JPS6148796B2 - - Google Patents
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- Publication number
- JPS6148796B2 JPS6148796B2 JP55087255A JP8725580A JPS6148796B2 JP S6148796 B2 JPS6148796 B2 JP S6148796B2 JP 55087255 A JP55087255 A JP 55087255A JP 8725580 A JP8725580 A JP 8725580A JP S6148796 B2 JPS6148796 B2 JP S6148796B2
- Authority
- JP
- Japan
- Prior art keywords
- elements
- film
- electrode
- photovoltaic device
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/30—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
- H10F19/31—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
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- Photovoltaic Devices (AREA)
Description
【発明の詳細な説明】
本発明は、光起電力装置、特に基板上で多数個
の光起電力素子を直列接続した光起電力装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photovoltaic device, and particularly to a photovoltaic device in which a large number of photovoltaic elements are connected in series on a substrate.
半導体材料のpn接合を用いた1つの光起電力
素子の光起電圧は0.3〜1.0V程度と小さく、時
計、電卓などの装置を駆動させるためには、これ
らの素子を多数個直列接続した光起電力装置を用
いる必要がある。 The photovoltaic voltage of a single photovoltaic element using a pn junction of semiconductor material is small at about 0.3 to 1.0V, and in order to drive devices such as watches and calculators, a large number of these elements are connected in series. It is necessary to use an electromotive force device.
従来、この目的のために用いられてきた光起電
力装置の構造を第1図に示す。pn接合を形成し
たシリコン単結晶を所望の形状に切断、分割した
素子1を、銅箔2にて配線をしたプリント基板3
上に固定し、シリコン単結晶素子の上部櫛形電極
4と隣接する素子の銅箔2とをボンデイング法や
半田付けにてリード線5で接続する。この工程を
繰返すことにより多数個のシリコン単結晶素子を
直列接続した光起電力装置を得ていた。しかしな
がら、この装置の製造時には、各シリコン単結晶
素子の切断、プリント基板3への各素子の固定、
さらに個々の素子をリード線5により接続する必
要があり、多くの労力と時間を必要としコストの
高いものとなつていた。 The structure of a photovoltaic device conventionally used for this purpose is shown in FIG. A printed circuit board 3 in which a silicon single crystal with a pn junction formed thereon is cut and divided into desired shapes, and an element 1 is wired with copper foil 2.
The upper comb-shaped electrode 4 of the silicon single crystal element is connected to the copper foil 2 of the adjacent element using lead wires 5 by bonding or soldering. By repeating this process, a photovoltaic device in which a large number of silicon single crystal elements were connected in series was obtained. However, when manufacturing this device, cutting each silicon single crystal element, fixing each element to the printed circuit board 3,
Furthermore, it is necessary to connect the individual elements using lead wires 5, which requires a lot of labor and time, resulting in high costs.
一方、薄膜半導体を用いた光起電力装置の従来
の構造を第2図に示す。In2O3やSnO3膜のような
透明電極6を所望のパターンに形成したガラスな
ど透明基板7上に、蒸着法や気相成長法などでn
形半導体物質8を素子相互で分離したパターンで
形成し、その上に同じく素子相互で分離したパタ
ーンでp形半導体9を形成し、複数個の独立した
pn接合を形成する。この複数個の素子を直列接
続するため、p形半導体9とオーミツク接触する
金属10を蒸着法で形成し、これによつて透明電
極6とp形半導体9とをそれぞれ接続する。この
場合、各素子で電極10とn形半導体8とは接触
してはならず、p形半導体9と透明電極6も触れ
てはならない。これはpn接合が短絡するのを防
ぐために必要なことで、第2図に示すように透明
基板に近い素子構成物質をその上に形成する物質
で素子構成上必要な部品を覆うようなかたちで
次々形成してゆく必要がある。そして最終段階と
してp形半導体電極10にて素子相互を直列に接
続することで光起電力装置を作成することができ
る。まさ、直列接続した素子間でも、例えば、透
明電極6とその隣りの素子のn形半導体8とは接
触してはならず、p形半導体9とその隣り素子の
p形半導体電極10とも接触してはならない。こ
れは、各素子間を直列接続するようには働らか
ず、並列接続として働くためである。以上のよう
に、薄膜半導体を用いた光起電力装置では、素子
相互の狭い空間に多くの層を次々に位置をづらし
て短絡しないように形成する必要を生じ、光起電
力素子群を1つの基板上に形成する場合、各構成
物質形成時のパターン形成マスクの位置合せが重
要となるこの作業に人手と時間を必要とする。ま
た、このような分割された構造は、素子相互の光
電変換動作を分離するとともに直列接続するため
に必要なことであるが、素子間の領域は素子の光
電変換効果を生じる面積としては役立たず、有効
に働く受光面積を減少させることになる。電卓や
時計などに組込んだ場合、光のあたる面積の中に
上述のような部分があると有効発電量が減少する
という欠点を発生する。 On the other hand, a conventional structure of a photovoltaic device using a thin film semiconductor is shown in FIG. On a transparent substrate 7 such as glass, on which a transparent electrode 6 such as In 2 O 3 or SnO 3 film is formed in a desired pattern, n is deposited by vapor deposition or vapor phase growth.
A p-type semiconductor material 8 is formed in a pattern in which the elements are separated from each other, and a p-type semiconductor material 9 is formed thereon in a pattern in which the elements are also separated from each other, so that a plurality of independent
Forms a pn junction. In order to connect the plurality of elements in series, a metal 10 that is in ohmic contact with the p-type semiconductor 9 is formed by vapor deposition, thereby connecting the transparent electrode 6 and the p-type semiconductor 9, respectively. In this case, the electrode 10 and the n-type semiconductor 8 of each element must not be in contact with each other, and the p-type semiconductor 9 and the transparent electrode 6 must not be in contact with each other. This is necessary to prevent short-circuiting of the pn junction, and as shown in Figure 2, the device component material close to the transparent substrate is formed on top of the material to cover the components necessary for the device configuration. It is necessary to form one after another. As a final step, the elements are connected in series using the p-type semiconductor electrode 10 to produce a photovoltaic device. Indeed, even between elements connected in series, for example, the transparent electrode 6 and the n-type semiconductor 8 of the adjacent element must not come into contact, and the p-type semiconductor 9 and the p-type semiconductor electrode 10 of the adjacent element must not come into contact. must not. This is because each element does not work as a series connection, but works as a parallel connection. As described above, in a photovoltaic device using a thin film semiconductor, it is necessary to form many layers in a narrow space between the elements one after another by shifting their positions to avoid short circuits. When forming on a substrate, alignment of pattern forming masks when forming each constituent material is important, and this operation requires manpower and time. In addition, such a divided structure is necessary for separating the photoelectric conversion operations of the elements and for connecting them in series, but the area between the elements is not useful as an area for producing the photoelectric conversion effect of the elements. , the effective light-receiving area will be reduced. When incorporated into a calculator, watch, etc., if such a portion is present in the area exposed to light, the effective power generation amount will be reduced.
本発明はこのような欠点を改善するためになさ
れたもので、複数の第一の膜と、この第一の膜に
共通に設けられる第二の膜とにより、製造工程が
簡略化され、有効受光面積が増加する光起電力装
置を提供することを目的とする。 The present invention has been made to improve these drawbacks, and the manufacturing process is simplified and made more effective by using a plurality of first films and a second film provided in common with the first films. It is an object of the present invention to provide a photovoltaic device with an increased light-receiving area.
以下に図面を用いて本発明を実施例とともに説
明する。 The present invention will be explained below along with examples using the drawings.
第3図a,bは本発明の光起電力装置の一実施
例を示す構造断面図および平面図である。 FIGS. 3a and 3b are a structural sectional view and a plan view showing an embodiment of the photovoltaic device of the present invention.
まず、ガラス基板11上にスクリーン印刷法で
0.1mol%Ga添加のCdS粉末に10wt%のCdCl2を添
加したCdSペーストを用いてパターン状のCdS層
12を形成する。これをアルミナ製のボートに入
れベルト式コンベア炉で690℃の焼成温度で約1
時間焼成する。このようにして得られたCdS膜
は、膜厚約25μm、結晶粒径10〜15μm、膜の横
方向の比抵抗約0.5Ω・cmでn形半導体である。
このパターン状のCdS層12上にスクリーン印刷
法で帯状のCdTe層13を形成する。CdTe層1
3には6w%のCdCl2が添加されており上述のCdS
層12と同じ方法で焼成を行う。この場合、焼成
温度680℃で焼成時間は約20分である。このよう
にして得られたCdTe層13は、膜厚15〜20μ
m、結晶粒径8〜10μm、膜の横方向の比抵抗約
103Ω・cmでp形半導体である。この帯状のCdTe
層13とパターン状のCdS層12とが接触してい
る部分がpn接合で光起電力効果を発生するとこ
ろとなる。このCdTe層13上にカーボンペース
トを所定のパターンに印刷し、250℃の温度で20
分間の熱処理を行い、パターン状の各CdS層12
に対応するようにカーボン電極14を形成する。
このカーボン電極14とCdS層12を接続するた
め、各光起電力素子の端部間にIn電極15を蒸着
してカーボン電極14の基板11上に位置する部
分とCdTe層13に覆われていないCdS層12の
一部とを接続し、CdS/CdTe光起電力素子を直
列接続した光起電力装置を製造する。この場合
CdS層12は電極層の働きも行つている。p型
CdTe層13側電極としては、Cu2Te/Au、Niな
どオーミツク電極として働くものであれば何でも
よく、一方CdS層12側の電極としてもIn粉末を
添加したAgペーストのような印刷により形成さ
れるオーミツク電極でもよい。 First, by screen printing on the glass substrate 11.
A patterned CdS layer 12 is formed using a CdS paste made by adding 10 wt% CdCl 2 to CdS powder containing 0.1 mol% Ga. This is placed in an alumina boat and fired in a belt conveyor furnace at a temperature of 690°C for approximately 1 hour.
Bake for an hour. The CdS film thus obtained is an n-type semiconductor with a film thickness of approximately 25 μm, a crystal grain size of 10 to 15 μm, and a specific resistance of approximately 0.5 Ω·cm in the lateral direction of the film.
A strip-shaped CdTe layer 13 is formed on this patterned CdS layer 12 by screen printing. CdTe layer 1
3 has 6w% CdCl 2 added and is similar to the CdS mentioned above.
Firing is carried out in the same manner as layer 12. In this case, the firing temperature is 680°C and the firing time is about 20 minutes. The CdTe layer 13 obtained in this way has a thickness of 15 to 20 μm.
m, crystal grain size 8-10μm, lateral specific resistance of the film approx.
It is a p-type semiconductor with a resistance of 10 3 Ω・cm. This band-shaped CdTe
The part where the layer 13 and the patterned CdS layer 12 are in contact is a pn junction and is where a photovoltaic effect is generated. Carbon paste was printed in a predetermined pattern on this CdTe layer 13, and
After heat treatment for 1 minute, each patterned CdS layer 12
The carbon electrode 14 is formed to correspond to the above.
In order to connect this carbon electrode 14 and the CdS layer 12, an In electrode 15 is deposited between the ends of each photovoltaic element to connect the part of the carbon electrode 14 located on the substrate 11 and the part not covered by the CdTe layer 13. A photovoltaic device in which CdS/CdTe photovoltaic elements are connected in series is manufactured by connecting a part of the CdS layer 12. in this case
The CdS layer 12 also functions as an electrode layer. p-type
The electrode on the CdTe layer 13 side may be made of any material such as Cu 2 Te/Au, Ni, etc. as long as it works as an ohmic electrode.On the other hand, the electrode on the CdS layer 12 side may be formed by printing such as Ag paste added with In powder. An ohmic electrode may also be used.
上述の方法で、受光面積約1cm2のCdS/CdTe
光起電力素子を8個直列に接続した光起電力装置
を製造したところ、この装置の特性は、500ルツ
クスの白色螢光灯下で開放端電圧3.4〜4.0V、短
絡電流25〜35μA、最大電力60〜80μWを得るこ
とができた。こ値は同様の方法で製造した第2図
に示した構造の光起電力装置の特性とほとんど変
らず、CdTe層13を帯状に形成することによる
特性への悪影響はなかつた。 Using the method described above, CdS/CdTe with a light-receiving area of approximately 1 cm 2 was
We manufactured a photovoltaic device with eight photovoltaic elements connected in series, and the characteristics of this device were: open circuit voltage 3.4 to 4.0 V, short circuit current 25 to 35 μA, maximum under 500 lux white fluorescent light. It was possible to obtain a power of 60 to 80 μW. This value was almost the same as the characteristics of a photovoltaic device having the structure shown in FIG. 2 manufactured by a similar method, and the characteristics were not adversely affected by forming the CdTe layer 13 in a band shape.
この理由を説明するため、第3図a,bの光起
電力装置を簡単化して第4図のように2つの光起
電力素子より構成されている場合について考え
る。 To explain the reason for this, consider a case in which the photovoltaic device shown in FIGS. 3a and 3b is simplified and consists of two photovoltaic elements as shown in FIG. 4.
まず素子Aの厚み方向、即ちCdS層12と対向
するカーボン電極14との間の抵抗分をR1と
し、素子AのCdS層12と素子Bのカーボン電極
14間で生じる横方向の抵抗分をR2とする。そ
してカーボン電極の寸法はω×lであり、CdS層
12間の間隔をt2、CdTe層13の膜厚をt1とす
る。上述の出力特性を得た素子のω、l、t1、t2
の値はそれぞれ、1.6cm、0.6cm、20μm、0.5mmで
ある。今CdTe層13の比抵抗を縦方向、横方向
とも同じ値のρであるとする。 First, let R 1 be the resistance in the thickness direction of element A, that is, between the CdS layer 12 and the opposing carbon electrode 14, and the lateral resistance occurring between the CdS layer 12 of element A and the carbon electrode 14 of element B. Let it be R 2 . The dimensions of the carbon electrode are ω×l, the distance between the CdS layers 12 is t 2 , and the thickness of the CdTe layer 13 is t 1 . ω, l, t 1 , t 2 of the element that obtained the above output characteristics
The values are 1.6 cm, 0.6 cm, 20 μm, and 0.5 mm, respectively. Now assume that the specific resistance of the CdTe layer 13 is ρ, which is the same value in both the vertical and horizontal directions.
ここでR1、R2を計算するとR1=ρt1/ωlで
ある。一方R2はt2≫t1の関係が成り立つためR2=
ρt2/ωt1となる。従つてR2/R1の比を求めると
R2/R1=t2l/t1 2となり前述の値を代入すると
R2/R1104となる。従つて、CdTe層13を帯状
にしても素子A、素子B間に流れる電流分はほと
んどなく、分離された場合と同じ働きをすること
になる。いま、CdTe層13の比抵抗は縦方向と
横方向とは同じ値と仮定した。しかし、横方向と
いうのはCdTe膜は多結晶であるため結晶粒界の
効果が強く働き、縦方向の比抵抗より大きくなる
傾向にあるため実際のR2/R1の比はさらに大き
いものと思われる。 Here, when R 1 and R 2 are calculated, R 1 =ρt 1 /ωl. On the other hand, for R 2 , the relationship t 2 ≫ t 1 holds, so R 2 =
It becomes ρt 2 /ωt 1 . Therefore, when finding the ratio of R 2 /R 1 ,
R 2 /R 1 = t 2 l / t 1 2 , and by substituting the above values,
It becomes R 2 /R 1 10 4 . Therefore, even if the CdTe layer 13 is formed into a strip, almost no current flows between the elements A and B, and they function in the same way as when they are separated. It is now assumed that the specific resistance of the CdTe layer 13 is the same value in the vertical and horizontal directions. However, in the horizontal direction, since the CdTe film is polycrystalline, the effect of grain boundaries is strong, and the resistivity tends to be larger than that in the vertical direction, so the actual ratio of R 2 / R 1 is likely to be even larger. Seem.
以上の結果から明らかなように本発明の光起電
力装置の有効性を制限するのは、n形、p形半導
体の種類やその製造方法の違いによるのではな
く、装置を構成する各物質の相互配置や膜厚であ
るため、本発明は広く他の半導体材料や他の製造
方法にて製造される場合に適用もできる。また第
3図bように素子間を接続する電極は、接合より
離れた位置に形成できるため、受光面積の減少も
少なく、接続時の短絡や、電極形成時に生じる接
合への悪影響を除外する効果もある。さらに、素
子構造の簡素化に役立ち、信頼性や歩留も向上す
る。 As is clear from the above results, the effectiveness of the photovoltaic device of the present invention is limited not by the differences in the types of n-type and p-type semiconductors or their manufacturing methods, but by the differences in the materials constituting the device. Because of the mutual arrangement and film thickness, the present invention can be widely applied to cases where semiconductor materials are manufactured using other semiconductor materials and other manufacturing methods. In addition, as shown in Figure 3b, the electrodes that connect the elements can be formed at a position farther away from the junction, so there is less reduction in the light-receiving area, and this has the effect of eliminating short circuits during connection and adverse effects on the junction that occur when forming the electrodes. There is also. Furthermore, it helps to simplify the device structure and improves reliability and yield.
本実施例ではCdS焼結膜は接合形成物質兼電極
材料として使わわれているが、従来例の説明で用
いた第2図のような構造、即ち透明電極上にn型
半導体を形成した場合でも全く同様であり、その
上に形成するp形半導体を帯状にすればよい。ま
た、p形半導体を分離し、n形半導体を帯状にし
たものでも効果は同様である。 In this example, the CdS sintered film is used as both a bonding material and an electrode material, but even if the structure shown in Figure 2 used to explain the conventional example is used, that is, an n-type semiconductor is formed on a transparent electrode, there will be no problem at all. Similarly, the p-type semiconductor formed thereon may be formed into a band shape. Furthermore, the same effect can be obtained even if the p-type semiconductor is separated and the n-type semiconductor is formed into a band.
以上の説明から明らかなように、本発明の光起
電力装置は次のような効果を奏する。 As is clear from the above description, the photovoltaic device of the present invention has the following effects.
(1) 基板上に多数個の光起電力素子を同時に形成
するため製造工程が簡素化され、低コストの装
置製造することができる。(1) Since a large number of photovoltaic elements are simultaneously formed on a substrate, the manufacturing process is simplified and the device can be manufactured at low cost.
(2) 基板上に素子相互を分割した光起電力素子を
形成する場合には、素子相互の狭い空間に多く
の素子構成物質を少しづつ位置をづらしながら
素子の短絡や素子間の短絡を防ぐように配置し
てゆく必要があり、パターンの位置合せが大切
となる。しかしながら、本発明の場合、pn接
合を形成する一方の半導体材料は、他方のすべ
ての半導体材料に共通な例えば帯状のものでよ
いため、上記のような短絡は起りにくい上にパ
ターンの位置合せのミスも減少し製造工程の簡
素化、歩留の向上が図れる。(2) When forming a photovoltaic device with separate elements on a substrate, it is necessary to gradually shift the positions of many element constituent materials in the narrow space between the elements to prevent short-circuits between the elements and short-circuits between the elements. Therefore, it is important to align the patterns. However, in the case of the present invention, one semiconductor material forming a pn junction may be a band-shaped material common to all other semiconductor materials, so short circuits as described above are less likely to occur, and pattern alignment is difficult. Errors are reduced, the manufacturing process is simplified, and yields are improved.
(3) 時計、電卓などの電源として使用する場合、
光照射面には従来のような発電に寄与しない部
分、即ち、素子の短絡や素子間の短絡を防止す
るために素子構成物質を少しづつ位置をづらし
た部分がないため同じ受光面当りの発電量が増
える。(3) When used as a power source for watches, calculators, etc.
Since there is no part on the light irradiation surface that does not contribute to power generation as in the conventional case, that is, a part where the element constituent materials are gradually shifted in order to prevent short circuits between elements or short circuits between elements, the power generation per the same light receiving surface is reduced. The amount increases.
(4) 上記の発電に寄与しない部分は、2種の半導
体材料や金属が入射光面側からみて見えるため
美観的にもよくないが、本発明では複数の第一
の膜に共通な第二の膜のために上記部分がしや
へいされ美観を損うことはない。(4) The above-mentioned portions that do not contribute to power generation are not aesthetically pleasing because the two types of semiconductor materials and metals are visible from the incident light surface side, but in the present invention, the second layer common to multiple first films Because of the membrane, the above-mentioned parts are softened and the aesthetic appearance is not spoiled.
(5) 素子間を接続する電極は、接合より離れた基
板の一方の主面上に形成でき、有効受光面積の
減少が少なく、信頼性の良い電極を容易に形成
できる。(5) The electrode that connects the elements can be formed on one main surface of the substrate away from the junction, so that the effective light-receiving area is less reduced, and highly reliable electrodes can be easily formed.
第1図はシリコン単結晶を用いた従来の光起電
力装置の断面図、第2図は薄膜半導体を用いた従
来の光起電力装置の断面図、第3図a,bは本発
明の光起電力装置の一実施例を示す構造断面図お
よび平面図、第4図は本発明を説明するための光
起電力装置の簡略構成図である。
11……ガラス基板、12……CdS層、13…
…CdTe層、14……カーボン電極、15……In
電極。
Fig. 1 is a cross-sectional view of a conventional photovoltaic device using a silicon single crystal, Fig. 2 is a cross-sectional view of a conventional photovoltaic device using a thin film semiconductor, and Fig. 3 a and b are a cross-sectional view of a conventional photovoltaic device using a silicon single crystal. A structural sectional view and a plan view showing one embodiment of the electromotive force device, and FIG. 4 is a simplified configuration diagram of the photovoltaic device for explaining the present invention. 11...Glass substrate, 12...CdS layer, 13...
...CdTe layer, 14...Carbon electrode, 15...In
electrode.
Claims (1)
体物質からなる複数個の第1の膜と、前記一導電
型とは反対導電型の半導体物質からなり、前記複
数個の第1の膜の一部の領域を除いて前記複数個
の第1の膜上に共通に設けられる第2の膜と、前
記複数個の第1の膜にそれぞれ対応して、前記第
2の膜上から前記基板の一主面上にわたつて形成
される複数個の第1の電極と、前記基板の一主面
上に設置され、隣接する前記第1の膜の一部の領
域と前記第1の電極の前記基板の一主面上に位置
する部分とをそれぞれ接続する第2の電極とを備
えてなることを特徴とする光起電力装置。1 A plurality of first films made of a semiconductor material of one conductivity type formed on one main surface of a substrate; and a plurality of first films made of a semiconductor material of a conductivity type opposite to the one conductivity type; A second film commonly provided on the plurality of first films except for a part of the film, and a second film provided on the second film corresponding to each of the plurality of first films. a plurality of first electrodes formed over one main surface of the substrate; a partial region of the adjacent first film installed on the one main surface of the substrate; A photovoltaic device comprising: second electrodes each connecting a portion of the electrode located on one principal surface of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8725580A JPS5713776A (en) | 1980-06-28 | 1980-06-28 | Photovoltaic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8725580A JPS5713776A (en) | 1980-06-28 | 1980-06-28 | Photovoltaic device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5713776A JPS5713776A (en) | 1982-01-23 |
| JPS6148796B2 true JPS6148796B2 (en) | 1986-10-25 |
Family
ID=13909673
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8725580A Granted JPS5713776A (en) | 1980-06-28 | 1980-06-28 | Photovoltaic device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5713776A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02257984A (en) * | 1989-03-31 | 1990-10-18 | Takara Kosan Kk | Balloon toy |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4419530A (en) * | 1982-02-11 | 1983-12-06 | Energy Conversion Devices, Inc. | Solar cell and method for producing same |
| JPS6032352A (en) * | 1983-08-01 | 1985-02-19 | Matsushita Electric Ind Co Ltd | Solar battery module |
-
1980
- 1980-06-28 JP JP8725580A patent/JPS5713776A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02257984A (en) * | 1989-03-31 | 1990-10-18 | Takara Kosan Kk | Balloon toy |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5713776A (en) | 1982-01-23 |
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