JPS6132722B2 - - Google Patents
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- Publication number
- JPS6132722B2 JPS6132722B2 JP15845675A JP15845675A JPS6132722B2 JP S6132722 B2 JPS6132722 B2 JP S6132722B2 JP 15845675 A JP15845675 A JP 15845675A JP 15845675 A JP15845675 A JP 15845675A JP S6132722 B2 JPS6132722 B2 JP S6132722B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- magnetic core
- head
- core
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
- G11B5/3146—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
- G11B5/3153—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers including at least one magnetic thin film coupled by interfacing to the basic magnetic thin film structure
Landscapes
- Magnetic Heads (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は薄膜磁気ヘツドおよびその製造方法に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head and a method of manufacturing the same.
薄膜磁気ヘツドの電磁気変換効率(ヘツド効
率)その他の特性は磁気コアを形成する磁性材料
の磁気特性のみならず、構造に関係する。ヘツド
効率については他の条件が等しければ磁気コア材
が厚い方が高くなる。
The electromagnetic conversion efficiency (head efficiency) and other characteristics of a thin film magnetic head are related not only to the magnetic properties of the magnetic material forming the magnetic core, but also to its structure. With respect to head efficiency, if other conditions are equal, the thicker the magnetic core material, the higher the head efficiency.
同じく、記録密度をのばすためには、磁気コア
材の記録媒体に面する部分すなわち磁極部の厚さ
はできるだけ薄いことが望ましい。 Similarly, in order to increase the recording density, it is desirable that the thickness of the portion of the magnetic core material facing the recording medium, that is, the magnetic pole portion, be as thin as possible.
また、薄膜磁気ヘツドによる書込みを考える
と、磁気コア材としては飽和磁束Bsや透磁率μ
の大きい金属材料を使用し得る利点はあるが、磁
気コアの磁気抵抗がコア全体に亘つて一様である
と、コアの磁極部分から離れた場所における磁束
の飽和に制限され、飽和磁束の数分の1の磁束が
磁気記録に有効に使用されるにすぎないので、従
来の構造では飽和磁束の大きい材料を使用しなが
ら大きな記録用磁界を発生させ得ない欠点があつ
た。 In addition, when considering writing using a thin film magnetic head, the magnetic core material has saturation magnetic flux B s and magnetic permeability μ
However, if the magnetic reluctance of the magnetic core is uniform throughout the core, the magnetic flux is limited to saturation at a location away from the magnetic pole part of the core, and the number of saturated magnetic fluxes increases. Since only one-half of the magnetic flux is effectively used for magnetic recording, the conventional structure had the disadvantage that it was not possible to generate a large recording magnetic field while using a material with a large saturation magnetic flux.
諸特性のよい薄膜磁気ヘツドを得るには、上記
の相矛盾するような条件を克服し、かつ上記の欠
点を排除することが必要である。
In order to obtain a thin film magnetic head with good characteristics, it is necessary to overcome the above contradictory conditions and eliminate the above drawbacks.
本発明は上記の相矛盾する条件を克服する困難
を解決し、さらに上記の欠点を除いた特性のよい
薄膜磁気ヘツドを提供することを目的とするもの
である。 The object of the present invention is to solve the difficulty of overcoming the above-mentioned contradictory conditions, and to provide a thin-film magnetic head with good characteristics that eliminates the above-mentioned drawbacks.
この目的は本発明によれば、その一部が磁極を
構成する薄膜より成る主磁気コアと、該主磁気コ
アの磁極部分を除き、その外側にそれぞれ、設け
た薄膜より成る補助磁気コアとを有し、補助コア
の一方は基板に形成した溝の内部に設けた磁気薄
膜より構成した薄膜磁気ヘツドにより達せられ
る。
According to the present invention, this purpose consists of a main magnetic core made of a thin film, a part of which constitutes a magnetic pole, and an auxiliary magnetic core made of a thin film provided on the outside of the main magnetic core except for the magnetic pole part. One of the auxiliary cores is reached by a thin film magnetic head consisting of a magnetic thin film provided inside a groove formed in the substrate.
次に図面について本発明の実施例を説明する。 Next, embodiments of the present invention will be described with reference to the drawings.
第1図は本発明を実施した薄膜磁気ヘツドを磁
極面に直角な平面で切つた場合の斜視図である。
図において、ヘツドを保持する基板1の表面に先
ず浅い溝2を作り、その中に磁性薄膜3を形成す
る。この薄膜は後述のように補助磁気コアを構成
する。薄膜3の厚さは、その表面が基板1の表面
4と一致する程度とする。さらにその上に図示の
通り薄膜3の磁極面12に遠い縁に対してやや磁
極面12に近い部分より磁極面12まで、ヘツド
の磁極の幅をもつ大きさの磁性薄膜5を施し、さ
らに磁性薄膜5の磁極面12に遠い縁に対してや
や磁極面12に近い部分より磁極面12まで達す
る導体薄膜6を設け、さらにその上に第2の導体
薄膜7を設ける。この第2の導体薄膜7は磁極面
12には達していない。そしてその上に、磁性薄
膜5および導体薄膜6,7を十分に覆う磁性薄膜
8および、さらにその上に磁極面12(磁性薄膜
6および8によつて作られる磁極部分)には達し
ないが磁性薄膜3の磁極面12より遠い縁から磁
性薄膜8を十分覆う第2の磁性薄膜9を設ける。
そして溝2の中に構成した磁性薄膜3を除いた
5,8,9はすべての幅が同一となるよう構成
し、導体薄膜6,7は外部と接続のためその側部
はさらに基板1上の導体薄膜10,11に結合さ
れる。図示してないが他の側部においても導体薄
膜は同様に構成される。そしてこのように薄膜を
形成した後磁極面12と磁極面12に連なる基板
1の面を研磨し整形する。 FIG. 1 is a perspective view of a thin film magnetic head embodying the present invention taken along a plane perpendicular to the magnetic pole surface.
In the figure, a shallow groove 2 is first formed on the surface of a substrate 1 holding the head, and a magnetic thin film 3 is formed in the groove. This thin film constitutes an auxiliary magnetic core as described below. The thickness of the thin film 3 is such that its surface coincides with the surface 4 of the substrate 1. Furthermore, as shown in the figure, a magnetic thin film 5 having a size equal to the width of the magnetic pole of the head is applied from a portion slightly closer to the magnetic pole surface 12 to the far edge of the magnetic pole surface 12 of the thin film 3, and A conductive thin film 6 is provided on the magnetic pole face 12 of the thin film 5, reaching the magnetic pole face 12 from a portion slightly closer to the magnetic pole face 12 toward the far edge, and a second conductive thin film 7 is further provided thereon. This second conductive thin film 7 does not reach the magnetic pole face 12. On top of that, there is a magnetic thin film 8 that sufficiently covers the magnetic thin film 5 and the conductive thin films 6 and 7, and on top of that, there is a magnetic thin film 8 that sufficiently covers the magnetic thin film 5 and the conductive thin films 6 and 7. A second magnetic thin film 9 is provided to sufficiently cover the magnetic thin film 8 from the edge of the thin film 3 farther from the magnetic pole face 12.
5, 8, and 9 other than the magnetic thin film 3 formed in the groove 2 are configured so that all widths are the same, and the conductive thin films 6 and 7 are connected to the outside, so their sides are further on the substrate 1. The conductor thin films 10 and 11 are connected to each other. Although not shown, the conductive thin film is constructed in the same manner on the other side portions as well. After forming the thin film in this way, the magnetic pole face 12 and the surface of the substrate 1 continuous to the magnetic pole face 12 are polished and shaped.
本発明による薄膜磁気ヘツドは上記のように構
成されており、主磁気コアを構成する磁性薄膜5
および8を覆つた補助磁気コアを構成する磁性薄
膜3および9があるので結果として磁気コアが厚
くなり、ヘツド効率が高くなる。 The thin film magnetic head according to the present invention is constructed as described above, and has a magnetic thin film 5 constituting the main magnetic core.
Since there are magnetic thin films 3 and 9 constituting the auxiliary magnetic core covering the magnetic cores 3 and 8, the magnetic core becomes thicker and the head efficiency becomes higher.
一方ポール・チツプの厚さ、すなわち、磁極面
12におけるコアの厚さは磁性薄膜5,8の厚さ
に過ぎず、従つて薄くすることができるので記録
密度をのばすことができる。 On the other hand, the thickness of the pole chip, that is, the thickness of the core at the pole face 12, is only the thickness of the magnetic thin films 5, 8, and can therefore be made thinner, thereby increasing the recording density.
また、補助コア(磁性薄膜3および9)は磁極
面12付近には達していないので、磁極付近を除
いた部分の磁束に対する抵抗を少くし、磁極に磁
束を集中させることができ、記録に当つて磁束を
有効に使用することができる。 In addition, since the auxiliary core (magnetic thin films 3 and 9) does not reach the vicinity of the magnetic pole surface 12, the resistance to the magnetic flux in the area other than the vicinity of the magnetic pole can be reduced and the magnetic flux can be concentrated on the magnetic pole, which is useful for recording. Therefore, magnetic flux can be used effectively.
このような薄膜磁気ヘツドは次のようにして製
造することができる。 Such a thin film magnetic head can be manufactured as follows.
第2図は本薄膜磁気ヘツドの製造工程の一例を
示す図であつて、まず第2図aに示すように基板
1としてシリコン基板20を用意し、フオト・エ
ツチング、イオン・ミリング、電子ビーム加工等
の公知の集積回路パターン形成技術により溝21
を形成する。この溝21は紙面に垂直方向に延長
するものである。 FIG. 2 is a diagram showing an example of the manufacturing process of the present thin film magnetic head. First, as shown in FIG. Grooves 21 are formed using known integrated circuit pattern forming techniques such as
form. This groove 21 extends in a direction perpendicular to the paper surface.
シリコン以外の材料を基板として使用する場合
は、基板上に予め酸化珪素の薄膜を形成した後上
記と同様に溝を形成することができる。 When a material other than silicon is used as the substrate, a thin film of silicon oxide can be formed on the substrate in advance, and then grooves can be formed in the same manner as described above.
次に第2図bに示すように、基板20の溝21
のある面の表面を酸化して酸化珪素の薄膜22を
作り、さらにその表面をクロムあるいはチタニウ
ム等の金属でメタライズし、金属薄膜層23を構
成する。その上に溝21が埋まる程度の厚さの磁
性薄膜24を蒸着、スパツタリング、あるいは電
着等の公知技術により形成する。この場合、溝2
1以外の部分にはこの磁気薄膜24は不要である
から、不要部分を化学的エツチングやイオンミリ
ング法等の公知の技術により除去する。 Next, as shown in FIG. 2b, the groove 21 of the substrate 20 is
A thin film 22 of silicon oxide is formed by oxidizing the surface of a certain surface, and the surface is further metalized with a metal such as chromium or titanium to form a metal thin film layer 23. A magnetic thin film 24 having a thickness sufficient to fill the groove 21 is formed thereon by a known technique such as vapor deposition, sputtering, or electrodeposition. In this case, groove 2
Since this magnetic thin film 24 is not necessary in areas other than 1, the unnecessary areas are removed by known techniques such as chemical etching or ion milling.
このようにして、第2図cに示すように磁性薄
膜24の一部26が基板20の溝21の中だけに
残存することとなる。 In this way, a portion 26 of the magnetic thin film 24 remains only in the groove 21 of the substrate 20, as shown in FIG. 2c.
第2図cにおいて、基板20および磁性薄膜2
6の表面に酸化珪素等の絶縁層25を設ける。 In FIG. 2c, the substrate 20 and the magnetic thin film 2
An insulating layer 25 made of silicon oxide or the like is provided on the surface of 6.
次に第2図dに示すように公知の磁性薄膜ヘツ
ドの製造技術により磁性薄膜26の上に磁性薄膜
27、導体薄膜28および30、磁性薄膜31,
32を順次に重ねて設ける。29は各薄膜の間に
設ける絶縁層である。 Next, as shown in FIG. 2d, a magnetic thin film 27, conductive thin films 28 and 30, magnetic thin film 31,
32 are sequentially stacked one on top of the other. 29 is an insulating layer provided between each thin film.
第2図dの図面の右側の方には導体薄膜28お
よび主磁気コアを構成する磁性薄膜27,31だ
けが延長し、線33を含み紙面に垂直な平面でこ
の3個の薄膜と基板20とを切り取り、研磨等に
よつて整形しヘツド浮上面34および磁極面35
を形成する。 Only the conductor thin film 28 and the magnetic thin films 27 and 31 constituting the main magnetic core extend toward the right side of the drawing in FIG. The head air bearing surface 34 and the magnetic pole surface 35 are cut out and shaped by polishing or the like.
form.
なお、磁性薄膜27および31,26および3
2はれぞれ導体薄膜28を越えた位置で相互に連
結されその間の磁気抵抗を少くするものである。 Note that the magnetic thin films 27 and 31, 26 and 3
2 are connected to each other at positions beyond the conductor thin film 28 to reduce the magnetic resistance therebetween.
以上述べた製造方法は多数の導体層をもつ多巻
形薄膜磁気ヘツドの製造に使用することがきる。 The manufacturing method described above can be used to manufacture multi-turn thin film magnetic heads having multiple conductor layers.
導体薄膜28と30との間に設けられ絶縁層2
9は各々導体薄膜28,30間において短絡電流
が生じないようにするためであり、このような構
造とすることにより導体薄膜の層の数に等しいタ
ーン数のコイルを得ることができる。本実施例で
は2ターンのコイルを有する薄膜磁気ヘツドが得
られる。 An insulating layer 2 provided between the conductive thin films 28 and 30
9 is for preventing short circuit current from occurring between the conductive thin films 28 and 30, and by adopting such a structure, a coil having the number of turns equal to the number of layers of the conductive thin films can be obtained. In this embodiment, a thin film magnetic head having a two-turn coil is obtained.
磁性薄膜31,32間および磁性薄膜26,2
7間の絶縁層29は磁気特性における高周波特性
を良くするために設けられる。 Between the magnetic thin films 31 and 32 and between the magnetic thin films 26 and 2
The insulating layer 29 between 7 and 7 is provided to improve high frequency characteristics in magnetic characteristics.
すなわち薄膜磁気ヘツドのコアとして使用され
る磁性薄膜はほとんどがNi−Fe合金(パーマロ
イ)、Fe−Si合金(センダスト)等の金属(合
金)材料である。 That is, most of the magnetic thin films used as the core of thin film magnetic heads are metal (alloy) materials such as Ni--Fe alloy (permalloy) and Fe--Si alloy (sendust).
従つて、上記磁性薄膜は、薄膜とはいえ導体で
あるから、高周波駆動を行おうとすると、表皮効
果により電流は導体表面に集中することとなる。
故に、この電流集中によつて生ずる損失が問題と
なる。上記絶縁層29はこの電流の集中を軽減
し、上記の損失を低下させる効果を有する。 Therefore, since the magnetic thin film is a conductor although it is a thin film, when high frequency driving is attempted, current will be concentrated on the surface of the conductor due to the skin effect.
Therefore, the loss caused by this current concentration becomes a problem. The insulating layer 29 has the effect of reducing concentration of this current and reducing the loss described above.
また上記絶縁層は非磁性層でもあるので、絶縁
層を設けることによつて磁極パターン内に環流磁
区と呼ばれる磁壁構造を形成し難くし、高い透磁
率が得られる。これらのことから高周波特性の改
善が図られる。 Further, since the insulating layer is also a nonmagnetic layer, by providing the insulating layer, it is difficult to form a domain wall structure called a free-flow magnetic domain within the magnetic pole pattern, and high magnetic permeability can be obtained. These factors lead to improvement in high frequency characteristics.
なお上述のように、薄膜コイルを多巻形とする
ことによつて、誘起電圧ないし磁束を増大させ、
ヘツドの効率を向上させることができる。このよ
うな多巻形薄膜コイルについては、例えば米国特
許第3549825号明細書等によつて公知である。(上
記文献には多数の1ターンコイルを多層に形成す
ることが記載されているが、外部接続の変更によ
つて複数ターンのコイルを形成することができ
る。)また本発明による構成をもつマルチ・トラ
ツクヘツドの構造にも使用することができ、この
際補助磁気コア用の磁性薄膜(第1図の3、第2
図の26)は総てこのヘツドに対して共通に作る
ことができ、ヘツド毎に切断加工を要せず、また
溝も長い共通の溝を1個作れば十分であるので製
造が簡単となる。 As mentioned above, by making the thin film coil multi-turn, the induced voltage or magnetic flux can be increased,
Head efficiency can be improved. Such multi-turn thin film coils are known, for example, from US Pat. No. 3,549,825. (Although the above-mentioned document describes forming a large number of one-turn coils in multiple layers, it is possible to form a multi-turn coil by changing the external connections.)・It can also be used in the structure of a track head, and in this case, the magnetic thin film for the auxiliary magnetic core (3, 2 in Figure 1)
26) in the figure can all be made in common for this head, cutting is not required for each head, and manufacturing is simple because it is sufficient to make one long common groove. .
なお最近開発されたテーパー付エツチング法に
よれば、補助磁気コアの端部を磁極面に近づける
ことが可能となり、これによりさらに記録磁界と
大きくすることができる。 According to the recently developed tapered etching method, it is possible to bring the end of the auxiliary magnetic core closer to the magnetic pole surface, thereby making it possible to further increase the recording magnetic field.
本発明は上記のように構成されているので、薄
膜磁気ヘツドのヘツド効率を向上させ、記録密度
を高め、大きな記録磁界が得られる効果があり、
またここに提示した本発明の製造方法によれば、
本発明による磁気ヘツドの製造が容易となり、ま
た特に多数のヘツドから成るマルチ・トラツク・
ヘツドの製造が容易となる効果がある。
Since the present invention is configured as described above, it has the effect of improving the head efficiency of the thin film magnetic head, increasing the recording density, and obtaining a large recording magnetic field.
Furthermore, according to the manufacturing method of the present invention presented here,
The manufacturing of the magnetic head according to the invention is facilitated, and especially for multi-track magnetic heads consisting of a large number of heads.
This has the effect of making it easier to manufacture the head.
第1図は本発明を実施したヘツドの一部断面で
示した斜視図、第2図は本発明によるこのヘツド
の製造工程を示す図である。
図において、1,20は基板、5,8,27,
31は主磁気コア、3,9,26,32は補助磁
気コア、6,7,28,30は導体薄膜、12,
35は磁極面である。
FIG. 1 is a partially sectional perspective view of a head embodying the present invention, and FIG. 2 is a diagram showing the manufacturing process of this head according to the present invention. In the figure, 1, 20 are substrates, 5, 8, 27,
31 is the main magnetic core, 3, 9, 26, 32 are auxiliary magnetic cores, 6, 7, 28, 30 are conductor thin films, 12,
35 is a magnetic pole surface.
Claims (1)
気コアと、該主磁気コアの磁極部分を除き、その
外側にそれぞれ、設けた薄膜より成る補助磁気コ
アとを有し、補助コアの一方は基板に形成した溝
の内部に設けた磁気薄膜より構成したことを特徴
とする薄膜磁気ヘツド。 2 基板の表面に該基板の磁気記録媒体に対向す
る面に近接した部分を除いて溝を作り該溝中に磁
気薄膜によつて第1の補助磁気コアを形成する工
程と、 該第1の補助磁気コアの磁気記録媒体と対向す
る面と反対側の端部を除く表面上および前記基板
の前記近接した部分の表面上に磁気薄膜によつて
第1の主磁気コアを形成する工程と、 該第1の主磁気コアの磁気記録媒体と対向する
面と反対側の端部を除く表面上に磁気薄膜によつ
て薄膜コイルを形成する工程と、 前記第1の主磁気コアの前記端部および前記薄
膜コイルの表面上に磁気薄膜によつて第2の主磁
気コアを形成する工程と、 前記第1の補助磁気コアの前記端部および第2
の主磁気コアの磁気記録媒体と対向する面に近接
する部分を除く表面上に磁気薄膜によつて第2の
補助磁気コアを形成する工程と、 前記基板と両主磁気コアと薄膜コイルの磁気記
録媒体と対向する面を平坦に整形する工程とを含
んでなることを特徴とする薄膜磁気ヘツドの製造
方法。[Claims] 1. A main magnetic core made of a thin film, a part of which constitutes a magnetic pole, and an auxiliary magnetic core made of a thin film provided on the outside of the main magnetic core except for the magnetic pole part. A thin film magnetic head, characterized in that one of the auxiliary cores is constituted by a magnetic thin film provided inside a groove formed in a substrate. 2. forming a groove on the surface of the substrate except for a portion close to the surface of the substrate facing the magnetic recording medium, and forming a first auxiliary magnetic core in the groove using a magnetic thin film; forming a first main magnetic core with a magnetic thin film on the surface of the auxiliary magnetic core excluding the end opposite to the surface facing the magnetic recording medium and on the surface of the adjacent portion of the substrate; forming a thin film coil using a magnetic thin film on a surface of the first main magnetic core other than the end opposite to the surface facing the magnetic recording medium; and the end of the first main magnetic core. and forming a second main magnetic core using a magnetic thin film on the surface of the thin film coil;
forming a second auxiliary magnetic core using a magnetic thin film on the surface of the main magnetic core except for a portion close to the surface facing the magnetic recording medium; 1. A method for manufacturing a thin-film magnetic head, comprising the step of flattening a surface facing a recording medium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15845675A JPS5284722A (en) | 1975-12-31 | 1975-12-31 | Thin film magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15845675A JPS5284722A (en) | 1975-12-31 | 1975-12-31 | Thin film magnetic head and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5284722A JPS5284722A (en) | 1977-07-14 |
| JPS6132722B2 true JPS6132722B2 (en) | 1986-07-29 |
Family
ID=15672133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15845675A Granted JPS5284722A (en) | 1975-12-31 | 1975-12-31 | Thin film magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5284722A (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4281357A (en) * | 1979-09-10 | 1981-07-28 | Magnex Corporation | Thin film magnetic head and method of making the same |
| JPS57117117A (en) * | 1981-01-09 | 1982-07-21 | Matsushita Electric Ind Co Ltd | Thin film magnetic head |
| JPS5942622A (en) * | 1982-09-01 | 1984-03-09 | Comput Basic Mach Technol Res Assoc | Thin film magnetic head |
| JPS5965921A (en) * | 1982-10-07 | 1984-04-14 | Comput Basic Mach Technol Res Assoc | Manufacture of thin film magnetic head |
| JPS5971115A (en) * | 1982-10-15 | 1984-04-21 | Hitachi Ltd | Thin film head for vertical magnetic recording and reproduction |
| JPS5979413A (en) * | 1982-10-27 | 1984-05-08 | Seiko Epson Corp | Magnetic head |
| JPS6045920A (en) * | 1983-08-23 | 1985-03-12 | Fujitsu Ltd | Thin film magnetic head having composite core |
| JPS61142519A (en) * | 1984-12-13 | 1986-06-30 | Matsushita Electric Ind Co Ltd | thin film magnetic head |
| EP0232505A1 (en) * | 1985-12-20 | 1987-08-19 | Siemens Aktiengesellschaft | Magnetic storage device with a recording medium to be magnetized perpendicularly |
| JP2000020919A (en) | 1998-07-03 | 2000-01-21 | Hitachi Ltd | Magnetic head and magnetic disk drive using the same |
| JP2000207707A (en) | 1999-01-08 | 2000-07-28 | Hitachi Ltd | Thin film magnetic head and magnetic disk drive using the same |
-
1975
- 1975-12-31 JP JP15845675A patent/JPS5284722A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5284722A (en) | 1977-07-14 |
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