JPS6117916B2 - - Google Patents
Info
- Publication number
- JPS6117916B2 JPS6117916B2 JP631381A JP631381A JPS6117916B2 JP S6117916 B2 JPS6117916 B2 JP S6117916B2 JP 631381 A JP631381 A JP 631381A JP 631381 A JP631381 A JP 631381A JP S6117916 B2 JPS6117916 B2 JP S6117916B2
- Authority
- JP
- Japan
- Prior art keywords
- strip
- seal roll
- foreign matter
- plating
- plating liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
本発明は横型電気メツキ装置におけるメツキ操
業方法に関する。
ストリツプの連続メツキ装置としてメツキ槽の
入側及び出側にシールロールを備えた横型電気メ
ツキ装置が知られている。第3図及び第4図はこ
のような装置の一例を示すもので、メツキ槽1上
部の入側と出側にはそれぞれシールロール2,2
及び3,3が設けられ、メツキ液4がシールされ
る。ストリツプ5は入側シールロール2,2間か
らメツキ槽1内に入り、上下電極6,6′を通つ
て出側シールロール3,3間から槽外へ抜け出る
もので、この際ストリツプ5表面のメツキ液が絞
られるようになつている。このような装置では、
前記電極6,6′は複数の金属角棒からなつてい
るが、この金属角棒に〓間が生じたりした場合、
その間に電位差が生じ、このため電極そのものの
表面にメツキ金属が析出してしまうという現象が
起きる。このようにして析出した金属は電極表面
との密着性が悪く、振動やメツキ液の噴流によつ
て容易に剥離し、異物となつてメツキ液中に含ま
れ、その一部がストリツプとともに出側のシール
ロール3,3に噛込まれてしまう。第6図はこの
ような噛込みの状況を示すもので、ストリツプの
ラインスピードが遅い場合には、同図aで示すよ
うに、異物7はストリツプ5上面に落下し、その
まま出側シールロール3に噛込まれ、またライン
スピードが比較的速い場合は、同図bで示すよう
にメツキ液4中に浮遊した異物7が直接出側シー
ルロール3に噛込まれ、またラインスピードがさ
らに速い場合には、同図cで示すように出側シー
ルロール3の近傍に乱流が生じ異物7の一部は出
側シールロール3上方に押し出されるような状態
となるが、他の一部は出側シールロール3に噛込
まれてしまうことになる。このように、いずれに
しても異物7の出側シールロール3への噛込みは
不可避的なものとなるが、異物7がストリツプ5
とともに出側シールロール3に噛込まれた場合、
第6図aでも示すように、異物7′がストリツプ
表面に圧着されてそのまま残つたり、またストリ
ツプ5に異物7による押疵が生じたりして、製品
の品質を落してしまうという問題がある。
本発明はこのような従来の問題点を解消すべく
創案されたもので、メツキ液中の異物の出側シー
ルロールへの噛込みを防止し、もつて異物による
ストリツプ表面の押疵の発生を防止しつつメツキ
を行うことができる操業方法を提供せんとするも
のである。
本発明は出側シールロールの噛込み側に噴射ノ
ズルを設け、上下電極間を出て出側シールロール
噛込み直前のストリツプ上面側において、メツキ
液をストリツプ幅方向片側の端から他側の端方向
へ噴射せしめることにより、ストリツプ幅方向他
側端での流速が0.1m/s以上のメツキ液流を出側
シールロールに沿つて形成せしめるものであり、
かくするならば、出側シールロール噛込み側に浮
遊し或はストリツプ上面に落下している異物は前
記噴射ノズルからの出側シールロールに沿つた流
れにより噛込み部から吹き飛ばされ、異物の出側
シールロールへの噛込みが適正に防止される。
第1図及び第2図は本発明の実施例を示すもの
であつて、9はメツキ液の貯蔵槽であり、メツキ
液はこの貯蔵槽9とメツキ槽1間を循環するよう
になつている。本発明の実施に用いられる噴射ノ
ズル10は、ストリツプ幅方向片側の端で出側シ
ールロール3,3のストリツプ上面側噛込み部に
近接した状態に配設され、そのノズル口11は水
平ないし斜め下向きの状態でストリツプ5幅方向
他側の端方向を向いている。前記噴射ノズル10
には貯蔵槽9からの配管12が接続され、この配
管12途中にはポンプ13が設けられている。
本発明はかかる構成において、メツキ中前記ポ
ンプ13によつて貯蔵槽9内のメツキ液を噴射ノ
ズル10に供給し、上下電極6,6′間を出て出
側シールロール3に噛込む直前のストリツプ上面
側において、この噴射ノズル10からメツキ液を
ストリツプ5幅方向の他側の端方向へ噴射せし
め、出側シールロール3,3に沿つた流れを形成
せしめるものである。かくすれば、出側シールロ
ール3近傍で浮遊し或はストリツプ5上面に載つ
ている異物は出側シールロール3に噛込む直前に
該シールロールに沿つたメツキ液流によつてスト
リツプ外方に押し流され、これによつて出側シー
ルロール3への異物の噛込みは適正に防止され
る。
このようにして異物を噴流により押し流すには
第2図におけるA点、すなわちストリツプ5幅方
向他端側での流速が最低0.1m/s必要であり、し
たがつて上記A点における流速が0.1m/s以上と
なるよう上記メツキ液流が形成される。そして、
このような流速を確保すべく、前記噴射ノズル1
0の噴射量、噴射圧等が決定される。
なお、本発明における噴射ノズル10による噴
射角度、換言すれば噴射ノズル10のストリツプ
5に対する下向きの傾斜角度αは0α<90゜の
範囲で適宜選択できるが、噴射の効率性等を考慮
すれば0α45゜とすることが好ましい。また
噴射ノズル10はシールロール3の噛込み部にな
るべく近いほうが好ましい。
下表は、本発明法を連続電気亜鉛メツキにおけ
るストリツプのラインスピードとメツキ液の流速
とを種々変化させて実施した結果を異物対策を何
ら講じていない従来法と比較して示したものであ
る。なお、本発明では、いずれの場合も前記A点
での噴射ノズル10による流速を0.8m/sとした
ものである。
The present invention relates to a plating operation method in a horizontal electroplating device. As a continuous strip plating device, a horizontal electroplating device is known which is equipped with seal rolls on the inlet and outlet sides of a plating tank. Figures 3 and 4 show an example of such a device, in which seal rolls 2 and 2 are installed at the entrance and exit sides of the upper part of the plating tank 1, respectively.
and 3, 3 are provided, and the plating liquid 4 is sealed. The strip 5 enters the plating tank 1 between the entrance seal rolls 2 and 2, passes through the upper and lower electrodes 6 and 6', and exits from between the exit seal rolls 3 and 3. The liquid is being squeezed out. In such a device,
The electrodes 6, 6' are made up of a plurality of square metal rods, but if gaps occur between the square metal rods,
A potential difference occurs between them, and this causes a phenomenon in which plating metal is deposited on the surface of the electrode itself. The metal deposited in this way has poor adhesion to the electrode surface, and is easily peeled off by vibration or jets of plating solution, becoming foreign matter and being included in the plating solution, and some of it is released along with the strip. It gets caught in the seal rolls 3, 3. FIG. 6 shows this kind of jamming situation. When the line speed of the strip is slow, the foreign matter 7 falls onto the upper surface of the strip 5 as shown in FIG. If the line speed is relatively high, the foreign matter 7 floating in the plating liquid 4 will be directly caught by the exit seal roll 3, as shown in Figure b, and if the line speed is even faster. In this case, turbulent flow occurs near the exit seal roll 3, as shown in c in the same figure, and part of the foreign matter 7 is pushed out above the exit seal roll 3, but the other part is pushed out. This will cause the side seal roll 3 to get caught. In this way, in any case, the foreign matter 7 is unavoidably caught in the exit seal roll 3, but if the foreign matter 7 is caught in the strip 5.
If it is bitten by the exit side seal roll 3,
As shown in FIG. 6a, there are problems in that the foreign matter 7' is pressed onto the strip surface and remains there, and the strip 5 is dented by the foreign matter 7, which deteriorates the quality of the product. . The present invention was devised to solve these conventional problems, and it prevents foreign matter in the plating liquid from getting caught in the exit seal roll, thereby preventing the occurrence of scratches on the strip surface due to foreign matter. The purpose of the present invention is to provide an operating method that can perform plating while preventing the occurrence of plating. In the present invention, an injection nozzle is provided on the biting side of the exit seal roll, and the plating liquid is sprayed from one end of the strip in the width direction to the other end on the upper surface side of the strip that exits between the upper and lower electrodes and immediately before the exit seal roll is bitten. By injecting it in the direction, a plating liquid flow with a flow velocity of 0.1 m/s or more at the other end of the strip width direction is formed along the exit side seal roll,
In this way, foreign matter floating on the side where the exit side seal roll is caught or falling onto the upper surface of the strip is blown away from the biting part by the flow from the injection nozzle along the exit side seal roll, and the foreign matter is removed. Caught in the side seal roll is properly prevented. 1 and 2 show an embodiment of the present invention, in which numeral 9 is a storage tank for plating liquid, and the plating liquid is circulated between storage tank 9 and plating tank 1. . The injection nozzle 10 used in the practice of the present invention is disposed at one end of the strip in the width direction in close proximity to the biting part on the upper surface side of the strip of the exit seal rolls 3, 3, and its nozzle opening 11 is arranged horizontally or diagonally. In the downward state, the strip 5 faces the other end in the width direction. The injection nozzle 10
A pipe 12 from the storage tank 9 is connected to the pipe 12, and a pump 13 is provided in the middle of the pipe 12. In the present invention, in such a configuration, the plating liquid in the storage tank 9 is supplied to the injection nozzle 10 by the pump 13 during plating, and immediately before it exits between the upper and lower electrodes 6 and 6' and bites into the exit side seal roll 3. On the upper surface side of the strip, the plating liquid is injected from this injection nozzle 10 toward the other end of the strip 5 in the width direction, thereby forming a flow along the exit seal rolls 3, 3. In this way, foreign matter floating near the exit seal roll 3 or placed on the upper surface of the strip 5 is removed from the strip by the plating liquid flow along the seal roll immediately before it is bitten by the exit seal roll 3. As a result, foreign matter is properly prevented from getting caught in the exit seal roll 3. In order to sweep away foreign matter with a jet stream in this way, the flow velocity at point A in Fig. 2, that is, at the other end of the strip 5 in the width direction, must be at least 0.1 m/s. Therefore, the flow velocity at point A is 0.1 m/s. The plating liquid flow is formed so that the plating liquid flow is equal to or greater than /s. and,
In order to ensure such a flow velocity, the injection nozzle 1
The injection amount, injection pressure, etc. of 0 are determined. Incidentally, in the present invention, the injection angle by the injection nozzle 10, in other words, the downward inclination angle α of the injection nozzle 10 with respect to the strip 5 can be appropriately selected in the range of 0α<90°, but if the efficiency of injection etc. is taken into consideration, it is 0α45 It is preferable to set it to ゜. Further, it is preferable that the injection nozzle 10 be as close to the biting portion of the seal roll 3 as possible. The table below shows the results of implementing the method of the present invention in continuous electrogalvanizing by varying the strip line speed and plating solution flow rate in comparison with the conventional method that does not take any measures against foreign matter. . In addition, in the present invention, the flow velocity by the injection nozzle 10 at the point A is set to 0.8 m/s in both cases.
【表】【table】
【表】
以上の表からも明らかなように、本発明法によ
れば、従来法に較べ異物噛込みによる押疵の発生
を大幅に抑えることができ、特にラインスピード
が高い場合、押疵等の欠陥がほとんどないことが
判る。
以上述べた本発明法によれば、出側シールロー
ルへ噛込む直前の異物をメツキ槽中の出側シール
ロールに沿つたメツキ液流で押し流し、異物の出
側シールロールへの噛込みを適正に防止すること
ができ、これによりストリツプの押疵の発生を防
止し、良好な品質のメツキ製品を得ることができ
るという優れた効果がある。[Table] As is clear from the above table, according to the method of the present invention, the occurrence of dents due to foreign matter getting caught can be significantly suppressed compared to the conventional method, and especially when the line speed is high, dents, etc. It can be seen that there are almost no defects. According to the method of the present invention described above, the foreign matter that is about to get caught in the exit seal roll is swept away by the plating liquid flow along the exit seal roll in the plating tank, and the foreign matter is properly caught in the exit seal roll. This has the excellent effect of preventing the occurrence of scratches on the strip and making it possible to obtain a plated product of good quality.
第1図ないし第3図は本発明の実施に利用され
る噴射ノズルの電気メツキ装置への取付状態を示
すもので、第1図は側面を示す説明図、第2図は
平面を示す説明図、第3図は噴射ノズルのストリ
ツプに対する傾斜角度を示す説明図である。第4
図及び第5図は従来の電気メツキ設備を示すもの
で、第4図は側面を示す説明図、第5図は平面を
示す説明図である。第6図a〜cは異物の出側シ
ールロールへの噛込み状況を示す説明図である。
図において、7は異物、10は噴射ノズルを各
示す。
Figures 1 to 3 show how the injection nozzle used in carrying out the present invention is attached to the electroplating device, with Figure 1 being an explanatory side view and Figure 2 being a plan view. , FIG. 3 is an explanatory diagram showing the inclination angle of the injection nozzle with respect to the strip. Fourth
5 and 5 show conventional electroplating equipment, FIG. 4 is an explanatory view showing a side view, and FIG. 5 is an explanatory view showing a plan view. FIGS. 6a to 6c are explanatory diagrams showing how foreign matter gets caught in the exit seal roll. In the figure, 7 indicates a foreign object, and 10 indicates an injection nozzle.
Claims (1)
射ノズルにより、上下電極間を出て出側シールロ
ール噛込み直前のストリツプ上面側において、メ
ツキ液をストリツプ幅方向片側の端から他側の端
方向へ噴射せしめることにより、ストリツプ幅方
向他側端での流速が0.1m/s以上のメツキ液流を
出側シールロールに沿つて形成せしめることを特
徴とする横型電気メツキ装置の操業方法。1 A spray nozzle installed on the biting side of the exit seal roll sprays the plating liquid from one end of the strip in the width direction to the other end on the upper surface side of the strip that exits between the upper and lower electrodes and immediately before the exit seal roll bites. 1. A method for operating a horizontal electroplating device, characterized in that a plating liquid flow is formed along an exit seal roll with a flow velocity of 0.1 m/s or more at the other end in the width direction of the strip by injecting the plating liquid in the opposite direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP631381A JPS57120690A (en) | 1981-01-21 | 1981-01-21 | Method for prevention of inclusion of foreign matter to outlet side sealing rolls in horizontal type electroplating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP631381A JPS57120690A (en) | 1981-01-21 | 1981-01-21 | Method for prevention of inclusion of foreign matter to outlet side sealing rolls in horizontal type electroplating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57120690A JPS57120690A (en) | 1982-07-27 |
| JPS6117916B2 true JPS6117916B2 (en) | 1986-05-09 |
Family
ID=11634875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP631381A Granted JPS57120690A (en) | 1981-01-21 | 1981-01-21 | Method for prevention of inclusion of foreign matter to outlet side sealing rolls in horizontal type electroplating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57120690A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61270395A (en) * | 1985-03-28 | 1986-11-29 | Kawasaki Steel Corp | Electroplating method |
| DE05075545T1 (en) | 1998-05-20 | 2006-08-31 | Process Automation International Ltd., Tai Po | Apparatus for electroplating |
| US6261425B1 (en) | 1998-08-28 | 2001-07-17 | Process Automation International, Ltd. | Electroplating machine |
-
1981
- 1981-01-21 JP JP631381A patent/JPS57120690A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57120690A (en) | 1982-07-27 |
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