JPS6141159B2 - - Google Patents
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- Publication number
- JPS6141159B2 JPS6141159B2 JP16432581A JP16432581A JPS6141159B2 JP S6141159 B2 JPS6141159 B2 JP S6141159B2 JP 16432581 A JP16432581 A JP 16432581A JP 16432581 A JP16432581 A JP 16432581A JP S6141159 B2 JPS6141159 B2 JP S6141159B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- chamber
- liquid
- tank
- pair
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】
本発明は薄板状のプリント基板の端子部を効率
良くめつき処理する方法と其の装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for efficiently plating terminal portions of a thin printed circuit board.
従来は、電子部品であるプリント基板の端子部
を連続めつきする場合に於て、例えば硫酸ニツケ
ル又はスルフアミン酸ニツケルなどの処理液にて
めつきを行う処理槽内に配設する陽極としては、
チタンに白金コーテングを施したる処理液に対し
て不溶性金属が用いられる。 Conventionally, when continuously plating terminals of printed circuit boards, which are electronic components, the anode was placed in a processing tank in which plating was performed using a processing solution such as nickel sulfate or nickel sulfamate.
A metal that is insoluble in the treatment solution used is titanium coated with platinum.
ところで不溶性金属なる故、陽性の消耗は無い
が、当然めつき液中に溶解している金属イオンが
被処理物表面に金属となつて析出するので、金属
イオン濃度が低下し、其の結果めつき液の電気抵
抗は大となり電解効率が低下し被めつき金属の粒
子が粗となる等の不都合が生ずるので、めつき液
の金属イオン濃度の低下を防ぐため、同種の濃厚
液を補充して操業が行われて来た。本発明は以上
の不都合を解消するため、めつき槽に配設する陽
極として可溶性金属を採用することにより解決し
たものである。以下図面を参照しながら本発明の
方法と装置につき詳細に説明する。 By the way, since it is an insoluble metal, there is no positive consumption, but naturally the metal ions dissolved in the plating solution become metal and precipitate on the surface of the workpiece, so the metal ion concentration decreases, and as a result, The electrical resistance of the plating solution increases, causing problems such as a decrease in electrolytic efficiency and coarser particles of the plated metal.To prevent the metal ion concentration of the plating solution from decreasing, replenish the plating solution with a concentrated solution of the same type. Operations have been carried out. The present invention solves the above-mentioned problems by employing a soluble metal as the anode disposed in the plating tank. The method and apparatus of the present invention will be described in detail below with reference to the drawings.
第1図は薄板状の被処理物1を連続めつきする
装置の外観図で、従来法は被処理物の搬送給電手
段としてローラーで挾持給電するか、ブラシにて
挾持して給電していたが、図示は出願人が開発し
た挾持面に給電ワイヤー2aを埋め込んだ一対の
搬送ベルトにて被処理物を挾持して搬送する点を
異にした装置である。そして本発明は第1図に於
ては図示されてい無い被処理物が挾持搬送される
下方のめつき槽の改良に存する。なお説明上第1
図に付した矢印側を正面と称する。 Figure 1 is an external view of an apparatus for continuous plating of a thin plate-shaped workpiece 1. In the conventional method, power was supplied by holding the workpiece between rollers or brushes as a power supply means for transporting the workpiece. However, the apparatus shown in the figure is different in that the object to be processed is held and conveyed by a pair of conveyor belts that have a power supply wire 2a embedded in the holding surfaces developed by the applicant. The present invention resides in an improvement of the lower plating tank in which objects to be treated, which are not shown in FIG. 1, are held and conveyed. Please note that the first
The side indicated by the arrow in the figure is called the front.
第2図は搬送ベルト2の直下で搬送方向に細長
いめつき槽の断面を示す正面図であつて本発明の
要部である。図に於いて1は被処理物であるプリ
ント基板で、基板の下方はめつき処理を受ける基
板の端子部1aで、上方は基板を挾持して搬送す
る保持部によつて確実に密着押圧されている。そ
して保持部は基板1を挾持する外側面には給電ワ
イヤー2aを全周に埋め込んだ一対のゴム状の弾
性体よりなる搬送ベルト2よりなり、其の内側面
はガイド用支柱11により支承されてるベルトガ
イド3によつて支持されてるので一定位置を常に
保つことが出来る。なお基板を挾持する面を長手
方向中心面Cと称する。一対の搬送ベルト2はそ
れぞれエンドレスで常法により第1図の如くプー
リー18により張設されて回転し、被処理物1を
挾持搬送する。 FIG. 2 is a front view showing a cross section of a plating tank elongated in the conveying direction directly under the conveying belt 2, and is a main part of the present invention. In the figure, 1 is a printed circuit board which is an object to be processed.The lower part of the board is the terminal part 1a of the board to be subjected to the plating process, and the upper part is firmly pressed tightly by a holding part that holds and conveys the board. There is. The holding part is composed of a pair of conveyor belts 2 made of a rubber-like elastic body with a power supply wire 2a embedded all around the outer surface that holds the substrate 1, and the inner surface of the conveyor belt 2 is supported by a guide column 11. Since it is supported by the belt guide 3, it can always maintain a constant position. Note that the surface that holds the substrate is referred to as a longitudinal center surface C. Each of the pair of conveyor belts 2 is endless and rotates under tension by a pulley 18 as shown in FIG. 1 in a conventional manner, and grips and conveys the object 1 to be processed.
保持部即ち図で搬送ベルト2の下方には、正面
と背面にプリント基板の出入する図示を略したス
リツト状の切欠けを設けた細長のめつき槽6が配
設され、第2図は其の断面を示す正面図である。
めつき槽6は上段のめつき室6aと下段の密閉さ
れたるノズル室4とに区分され、ノズル室の上面
にはプリント基板端子部1aに向けてめつき液を
噴射するノズル5が中心面に対称に、搬送ベルト
2の進行方向に適当ピツチにて、図で左右両側に
設けられている。実施例ではノズル径2mm、ピツ
チ15mmのノズルであるが、代うるに同容量のスリ
ツトでも同一である。そしてノズル室4の下面に
は後述するポンプ及配管にて循環するめつき液が
圧送されるための開孔16が設けられている。め
つき室6a内には可溶性金属よりなる陽極10
が、複数個の陽極台座9上に、めつき室の正面よ
り背面に向けて左右対称、互に平行に横設されて
いる。そして陽極10の上端13はめつき室6a
の液面17より上方に突出している。又めつき室
6aの左右の側壁には液面調整堰12が設けら
れ、操業中常時めつき液がオーバーフローする如
く側壁内の液面17′より常に低くなつている。
なお実施例のめつき液は、硫酸ニツケル又はスル
フアミル酸ニツケルで、可溶性陽極としては金属
ニツケルが用いられている。 In the holding section, that is, below the conveyor belt 2 in the figure, there is disposed an elongated plating tank 6 having slit-like notches (not shown) on the front and back sides through which printed circuit boards enter and exit. It is a front view showing a cross section.
The plating tank 6 is divided into an upper plating chamber 6a and a lower sealed nozzle chamber 4. On the upper surface of the nozzle chamber, a nozzle 5 for spraying plating liquid toward the printed circuit board terminal portion 1a is located on the center surface. They are provided symmetrically at appropriate pitches in the traveling direction of the conveyor belt 2, on both the left and right sides in the figure. In the example, a nozzle with a nozzle diameter of 2 mm and a pitch of 15 mm is used, but a slit of the same capacity may be used instead. An opening 16 is provided on the lower surface of the nozzle chamber 4 through which a plating liquid circulated by a pump and piping described later is fed under pressure. Inside the plating chamber 6a is an anode 10 made of a soluble metal.
are placed horizontally on a plurality of anode pedestals 9, symmetrically and parallel to each other from the front to the back of the plating chamber. The upper end 13 of the anode 10 is fitted into the plating chamber 6a.
It protrudes above the liquid level 17 of. Liquid level adjusting weirs 12 are provided on the left and right side walls of the plating chamber 6a, and are always lower than the liquid level 17' in the side walls so that the plating liquid overflows during operation.
The plating solution used in the examples is nickel sulfate or nickel sulfamylate, and nickel metal is used as the soluble anode.
次に作動について概説すると、常法により搬送
用ベルト2を稼動させて、引続きめつき用電源を
通電し、プリント基板の端子即ちめつきすべき部
分1a以外は常法によりマスクテープを貼布し
て、めつき槽6の正面側で一対の搬送ベルト2に
挾持させると、めつき室6aのスリツト切欠(図
示省略)を通過してめつき室6a内に搬送され、
端子はめつき液に浸漬する。他方常法によりポン
プ14を稼動すると、めつき液管理槽8よりめつ
き液を吸引し、パイプ15を介してめつき液はノ
ズル室4内に圧入され、ノズル室内の圧送された
めつき液はノズル5より基板端子1aに向けて強
制的に噴射し、めつき室6a内のめつき液は矢印
の如く陽極10の下部を通り抜けて側壁の上縁よ
り流出する。図例では調整用堰12の上縁より流
出する。流出しためつき液はレシーブタンク7を
経て、排出管15′を介して前記管理槽8に戻
り、以後同様にめつき液は循環し、めつき処理が
完了したプリント基板1はめつき室6aの背面ス
リツト切欠きを抜け、更に搬送ベルトの挾持から
離脱する。 Next, to outline the operation, the conveyor belt 2 is operated in the usual way, the plating power is turned on, and mask tape is applied in the usual way except for the terminals of the printed circuit board, that is, the part 1a to be plated. When it is held between a pair of conveyor belts 2 on the front side of the plating tank 6, it passes through a slit notch (not shown) in the plating chamber 6a and is conveyed into the plating chamber 6a.
Immerse the terminals in the plating solution. On the other hand, when the pump 14 is operated in a conventional manner, the plating liquid is sucked from the plating liquid management tank 8, the plating liquid is pressurized into the nozzle chamber 4 through the pipe 15, and the plating liquid pumped into the nozzle chamber is The plating liquid is forcibly sprayed from the nozzle 5 toward the board terminal 1a, and the plating liquid in the plating chamber 6a passes through the lower part of the anode 10 as shown by the arrow and flows out from the upper edge of the side wall. In the illustrated example, the water flows out from the upper edge of the adjustment weir 12. The outflowing plating liquid passes through the receiving tank 7 and returns to the management tank 8 via the discharge pipe 15'. From then on, the plating liquid circulates in the same way, and the printed circuit board 1 that has been plated is placed in the plating chamber 6a. It passes through the back slit and then separates from the grip of the conveyor belt.
以上述べた如く本発明によれば、めつき処理す
る場合に、陽極として可溶性金属を使用してるの
で、めつき液よりの析出金属と同量の金属が陽極
10より溶出し金属イオン濃度は安定するので、
従来の如き濃厚液補充式と異り自動的に処理量と
同量の金属が補充されるので時間毎の液分析も必
要なく安定した製品の生産を可能とした生産性向
上に寄与するところ大である。 As described above, according to the present invention, since a soluble metal is used as the anode during plating treatment, the same amount of metal as the metal precipitated from the plating solution is eluted from the anode 10, and the metal ion concentration is stable. So,
Unlike the conventional concentrated liquid replenishment type, the metal is automatically replenished in the same amount as the amount processed, so there is no need for hourly liquid analysis, which greatly contributes to improved productivity by making stable product production possible. It is.
更に本装置によれば、弾性を有する搬送ベルト
にて確かとプリント基板を密着固定することが出
来、製品に損傷を与えることなく、端子部はノズ
ル噴射にて新規なめつき液と更新され、調整堰を
設けて、電極間内水位との差を大とすることによ
り液循環の流速を調整することも出来る。 Furthermore, according to this device, the printed circuit board can be securely fixed tightly using the elastic conveyor belt, and the terminal area can be updated with new licking liquid by spraying from the nozzle without damaging the product. The flow rate of liquid circulation can also be adjusted by providing a weir and increasing the difference between the water level and the water level between the electrodes.
又明細書及び図面に示すとおり、有機的な本願
構成により、噴射ノズルより噴出後の液循環は、
めつき室の中心に向けて上昇し、再び降下し、室
底を経て再び上昇し側壁よりオーバーフローする
ので、めつき液は均一となり、めつき能力及びめ
つき品質ともに格段の向上を達成することが出来
る。 Furthermore, as shown in the specification and drawings, due to the organic structure of the present application, the liquid circulation after being ejected from the injection nozzle is as follows:
Since the plating liquid rises toward the center of the plating chamber, descends again, rises again through the bottom of the chamber, and overflows from the side wall, the plating liquid becomes uniform, achieving a marked improvement in both plating ability and plating quality. I can do it.
第1図は薄板状の被処理物を挾持搬送して連続
めつきする装置の外観図、第2図は本発明の要部
で細長いめつき槽の断面を示す正面図で、第1図
の〜に沿つた縦断面である。
1……薄板状被処理物(プリント基板)、1a
……被めつき部(端子部)、2……搬送用ベル
ト、2a……給電部(ワイヤー)、4……密閉ノ
ズル室、5……ノズル、6……めつき槽、6a…
…めつき室、10……陽極、13……上端、1
7,17′……液面、C……中心面。
Fig. 1 is an external view of an apparatus for continuous plating by holding and conveying a thin plate-shaped workpiece, and Fig. 2 is a front view showing a cross section of an elongated plating tank, which is the main part of the present invention. It is a longitudinal section along ~. 1... Thin plate-shaped object to be processed (printed circuit board), 1a
... Plated part (terminal part), 2 ... Conveyor belt, 2a ... Power supply part (wire), 4 ... Closed nozzle chamber, 5 ... Nozzle, 6 ... Plating tank, 6a ...
...Plating chamber, 10...Anode, 13...Top end, 1
7, 17'...Liquid level, C...Center plane.
Claims (1)
理液中に溶解している金属と同一金属よりなる板
状の可溶性金属を採用し、 左右一対の前記陽極板を、複数個の台座等を介
してめつき室6aの底面に定置することで、底面
上にめつき液流路を形成して、めつき槽長手方向
に堰状に配設し、 外側面に給電ワイヤーを埋め込んだ一対のエン
ドレス搬送ベルトにて被処理物をめつき槽上にて
密着挟持して、前記被処理物の下端被めつき部分
を前記一対の陽極間中心面Cを搬送せしめ、 他方めつき室6aの底面中央を逆W字状に形成
し、その一対のV形頂部斜面より、それぞれ約45
゜の角度にてめつき液を噴出して被めつき部分1
aの両面をめつき処理して、めつき室6aの左右
上端の液面調節堰よりめつき液を排出するプリン
ト基板端子部の連続めつき方法。 2 薄板状被処理物1の被めつき部1aの上部を
保持して搬送する挟持面に、給電部を有する一対
のエンドレス搬送ベルトにて被処理物を垂下搬送
する保持部を備えた搬送装置を配設し、 搬送装置の下方で、搬送ベルトの進行方向に正
面及び背面に薄板状被処理物出入用のスリツト状
開口を有する細長のめつき槽6を配設し、 前記めつき槽は、下段の密閉ノズル室と上段の
めつき室に区分し、ノズル室4の上表面中央に2
列の山形を形成し、其の中心側斜面頂部より45゜
の角度にてめつき液を噴出し、 他方めつき室6aの底面には、中心面と対称に
底面と間隔を保持して、めつき液と同一金属イオ
ンを溶出する可溶性板状の左右一対の陽極をめつ
き液面17上に突出せしめて堰状に配設し、 めつき装置を稼動して、めつき液面より低い槽
側壁より流出しためつき液を其の外周に設けたレ
シーブタンク7を介してポンプ配管にて循環し、
ノズル室に圧送し、ノズルより噴射してめつき処
理するプリント基板端子部の連続めつき装置。[Claims] 1. In a continuous plating device, a plate-shaped soluble metal made of the same metal as the metal dissolved in the plating processing solution is used as an anode, and a pair of left and right anode plates, By placing it on the bottom surface of the plating chamber 6a via a plurality of pedestals, a plating liquid flow path is formed on the bottom surface, and the plating liquid is arranged like a weir in the longitudinal direction of the plating tank, and power is supplied to the outer surface. A pair of endless conveyor belts embedded with wires tightly sandwich the workpiece on the plating tank, and transport the lower end covered part of the workpiece over the center plane C between the pair of anodes, and the other The center of the bottom of the plating chamber 6a is formed into an inverted W-shape, and from the pair of V-shaped top slopes, each approximately 45 mm
Spout the plating liquid at an angle of ゜ to cover the covered part 1.
A continuous plating method for printed circuit board terminals, in which both sides of a are plated and the plating liquid is discharged from liquid level adjustment weirs at the upper left and right ends of the plating chamber 6a. 2. A conveying device that includes a holding section that suspends and conveys the object to be processed using a pair of endless conveyor belts that have a power supply section on a holding surface that holds and conveys the upper part of the plated portion 1a of the thin plate-like object 1. An elongated plating tank 6 having slit-like openings on the front and back sides for entering and exiting the thin plate-like material to be processed is arranged below the transport device in the direction of travel of the transport belt, and the plating tank is The nozzle chamber 4 is divided into a sealed nozzle chamber at the bottom and a plating chamber at the top.
The plating liquid is spouted at an angle of 45 degrees from the top of the slope on the center side, and on the bottom of the plating chamber 6a, a space is maintained between the bottom and the bottom symmetrically with the center plane. A pair of left and right soluble plate-shaped anodes that elute the same metal ions as the plating solution are arranged in a weir shape so as to protrude above the plating solution level 17, and the plating device is operated to lower the anode level below the plating solution level. The tamping liquid flowing out from the side wall of the tank is circulated through a pump piping via a receive tank 7 provided on its outer periphery.
A continuous plating device for printed circuit board terminals that pressure feeds into the nozzle chamber and sprays it from the nozzle to process the plating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16432581A JPS5866392A (en) | 1981-10-16 | 1981-10-16 | Method and device for continuously plating printed board terminal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16432581A JPS5866392A (en) | 1981-10-16 | 1981-10-16 | Method and device for continuously plating printed board terminal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5866392A JPS5866392A (en) | 1983-04-20 |
| JPS6141159B2 true JPS6141159B2 (en) | 1986-09-12 |
Family
ID=15791011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16432581A Granted JPS5866392A (en) | 1981-10-16 | 1981-10-16 | Method and device for continuously plating printed board terminal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5866392A (en) |
-
1981
- 1981-10-16 JP JP16432581A patent/JPS5866392A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5866392A (en) | 1983-04-20 |
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