JPS6124654B2 - - Google Patents
Info
- Publication number
- JPS6124654B2 JPS6124654B2 JP52023877A JP2387777A JPS6124654B2 JP S6124654 B2 JPS6124654 B2 JP S6124654B2 JP 52023877 A JP52023877 A JP 52023877A JP 2387777 A JP2387777 A JP 2387777A JP S6124654 B2 JPS6124654 B2 JP S6124654B2
- Authority
- JP
- Japan
- Prior art keywords
- operating
- power supply
- circuit
- voltage
- semiconductor circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Testing Of Individual Semiconductor Devices (AREA)
- Tests Of Electronic Circuits (AREA)
Description
【発明の詳細な説明】
本発明は、半導体回路の動作マージン特性を支
配する回路部分を効率よく効果的に解析すること
を可能にした半導体回路の試験方法に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor circuit testing method that makes it possible to efficiently and effectively analyze a circuit portion that governs the operating margin characteristics of a semiconductor circuit.
従来この種の解析を行なうには、半導体回路の
動作マージン特性の動作領域と非動作領域の境界
(以下、動作マージン境界と呼ぶ)の近傍の複数
の電源電圧もしくはクロツク電圧の条件下でのシ
ミユレーシヨンを行い、半導体回路内の個々の回
路部分について、前記電源電圧もしくはクロツク
電圧の値の変化に対する動作速度の変化及び動作
マージンの変化を詳細に調べ、その結果に基づい
て半導体回路の全体の動作マージン特性を支配し
ている回路部分を調査することが必要である。 Traditionally, this type of analysis requires simulation under conditions of multiple power supply voltages or clock voltages near the boundary between the operating region and non-operating region (hereinafter referred to as the "operating margin boundary") of the operating margin characteristics of a semiconductor circuit. Then, for each circuit part in the semiconductor circuit, changes in operating speed and changes in operating margin with respect to changes in the power supply voltage or clock voltage are investigated in detail, and based on the results, the overall operating margin of the semiconductor circuit is determined. It is necessary to investigate the parts of the circuit that govern the characteristics.
しかしこの従来の方法は、動作マージン境界上
の1つの電源電圧もしくはクロツク電圧の条件下
での半導体回路の動作特性の支配要因を調べるだ
けでも長時間を要し動作特性の解析領域が広範囲
に及ぶ場合には、その調査にさらに膨大な時間を
必要とする。 However, with this conventional method, it takes a long time to investigate the factors governing the operating characteristics of a semiconductor circuit under conditions of one power supply voltage or clock voltage on the boundary of the operating margin, and the analysis area of operating characteristics is wide-ranging. In some cases, the investigation will require even more time.
さらに従来の方法では、シミユレーシヨンの精
度に極めて抑存するため、半導体回路の動作特性
の支配要因を正確に指摘することが極めて困難で
あり、又その支配要因が回路構成になく製造プロ
セスに存在する場合には、この方法を適用出来な
いという難点も有している。 Furthermore, with conventional methods, the accuracy of simulation is extremely limited, so it is extremely difficult to accurately identify the controlling factors of the operating characteristics of semiconductor circuits, and if the controlling factors are not in the circuit configuration but in the manufacturing process also has the disadvantage that this method cannot be applied.
本発明に係る半導体回路の試験方法は、これら
従来の方法における諸難点を解決し、半導体回路
中の動作マージン特性を支配する回路部分を、そ
の動作時間で正確に指摘可能にしたものである。 The semiconductor circuit testing method according to the present invention solves the problems of these conventional methods, and makes it possible to accurately identify circuit parts that control the operating margin characteristics in a semiconductor circuit based on the operating time.
以下本発明に係る半導体回路の試験方法を、そ
の実施例に基ずいて詳細に説明する。 The semiconductor circuit testing method according to the present invention will be explained in detail below based on examples thereof.
第1図は、MOSメモリの動作マージン特性を
示す図である。 FIG. 1 is a diagram showing the operating margin characteristics of a MOS memory.
図で横軸のVDDはメモリ回路を駆動する電源
電圧、縦軸のVBBはメモリチツプの基板に印加
される基板電圧を示している。又、NAは非動作
領域、AAは動作領域、曲線AMSは動作マージン
境界を示す曲線で、点線ARで囲まれた領域は動
作規格領域を示すものである。 In the figure, VDD on the horizontal axis represents the power supply voltage that drives the memory circuit, and VBB on the vertical axis represents the substrate voltage applied to the substrate of the memory chip. Further, NA is a non-operating area, AA is an operating area, curve AMS is a curve indicating an operating margin boundary, and the area surrounded by a dotted line AR indicates an operating standard area.
又第2図は、本発明に係る方法に基ずく電源電
圧もしくはクロツク電圧印加の実施例を示す図で
あり、CEはMOSメモリ回路の駆動のために外部
から印加するクロツク電圧で、時間tSB間ではメ
モリ回路がスタンドバイ状態、即ち休止状態にあ
り、時間tCE間ではメモリ回路がイネーブル状
態、即ち動作状態にあり、時間t2でMOSメモリ回
路が作動を開始する。 FIG. 2 is a diagram showing an embodiment of applying a power supply voltage or a clock voltage based on the method according to the present invention, where CE is a clock voltage applied from the outside to drive the MOS memory circuit, and the time t SB During the time interval, the memory circuit is in a standby state, ie, in a dormant state, during time t CE , the memory circuit is in an enabled state, ie, in an operating state, and at time t 2 , the MOS memory circuit starts operating.
今第1図に示すように、A点の近傍で動作マー
ジン不良がある場合を考え、A点の近傍で同一の
基板電圧VBB1で、動作領域AA内のP点及び非
動作領域NA内のF点を取り、それぞれの電源電
圧の値をVDDP及びVDDFとする。 As shown in Fig. 1, consider the case where there is a defective operating margin near point A, and with the same substrate voltage VBB1 near point A, point P in the operating area AA and F in the non-operating area NA. Take the points and let the values of the respective power supply voltages be VDDP and VDDF.
次いで高レベルの電源電圧値VDDP及び低レベ
ルの電源電圧値VDDFを用い、第2図に示すよう
にパルス幅tW、クロツク電圧CEの立上り時間t2
からの遅れ時間がtDのパルス電圧を形成する。 Next, using the high level power supply voltage value VDDP and the low level power supply voltage value VDDF, the pulse width t W and the rise time t 2 of the clock voltage CE are determined as shown in FIG.
The delay time from tD forms a pulse voltage.
このパルス幅tWのパルス電圧を、基板電圧を
VBB1に設定したメモリ回路の電源端子に印加す
る。これにより、メモリ回路の動作開始時間t2か
ら動作終了時間t3の間で、パルス幅tWのパルス
電圧が印加された時間だけ、メモリ回路は第1図
に示す動作マージン特性で非動作領域NAのF点
の電源電圧VDDFの電圧条件となり、他の時間で
は動作領域AAのP点の電源電圧VDDPの電圧条
件となる。 This pulse voltage with pulse width t W is applied to the substrate voltage.
Apply to the power supply pin of the memory circuit set to VBB1. As a result, between the operation start time t 2 and the operation end time t 3 of the memory circuit, the memory circuit is in the non-operation region with the operation margin characteristics shown in FIG. The voltage condition is the power supply voltage VDDF at point F in NA, and at other times, the voltage condition is the power supply voltage VDDP at point P in the operating area AA.
このようにして、パルス幅tWを所定値に設定
して、第2図に示すように形成したパルス電圧を
印加して、電源電圧の印加条件を与え、クロツク
電圧の立上り時間t2からの遅れ時間tDとアクセ
スタイムtAの特性を求めると第3図に示すよう
になる。図に示すように、遅れ時間tDとアクセ
スタイムの特性はここではta,tbで、動作マー
ジン特性測定時のアクセスタイムtACCを越える
ピーク値を有している。これにより、メモリ回路
の中で時間taからta+tw,及びtbからtb+
twの間に動作している回路部分が、第1図に示
す動作マージン特性のA点近傍で不良動作状態に
なることがわかる。時間taからta+tw、およ
びtbからtb+twの間に動作している回路部分
は、第1図の動作マージン特性のA点の電源電圧
および基板電圧の条件でメモリ回路のシミユレー
シヨンを行い、メモリ回路内の各回路部分につい
て、出力信号が変化する時刻、すなわち動作時刻
が時間taからta+tw、あるいはtbからtb+
twの間であるか否かを調べることにより容易に
検出できる。 In this way, by setting the pulse width t W to a predetermined value and applying the pulse voltage formed as shown in FIG. The characteristics of the delay time t D and the access time t A are shown in FIG. 3. As shown in the figure, the characteristics of the delay time t D and the access time are t a and t b here, and have peak values exceeding the access time t ACC when measuring the operating margin characteristics. As a result, in the memory circuit, from time t a to t a +t w and from t b to t b +
It can be seen that the circuit portion operating during the period tw enters into a malfunctioning state near point A of the operating margin characteristics shown in FIG. The circuit portion operating between time t a to t a +t w and from t b to t b + t w is the memory circuit under the conditions of the power supply voltage and substrate voltage at point A of the operating margin characteristics in Figure 1. A simulation is performed and the time at which the output signal changes for each circuit part in the memory circuit, that is, the operation time, changes from time t a to t a +t w or from t b to t b +
This can be easily detected by checking whether it is between t w or not.
以上の説明では、メモリ回路に電源電圧をパル
ス的に印加する例について述べたが、この他にク
ロツク電圧を低レベル又は高レベルの時間内にパ
ルス的に印加したり、或は各種の電源電圧とクロ
ツク電圧の複数個の組合せによる印加方法をとる
ことも可能である。 In the above explanation, an example has been described in which the power supply voltage is applied in pulses to the memory circuit, but in addition to this, it is also possible to apply the clock voltage in pulses at a low level or high level, or to apply various power supply voltages. It is also possible to apply an application method using a plurality of combinations of the clock voltage and the clock voltage.
以上詳細に説明したように、本発明に係る半導
体回路の試験方法では、半導体回路の動作領域及
び非動作領域の電源電圧もしくはクロツク電圧に
基ずいて試験パルスを形成する第1の手段、第1
の手段で得た試験パルスを半導体回路の電源端子
もしくはクロツク端子に印加し、その遅延時間或
はパルス幅を変化させる第2の手段、この結果に
より半導体回路の動作マージン特性のA点近傍で
不良動作状態になる回路部分を検出し診断する第
3の手段をとることにより、半導体回路の動作マ
ージン特性を支配する回路部分をその動作時間で
指摘することが可能である。従つて従来のように
シミユレーシヨンにより、半導体回路内の個々の
回路部分について、動作マージン境界近傍での電
源電圧もしくはクロツク電圧の値の変化に対する
動作速度の変化、及び動作マージンの変化を詳細
に調べ、支配要因を調査する必要はなく、シミユ
レーシヨンにより個々の回路部分の動作時間を求
めるだけで、極めて効率よく支配要因を指摘する
ことが出来る。さらに、支配要因が回路構成以外
の例えば製造プロセスによる場合も、それによつ
て動作特性を支配する回路部分の動作時間を指摘
して動作特性の解析を行なうことが可能である。 As explained in detail above, the semiconductor circuit testing method according to the present invention includes a first means for forming a test pulse based on the power supply voltage or clock voltage in the operating region and non-operating region of the semiconductor circuit;
The second method is to apply the test pulse obtained by the above method to the power supply terminal or clock terminal of the semiconductor circuit and change the delay time or pulse width. By employing the third means of detecting and diagnosing a circuit portion that is in an operating state, it is possible to identify a circuit portion that governs the operating margin characteristics of a semiconductor circuit based on its operating time. Therefore, as in the past, by simulation, we examine in detail the changes in operating speed and changes in operating margin in response to changes in the power supply voltage or clock voltage near the operating margin boundary for individual circuit parts in a semiconductor circuit. There is no need to investigate the controlling factors, and it is possible to point out the controlling factors extremely efficiently by simply determining the operating time of each circuit part through simulation. Furthermore, even when the controlling factor is due to something other than the circuit configuration, for example, the manufacturing process, it is possible to analyze the operating characteristics by pointing out the operating time of the circuit portion that controls the operating characteristics.
第1図はMOSメモリの動作マージン特性を示
す図、第2図は本発明に係る方法に基ずく電源電
圧もしくはクロツク電圧印加の実施例を示す図、
第3図は本発明に係る方法に基ずく遅れ時間とア
クセスタイムの特性を示す図である。
符号の説明
VDD……電源電圧、VBB……基板電圧、CE…
…クロツク電圧、tD……遅れ時間、tA……アク
セスタイム。
FIG. 1 is a diagram showing the operating margin characteristics of a MOS memory, and FIG. 2 is a diagram showing an example of applying a power supply voltage or clock voltage based on the method according to the present invention.
FIG. 3 is a diagram showing the characteristics of delay time and access time based on the method according to the present invention. Explanation of symbols VDD...Power supply voltage, VBB...Board voltage, CE...
...clock voltage, tD ...delay time, tA ...access time.
Claims (1)
源電圧もしくはクロツク電圧が印加されている期
間内に、前記電源電圧もしくはクロツク電圧をパ
ルス状に所定の期間だけ非動作領域の値とする試
験パルスを形成する第1の手段と、前記試験パル
スを前記半導体回路の電源端子もしくはクロツク
端子に印加するとともに、前記半導体回路を所定
の試験パタンで駆動し、前記試験パルス遅延時間
もしくはパルス幅を変化させる第2の手段と、前
記第2の手段により得られる前記半動体回路の出
力信号に基づいて前記動作領域及び非動作領域の
境界で前記半導体回路の動作特性を支配する回路
部分を検出診断する第3の手段とを有することを
特徴とする半導体回路の試験方法。1. During a period in which a power supply voltage or clock voltage in an operating region is applied to a semiconductor circuit that performs periodic operation, a test pulse is applied to the power supply voltage or clock voltage to bring it to a value in a non-operating region for a predetermined period. and a first means for applying the test pulse to a power supply terminal or a clock terminal of the semiconductor circuit, driving the semiconductor circuit in a predetermined test pattern, and changing the test pulse delay time or pulse width. and a third means for detecting and diagnosing a circuit portion that governs the operating characteristics of the semiconductor circuit at the boundary between the operating region and the non-operating region based on the output signal of the semi-dynamic body circuit obtained by the second means. A method for testing a semiconductor circuit, comprising the steps of:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2387777A JPS53109481A (en) | 1977-03-07 | 1977-03-07 | Test method for semiconductor circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2387777A JPS53109481A (en) | 1977-03-07 | 1977-03-07 | Test method for semiconductor circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53109481A JPS53109481A (en) | 1978-09-25 |
| JPS6124654B2 true JPS6124654B2 (en) | 1986-06-12 |
Family
ID=12122671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2387777A Granted JPS53109481A (en) | 1977-03-07 | 1977-03-07 | Test method for semiconductor circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53109481A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5651679A (en) * | 1979-10-03 | 1981-05-09 | Hitachi Ltd | Measuring circuit for minimum operation pulse |
| KR101013442B1 (en) | 2007-04-13 | 2011-02-14 | 주식회사 하이닉스반도체 | Voltage measuring device of semiconductor integrated circuit and voltage measuring system comprising same |
-
1977
- 1977-03-07 JP JP2387777A patent/JPS53109481A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53109481A (en) | 1978-09-25 |
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