JPS6134386B2 - - Google Patents
Info
- Publication number
- JPS6134386B2 JPS6134386B2 JP54126722A JP12672279A JPS6134386B2 JP S6134386 B2 JPS6134386 B2 JP S6134386B2 JP 54126722 A JP54126722 A JP 54126722A JP 12672279 A JP12672279 A JP 12672279A JP S6134386 B2 JPS6134386 B2 JP S6134386B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- laminate
- transparent
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 48
- 239000010409 thin film Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- -1 methoxyethyl group Chemical group 0.000 claims description 13
- 239000011241 protective layer Substances 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000003700 epoxy group Chemical group 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 239000011368 organic material Substances 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 239000003999 initiator Substances 0.000 claims description 2
- 125000000962 organic group Chemical group 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 19
- 239000010408 film Substances 0.000 description 18
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 15
- 239000004332 silver Substances 0.000 description 11
- 229910000881 Cu alloy Inorganic materials 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 150000003961 organosilicon compounds Chemical class 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 229920006267 polyester film Polymers 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 229920003214 poly(methacrylonitrile) Polymers 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000008399 tap water Substances 0.000 description 4
- 235000020679 tap water Nutrition 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229910001316 Ag alloy Inorganic materials 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- LGXVIGDEPROXKC-UHFFFAOYSA-N 1,1-dichloroethene Chemical compound ClC(Cl)=C LGXVIGDEPROXKC-UHFFFAOYSA-N 0.000 description 1
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 206010037867 Rash macular Diseases 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- QRJOYPHTNNOAOJ-UHFFFAOYSA-N copper gold Chemical compound [Cu].[Au] QRJOYPHTNNOAOJ-UHFFFAOYSA-N 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- PQTCMBYFWMFIGM-UHFFFAOYSA-N gold silver Chemical compound [Ag].[Au] PQTCMBYFWMFIGM-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical group 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006350 polyacrylonitrile resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000009283 thermal hydrolysis Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Description
【発明の詳細な説明】
本発明は耐久性の優れた選択的光透過性の積層
体に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a highly durable and selectively transparent laminate.
選択的光透過性積層体は、例えば可視光に対し
ては透明であるが、遠赤外線に対しては反射能を
有するものである。この積層体を用いると輻射に
よる熱移動を防ぐことができるから、透明な断熱
窓としての機能が生じる。例えばこの積層体を一
重窓に施工すると二重窓並みの断熱効果が得られ
る。 The selectively transparent laminate is, for example, transparent to visible light but reflective to far infrared rays. Using this laminate can prevent heat transfer due to radiation, so it functions as a transparent heat insulating window. For example, if this laminate is applied to a single-pane window, it will provide the same insulation effect as a double-pane window.
かかる性能を有する積層体は、太陽エネルギー
集熱器、温水器;グリーンハウス、建造物の窓;
冷凍庫、冷蔵シヨーケース;車輌又は航空機の窓
等への利用が考えられ、太陽エネルギーの利用及
びエネルギー放射の防止をはかる透明断熱窓とし
ての機能が今後益々重要となつてくる。 Laminated bodies with such performance can be used in solar energy collectors, water heaters; greenhouses, windows in buildings;
It can be used in freezers, refrigerated cases, windows of vehicles or aircraft, etc., and its function as a transparent heat-insulating window that utilizes solar energy and prevents energy radiation will become increasingly important in the future.
かかる目的を達成する為に、耐久性のある選択
光透過性積層体が、工業的に安価、大量に供給さ
れることが望まれている。 In order to achieve this objective, it is desired that durable selective light transmitting laminates be industrially available at low cost and in large quantities.
従来技術におけるソーラーシステム等に供され
る積層体は金、銀、銅、アルミニウム等の金属薄
膜を有機材料からなる透明な基盤の上に設けたも
のである。更に特定の波長領域における透明性を
改良するために透明な高屈折率を有する薄膜層を
金属薄膜の上に覆う技術も公知であり、高屈折率
をもつ薄膜によつて金属薄膜を挾む構成もよく知
られている。 Laminated bodies used in solar systems and the like in the prior art are those in which a thin metal film of gold, silver, copper, aluminum, etc. is provided on a transparent substrate made of an organic material. Furthermore, in order to improve the transparency in a specific wavelength range, a technique is also known in which a transparent thin film layer with a high refractive index is coated on a metal thin film, and a structure in which a metal thin film is sandwiched between thin films with a high refractive index is also known. is also well known.
ところが、選択光透過性を有する積層体を建築
物あるいはシヨーケース等の窓に適用した場合、
一定期間を経たものに斑点状のしみが発生するこ
とがわかつた。特に結露した窓ガラスの積層体や
水道水で清掃して濡れる積層体においてしみの発
生が著しい。このしみを防止する目的で、例えば
ポリアクリル樹脂、ポリアクリルニトリル樹脂等
の高分子材料からなる透明保護膜を厚さ2〜10μ
mに調整して金属薄膜(または高屈折率を有する
物質の薄膜)を被覆しても、このしみ状斑点の発
生を抑えることができない。もつとも、透明保護
膜を充分厚くすると斑点を防止できるが、遠赤外
線の吸収が増すので積層体の断熱性能が損われ
る。 However, when a laminate with selective light transmittance is applied to windows of buildings or show cases,
It was found that after a certain period of time, spot-like stains appeared. The occurrence of stains is particularly noticeable on laminated glass windows with dew condensation or those that are wetted by cleaning with tap water. In order to prevent this staining, a transparent protective film made of a polymeric material such as polyacrylic resin or polyacrylonitrile resin is applied to a thickness of 2 to 10 μm.
Even if a metal thin film (or a thin film of a substance having a high refractive index) is coated with an adjustment to m, the occurrence of these blotchy spots cannot be suppressed. Of course, if the transparent protective film is made sufficiently thick, spots can be prevented, but the absorption of far infrared rays increases, which impairs the heat insulation performance of the laminate.
本発明者は、断熱効果が維持でき、かつしみ斑
点の生じない耐久性のある積層体を鋭意研究して
本発明に到達した。 The inventor of the present invention has arrived at the present invention through intensive research into a durable laminate that can maintain its heat insulating effect and does not cause stains.
即ち、本発明は透明な成形物基盤(A)、選択透過
膜(X)、中間層(D)及び有機物系の透明保護層(E)
とがこの順序に積層されてなる積層体であつて、
前記選択透過膜は金属薄膜層(B)と要すれば高屈折
率物質の薄層(C)とからなり、前記中間層はR1Si
(OR2)3で表わされる有機シラン化合物であるこ
とを特徴とする積層体である。ここにR1は炭素
原子数10以下でビニル基、エポキシ基、アミノ
基、メルカプト基の少くとも1の基を含む有機基
であり、またR2はメチル基、エチル基、メトキ
シエチル基のいずれかである。 That is, the present invention comprises a transparent molded substrate (A), a selectively permeable membrane (X), an intermediate layer (D), and an organic transparent protective layer (E).
and are laminated in this order,
The selectively permeable membrane is composed of a metal thin film layer (B) and, if necessary, a thin layer (C) of a high refractive index material, and the intermediate layer is made of R 1 Si.
This is a laminate characterized by being an organic silane compound represented by (OR 2 ) 3 . Here, R 1 is an organic group having 10 or less carbon atoms and containing at least one of vinyl group, epoxy group, amino group, and mercapto group, and R 2 is any one of methyl group, ethyl group, and methoxyethyl group. That's it.
本発明を説明する。 The present invention will be explained.
本発明に供する透明な成形物の基盤は、材質と
して有機物及び無機物いずれでも良い。有機物と
しては、例えば熱可塑性高分子のシートまたはフ
イルム、また無機物としては、例えばガラス板等
が挙げられる。 The material for the base of the transparent molded product used in the present invention may be either organic or inorganic. Examples of the organic material include a thermoplastic polymer sheet or film, and examples of the inorganic material include a glass plate.
金属薄膜層としては、金、銀、銅、アルミニウ
ム又はこれらの金属の少くとも2種以上からなる
合金もしくは多層体が挙げられる。好ましい金属
薄膜層は、銀と銅の合金膜、金と銀の合金膜であ
る。 Examples of the metal thin film layer include gold, silver, copper, aluminum, or an alloy or multilayer body made of at least two or more of these metals. Preferred metal thin film layers are a silver-copper alloy film and a gold-silver alloy film.
金属薄膜層の膜厚は、透明導電性又は選択光透
過性を有する限り特に限定されない。通常膜厚は
約40Å〜500Åが好ましく、より充分な透明性と
充分な導電性を兼有する為には100Å〜200Åが特
に好ましい。40Å以下になると完全に連続した薄
い層とならずに島状構造になりやすく、又、500
Å以上になると透明性が損なわれる。かかる金属
薄膜を形成させる手段としては、真空蒸着法、カ
ソードスパツタリング法、イオンプレーテイング
法、プラズマ溶射法が挙げられるが、好ましくは
真空蒸着法、カソードスパツタリング法である。 The thickness of the metal thin film layer is not particularly limited as long as it has transparent conductivity or selective light transmittance. Usually, the film thickness is preferably about 40 Å to 500 Å, and particularly preferably 100 Å to 200 Å in order to have both sufficient transparency and sufficient conductivity. If the thickness is less than 40 Å, it will not form a completely continuous thin layer and will tend to form an island structure.
If it exceeds Å, transparency will be impaired. Examples of means for forming such a metal thin film include vacuum evaporation, cathode sputtering, ion plating, and plasma spraying, with vacuum evaporation and cathode sputtering being preferred.
有機物系の透明保護層は、耐スクラツチ性、耐
光性向上のために設けられる。その例としてはポ
リエチレンテレフタレート、ポリエチレン、ポリ
プロピレン、ポリカーボネート、ポリアクリルニ
トリル、ポリメタアクリルニトリル、ポリ(メ
タ)アクリレートエチレン−酢酸ビニル共重合
体、ポリスチレン、ポリ塩化ビニル、酢酸ビニル
−塩化ビニル共重合体、塩化ビニル一塩化ビニリ
デン等の塩化ビニル、ナイロン、多官能ポリ(メ
タ)アクリレート、ジエチレングリコールビスア
リルカーボネート、メラミン等が挙げられる。 The organic transparent protective layer is provided to improve scratch resistance and light resistance. Examples include polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyacrylonitrile, polymethacrylonitrile, poly(meth)acrylate ethylene-vinyl acetate copolymer, polystyrene, polyvinyl chloride, vinyl acetate-vinyl chloride copolymer, Examples include vinyl chloride such as vinyl chloride and vinylidene monochloride, nylon, polyfunctional poly(meth)acrylate, diethylene glycol bisallyl carbonate, and melamine.
最適な膜厚は、透明保護層の遠赤外に対する透
過率の大小によつて変わる。ポリエチレン、ポリ
プロピレン等のオレフイン系の透明保護層の膜厚
は、40〜50μmでも断熱効果を有しているが、ポ
リエチレンテレフタレート、ポリアクリレート等
の透明保護層の膜厚が20μmでは、断熱効果は著
しく減少するため断熱窓の用途には適さない。も
つとも日照調整用としての機能は有している。 The optimum film thickness varies depending on the far-infrared transmittance of the transparent protective layer. Olefin-based transparent protective layers such as polyethylene and polypropylene have a heat insulation effect even when the thickness is 40 to 50 μm, but when the thickness of polyethylene terephthalate, polyacrylate, etc. is 20 μm, the heat insulation effect is significantly This makes it unsuitable for use in insulated windows. However, it still has the function of adjusting sunlight.
本発明の中間層はR1Si(OR2)3の一般式で示さ
れる有機ケイ素化合物である。ここにR1として
はビニル基、エポキシ基、アミノ基、メルカプト
基のうちの少なくとも1の基を有する炭素原子数
10以下の有機化合物であり、R2はメチル基、エ
チル基、メトキシエチル基のいずれかである。 The intermediate layer of the present invention is an organosilicon compound represented by the general formula R 1 Si(OR 2 ) 3 . Here, R 1 is the number of carbon atoms having at least one of vinyl group, epoxy group, amino group, and mercapto group.
It is an organic compound with a size of 10 or less, and R 2 is a methyl group, an ethyl group, or a methoxyethyl group.
具体例としては、ビニルトリエトキシシラン、
ビニルトリス(β−メトキシエトキシ)シラン、
β−(3・4エポキシシクロヘキシル)エチルト
リメトキシシラン、γ−グリシドキシプロピルト
リメトキシシラン、N−β(アミノエチル)γ−
アミノプロピルトリメトキシシラン、γ−メルカ
プトプロピルトリメトキシシランなどがあげられ
る。 Specific examples include vinyltriethoxysilane,
vinyltris(β-methoxyethoxy)silane,
β-(3,4 epoxycyclohexyl)ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, N-β(aminoethyl)γ-
Examples include aminopropyltrimethoxysilane and γ-mercaptopropyltrimethoxysilane.
本発明における有機ケイ素化合物の効果は、上
述した具体例に限定されるものではない。 The effects of the organosilicon compound in the present invention are not limited to the specific examples described above.
本発明において、可視域での透過率を高めるた
め、あるいは接着性改善のため、透明高屈折率を
もつ誘電体薄層を金属薄膜層の上に積層すること
ができる。ここに、高屈折率誘電体とは589nm
において測定した屈折率が1.4以上のものであつ
て、好ましくは1.6以上、更に好ましくは1.7以上
のものである。かかる条件を満足するものとして
は、一酸化チタン、二酸化チタン、酸化ジルコ
ン、酸化ビスマス、酸化スズ、酸化インジウム、
酸化硅素、酸化亜鉛及び酸化バリウム等が挙げら
れる。 In the present invention, a transparent dielectric thin layer having a high refractive index can be laminated on the metal thin film layer in order to increase transmittance in the visible region or to improve adhesiveness. Here, the high refractive index dielectric is 589nm.
The refractive index measured in is 1.4 or more, preferably 1.6 or more, more preferably 1.7 or more. Titanium monoxide, titanium dioxide, zirconium oxide, bismuth oxide, tin oxide, indium oxide,
Examples include silicon oxide, zinc oxide and barium oxide.
この中でも、一酸化チタン、二酸化チタン等の
酸化チタン、酸化硅素、酸化亜鉛が透明性や膜形
成速度の点より好ましく、特に可視光屈折率、透
明性等の光学的特性の優秀さより酸化チタンが好
ましい。 Among these, titanium oxide such as titanium monoxide and titanium dioxide, silicon oxide, and zinc oxide are preferable from the viewpoint of transparency and film formation speed, and titanium oxide is particularly preferable because of its excellent optical properties such as visible light refractive index and transparency. preferable.
透明高屈折率薄膜層は、蒸着等の物理的方法あ
るいは熱加水分解法等の化学的方法のいずれによ
つても形成することが出来る。 The transparent high refractive index thin film layer can be formed by either a physical method such as vapor deposition or a chemical method such as thermal hydrolysis.
これらの各層は次の構成の順序に積層される。
透明な成型物基盤A、金属薄膜層B、透明高屈折
率誘電体薄層をC、有機ケイ素化合物の中間層を
D及び有機物系透明保護層をEとすると、
(1) A\C\B\C\D\E
(2) A\C\B\D\E
(3) A\B\C\D\E
(4) A\B\D\E
などの構成が例示できる。 Each of these layers is laminated in the following configuration order.
Assuming that the transparent molded substrate A, the metal thin film layer B, the transparent high refractive index dielectric thin layer is C, the organosilicon compound intermediate layer is D, and the organic transparent protective layer is E, (1) A\C\B Examples of configurations include \C\D\E (2) A\C\B\D\E (3) A\B\C\D\E (4) A\B\D\E.
有機ケイ素化合物の中間層Dは、適当な溶媒に
溶解させた後、バーコーターなどで透明保護層E
又は金属薄膜若しくは薄層Cの表面に塗布する
か、他の手段例えば浸漬法、噴霧法、スピナー法
やマシンコーテイング法など、一般的な溶液の塗
工法をそのまま適用し、乾燥器などで乾燥、熱処
理すれば良い。 The intermediate layer D of an organosilicon compound is dissolved in a suitable solvent, and then coated with a transparent protective layer E using a bar coater or the like.
Alternatively, it can be applied to the surface of the metal thin film or thin layer C, or other methods such as dipping, spraying, spinner coating, machine coating, etc. can be used as is, and the solution can be dried in a dryer or the like. It can be heat treated.
この際、有機ケイ素化合物の硬化速度を高める
ために、溶液中に水及び硬化促進剤を加えること
もできる。 At this time, water and a curing accelerator may be added to the solution in order to increase the curing speed of the organosilicon compound.
本発明は各層を順次形成させることによつて斑
点状のシミ発生防止に大きい効果のある積層体が
得られるが、R1としてビニル基を含み、透明保
護層に熱開始剤を含有させて形成した積層体は、
とりわけ著しい耐久性を示す。 In the present invention, by sequentially forming each layer, a laminate that is highly effective in preventing the occurrence of spot-like stains can be obtained. The laminate is
It shows particularly remarkable durability.
熱開始剤としてはアゾビスイソブチロニトリル
等のアゾン化合物、ベンゾイルパーオキサイド、
ラウリルパーオキサイド、ジ−tert−ブチルパー
オキサイド、ジクメニルパーオキサイドなどの過
酸化物があげられる。これらの過酸化物は混合し
て用いる事もできる。使用量は有機物系透明保護
層樹脂成分に対して0.01〜10重量%の範囲であ
る。 As a thermal initiator, an azone compound such as azobisisobutyronitrile, benzoyl peroxide,
Examples include peroxides such as lauryl peroxide, di-tert-butyl peroxide, and dicumenyl peroxide. These peroxides can also be used in combination. The amount used is in the range of 0.01 to 10% by weight based on the organic transparent protective layer resin component.
本発明における選択光透過性積層体のすぐれた
耐久性を実証するために、次の実験が遂行され
た。 In order to demonstrate the superior durability of the selective light transmitting laminate of the present invention, the following experiment was performed.
南面に面した窓の室内側のガラス面にサンプル
を貼付け、積層体から空間を隔ててノズルを設
け、2時間毎に1分間の周期で水道水をスプレー
した。スプレーされた水道水はほぼ均一に積層体
を濡らし、その後次の水スプレーがなされる前
に、附着した水道水は乾燥していた。 The sample was attached to the glass surface on the indoor side of a window facing south, a nozzle was installed at a distance from the laminate, and tap water was sprayed at a cycle of 1 minute every 2 hours. The sprayed tap water wetted the laminate almost uniformly, and the deposited tap water had dried before the next water spray was applied.
以下、実施例に基いて本発明の積層体の効果に
ついて述べる。 Hereinafter, the effects of the laminate of the present invention will be described based on Examples.
実施例 1
透明な二軸延伸ポリエステルフイルム上に、テ
トラブチルチタネートの4量体3部、イソプロピ
ルアルコール65部及びノルマルヘキサン32部から
なる溶液をバーコーターで塗布し、塗布物を130
℃で3分間加熱して厚さ250Åの酸化チタン層を
設け、更にこの酸化チタン層の上に厚さ180Åの
銀と銅との合金(銀/銅=90/10)の薄膜を設け
た。Example 1 A solution consisting of 3 parts of tetrabutyl titanate tetramer, 65 parts of isopropyl alcohol, and 32 parts of n-hexane was applied onto a transparent biaxially stretched polyester film using a bar coater, and the coated material was
A titanium oxide layer with a thickness of 250 Å was formed by heating at ℃ for 3 minutes, and a thin film of an alloy of silver and copper (silver/copper = 90/10) with a thickness of 180 Å was further formed on this titanium oxide layer.
銀−銅合金層は銀・銅合金(銀70%、銅30%)
を用い、抵抗加熱方式で真空蒸着を施した。続い
て銀−銅合金層上に第二層と同様にして250Åの
酸化チタン層を設け、更にその上にβ−(3・4
−エポキシシクロヘキシル)エナルトリメトキシ
シラン1に対し、水1;イソプロピルアルコール
8の割合で調整した有機ケイ素化合物溶液をバー
コーターで塗布し、130℃に於て5分間熱処理を
施し、厚さ0.1μmの膜を設けた。 Silver-copper alloy layer is silver-copper alloy (70% silver, 30% copper)
Vacuum deposition was performed using a resistance heating method. Next, a 250 Å titanium oxide layer was formed on the silver-copper alloy layer in the same manner as the second layer, and on top of that was a β-(3.4
- An organosilicon compound solution prepared in a ratio of 1 part - epoxycyclohexyl)enaltrimethoxysilane, 1 part water, and 8 parts isopropyl alcohol was coated with a bar coater, heat-treated at 130°C for 5 minutes, and a thickness of 0.1 μm was applied. A membrane was provided.
さらにこの上にポリメタアクリルニトリルのシ
クロヘキサノン溶液をバーコーターで塗布し、
130℃に於ける5分の乾燥を施して厚さ2μmの
膜を設けた。 Furthermore, a cyclohexanone solution of polymethacrylonitrile was applied on top of this using a bar coater.
Drying at 130° C. for 5 minutes provided a 2 μm thick film.
得られた積層体を前述した実装耐久試験装置の
窓に貼付して評価を行なつた。 The obtained laminate was pasted on the window of the above-mentioned mounting durability testing device and evaluated.
本実施例の積層体は30日経過しても斑点状のシ
ミは発生しなかつた。また赤外波長4μm〜25μ
mでの赤外反射率の平均値は84%であつた。 The laminate of this example did not develop any speckled stains even after 30 days. Also, infrared wavelength 4μm ~ 25μm
The average value of infrared reflectance at m was 84%.
比較例 1
実施例1において、有機ケイ素化合物の層を除
き、他の層に関しては全く同じ方法で積層体を形
成した。これを実装耐久試験装置の窓に貼付け、
テストしたところ3日後には多くの斑点状のシミ
が発生した。Comparative Example 1 A laminate was formed in exactly the same manner as in Example 1 except for the organosilicon compound layer with respect to the other layers. Paste this on the window of the mounting durability test equipment,
When tested, many spots appeared after 3 days.
実施例 2
透明な二軸延伸ポリエステルフイルム上に、実
施例1と同様に250Åの酸化チタン層を設け、そ
の上に金属として厚さ180Åの銀と金の合金
(銀/金=80/20)をスパツタリング法で設け
た。この上に同様の方法で250Åの酸化チタン薄
膜層を設け、更にその上にビニルトリス(β−メ
トキシエトキシ)シラン1に対し水1、イソブタ
ビルアルコール8の割合で調整した溶液をバーコ
ーターで塗布し、130℃で5分間の熱処理を行な
い、厚さ0.1μmの膜を設けた。この膜の上に、
更にポリメタアクリルニトリル1に対しシクロヘ
キサン9及びベンゾイルパーオキサイド0.02の割
合で調整した溶液で調整した溶液をパーコーター
で塗布して、130℃で5分間熱処理を施し、2μ
mの膜を得た。得られた積層体を前述した実装耐
久試験装置の窓に貼付けて評価を行なつたが、40
日経過しても斑点状のシミは発生しなかつた。ま
た、赤外波長4〜25μmでの赤外反射率の平均は
84%であつた。Example 2 A 250 Å thick titanium oxide layer was provided on a transparent biaxially stretched polyester film in the same manner as in Example 1, and on top of that a 180 Å thick silver and gold alloy (silver/gold = 80/20) was used as a metal. was installed using the sputtering method. A 250 Å thin film layer of titanium oxide was applied on top of this using the same method, and then a solution prepared in a ratio of 1 part vinyltris(β-methoxyethoxy)silane, 1 part water, and 8 parts isobutabyl alcohol was applied using a bar coater. Then, heat treatment was performed at 130°C for 5 minutes to form a film with a thickness of 0.1 μm. On this membrane,
Furthermore, a solution prepared in a ratio of 1 part of polymethacrylonitrile to 9 parts of cyclohexane and 0.02 parts of benzoyl peroxide was applied with a percoater, heat-treated at 130°C for 5 minutes, and a 2μ
A film of m was obtained. The obtained laminate was evaluated by pasting it on the window of the mounting durability test device mentioned above, but
No spot-like stains appeared even after a day had passed. Also, the average infrared reflectance at an infrared wavelength of 4 to 25 μm is
It was 84%.
比較例 2
実施例2において、有機ケイ素化合物の層を除
き、他の層に関しては全く同じ方法で積層体を形
成した。Comparative Example 2 A laminate was formed in exactly the same manner as in Example 2 except for the organosilicon compound layer with respect to the other layers.
これについて実装耐久試験装置の窓に貼付け、
テストしたところ7日後には多数の斑点状シミが
発生した。 Regarding this, paste it on the window of the mounting durability test equipment,
When tested, numerous spots appeared after 7 days.
実施例 3
実施例1と同様に、ポリエステルフイルム上に
250Åの酸化チタン層を設け、その上に厚さ180Å
の銀−銅合金属(銀90/銅10)を設けた。Example 3 Similar to Example 1, on a polyester film
A 250 Å titanium oxide layer is placed on top of a 180 Å thick titanium oxide layer.
A silver-copper alloy metal (90 silver/10 copper) was prepared.
次いでこの上にN−β(アミノエチル)γ−ア
ミノプロピルトリメトキシシラン1に対し、水
1、イソプロピルアルコール8の割合で調整した
溶液をバーコーターで塗布し、130℃で10分間の
熱処理を施し、厚さ0.1μmの膜を設けた。 Next, a solution prepared in a ratio of 1 part N-β (aminoethyl) γ-aminopropyltrimethoxysilane to 1 part water and 8 parts isopropyl alcohol was applied onto this using a bar coater, and heat treatment was performed at 130°C for 10 minutes. , a film with a thickness of 0.1 μm was provided.
更にこの上にポリアクリルニトリルのジメチル
ホルムアミド溶液をバーコーターで塗布し、130
℃で5分間の乾燥を施して厚さ2μmの膜を設け
た。得られた積層体を実装耐久試験装置の窓に貼
付けテストを行なつたところ、30日経過しても異
常が認められなかつた。 Furthermore, a dimethylformamide solution of polyacrylonitrile was applied on top of this using a bar coater, and 130
Drying was performed at ℃ for 5 minutes to provide a 2 μm thick membrane. When the obtained laminate was tested by pasting it on the window of a mounting durability testing device, no abnormality was observed even after 30 days had passed.
実施例 4
透明な二軸延伸ポリエステルフイルム上に、電
子ビーム法で240Åの酸化チタンの膜を設けた。
この上に実施例1と同様に抵抗加熱方式180Åの
銀−銅合金薄膜層(銀/銅=90/10)を設け、次
いでその上に電子ビーム法で240Åの酸化チタン
の膜を設けた。Example 4 A 240 Å titanium oxide film was provided on a transparent biaxially stretched polyester film by an electron beam method.
A 180 Å silver-copper alloy thin film layer (silver/copper = 90/10) was formed thereon by the resistance heating method as in Example 1, and then a 240 Å titanium oxide film was formed thereon by the electron beam method.
さらに、γ−メルカプトプロピルトリメトキシ
シラン1に対し、水1、イソプロピルアルコール
8の割合で調整した溶液をバーコーターで塗布
し、130℃で5分間の熱処理を施して厚さ0.1μm
の膜を設けた。 Furthermore, a solution prepared in a ratio of 1 part of γ-mercaptopropyltrimethoxysilane to 1 part of water and 8 parts of isopropyl alcohol was coated with a bar coater, and heat treated at 130°C for 5 minutes to a thickness of 0.1 μm.
A membrane was provided.
さらにこの上にポリメタアクリルニトリルのシ
クロヘキサノン溶液をバーコーターで塗布し、
130℃において5分間熱処理を施し2μmの膜を
設けた。得られた積層体を実装耐久試験装置の窓
に貼付け、テストを行なつたところ30日経過して
も異常が認められなかつた。 Furthermore, a cyclohexanone solution of polymethacrylonitrile was applied on top of this using a bar coater.
Heat treatment was performed at 130° C. for 5 minutes to form a 2 μm film. When the obtained laminate was pasted on the window of a mounting durability testing device and tested, no abnormality was observed even after 30 days had passed.
実施例 5
ポリエステルフイルム上に、厚さ170Åの銀−
金−銅合金層(銀/金/銅=75/20/5)をスパ
ツタリング法で設け、その上に実施例1と同様に
してテトラブチルチタネートの溶液をコーテイン
グすることにより、240Åの酸化チタン層を形成
させた。Example 5 A 170 Å thick layer of silver was deposited on a polyester film.
A gold-copper alloy layer (silver/gold/copper = 75/20/5) was formed by sputtering, and then a 240 Å titanium oxide layer was formed by coating a tetrabutyl titanate solution in the same manner as in Example 1. was formed.
次いでその上にβ−(3・4エポキシシクロヘ
キシル)エチルトリメトキシシラン1に対し、水
1、イソプロピルアルコール8の割合で調整した
溶液をバーコーターで塗布し、130℃5分間の熱
処理を行なつて厚さ0.1μmの膜を得た。更に、
その上にポリメタアクリルニトリルの2μm膜を
前述の方法で設けた。 Next, a solution prepared in a ratio of 1 part β-(3,4 epoxycyclohexyl)ethyltrimethoxysilane to 1 part water and 8 parts isopropyl alcohol was applied onto it using a bar coater, and heat treatment was performed at 130°C for 5 minutes. A film with a thickness of 0.1 μm was obtained. Furthermore,
A 2 μm film of polymethacrylonitrile was provided thereon by the method described above.
本実施例の積層体を実装耐久試験装置でテスト
したところ、30日経過しても異常が認められなか
つた。 When the laminate of this example was tested using a mounting durability tester, no abnormality was observed even after 30 days.
比較例 3
実施例5で、有機ケイ素化合物の硬化層を除
く、他の層は全く同じ方法で形成したポリエステ
ルフイルム\銀−金−銅合金属\酸化チタン\ポ
リメタアクリルニトリルの積層体を実装耐久試験
装置でテストしたところ、4日で多数の斑点状シ
ミが発生した。Comparative Example 3 A laminate of polyester film\silver-gold-copper alloy\titanium oxide\polymethacrylonitrile was formed using the same method as in Example 5 except for the hardened layer of the organosilicon compound. When tested using a durability testing device, numerous spot-like stains appeared within 4 days.
実施例 6
透明な二軸延伸ポリエステルフイルムの両面
に、実施例1と同様にして250Åの酸化チタン
層、180Åの銀−銅合金層(銀/銅=90/10)、
250Åの酸化チタン層、β−(3・4エポキシシク
ロヘキシル)エチルトリメトキシシラン層0.1μ
m、ポリメタアクリルニトリル2μmの層を順次
設け、実装耐久試験装置の窓に貼付けて評価を行
なつた。Example 6 On both sides of a transparent biaxially stretched polyester film, a 250 Å titanium oxide layer, a 180 Å silver-copper alloy layer (silver/copper = 90/10),
250 Å titanium oxide layer, 0.1 μ β-(3,4 epoxycyclohexyl)ethyltrimethoxysilane layer
A layer of 2 μm of polymethacrylic nitrile was sequentially provided and evaluated by attaching it to the window of a mounting durability testing device.
この積層体は25日経過しても斑点状のシミが発
生しなかつた。 This laminate did not develop any speckled stains even after 25 days.
Claims (1)
膜層を含む選択透過膜を設け、成形物基盤との反
対側の該選択透過膜の上に中間層及び有機物系の
透明保護層を設けてなる積層体において、前記中
間層が次式 R1Si(OR2)3 〔ここにR1はビニル基、エポキシ基、アミノ基及
びメルカプト基のうちの少くとも1の基をもつ炭
素原子数10以下の有機基であり、R2はメチル
基、エチル基又はメトキシエチル基である。〕 で表わされる有機シラン化合物からなることを特
徴とする積層体。 2 ビニル基を含む有機シラン化合物からなる中
間層と熱開始剤により形成された透明保護層とよ
りなる特許請求範囲第1項記載の積層体。[Scope of Claims] 1. A selectively permeable membrane including a metal thin film layer is provided on at least one side of a transparent molded substrate, and an intermediate layer and an organic material are provided on the selectively permeable membrane on the opposite side to the molded substrate. In the laminate provided with a transparent protective layer, the intermediate layer has the following formula R 1 Si(OR 2 ) 3 [where R 1 is at least one group selected from a vinyl group, an epoxy group, an amino group, and a mercapto group. is an organic group having 10 or less carbon atoms, and R 2 is a methyl group, an ethyl group, or a methoxyethyl group. ] A laminate characterized by comprising an organic silane compound represented by: 2. A laminate according to claim 1, comprising an intermediate layer made of an organic silane compound containing a vinyl group and a transparent protective layer formed from a thermal initiator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12672279A JPS5651354A (en) | 1979-10-03 | 1979-10-03 | Laminate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12672279A JPS5651354A (en) | 1979-10-03 | 1979-10-03 | Laminate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5651354A JPS5651354A (en) | 1981-05-08 |
| JPS6134386B2 true JPS6134386B2 (en) | 1986-08-07 |
Family
ID=14942244
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12672279A Granted JPS5651354A (en) | 1979-10-03 | 1979-10-03 | Laminate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5651354A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090115060A1 (en) | 2007-11-01 | 2009-05-07 | Infineon Technologies Ag | Integrated circuit device and method |
| CN102975416B (en) * | 2012-12-05 | 2015-06-03 | 中山市创科科研技术服务有限公司 | High-oxidation-resistance energy-saving door and window base material |
-
1979
- 1979-10-03 JP JP12672279A patent/JPS5651354A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5651354A (en) | 1981-05-08 |
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