JPS6116371B2 - - Google Patents
Info
- Publication number
- JPS6116371B2 JPS6116371B2 JP58142484A JP14248483A JPS6116371B2 JP S6116371 B2 JPS6116371 B2 JP S6116371B2 JP 58142484 A JP58142484 A JP 58142484A JP 14248483 A JP14248483 A JP 14248483A JP S6116371 B2 JPS6116371 B2 JP S6116371B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- reaction
- styrene
- styrenes
- dimer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 37
- 239000000539 dimer Substances 0.000 claims description 32
- -1 sulfonate anion Chemical class 0.000 claims description 27
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 230000000447 dimerizing effect Effects 0.000 claims description 5
- 125000001153 fluoro group Chemical group F* 0.000 claims description 5
- 150000004945 aromatic hydrocarbons Chemical group 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 3
- 239000011737 fluorine Chemical group 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 25
- 239000002253 acid Substances 0.000 description 20
- 150000003440 styrenes Chemical class 0.000 description 19
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- 238000006471 dimerization reaction Methods 0.000 description 15
- 150000007513 acids Chemical class 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- 239000002904 solvent Substances 0.000 description 7
- 150000001450 anions Chemical class 0.000 description 6
- 238000003379 elimination reaction Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 5
- 239000013638 trimer Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000008030 elimination Effects 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010538 cationic polymerization reaction Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 239000011973 solid acid Substances 0.000 description 3
- GKNWQHIXXANPTN-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-N 0.000 description 2
- XBWQFDNGNOOMDZ-UHFFFAOYSA-N 1,1,2,2,3,3,3-heptafluoropropane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)F XBWQFDNGNOOMDZ-UHFFFAOYSA-N 0.000 description 2
- MEBONNVPKOBPEA-UHFFFAOYSA-N 1,1,2-trimethylcyclohexane Chemical compound CC1CCCCC1(C)C MEBONNVPKOBPEA-UHFFFAOYSA-N 0.000 description 2
- QEGNUYASOUJEHD-UHFFFAOYSA-N 1,1-dimethylcyclohexane Chemical compound CC1(C)CCCCC1 QEGNUYASOUJEHD-UHFFFAOYSA-N 0.000 description 2
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 2
- CXUBKCHAJCWOEX-UHFFFAOYSA-N 2,4,6-tribromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=C(Br)C=C(Br)C=C1Br CXUBKCHAJCWOEX-UHFFFAOYSA-N 0.000 description 2
- SJDXJURIQGALGO-UHFFFAOYSA-N 2,4,6-trichlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=C(Cl)C=C(Cl)C=C1Cl SJDXJURIQGALGO-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- PXACTUVBBMDKRW-UHFFFAOYSA-N 4-bromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Br)C=C1 PXACTUVBBMDKRW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GNQWHYWLSGTMSL-OUKQBFOZSA-N [(e)-3-phenylbut-1-enyl]benzene Chemical compound C=1C=CC=CC=1C(C)\C=C\C1=CC=CC=C1 GNQWHYWLSGTMSL-OUKQBFOZSA-N 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- YPJRYQGOKHKNKZ-UHFFFAOYSA-N 1-ethyl-1-methylcyclohexane Chemical compound CCC1(C)CCCCC1 YPJRYQGOKHKNKZ-UHFFFAOYSA-N 0.000 description 1
- SKZVGENPKQIKDV-ZHACJKMWSA-N 1-methyl-3-[(E)-3-(3-methylphenyl)but-1-enyl]benzene Chemical compound CC(\C=C\c1cccc(C)c1)c1cccc(C)c1 SKZVGENPKQIKDV-ZHACJKMWSA-N 0.000 description 1
- YZBHYDPTJNQVEI-UHFFFAOYSA-N 1-methyl-3-[3-(4-methylphenyl)but-1-enyl]benzene Chemical compound C=1C=C(C)C=CC=1C(C)C=CC1=CC=CC(C)=C1 YZBHYDPTJNQVEI-UHFFFAOYSA-N 0.000 description 1
- VCADVNMVDOJZGX-UHFFFAOYSA-N 1-methyl-3-[4-(4-methylphenyl)but-3-en-2-yl]benzene Chemical compound C=1C=CC(C)=CC=1C(C)C=CC1=CC=C(C)C=C1 VCADVNMVDOJZGX-UHFFFAOYSA-N 0.000 description 1
- JHIDJKSBZPNVKZ-UHFFFAOYSA-N 1-methyl-3-phenyl-2,3-dihydro-1h-indene Chemical compound C12=CC=CC=C2C(C)CC1C1=CC=CC=C1 JHIDJKSBZPNVKZ-UHFFFAOYSA-N 0.000 description 1
- DIASHBFEHKLDMH-UHFFFAOYSA-N 2,4,6-trifluorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=C(F)C=C(F)C=C1F DIASHBFEHKLDMH-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- DRIJGEJOLOPSGI-DHZHZOJOSA-N C=1C=C(C)C=CC=1C(C)\C=C\C1=CC=C(C)C=C1 Chemical group C=1C=C(C)C=CC=1C(C)\C=C\C1=CC=C(C)C=C1 DRIJGEJOLOPSGI-DHZHZOJOSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GWESVXSMPKAFAS-UHFFFAOYSA-N Isopropylcyclohexane Natural products CC(C)C1CCCCC1 GWESVXSMPKAFAS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- ZHGASCUQXLPSDT-UHFFFAOYSA-N cyclohexanesulfonic acid Chemical compound OS(=O)(=O)C1CCCCC1 ZHGASCUQXLPSDT-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- QUSSPXNPULRXKG-UHFFFAOYSA-N galleon Natural products O1C(=CC=2)C(OC)=CC=2CCCCC(=O)CCC2=CC=C(O)C1=C2 QUSSPXNPULRXKG-UHFFFAOYSA-N 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000003402 intramolecular cyclocondensation reaction Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- XGPOMXSYOKFBHS-UHFFFAOYSA-M sodium;trifluoromethanesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C(F)(F)F XGPOMXSYOKFBHS-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000003930 superacid Substances 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明はスチレン類を二量化もしくは共二量化
せしめてスチレン類の不飽和二量体を製造する方
法に関する。
スチレン類を二量化もしくは共二量化せしめる
と、一般には飽和二量体と不飽和二量体が生成す
ることが知られている。たとえば、スチレンの二
量化の場合には飽和二量体として1−フエニル−
3−メチルインダンが、不飽和二量体として1,
3−ジフエニル−1−ブテンがそれぞれ得られ
る。
スチレン類の不飽和二量体はそれ自身有用であ
るとともに、各種反応原料としても有用な化合物
であるが、スチレン類の二量化に際して選択率良
く不飽和二量体を得ることができなかつた。
硫酸を触媒とする場合は、飽和二量体および三
量体以上のオリゴマーの生成が避けられない。ま
た、不飽和二量体の選択率を向上せしめるには硫
酸濃度を低下させたり、温度を高くせざるを得
ず、その際には装置の腐食が生じやすくなる。
固体酸もしくは酸性白土を使用する場合は、飽
和二量体の生成が主となる。
本発明は、これらの欠点を解決し、スチレン類
の二量化もしくは共二量化によりスチレン類の不
飽和二量体を選択率良く、かつ高収率で得る方法
を提供するものである。
本発明は、スルホネートアニオンの存在下に0
℃を越え150℃以下の温度範囲で下記式()で
表わされるスチレン類を二量化させることを特徴
とするスチレン類の不飽和二量体の製造方法であ
る。
(式中Rは水素または炭素数1〜3の低級アル
キル基、nはRがアルキル基の場合のアルキル基
の数であつて1もしくは2、nが2の場合Rは同
一もしくは異種のアルキル基であつてもよい。)
本発明において用いるスチレン類は、式()
で表わされるものであればいずれでもよいが、特
に工業的には、スチレン、m−もしくはp−ビニ
ルトルエン等が有利に使用できる。本発明におい
ては二種以上のスチレン類を用い共二量化させる
こともできる。
本発明はスルホネートアニオンの存在下で式
()で表わされるスチレン類の二量化を行なう
ものである。
本発明におけるスルホネートアニオンは式
()で表わされる。
R′SO3 - ………()
R′はフツ素原子または塩素原子であり、さら
に、脂肪族炭化水素残基、脂環式炭化水素残基も
しくは芳香族炭化水素残基のフツ素置換体、塩素
置換体もしくは臭素置換体である。脂肪族炭化水
素残基の炭素数は1〜3、脂環式炭化水素残基は
炭素数5〜8、芳香族炭化水素残基は単環もしく
は二環で炭素数6〜18がそれぞれ好ましい。
スルホネートアニオンの代表的具体例はつぎの
とおりである。
R′がフツ素原子の場合のフルオル硫酸イオ
ン。R′が塩素原子の場合のクロル硫酸イオン。
R′が置換体の場合は、トリフルオルメタンス
ルホネートアニオン、パーフルオルエタンスルホ
ネートアニオン、パーフルオルプロパンスルホネ
ートアニオン、パラフルオルベンゼンスルホネー
トアニオン、2,4,6−トリフルオルベンゼン
スルホネートアニオン、パラクロロベンゼンスル
ホネートアニオン、2,4,6−トリクロロベン
ゼンスルホネートアニオン、パラブロムベンゼン
スルホネートアニオン、2,4,6−トリブロム
ベンゼンスルホネートアニオン。
スチレン類の二量化反応においてこれらのスル
ホネートアニオンを反応系に存在させて反応を進
行させるには酸(R′SO3H)の形の化合物、ある
いはこれらの誘導体である炭素数1〜3のアルキ
ル基(R″)を有するエステル(R′SO3R″),
R′SO3Mで表わされる金属塩、もしくは
(R′SO2)2Oで表わされる酸無水物の形の化合物を
反応系に添加する。
スルホネートアニオン(R′SO3 -)を生成させる
酸の代表的具体例は、フルオル硫酸、クロル硫
酸、トリフルオルメタンスルホン酸、パーフルオ
ルエタンスルホン酸、パーフルオルプロパンスル
ホン酸、パラフルオルベンゼンスルホン酸、2,
4,6−トリフルオルベンゼンスルホン酸、パラ
クロロベンゼンスルホン酸、2,4,6−トリク
ロロベンゼンスルホン酸、パラブロムベンゼンス
ルホン酸、2,4,6−トリブロムベンゼンスル
ホン酸、等である。
エステルはこれらの酸のアルキルエステルであ
つて、メチルエステル、エチルエステル、プロピ
ルエステル等が代表的なものである。これらの酸
の金属塩は、金属(M)がナトリウム、カリウ
ム、マグネシウム、カルシウム、バリウム等であ
る塩が代表的なものである。これらの酸の酸無水
物は、ピロクロロ硫酸等が代表的なものである。
もちろん酸の誘導体であるエステル、金属塩、無
水物は上記具体例の化合物のみに限定されるもの
ではない。
スチレン類の二量化反応を進行させるには上記
のごときスルホネートアニオンを生成する化合物
として、酸もしくはその誘導体を反応系に添加す
ることによる。
これらの化合物を反応系に添加すれば化合物の
解離により生ずるスルホネートアニオンの存在下
にスチレン類の二量化反応が選択的に起こる。そ
れ単独では活性が二量化反応に不充分な場合(た
とえば上記誘導体の場合に見られることである
が)には、硫酸やHF等のプロトン酸あるいは
BF3,FeCl3,I2等のルイス酸のごとき酸と組合
せて用いれば、化合物が酸による複分解で活性化
されて、反応が進行するに充分な量のスルホネー
トアニオンが生成しその結果スルホネートアニオ
ン存在下のスチレン類の二量化反応を満足すべき
程度に進行させることが容易に達成される。
本発明のスルホネートアニオン源として100%
硫酸より強い酸として定義される超強酸は活性が
高く触媒量が少なくてすむので最も好ましいもの
である。
また、超強酸のエステル、金属塩または酸無水
物の場合でもプロトン酸やルイス酸と組合わせる
ことによつて同等効果が得られる。スルホネート
アニオンを生成する超強酸の代表的なものは、
R′SO3HのR′がフツ素、塩素あるいはパーフルオ
ルアルキルであるフルオル硫酸、クロル硫酸、ト
リフルオルメタンスルホン酸、パーフルオルエタ
ンスルホン酸、パーフルオルプロパンスルホン酸
等あるいはR′がハロゲン置換芳香族炭化水素で
あるパラフルオルベンゼンスルホン酸、パラクロ
ロベンゼンスルホン酸、パラブロムベンゼンスル
ホン酸、2,4,6−トリクロロベンゼンスルホ
ン酸、2,4,6−トリフルオロベンゼンスルホ
ン酸、2,4,6−トリブロムベンゼンスルホン
酸等である。
スチレン類のカチオン重合は、スチレンモノマ
ーに触媒化合物が作用して、モノマーカチオンと
触媒から生成したアニオンとの対イオンが生成す
ることにより開始する。この対イオンにさらにモ
ノマーが付加して重合反応が進行するのである。
一方、重合の停止反応は生成したポリマーイオン
対のプロトン脱離反応による。この場合アニオン
の種類によつては、モノマー付加反応性、プロト
ン脱離反応性、およびアニオン自身がポリマー末
端に付加して安定化する反応性について相違があ
る。たとえば、硫酸やハロゲン化金属アニオンで
はスチレンモノマーの付加反応が主となり、オリ
ゴマー以上の重合体となる。
ただし、ステレンのα位にアルキル基が置換し
たα−アルキルスチレン類モノマーの場合は、α
−アルキル基の立体障害により二量体以上に生長
しにくく、二量体が容易に得られる。
これに対し、α−アルキル基を有しないスチレ
ン類モノマーについては、これまで収率よく二量
化する方法は提供されず、オリゴマーもしくはオ
リゴマーと高重合体との混合物しか得られていな
かつた。反応温度が高くなるとプロトン脱離反応
が促進され、二量体で反応が停止しやすくなるが
ラジカル重合による高重合生成物が増加するとと
もに、プロトン脱離の際の分子内環化により飽和
二量体が増加する。
本発明者らはスチレン類のカチオン重合を研究
の結果、二量化で重合が停止する程度のプロトン
脱離性を有し、しかもプロトン脱離の際に分子内
付加による飽和二量体を生成することのないアニ
オンおよび温度条件を見出して本発明を完成した
のである。
反応系に存在すべきスルホネートアニオンの使
用量はスチレン類1モルに対し0.1〜200ミリモル
当量が好ましい。この範囲外でも使用できるが、
少量では満足すべき程度の反応速度が得られず反
応時間を要し、他方多量では触媒除去の手間を余
計に要し経済的に不利である。
反応温度は、〜℃を越え150℃以下の温度範囲
内で適宜選択できるがさらに好ましくは20℃〜80
℃の温度範囲内である。0℃以下の場合には、ス
チレン類の三量体以上のオリゴマーあるいはさら
に高重合度のポリマーが生成し、一方反応温度が
高い場合には反応速度が上昇するがスチレン類の
ラジカル重合が生じたり、飽和二量体が生成して
不飽和二量体の選択率が低下するので150℃以下
の適当な温度範囲で二量化反応を行なう必要があ
る。
本発明の反応は、溶媒の存在下でで行なうこと
が好ましい。溶媒はスチレン類のカチオン重合を
停止させないような性質のものであればよい。溶
媒の好ましい具体例は、ベンゼン、クロルベンゼ
ン、ジクロルベンゼン、トリクロルベンゼン、ニ
トロベンゼンのごとき芳香族化合物;炭素数5〜
18、たとえばn−ヘキサンのごとき飽和脂肪族炭
化水素;シクロヘキサン、メチルシクロヘキサ
ン、エチルシクロヘキサン、ジメチルシクロヘキ
サン、トリメチルシクロヘキサン、メチルエチル
シクロヘキサンやデカリンのような飽和脂環式炭
化水素;あるいはこれらのハロゲン化物である塩
化メチレン、クロロホルム、四塩化炭素、ジクロ
ルエタン、トリクロルエタン等である。もちろん
本発明に使用し得る溶媒はここに具体的に例示し
た化合物に限定されるものではない。なお、溶媒
は二種以上を混合して用いることもできる。
本発明の反応は、液相反応条件下で行なわれ、
液相を保つために必要に応じて加圧することが可
能である。
不飽和二量体は反応混合物から減圧蒸留によつ
て単離することができる。
本発明によるときは、生成するスチレン類の二
量体がすべて不飽和二量体であり、かつその収率
がきわめてすぐれている。
以下実施例により本発明をさらに詳細に説明す
る。
実施例 1
乾燥窒素中でスチレンのベンゼン溶液にトリフ
ルオルメタンスルホン酸(CF3SO3H)のベンゼ
ン溶液を加え、スチレン濃度0.50モル/、触媒
濃度0.20ミリモル/の初期条件で、温度50℃で
120分間反応させた。アンモニア性メタノールで
反応を停止した後、減圧下40℃で溶媒および未反
応スチレンを除去した。
転化率は、未反応スチレンをガスクロマトグラ
フイーで定量することにより求めた。生成物中の
二量体収率は、ゲルパーミエーシヨンクロマトグ
ラフイーにより得られた生成物の分子量分布から
求めた。生成した二量体はガスクロマトグラフイ
ーでほとんど単一成分であることを確認し、その
構造はNMRおよびIRで1,3−ジフエニル−1
−ブテンであることを確認した。表1に結果を示
す。
実施例 2〜6
実施例1に準じて、触媒、溶媒、温度をかえて
スチレンの二量化反応を行なつた結果を表1に示
す。
この場合も、生成二量体は1,3−ジフエニル
−1−ブテンであつた。
The present invention relates to a method for producing unsaturated dimers of styrenes by dimerizing or codimerizing styrenes. It is known that when styrenes are dimerized or co-dimerized, saturated dimers and unsaturated dimers are generally produced. For example, in the dimerization of styrene, 1-phenyl-
3-methylindane is an unsaturated dimer with 1,
3-diphenyl-1-butene is obtained in each case. Unsaturated dimers of styrenes are useful compounds in themselves and as raw materials for various reactions, but it has not been possible to obtain unsaturated dimers with good selectivity during dimerization of styrenes. When sulfuric acid is used as a catalyst, the production of saturated dimers, trimers, and higher oligomers is unavoidable. In addition, in order to improve the selectivity of unsaturated dimers, it is necessary to lower the sulfuric acid concentration or raise the temperature, which tends to cause corrosion of the equipment. When solid acids or acid clay are used, saturated dimers are mainly produced. The present invention solves these drawbacks and provides a method for obtaining unsaturated dimers of styrenes with good selectivity and high yield through dimerization or co-dimerization of styrenes. The present invention provides that in the presence of sulfonate anions, 0
This is a method for producing an unsaturated dimer of styrenes, which is characterized by dimerizing styrenes represented by the following formula () in a temperature range exceeding 150°C. (In the formula, R is hydrogen or a lower alkyl group having 1 to 3 carbon atoms, n is the number of alkyl groups when R is an alkyl group and is 1 or 2, and when n is 2, R is the same or different alkyl group. ) The styrene used in the present invention has the formula ()
Any compound represented by the above formula may be used, but styrene, m- or p-vinyltoluene, etc. can be advantageously used, especially industrially. In the present invention, two or more types of styrenes can also be used for co-dimerization. The present invention involves dimerizing styrenes represented by the formula () in the presence of a sulfonate anion. The sulfonate anion in the present invention is represented by the formula (). R′SO 3 - ………() R′ is a fluorine atom or a chlorine atom, and is further a fluorine substituted product of an aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue, or an aromatic hydrocarbon residue. , a chlorine-substituted product or a bromine-substituted product. The aliphatic hydrocarbon residue preferably has 1 to 3 carbon atoms, the alicyclic hydrocarbon residue preferably has 5 to 8 carbon atoms, and the aromatic hydrocarbon residue preferably has a monocyclic or bicyclic ring with 6 to 18 carbon atoms. Typical specific examples of sulfonate anions are as follows. Fluorosulfate ion when R′ is a fluorine atom. Chlorosulfate ion when R′ is a chlorine atom. When R′ is a substituent, trifluoromethanesulfonate anion, perfluoroethanesulfonate anion, perfluoropropanesulfonate anion, parafluorobenzenesulfonate anion, 2,4,6-trifluorobenzenesulfonate anion, parachlorobenzene Sulfonate anion, 2,4,6-trichlorobenzenesulfonate anion, parabromobenzenesulfonate anion, 2,4,6-tribromobenzenesulfonate anion. In the dimerization reaction of styrene compounds, in order to allow these sulfonate anions to be present in the reaction system and proceed with the reaction, compounds in the form of acids (R′SO 3 H) or alkyl derivatives thereof having 1 to 3 carbon atoms are used. Ester (R′SO 3 R″) with group (R″),
A compound in the form of a metal salt represented by R′SO 3 M or an acid anhydride represented by (R′SO 2 ) 2 O is added to the reaction system. Typical examples of acids that generate sulfonate anions (R'SO 3 - ) are fluorosulfuric acid, chlorosulfuric acid, trifluoromethanesulfonic acid, perfluoroethanesulfonic acid, perfluoropropanesulfonic acid, and parafluorobenzene. sulfonic acid, 2,
These include 4,6-trifluorobenzenesulfonic acid, parachlorobenzenesulfonic acid, 2,4,6-trichlorobenzenesulfonic acid, parabromobenzenesulfonic acid, 2,4,6-tribromobenzenesulfonic acid, and the like. Esters are alkyl esters of these acids, and typical examples include methyl ester, ethyl ester, and propyl ester. Typical metal salts of these acids are salts in which the metal (M) is sodium, potassium, magnesium, calcium, barium, or the like. Typical acid anhydrides of these acids include pyrochlorosulfuric acid.
Of course, the acid derivatives such as esters, metal salts, and anhydrides are not limited to the above-mentioned specific examples. In order to advance the dimerization reaction of styrenes, an acid or a derivative thereof is added to the reaction system as a compound that produces the above-mentioned sulfonate anion. When these compounds are added to the reaction system, a dimerization reaction of styrenes occurs selectively in the presence of sulfonate anions generated by dissociation of the compounds. If the activity alone is insufficient for the dimerization reaction (as is the case, for example, with the above derivatives), protonic acids such as sulfuric acid or HF or
When used in combination with an acid such as a Lewis acid such as BF 3 , FeCl 3 , I 2 etc., the compound is activated by acid metathesis and a sufficient amount of sulfonate anion is produced for the reaction to proceed, resulting in the formation of sulfonate anion. It is easily achieved that the dimerization reaction of styrenes in the presence proceeds to a satisfactory degree. 100% as the sulfonate anion source of the present invention
Super strong acids, which are defined as acids stronger than sulfuric acid, are most preferred because they have high activity and require a small amount of catalyst. Furthermore, even in the case of esters, metal salts, or acid anhydrides of super strong acids, equivalent effects can be obtained by combining them with protonic acids or Lewis acids. Typical superacids that generate sulfonate anions are:
Fluorosulfuric acid, chlorosulfuric acid, trifluoromethanesulfonic acid, perfluoroethanesulfonic acid, perfluoropropanesulfonic acid, etc. where R′ of R′SO 3 H is fluorine, chlorine or perfluoroalkyl, or R′ is Halogen-substituted aromatic hydrocarbons parafluorobenzenesulfonic acid, parachlorobenzenesulfonic acid, parabromobenzenesulfonic acid, 2,4,6-trichlorobenzenesulfonic acid, 2,4,6-trifluorobenzenesulfonic acid, 2 , 4,6-tribromobenzenesulfonic acid and the like. Cationic polymerization of styrenes starts when a catalyst compound acts on a styrene monomer to generate a counter ion between the monomer cation and an anion generated from the catalyst. Further monomer is added to this counterion, and the polymerization reaction proceeds.
On the other hand, the termination reaction of polymerization is caused by a proton elimination reaction between the generated polymer ion pairs. In this case, depending on the type of anion, there are differences in monomer addition reactivity, proton elimination reactivity, and reactivity in which the anion itself is added to the polymer terminal and stabilized. For example, in the case of sulfuric acid or metal halide anions, the addition reaction of styrene monomers is the main reaction, resulting in polymers higher than oligomers. However, in the case of α-alkylstyrene monomers in which an alkyl group is substituted at the α-position of sterene, α
- Due to the steric hindrance of the alkyl group, it is difficult to grow more than a dimer, and a dimer is easily obtained. On the other hand, for styrene monomers that do not have an α-alkyl group, no method has been provided for dimerizing them with good yield, and only oligomers or mixtures of oligomers and high polymers have been obtained. As the reaction temperature increases, the proton elimination reaction is accelerated, and the reaction tends to stop at the dimer level, but at the same time, the amount of highly polymerized products due to radical polymerization increases, and saturated dimerization occurs due to intramolecular cyclization during proton elimination. body increases. As a result of research on the cationic polymerization of styrenes, the present inventors found that it has proton elimination properties to the extent that polymerization is terminated by dimerization, and that saturated dimers are generated by intramolecular addition upon proton elimination. The present invention was completed by discovering unique anions and temperature conditions. The amount of sulfonate anion to be used in the reaction system is preferably 0.1 to 200 mmole equivalent per mole of styrene. Although it can be used outside this range,
If the amount is too small, a satisfactory reaction rate cannot be obtained and reaction time is required, while if the amount is too large, it will require additional effort to remove the catalyst, which is economically disadvantageous. The reaction temperature can be selected as appropriate within the temperature range of more than 150°C, more preferably 20°C to 80°C.
Within the temperature range of ℃. If the temperature is below 0°C, oligomers of styrene trimers or higher or polymers with a higher degree of polymerization will be produced, while if the reaction temperature is high, the reaction rate will increase, but radical polymerization of styrene may occur. Since saturated dimers are produced and the selectivity for unsaturated dimers decreases, it is necessary to carry out the dimerization reaction at an appropriate temperature range of 150° C. or lower. The reaction of the present invention is preferably carried out in the presence of a solvent. Any solvent may be used as long as it does not stop the cationic polymerization of styrenes. Preferred specific examples of the solvent include aromatic compounds such as benzene, chlorobenzene, dichlorobenzene, trichlorobenzene, and nitrobenzene;
18, saturated aliphatic hydrocarbons such as n-hexane; saturated alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, ethylcyclohexane, dimethylcyclohexane, trimethylcyclohexane, methylethylcyclohexane and decalin; or halides thereof. These include methylene chloride, chloroform, carbon tetrachloride, dichloroethane, trichloroethane, etc. Of course, the solvents that can be used in the present invention are not limited to the compounds specifically exemplified here. In addition, two or more types of solvents can also be used in combination. The reaction of the present invention is carried out under liquid phase reaction conditions,
Pressure can be applied as necessary to maintain the liquid phase. The unsaturated dimer can be isolated from the reaction mixture by vacuum distillation. According to the present invention, all of the styrene dimers produced are unsaturated dimers, and the yield thereof is extremely high. The present invention will be explained in more detail with reference to Examples below. Example 1 A benzene solution of trifluoromethanesulfonic acid (CF 3 SO 3 H) was added to a benzene solution of styrene in dry nitrogen, and the mixture was heated at a temperature of 50°C under the initial conditions of a styrene concentration of 0.50 mol/, a catalyst concentration of 0.20 mmol/
The reaction was allowed to proceed for 120 minutes. After terminating the reaction with ammoniacal methanol, the solvent and unreacted styrene were removed under reduced pressure at 40°C. The conversion rate was determined by quantifying unreacted styrene using gas chromatography. The yield of dimer in the product was determined from the molecular weight distribution of the product obtained by gel permeation chromatography. The produced dimer was confirmed to be almost a single component by gas chromatography, and its structure was determined to be 1,3-diphenyl-1 by NMR and IR.
- Confirmed to be butene. Table 1 shows the results. Examples 2 to 6 Table 1 shows the results of styrene dimerization reactions conducted in the same manner as in Example 1 by changing the catalyst, solvent, and temperature. In this case as well, the dimer produced was 1,3-diphenyl-1-butene.
【表】
実施例 7,8
ステレンをm−ビニルトルエン(65%)、p−
ビニルトルエン(35%)の混合物にかえ、触媒と
してトリフルオルメタンスルホン酸
(CF3SO3H)およびトリフルオルメタンスルホン
酸ナトリウムと硫酸(CF3SO3Na+H2SO4)の
10:1(モル比)の組合せの2種について、それ
ぞれ実施例1,6に準じてビニルトルエンの二量
化反応を行なつた。それぞれ生成物は、1,3−
ビス(4−メチルフエニル)−1−ブテン;1,
3−ビス−(3−メチルフエニル)−1−ブテン;
1−(4−メチルフエニル)−3−(3−メチルフ
エニル)−1−ブテン;1−(3−メチルフエニ
ル)−3−(4−メチルフエニル)−1−ブテンの
混合物であり、転化率は100wt%、二量体収率は
85wt%であつた。
比較例 1〜3
比較例1では、実施例1と同一の触媒を用い
て、0℃以下の温度で実施例1の方法に準じてス
チレンを反応させた。
表2の結果から明らかなように二量体の生成が
わずかした認められない。
比較例2では、触媒として、メタンスルホン
酸、シクロヘキサンスルホン酸、p−トルエンス
ルホン酸を用いて触媒量、その他は実施例1と同
様にしてスチレンを反応させた。その結果、ハロ
ゲン原子を含まないスルホネートアニオンの存在
下では、低活性であつて、かつ生成物中の二量体
の収率が低く、三量体以上の重合体が30%以上生
成していた。
比較例3では、実施例1と同じトリフルオロメ
タンスルホン酸を触媒とし、α−メチルスチレン
を実施例1と同様に反応させたところ、生成物中
の二量体としては環状の飽和二量体が多量に生成
しており、α−メチルスチレンでは反応挙動が異
なることを示していた。[Table] Examples 7 and 8 Sterene was mixed with m-vinyltoluene (65%) and p-vinyltoluene (65%).
Instead of a mixture of vinyltoluene (35%), trifluoromethanesulfonic acid (CF 3 SO 3 H) and sodium trifluoromethanesulfonate and sulfuric acid (CF 3 SO 3 Na + H 2 SO 4 ) were added as catalysts.
Dimerization reactions of vinyltoluene were carried out in accordance with Examples 1 and 6 for two types of combinations of 10:1 (molar ratio). Each product is 1,3-
Bis(4-methylphenyl)-1-butene; 1,
3-bis-(3-methylphenyl)-1-butene;
1-(4-methylphenyl)-3-(3-methylphenyl)-1-butene; It is a mixture of 1-(3-methylphenyl)-3-(4-methylphenyl)-1-butene, and the conversion rate is 100wt%. The dimer yield is
It was 85wt%. Comparative Examples 1 to 3 In Comparative Example 1, styrene was reacted using the same catalyst as in Example 1 at a temperature of 0° C. or lower according to the method of Example 1. As is clear from the results in Table 2, only a small amount of dimer formation was observed. In Comparative Example 2, styrene was reacted using methanesulfonic acid, cyclohexanesulfonic acid, and p-toluenesulfonic acid as catalysts in the same manner as in Example 1 except for the catalytic amounts. As a result, in the presence of a sulfonate anion that does not contain a halogen atom, the activity was low and the yield of dimer in the product was low, with more than 30% of polymers of trimer or higher being formed. . In Comparative Example 3, α-methylstyrene was reacted in the same manner as in Example 1 using the same trifluoromethanesulfonic acid as in Example 1, and the dimer in the product was a cyclic saturated dimer. It was produced in large amounts, indicating that the reaction behavior was different for α-methylstyrene.
【表】
比較例 4〜6
従来公知の硫酸、三フツ化ホウ素(エチルエー
テル溶液)(BF3O(C2H5)2)、固体酸(水沢化学
製のガレオンアース036)を用いてスチレンを反
応させた結果を表3に示す。
表3から明らかなように、硫酸の場合は、相当
量の飽和二量体および三量体以上のオリゴマーの
生成が認められた。三フツ化ホウ素(エチルエー
テル溶液)(BF2O(C2H5)2)の場合は二量体の生
成が認められずほとんどが三量体以上のオリゴマ
ーであつた。また固体酸(シリカ・アルミナ)の
場合は、二量体収率が低く、かつ二量体中の不飽
和成分が20%と非常に低い。[Table] Comparative Examples 4 to 6 Styrene was prepared using conventionally known sulfuric acid, boron trifluoride (ethyl ether solution) (BF 3 O (C 2 H 5 ) 2 ), and solid acid (Galleon Earth 036 manufactured by Mizusawa Chemical). Table 3 shows the results of the reaction. As is clear from Table 3, in the case of sulfuric acid, formation of a considerable amount of saturated dimers and oligomers of trimers and higher was observed. In the case of boron trifluoride (ethyl ether solution) (BF 2 O(C 2 H 5 ) 2 ), no dimer was observed and most of the samples were oligomers of trimer or higher. Furthermore, in the case of solid acids (silica/alumina), the dimer yield is low, and the unsaturated component in the dimer is extremely low at 20%.
Claims (1)
ニオンの存在下に0℃を越え150℃以下の温度範
囲で下記式()であらわされるスチレン類を二
量化させることを特徴とするスチレン類の不飽和
二量体の製法。 (Rは水素または炭素数1〜3の低級アルキル
基、nはRがアルキル基の場合のアルキル基の数
であつて1もしくは2、nが2の場合Rは同一も
しくは異なるアルキル基であつてよい。) R′SO3 - ………() (R′はフツ素原子、塩素原子および脂肪族炭
化水素残基、脂環式炭化水素残基もしくは芳香族
炭化水素残基のフツ素置換体、塩素置換体もしく
は臭素置換体からなる群から選ばれた置換基。)[Scope of Claims] 1. A styrene characterized by dimerizing a styrene represented by the following formula () in the presence of a sulfonate anion represented by the following formula () in a temperature range exceeding 0°C and not more than 150°C. A method for producing unsaturated dimers of the following types. (R is hydrogen or a lower alkyl group having 1 to 3 carbon atoms, n is the number of alkyl groups when R is an alkyl group and is 1 or 2, and when n is 2, R is the same or different alkyl group. Good.) R′SO 3 - ………() (R′ is a fluorine atom, a chlorine atom, and a fluorine substituted product of an aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue, or an aromatic hydrocarbon residue) (a substituent selected from the group consisting of , chlorine-substituted product, or bromine-substituted product).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58142484A JPS5962535A (en) | 1983-08-05 | 1983-08-05 | Preparation of unsaturated dimer of styrene compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58142484A JPS5962535A (en) | 1983-08-05 | 1983-08-05 | Preparation of unsaturated dimer of styrene compound |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50039744A Division JPS5910329B2 (en) | 1975-04-03 | 1975-04-03 | Method for producing unsaturated dimers of styrenes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5962535A JPS5962535A (en) | 1984-04-10 |
| JPS6116371B2 true JPS6116371B2 (en) | 1986-04-30 |
Family
ID=15316392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58142484A Granted JPS5962535A (en) | 1983-08-05 | 1983-08-05 | Preparation of unsaturated dimer of styrene compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5962535A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5246848B2 (en) * | 2008-02-28 | 2013-07-24 | 独立行政法人産業技術総合研究所 | Method for producing alkyne derivative |
-
1983
- 1983-08-05 JP JP58142484A patent/JPS5962535A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5962535A (en) | 1984-04-10 |
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