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JPS6128985B2 - - Google Patents
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JPS6128985B2 - - Google Patents

Info

Publication number
JPS6128985B2
JPS6128985B2 JP4313781A JP4313781A JPS6128985B2 JP S6128985 B2 JPS6128985 B2 JP S6128985B2 JP 4313781 A JP4313781 A JP 4313781A JP 4313781 A JP4313781 A JP 4313781A JP S6128985 B2 JPS6128985 B2 JP S6128985B2
Authority
JP
Japan
Prior art keywords
temperature
thermostat
developer
heater
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4313781A
Other languages
Japanese (ja)
Other versions
JPS57158641A (en
Inventor
Hiroshi Taniguchi
Norimasa Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP4313781A priority Critical patent/JPS57158641A/en
Publication of JPS57158641A publication Critical patent/JPS57158641A/en
Publication of JPS6128985B2 publication Critical patent/JPS6128985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03DAPPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)

Description

【発明の詳細な説明】 写真フイルム、印画紙、印刷版等の現像処理に
おいては、処理液の温度が現像仕上り結果に大き
く影響するので、自動現像機においては、通常恒
温装置を使用して、処理液温を所定温度に保つよ
うにしている。
DETAILED DESCRIPTION OF THE INVENTION In developing photographic film, photographic paper, printing plates, etc., the temperature of the processing solution greatly affects the development results, so automatic processors usually use a constant temperature device. The temperature of the processing liquid is maintained at a predetermined temperature.

第1図は、自動現像機において一般に行われて
いる現像液と定着液の液温の恒温方法を略示する
もので、1は給電線、2は、現像タンクの適所に
設置した現像液加熱ヒータ又は冷却器等の温調器
(以下ヒータと総称する)、3は、ヒータ2への給
電を制御する常用のマグネツトスイツチ、4は、
現像タンクの適所に設置され、現像液温により作
動してマグネツトスイツチ3を開閉させるサーモ
スタツトである。
Figure 1 schematically shows the method of keeping the temperature of the developer and fixer that is generally carried out in automatic processors. 1 is the power supply line, 2 is the developer heated at the appropriate location in the developer tank. A temperature controller such as a heater or a cooler (hereinafter collectively referred to as a heater); 3 is a commonly used magnetic switch that controls power supply to the heater 2; 4 is a
This thermostat is installed at a suitable location in the developing tank and is activated by the temperature of the developing solution to open and close the magnetic switch 3.

この恒温装置は、現像液温が所定温度より下る
と、サーモスタツト4が閉じて、マグネツトスイ
ツチ3の励磁コイル3aに通電して、マグネツト
スイツチ3を閉じ、ヒータ2に給電して現像液を
加熱し、現像液温が所定温度に達すると、サーモ
スタツト4が開いて、マグネツトスイツチ3を開
き、ヒータ2の給電を停止する公知のものであ
る。
In this constant temperature device, when the developer temperature falls below a predetermined temperature, the thermostat 4 closes, the excitation coil 3a of the magnet switch 3 is energized, the magnet switch 3 is closed, the heater 2 is supplied with power, and the developer is discharged. When the developing solution temperature reaches a predetermined temperature, the thermostat 4 is opened, the magnetic switch 3 is opened, and the power supply to the heater 2 is stopped.

定着タンクにも、上述と同様のヒータ5とマグ
ネツトスイツチ6とサーモスタツト7よりなる恒
温装置が設けてあり、両恒温装置は、給電線1,
1に並列に接続されている。
The fixing tank is also provided with a constant temperature device consisting of a heater 5, a magnetic switch 6, and a thermostat 7 similar to those described above.
1 in parallel.

従つて、上述の恒温方法は、しばしば両ヒータ
2,5に同時に給電することがあるので、給電線
1,1は、両ヒータ2,5の定格電流の和に十分
耐えうる容量のものが必要である。
Therefore, in the constant temperature method described above, power is often supplied to both heaters 2 and 5 at the same time, so the power supply lines 1 and 1 must have a capacity that can withstand the sum of the rated currents of both heaters 2 and 5. It is.

一般に、フイルム現像処理においては、現像液
温の所定温度に対する許容範囲は狭く、精度よく
所定温度近くに保つ必要があるが、定着液温は許
容範囲が広く、所定温度に対し若干の高低があつ
ても実用上差支えない。
Generally, in film development processing, the tolerance range for the developer temperature is narrow and must be kept close to the prescribed temperature with high precision, but the fixer temperature has a wide tolerance range and may vary slightly above or below the prescribed temperature. However, there is no practical problem.

本発明は、この事実を利用して、現像仕上り結
果を損うことのないように、両処理液温を許容範
囲内に保ちつつ、両恒温装置への給電線を、両恒
温装置のいずれか大きい方の電流容量、すなわ
ち、従来の方法の約半分の容量となしうるように
した恒温方法に関するもので、以下第2図に基い
て具体的に説明する。
The present invention takes advantage of this fact and connects the power supply line to either of the two constant temperature devices while keeping the temperature of both processing solutions within the allowable range so as not to impair the finished development result. This method relates to a constant temperature method that allows a larger current capacity, that is, about half the capacity of the conventional method, and will be explained in detail below with reference to FIG.

第2図は、本発明方法を適用した、現像液と定
着液の恒温装置を示すもので、11,12,13
は、それぞれ上記1,2,3と同様の給電線、第
1ヒータ、及び第1マグネツトスイツチ、14
は、上記4に相当する次記するような第1サーモ
スタツト、15,16,17は、それぞれ上記
5,6,7と同様の第2ヒータ、第2マグネツト
スイツチ、及び第2サーモスタツトである。
Figure 2 shows a constant temperature device for developing solution and fixing solution to which the method of the present invention is applied.
14 are the same power supply lines, first heater, and first magnetic switch as in 1, 2, and 3 above, respectively.
is a first thermostat as described below corresponding to 4 above, and 15, 16, and 17 are a second heater, a second magnet switch, and a second thermostat similar to 5, 6, and 7 above, respectively. be.

第1サーモスタツト14は、2個の接点14
b,14bを有する。切替スイツチ構造となつて
おり、その接片14aは、現像液温が所定温度よ
り低い時には、第2図左方の第1接点14bに圧
接し、現像液温が所定温度より高い時には、第2
図右方の第2接点14cに圧接し、接点14b,
14cは、それぞれ、第1マグネツトスイツチ1
3の励磁コイル13aと、第2サーモスタツト1
7に接続されている。
The first thermostat 14 has two contacts 14
b, 14b. It has a changeover switch structure, and when the developer temperature is lower than a predetermined temperature, the contact piece 14a is in pressure contact with the first contact point 14b on the left side in FIG.
Pressed into contact with the second contact 14c on the right side of the figure, contact 14b,
14c are the first magnetic switches 1 and 14c, respectively.
3 excitation coil 13a and the second thermostat 1
7 is connected.

すなわち、第1サーモスタツト14の第1接点
14bと、第1マグネツトスイツチ13の励磁コ
イル13aとは直列に接続され、第1サーモスタ
ツト14の第2接点14cと、第2サーモスタツ
ト17と、第2マグネツトスイツチ16の励磁コ
イル16aとは直列に接続されている。
That is, the first contact 14b of the first thermostat 14 and the excitation coil 13a of the first magnet switch 13 are connected in series, and the second contact 14c of the first thermostat 14 and the second thermostat 17 are connected in series. The excitation coil 16a of the second magnet switch 16 is connected in series.

第2図は、現像液と定着液が共に所定温度に達
して、両ヒータ12,15の給電が絶たれている
状況を示すもので、第1サーモスタツト14の接
片14aは、第2接点14cに圧接している。
FIG. 2 shows a situation where both the developer and the fixer have reached a predetermined temperature and the power supply to both heaters 12 and 15 is cut off, and the contact piece 14a of the first thermostat 14 is connected to the second contact. It is in pressure contact with 14c.

この状態において、現像液温が所定温度以下に
下ると、サーモスタツト14が作動して、その接
片14aが第1接点14bに圧接するので、第1
マグネツトスイツチ13は閉じて、第1ヒータ1
2のみに給電し、現像液を所定温度まで加熱す
る。
In this state, when the developer temperature falls below a predetermined temperature, the thermostat 14 is activated and its contact piece 14a comes into pressure contact with the first contact point 14b.
The magnetic switch 13 is closed and the first heater 1
2 and heats the developer to a predetermined temperature.

また、定着液が所定温度以下に下ると、第2サ
ーモスタツト17が閉じるので、第2マグネツト
スイツチ16が閉じて、第2ヒータ15のみに給
電し、定着液を所定温度まで加熱する。
Furthermore, when the temperature of the fixing liquid drops below a predetermined temperature, the second thermostat 17 closes, so the second magnet switch 16 closes, supplying power only to the second heater 15, and heating the fixing liquid to a predetermined temperature.

しかし、現像液温が低下し、第1ヒータ12に
給電中に、定着液温も低下して、第2サーモスタ
ツト17が閉じても、第1サーモスタツト14の
接片14aと第2接点14cとは離れているの
で、第2マグネツトスイツチ16は閉じず、第2
ヒータ15には給電されない。
However, even if the developing solution temperature drops and the fixing solution temperature also drops while power is being supplied to the first heater 12 and the second thermostat 17 closes, the contact piece 14a of the first thermostat 14 and the second contact 14c Since the second magnetic switch 16 is located far away from the
No power is supplied to the heater 15.

また、第2ヒータ15に給電中に、現像液温が
低下すると、第1サーモスタツト14の接片14
aが、第1接点14bの方に揺動して、第2接点
14cより離れるので、第2ヒータ15への給電
が絶たれ、その間、定着液温はさらに低下する。
Additionally, if the developer temperature drops while power is being supplied to the second heater 15, the contact piece 14 of the first thermostat 14
Since the contact point a swings toward the first contact point 14b and moves away from the second contact point 14c, the power supply to the second heater 15 is cut off, and during that time, the temperature of the fixing fluid further decreases.

そして、現像液温が所定温度に達すると、第1
サーモスタツト14の接片14aは第2接点14
cに圧接して、第2ヒータ15に給電が開始さ
れ、定着液は加熱される。
When the developer temperature reaches a predetermined temperature, the first
The contact piece 14a of the thermostat 14 is the second contact 14
c, power supply to the second heater 15 is started, and the fixing liquid is heated.

以上においては、13,16はマグネツトスイ
ツチとして説明したが、サイリスタを使用しても
よいし、14のサーモスタツトに、フリツプフロ
ツプ回路を用いて、IC化も可能なことはいうま
でもない。
In the above description, 13 and 16 are described as magnetic switches, but it goes without saying that thyristors may be used, and the thermostat 14 can also be integrated into an IC by using a flip-flop circuit.

このように、本発明方法によれば、両ヒータ1
2,15に同時に給電することはなく、恒温装置
は、ヒータ12または15において大部分の電力
を消費するので、給電線11,11は、両恒温装
置のいずれか容量の大きい方の通過電流に耐えう
るものであればよく、従来の方法の約半分の容量
のものでよい。
In this way, according to the method of the present invention, both heaters 1
2 and 15 at the same time, and the constant temperature device consumes most of the power in the heater 12 or 15. Therefore, the power supply lines 11, 11 are connected to the passing current of whichever of the two constant temperature devices has a larger capacity. It only needs to be durable, and it can be about half the capacity of the conventional method.

また、本発明方法においては、現像液と定着液
を同時に加熱することはできず、現像液を優先し
て、個別に加熱するので、定着液温の蛇行は、従
来の方法より大きくなるが、上述のように、定着
液温の許容範囲は大きいので、フイルムの現像仕
上り結果に悪影響を及ぼすことはなく、実用上な
んら差支えない。
Furthermore, in the method of the present invention, it is not possible to heat the developer and fixer at the same time, and the developer is prioritized and heated individually, so the meandering of the fixer's temperature is greater than in the conventional method. As mentioned above, since the fixer temperature has a wide allowable range, it does not adversely affect the finished film development result, and there is no problem in practical use.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の恒温方法を説明するための結
線図、第2図は、本発明の恒温方法の一例を説明
するための結線図である。 1……給電線、2……ヒータ、3……マグネツ
トスイツチ、3a……励磁コイル、4……サーモ
スタツト、5……ヒータ、6……マグネツトスイ
ツチ、7……サーモスタツト、11……給電線、
12……第1ヒータ、13……第1マグネツトス
イツチ、13a……励磁コイル、14……第1サ
ーモスタツト、14a……接片、14b……第1
接点、14c……第2接点、15……第2ヒー
タ、16……第2マグネツトスイツチ、16a…
…励磁コイル、17……第2サーモスタツト。
FIG. 1 is a wiring diagram for explaining a conventional constant temperature method, and FIG. 2 is a wiring diagram for explaining an example of the constant temperature method of the present invention. DESCRIPTION OF SYMBOLS 1... Power supply line, 2... Heater, 3... Magnetic switch, 3a... Excitation coil, 4... Thermostat, 5... Heater, 6... Magnetic switch, 7... Thermostat, 11... ...power line,
12...First heater, 13...First magnet switch, 13a...Excitation coil, 14...First thermostat, 14a...Touch piece, 14b...First
Contact, 14c...Second contact, 15...Second heater, 16...Second magnetic switch, 16a...
...excitation coil, 17...second thermostat.

Claims (1)

【特許請求の範囲】 1 自動現像機の現像液と定着液を、サーモスタ
ツトにより、温調機と直列に接触したスイツチを
開閉する装置をもつて、それぞれ温調するように
した恒温方法において、 現像液用サーモスタツトを、所定温度を境界と
して切替わる2個の接点を有する切替スイツチ構
造とし、該2個の接点の中、現像液温度が前記所
定温度より低い場合に接続される側の接点と現像
液用温調用スイツチとを直列に接続するととも
に、他方の接点と定着液用サーモスタツトおよび
温調用スイツチとを直列に接続することにより、
現像液用温調用スイツチを優先して、両温調器に
個別に、かつ、時期を異ならせて、給電するよう
にしたことを特徴とする自動現像機における現像
液と定着液の恒温方法。
[Scope of Claims] 1. A constant temperature method in which the temperature of the developing solution and fixing solution of an automatic developing machine is controlled by a thermostat with a device that opens and closes a switch connected in series with the temperature regulator, The developer thermostat has a changeover switch structure having two contacts that switch at a predetermined temperature, and one of the two contacts is the one that is connected when the developer temperature is lower than the predetermined temperature. By connecting in series the and the developer temperature control switch, and by connecting the other contact in series with the fixer thermostat and the temperature control switch,
A method for constant temperature of a developer and a fixer in an automatic processor, characterized in that power is supplied to both temperature regulators individually and at different times, giving priority to a temperature control switch for the developer.
JP4313781A 1981-03-26 1981-03-26 Thermostatic method for developer and fixer of automatic developing device Granted JPS57158641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4313781A JPS57158641A (en) 1981-03-26 1981-03-26 Thermostatic method for developer and fixer of automatic developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4313781A JPS57158641A (en) 1981-03-26 1981-03-26 Thermostatic method for developer and fixer of automatic developing device

Publications (2)

Publication Number Publication Date
JPS57158641A JPS57158641A (en) 1982-09-30
JPS6128985B2 true JPS6128985B2 (en) 1986-07-03

Family

ID=12655445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4313781A Granted JPS57158641A (en) 1981-03-26 1981-03-26 Thermostatic method for developer and fixer of automatic developing device

Country Status (1)

Country Link
JP (1) JPS57158641A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6170557A (en) * 1984-09-14 1986-04-11 Copal Co Ltd Automatic developing machine

Also Published As

Publication number Publication date
JPS57158641A (en) 1982-09-30

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