Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS6149114B2 - - Google Patents
[go: Go Back, main page]

JPS6149114B2 - - Google Patents

Info

Publication number
JPS6149114B2
JPS6149114B2 JP9611482A JP9611482A JPS6149114B2 JP S6149114 B2 JPS6149114 B2 JP S6149114B2 JP 9611482 A JP9611482 A JP 9611482A JP 9611482 A JP9611482 A JP 9611482A JP S6149114 B2 JPS6149114 B2 JP S6149114B2
Authority
JP
Japan
Prior art keywords
dap
resin
varnish
laminate
polythiol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9611482A
Other languages
Japanese (ja)
Other versions
JPS58212945A (en
Inventor
Setsuo Suzuki
Nobutaka Takasu
Susumu Takei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP9611482A priority Critical patent/JPS58212945A/en
Publication of JPS58212945A publication Critical patent/JPS58212945A/en
Publication of JPS6149114B2 publication Critical patent/JPS6149114B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0326Organic insulating material consisting of one material containing O
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

Landscapes

  • Laminated Bodies (AREA)

Description

【発明の詳細な説明】 本発明は新規な放射線硬化樹脂を用いて積層板
を製造する方法に係るものである。更に詳しくは
ジアリルフタレート(以下DAPという)系樹脂
骨格を有する末端−SH基を有するプレポリマー
とポリエンおよび光増感剤から成るワニスを、布
もしくは不織布に塗布含浸して乾燥せしめ得られ
たプリプレグを、銅箔とラミネートし一体化物を
得、プリプレグ側から紫外線、電子線等の放射線
を照射して該樹脂系を硬化せしめて積層板を得る
方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing laminates using a novel radiation-cured resin. More specifically, a varnish consisting of a prepolymer having a terminal -SH group having a diallyl phthalate (hereinafter referred to as DAP) resin skeleton, a polyene, and a photosensitizer is applied to cloth or nonwoven fabric, impregnated and dried, and the obtained prepreg is obtained. , relates to a method of laminating with copper foil to obtain an integrated product, and curing the resin system by irradiating radiation such as ultraviolet rays or electron beams from the prepreg side to obtain a laminate.

従来DAP樹脂系の積層板を得る方法として
は、まずDAP・PとDAPモノマーおよび熱重合
開始剤を溶媒に溶解せしめて樹脂ワニスを作り、
これをガラスクロス等に含浸せしめ加熱乾燥して
プリプレグを得、然る後該プリプレグ数枚と片面
若しくは両面に積層された銅箔とを熱板間に挿入
し、熱圧硬化する方法が知られている。然しなが
らこの方法はプレス間熱重合を行うため生産性に
乏しく、更にDAP・PおよびDAPモノマーのガ
ラス繊維および銅箔との親和密着性に乏しいため
に、基材−樹脂間の剥離、銅箔密着不良等の問題
が致命傷となり、他の樹脂積層板に比較して伸び
が著じるしく低いものであつた。一方DAP樹脂
系の積層板には他樹脂にない優れた性能も有して
おり、積層板への適用は業界の長年の夢であるこ
とも事実である。一例として高度の電気絶縁性、
高度の寸法安定性、広領域の周波数に対する高周
波性能の安定性等を挙げることが出来る。
The conventional method for obtaining DAP resin-based laminates is to first dissolve DAP・P, DAP monomers, and a thermal polymerization initiator in a solvent to create a resin varnish.
A known method is to impregnate a glass cloth or the like with this and heat and dry it to obtain a prepreg, then insert several sheets of the prepreg and copper foil laminated on one or both sides between hot plates and heat-pressure harden. ing. However, this method has poor productivity because thermal polymerization is carried out during pressing, and furthermore, DAP/P and DAP monomers have poor affinity and adhesion with glass fibers and copper foil, resulting in peeling between the base material and resin and adhesion of the copper foil. Problems such as defects were fatal, and the elongation was significantly lower than that of other resin laminates. On the other hand, DAP resin-based laminates have excellent performance not found in other resins, and it is also true that their application to laminates has been a long-held dream of the industry. High degree of electrical insulation as an example;
Examples include a high degree of dimensional stability and stability of high frequency performance over a wide range of frequencies.

一方アクリレート系もしくはメタアクリレート
系放射線硬化樹脂を用いて、これを基材に含浸せ
しめて積層板を合理的に得んとする試みも数多く
成されている。しかしながら以下の如き根本的な
欠点故に熱重合と併用しない放射線硬化法のみに
よる積層板の製造法は実用化される迄には至つて
いない。
On the other hand, many attempts have been made to rationally obtain laminates by impregnating base materials with acrylate or methacrylate radiation-curable resins. However, due to the following fundamental drawbacks, a method for producing a laminate using only a radiation curing method without thermal polymerization has not been put into practical use.

即ち、 (1) 一般にアクリレート系樹脂は硬化収縮が極端
に大きく、積層板化した場合、反り、ねじれが
大きい。またこの現象を避ける為に無機充填材
を多量に添加した場合、放射線透過率が減少す
る。
That is, (1) Generally, acrylate resins have extremely large curing shrinkage, and when formed into a laminate, they are prone to large warpage and twisting. Furthermore, when a large amount of inorganic filler is added to avoid this phenomenon, the radiation transmittance decreases.

(2) 一般には反応性モノマーを使用するが、その
毒性が問題になる上、低分子モノマーを大量に
使用するため乾燥后も粘着性を除去することが
出来ず、作業性が極めて悪い。また添加モノマ
ーのプレポリマーとの共重合性の関係でモノマ
ーの種類が限定され、加えて単独重合体も生じ
てしまい、物性を著じるしく損ねる。
(2) Reactive monomers are generally used, but their toxicity is a problem, and since a large amount of low-molecular-weight monomers are used, the stickiness cannot be removed even after drying, resulting in extremely poor workability. Further, the type of monomer is limited due to the copolymerizability of the added monomer with the prepolymer, and in addition, a homopolymer is also formed, which significantly impairs the physical properties.

(3) 酸素禁止効果が著じるしく表面が未硬化にな
る。この現象を防止する意味で多量の開始剤を
用いざるを得ないため、ラジカル濃度が増大し
てしまい脆い硬化物になつてしまう等である。
(3) The oxygen inhibition effect is significant and the surface becomes uncured. In order to prevent this phenomenon, a large amount of initiator must be used, which increases the radical concentration and results in a brittle cured product.

本発明者らはDAP系樹脂の優れた性能を損ね
ること無く、従来の欠点を克服し、更に加えて放
射線硬化のみによる積層板の製法を見い出すべく
鋭意検討を行ない、本発明に到達した。
The present inventors have conducted intensive studies to overcome the conventional drawbacks without impairing the excellent performance of DAP-based resins, and in addition, to find a method for producing a laminate using only radiation curing, and have arrived at the present invention.

即ち、DAP・Pのアリル基と過剰のポリチオ
ールのメルカプト基とを溶媒存在下で反応せし
め、末端−SH基を有する変性DAP・Pを得、こ
れに炭素−炭素二重結合を有するポリエンおよび
光増感剤を添加して成る樹脂ワニスを用いる方法
を見い出した。この樹脂系を用いた場合、以下の
特徴が発現する。
That is, the allyl group of DAP・P and the mercapto group of excess polythiol are reacted in the presence of a solvent to obtain a modified DAP・P having a terminal −SH group, which is then treated with a polyene having a carbon-carbon double bond and a photopolymer. We have discovered a method using a resin varnish containing a sensitizer. When this resin system is used, the following characteristics are exhibited.

(1) ポリエン−ポリチオールの反応を用いるた
め、樹脂の硬化収縮が小さく、基板化に際しの
反り、ねじれが完全に防止出来る。
(1) Since a polyene-polythiol reaction is used, the curing shrinkage of the resin is small, and warping and twisting when forming a substrate can be completely prevented.

(2) ポリエン−ポリチオールの反応を用いるた
め、共重合性に由来するポリエン選定の制約が
大巾に緩和される。因みにDAP・Pのラジカ
ル架橋に際して用いられるモノマーは、
DAP・モノマー、スチレン等数種を数えるに
過ぎない。
(2) Since the polyene-polythiol reaction is used, restrictions on polyene selection due to copolymerizability are greatly relaxed. Incidentally, the monomers used for radical crosslinking of DAP/P are:
There are only a few types such as DAP, monomer, and styrene.

(3) DAP・Pを末端処理して−SHに変性してあ
るため、シート基材とのなじみ性、密着性が大
巾に改良される。
(3) Since DAP/P is end-treated and modified to -SH, its compatibility and adhesion with the sheet base material are greatly improved.

(4) DAP・Pをベースにしているため、造膜性
に優れ、塗布乾燥後のプリプレグは室温では全
く粘性が無いうえに、加えて可撓性を有してお
りプリプレグの巻き取りが可能である。この為
生産性が大巾に向上する。
(4) Since it is based on DAP/P, it has excellent film-forming properties, and the prepreg after coating and drying has no viscosity at room temperature.In addition, it is flexible and can be rolled up. It is. This greatly improves productivity.

(5) 得られたプリプレグは温度を上げることによ
り粘性が発現するため、銅箔とのラミネートが
可能になり、更に硬化后も−SH基に寄因して
銅箔密着性に優れている。
(5) The obtained prepreg develops viscosity by increasing the temperature, so it can be laminated with copper foil, and even after curing, it has excellent adhesion to copper foil due to the -SH group.

(6) ポリエン−ポリチオールの反応のため、酸素
禁止効果が無く、開始剤量が少なくて済み、基
材の効果と相まつて、強靭な硬化物が得られ
る。このため可撓性を有する謂ゆるフレキキシ
ブル基板も得ることが出来る。
(6) Because of the polyene-polythiol reaction, there is no oxygen inhibition effect, and only a small amount of initiator is required, which, combined with the effect of the base material, provides a tough cured product. Therefore, a so-called flexible substrate having flexibility can also be obtained.

(7) 紫外線、電子線等の放射線硬が可能である。(7) Radiation hardening such as ultraviolet rays and electron beams is possible.

この様な特徴を有する積層板製造法は従来全く
見られず、本発明は画期的である。以下に詳細を
述べる。
The present invention is groundbreaking, as no method of manufacturing a laminate having such characteristics has been seen in the past. Details are given below.

本発明に用いられるDAP・P又はisO DAP・
Pは通常の市販品で良く、その重合度は適宜選択
出来る。ポリエン添加後の造膜性を考慮した場合
重合度5以上のDAP・Pが好ましい。
DAP/P or isO DAP/P used in the present invention
P may be an ordinary commercially available product, and its degree of polymerization can be selected as appropriate. When considering the film-forming property after addition of polyene, DAP/P with a degree of polymerization of 5 or more is preferable.

またプレポリマー化に際して用いられる一般式
R−(SH)o(式中、nは2〜4の整数、Rは反応
性二重結合を含まない有機基)で表される化合物
はすべて使用可能であるが、好ましい化合物とし
てはメルカプトカルボン酸類と多価アルコールの
エステルがあり、一般的に用いられる具体的な例
としては、トリメチロールプロパントリスチオグ
リコレート、トリメチロールプロパン(β−メル
カプトプロピオネート)、ペンタエリスリツトテ
トラキス(チオグリコレート)、ペンタエリスリ
ツトテトラキス(β−メルカプトプロピオネー
ト)、トリス(ヒドロキシエチル)イソシアヌレ
ートトリス(β−メルカプトプロピオネート)エ
チレングリコールビス(β−メルカプトプロピオ
ネート)等である。これらを併用して用いること
も可能である。
In addition, all compounds represented by the general formula R-(SH) o (where n is an integer of 2 to 4 and R is an organic group not containing a reactive double bond) used in prepolymerization can be used. However, preferred compounds include esters of mercaptocarboxylic acids and polyhydric alcohols, and specific examples commonly used include trimethylolpropane tristhioglycolate and trimethylolpropane (β-mercaptopropionate). , pentaerythritotetrakis (thioglycolate), pentaerythritotetrakis (β-mercaptopropionate), tris(hydroxyethyl)isocyanurate tris(β-mercaptopropionate) ethylene glycol bis(β-mercaptopropionate) ) etc. It is also possible to use these in combination.

またプレポリマー化に際してのDAP・Pおよ
び/またはiso DAP・Pとポリチオールの混合比
率はDAP・Pおよび/またはiso DAP・P1当量
に対して、ポリチオール2当量以上が必要であ
り、これ以下であるとプレポリマー化に際してゲ
ルを生じてしまう。しかしながらポリチオール成
分をあまり過剰にするとフリーのポリチオールが
増加し、最終硬化物中のDAP・Pおよび/また
はiso DAP・P成分が少なくなつてしまい耐熱性
が低下してしまう。従つてプレポリマー化に際し
てはゲルを生じない可及的に少ない量のポリチオ
ールを用いることが肝要である。また反応に際し
ては無触媒であつても反応は進行するが、必要に
応じてラジカル開始剤の添加も効果的である。
In addition, the mixing ratio of DAP・P and/or iso DAP・P and polythiol during prepolymerization is required to be at least 2 equivalents of polythiol per 1 equivalent of DAP・P and/or iso DAP・P, and less than this. This results in the formation of a gel during prepolymerization. However, if the polythiol component is made too excessive, free polythiol will increase, and the DAP/P and/or iso DAP/P components in the final cured product will decrease, resulting in a decrease in heat resistance. Therefore, in prepolymerization, it is important to use as small an amount of polythiol as possible without forming a gel. Although the reaction proceeds even in the absence of a catalyst, it is also effective to add a radical initiator if necessary.

更にプレポリマー化は通常溶媒中で行ない、最
終組成物は謂ゆるワニスの状態で得るのが一般的
であり、DAP・Pおよび/またはiso DAP・P
を溶解出来る溶媒はすべて使用可能であるし、更
に液状ポリチオール中にDAP・Pおよび/また
はiso DAP・Pを分散溶解せしめ、加熱反応后最
終的に溶媒を添加することも可能である。好んで
用いられる溶媒は該組成物の用途により異なる
が、該ワニスはシート状基材に塗布・含浸后溶媒
を乾燥により除去するため、アセトン、メチルエ
チルケトン、メチルイソブチルケトンといつた低
沸点溶媒が好ましい。
Furthermore, prepolymerization is usually carried out in a solvent, and the final composition is generally obtained in the form of a so-called varnish, which is DAP・P and/or iso DAP・P.
Any solvent that can dissolve DAP·P and/or iso DAP·P can be used, and it is also possible to disperse and dissolve DAP·P and/or iso DAP·P in liquid polythiol, and finally add the solvent after the heating reaction. The preferred solvent varies depending on the use of the composition, but since the varnish is applied to a sheet-like substrate and the solvent is removed by drying, a low boiling point solvent such as acetone, methyl ethyl ketone, or methyl isobutyl ketone is preferable. .

次いでこの様にして得られたチオールプレポリ
マーに、1分子中に反応性炭素−炭素不飽和結合
を2ケ以上有するポリエン化合物を添加する。
DAP・Pおよび/またはiso DAP・Pをチオー
ル変性することにより各種ポリエンとの相溶性が
向上し、共重合性も著じるしく向上するため、ポ
リエンとしてはアクリレート化合物、メタクリレ
ート化合物、アリル化合物であれば全て使用可能
であるが、反応性のコントロールのし易さという
点を考慮した場合、アリル化合物であることが望
ましい。具体的な例としては、トリアリルイソシ
アヌレート、トリアリルシアヌレート、ジアリル
イソフタレート、ジアリルマレート、ジアリルイ
タコネート、ジアリルクロレンデート、トリアリ
ルトリメリテート等が挙げられ、これらは単独で
もしくは併用して用いることが可能である。
Next, a polyene compound having two or more reactive carbon-carbon unsaturated bonds in one molecule is added to the thiol prepolymer thus obtained.
Thiol modification of DAP・P and/or iso DAP・P improves compatibility with various polyenes and significantly improves copolymerizability, so acrylate compounds, methacrylate compounds, and allyl compounds can be used as polyenes. Any compound can be used, but allyl compounds are preferable from the viewpoint of ease of controlling reactivity. Specific examples include triallyl isocyanurate, triallyl cyanurate, diallyl isophthalate, diallyl maleate, diallylitaconate, diallyl chlorendate, triallyl trimellitate, etc., which may be used alone or in combination. It can be used as

更に上記ポリチオールプレポリマー溶液とポリ
エンの配合物に紫外線、電子線等の放射線照射に
より遊離基を生成する。光増感剤を添加するが、
この化合物としてはベンゾフエノン、ベンゾイン
メチルエーテル、ベンゾインエチルエーテル等を
単独もしくは併用添加することが可能である。こ
れらの添加量は全樹脂に対して0.01〜3重量%程
度で充分である。また上記組成物中に必要により
安定剤、顔料、染料等の着色剤、増量剤等を添加
することも適宜実施可能である。
Furthermore, free radicals are generated by irradiating the mixture of the polythiol prepolymer solution and polyene with radiation such as ultraviolet rays and electron beams. Adding a photosensitizer,
As this compound, benzophenone, benzoin methyl ether, benzoin ethyl ether, etc. can be added alone or in combination. The amount of these added is approximately 0.01 to 3% by weight based on the total resin. It is also possible to add stabilizers, colorants such as pigments and dyes, extenders, etc. to the above composition as necessary.

かくして得られた樹脂ワニスを各種シート状基
板に塗布含浸する。この場合のシート状基材は放
射線透過性を有するものであればすべて使用可能
であるが、特に好ましいものとしては、ガラス
布、ガラス不織布、ポリエステル布、ポリエステ
ル不織布紙等が放射線透過性という観点から好ま
しい。また樹脂の塗布量は、溶剤除去後で30〜70
重量%が妥当であり、30%以下であるとラミネー
ト時銅箔との密着不良を生じるし、70%以上の場
合樹脂のフロー量が大きく、ラミネート時のトラ
ブルが生じてしまう。塗布含浸后120℃以下の温
度で乾燥せしめて溶媒を除去し冷却する。冷却后
は室温状態では全く粘性は無く、優れたプリプレ
グである。次いで得られた1放以上のプリプレグ
と銅箔を熱ラミネーター等を用いてラミネートす
る。熱間状態では適度の粘性が発現するため強固
な接着性が得られる。次いで該ラミネートをプリ
プレグ側から放射線を照射し、樹脂を完全に硬化
せしめる。照射は10秒以下の照射で充分であるた
め極めて生産性の高い製造法である。
The resin varnish thus obtained is applied and impregnated onto various sheet-like substrates. In this case, any sheet-like base material can be used as long as it has radiation transparency, but glass cloth, glass nonwoven fabric, polyester cloth, polyester nonwoven paper, etc. are particularly preferable from the viewpoint of radiation transparency. preferable. Also, the amount of resin applied is 30 to 70% after removing the solvent.
The weight percentage is appropriate; if it is less than 30%, poor adhesion with the copper foil will occur during lamination, and if it is more than 70%, the amount of resin flow will be large, causing trouble during lamination. After coating and impregnating, dry at a temperature below 120°C to remove the solvent and cool. After cooling, it has no viscosity at room temperature and is an excellent prepreg. Next, one or more of the obtained prepregs and the copper foil are laminated using a thermal laminator or the like. In a hot state, moderate viscosity is developed, so strong adhesiveness can be obtained. Next, the laminate is irradiated with radiation from the prepreg side to completely cure the resin. It is an extremely productive manufacturing method because irradiation for 10 seconds or less is sufficient.

かくして優れた片面金属張り板が得られ、この
ものはプリント配線板等への適用が可能なもので
あり、その工業的意義は極めて高いものである。
In this way, an excellent single-sided metal-clad board is obtained, which can be applied to printed wiring boards, etc., and has extremely high industrial significance.

以下に実施例を示す。 Examples are shown below.

実施例 1 粉末状DAPプレポリマー(大阪曹達(株)製、商
品名ダイソーダツプA)600重量部、メチルエチ
ルケトン(MEK)400重量部を5フラスコ中で
混合し均一な溶液とする。
Example 1 600 parts by weight of powdered DAP prepolymer (manufactured by Osaka Soda Co., Ltd., trade name: Daisodap A) and 400 parts by weight of methyl ethyl ketone (MEK) were mixed in five flasks to form a uniform solution.

次いでこの溶液にペンタエリスリツトテトラキ
ス(β−メルカプトプロピオネート)700重量部
を添加し、60℃の温度で2時間反応せしめ、−SH
含量2.4m・mol/gのポリチオールプレポリマー
を得た。次いでこの樹脂溶液を冷却し、トリアリ
ルイソシアヌレート350重量部、ベンゾフエノン
1重量部およびMEK1000重量部を添加混合して
均一なワニス組成物を得た。
Next, 700 parts by weight of pentaerythritotetrakis (β-mercaptopropionate) was added to this solution and reacted at a temperature of 60°C for 2 hours to form -SH
A polythiol prepolymer having a content of 2.4 m·mol/g was obtained. Next, this resin solution was cooled, and 350 parts by weight of triallylisocyanurate, 1 part by weight of benzophenone, and 1000 parts by weight of MEK were added and mixed to obtain a uniform varnish composition.

次に上記ワニスをガラスクロスに塗布し、100
℃の温度で乾燥したところ可撓性に富む粘着性の
全くないプリプレグを得た。該プリプレグ2層を
重ね、更にその上に35μの銅箔を重ね、150℃に
設定されたロール間を通過せしめてラミネートを
行つた。密着性を有する一体化したラミネート品
を得た。次いで該積層板のプリプレグ側を上面に
して高圧水銀灯を用いて、10秒間紫外線を照射し
た。照射によりプリプレグは完全に硬化し片面銅
貼り板が得られた。得れた銅貼板は可撓性を有す
る反り、ねじれの全く無い優れたものであり、回
路板として充分使用可能なものであつた。
Next, apply the above varnish to the glass cloth and apply 100%
When dried at a temperature of 0.degree. C., a highly flexible prepreg with no tackiness was obtained. Two layers of the prepreg were stacked, and a 35 μm copper foil was further stacked on top of the prepreg, and lamination was performed by passing between rolls set at 150°C. An integrated laminate product with adhesive properties was obtained. Next, the laminate was irradiated with ultraviolet rays for 10 seconds using a high-pressure mercury lamp with the prepreg side facing upward. The prepreg was completely cured by irradiation, and a single-sided copper-clad board was obtained. The resulting copper laminate was highly flexible and free from warping and twisting, and could be fully used as a circuit board.

Claims (1)

【特許請求の範囲】[Claims] 1 ジアリルフタレートプレポリマー(以下
DAP・Pという)および/またはイソジアリル
フタレートプレポリマー(以下isO DAP・Pと
いう)と一般式R(−SH)o(式中Rは反応性炭素
−炭素不飽和結合を含まない有機基、nは2〜4
の整数)で表されるポリチオールをDAP・Pお
よび/またはisO DAP・P中のアリル基に対し
てポリチオールのメルカプト基が化学量論的に過
剰である条件において、溶媒存在下、加熱下で反
応せしめて得られる末端−SHおよびフリーのポ
リチオールを含有して成るチオールプレポリマー
ワニス(A)と1分子中に2個以上の反応性炭素−炭
素不飽和結合を有するポリエン(B)および光増感剤
(C)とを主要構成成分とする樹脂ワニスを得る工程
(工程)と、該ワニスを放射線透過能を有する
繊維状物質から構成される布若しくは不織布等の
シート状基材に塗布含浸して乾燥せしめる工程
(工程)と、1層以上の該含浸乾燥物を重ね、
銅箔とラミネートして一体化した積層物を得る工
程(工程)と、銅箔と反対の含浸乾燥物面に放
射線を照射して樹脂を3次元架橋硬化せしめる銅
張り積層板を得る工程(工程)とからなること
を特徴とする積層板製造方法。
1 Diallyl phthalate prepolymer (hereinafter
DAP・P) and/or isodiallyl phthalate prepolymer (hereinafter referred to as isO DAP・P) and the general formula R(-SH) o (wherein R is an organic group containing no reactive carbon-carbon unsaturated bond, n is 2-4
DAP・P and/or isO is reacted with a polythiol represented by (integer of A thiol prepolymer varnish (A) containing terminal -SH and free polythiol, a polyene (B) having two or more reactive carbon-carbon unsaturated bonds in one molecule, and photosensitization. agent
A step (process) of obtaining a resin varnish containing (C) as a main component, and applying and impregnating the varnish on a sheet-like base material such as a cloth or non-woven fabric made of a fibrous material having radiation transmittance and drying it. a step of impregnating (process), and layering one or more layers of the impregnated dried material,
A process (process) of laminating with copper foil to obtain an integrated laminate; and a process (process) of obtaining a copper-clad laminate in which the side of the impregnated dry material opposite to the copper foil is irradiated with radiation to three-dimensionally crosslink and harden the resin. ) A method for manufacturing a laminate, comprising:
JP9611482A 1982-06-07 1982-06-07 Manufacture of laminated board Granted JPS58212945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9611482A JPS58212945A (en) 1982-06-07 1982-06-07 Manufacture of laminated board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9611482A JPS58212945A (en) 1982-06-07 1982-06-07 Manufacture of laminated board

Publications (2)

Publication Number Publication Date
JPS58212945A JPS58212945A (en) 1983-12-10
JPS6149114B2 true JPS6149114B2 (en) 1986-10-28

Family

ID=14156356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9611482A Granted JPS58212945A (en) 1982-06-07 1982-06-07 Manufacture of laminated board

Country Status (1)

Country Link
JP (1) JPS58212945A (en)

Also Published As

Publication number Publication date
JPS58212945A (en) 1983-12-10

Similar Documents

Publication Publication Date Title
JPS61243844A (en) thermosetting resin composition
CA1175335A (en) Production of metal clad reinforced resin laminates
US5976699A (en) Insulating adhesive for multilayer printed circuit board
JPH03275760A (en) Polyphenylene oxide resin composition and metal-plated laminate board
JPS6149114B2 (en)
JPS6356548A (en) Thermosetting resin composition, laminated sheet produced by using same and production thereof
JPH01215815A (en) Thermosetting resin composition and metal-clad laminate thereof
JPS6334020B2 (en)
JPH03297638A (en) Production of copper foil coated with radiation hardening type coating
JPH04239017A (en) Curable resin composition, and composite material and laminate prepared by using same
JPH11147285A (en) Production of copper-clad laminated sheet
JPS62248632A (en) Metal-lined flexible laminated board
JPH0476018A (en) New curable polyphenylene ether/epoxy resin composition
JPH03166256A (en) Resin composition and laminated board thereof
JPS6329887B2 (en)
JPS63117053A (en) laminate board
JPH03275761A (en) Polyphenylene oxide resin composition and metal-plated laminate board
JPH04239018A (en) New curable polyphenylene ether/epoxy resin composition, and composite material and laminate prepared therefrom
JPH04239019A (en) Curable polyphenylene ether/epoxy resin composition, and composite material and laminate prepared by using same
JPH01207986A (en) Compound material for printed wiring board
JPH0392348A (en) Preparation of laminated sheet
JPH02206549A (en) Thermosetting resin composition film laminate and production of multilayer interconnection board using the same
JPH04125147A (en) Continuous production of board for flexible printed wiring board
JPH03166255A (en) Flame retardant polyphenylene oxide-based resin composition and metal-clad laminated board thereof
JPH04197717A (en) Manufacture of electric laminated sheet