JPS6114184B2 - - Google Patents
Info
- Publication number
- JPS6114184B2 JPS6114184B2 JP5504177A JP5504177A JPS6114184B2 JP S6114184 B2 JPS6114184 B2 JP S6114184B2 JP 5504177 A JP5504177 A JP 5504177A JP 5504177 A JP5504177 A JP 5504177A JP S6114184 B2 JPS6114184 B2 JP S6114184B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- film
- enamel
- silicate
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 210000003298 dental enamel Anatomy 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 28
- 229920005989 resin Polymers 0.000 claims description 24
- 239000011347 resin Substances 0.000 claims description 24
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 13
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 7
- 239000000049 pigment Substances 0.000 claims description 7
- 229920002050 silicone resin Polymers 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 5
- 229920000647 polyepoxide Polymers 0.000 claims description 5
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- CBECDWUDYQOTSW-UHFFFAOYSA-N 2-ethylbut-3-enal Chemical compound CCC(C=C)C=O CBECDWUDYQOTSW-UHFFFAOYSA-N 0.000 claims description 3
- 239000004925 Acrylic resin Substances 0.000 claims description 3
- 229920000178 Acrylic resin Polymers 0.000 claims description 3
- 239000005062 Polybutadiene Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- JTHNLKXLWOXOQK-UHFFFAOYSA-N n-propyl vinyl ketone Natural products CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 claims description 3
- 229920001568 phenolic resin Polymers 0.000 claims description 3
- 239000005011 phenolic resin Substances 0.000 claims description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 3
- 229920002857 polybutadiene Polymers 0.000 claims description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 2
- 239000003973 paint Substances 0.000 description 24
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 11
- 238000001035 drying Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- -1 allyl orthosilicate Chemical compound 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000004927 clay Substances 0.000 description 3
- 239000002537 cosmetic Substances 0.000 description 3
- 239000010433 feldspar Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 150000004760 silicates Chemical class 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 2
- 229910052570 clay Inorganic materials 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 229910052605 nesosilicate Inorganic materials 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- 150000004762 orthosilicates Chemical class 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 235000014692 zinc oxide Nutrition 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 235000002568 Capsicum frutescens Nutrition 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- AQLMHYSWFMLWBS-UHFFFAOYSA-N arsenite(1-) Chemical compound O[As](O)[O-] AQLMHYSWFMLWBS-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000331 cadmium sulfate Inorganic materials 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000004534 enameling Methods 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- WKMKTIVRRLOHAJ-UHFFFAOYSA-N oxygen(2-);thallium(1+) Chemical compound [O-2].[Tl+].[Tl+] WKMKTIVRRLOHAJ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229910003438 thallium oxide Inorganic materials 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 1
- 229910003452 thorium oxide Inorganic materials 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VNLYGNHABLGDFS-UHFFFAOYSA-N trihydroxy(2-phenylethoxy)silane Chemical compound O[Si](O)(O)OCCC1=CC=CC=C1 VNLYGNHABLGDFS-UHFFFAOYSA-N 0.000 description 1
- HKJJPWLIZHQHFX-UHFFFAOYSA-N trihydroxy(octoxy)silane Chemical compound CCCCCCCCO[Si](O)(O)O HKJJPWLIZHQHFX-UHFFFAOYSA-N 0.000 description 1
- KIRWIETUDITSMO-UHFFFAOYSA-N trihydroxy(phenoxy)silane Chemical compound O[Si](O)(O)OC1=CC=CC=C1 KIRWIETUDITSMO-UHFFFAOYSA-N 0.000 description 1
- JEIURVZIWBXPOB-UHFFFAOYSA-N trihydroxy(phenylmethoxy)silane Chemical compound O[Si](O)(O)OCC1=CC=CC=C1 JEIURVZIWBXPOB-UHFFFAOYSA-N 0.000 description 1
- IKVKLKUMYSCCLG-UHFFFAOYSA-N trihydroxysilyl 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)O[Si](O)(O)O IKVKLKUMYSCCLG-UHFFFAOYSA-N 0.000 description 1
- NSBGJRFJIJFMGW-UHFFFAOYSA-N trisodium;stiborate Chemical compound [Na+].[Na+].[Na+].[O-][Sb]([O-])([O-])=O NSBGJRFJIJFMGW-UHFFFAOYSA-N 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Curing Cements, Concrete, And Artificial Stone (AREA)
- Paints Or Removers (AREA)
- Glass Compositions (AREA)
Description
本発明は被膜形成用組成物に関するものであ
る。
さらに詳しくは、アルキル(もしくはアリルま
たはアリール)シリケート、有機樹脂およびほう
ろうフリツトを主成分とする耐熱性および密着性
にすぐれた被膜形成組成物に関するものである。
一般に有機樹脂を用いた塗料の耐熱性は約400
℃以上で著しく劣化し、実用上はそれ以下の温度
での使用が望ましく、それ以上の温度の耐熱性が
要求される場合においては、無機質塗料が用いら
れる。
しかし、無機質塗料でも800℃以上の高温から
常温に移行するとき鉄素地との密着不良が生じハ
ガレ、ワレ等を発生する欠点がある。従つて800
℃以上の高温に耐える塗料はない。
本発明者は、常温および800℃以下の温度にお
いても使用可能800℃以上の高温に耐え、かつ密
着性にすぐれた塗料を開発するため、鉄との密着
性に優れるほうろうと無機質塗料用無機バインダ
ーとして使用されているアルキル(もしくはアリ
ルまたはアリール)シリケートおよび有機樹脂の
利用に着目し、鋭意研究を重ねた結果、常温はも
ちろん800℃以上に耐える本被膜形成用組成物を
得るに至つた。
従来、ほうろう仕上げは、ほうろうフリツトに
粘土、塩化カリウム、亜硝酸ソーダ、水などがミ
ル添加剤として加えられ、分散された後、被塗物
に塗装され、800℃付近で焼付処理することによ
つて密着性にすぐれたほうろう膜が得られる。
しかし、焼付前の800℃以下の温度域において
は連続した膜を形成するが、塗膜硬度は非常に低
く、素地との密着性も悪く、当然、耐水性もなく
容易に水で軟化する状態にある。
従つて、実用上は800℃付近で処理しない限り
使用できない。また、このほうろうフリツトは一
種のガラスであるため、分散しても美粧効果は殆
んど得られない。
このようにほうろうは、800℃以下の温度域に
おいて上記のような欠点を有するものであるが、
ほうろうフリツトをアルキル(もしくはアリルま
たはアリール)シリケートと組合わせて用いるこ
とにより、800℃以上の高温に耐え、かつ密着性
にすぐれ、ワレ、ハガレの欠点のない無機質塗料
が得られることはもとより、800℃以下の温度に
おいてもほうろうの欠点があらわれず、密着性に
すぐれた硬い塗膜を形成し、かつ美粧効果のある
塗料が得られる。また、有機樹脂を用いることに
より常温ですぐれた光沢の塗膜が得られ、さらに
厚塗りすることも可能であることを本発明者は見
出し本発明の完成に至つた。
すなわち、本発明は
(A)アルキル(もしくはアリルまたはアリール)
シリケート、(B)ほうろうフリツトおよび(C)ビニル
ブチラール樹脂、アクリル樹脂、シリコン樹脂、
ポリブタジエン樹脂、エポキシ樹脂、ウレタン樹
脂、フエノール樹脂およびキシレン樹脂から選ば
れる一種以上の有機樹脂を必須成分とし、且つ
(A)、(B)および(C)の配合割合が乾燥塗膜中に(B)が10
〜85重量%、(A)+(C)が90〜15重量%占め、さらに
(A)/(C)の比が固形分重量で0.5/99.5〜97/3か
らなる混合物に、さらに要すれば顔料、ほうろう
フリツト用原料、添加剤、硬化剤から選ばれる一
種以上を加えてなる被膜形成用組成物に係わるも
のである。
本発明の被膜形成用組成物は、厚塗り性にすぐ
れハケ塗り、スプレー塗りなどの手段によつて鉄
素地などに塗装され、常温乾燥で皮膜を形成す
る。その塗膜は、密着性にすぐれ、光沢があり、
硬く、常温はもとより800℃以上の高温に耐える
ことができる。本被膜形成用組成物の展色剤とし
て用いられる有機樹脂は一般に300℃〜450℃の温
度で熱分解し被膜中に残らないが、常温における
塗膜の光沢や厚塗り性は有機樹脂の使用に基づく
ものである。
本願発明の組成物の被膜形成は、300〜450℃以
下の温度ではアルキル(もしくはアリルまたはア
リール)シリケート、ほうろうフリツトおよび有
機樹脂を主成分とする被膜を形成し、ついで有機
樹脂が分解する温度以上ではアルキル(もしくは
アリルまたはアリール)シリケートによる展色剤
で被膜が形成され、800℃以上となるとほうろう
フリツト、ほうろうフリツト用原料などにもとず
くほうろう膜へと変化するものである。
本発明において用いられるアルキル(もしくは
アリルまたはアリール)シリケートとしては、
一般式
The present invention relates to a film-forming composition. More specifically, the present invention relates to a film-forming composition with excellent heat resistance and adhesion that is mainly composed of an alkyl (or allyl or aryl) silicate, an organic resin, and an enamel frit. Generally, the heat resistance of paints using organic resins is approximately 400
Inorganic paints are used in cases where they deteriorate significantly at temperatures above .degree. C., and are practically desirable to be used at temperatures below that temperature, but require heat resistance at temperatures above that temperature. However, even inorganic paints have the drawback of poor adhesion to the iron base when the paint moves from a high temperature of 800°C or higher to room temperature, resulting in peeling, cracking, etc. Therefore 800
There are no paints that can withstand temperatures higher than ℃. In order to develop a paint that can be used at room temperature and temperatures below 800°C, can withstand high temperatures above 800°C, and has excellent adhesion, the inventors developed enamel that has excellent adhesion to iron and an inorganic binder for inorganic paints. Focusing on the use of alkyl (or allyl or aryl) silicates and organic resins, which are used as silicates, as a result of extensive research, we were able to obtain this film-forming composition that can withstand not only room temperature but also temperatures of 800°C or higher. Traditionally, enamel finishing is achieved by adding clay, potassium chloride, sodium nitrite, water, etc. as mill additives to enamel frits, dispersing them, painting them on the object, and baking them at around 800℃. An enamel film with excellent adhesion can be obtained. However, although it forms a continuous film in the temperature range of 800℃ or less before baking, the hardness of the coating is very low, its adhesion to the substrate is poor, and it is naturally not water resistant and easily softens with water. It is in. Therefore, it cannot be used practically unless it is treated at around 800°C. Furthermore, since this enamel frit is a type of glass, almost no cosmetic effect can be obtained even if it is dispersed. Although enamel has the above-mentioned drawbacks in the temperature range below 800℃,
By using enamel frit in combination with alkyl (or allyl or aryl) silicate, it is possible to obtain an inorganic paint that can withstand high temperatures of 800℃ or higher, has excellent adhesion, and has no defects such as cracking or peeling. Even at temperatures below °C, the defects of enamel do not appear, a hard coating film with excellent adhesion is formed, and a paint with a cosmetic effect can be obtained. Furthermore, the present inventors have discovered that by using an organic resin, a coating film with excellent gloss can be obtained at room temperature, and it is also possible to apply thick coatings, leading to the completion of the present invention. That is, the present invention provides (A) alkyl (or allyl or aryl)
Silicates, (B) enamel frits and (C) vinyl butyral resins, acrylic resins, silicone resins,
An essential component is one or more organic resins selected from polybutadiene resin, epoxy resin, urethane resin, phenolic resin, and xylene resin, and
The blending ratio of (A), (B) and (C) is 10% of (B) in the dry coating film.
~85% by weight, (A) + (C) accounts for 90~15% by weight, and
If necessary, one or more selected from pigments, raw materials for enamel frits, additives, and hardening agents are added to a mixture in which the ratio of (A)/(C) is 0.5/99.5 to 97/3 by solid weight. The present invention relates to a film-forming composition. The film-forming composition of the present invention has excellent thick coating properties and can be applied to an iron substrate or the like by brushing, spraying, or the like, and forms a film by drying at room temperature. The coating film has excellent adhesion and is glossy.
It is hard and can withstand not only room temperature but also high temperatures of over 800℃. The organic resin used as the vehicle for this film-forming composition generally decomposes thermally at a temperature of 300°C to 450°C and does not remain in the film, but the gloss and thick coating properties of the film at room temperature are determined by the use of organic resin. It is based on The composition of the present invention forms a film mainly composed of alkyl (or allyl or aryl) silicate, enamel frit, and organic resin at a temperature of 300 to 450°C or lower, and then at a temperature higher than the temperature at which the organic resin decomposes. In this case, a film is formed with a color vehicle made of alkyl (or allyl or aryl) silicate, and when the temperature exceeds 800°C, it changes to an enamel film based on enamel frits and raw materials for enamel frits. The alkyl (or allyl or aryl) silicate used in the present invention has the general formula
【式】
(Rは炭素数1〜8のアルキル基を、もしくは
アリル基またはアリール基を、nは0もしくは11
以下の整数を表わす)により示されるテトラアル
キル(もしくはテトラアリル)オルトシリケート
またはポリシリケート類である。具体的には、た
とえばメチルオルトシリケート、エチルオルトシ
リケート、n−プロピルオルトシリケート、n−
ブチルシリケート、n−オクチルオルトシリケー
ト、フエニルオルトシリケート、ベンジルオルト
シリケート、およびフエネチルオルトシリケー
ト、アリル(Allyl)オルトシリケート、メタク
ルオルトシリケートなどがあり、さらにそれらの
オルトシリケート類の脱水縮合によつて生成する
ポリシリケート類も用いられる。これらのうち
で、コストの面からエチルシリケートが適してい
る。特に加水分解率30%以上のものが乾燥性の点
から望ましい。
このアルキル(もしくはアリルまたはアリー
ル)シリケートと使用されるほうろうフリツト
は、通常のほうろう仕上げを行なう際に使用され
るものであり、耐火性原料(ケイ石、ケイ砂、長
石など)、溶融性原料(ホウ砂、ホウ酸、酸化ホ
ウ素、ソーダ灰、チリ硝石、カリ硝石、炭酸リチ
ウム、炭酸カリウム、炭酸カルシウム、炭酸バリ
ウム、炭酸マグネシウム、水酸化カルシウム、鉛
タン、一酸化鉛、亜鉛華など)、弱乳白原料(ホ
タル石、氷昌石、フツ化ナトリウム、フツ化アル
ミニウム、ケイフツ化ナトリウム等)、強乳白原
料(酸スズ、酸化アンチモン、金属アンチモン、
アンチモン酸ナトリウム、酸化チタン、酸化ジル
コニウム、ケイ酸ジルコニウム、亜ヒ酸、酸化セ
リウムなど)、着色原料(イオウ華、酸化コバル
ト、酸化クロム、酸化ニツケル、二酸化マンガ
ン、酸化銅、酸化鉄、重クロム酸カリウム、硫酸
カドミウム、金属セレン、クロム酸鉛など)、密
着剤(酸化コバルト、酸化ニツケル、二酸化マン
ガンなど)のほうろうフリツト用原料から選ばれ
てつくられたフリツトである。
たとえば市販品としては、フリツト番号F−
327、F−501、F−540、F−718、TA−37、
(関東琺瑯釉薬株式会社製)などがある。
また、展色剤として使用される有機樹脂として
は、一般に公知の例えばビニルブチラール樹脂、
アクリル樹脂、シリコン樹脂、ポリブタジエン、
エポキシ樹脂、ウタン樹脂、フエノール樹脂、キ
シレン樹脂、ニトロセルロース、セルロースアセ
テートブチレート、塩化ビニル、シリコン変性樹
脂などが使用できるが、常温における塗膜性能の
面からウレタン樹脂およびシリコン樹脂が好まし
い。
本発明の被膜形成用組成物には、上述の成分の
他に、必要ならば顔料、ほうろうフリツト用原
料、無機質添加剤、硬化剤などが添加される。
顔料としては、たとえば着色剤としてチタン
白、ベンガラ、アルミナ、鉛丹、黄鉛、カーボン
ブラツク、シアニンブルー、亜鉛華等が使用で
き、体質顔料としてはタルク、タンカル、クレ
ー、マイカ、バリタ、長石等が使用できる。ま
た、防錆を目的として鉛丹、塩基性クロム酸亜
鉛、シアナミドなども使用できる。
本発明において、有機樹脂が熱分解した後のア
ルキル(もしくはアリルまたはアリール)シリケ
ートとほうろうフリツトのみからなる展色剤でも
800℃以上の温度域で塗膜全体をほうろう化する
ことが可能であるが、無機顔料、無機質添加剤な
どが添加されている場合、全面的にほうろう膜を
形成することは難しくなる。このため、塗膜全面
をほうろう化することが望まれる場合、上述のほ
うろうフリツト用原料を併用すればよい。また、
一般の酸化物ガラスの原料であるタリウム、酸化
タリウム、酸化ビスマス、酸化カドミウム、酸イ
ンジウム、五酸化リン、五酸化バナジウム、酸化
ゲルマニウム、酸化ガリウム、酸化トリウム、酸
化イツトリウムなどをほうろうフリツト用原料に
加えてもよい。
また、添加剤としては、顔料の沈降を抑制する
ために、粘土、ベントナイト、エロジル、ヒドロ
キシエチルセルロース等を使用するとよい。
さらに、塗膜のワレを防止する目的でアスベス
ト、ガラス繊維、ガラスパウダー、ガラスフレー
クも併用できる。その他にほうろうフリツトと有
機樹脂との密着性をよくするために、シランカツ
プリング剤、たとえば日本ユニカー(株)のA−
1100A−1120,A186,A−187,A−189なども
使用できる。
さらにまた、アルキル(もしくはアリルまたは
アリール)シリケートと有機樹脂は比較的相溶し
にくいことから、塗膜の耐水性が劣ることがあ
る。この欠点を改良するために、硬化剤として金
属粉末、たとえば亜鉛末、マンガン、アンチモ
ン、鉛、鉄粉、金属シリコンなどの粉末やその他
金、白金、銀などの粉末も添加することができ
る。
本発明の被膜形成用組成物の主成分であるアル
キル(もしくはアリルまたはアリール)シリケー
ト、ほうろうフリツトおよび有機樹脂の配合割合
は、乾燥塗膜中におけるほうろうフリツト分が10
〜85重量%、好ましくは50〜70重量%である。残
り90〜15重量%は、アルキル(もしくはアリルま
たはアリール)シリケートと有機樹脂が占める
が、前者と後者の比は固形分比で0.5:99.5〜
97:3の範囲で、好ましくは12:88〜75:25の範
囲である。ほうろうフリツト分が10重量%以下で
は高温でほうろう膜になり難く、85重量%以上で
は硬度の低い被膜になる。また、アルキル(もし
くはアリルまたはアリール)シリケート分が多す
ぎるとワレが生じやすく、光沢のある被膜が得ら
れない。一方、少なすぎると400℃以上の高温で
ハガレが生じやすくなる。
また、顔料、ほうろうフリツト用原料、添加
剤、硬化剤などの添加割合は該被膜形成用組成物
中において固形分として90重量%まで含有させる
ことが可能であるが、好ましくは50重量%以下で
ある。
本被膜形成用組成物は常温で乾燥させて用いる
場合、さらに美粧性を付与するために上塗塗料と
してウレタン樹脂塗料、エポキシ樹脂塗料、塩化
ビニル樹脂塗料、塩化ゴム塗料、アルキド樹脂塗
料などが塗装できる。
以下、実施例および比較例をもつて本発明をさ
らに詳細に説明する。なお、部および%は特に断
らない限り、重量部および重量%を示す。
実施例 1
エチルシリケート(日本コルコート化学社製、
重合度4〜6、SiO2分40%)100部、イソプロピ
ルアルコール90部および1N−塩酸10部からなる
混合物を室温で24時間維持し加水分解させた。得
られたエチルシリケートの加水分解率は66%で不
揮発分は20%であつた。
得られたエチルシリケートの加水分解物(以下
SV−1と略称する)30部、ほうろうフリツトF
−339(関東琺瑯釉薬社製)40部およびレタンNo.
4026(関西ペイント社製35%ポリウレタンクリヤ
ー)60部をボールミルで24時間分散した。得られ
た組成物にレタンNo.4000硬化剤(関西ペイント社
製65%ポリウレタン用硬化剤)を10部加えて被膜
形成用組成物を作成した。
実施例 2
実施例1で用いたSV−1を30部、ほうろうフ
リツトTA−37(関東琺瑯釉薬社製))130部およ
びレタンNo.4026(実施例1と同じ)50部をボール
ミルで24時間分散した。得られた組成物にレタン
No.4000硬化剤(実施例1と同じ)を10部加えて被
膜形成用組成物を作成した。
実施例 3
実施例1で用いたSV−1を35部、ほうろうフ
リツトF−339(実施例1と同じ)150部、ベンガ
ラ10部、長石30部、チリ硝石10部、およびレタン
No.4026(実施例1と同じ50部、をボールミルで24
時間分散した。得られた組成物にレタンNo.4000硬
化剤(実施例1と同じ)を10部加えて被膜形成用
組成物を得た。
実施例 4
実施例1で用いたSV−1を60部、ほうろうフ
リツトF−718(関東琺瑯釉薬(株))120部、および
SH−840(東レ シリコーン(株) 不揮発分50%シ
リコン樹脂)40部をボールミルで24時間分散し被
膜形成用組成物を得た。
実施例 5
実施例1で用いたSV−1を40部、ほうろうフ
リツトTA−37(関東琺瑯釉薬社製)130部及び
エポキシ樹脂70%溶液(シエル化学社製エピコー
ト1001:トルエン/メチルイソブチルケトン/セ
ロソルブ=2/1/1混合溶剤)40部をボールミ
ルで24時間分散しした。得られた組成物にトーマ
イド410N(富士化成社製硬化剤:キシレン/ブ
タノール=7/3溶液)30部を加えて被膜形成用
組成物を作成した。
実施例 6
SV−1を30部、ほうろうフリツトTA−37を
130部及びセルロースアセテートブチレート25%
溶液(イーストマンコダツク社製CAB551−1/2:
メチルエチルケトン/酢酸エチル/セロソルブア
セテート=10/50/40混合溶剤)10部をボールミ
ルで24時間分散し、被膜形成用組成物とした。
比較例 1
関西ペイント社SDジンクプライマーZENo.
1500N(エチルシリケート系ジンクリツチペイン
トを用いた。
比較例 2
実施例1で用いたSV−140部、ほうろうフリツ
トTA−37、60部およびセロソルブ10部をボール
ミルで24時間分散して被膜形成用組成物を作成し
た。
上記実施例および比較例で得られた塗料をサン
ドブラスト鋼板にハケで塗装し、室温で乾燥させ
たものを試験片とした。試験結果を表1に示す。
硬 度 塗膜を室で1週間塗料させた後、エンピ
ツ硬度を測定した。
耐水性 室温で1週間乾燥させた後、水に5日間
浸水させた後、引き上げて塗膜の軟化を調
べた。
密着性 塗膜を5日間塗膜乾燥させた後、ナイフ
でクロスカツトを行ない、セロテープでは
がしてそれに付着するかどうかをみた。
耐熱性 400℃と800℃の電気炉に6時間入れた
後、室温に放置しワレ、ハガレを観た。
光 沢 1週間室温乾燥後60゜グロスを測定し
た。
厚塗り性 ハケで何回となく塗り重ね乾燥後の膜
厚が200μ程度になるようにし、その被
膜を室温で1週間乾燥させた時のワレを
調べる。[Formula] (R is an alkyl group having 1 to 8 carbon atoms, an allyl group, or an aryl group, n is 0 or 11
These are tetraalkyl (or tetraallyl) orthosilicates or polysilicates represented by the following integers. Specifically, for example, methyl orthosilicate, ethyl orthosilicate, n-propylorthosilicate, n-
There are butyl silicate, n-octyl orthosilicate, phenyl orthosilicate, benzyl orthosilicate, phenethyl orthosilicate, allyl orthosilicate, methacryl orthosilicate, etc. Furthermore, dehydration condensation of these orthosilicates Polysilicates thus produced are also used. Among these, ethyl silicate is suitable from the viewpoint of cost. In particular, a hydrolysis rate of 30% or more is desirable from the viewpoint of drying properties. The enamel frits used with this alkyl (or allyl or aryl) silicate are those used in the production of conventional enameling, and include refractory raw materials (silica, silica sand, feldspar, etc.), fusible raw materials ( Borax, boric acid, boron oxide, soda ash, chili saltpetre, potassium saltpetre, lithium carbonate, potassium carbonate, calcium carbonate, barium carbonate, magnesium carbonate, calcium hydroxide, lead tan, lead monoxide, zinc white, etc.), weak milky white Raw materials (fluorite, cryochate, sodium fluoride, aluminum fluoride, sodium silicate, etc.), strong opalescent raw materials (tin acid, antimony oxide, antimony metal,
Sodium antimonate, titanium oxide, zirconium oxide, zirconium silicate, arsenite, cerium oxide, etc.), coloring materials (sulfur flower, cobalt oxide, chromium oxide, nickel oxide, manganese dioxide, copper oxide, iron oxide, dichromic acid) These frits are made from raw materials for enamel frits, such as potassium, cadmium sulfate, metallic selenium, lead chromate, etc.) and adhesives (cobalt oxide, nickel oxide, manganese dioxide, etc.). For example, as a commercially available product, frit number F-
327, F-501, F-540, F-718, TA-37,
(manufactured by Kanto Enamel Glaze Co., Ltd.). In addition, as the organic resin used as a color vehicle, generally known examples include vinyl butyral resin,
Acrylic resin, silicone resin, polybutadiene,
Epoxy resins, utane resins, phenolic resins, xylene resins, nitrocellulose, cellulose acetate butyrate, vinyl chloride, silicone-modified resins, etc. can be used, but urethane resins and silicone resins are preferred from the viewpoint of coating film performance at room temperature. In addition to the above-mentioned components, pigments, raw materials for enamel frit, inorganic additives, hardening agents, etc. may be added to the film-forming composition of the present invention, if necessary. As pigments, for example, titanium white, red iron, alumina, red lead, yellow lead, carbon black, cyanine blue, zinc white, etc. can be used as coloring agents, and as extender pigments, talc, tancal, clay, mica, baryta, feldspar, etc. can be used. can be used. Furthermore, red lead, basic zinc chromate, cyanamide, etc. can also be used for the purpose of rust prevention. In the present invention, a color vehicle consisting only of alkyl (or allyl or aryl) silicate and enamel frit after the organic resin is thermally decomposed can also be used.
It is possible to enamel the entire coating film at a temperature of 800°C or higher, but if inorganic pigments, inorganic additives, etc. are added, it becomes difficult to form an enamel film over the entire surface. Therefore, if it is desired to enamelize the entire surface of the coating, the above-mentioned raw materials for enamel frit may be used in combination. Also,
Common oxide glass raw materials such as thallium, thallium oxide, bismuth oxide, cadmium oxide, indium oxide, phosphorus pentoxide, vanadium pentoxide, germanium oxide, gallium oxide, thorium oxide, and yttrium oxide are added to the raw materials for enamel frit. It's okay. Further, as additives, clay, bentonite, Erosil, hydroxyethyl cellulose, etc. may be used in order to suppress sedimentation of pigments. Furthermore, asbestos, glass fiber, glass powder, and glass flakes can also be used in combination to prevent cracking of the paint film. In addition, in order to improve the adhesion between the enamel frit and the organic resin, silane coupling agents, such as Nippon Unicar Co., Ltd.'s A-
1100A-1120, A186, A-187, A-189, etc. can also be used. Furthermore, since alkyl (or allyl or aryl) silicate and organic resin are relatively difficult to be compatible with each other, the water resistance of the coating film may be poor. In order to improve this drawback, metal powders such as zinc powder, manganese, antimony, lead, iron powder, metal silicon powder, and other powders such as gold, platinum, and silver may also be added as hardening agents. The blending ratio of the alkyl (or allyl or aryl) silicate, enamel frit, and organic resin, which are the main components of the film-forming composition of the present invention, is such that the enamel frit content in the dry coating film is 10%.
~85% by weight, preferably 50-70% by weight. The remaining 90-15% by weight is occupied by alkyl (or allyl or aryl) silicate and organic resin, and the ratio of the former to the latter is 0.5:99.5-99.5 in terms of solid content.
The range is 97:3, preferably 12:88 to 75:25. If the enamel frit content is less than 10% by weight, it will be difficult to form an enamel film at high temperatures, and if it is more than 85% by weight, the film will have low hardness. Furthermore, if the alkyl (or allyl or aryl) silicate content is too large, cracking tends to occur and a glossy coating cannot be obtained. On the other hand, if the amount is too low, peeling may easily occur at high temperatures of 400°C or higher. In addition, the proportion of pigments, raw materials for enamel frits, additives, hardening agents, etc. can be contained up to 90% by weight as a solid content in the film-forming composition, but preferably 50% by weight or less. be. When this film-forming composition is dried at room temperature and used, it can be coated with urethane resin paint, epoxy resin paint, vinyl chloride resin paint, chloride rubber paint, alkyd resin paint, etc. as a top coat to give it more cosmetic properties. . The present invention will be explained in more detail below using Examples and Comparative Examples. Note that parts and % indicate parts by weight and % by weight unless otherwise specified. Example 1 Ethyl silicate (manufactured by Nippon Colcoat Chemical Co., Ltd.,
A mixture consisting of 100 parts of polymerization degree 4-6, 100 parts of SiO 2 min (40%), 90 parts of isopropyl alcohol and 10 parts of 1N hydrochloric acid was maintained at room temperature for 24 hours for hydrolysis. The hydrolysis rate of the obtained ethyl silicate was 66%, and the nonvolatile content was 20%. The obtained hydrolyzate of ethyl silicate (hereinafter
(abbreviated as SV-1) 30 copies, enamel frit F
-339 (manufactured by Kanto Enamel Glaze Co., Ltd.) 40 copies and retan No.
60 parts of 4026 (35% polyurethane clear manufactured by Kansai Paint Co., Ltd.) was dispersed in a ball mill for 24 hours. A film-forming composition was prepared by adding 10 parts of Rethane No. 4000 curing agent (65% polyurethane curing agent manufactured by Kansai Paint Co., Ltd.) to the obtained composition. Example 2 30 parts of SV-1 used in Example 1, 130 parts of enamel frit TA-37 (manufactured by Kanto Horo Glaze Co., Ltd.) and 50 parts of Rethane No. 4026 (same as Example 1) were mixed in a ball mill for 24 hours. Dispersed. Rethane in the resulting composition
A film-forming composition was prepared by adding 10 parts of No. 4000 curing agent (same as in Example 1). Example 3 35 parts of SV-1 used in Example 1, 150 parts of enamel frit F-339 (same as Example 1), 10 parts of red iron, 30 parts of feldspar, 10 parts of chili saltpeter, and rethane.
No.4026 (50 parts as in Example 1) was milled in a ball mill for 24 minutes.
Spread out time. To the obtained composition, 10 parts of Rethane No. 4000 curing agent (same as in Example 1) was added to obtain a film-forming composition. Example 4 60 parts of SV-1 used in Example 1, 120 parts of enamel frit F-718 (Kanto Horo Glaze Co., Ltd.), and
40 parts of SH-840 (Toray Silicone Co., Ltd., silicone resin with non-volatile content of 50%) was dispersed in a ball mill for 24 hours to obtain a film-forming composition. Example 5 40 parts of SV-1 used in Example 1, 130 parts of enamel frit TA-37 (manufactured by Kanto Horo Glaze Co., Ltd.) and a 70% epoxy resin solution (Epicoat 1001, manufactured by Ciel Chemical Co., Ltd.: toluene/methyl isobutyl ketone/ 40 parts of Cellosolve (2/1/1 mixed solvent) was dispersed in a ball mill for 24 hours. To the obtained composition, 30 parts of Tomide 410N (hardening agent manufactured by Fuji Kasei Co., Ltd.: xylene/butanol = 7/3 solution) was added to prepare a film-forming composition. Example 6 30 copies of SV-1 and enamel frit TA-37
130 parts and 25% cellulose acetate butyrate
10 parts of a solution (CAB551-1/2 manufactured by Eastman Kodak Co.: methyl ethyl ketone/ethyl acetate/cellosolve acetate = 10/50/40 mixed solvent) was dispersed in a ball mill for 24 hours to obtain a film-forming composition. Comparative Example 1 Kansai Paint SD Zinc Primer ZENo.
1500N (using ethyl silicate-based zinc-rich paint) Comparative Example 2 A film-forming composition was prepared by dispersing 140 parts of SV-1 used in Example 1, 60 parts of enamel frit TA-37, and 10 parts of cellosolve in a ball mill for 24 hours. The paints obtained in the above Examples and Comparative Examples were applied to a sandblasted steel plate with a brush and dried at room temperature to make test pieces.The test results are shown in Table 1.Hardness Paint film After letting the paint sit in a room for one week, pencil hardness was measured.Water Resistance After drying at room temperature for one week, the paint was immersed in water for five days, then pulled out and the softening of the paint film was examined.Adhesion The paint film was After letting the paint film dry for 5 days, I made a cross cut with a knife and peeled it off with cellophane tape to see if it would stick to it.Heat resistance After putting it in an electric furnace at 400℃ and 800℃ for 6 hours, I left it at room temperature to see if it would crack. Gloss: 60° gloss was measured after drying at room temperature for one week.Thick coating property: Apply several coats with a brush until the film thickness after drying is approximately 200μ, and then apply the film at room temperature for 1 week. Check for cracks after drying for a week.
【表】【table】
【表】【table】
Claims (1)
ル)シリケート、(B)ほうろうフリツトおよび(C)ビ
ニルブチラール樹脂、アクリル樹脂、シリコン樹
脂、ポリブタジエン樹脂、エポキシ樹脂、ウレタ
ン樹脂、フエノール樹脂、およびキシレン樹脂か
ら選ばれる一種以上の有機樹脂を必須成分とし、
且つ(A)、(B)および(C)の配合割合が乾燥塗膜中に(B)
が10〜85重量%、(A)+(C)が90〜15重量%占め、さ
らに(A)/(C)の比が固形分重量で0.5/99.5〜97/
3からなる混合物に、さらに要すれば顔料、ほう
ろうフリツト用原料、添加剤、硬化剤から選ばれ
る一種以上を加えてなる被膜形成用組成物。 2 アルキル(もしくはアリルまたはアリール)
シリケートかエチルシリケートである特許請求の
範囲第1項記載の被膜形成用組成物。 3 有機樹脂はウレタン樹脂またはシリコーン樹
脂である特許請求の範囲第1項記載の被膜形成用
組成物。[Claims] 1 (A) alkyl (or allyl or aryl) silicate, (B) enamel frit and (C) vinyl butyral resin, acrylic resin, silicone resin, polybutadiene resin, epoxy resin, urethane resin, phenolic resin, and xylene resin as an essential component,
And the blending ratio of (A), (B) and (C) is (B) in the dry coating film.
occupies 10 to 85% by weight, (A) + (C) accounts for 90 to 15% by weight, and the ratio of (A)/(C) is 0.5/99.5 to 97/ in terms of solid content weight.
A composition for forming a film, which is obtained by adding, if necessary, one or more selected from pigments, raw materials for enamel frits, additives, and hardening agents to the mixture consisting of the following. 2 Alkyl (or allyl or aryl)
The film-forming composition according to claim 1, which is a silicate or an ethyl silicate. 3. The film-forming composition according to claim 1, wherein the organic resin is a urethane resin or a silicone resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5504177A JPS53140332A (en) | 1977-05-13 | 1977-05-13 | Film-forming |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5504177A JPS53140332A (en) | 1977-05-13 | 1977-05-13 | Film-forming |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53140332A JPS53140332A (en) | 1978-12-07 |
| JPS6114184B2 true JPS6114184B2 (en) | 1986-04-17 |
Family
ID=12987569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5504177A Granted JPS53140332A (en) | 1977-05-13 | 1977-05-13 | Film-forming |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53140332A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0316592U (en) * | 1989-06-30 | 1991-02-19 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006273942A (en) * | 2005-03-28 | 2006-10-12 | Sumitomo Osaka Cement Co Ltd | Coating and coating film |
| WO2017003389A1 (en) * | 2015-06-30 | 2017-01-05 | Alemdarzade Akkoç Berçem | The tempering paint which demonstrating high durability before heat treatment |
-
1977
- 1977-05-13 JP JP5504177A patent/JPS53140332A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0316592U (en) * | 1989-06-30 | 1991-02-19 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53140332A (en) | 1978-12-07 |
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