JPS6119031B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for positioning a substrate to be exposed in a mask exposure apparatus.

For example, in the production of hybrid integrated circuits in which circuit elements, conductor patterns, etc. are formed on a rectangular substrate made of ceramic, glass, etc., thin metal films, insulating films, etc. deposited on the substrate are optically and chemically coated. There is a mask exposure device as a device for selectively removing and forming a desired film pattern. That is, a substrate on which a metal film and a photoresist film are sequentially laminated is mounted and fixed on the work table of a mask exposure device, and then brought into close contact with a mask and exposed to light to create a pattern that is identical to the existing pattern of the mask. Patterns of metal etc. can be formed by etching means. At that time, in order to form various patterns at fixed positions on the substrate and to maintain the relative positional relationships of the various patterns formed in different processes with the required accuracy, the mask exposure equipment is equipped with a mechanism for positioning the exposed substrate. There is. However, in the conventional mechanism, the work table is provided with three fixing pins for positioning, and one side of the substrate to be placed contacts the outer surface of the two fixing pins, and is substantially orthogonal to one side of the substrate. The other side was configured to be positioned by contacting the outer surface of one of the fixing pins. Therefore, the contact portion of each fixing pin has the disadvantage that it is rubbed against the end face each time a substrate made of a hard material is mounted and positioned, resulting in local wear, which impairs positioning accuracy.

The purpose of the present invention is to eliminate the above-mentioned drawbacks, and the purpose is to provide two rotatable fixed rollers that are in contact with one side of a rectangular substrate, and one that is in contact with the other side of the substrate that is substantially orthogonal to the one side. a rotatable fixed roller; and a rotatable movable roller that is pressed and driven to bring one side and the other side of the substrate into contact with each of the fixed rollers; This is achieved by providing a method for positioning a mounting substrate of a mask exposure apparatus, which is characterized by pressing the substrate.

Hereinafter, the present invention will be explained using the drawings.

1A to 1H are plan views for explaining the basic configuration of the method of the present invention and an example of its operation; FIG. 2 is a sectional view of a work table of a mask exposure apparatus according to an embodiment of the present invention; FIG. 2 is a sectional view of the roller shown in FIG. 2. FIG.

In FIG. 1, 1 to 3 are fixed rollers mounted on a work table of a mask exposure device, 4 to 6 are movable rollers mounted on the table, 7 is a rectangular substrate mounted on the table, Each of the rollers 1 to 6 arranged in a hexagonal pattern is rotatable. In addition, the fixed rollers 1 and 2 and the movable rollers 4 and 5 are of the same type, and are configured to be able to reciprocate in the left and right directions in the figure (arrow A direction and arrow C direction). The roller 6 is moved in the vertical direction shown in the figure (the direction of arrow B and the direction of arrow D).
It is configured to be able to move back and forth. Hereinafter, the positioning operation of the substrate 7 will be sequentially explained.

FIG. 1a shows a state in which each of the rollers 1 to 6 has been moved outward and a substrate 7 is placed on the work table in the center thereof, and each long side of the substrate 7 is connected to the fixed rollers 1 and 2 and the movable roller 4. and 5, and each short side substantially faces the fixed roller 3 and the movable roller 6, respectively. Then the first
After the fixed rollers 1 to 3 move inward and are fixed at predetermined positions as shown in FIG.
The opposing long sides are fixed rollers 1 and 2 and movable roller 4.
and 5, the position and posture in the horizontal direction shown in the figure are corrected. At that time, the roller 1 in contact with the substrate 7
and 2, 4 and 5 are rotated naturally by contact friction. Next, the movable roller 6 moves inward as shown in FIG.
and is held between movable rollers 6, and its vertical position in the drawing is corrected. At that time, each roller 1 in contact with the substrate 7
~6 are rotated naturally by contact friction.

As a result, the substrate 7 is positioned at a predetermined position on the work table, but in order to further improve the positioning accuracy depending on the size and mechanical strength of the substrate 7 and the lamination accuracy of the formed patterns, it is necessary to
This is achieved by sequentially carrying out the operations of moving the substrate 7 outward as shown in FIGS. 1e and 1g, and then bringing it into contact with the substrate 7 again as shown in FIGS. 1f and h.

Further, after fixing the substrate 7 as shown in FIG. 1 d or h to the work table, each roller 1
- 6 are moved outward as shown in FIG. 1a, and then brought into close contact with a mask (not shown) and exposed.

In FIG. 2, a support shaft 13 is equipped with a vacuum suction plate 12 for fixing the substrate 11 to be exposed at its upper end.
is the guide shaft 1 attached to the table plate 14.
5 and can move up and down. The rotatable fixed roller 16 is connected to the drive block 1 which is slidable in the left and right direction on the table plate 14.
A movable roller 18 that is attached to 7 and is rotatable
is attached to a support block 19, and the block 19 is attached to a drive block 21 which is slidable in the left-right direction on the table plate 14 via a compression coil spring 20 for buffering. Note that the drive block 17
The stopper 22, which the tip of the roller abuts when it moves toward the center (inside) of the table, is for positioning the fixed roller 16, and the drive blocks 17 and 21 are operated by ordinary cam mechanism means for each substrate positioning operation, or The above operation can be repeated multiple times. The detailed structure of the rollers 16 and 18 is as shown in FIG. 3. The inner rings of a pair of miniature bearings 23 and 24 are mounted on a roller shaft 25, and the outer rings of the bearings 23 and 24 are fitted with a ring 26 made of a hard material. The ring 26 is fitted onto the substrate 11.
It is designed to make contact with Furthermore, in FIG. 2, one fixed roller 16 and one movable roller 1
Although only 8 is written, three fixed rollers and three movable rollers are arranged on the plate 14 in a hexagonal shape similar to that shown in FIG. It is equipped with operational functions.

A mask exposure apparatus having such a positioning mechanism fixes the substrate 11 on the suction plate 12 by the operation explained using FIG. After moving, raise the support shaft 13 and lift the substrate 1.
1 is brought into close contact with the mask 28 fixed to the holder 27.

According to the method of the present invention as explained above, since the roller that comes into contact with the substrate to be exposed rotates naturally due to its contact friction resistance when positioning the substrate to be exposed, not only is the lifespan extended without local wear, but also the movable roller There is a practical effect in that the positioning accuracy can be improved by repeating the operation touching the position a plurality of times.

[Brief explanation of the drawing]

FIG. 1 is a plan view for explaining the basic configuration of the method of the present invention and an example of its operation, FIG. 2 is a sectional view of a work table of a mask exposure apparatus according to an embodiment of the present invention, and FIG. FIG. 3 is a cross-sectional view of the roller shown in the figure. In the figure, 1 to 3 and 16 are fixed rollers, 2 to 6 and 18 are movable rollers, 7 and 11 are substrates to be exposed, 12 is a suction plate, and 14 is a table plate.

Claims (1)

[Claims] 1 In a method in which a square substrate made of ceramic or the like is coated with a photoresist film on its surface and is mounted and positioned on the work table of a mask exposure device, two rotatable fixings are used, one side of which touches the square substrate. a rotatable fixed roller that is in contact with the other side of the substrate that is substantially orthogonal to the one side; and a rotation that is driven to press so that the one side and the other side of the substrate are brought into contact with each of the fixed rollers. 1. A method for positioning a mounted substrate in a mask exposure apparatus, comprising a movable roller that can move freely, and the movable roller repeatedly presses the substrate.