JPS606920B2 - Gallium arsenide single crystal production equipment - Google Patents
Gallium arsenide single crystal production equipmentInfo
- Publication number
- JPS606920B2 JPS606920B2 JP19776082A JP19776082A JPS606920B2 JP S606920 B2 JPS606920 B2 JP S606920B2 JP 19776082 A JP19776082 A JP 19776082A JP 19776082 A JP19776082 A JP 19776082A JP S606920 B2 JPS606920 B2 JP S606920B2
- Authority
- JP
- Japan
- Prior art keywords
- support rod
- crucible
- melt
- blind tube
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 title claims description 43
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 title claims description 26
- 229910001218 Gallium arsenide Inorganic materials 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000002994 raw material Substances 0.000 claims description 20
- 239000000155 melt Substances 0.000 claims description 8
- 238000003860 storage Methods 0.000 claims description 6
- 229910052785 arsenic Inorganic materials 0.000 claims description 5
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 description 12
- 238000007789 sealing Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 241000219112 Cucumis Species 0.000 description 2
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 2
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000005068 transpiration Effects 0.000 description 2
- 229910011255 B2O3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
【発明の詳細な説明】
この発明は高品質半絶縁性ガリウム砥素GaAs単結晶
の製造装置に関し、更に詳しくは、原料溶融液中に枇素
ぶ蒸気を吹込む手段を備えたGaAs単結晶の製造装置
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for producing high-quality semi-insulating gallium arsenide GaAs single crystals, and more specifically, the present invention relates to an apparatus for producing high-quality semi-insulating gallium arsenide GaAs single crystals, and more specifically, a production apparatus for producing GaAs single crystals equipped with means for blowing steam into a raw material melt. Regarding manufacturing equipment.
m−V族化合物の中でもGaAsは電子移動度が大きく
、高速集積回路、光、電子素子用材料に広く用いられつ
つある。Among m-V group compounds, GaAs has a high electron mobility and is being widely used as a material for high-speed integrated circuits, optics, and electronic devices.
このようにGaASが注目を浴びているのは高品質のG
a偽の比抵抗が1び○伽以上と高絶縁性であること、結
晶内の欠陥が少く、分布が均一であるものが得られるこ
と、大型ウヱハーの製造が容易であること等が挙げられ
る。このような要求を満すGaAs単結晶の製造方法と
しては液体封止引き上げ法(LEC法)が挙げられる。
この液体封止引き上げ法は低圧封止引き上げ法と高圧封
止引き上げ法とがある。低圧封止引き上げ法は予じめボ
ート成長法で作成したSi等の不純物を含むGaAs多
結晶を原料として単結晶とするため、半絶縁性とするに
はクロムの添加を必要とし、好ましくない。また原料を
直接合成する高圧封止引き上げ法はクロムの添加は不要
であるが、原料であるGaとぶ及び封止剤である&03
をルツボに入れて高圧下で加熱、合成する際に蒸気圧の
低いAsが多く蒸散する。従って、所望の組成比のGa
As溶融液を得るために粕の添加量を多くしているが、
条件によって偽の蒸散する量が異なり、溶融液中のGa
船組成比にばらつきが生じて、高品質の無添加(アンド
ーブ)Ca笛単結晶を再現性よく得ることは困難であっ
た。この発明の目的は高品質の半絶縁性無添加Ga公単
結晶を再現性よく製造することのできる単結晶製造装置
を提供する。GaAS is attracting attention because of its high quality G.
A: It has high insulation properties with a false resistivity of 1 or more, it has few defects in the crystal and has a uniform distribution, and it is easy to manufacture large wafers. . A method for manufacturing GaAs single crystals that satisfies such requirements is the liquid confinement pulling method (LEC method).
This liquid sealing pulling method includes a low pressure sealing pulling method and a high pressure sealing pulling method. The low-pressure sealing pulling method uses a GaAs polycrystal containing impurities such as Si, which is prepared in advance by a boat growth method, as a single crystal as a raw material, and therefore requires the addition of chromium to make it semi-insulating, which is not preferable. In addition, the high-pressure sealed pulling method that directly synthesizes the raw materials does not require the addition of chromium, but the raw material Ga and the sealant &03
When put into a crucible and heated under high pressure for synthesis, a large amount of As, which has a low vapor pressure, transpires. Therefore, Ga of the desired composition ratio
Although the amount of lees added is increased to obtain As molten liquid,
The amount of false transpiration varies depending on the conditions, and the amount of Ga in the melt
Due to variations in the vessel composition ratio, it has been difficult to obtain high-quality additive-free (undoved) Ca whistle single crystals with good reproducibility. An object of the present invention is to provide a single crystal manufacturing apparatus capable of manufacturing a high quality semi-insulating additive-free Ga common single crystal with good reproducibility.
このため、この発明による単結晶製造装置においては、
ルッボ内の結晶原料熔融液に瓜蒸気を吹込む手段を備え
、原料合成中にASの不足を見出すと、原料客融液に直
接As蒸気の吹込みを行って、所定のGaAs組成比に
調整し、しかる後に結晶成長を行うようにする。Therefore, in the single crystal manufacturing apparatus according to the present invention,
Equipped with a means for blowing melon steam into the crystal raw material melt in Rubbo, if a shortage of AS is found during raw material synthesis, As vapor is directly blown into the raw material melt to adjust the GaAs composition ratio to a predetermined value. After that, crystal growth is performed.
従って、常に高品質のGaAs単結晶が再現性良く得ら
れることになる。先ず、結晶原料容融液中のGaAs組
成比の測定方法について、本発明者らが提案した方法を
第1図により説明すると、高圧容器1内にはその外周を
炭素材料等の支持部材4で覆れた石英、窒化ボロン等の
ルッボ3を設け、このルッボ3を回転支持軸6により回
転できるように支持し、ルツボ3の周囲にはヒーター2
を設けて、ルッボを所定の温度に加熱、維持する。Therefore, high quality GaAs single crystals can always be obtained with good reproducibility. First, the method proposed by the present inventors for measuring the GaAs composition ratio in the crystal raw material melt will be explained with reference to FIG. A covered rubbo 3 made of quartz, boron nitride, etc. is provided, and this rubbo 3 is rotatably supported by a rotation support shaft 6.A heater 2 is placed around the crucible 3.
is installed to heat and maintain Rubbo at a predetermined temperature.
ルッボ3の上部には下端に種結晶9を取付けた導電性の
引き上げ軸5を設け、この引き上げ軸は回転すると共に
上下動するように構成されている。そして、ルッボの支
持部材4と種結晶引き上げ軸5にはリード線10,11
をそれぞれ接続する。ルッボ3内には結晶材料としてG
a,As及び高圧封止剤として酸化ボロンB03を所定
量入れ、不活性ガスで容器内を加圧し、ヒータにて原料
の溶融点以上の温度で加熱し、ルッポ内の原料が溶融し
たら引き上げ軸5を下降させ種結晶9をルッボ3内の原
料熔融液7と接触させる。このような状態で、リード線
10,11を介してルツボ支持体4と引き上げ軸5に電
源12より交流電圧を印加すると、GaAs溶融液は抵
抗体と見倣され、ルッボは絶縁体のためコンデンサーを
構成することにより、電流計13には原料溶融液の抵抗
値に対応する電流値が表示されることになる。A conductive pulling shaft 5 with a seed crystal 9 attached to the lower end is provided on the upper part of Rubbo 3, and this pulling shaft is configured to rotate and move up and down. Lead wires 10 and 11 are connected to the Rubbo support member 4 and the seed crystal pulling shaft 5.
Connect each. Inside Rubbo 3, there is G as a crystal material.
A, As, and a predetermined amount of boron oxide B03 as a high-pressure sealant are put in, the inside of the container is pressurized with an inert gas, and heated with a heater to a temperature higher than the melting point of the raw material. When the raw material in the Luppo melts, the pulling shaft is removed. 5 is lowered to bring the seed crystal 9 into contact with the raw material melt 7 in the rubbo 3. In this state, when an AC voltage is applied from the power supply 12 to the crucible support 4 and the pulling shaft 5 via the lead wires 10 and 11, the GaAs melt is treated as a resistor, and since the crucible is an insulator, it becomes a capacitor. By configuring this, the ammeter 13 displays a current value corresponding to the resistance value of the raw material melt.
上記の電流値はルツボ内に溶融しているGaAsの組成
比によって変る。The above current value changes depending on the composition ratio of GaAs melted in the crucible.
一例として、ルッボを約126000で加熱した時のG
aAsの組成比と電流値の関係は第2図に示すように、
Gaが約51.3%、Asが48.7%の組成比の時に
最大電流値を示し、それより船が増加すると電流値は急
激に減少する。通常高品質の単結晶を得るための溶融液
中のGaとAsの組成比は50%±0.2の範囲といわ
れており、溶融液のGaAsの組成比を調整して電流値
が0.27〜0.3hAの範囲(図中の点線で示す範囲
)を指示したら、結晶引き上げ操作を行うことにより高
品質のGaAs単結晶が再現性よく得られることになる
。第3図は第1図に示した単結晶製造装置に本発明によ
るAs供給手段を設けた装置の断面図であって、高圧容
器1の上部側壁に開設した閉口部14に旨筒15の関口
端を気密に接続する。As an example, when Rubbo is heated to about 126,000 G
The relationship between the composition ratio of aAs and the current value is as shown in Figure 2.
The maximum current value is exhibited when the composition ratio is approximately 51.3% Ga and 48.7% As, and as the number of ships increases beyond that, the current value rapidly decreases. Normally, the composition ratio of Ga and As in the melt to obtain a high-quality single crystal is said to be in the range of 50%±0.2, and the current value can be adjusted to 0.2 by adjusting the composition ratio of GaAs in the melt. When a range of 27 to 0.3 hA (range indicated by the dotted line in the figure) is specified, a high quality GaAs single crystal can be obtained with good reproducibility by performing a crystal pulling operation. FIG. 3 is a cross-sectional view of the single crystal manufacturing apparatus shown in FIG. 1, which is equipped with an As supply means according to the present invention. Connect the ends airtight.
旨筒15内には先端が高圧容器1内に突入する支持棒1
8があり、支持棒先端には枇素収納容器16を固定し、
この支持榛の後端には永久磁石20を設ける。旨筒15
の外周面には環状の永久磁石19を舷合させ、この永久
磁石19は支持樟後端の磁石20と旨筒の壁部を挟んで
互に吸引し、永久磁石19を旨筒外周に沿って摺動させ
るとそれに伴って、支持棒18も旨筒内を前後に移動す
ることになる。この支持棒の保持、摺動方法は他の方法
によって行っても良い。上記容器16の支持棒の固定端
近傍にはパイプ17の一端を接続し、屈曲してその先端
は容器の前方に延び、支持棒が盲筒内を下降したときに
ルツボ3内の原料溶融液7に突込するように構成する。
容器の周面にはヒータ21を設け、容器内を加熱するよ
うに構成する。上述の容器、支持棒、旨筒は石英または
パイロリテック窒化ボロンで形成される。このような構
成の単結晶製造装置の使用方法を説明すると、収納容器
16内にはAsを予じめ装填し、環状磁石19により支
持棒18を上端に引き上げてト容器を関口部14内に待
機させる。Inside the cylinder 15 is a support rod 1 whose tip protrudes into the high pressure container 1.
8, and a phosphorus storage container 16 is fixed at the tip of the support rod.
A permanent magnet 20 is provided at the rear end of this support rod. Umatsutsu 15
An annular permanent magnet 19 is attached to the outer circumferential surface of the support rod, and this permanent magnet 19 and the magnet 20 at the rear end of the support rod are attracted to each other across the wall of the cylinder, and the permanent magnet 19 is moved along the outer circumference of the cylinder. When the support rod 18 is slid, the support rod 18 also moves back and forth within the cylinder. The support rod may be held and slid by other methods. One end of a pipe 17 is connected to the vicinity of the fixed end of the support rod of the container 16, and the pipe 17 is bent so that its tip extends toward the front of the container, so that when the support rod descends inside the blind cylinder, the raw material melt in the crucible 3 7.
A heater 21 is provided on the circumferential surface of the container to heat the inside of the container. The container, support rod, and tube described above are made of quartz or Pyrolitec boron nitride. To explain how to use the single crystal manufacturing apparatus having such a configuration, As is loaded into the storage container 16 in advance, and the support rod 18 is pulled up to the upper end by the annular magnet 19 to place the container into the entrance part 14. Make it standby.
ルッボ3内にGa,As,B203を入れ、所定の圧力
及び温度を維持して、ルッポ内の原料が溶融したら「種
結晶9を下降させ、GaAs溶融液7に接触させて、電
流値を測定する。測定した電流値よりAsが不足してい
ることが判明したら、盲筒15に隊合している環状磁石
19を下降さる。Ga, As, and B203 are put into the Lubbo 3, maintaining the predetermined pressure and temperature, and when the raw materials in the Lubbo are melted, the seed crystal 9 is lowered, brought into contact with the GaAs melt 7, and the current value is measured. If it is determined from the measured current value that As is insufficient, the annular magnet 19 aligned with the blind cylinder 15 is lowered.
その結果、容器16はルツボ3に近ずき、パイプ17の
先端はルッボ3内のGaAs溶融液7に突入することに
なる。高圧容器1内は船の融点以上の温度であるため「
As蒸気はパイプ先端より噴出しており、GaAs溶融
液中に兆が吹き込まれることになる。吹き込み量が不足
している場合はヒ−夕21‘こより容器16を更に積極
的に加熱することにより船蒸気の噴出量は増加する。ル
ッボ内のGaAs溶融液が所定の組成比に調整されたら
、容器16の加熱を停止し、支持棒の引き上げ操作を行
い、容器16を閉口部14に待機させ、種結晶9の回転
、引き上げ操作により通常の単結晶製造を行う。種結晶
をGa船溶融液に接触させて回転、引き上げ操作によっ
て、単結晶を製造する場合、原料溶融液のGaAsの組
成比は製造する単結晶の品質に大きな影響を与える。As a result, the container 16 approaches the crucible 3, and the tip of the pipe 17 plunges into the GaAs melt 7 inside the crucible 3. Because the temperature inside the high-pressure vessel 1 is higher than the melting point of the ship,
As vapor is ejected from the tip of the pipe, and is blown into the GaAs melt. If the amount of blown steam is insufficient, the amount of ship steam blown out is increased by further actively heating the container 16 from the heater 21'. When the GaAs melt in Rubbo is adjusted to a predetermined composition ratio, the heating of the container 16 is stopped, the support rod is pulled up, the container 16 is placed on standby in the closing part 14, and the seed crystal 9 is rotated and pulled up. Normal single crystal production is carried out by When a single crystal is produced by rotating and pulling a seed crystal in contact with a Ga vessel melt, the composition ratio of GaAs in the raw material melt has a large effect on the quality of the produced single crystal.
特にAsはGaに較べて蒸発温度が低く、高圧下で原料
を合成する際に、条件が少しでも変ると、合成した溶融
液のGa船組成比も微妙に変り、所望の組成比を有する
GaAs溶融液を再現性よく合成することは困難なこと
である。しかるに本発明によって、高圧容器内のGa船
溶融液にAsを供給することが可能となり、結晶引き上
げ操作前に溶融液の組成比の調整を行うので「高品質の
CaAs単結晶が再現性よく得られることになる。更に
原料合成中、或は結晶引き上げ中にも瓜収納容器に接続
したパイプよりAsが高圧容器内に噴射し、船が多量に
含む雰囲気を構成することになるが、この多量の松の存
在によって、原料溶融液或は成長中の単結晶表面よりA
sの蒸散を抑制し、単結晶の品質の向上に寄与する。な
お、明細書に記載のGaAs溶融液の組成比の測定法は
一例であって、他の測定法によって得られた結果に基い
て、本発明の装置により結晶原料溶融液へAsを供給し
、単結晶の製造ができることは言うまでもない。In particular, As has a lower evaporation temperature than Ga, and when the raw materials are synthesized under high pressure, if the conditions change even slightly, the Ga carrier composition ratio of the synthesized melt will change slightly, resulting in GaAs having the desired composition ratio. It is difficult to synthesize a melt with good reproducibility. However, with the present invention, it is possible to supply As to the Ga vessel melt in the high-pressure vessel, and the composition ratio of the melt is adjusted before the crystal pulling operation, making it possible to obtain high-quality CaAs single crystals with good reproducibility. Furthermore, during raw material synthesis or crystal pulling, As is injected into the high-pressure vessel from the pipe connected to the melon storage vessel, forming the atmosphere that the ship contains in large quantities. Due to the presence of the pine tree, A
It suppresses transpiration of s and contributes to improving the quality of single crystals. Note that the method for measuring the composition ratio of the GaAs melt described in the specification is just one example, and based on the results obtained by other measurement methods, As is supplied to the crystal raw material melt using the apparatus of the present invention, Needless to say, it is possible to manufacture single crystals.
第1図は溶融液中のGa船組成比の測定手段を備えた単
結晶製造装置の一例を示す断面図、第2図はGaAs組
成比と電流値の関係の一例を示すグラフ、第3図は本発
明による単結晶製造装置のふ供給手段の拡大断面図であ
る。
図中、1は高圧容器、2はヒーター、3はルツポ、5は
引き上げ軸、6は種結晶、7はGa偽溶融液、13は開
□部、14は旨筒、15はAs収納容器、16はパイプ
、17は支持棒、18,19は磁石、20はヒーターを
示す。
第1図
第2図
第3図Fig. 1 is a sectional view showing an example of a single crystal manufacturing apparatus equipped with a means for measuring the GaAs composition ratio in the melt, Fig. 2 is a graph showing an example of the relationship between the GaAs composition ratio and the current value, and Fig. 3 FIG. 2 is an enlarged cross-sectional view of the feed means of the single crystal manufacturing apparatus according to the present invention. In the figure, 1 is a high-pressure vessel, 2 is a heater, 3 is a receptacle, 5 is a pulling shaft, 6 is a seed crystal, 7 is a Ga pseudo melt, 13 is an opening, 14 is a cylinder, 15 is an As storage container, 16 is a pipe, 17 is a support rod, 18 and 19 are magnets, and 20 is a heater. Figure 1 Figure 2 Figure 3
Claims (1)
転ルツボと、該ルツボ上に下端を向け、この下端に種結
晶を取付けた回転且つ上下動可能な引き上げ軸を設け、
上記ルツボ中の原料が溶融したら引き上げ軸を下降し、
下端の種結晶を上記ルツボ内の溶融液に接触させて回転
、引き上げる単結晶製造装置において、 上記高圧容器
の上部側壁に開設した開口部に開口端を気密に接続して
盲筒を設け、該盲筒内にはその先端が上記高圧容器内に
突入する支持棒を収容し、また上記盲筒の外周と支持棒
には該支持棒を盲筒に沿って摺動させる手段を設け、更
に上記支持棒の先端にはその周面にヒータを設けた砒素
収納容器を固定し、また該砒素収納容器にはその先端を
上記ルツボに向けてパイプを突設したことを特徴とする
ガリウム砒素結晶製造装置。1. A rotating crucible that is heated by a heater to melt raw materials in a high-pressure container, and a pulling shaft that can rotate and move up and down with its lower end facing above the crucible and a seed crystal attached to the lower end,
Once the raw material in the crucible is melted, the pulling shaft is lowered,
In a single crystal manufacturing apparatus that rotates and pulls a seed crystal at the lower end in contact with the melt in the crucible, a blind tube is provided with the open end airtightly connected to an opening opened in the upper side wall of the high pressure container; A support rod whose tip extends into the high-pressure container is housed in the blind tube, and a means for sliding the support rod along the blind tube is provided on the outer periphery of the blind tube and the support rod, and a means for sliding the support rod along the blind tube is provided. Gallium arsenide crystal production characterized in that an arsenic storage container having a heater provided on its circumferential surface is fixed to the tip of the support rod, and a pipe is provided protruding from the arsenic storage container with its tip directed toward the crucible. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19776082A JPS606920B2 (en) | 1982-11-12 | 1982-11-12 | Gallium arsenide single crystal production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19776082A JPS606920B2 (en) | 1982-11-12 | 1982-11-12 | Gallium arsenide single crystal production equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5988394A JPS5988394A (en) | 1984-05-22 |
| JPS606920B2 true JPS606920B2 (en) | 1985-02-21 |
Family
ID=16379889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19776082A Expired JPS606920B2 (en) | 1982-11-12 | 1982-11-12 | Gallium arsenide single crystal production equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS606920B2 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6051697A (en) * | 1983-08-29 | 1985-03-23 | Hitachi Cable Ltd | Compound semiconductor manufacturing method |
| JPS6147630A (en) * | 1984-08-14 | 1986-03-08 | Agency Of Ind Science & Technol | Adjustment of n type carrier concentration distribution in gallium arsenic semiconductor |
| JPH0639355B2 (en) * | 1985-07-04 | 1994-05-25 | 日本電気株式会社 | Method for producing compound semiconductor single crystal |
| WO2001086033A1 (en) * | 2000-05-10 | 2001-11-15 | Memc Electronic Materials, Inc. | Method and device for feeding arsenic dopant into a silicon crystal growing process |
| JP5302556B2 (en) * | 2008-03-11 | 2013-10-02 | Sumco Techxiv株式会社 | Silicon single crystal pulling apparatus and silicon single crystal manufacturing method |
| JP5270996B2 (en) * | 2008-07-30 | 2013-08-21 | Sumco Techxiv株式会社 | Silicon single crystal pulling device |
| JP5329143B2 (en) * | 2008-07-30 | 2013-10-30 | Sumco Techxiv株式会社 | Silicon single crystal pulling device |
| JP5226496B2 (en) * | 2008-12-17 | 2013-07-03 | Sumco Techxiv株式会社 | Silicon single crystal pulling device |
| JP5410086B2 (en) * | 2008-12-19 | 2014-02-05 | Sumco Techxiv株式会社 | Silicon single crystal pulling device |
| JP5144546B2 (en) * | 2009-01-14 | 2013-02-13 | Sumco Techxiv株式会社 | Silicon single crystal pulling device |
| US8535439B2 (en) | 2009-01-14 | 2013-09-17 | Sumco Techxiv Corporation | Manufacturing method for silicon single crystal |
| CN113913920B (en) * | 2021-10-18 | 2024-05-03 | 北京工业大学 | AlGaAs single crystal preparation method and preparation device |
-
1982
- 1982-11-12 JP JP19776082A patent/JPS606920B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5988394A (en) | 1984-05-22 |
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