JPS6113366B2 - - Google Patents
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- Publication number
- JPS6113366B2 JPS6113366B2 JP11464179A JP11464179A JPS6113366B2 JP S6113366 B2 JPS6113366 B2 JP S6113366B2 JP 11464179 A JP11464179 A JP 11464179A JP 11464179 A JP11464179 A JP 11464179A JP S6113366 B2 JPS6113366 B2 JP S6113366B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- cobalt
- magnetic
- magnetic thin
- film
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Description
本発明は、耐蝕性に優れた被熱処理磁性薄膜の
製造方法に関する。
磁性薄膜は、コバルトを磁性材料とし、さらに
少なくとも1つ以上の非磁性層とともに構成され
た多層薄膜構造を有しており、真空蒸着法、イオ
ンプレーテイング法、スパツタリング法等の方法
によつて、高分子、ガラス、セラミツクス、金属
等の基板上に形成させたものである。
コバルトは、同じ遷移金属である鉄と同様に腐
蝕しやすい金属である。それ故、通常の方法、例
えば単純に蒸着させて得られたコバルト薄膜は錆
びやすいので、実用上、磁気テープとして用いる
ことができない。
本発明は、特に磁性材料としてコバルトを用い
る場合の腐蝕性を改善し、向上させたものであ
る。
一般に、磁性薄膜は、磁性層を単一に厚く形成
するよりも、非磁性層を基板と磁性層または磁性
層間に挾んだ多層膜にした方が、基板との付着強
度、磁気特性、電磁変換特性等が向上する。特
に、非磁性層が酸化物生成の標準自由エネルギー
の低い金属の場合には、特に電磁変換特性が向上
する。
一方、腐蝕性の面から見た場合、磁性層である
コバルトと非磁性層を組み合わせた時、非磁性層
が上記のように電磁特性に効果のある金属等の導
電性物質の場合には、コバルトと重ね合わせるこ
と、または接した構成にすることによつて、接触
起電力を生じ、一種の電池の作用によつて耐蝕性
の面から望ましくないことが起こる。
通常、コバルト金属を真空蒸着等の方法によつ
て高分子フイルム等の基板上に薄膜を形成させた
場合、純枠なコバルトからなるコバルト薄膜を形
成している。
このコバルト薄膜を、ホウ砂0.02M/とホウ
歳0.1M/を含む30℃の水溶液(以後、電解質
溶液と呼ぶ)に浸漬した時に浸漬してから1〜2
分後に、ほぼ純コバルトの自然電極電位である−
0.50V〜−0.55V付近の電位(飽和甘汞電極に対
して、以後、対.SCEと書く)を示す。
また、高分子フイルム等の上に、最初に銀を蒸
着し、次に上記のようにコバルトを蒸着させて、
多層構造とした場合も、電解質溶液に浸漬した場
合、コバルトのみの蒸着層と同じく、ほぼ純コバ
ルトの自然電極電位に1〜2分後に落ち着く。
この多層構造薄膜を、例えば100℃で熱処理す
ると、主にその表面が酸化されて電解質溶液に浸
漬した場合、その浸漬した瞬間は、−0.50Vより
プラスの電位を示すが、浸漬3分経過後はコバル
トと異種金属の組み合わせの違いによつて示す電
位が異なることもあるが、−0.20V以下の値しか
示さない。
ここで、電解質溶液は、1の蒸留水に0.02モ
ルのホウ砂と0.1モルのホウ酸を含む水溶液であ
り、窒素ガスで10分間程バブリング処理して、水
溶液中に溶解している酸素を窒素で置換した溶液
である。電解質溶液は、磁性薄膜を浸漬している
間撹拌せずに静置しておくものとする。
薄膜の電位を測定する場合、リード線として金
線を用い、導電性塗料で薄膜上に接触固定させ、
常温硬化樹脂で金線を固定して測定した。基板が
高分子フイルム等の場合は、試料をガラスプレパ
ラート上に常温硬化樹脂で数ケ所固定して試料が
動かないようにした。
一方、本発明の製造方法による磁性薄膜は、電
解質溶液に浸漬した時に、浸漬してから3分経過
後の被熱処理磁性薄膜の示す自然電極電位が飽和
甘汞電極に対して−0.20Vより正の電位を示すも
のである。
このように、−0.20Vより正の電位を示すコバ
ルトは、コバルト板等のコバルト金属を電解質溶
液中で陽極酸化処理することによつて得られるこ
ては公知である。
しかし、本発明のように減圧下、酸素雰囲気中
で作製したコバルト薄膜は、膜の厚さが数100〜
数1000Åであるので電解処理を行うと、電解質溶
液中に溶解して、薄膜形状を維持することが困難
になつたりする。
それ故、本発明の磁性薄膜は、陽極酸化のよう
な公知の方法によつて、コバルト薄膜の耐蝕性を
向上させるものではない。
本発明の製造方法による磁性薄膜は、陽極酸化
処理を施さずに、陽極酸化処理を施したものと同
様に、高い電位を示す薄膜であり、さらに熱処理
の効果によつて耐蝕性を向上させるものである。
陽極酸化処理は溶液中で形成されるが、本発明
の薄膜は、溶液中で形成されたものでないので、
高い電位を示す薄膜の組織等は、溶液中で形成し
たものとは異なつている点が多いものと思われ
る。
そして熱処理の効果は、以下のとおりである。
コバルトと非磁性層を組み合わせた場合、電極
変換特性に効果のある金属を非磁性層に用いた場
合等には、多層薄膜形成後無処理の状態におい
て、特にコバルトのみの薄膜より耐蝕性が悪くな
る傾向が強い。一方、この多層薄膜を熱処理する
と、熱処理したコバルトと同程度、またはさらに
耐蝕性がよくなるという著しい耐蝕性の向上を見
出したものである。
しかし、熱処理によつて、全部耐蝕性がよくな
るのではない。すなわち、熱処理後の磁性薄膜を
電解質溶液に浸漬した時に、浸漬してから3分経
過後に示す自然電極電位が飽和甘汞電極に対して
−0.20Vより正の電位を示す磁性薄膜が特に耐蝕
性に優れていたものである。
このように本発明の製造方法による薄膜は、コ
バルトを非磁性層、特に金属等を組み合わせた場
合、コバルトのみの薄膜より熱処理前は耐蝕性に
劣つていたが、熱処理後、自然電極電位(浸漬後
3分値、対、SCE)が、−0.20Vより正の電位を
示す薄膜は、コバルトと同程度、またはさらに耐
蝕性に優れた特徴をもつているものである。
また熱処理によつて、磁気特性が悪くなる傾向
は見られず、反対に経時変化を起こさない安定な
特性を示すようになつた。
なお、本発明で述べる非磁性層とは、強磁性を
示さない物質である。
コバルトと少なくとも1つ以上の非磁性層から
構成された多層薄膜構成とは、コバルトと非磁性
層とが接した構造を少なくとも1つ以上基板上に
有するものであればよい。
例えば、コバルト層をCとし、非磁性層を
A1,A2,A3,A4……とした場合の多層薄膜構成
の例として、A1/C,A1/A2/C,A1/C/
A1/C,A1/C/A2/C,A1/A2/C/C,
A1/C/A2/C/A3/C,……等である。
この場合、最外層をコバルト以外の金属、また
は適当な材料で被覆してもよい。しかしこの場合
には、コバルト面の自然電極電位を測定できな
い。このような場合には、最外層をコバルト以外
の材料で被覆する前に熱処理して、−0.20Vより
正の自然電極電位(浸漬後3分値、対、SCE)
を示す時はこのような磁性薄膜も本発明に含むも
のである。
第1図に一例として、ポリエチレンテレフタレ
ートフイルム上に第1層としてアルミニウム、第
2層としてコバルトを形成させた薄膜を110℃で
熱処理した後、電解質溶液中で測定した自然電極
電位の時間依存性を示した。
そして本発明の熱処理後の自然電極電位(浸漬
後3分値、対、SCE)が−0.2Vより正の電位を
示す薄膜は、次のようして得られた。
第2図に簡単に磁性薄膜の形成方法(装置)を
示した。ポリエステルフイルムに非磁性層として
例えば、チタンを蒸発させた。次に、コバルトを
入射角10゜以上、酸素導入下、ポリエステルフイ
ルムを連続的に走行させ電子ビームにより加熱蒸
発させて、コバルトの連続蒸着膜を得た。この磁
性薄膜を125℃の熱ローラに沿わせて連続的に加
熱処理を行つた。
なお第2図において、1は巻出しロール2から
キヤン3の周囲を経て巻取りリール4に巻取られ
る基板フイルム、5はコバルトの蒸発源、6はマ
スク、θは斜め蒸着する場合の入射角である。
減圧下での薄膜形成条件は、数多くの因子、例
えば、薄膜形成時の基板温度、真空度(排気速度
と導入ガス量との関係)、酸素導入量、結晶の形
成速度、蒸発物の基板への入射角依存性、蒸発炉
の加熱温度、電子ビームの加速電圧等に影響され
るが、特り本発明のように耐蝕性に優れた磁性膜
を得るには、酸素導入量、蒸発物の基板への入射
角、蒸発速度に特に大きく依存していることから
コバルトと酸素との反応系、結晶の形成系に深く
関係していることは明らかであつた。
コバルト薄膜は、熱処理前では非磁性層との組
み合わせによつて、コバルト単一よりも耐蝕性が
悪い傾向を示すが、熱処理後では、同等もしくは
さらに良くなる理由は明白ではないが、熱処理に
よつて自然電極電位の向上する割合が大きいもの
程錆びにくくなる傾向から、蒸着時に形成された
酸素との結び付きが熱処理によつてさらに安定化
されるものと思われる。
非磁性層との多層薄膜構成からなるコバルト磁
性薄膜の熱処理条件は、コバルト磁性薄膜の製造
条件に依存するが、例えばポリエステルフイルム
基板の場合、約90〜120℃で処理した場合、耐蝕
性が大幅によくなる。
熱処理温度は90℃以上で効果が大きいことか
ら、熱処理は90℃以上で行うものとする。
コバルトと各種の非磁性層からなる磁性薄膜を
60℃、90%RHの湿度雰囲気下において耐蝕試験
を行つた結果を次の表−1に示す。自然電極電位
(浸漬後3分値、対、SCE)が−0.20Vより正の
電位を示す磁性薄膜が特に耐蝕性に優れていた。
The present invention relates to a method for manufacturing a heat-treated magnetic thin film with excellent corrosion resistance. The magnetic thin film has a multilayer thin film structure composed of cobalt as a magnetic material and at least one non-magnetic layer, and is produced by a method such as a vacuum evaporation method, an ion plating method, or a sputtering method. It is formed on a substrate of polymer, glass, ceramics, metal, etc. Cobalt, like iron, a transition metal, is a metal that corrodes easily. Therefore, cobalt thin films obtained by conventional methods, such as simple vapor deposition, are susceptible to rust and cannot be practically used as magnetic tapes. The present invention improves and improves the corrosion resistance especially when cobalt is used as the magnetic material. In general, for magnetic thin films, it is better to form a multilayer film in which a non-magnetic layer is sandwiched between a substrate and a magnetic layer, or between magnetic layers, than to form a single thick magnetic layer. Conversion characteristics etc. are improved. In particular, when the nonmagnetic layer is a metal with a low standard free energy of oxide formation, the electromagnetic conversion characteristics are particularly improved. On the other hand, from the perspective of corrosion, when a magnetic cobalt layer and a non-magnetic layer are combined, and the non-magnetic layer is made of a conductive material such as a metal that has an effect on electromagnetic properties as described above, By superimposing or contacting cobalt, a contact electromotive force is generated, which is undesirable from a corrosion resistance point of view due to a kind of battery action. Usually, when a thin film of cobalt metal is formed on a substrate such as a polymer film by a method such as vacuum evaporation, a cobalt thin film made of pure cobalt is formed. This cobalt thin film was immersed in an aqueous solution at 30°C (hereinafter referred to as electrolyte solution) containing 0.02M/borax and 0.1M/borax.
After minutes, the natural electrode potential of nearly pure cobalt is −
Indicates a potential around 0.50V to -0.55V (hereinafter written as vs. SCE for a saturated electrode). Alternatively, silver is first vapor-deposited on a polymer film, etc., and then cobalt is vapor-deposited as described above.
Even in the case of a multilayer structure, when immersed in an electrolyte solution, it settles to the natural electrode potential of almost pure cobalt after 1 to 2 minutes, as in the case of a vapor-deposited layer of only cobalt. When this multilayer structure thin film is heat-treated at, for example, 100°C, its surface is mainly oxidized, and when it is immersed in an electrolyte solution, it exhibits a potential more positive than -0.50V at the moment of immersion, but after 3 minutes of immersion. Although the potential shown may differ depending on the combination of cobalt and different metals, it only shows a value of -0.20V or less. Here, the electrolyte solution is an aqueous solution containing 0.02 mol of borax and 0.1 mol of boric acid in 1 part distilled water, and is bubbled with nitrogen gas for about 10 minutes to remove the oxygen dissolved in the aqueous solution. This is a solution substituted with The electrolyte solution shall be left standing without stirring while the magnetic thin film is immersed. When measuring the potential of a thin film, a gold wire is used as a lead wire, and it is fixed in contact with the thin film using conductive paint.
The measurement was carried out by fixing the gold wire with a resin that hardens at room temperature. When the substrate was a polymer film or the like, the sample was fixed at several points on the glass preparation with a room-temperature curing resin to prevent the sample from moving. On the other hand, when the magnetic thin film produced by the manufacturing method of the present invention is immersed in an electrolyte solution, the natural electrode potential of the heat-treated magnetic thin film after 3 minutes of immersion is more positive than -0.20 V with respect to the saturated electrode. This shows the potential of As described above, it is known that cobalt having a potential more positive than -0.20 V can be obtained by anodizing a cobalt metal such as a cobalt plate in an electrolyte solution. However, the cobalt thin film produced in an oxygen atmosphere under reduced pressure as in the present invention has a thickness of several hundred to several hundred nanometers.
Since the thickness is several thousand Å, if electrolytic treatment is performed, it will dissolve in the electrolyte solution, making it difficult to maintain the thin film shape. Therefore, the magnetic thin film of the present invention does not improve the corrosion resistance of cobalt thin films by known methods such as anodic oxidation. The magnetic thin film produced by the manufacturing method of the present invention is a thin film that exhibits a high potential without being anodized, similar to the one that is anodized, and has improved corrosion resistance due to the effect of heat treatment. It is. Although anodizing is performed in a solution, the thin film of the present invention is not formed in a solution.
It is thought that the structure of a thin film exhibiting a high potential is different from that formed in a solution in many respects. The effects of heat treatment are as follows. When cobalt and a non-magnetic layer are combined, or when a metal that is effective in electrode conversion properties is used for the non-magnetic layer, corrosion resistance is worse than a thin film made of only cobalt, especially in the untreated state after forming a multilayer thin film. There is a strong tendency to On the other hand, it has been found that when this multilayer thin film is heat-treated, its corrosion resistance is significantly improved to the same level as that of heat-treated cobalt, or even better. However, heat treatment does not improve corrosion resistance in all cases. In other words, when the magnetic thin film after heat treatment is immersed in an electrolyte solution, the magnetic thin film whose natural electrode potential after 3 minutes of immersion is more positive than -0.20V with respect to the saturated electrode is particularly corrosion resistant. It was excellent in As described above, when the thin film produced by the manufacturing method of the present invention combines cobalt with a nonmagnetic layer, especially a metal, etc., the corrosion resistance was inferior to that of a thin film made of cobalt alone before heat treatment, but after heat treatment, the natural electrode potential ( A thin film whose 3-minute post-immersion value (vs. SCE) shows a potential more positive than -0.20 V has corrosion resistance comparable to or even better than that of cobalt. In addition, there was no tendency for the magnetic properties to deteriorate due to heat treatment, and on the contrary, they began to exhibit stable properties that did not change over time. Note that the nonmagnetic layer described in the present invention is a substance that does not exhibit ferromagnetism. The multilayer thin film structure composed of cobalt and at least one nonmagnetic layer may be any structure having at least one structure in which cobalt and a nonmagnetic layer are in contact with each other on the substrate. For example, the cobalt layer is C and the nonmagnetic layer is
As an example of a multilayer thin film structure in the case of A 1 , A 2 , A 3 , A 4 ..., A 1 /C, A 1 /A 2 /C, A 1 /C/
A 1 /C, A 1 /C/A 2 /C, A 1 /A 2 /C/C,
A 1 /C/A 2 /C/A 3 /C, etc. In this case, the outermost layer may be coated with a metal other than cobalt or with a suitable material. However, in this case, the natural electrode potential of the cobalt surface cannot be measured. In such cases, the outermost layer should be heat treated before being coated with a material other than cobalt to achieve a natural electrode potential more positive than -0.20V (3 minutes after immersion, vs. SCE).
When this is indicated, such magnetic thin films are also included in the present invention. As an example, Figure 1 shows the time dependence of the natural electrode potential measured in an electrolyte solution after heat-treating a thin film made of aluminum as the first layer and cobalt as the second layer on a polyethylene terephthalate film at 110°C. Indicated. The thin film of the present invention exhibiting a natural electrode potential (value 3 minutes after immersion, versus SCE) more positive than -0.2 V after heat treatment was obtained in the following manner. FIG. 2 briefly shows a method (apparatus) for forming a magnetic thin film. For example, titanium was evaporated onto the polyester film as a nonmagnetic layer. Next, cobalt was heated and evaporated with an electron beam by running the polyester film continuously under the introduction of oxygen at an incident angle of 10° or more to obtain a continuous vapor-deposited film of cobalt. This magnetic thin film was continuously heated along a heated roller at 125°C. In FIG. 2, 1 is the substrate film that is wound from the unwinding roll 2 around the can 3 to the take-up reel 4, 5 is the cobalt evaporation source, 6 is the mask, and θ is the incident angle in the case of oblique evaporation. It is. The thin film formation conditions under reduced pressure are determined by many factors, such as the substrate temperature during thin film formation, the degree of vacuum (the relationship between the pumping speed and the amount of gas introduced), the amount of oxygen introduced, the rate of crystal formation, and the amount of evaporated material on the substrate. In particular, in order to obtain a magnetic film with excellent corrosion resistance as in the present invention, the amount of oxygen introduced and the evaporated material are Since it is highly dependent on the incident angle to the substrate and the evaporation rate, it is clear that it is deeply related to the reaction system between cobalt and oxygen and the crystal formation system. Before heat treatment, cobalt thin films tend to have worse corrosion resistance than cobalt alone, depending on the combination with the nonmagnetic layer, but after heat treatment, the corrosion resistance becomes equal or even better, although it is not clear why. Since the higher the rate of improvement in the natural electrode potential, the more difficult it is to rust, it is thought that the bond with oxygen formed during vapor deposition is further stabilized by heat treatment. The heat treatment conditions for a cobalt magnetic thin film, which has a multilayer thin film structure with a non-magnetic layer, depend on the manufacturing conditions of the cobalt magnetic thin film, but for example, in the case of a polyester film substrate, corrosion resistance is significantly improved when treated at approximately 90 to 120°C. Get better. Since the heat treatment temperature is more effective at 90°C or higher, the heat treatment should be performed at 90°C or higher. A magnetic thin film made of cobalt and various non-magnetic layers.
Table 1 below shows the results of a corrosion resistance test conducted in a humid atmosphere of 60°C and 90% RH. A magnetic thin film exhibiting a natural electrode potential (value for 3 minutes after immersion, vs. SCE) more positive than -0.20V was particularly excellent in corrosion resistance.
【表】
以下に具体例を示す。
例 1
厚さ10μm,長さ500mのポリエステルテープ
をキヤン温度70℃、斜め蒸着の入射角20゜(第1
図のθの値)、導入酸素ガス量0.2/min、加速
電圧10KVの電子ビーム加熱条件下で蒸着を行
い、100mの長さにクロムを蒸着させた。
次にこのクロム上に、入射角30゜、導入酸素ガ
ス量0.2/min条件でコバルト薄膜を形成し
た。
以下この薄膜をAと呼ぶ。
次に上記と同様にポリエステルテープ上にクロ
ムを第1層として形成し、このクロム上にコバル
トを、第2図のマスク6を除去し、酸素を導入し
ないで蒸着させた。以下この薄膜をBと呼ぶ。
以上2つの薄膜A,Bのそれぞれの半分を110
℃一定に保持した熱ロールによりフイルム走行速
度20m/minの速度で熱処理した。
この熱処理した薄膜をそれぞれA′,B′とす
る。以下、各例で作製した薄膜の評価は、表−2
にまとめて記す。
例 2
例1と同じポリエステルフイルム上にマスクを
用いず、酸素を導入しないで連続的にチタンを蒸
着させた。
このチタン上に、チタン蒸着と同様にマスクを
用いず、酸素を導入しないでコバルトを蒸着させ
た。以下この薄膜をCと呼ぶ。
次に先に第1層として形成したチタン上にコバ
ルトを、マスクを用いて斜め蒸着の入射角30゜、
導入酸素ガス量0.15/minの条件でコバルト薄
膜を形成した。以下この薄膜をDと呼ぶ。
例1と同様に薄膜C,Dの各半分を115℃の熱
ロールで熱処理を行つた。以下この熱処理薄膜を
C′,D′と呼ぶ。
例 3
例1と同じポリエステルフイルム上にキヤン温
度70℃、斜め蒸着の入射角30゜、導入酸素ガス量
0.24/minで電子ビームによりアルミニウムを
第1層として形成させた。
この条件で、次にコバルトを第2層として形成
させ、この同じ操作を2度繰り返えして、ポリエ
ステルフイルム上にアルミニウム、コバルト、ア
ルミニウム、コバルトという順序で薄膜を形成さ
せた。以下この薄膜をEと呼び、例1と同様に
120゜で熱処理した薄膜をE′と呼ぶ。
例 4
例1と同じポリエステルフイルム上にマスクを
用いず、導入酸素ガス量0.5/minの条件でア
ルミニウムを連続的に蒸着させ、このアルミニウ
ム上に斜め蒸着の入射角30゜、導入酸素ガス量
0.5/min、加速電圧30KVの電子ビームによ
り、コバルトを蒸着させた。以下この薄膜をFと
呼び、例3と同様に熱処理した薄膜をF′と呼
ぶ。
以上、例1〜4までの各薄膜に金のリード線を
導電性塗料で付着して形成させた後、本発明の電
解質溶液中に浸漬して、浸漬してから3分後の自
然電極電位(対SCE)を測定した。
また、各薄膜を60℃90%RHの湿度雰囲気下に
5時間放置してその耐蝕性を試験した。
以下表にて示す。[Table] Specific examples are shown below. Example 1 A polyester tape with a thickness of 10 μm and a length of 500 m was deposited at a can temperature of 70°C and an incident angle of 20° (first
Chromium was deposited over a length of 100 m by electron beam heating with an oxygen gas flow rate of 0.2/min and an accelerating voltage of 10 KV. Next, a cobalt thin film was formed on this chromium at an incident angle of 30° and an oxygen gas flow rate of 0.2/min. This thin film will be referred to as A hereinafter. Next, chromium was formed as a first layer on the polyester tape in the same manner as above, and cobalt was vapor-deposited on the chromium without introducing the mask 6 of FIG. 2 and introducing oxygen. This thin film will be referred to as B hereinafter. Half of each of the above two thin films A and B is 110
The film was heat-treated at a film running speed of 20 m/min using a hot roll kept at a constant temperature. These heat-treated thin films are referred to as A' and B', respectively. Below, the evaluation of the thin films produced in each example is shown in Table 2.
They are summarized in . Example 2 Titanium was continuously deposited on the same polyester film as in Example 1 without using a mask and without introducing oxygen. Cobalt was deposited on this titanium without using a mask and without introducing oxygen, as in the case of titanium deposition. This thin film will be referred to as C hereinafter. Next, cobalt was deposited obliquely on the titanium formed as the first layer using a mask at an incident angle of 30°.
A cobalt thin film was formed under the condition that the amount of oxygen gas introduced was 0.15/min. This thin film will be referred to as D hereinafter. As in Example 1, each half of thin films C and D was heat treated using a hot roll at 115°C. This heat-treated thin film is shown below.
They are called C′ and D′. Example 3 On the same polyester film as in Example 1, the can temperature is 70°C, the incident angle of oblique evaporation is 30°, and the amount of oxygen gas introduced.
Aluminum was formed as a first layer using an electron beam at 0.24/min. Under these conditions, cobalt was then formed as a second layer, and this same operation was repeated twice to form thin films of aluminum, cobalt, aluminum, and cobalt in this order on the polyester film. Hereinafter, this thin film will be referred to as E, and as in Example 1,
The thin film heat-treated at 120° is called E′. Example 4 Aluminum was continuously evaporated onto the same polyester film as in Example 1 without using a mask at an amount of oxygen gas introduced at 0.5/min.
Cobalt was deposited using an electron beam at 0.5/min and an acceleration voltage of 30 KV. Hereinafter, this thin film will be referred to as F, and the thin film heat-treated in the same manner as in Example 3 will be referred to as F'. As described above, each thin film of Examples 1 to 4 was formed by attaching a gold lead wire with a conductive paint, and then immersed in the electrolyte solution of the present invention, and the natural electrode potential after 3 minutes of immersion. (vs. SCE) was measured. In addition, each thin film was left in a humid atmosphere at 60° C. and 90% RH for 5 hours to test its corrosion resistance. It is shown in the table below.
【表】
以上のようにコバルトと非磁性層との組み合わ
せは、熱処理前で特に耐蝕性が悪いものが多く、
熱処理を行い、しかも熱処理後の自然電極電位
(3分値、対、SCE)が−0.2Vより正の電位を示
すものが耐蝕性に優れていた。
このように耐蝕性に優れることによつて、非磁
性層との組み合わせによつて向上する磁気特性を
損うことなく、磁性薄膜として用いることができ
る。特に磁気テープ等の実用上の応用に対して益
す所が大である。
なお、上記では、電子ビーム加熱によるコバル
トと非磁性層との組み合わせについて記したが、
単に蒸着法による薄膜形成法に限定されるもので
なく、1気圧より低圧下で形成された薄膜であつ
て、熱処理後、30℃の電解質溶液に浸漬した時
に、浸漬してから3分後の自然電極電位(対、
SCE)が−0.20Vより正の電位を示す磁性薄膜で
あればよいものである。
以上のように本発明によれば、耐蝕性に優れた
磁性薄膜を得ることができるものである。[Table] As shown above, many combinations of cobalt and nonmagnetic layers have particularly poor corrosion resistance before heat treatment.
Those that were heat-treated and showed a natural electrode potential (3-minute value, vs. SCE) more positive than -0.2V after heat treatment had excellent corrosion resistance. Due to this excellent corrosion resistance, it can be used as a magnetic thin film without impairing the magnetic properties that can be improved by combining with a nonmagnetic layer. In particular, it has great benefits for practical applications such as magnetic tape. In addition, above, we described the combination of cobalt and nonmagnetic layer by electron beam heating.
It is not limited to a thin film formation method simply by vapor deposition, but is a thin film formed under a pressure lower than 1 atm, and when immersed in an electrolyte solution at 30°C after heat treatment, 3 minutes after immersion. Natural electrode potential (vs.
Any magnetic thin film exhibiting a potential SCE) more positive than -0.20V is sufficient. As described above, according to the present invention, a magnetic thin film with excellent corrosion resistance can be obtained.
第1図は電解質溶液中での磁性薄膜の自然電極
電位の時間依存性を示す図、第2図は本発明の耐
蝕性磁性薄膜の製造方法における製造装置の要部
の概略構成図である。
1……基板フイルム、5……コバルトの蒸発
源。
FIG. 1 is a diagram showing the time dependence of the natural electrode potential of a magnetic thin film in an electrolyte solution, and FIG. 2 is a schematic diagram of the main parts of a manufacturing apparatus in the method for manufacturing a corrosion-resistant magnetic thin film of the present invention. 1...Substrate film, 5...Cobalt evaporation source.
Claims (1)
バルトと非磁性金属層とを層状にして薄膜を形成
した後、この薄膜を熱処理して磁性薄膜を形成
し、この磁性薄膜をホウ砂0.02M/とホウ酸
0.1M/を含む30℃の水溶液に浸漬して浸漬し
てから3分経過後の前記磁性薄膜の示す自然電極
電位が飽和甘汞電極に対してマイナス0.20Vより
正の電位を示す磁性薄膜を選択するようにした耐
蝕性磁性薄膜の製造方法。1. After forming a thin film by layering cobalt and a non-magnetic metal layer on a substrate film in an oxygen atmosphere under reduced pressure, this thin film is heat-treated to form a magnetic thin film, and this magnetic thin film is coated with borax 0.02M/ and boric acid
The magnetic thin film is immersed in an aqueous solution at 30°C containing 0.1M/3 minutes after the immersion, the natural electrode potential of the magnetic thin film is more positive than -0.20V with respect to the saturated electrode. A method for manufacturing a corrosion-resistant magnetic thin film as selected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11464179A JPS5638809A (en) | 1979-09-05 | 1979-09-05 | Corrosion resistive magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11464179A JPS5638809A (en) | 1979-09-05 | 1979-09-05 | Corrosion resistive magnetic thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5638809A JPS5638809A (en) | 1981-04-14 |
| JPS6113366B2 true JPS6113366B2 (en) | 1986-04-12 |
Family
ID=14642880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11464179A Granted JPS5638809A (en) | 1979-09-05 | 1979-09-05 | Corrosion resistive magnetic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5638809A (en) |
-
1979
- 1979-09-05 JP JP11464179A patent/JPS5638809A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5638809A (en) | 1981-04-14 |
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