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JPS6130366B2 - - Google Patents
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JPS6130366B2 - - Google Patents

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Publication number
JPS6130366B2
JPS6130366B2 JP6456580A JP6456580A JPS6130366B2 JP S6130366 B2 JPS6130366 B2 JP S6130366B2 JP 6456580 A JP6456580 A JP 6456580A JP 6456580 A JP6456580 A JP 6456580A JP S6130366 B2 JPS6130366 B2 JP S6130366B2
Authority
JP
Japan
Prior art keywords
weight
powder
glass frit
alumina ceramic
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6456580A
Other languages
Japanese (ja)
Other versions
JPS56160705A (en
Inventor
Takehiko Yoneda
Hiromitsu Tagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6456580A priority Critical patent/JPS56160705A/en
Publication of JPS56160705A publication Critical patent/JPS56160705A/en
Publication of JPS6130366B2 publication Critical patent/JPS6130366B2/ja
Granted legal-status Critical Current

Links

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  • Glass Compositions (AREA)
  • Paints Or Removers (AREA)
  • Conductive Materials (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明はアルミナセラミツク基板に導電金属層
を形成するためのメタライズ用組成物に関するも
のである。 従来のメタライズ用組成物は、金属粉末とガラ
スフリツトを含んで構成されている。金属粉末と
してはW金属粉末単独,Mo金属粉末単独,W金
属粉末とMn金属粉末との混合物,Mo金属粉末と
Mn金属粉末との混合物が最も一般的に使用され
ている。 近年、配線基板の製造において、セラミツクの
焼結と導電金属層の形成を加湿還元雰囲気下で同
時焼成により行なう技術が発達してきた。しか
し、加湿は有機バインダーの分解及び金属層とセ
ラミツク層の結合を促進させる効果を有する反
面、加湿条件によつては金属が過度に酸化され、
導電金属層の電気抵抗の増加及び導電金属層の焼
結性の低下を招く欠点を有している。 従つて、本発明は係る欠点をなくすためになさ
れたものであり、加湿条件の変動による金属粉末
の酸化を防止することのできるメタライズ用組成
物を提供し、以つて金属粒子間の焼結現象を促進
させるとともに、導電金属層の電気抵抗の減少を
図るものである。 係る目的に従つて本発明に係るメタライズ用組
成物は、アルミナセラミツク基板に導電金属層を
形成するため、W,Mo,Mn金属粉末の1種また
は2種以上が合計80〜99重量%、炭素粉末が0.01
〜1重量%、上記アルミナセラミツク基板と同一
組成物仮焼粉末またはガラスフリツトの1種また
は両者が合計0.99〜19重量%より成ることを特徴
とし、また金属粉末、炭素粉末、アルミナセラミ
ツク基板と同一組成物仮焼粉末または/及びガラ
スフリツトの平均粒径をおのおの0.1〜5μとす
ることを特徴とする。 炭素粉末は強力な還元剤として作用し、加湿非
酸化雰囲気下で焼成の際過度の加湿による金属粉
末の酸化を制御する。また、下地アルミナセラミ
ツク基板原料仮焼粉末は導電金属層と基板間の接
着に寄与する目的で添加される。そして、仮焼の
意義はメタライズ用ペースト中における小密度酸
化物原料の相分離防止のためである。さらに、ガ
ラスフリツトは導電金属層と基板間の接着に寄与
する目的で添加されるものであるから、使用する
ガラスフリツトは係る目的に適合し、かつ軟化温
度が600℃以上であれば特にその種類は限定され
ない。 上記組成物中の炭素粉末、仮焼粉末、ガラスフ
リツトの含有量及び平均粒径は、該組成物に含ま
れる金属粉末の種類、粒径、量及び焼成温度によ
つて上記範囲内で種々の値を採ることができる。 尚、W,Mo,Mn金属粉末の1種または2種以
上の合計が80重量%未満の場合面抵抗値が増加す
る。一方、99重量%より多い場合電極の面接着強
度の低下を招く。また、炭素粉末が0.01重量%未
満の場合は加湿条件により電極の面抵抗値が大き
くなり、面接着強度も低下する。一方、1重量%
より多い場合電極皮膜強度が低下する。さらに、
下地アルミナセラミツク基板原料仮焼粉末、ガラ
スフリツトの1種または両者の合計が0.99重量%
未満の場合は電極の面接着強度が低下し、19重量
%より多い場合には面抵抗値が増大する。さらに
は金属粉末、炭素粉末、仮焼粉末、ガラスフリツ
トの平均粒径が0.1μ未満の場合は粉末純度の低
下及びコスト高となる。一方、5μより大きくな
ると金属粉末の場合は電極の焼結性が低下し、炭
素粉末の場合は炭素粒子の偏析により面抵抗値が
増大する。そして、仮焼粉末、ガラスフリツトの
場合は電極の焼結性低下及び偏析による面抵抗値
の増加、面接着強度の低下を招く。 上記の如く炭素粉末を用いることにより、本発
明は新規な優れたメタライズ用組成物を完成し
た。 以下、本発明を実施例を挙げ具体的に説明す
る。 まず、W,Mo,Mn粉末は市販の平均粒径
0.1,1,5,10μの試薬を用い、ガラスフリツ
ト粉末は軟化点1100℃の市販のAl2O3―SiO2
MgO―MnO2系ガラスフリツトをボールミルにて
平均粒径0.1,1,5,10μとしたものを用い
る。また、印刷用未焼結生アルミナセラミツクシ
ートは、原料として工業用原料(純度98%以上)
を用い、Al3O396重量%、SiO23重量%、MgO0.5
重量%、CaO0.5重量%の組成比になるよう調合
し、公知の技術を用いて生アルミナセラミツクシ
ートとする。そして、下地アルミナセラミツク基
板原料仮焼物は、上記の組成比の原料粉末を1300
℃で仮焼し、ボールミルを用い平均粒径0.1,
1,5,10μとした粉体である。このようなメタ
ライズ用組成物の組成比及び平均粒径を下記の第
1表に示す。該組成物を用いメタライズ用ペース
トを得る。 上記未焼結アルミナセラミツクシート上に該メ
タライズ用ペーストを印刷し、大気中にて脱バイ
ンダー後、次いで露点(d.p)0℃〜40℃間の湿
つたグリーンガス中で1500℃〜1600℃にて行な
う。こうして得られたメタライズ基板を用い、下
記の第2表のような各諸特性を調べた。
The present invention relates to a metallizing composition for forming a conductive metal layer on an alumina ceramic substrate. Conventional metallizing compositions include metal powder and glass frit. The metal powder includes W metal powder alone, Mo metal powder alone, a mixture of W metal powder and Mn metal powder, and Mo metal powder and
Mixtures with Mn metal powder are most commonly used. In recent years, in the manufacture of wiring boards, a technology has been developed in which sintering of ceramic and formation of a conductive metal layer are performed by simultaneous firing in a humidified reducing atmosphere. However, while humidification has the effect of promoting the decomposition of the organic binder and the bonding between the metal layer and the ceramic layer, depending on the humidification conditions, the metal may be excessively oxidized.
This has the disadvantage of increasing the electrical resistance of the conductive metal layer and decreasing the sinterability of the conductive metal layer. Therefore, the present invention has been made to eliminate such drawbacks, and provides a metallizing composition that can prevent oxidation of metal powder due to changes in humidification conditions, and thereby prevents the sintering phenomenon between metal particles. The purpose is to promote the electrical resistance of the conductive metal layer and to reduce the electrical resistance of the conductive metal layer. In order to form a conductive metal layer on an alumina ceramic substrate, the metallizing composition according to the present invention contains one or more of W, Mo, and Mn metal powders in a total amount of 80 to 99% by weight, carbon powder is 0.01
~1% by weight, the same composition as the alumina ceramic substrate, characterized by a total of 0.99~19% by weight of one or both of calcined powder and glass frit, and the same composition as the metal powder, carbon powder, and alumina ceramic substrate. It is characterized in that the average particle size of the calcined powder and/or glass frit is 0.1 to 5 μm. The carbon powder acts as a strong reducing agent, controlling oxidation of the metal powder due to excessive humidification during firing in a humidified non-oxidizing atmosphere. Further, the calcined powder of the base alumina ceramic substrate raw material is added for the purpose of contributing to adhesion between the conductive metal layer and the substrate. The purpose of calcination is to prevent phase separation of the low-density oxide raw material in the metallizing paste. Furthermore, since glass frit is added for the purpose of contributing to adhesion between the conductive metal layer and the substrate, the type of glass frit used is particularly limited as long as it is compatible with this purpose and has a softening temperature of 600°C or higher. Not done. The content and average particle size of the carbon powder, calcined powder, and glass frit in the above composition may vary within the above range depending on the type, particle size, amount, and firing temperature of the metal powder contained in the composition. can be taken. Incidentally, when the total amount of one or more of W, Mo, and Mn metal powders is less than 80% by weight, the sheet resistance value increases. On the other hand, if the amount exceeds 99% by weight, the surface adhesion strength of the electrode will decrease. Furthermore, if the carbon powder content is less than 0.01% by weight, the sheet resistance value of the electrode increases depending on the humidification conditions, and the surface adhesion strength also decreases. On the other hand, 1% by weight
If the amount is more, the strength of the electrode film decreases. moreover,
Base alumina ceramic substrate raw material calcined powder, glass frit, or the total of both is 0.99% by weight
When the amount is less than 19% by weight, the surface adhesion strength of the electrode decreases, and when it is more than 19% by weight, the sheet resistance value increases. Furthermore, if the average particle size of the metal powder, carbon powder, calcined powder, or glass frit is less than 0.1μ, the purity of the powder will decrease and the cost will increase. On the other hand, if it is larger than 5μ, the sinterability of the electrode decreases in the case of metal powder, and the sheet resistance value increases due to segregation of carbon particles in the case of carbon powder. In the case of calcined powder or glass frit, the sinterability of the electrode decreases, the sheet resistance increases due to segregation, and the surface adhesion strength decreases. By using carbon powder as described above, the present invention has completed a new and excellent metallizing composition. Hereinafter, the present invention will be specifically explained with reference to Examples. First, W, Mo, and Mn powders are commercially available with an average particle size of
Glass frit powder was commercially available Al 2 O 3 -SiO 2 - with a softening point of 1100°C.
MgO--MnO 2 glass frits with average particle sizes of 0.1, 1, 5, and 10 μm are used in a ball mill. In addition, the unsintered raw alumina ceramic sheet for printing is an industrial raw material (purity of 98% or more).
Al 3 O 3 96% by weight, SiO 2 3% by weight, MgO 0.5
% by weight, CaO is mixed to a composition ratio of 0.5% by weight, and made into a raw alumina ceramic sheet using a known technique. The base alumina ceramic substrate raw material calcined product is made by mixing 1300% raw material powder with the above composition ratio.
Calcinate at ℃ and use a ball mill to reduce the average particle size to 0.1.
These are powders with sizes of 1, 5, and 10μ. The composition ratio and average particle size of such a metallizing composition are shown in Table 1 below. A metallizing paste is obtained using the composition. The metallizing paste was printed on the unsintered alumina ceramic sheet, the binder was removed in the atmosphere, and then the paste was heated at 1500°C to 1600°C in a moist green gas with a dew point (dp) of 0°C to 40°C. Let's do it. Using the metallized substrate thus obtained, various properties as shown in Table 2 below were investigated.

【表】【table】

【表】【table】

【表】 第1表、第2表より明らかなように本発明範囲
の実施例はNo.1〜No.5迄であり、他は範囲外の比
較例である。 本発明範囲の試料は面抵抗値、面接着強度、焼
結度において優秀な特性を示している。また、本
発明範囲外は諸特性が悪い。 本実施例において焼結度は、電極皮膜をナイフ
にてけずる時の度合及び電極皮膜の比抵抗値より
判定した。また、一般に配線基板の電極部の面抵
抗値は20mΩ/□以下が望ましく、面接着強度は
5Kg/mm2以上が望ましい。 以上のように本発明のメタライズ用組成物は、
配線基板用電極材として非常に優れた性能を備え
ており、工業的量産性においても著しく安定であ
り、産業的価値の大なるものである。
[Table] As is clear from Tables 1 and 2, Examples No. 1 to No. 5 are within the scope of the present invention, and the others are comparative examples outside the scope. The samples within the range of the present invention exhibit excellent properties in terms of surface resistance, surface adhesion strength, and degree of sintering. Further, properties outside the scope of the present invention are poor. In this example, the degree of sintering was determined from the degree to which the electrode film was scratched with a knife and the specific resistance value of the electrode film. Further, in general, it is desirable that the sheet resistance value of the electrode portion of the wiring board is 20 mΩ/□ or less, and the surface adhesion strength is preferably 5 Kg/mm 2 or more. As described above, the metallizing composition of the present invention has
It has extremely excellent performance as an electrode material for wiring boards, is extremely stable in industrial mass production, and has great industrial value.

Claims (1)

【特許請求の範囲】[Claims] 1 アルミナセラミツク基板に導電金属層を形成
するため、W,Mo,Mn金属粉末の1種または2
種以上が合計80〜99重量%、炭素粉末が0.01〜1
重量%、上記アルミナセラミツク基と同一組成物
仮焼粉末またはガラスフリツトの1種または両者
が合計0.99〜19重量%よりなり、しかも上記各粉
末並びにガラスフリツトの平均粒径をおのおの
0.1〜5μとすることを特徴とするメタライズ用
組成物。
1 In order to form a conductive metal layer on an alumina ceramic substrate, one or two types of W, Mo, and Mn metal powders are used.
Total content of seeds and above is 80-99% by weight, carbon powder is 0.01-1%
% by weight, one or both of calcined powder and glass frit having the same composition as the above alumina ceramic group, and a total of 0.99 to 19% by weight, and each of the above powders and glass frit has an average particle size of
A composition for metallization, characterized in that it has a thickness of 0.1 to 5μ.
JP6456580A 1980-05-14 1980-05-14 Metallized composition Granted JPS56160705A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6456580A JPS56160705A (en) 1980-05-14 1980-05-14 Metallized composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6456580A JPS56160705A (en) 1980-05-14 1980-05-14 Metallized composition

Publications (2)

Publication Number Publication Date
JPS56160705A JPS56160705A (en) 1981-12-10
JPS6130366B2 true JPS6130366B2 (en) 1986-07-12

Family

ID=13261876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6456580A Granted JPS56160705A (en) 1980-05-14 1980-05-14 Metallized composition

Country Status (1)

Country Link
JP (1) JPS56160705A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58199595A (en) * 1982-05-14 1983-11-19 日立化成工業株式会社 Method of producing ceramic multialyer circuit board
JPS58204598A (en) * 1982-05-25 1983-11-29 日立化成工業株式会社 Method of producing ceramic multilayer circuit board
JPS58219797A (en) * 1982-06-14 1983-12-21 日立化成工業株式会社 Method of producing ceramic multilayer circuit substrate
GB8526397D0 (en) * 1985-10-25 1985-11-27 Oxley Dev Co Ltd Metallising paste

Also Published As

Publication number Publication date
JPS56160705A (en) 1981-12-10

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