合共振器レーザとなる。従ってこのレーザ装置の縦モー
ドは第6図に示す如くなる。
FIG. 7 shows this state, where 13a is a portion that becomes a depletion layer of the optical transmission line 13, and 13b is a normal portion that does not become a depletion layer. These regions 12, 13 are optically coupled by the insulating region 14 of the layer 15, which serves as a light guide, so that this laser device has two optical transmission paths 12, 13 with distributed coupling. This results in a composite resonator laser having two resonators whose lengths L, , - are different, and therefore whose resonance frequencies are different. Therefore, the longitudinal mode of this laser device is as shown in FIG.

第6図のaは領域12側の、bは領域13側のレーザ素
子のスペクトル特性を示し「L三−であるから光伝送路
12に関する縦モード間隔△入,と導波路13に関する
縦モ−ド間隔A入2は異なり、L.<L2のとき△入,
>△入2である。2つの共振器を持つ半導体レーザ装置
は2つの共振周波数が一致した周波数で発振するから、
第6図に示すように波長入川 ^aで2つの共振器の共
振周波数が一致すれば、このレーザ装置の出力光の波長
は^,.(=^2,)となる。
In FIG. 6, a shows the spectral characteristics of the laser element on the region 12 side, and b shows the spectral characteristics of the laser element on the region 13 side. The dot spacing A in 2 is different, and when L.<L2, △ in,
>△ entered 2. A semiconductor laser device with two resonators oscillates at a frequency where the two resonance frequencies match.
As shown in Fig. 6, if the resonant frequencies of the two resonators match at wavelength ^a, the wavelength of the output light of this laser device will be ^, . (=^2,).

このレーザ装置は電気的に発振波長を変化させることが
できる。次にこの発振波長を変化する方法について述べ
る。第4図における領域13の電極1川こ逆方向電圧を
かけていくと、前述のようにp−n接合面から光伝送路
13の中に空乏層が広がり、光伝送路13は2層13a
,13Mこ分かれ、電圧を大にしてゆくとこの部分13
aが拡がってゆく。屈折率はキャリャ数によって変化す
るので結晶の方向を適当に選んでおくと空乏層の広がっ
た部分13aの屈折率n,′は空乏層ではない部分13
bの屈折率n,より大になる。従って光伝送路13の中
を伝搬する光にとっては屈折率が変るので、前記‘1}
、‘2ー式から明らかなようにスペクトルの波長入2,
、入22……および間隔△入2が変化する。その結果「
^,.(=入2,)で発振していたものが入a、入2
2、^鱗、入24がそろって長波長側へ動き「その間隔
も変ることにより、入,.ミ入のとなり、適当な逆方向
電圧で^,2=入22となる。従って、このレーザは^
,2の波長で発振する。さらに電圧を上げていくと、適
当な電圧で入,3=^23あるいは^,4=^24とな
り、電圧変化にともない発振波長は次々と移っていく。
このように、この半導体レーザの発振波長は1つの共振
器の共振条件を変える事によりそれを変化させるのでは
なく、2つの共振器の共振周波数の一致した周波数で発
振させ、一方の共振器の共振条件を変える事により、一
致する共振周波数を次々と不連続的に変化させる点に特
徴がある。
This laser device can electrically change the oscillation wavelength. Next, a method for changing this oscillation wavelength will be described. When a reverse voltage is applied to the electrode 1 of region 13 in FIG.
, 13M, and as the voltage is increased, this part 13
a expands. The refractive index changes depending on the number of carriers, so if the direction of the crystal is selected appropriately, the refractive index n,' of the part 13a where the depletion layer is expanded will be the same as the part 13 that is not a depletion layer.
The refractive index n of b becomes larger. Therefore, the refractive index changes for the light propagating in the optical transmission line 13, so the above '1}
, '2 - As is clear from equation 2, the wavelength input of the spectrum is 2,
, input 22... and the interval △ input 2 change. the result"
^,. What was oscillating at (= input 2,) is now input a, input 2
2, ^ scales and input 24 all move toward the long wavelength side, and the interval between them also changes, resulting in input, .mi input, and with an appropriate reverse voltage, ^, 2 = input 22. Therefore, this laser Ha^
, 2 wavelengths. When the voltage is further increased, the voltage turns on at an appropriate voltage, 3=^23 or ^,4=^24, and the oscillation wavelength shifts one after another as the voltage changes.
In this way, the oscillation wavelength of this semiconductor laser is not changed by changing the resonance conditions of one resonator, but by oscillating at the same resonant frequency of two resonators, and changing the oscillation wavelength of one resonator. The feature is that by changing the resonance conditions, the matching resonance frequencies are changed discontinuously one after another.

従来の1共振器型のレーザではしーザ装置自体で発振波
長を変えるという事は殆んど行なわれておらず、必要な
ら外部で変えるという方法をとるのが普通である。また
レーザ装置自体で発振波長を変えるとその変化範囲は非
常に小さく、例えば屈折率変化では0.7A程度しか変
らない。この点本発明ではほゞスペクトル間隔△^(3
〜10A)のステップで変えることができ、従来方式の
半導体レーザに比べて波長変化範囲が広くとれ、また外
部機構により波長を変化する方式に比べ、4・型でしか
も低電圧、低電力で動作させられるという点において、
非常に有利である。このレーザ装置では出力を検出して
電極1川こ帰還を加えることにより発振波長を安定化す
ることができる。
In conventional single-resonator lasers, the oscillation wavelength is rarely changed by the laser device itself, and it is common practice to change the wavelength externally if necessary. Furthermore, when the oscillation wavelength is changed in the laser device itself, the range of change is very small; for example, when changing the refractive index, the change is only about 0.7A. In this respect, in the present invention, the spectral interval is approximately △^(3
The wavelength can be changed in steps of ~10A), allowing for a wider wavelength change range than conventional semiconductor lasers, and compared to methods that change the wavelength using an external mechanism, it is a 4-inch device and operates at low voltage and power. In terms of being forced to
Very advantageous. In this laser device, the oscillation wavelength can be stabilized by detecting the output and adding feedback from one electrode.

また電極10に加える電圧を変えて発振波長を変えるこ
とにより時分割多重通信を簡単に行なうことができる。
なお図示実施例ではしーザ素子として動作する部分9,
11,15〜18の−側にのみ複合共振器の一方をなす
部分10,11,15〜18を設けたが、これはしーザ
素子部分の池側にも複合共振器の一方をなす部分を設け
てもよい。
Further, by changing the voltage applied to the electrode 10 and changing the oscillation wavelength, time division multiplex communication can be easily performed.
In the illustrated embodiment, the portion 9 that operates as a laser element,
Portions 10, 11, 15 to 18 forming one side of the composite resonator are provided only on the negative side of 11, 15 to 18; may be provided.

また屈折率の変更には空乏層を利用したが、これはキャ
リャ注入の他の電気手段を用いてもよい。
Further, although the depletion layer is used to change the refractive index, other electrical means of carrier injection may also be used.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の半導体レーザの斜視図、第2図はその平
面図、第3図はスペクトル特性図、第4図は本葬明の半
導体レーザの実施例を示す概略断面図、第5図はその平
面図、第6図はスペクトル特性図、第7図は動作説明用
の概略部分断面図である。 図面で12,13は光伝送路、11は共通電極、9,1
0は一対のストリップ線路状電極、14は電気的絶縁層
で光学的導体層の部分である。 第1図第2図 第3図 第4図 第5図 第6図 第7図
Fig. 1 is a perspective view of a conventional semiconductor laser, Fig. 2 is a plan view thereof, Fig. 3 is a spectral characteristic diagram, Fig. 4 is a schematic cross-sectional view showing an example of Honsomei's semiconductor laser, and Fig. 5 6 is a spectral characteristic diagram, and FIG. 7 is a schematic partial sectional view for explaining the operation. In the drawing, 12 and 13 are optical transmission lines, 11 is a common electrode, and 9 and 1
0 is a pair of strip line electrodes, and 14 is an electrically insulating layer that is part of an optical conductor layer. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7

Claims (1)

【特許請求の範囲】[Claims] 1 pn接合を持つ半導体の該pn接合面と平行な一面
に共通電極をまた他面に一対の電極を取付けてこれらの
電極と共通電極の間に一対の平行ストリツプ線路状の光
伝送路を形成させ、これらの光伝送路の両端の半導体へ
き開面間距離を不等にして、光学的に結合する該一対の
光伝送路の長さを異ならせ、前記電極間に電圧を加えて
一方の光伝送路でレーザ発振を生じさせそして他方の光
伝送路の屈折率を電気的に制御して出力光の波長を変化
させるようにしてなることを特徴とする波長可変型半導
体発光装置。
1. Attach a common electrode to one surface parallel to the pn junction surface of a semiconductor having a pn junction and a pair of electrodes to the other surface to form a pair of parallel strip line-shaped optical transmission paths between these electrodes and the common electrode. The distances between the semiconductor cleavage planes at both ends of these optical transmission lines are made unequal, the lengths of the pair of optical transmission lines to be optically coupled are made different, and a voltage is applied between the electrodes to cause one of the optical A wavelength tunable semiconductor light emitting device characterized in that the wavelength of output light is changed by generating laser oscillation in a transmission path and electrically controlling the refractive index of the other optical transmission path.
JP10399377A 1977-08-30 1977-08-30 semiconductor light emitting device Expired JPS606553B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10399377A JPS606553B2 (en) 1977-08-30 1977-08-30 semiconductor light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10399377A JPS606553B2 (en) 1977-08-30 1977-08-30 semiconductor light emitting device

Publications (2)

Publication Number Publication Date
JPS5437596A JPS5437596A (en) 1979-03-20
JPS606553B2 true JPS606553B2 (en) 1985-02-19

Family

ID=14368811

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10399377A Expired JPS606553B2 (en) 1977-08-30 1977-08-30 semiconductor light emitting device

Country Status (1)

Country Link
JP (1) JPS606553B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6287654U (en) * 1985-11-20 1987-06-04
JPS6446484A (en) * 1987-08-13 1989-02-20 Nohmi Bosai Kogyo Co Ltd Link mechanism of sprinkler head

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445218A (en) * 1981-09-28 1984-04-24 Bell Telephone Laboratories, Incorporated Semiconductor laser with conductive current mask
JPS6362388A (en) * 1986-09-03 1988-03-18 Hitachi Ltd Semiconductor laser device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6287654U (en) * 1985-11-20 1987-06-04
JPS6446484A (en) * 1987-08-13 1989-02-20 Nohmi Bosai Kogyo Co Ltd Link mechanism of sprinkler head

Also Published As

Publication number Publication date
JPS5437596A (en) 1979-03-20

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