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JPS6143794B2 - - Google Patents
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JPS6143794B2 - - Google Patents

Info

Publication number
JPS6143794B2
JPS6143794B2 JP54055209A JP5520979A JPS6143794B2 JP S6143794 B2 JPS6143794 B2 JP S6143794B2 JP 54055209 A JP54055209 A JP 54055209A JP 5520979 A JP5520979 A JP 5520979A JP S6143794 B2 JPS6143794 B2 JP S6143794B2
Authority
JP
Japan
Prior art keywords
magnetic
pattern
bubbles
bubble
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54055209A
Other languages
Japanese (ja)
Other versions
JPS55150184A (en
Inventor
Mikio Segawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5520979A priority Critical patent/JPS55150184A/en
Publication of JPS55150184A publication Critical patent/JPS55150184A/en
Publication of JPS6143794B2 publication Critical patent/JPS6143794B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は磁気バブルメモリ装置に関し特にその
磁気バブルメモリチツプの改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to magnetic bubble memory devices, and more particularly to improvements in magnetic bubble memory chips.

一般に磁性薄膜は面内方向に磁区の磁化容易軸
を持つているが、ある種の磁性材料、例えばオル
ソフエライトや磁性ガーネツト等の単結晶はC軸
方向にのみ磁化容易軸を有する強い1軸異方性を
もつている。このような材料をC軸に垂直な面を
もつ薄膜とした場合、外部から磁界を加えないと
きには第1図aに示すように上向きの磁化方向の
磁区と下向きの磁区とがほぼ等面積で縞状に交互
に入り交つた状態になつている。この薄膜に下向
きのバイアス磁界HBを加えて行くと上向きの磁
区は減り、下向きの磁区が広がつて第1図bのよ
うな状態を経て遂には第1図cに示すように上向
きの磁区は直径数μmの小さな円柱状になる。こ
の円柱状の磁区を磁気バブルドメインという。ま
た第1図cの状態からさらにバイアス磁界を強く
して行くと磁気バブルドメインはある半径から突
然つぶれて消失してしまう。この状態から新しく
磁気バブルドメインを作るには局部的にバイアス
磁界と反対方向に数千Oeのパルス状の磁界をか
けなければならない。この磁界をニユークリエー
シヨン磁界(HN)という。
Generally, a magnetic thin film has an easy axis of magnetization of the magnetic domain in the in-plane direction, but certain magnetic materials, such as single crystals such as orthoferrite and magnetic garnet, have a strong uniaxial anisotropy that has an easy axis of magnetization only in the C-axis direction. It has directionality. When such a material is made into a thin film with a surface perpendicular to the C-axis, when no external magnetic field is applied, the upward magnetization direction and the downward magnetization direction form stripes with approximately equal areas, as shown in Figure 1a. They are in a state of alternating patterns. When a downward bias magnetic field H B is applied to this thin film, the number of upward magnetic domains decreases, the downward magnetic domains expand, and after passing through the state shown in Figure 1b, the upward magnetic domains finally form as shown in Figure 1c. becomes a small cylinder with a diameter of several μm. This cylindrical magnetic domain is called a magnetic bubble domain. Moreover, if the bias magnetic field is further strengthened from the state shown in FIG. 1c, the magnetic bubble domain suddenly collapses and disappears from a certain radius. To create a new magnetic bubble domain from this state, it is necessary to locally apply a pulsed magnetic field of several thousand Oe in the opposite direction to the bias magnetic field. This magnetic field is called a nucleation magnetic field (H N ).

磁気バブルメモリ装置はこの磁気バブルドメイ
ンを磁界により磁性薄膜内を自由に動かすことが
できることを利用したもので、基板上にパーマロ
イ薄膜で第2図aに示す如きテイーバー、あるい
は第2図bに示す如きハーフデイスクなどのパタ
ーンを行列させた伝播路を形成しておき磁気バブ
ルのあるところを“1”、ないところを“0”と
して情報を記憶するようになつている。従つて磁
気バブルは記憶すべき情報に従つて発生させる必
要がある。第3図はバブル発生器の1つであるニ
ユークリエーシヨン型バブル発生器を示したもの
で、局部的磁界を発生させる導体パターン1とつ
るはし状のパーマロイパターンとを組合せたもの
である。このバブル発生器は導体パターン1にパ
ルス状電流を流しバイアス磁界と反対方向の磁界
を生じさせてバブル3を発生させるのである。と
ころがこのニユークリエーシヨン型発生器でバブ
ルを発生させる場合、温度の上昇に伴つてニユー
クリエーシヨン磁界(HN)が下りバブルが発生
し易くなり、時によつては2個発生したり、ある
いは導体パターンに沿つた所にもバブル4が発生
することがある。このようなバブルが伝播路に混
入すると情報が乱れバブルメモリ動作の信頼性に
大きな悪影響を与えることになる。本発明はこの
欠点を改良するために案出されたものである。
The magnetic bubble memory device utilizes the fact that this magnetic bubble domain can be moved freely within a magnetic thin film by a magnetic field, and is made by forming a Permalloy thin film on a substrate using a Taber as shown in Figure 2a or a Taber as shown in Figure 2b. A propagation path is formed by forming a matrix of patterns such as half disks, and information is stored as "1" where there is a magnetic bubble and "0" where there is no magnetic bubble. Therefore, magnetic bubbles must be generated according to the information to be stored. FIG. 3 shows a nucleation type bubble generator, which is one type of bubble generator, and is a combination of a conductor pattern 1 for generating a local magnetic field and a pickaxe-shaped permalloy pattern. This bubble generator generates bubbles 3 by passing a pulsed current through the conductor pattern 1 to generate a magnetic field in the opposite direction to the bias magnetic field. However, when generating bubbles with this nucleation type generator, as the temperature rises, the nucleation magnetic field (H N ) decreases, making it easier to generate bubbles, and sometimes two bubbles are generated, or even if the conductor Bubbles 4 may also occur along the pattern. If such bubbles enter the propagation path, information will be disturbed and the reliability of the bubble memory operation will be greatly affected. The present invention has been devised to improve this drawback.

このため本発明においては、1軸異方性をもつ
磁性材料にて基板を形成し、その上に磁気バブル
発生器、分割器、伝播路、検出器等のパターンを
薄膜金属により形成したチツプを具備する磁気バ
ブルメモリ装置において、前記チツプには少なく
とも不要バブルの侵出、又は侵入を許容しない部
分の周囲に、前記基板の結晶に対して歪力を与え
て不要バブルをせき止めるバリアが形成されてい
ることを特徴とするものである。
For this reason, in the present invention, a chip is formed by forming a substrate from a magnetic material with uniaxial anisotropy, and on which patterns such as a magnetic bubble generator, a divider, a propagation path, a detector, etc. are formed from a thin film metal. In the magnetic bubble memory device, a barrier is formed in the chip at least around a portion that does not allow the leakage or intrusion of unnecessary bubbles by applying a strain force to the crystal of the substrate to block unnecessary bubbles. It is characterized by the presence of

以下、添付図面に基づいて本発明の実施例につ
き詳細に説明する。
Hereinafter, embodiments of the present invention will be described in detail based on the accompanying drawings.

一般に磁気バブルメモリに用いられるオルソフ
エライト等の磁性薄膜は歪に対し敏感であり、導
体パターンの歪のためにパターンのふちでバブル
が捕捉されることが知られている。本発明はこの
結晶の歪を利用して不要バブルの通過を防ぐため
のバリアとするのである。磁性薄膜に歪を与える
には磁性薄膜と熱膨張係数が大きく異なる材料で
生膜するか、あるいは基板を高温度にしてパター
ンを形成する方法が用いられる。また膜厚やパタ
ーン幅を変えることによつても歪の大きさを変え
ることができる。
Generally, magnetic thin films such as orthoferrite used in magnetic bubble memories are sensitive to strain, and it is known that bubbles are trapped at the edges of the pattern due to strain in the conductor pattern. The present invention utilizes the distortion of this crystal to create a barrier to prevent unnecessary bubbles from passing through. To impart strain to a magnetic thin film, a method is used in which a raw film is formed using a material with a coefficient of thermal expansion significantly different from that of the magnetic thin film, or a method is used in which a pattern is formed by heating the substrate to a high temperature. The magnitude of distortion can also be changed by changing the film thickness or pattern width.

実施例として熱膨張係数の大きなアルミニウム
パターンをニユークリエーシヨン型磁気バブル発
生器の周囲に配置したチツプの平面図を第4図に
示し、その−線における断面を第5図に示
す。図において5は基板、6は磁気バブル発生器
用の導体パターン、7は磁気バブル発生器用のパ
ーマロイパターン、8は伝播路用パーマロイパタ
ーンであり、9が本発明の要点であるバリアとし
て形成されたアルミニウムのパターンであつてバ
ブル発生器の導体パターンの周囲をかこむように
して基板5の上に直接形成されている。なお1
0,11,12,13はSiO2又はSiOを用いた絶
縁層である。
As an example, a plan view of a chip in which an aluminum pattern having a large coefficient of thermal expansion is arranged around a nucleation type magnetic bubble generator is shown in FIG. 4, and a cross section taken along the - line is shown in FIG. In the figure, 5 is a substrate, 6 is a conductor pattern for a magnetic bubble generator, 7 is a permalloy pattern for a magnetic bubble generator, 8 is a permalloy pattern for a propagation path, and 9 is an aluminum plate formed as a barrier, which is the main point of the present invention. This pattern is formed directly on the substrate 5 so as to surround the conductor pattern of the bubble generator. Note 1
0, 11, 12, and 13 are insulating layers using SiO 2 or SiO.

このように形成されたチツプにおいて、バブル
発生器の導体パターン6に通電されると正規のバ
ブル14の他に余剰のバブル15が発生すること
がある。この余剰バブル15はメモリの動作中に
動き出して移動するが、アルミニウムパターン9
は熱膨張係数の大きいこと、直接基板に形成され
ているため基板5に大きな歪を与えており、その
ため前記の余剰バルブ15はアルミニウムパター
ン9の外に出ることはできない。従つて伝播路へ
の不要バブルの流入は防止されることになる。
In a chip formed in this manner, when the conductor pattern 6 of the bubble generator is energized, extra bubbles 15 may be generated in addition to the regular bubbles 14. This surplus bubble 15 starts to move and move during the operation of the memory, but the aluminum pattern 9
has a large coefficient of thermal expansion and is formed directly on the substrate, giving a large strain to the substrate 5. Therefore, the surplus bulb 15 cannot come out of the aluminum pattern 9. Therefore, unnecessary bubbles are prevented from flowing into the propagation path.

このようにしてバルブ発生器や分割器あるいは
その導体の隅部などのパターンが混み入つている
ところから発生する不要バブル、又は低バイアス
時のバブルのからまり等による伝播路からのはみ
出しなども抑制することができる。
In this way, unnecessary bubbles generated from crowded patterns such as corners of valve generators, dividers, or their conductors, and bubbles protruding from the propagation path due to entanglement at low bias are also suppressed. can do.

第6図はMo/Au/Mo(厚さ150/2500/150
Å)とAl−Cu(厚さ2800Å)のパターンによる
バブルの拘束力を示したものである。図の縦軸に
は拘束力をとり横軸の左方にはMo/Au/Moを
丸印により、右方にAl−Cuを×印によりプロツ
トした。なお拘束力は、拘束力=(パターン下の
バブル通過最小磁場勾配)−(自由バブル移動最小
磁場勾配)で示し、パターンの蒸着時の基板温度
はMo/Au/Moが250/80/80℃で、Al−Cuが
150゜である。図により熱膨張係数の大きいAl−
Cuの方が拘束力の大なることがわかる。
Figure 6 shows Mo/Au/Mo (thickness 150/2500/150
This figure shows the bubble restraining force due to the pattern of Al-Cu (2800 Å thick) and Al-Cu (2800 Å thick). The vertical axis of the figure represents the restraining force, and the left side of the horizontal axis plots Mo/Au/Mo with circles, and the right side plots Al-Cu with x marks. The restraint force is expressed as: restraint force = (minimum magnetic field gradient for passing bubbles under the pattern) - (minimum magnetic field gradient for free bubble movement), and the substrate temperature during pattern deposition is 250/80/80°C for Mo/Au/Mo. So, Al−Cu
It is 150°. As shown in the figure, Al− has a large coefficient of thermal expansion.
It can be seen that Cu has a greater binding force.

以上説明した如く本発明は基板の上に基板に歪
を与えたパターンを形成することにより不要バブ
ルの通過を阻止してメモリとしての誤動作を防止
して磁気バブルメモリの信頼性を向上したもので
ある。
As explained above, the present invention improves the reliability of the magnetic bubble memory by forming a pattern on the substrate that distorts the substrate, thereby blocking the passage of unnecessary bubbles and preventing malfunction of the memory. be.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は磁気バブル発生の原理図、第2図は磁
気バブル伝播パターンの平面図、第3図は磁気バ
ブル発生器の平面図、第4図は本発明にかかる実
施例の磁気バブルメモリ装置のチツプの一部拡大
平面図、第5図はそのV−V線における断面図、
第6図はパターンのバブル拘束力を示したグラフ
図である。 5……基板、6……磁気バブル発生器の導体パ
ターン、7……磁気バブル発生器のパーマロイパ
ターン、8……伝播路用パターン、9……アルミ
ニウムパターン、15……不要バブル。
FIG. 1 is a diagram of the principle of magnetic bubble generation, FIG. 2 is a plan view of a magnetic bubble propagation pattern, FIG. 3 is a plan view of a magnetic bubble generator, and FIG. 4 is a magnetic bubble memory device according to an embodiment of the present invention. FIG. 5 is a partially enlarged plan view of the chip, and FIG. 5 is a cross-sectional view taken along the line V-V.
FIG. 6 is a graph showing the bubble restraining force of the pattern. 5... Substrate, 6... Conductor pattern of magnetic bubble generator, 7... Permalloy pattern of magnetic bubble generator, 8... Pattern for propagation path, 9... Aluminum pattern, 15... Unnecessary bubble.

Claims (1)

【特許請求の範囲】[Claims] 1 強い1軸異方性をもつ磁性材料にて基板を形
成し、その上に磁気バブル発生器、分割器、伝播
路、検出器等のパターンを薄膜金属により形成し
たチツプを具備する磁気バブルメモリ装置におい
て、前記チツプには少なくとも不要バブルの侵出
又は侵入を許容しない部分の周囲に、前記基板の
結晶に対して歪力を与えて不要バブルをせき止め
るバリアが形成されていることを特徴とする磁気
バブルメモリ装置。
1. A magnetic bubble memory comprising a substrate made of a magnetic material with strong uniaxial anisotropy and a chip on which patterns such as a magnetic bubble generator, divider, propagation path, detector, etc. are formed using thin film metal. The device is characterized in that the chip is provided with a barrier that applies strain to the crystals of the substrate and dams up unnecessary bubbles, at least around a portion that does not allow the leakage or intrusion of unnecessary bubbles. Magnetic bubble memory device.
JP5520979A 1979-05-08 1979-05-08 Magnetic bubble memory device Granted JPS55150184A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5520979A JPS55150184A (en) 1979-05-08 1979-05-08 Magnetic bubble memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5520979A JPS55150184A (en) 1979-05-08 1979-05-08 Magnetic bubble memory device

Publications (2)

Publication Number Publication Date
JPS55150184A JPS55150184A (en) 1980-11-21
JPS6143794B2 true JPS6143794B2 (en) 1986-09-30

Family

ID=12992245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5520979A Granted JPS55150184A (en) 1979-05-08 1979-05-08 Magnetic bubble memory device

Country Status (1)

Country Link
JP (1) JPS55150184A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53107241A (en) * 1977-03-02 1978-09-19 Hitachi Ltd Magnetic bubble memory unit
JPS544535A (en) * 1977-06-13 1979-01-13 Nec Corp Magnetic bubble memory device
JPS546430A (en) * 1977-06-16 1979-01-18 Nec Corp Magnetic bubble memory device

Also Published As

Publication number Publication date
JPS55150184A (en) 1980-11-21

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