JPS6127880B2 - - Google Patents
Info
- Publication number
- JPS6127880B2 JPS6127880B2 JP56019193A JP1919381A JPS6127880B2 JP S6127880 B2 JPS6127880 B2 JP S6127880B2 JP 56019193 A JP56019193 A JP 56019193A JP 1919381 A JP1919381 A JP 1919381A JP S6127880 B2 JPS6127880 B2 JP S6127880B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic pole
- cyclotron
- ultra
- cooling plate
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
Landscapes
- Particle Accelerators (AREA)
Description
【発明の詳細な説明】
本発明は、負水素イオンを加速するサイクロト
ロンに係るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cyclotron that accelerates negative hydrogen ions.
サイクロトロンの中心部に設置されたイオン源
で、負水素イオンを多量に生成するには比較的高
い圧力(H+イオンの場合の十倍乃至数十倍)の
下で、プラズマ放電を行う必要がある。このため
多量の水素ガスを必要とし、この水素ガスは排気
箱(加速箱とも云う)にとりつけられた大きい排
気速度を持つ真空ポンプ(普通は油拡散ポンプ)
によつて排気される。 The ion source is installed in the center of the cyclotron, and in order to generate a large amount of negative hydrogen ions, it is necessary to perform plasma discharge under relatively high pressure (10 to several tens of times higher than that for H + ions). be. For this reason, a large amount of hydrogen gas is required, and this hydrogen gas is transported by a vacuum pump (usually an oil diffusion pump) with a high pumping speed attached to an exhaust box (also called an acceleration box).
Exhausted by.
小形サイクロトロンの場合でも、H-用イオン
源のガス流量は大形サイクロトロンと同量である
から、大きな真空ポンプを必要とする。しかし小
形サイクロトロンに大きな真空ポンプを取につけ
ることは、サイクロトロン全体を大形にしてしま
う。たとえば必要とされる油拡散ポンプの直径は
磁極直径と同程度となる。又、小形であるため、
排気箱に大形真空ポンプを取りつけると、イオン
源およびH-イオンの加速空間(真空箱の中央
部)に対する真空コンダクタンスを大きくするこ
とができず、有効な排気速度は得がたいという不
都合がある。 Even in the case of a small cyclotron, the gas flow rate of the H - ion source is the same as that of a large cyclotron, so a large vacuum pump is required. However, attaching a large vacuum pump to a small cyclotron increases the size of the entire cyclotron. For example, the diameter of the required oil diffusion pump will be comparable to the diameter of the magnetic pole. Also, because it is small,
If a large vacuum pump is attached to the evacuation box, the vacuum conductance to the ion source and H - ion acceleration space (the center of the vacuum box) cannot be increased, making it difficult to obtain an effective evacuation speed.
本発明の目的は、小形サイクロトロンでイオン
源からのH2ガスに対して大きな排気速度を持た
せてH-イオン加速を実現させることである。こ
の目的は、液体窒素温度で冷却される保冷板とこ
の保冷板から離して配置され液体ヘリウムで冷却
される冷却板とを備える超低温パネルを磁極構造
体のデイーの置いてない各磁極の谷の表面近くに
設置することにより達成される。 An object of the present invention is to provide a small cyclotron with a large pumping speed for H 2 gas from an ion source to realize H - ion acceleration. The purpose is to install an ultra-low-temperature panel with a cold plate cooled at liquid nitrogen temperature and a cold plate placed apart from the cold plate and cooled with liquid helium in the valley of each magnetic pole that is not placed on the day of the magnetic pole structure. This is achieved by placing it close to the surface.
第1図は本発明による負水素イオンを加速する
小形サイクロトロンを平面図で示し、第2図は第
1図の―線に沿う断面を示す。 FIG. 1 shows a plan view of a small cyclotron for accelerating negative hydrogen ions according to the present invention, and FIG. 2 shows a cross section taken along the line -- in FIG.
第1,2図に示すように、ゲツターポンプとし
て作用する冷却板1と保冷板3とから成る超低温
パネルを小形サイクロトロンの磁極構造体2のデ
イー6を配置していない谷2′に配合する。磁極
構造体2の山を2″で示す。第2図に示すように
H-イオンビームが通過する側に冷却板1を配置
し、その背後に保冷板3を配置する。冷却板1は
電離していない水素ガスを吸着して真空箱の雰囲
気の真空度を高める。保冷板3は磁極構造体2か
ら冷却板1への輻射熱を遮断して冷却板1の温度
上昇を防止して排気能率を高く維持している。7
はイオン源、8はヘリウム冷却機をそれぞれ示し
ている。 As shown in FIGS. 1 and 2, a cryogenic panel consisting of a cooling plate 1 and a cold insulating plate 3, which act as a getter pump, is placed in the valley 2' of the magnetic pole structure 2 of a small cyclotron, where the day 6 is not located. The peak of the magnetic pole structure 2 is indicated by 2''.As shown in Fig. 2.
A cooling plate 1 is placed on the side through which the H - ion beam passes, and a cold insulating plate 3 is placed behind it. The cooling plate 1 adsorbs non-ionized hydrogen gas to increase the degree of vacuum in the atmosphere of the vacuum box. The cold plate 3 blocks radiant heat from the magnetic pole structure 2 to the cooling plate 1, prevents the temperature of the cooling plate 1 from rising, and maintains high exhaust efficiency. 7
8 indicates an ion source, and 8 indicates a helium cooler.
第3,4図を参照する。第3図は真空箱4に取
付けた超低温パネルを示すため真空箱の一部を破
断してその内部を示す斜視図であり、第4図は冷
却板1と保冷板3とを示す斜視図である。冷却板
1を保冷板3に嵌入して、真空箱4の側壁に取付
ける。冷却板1には液体ヘリウム(約絶対温度
零)を供給し、保冷板3には液体窒素(約絶対温
度70)を供給する。 See Figures 3 and 4. FIG. 3 is a perspective view showing the inside of the vacuum box with a part cut away to show the ultra-low temperature panel attached to the vacuum box 4, and FIG. 4 is a perspective view showing the cooling plate 1 and the cold insulating plate 3. be. The cooling plate 1 is fitted into the cold insulating plate 3 and attached to the side wall of the vacuum box 4. Liquid helium (approximately absolute temperature 0) is supplied to the cooling plate 1, and liquid nitrogen (approximately absolute temperature 70°C) is supplied to the cold plate 3.
本願発明では上に述べたように、従来は油拡散
ポンプの補助的手段としてしか使用されなかつた
超低温パネル(IEEE Transaction on
Nuc1earScience,Voi.NS―26,No.2,Apri1
1979,p.2179)を積極的効果的に使用して小形サ
イクロトロンでH-イオンを加速するを可能とし
たのである。 As mentioned above, the present invention utilizes ultra-low temperature panels (IEEE Transaction on
Nuc1earScience, Voi.NS―26, No.2, Apri1
1979, p. 2179), it became possible to accelerate H - ions with a small cyclotron.
第1図は本発明による負水素イオンを加速する
小形サイクロトロンの平面図である。第2図は第
1図の―線の断面展開図である。第3図は超
低温パネルの取付部を示す部分破断斜視図であ
る。第4図は超低温パネルの展開斜視図である。
1……冷却板、2……磁極構造体、2′……磁
極構造体の谷、2″……磁極構造体の山、3……
保冷板、6……デイー。
FIG. 1 is a plan view of a small cyclotron for accelerating negative hydrogen ions according to the present invention. FIG. 2 is a cross-sectional developed view taken along the line - in FIG. 1. FIG. 3 is a partially cutaway perspective view showing the attachment portion of the ultra-low temperature panel. FIG. 4 is an exploded perspective view of the ultra-low temperature panel. DESCRIPTION OF SYMBOLS 1... Cooling plate, 2... Magnetic pole structure, 2'... Valley of magnetic pole structure, 2''... Mountain of magnetic pole structure, 3...
Cold plate, 6...day.
Claims (1)
極構造体のデイーの置いてない磁極の谷に設置
し、前記の超低温パネルは磁極の谷の表面近くに
配置される保冷板とこの保冷板から離して配置さ
れる冷却板とを備えていることを特徴とする負水
素イオンを加速するサイクロトロン。1. An ultra-low temperature panel for adsorbing hydrogen gas is installed in the valley of the magnetic pole where the day of the magnetic pole structure is not placed, and the ultra-low temperature panel is placed between a cold plate placed near the surface of the valley of the magnetic pole and a distance from this cold plate. A cyclotron for accelerating negative hydrogen ions, characterized in that it is equipped with a cooling plate arranged at
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56019193A JPS57133388A (en) | 1981-02-12 | 1981-02-12 | Cyclotron for accelerating negative hydrogen ion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56019193A JPS57133388A (en) | 1981-02-12 | 1981-02-12 | Cyclotron for accelerating negative hydrogen ion |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57133388A JPS57133388A (en) | 1982-08-18 |
| JPS6127880B2 true JPS6127880B2 (en) | 1986-06-27 |
Family
ID=11992500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56019193A Granted JPS57133388A (en) | 1981-02-12 | 1981-02-12 | Cyclotron for accelerating negative hydrogen ion |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57133388A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02267898A (en) * | 1989-04-06 | 1990-11-01 | Res Dev Corp Of Japan | Absorber for synchrotron discharger |
| JP6038682B2 (en) * | 2013-02-20 | 2016-12-07 | 住友重機械工業株式会社 | cyclotron |
| JP6042247B2 (en) * | 2013-03-22 | 2016-12-14 | 住友重機械工業株式会社 | cyclotron |
-
1981
- 1981-02-12 JP JP56019193A patent/JPS57133388A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57133388A (en) | 1982-08-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3144200A (en) | Process and device for cryogenic adsorption pumping | |
| US3485054A (en) | Rapid pump-down vacuum chambers incorporating cryopumps | |
| US4212170A (en) | Cryopump | |
| JPS6127880B2 (en) | ||
| US3177672A (en) | Space simulating apparatus and method | |
| EP0144575A2 (en) | Cryosorption pump | |
| JPS6157473B2 (en) | ||
| JP2006009139A (en) | Sputtering cathode for coating process | |
| US3130562A (en) | Cryogenic pumping apparatus | |
| US20070286738A1 (en) | Vacuum ion-getter pump with cryogenically cooled cathode | |
| JPH0544642A (en) | Cryopump equipped with low temperature trap | |
| JPH11166477A (en) | Cryopump | |
| JP2002070738A (en) | Cryotrap | |
| JP4008080B2 (en) | Differential exhaust type cryopump | |
| Benvenuti | Vacuum system for Proton Storage Rings equipped with superconducting magnets | |
| US3569706A (en) | Method and apparatus for generating a continuous beam of neutral atoms | |
| JP2587522B2 (en) | Generation method of extremely high vacuum environment | |
| Lilje | Vacuum Systems for Synchrotron Light Sources and FELs | |
| Park et al. | Vacuum system design for the PLS storage ring | |
| US3383032A (en) | Vacuum pumping method and apparatus | |
| JPS60113892A (en) | Vacuum evacuating method of refrigerant transport pipe | |
| JPS58117371A (en) | Superhigh vacuum pump using bulk getter pump and sputtered ion pump in combination | |
| JPH06346847A (en) | Hydrogen exhausting cryopump having small-sized helium refrigerator | |
| JP4854614B2 (en) | Ion implantation method | |
| JPS63183280A (en) | Cryopump |