JPS6149657B2 - - Google Patents
Info
- Publication number
- JPS6149657B2 JPS6149657B2 JP3720477A JP3720477A JPS6149657B2 JP S6149657 B2 JPS6149657 B2 JP S6149657B2 JP 3720477 A JP3720477 A JP 3720477A JP 3720477 A JP3720477 A JP 3720477A JP S6149657 B2 JPS6149657 B2 JP S6149657B2
- Authority
- JP
- Japan
- Prior art keywords
- forming material
- exposed
- image forming
- metal
- image formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 8
- 150000002736 metal compounds Chemical class 0.000 claims description 8
- 239000003504 photosensitizing agent Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 4
- 239000012965 benzophenone Substances 0.000 claims description 4
- 150000001540 azides Chemical class 0.000 claims description 3
- 239000011230 binding agent Substances 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 229920006395 saturated elastomer Polymers 0.000 claims 2
- -1 tetrafluoroborate Chemical compound 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- MDNQGVGQANAJTG-UHFFFAOYSA-M 2,5-diethoxy-4-(4-methylphenyl)sulfanylbenzenediazonium;zinc;chloride Chemical compound [Cl-].[Zn].CCOC1=CC([N+]#N)=C(OCC)C=C1SC1=CC=C(C)C=C1 MDNQGVGQANAJTG-UHFFFAOYSA-M 0.000 description 1
- NZJOWPHCJQWDJZ-UHFFFAOYSA-O 2,5-diethoxy-4-[(4-methoxybenzoyl)amino]benzenediazonium Chemical compound CCOC1=CC([N+]#N)=C(OCC)C=C1NC(=O)C1=CC=C(OC)C=C1 NZJOWPHCJQWDJZ-UHFFFAOYSA-O 0.000 description 1
- CVTWUUJGZIZUTR-UHFFFAOYSA-N 2,5-dimethoxy-4-(4-methylphenyl)sulfanylbenzenediazonium Chemical compound COC1=CC([N+]#N)=C(OC)C=C1SC1=CC=C(C)C=C1 CVTWUUJGZIZUTR-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- ADOGRHNJEKVFAC-UHFFFAOYSA-N 3-methyl-4-pyrrolidin-1-ylbenzenediazonium Chemical compound CC1=CC([N+]#N)=CC=C1N1CCCC1 ADOGRHNJEKVFAC-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- AMTIVRQIKUFCEU-UHFFFAOYSA-M 4-(dimethylamino)benzenediazonium;zinc;chloride Chemical compound [Cl-].[Zn].CN(C)C1=CC=C([N+]#N)C=C1 AMTIVRQIKUFCEU-UHFFFAOYSA-M 0.000 description 1
- NJYDJNRTEZIUBS-UHFFFAOYSA-N 4-morpholin-4-ylbenzenediazonium Chemical compound C1=CC([N+]#N)=CC=C1N1CCOCC1 NJYDJNRTEZIUBS-UHFFFAOYSA-N 0.000 description 1
- OHNKSVVCUPOUDJ-UHFFFAOYSA-N 5-nitro-1h-indene Chemical compound [O-][N+](=O)C1=CC=C2CC=CC2=C1 OHNKSVVCUPOUDJ-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- INBXHFRQITUXGJ-UHFFFAOYSA-N diazidoazaniumylideneazanide Chemical compound [N-]=[N+]=N[N+](=[N-])N=[N+]=[N-] INBXHFRQITUXGJ-UHFFFAOYSA-N 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- WUALQPNAHOKFBR-UHFFFAOYSA-N lithium silver Chemical compound [Li].[Ag] WUALQPNAHOKFBR-UHFFFAOYSA-N 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
この発明は乾式画像形成の促進法に関してい
る。
フイルム形成性熱可塑性高分子化合物、ガラス
または金属よりなるシート状また立体性基材の上
に、金属例えばアルミニウム、亜鉛その他の金属
または硫化カドミウム、弗化マグネシウム、酸化
チタンのような金属化合物の薄膜およびキノン
系、ジアゾ系、アジド系またはベンゾフエノン感
光剤とバインダー用高分子化合物、例えば各種の
熱可塑性合成樹脂、特にビニル系重合体または共
重合体、アクリレート系共重合体、ポリエステ
ル、セルロース誘導体、ゴム誘導体またはこれら
の混合物とからなる感光膜よりなり、該感光膜は
露光したとき感光部位の金属または金属化合物薄
膜と感光膜との界面接着力を低下できる乾式画像
形成材料を、所望のパターンを介して露光後、感
光膜を剥離して感光部位の金属または金属化合物
の薄膜層画像を形成することは、既に発明者等が
特願昭51−42083号(特開昭52−126220号公報参
照)として特許出願している。
この方法は特別な現像処理を必要とせず、露光
も日光または紫外線ないし短波長側の可視光線を
照射するだけで、極めて簡便な方法であり、また
得られる画像は解像力も高いので工業的に優れた
方法である。
しかし、この画像形成法を実施したとき、感光
剤の光化学反応に必要とするに充分露光しても、
画像が得られるまでに若干の時間を必要とし、露
光後感光膜を直ちに剥離すると画像を形成しなか
つたり得られる画像が不鮮明ないしは不均一であ
つた。この原因について種々研究の結果、露光後
に画像形成材料の置かれる雰囲気の湿度が大きく
影響し、同時に温度も画像形成までの時間を左右
することが判明した。この発明はこの知見に基づ
いて完成したものである。
したがつて、この発明は基材、その上に設けた
金属または金属化合物の薄膜および感光膜よりな
り、該感光膜はバインダー用高分子化合物および
キノン系、ジアゾ系、アジド系またはベンゾフエ
ノン感光剤よりなりかつ露光したとき感光部位の
金属または金属化合物薄膜と感光膜との界面接着
力を低下できる乾式画像形成材料を所望のパター
ンを介して露光後、感光膜を剥離して感光部位の
金属または金属化合物薄膜層の画像を形成する方
法において、露光した画像形成材料を水分の存在
下に高温で一定時間保持することを特徴とする画
像形成促進法を提供する。
この発明で用いる感光剤としては次のものが好
ましい:
(a) ベンゾフエノン
(b) キノン系感光剤
1,4−ナフトキノン、2−メチル−1,4−
ナフトキノン、アントラキノン、2−メチルアン
トラキノン、2−エチルアントラキノン、2−ク
ロロアントラキノンまたはp−トルキノン、
(c) ジアゾ系感光剤
4−(p−トリルメルカプト)−2,5−ジエト
キシベンゼンジアゾニウムの塩化亜鉛塩、硫酸ソ
ーダ塩または四弗化硼酸塩、4−(p−トリルメ
ルカプト)−2,5−ジメトキシベンゼンジアゾ
ニウムの塩化亜鉛塩、4−(p−メチルベンゾイ
ルアミノ)−2,5−ジエトキシベンゼンジアゾ
ニウムの塩化亜鉛塩、4−(p−メトキシベンゾ
イルアミノ)−2,5−ジエトキシベンゼンジア
ゾニウムの塩化亜鉛塩、4−モルフオリノ−2,
5−ジプトキシベンゼンジアゾニウムの塩化亜鉛
塩または四弗化硼酸塩、4−モルフオリノベンゼ
ンジアゾニウムの四弗化硼酸塩、4−ピロリジノ
−3−メチルベンゼンジアゾニウムの四弗化硼酸
塩、p−N,N−ジメチルアミノベンゼンジアゾ
ニウムの塩化亜鉛塩または四弗化硼酸塩、p−N
−エチル−N−ヒドロキシアミノベンゼンジアゾ
ニウムの塩化亜鉛塩、1,2−ジアゾナフトール
−5−スルフオン酸ソーダまたは4−ジアゾジフ
エニルアミン硫酸塩とホルムアルデヒドとの縮合
物の塩化亜鉛塩、
(d) アジド系感光剤
2,6−ジ−(4′−アジトベンザル)シクロヘ
キサノン。
この発明で露光後の乾式画像形成材料を、水分
の存在下に高温度に保持して画像形成を促進する
場合、温度が高い程また水分が多い程換言すれば
湿度が高い程画像形成までの時間は短縮される。
しかし、約80℃以上の温度では画像形成時間は数
秒以内に短縮できるが、かかる短時間処理は処理
装置の点より実施に問題が多く工業的ないしは経
済的でない。したがつて、一般に約40ないし約80
℃で処理するのが好ましい。また処理時間は5分
以内で充分に所期の効果が発揮できる。
具体的な処理法としては、露光した乾式画像形
成材料を所定の温度に保つた温湯中に一定時間浸
漬するのが最も簡便でかつ効果的な方法である。
別法として、露光画像形成材料を相対湿度100%
またはこれに近い雰囲気で所望の温度に保つた場
所に一定時間置いてもよい。しかし、この処理で
は装置からの湿分漏洩を防止する必要があり、ま
た雰囲気の温度が変動し易い欠点を有している。
次にこの発明を次の実施例で説明する。
実施例
塩化ビニル86%、醋酸ビニル13%、無水マレイ
ン酸1%の共重合体(UCC社よりビニライト
UMCHとして市販)20gおよび4−(p−トリル
メルカプト)―2,5−ジエトキシベンゼンジア
ゾニウム四弗化硼酸塩(株式会社大東工業所より
WH−1500として市販)0.8gをメチルエチルケ
トン80gに溶解して固形分20.63%の感光組成物
溶液を調製した。
厚さ100μのポリエチレンテレフタレートフイ
ルムの片面に、アルミニウムを真空蒸着して膜厚
100mμとした。アルミニウム薄膜上に前記の感
光組成物溶液を、ワイヤーバーで塗布して90℃で
1分間乾燥して感光膜厚5μを有する画像形成材
料を得た。
感光膜上に銀塩リス型フイルムのポジ原稿を密
着させ、80cm離れた3KWアーク灯からの光に露
光した。次いで温湯に浸漬してから感光膜を剥離
して基体上に蒸着アルミニウムのネガ画像を得
た。露光時間、温湯の温度および浸漬時間と画像
発現性との関係を次の表に示す。
This invention relates to a method for accelerating dry imaging. A thin film of a metal such as aluminum, zinc or other metal or a metal compound such as cadmium sulfide, magnesium fluoride or titanium oxide on a sheet or three-dimensional substrate made of a film-forming thermoplastic polymer compound, glass or metal. and quinone, diazo, azide, or benzophenone photosensitizers and polymer compounds for binders, such as various thermoplastic synthetic resins, especially vinyl polymers or copolymers, acrylate copolymers, polyesters, cellulose derivatives, and rubbers. The photoresist film consists of a photoresist film made of a derivative or a mixture thereof, in which a dry image forming material that can reduce the interfacial adhesion between the photoresist film and the metal or metal compound thin film in the photosensitive area when exposed to light is applied through a desired pattern. The inventors have already disclosed in Japanese Patent Application No. 51-42083 (see Japanese Unexamined Patent Publication No. 52-126220) that after exposure, the photoresist film is peeled off to form a thin layer image of metal or metal compound at the photosensitive area. A patent has been applied for. This method does not require any special development processing, and the exposure requires only irradiation with sunlight, ultraviolet rays, or visible light on the short wavelength side, making it an extremely simple method.The resulting images also have high resolution, making them excellent for industrial use. This is a method. However, when carrying out this image forming method, even if the exposure is sufficient for the photochemical reaction of the photosensitizer,
It takes some time to obtain an image, and if the photosensitive film is peeled off immediately after exposure, no image is formed or the resulting image is unclear or non-uniform. As a result of various studies on the cause of this, it has been found that the humidity of the atmosphere in which the image forming material is placed after exposure has a large effect, and at the same time, the temperature also influences the time until image formation. This invention was completed based on this knowledge. Therefore, the present invention comprises a base material, a thin film of a metal or metal compound provided thereon, and a photosensitive film, and the photosensitive film is made of a polymeric compound for a binder and a quinone-based, diazo-based, azide-based, or benzophenone photosensitizer. After exposing the dry image forming material to light through a desired pattern, which can reduce the interfacial adhesion between the metal or metal compound thin film in the photosensitive area and the photosensitive film when exposed to light, the photoresist film is peeled off and the metal or metal compound in the photosensitive area is removed. Provided is a method for accelerating image formation, in which an image forming material exposed to light is held at a high temperature for a certain period of time in the presence of moisture. The following photosensitizers are preferred for use in this invention: (a) benzophenone (b) quinone photosensitizer 1,4-naphthoquinone, 2-methyl-1,4-
Naphthoquinone, anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-chloroanthraquinone or p-toluquinone, (c) Diazo photosensitizer 4-(p-tolylmercapto)-2,5-diethoxybenzenediazonium zinc chloride salt, sodium sulfate or tetrafluoroborate, zinc chloride salt of 4-(p-tolylmercapto)-2,5-dimethoxybenzenediazonium, 4-(p-methylbenzoylamino)-2,5-diethoxybenzene Zinc chloride salt of diazonium, zinc chloride salt of 4-(p-methoxybenzoylamino)-2,5-diethoxybenzenediazonium, 4-morpholino-2,
Zinc chloride salt or tetrafluoroborate of 5-diptoxybenzenediazonium, tetrafluoroborate of 4-morpholinobenzenediazonium, tetrafluoroborate of 4-pyrrolidino-3-methylbenzenediazonium, p-N , N-dimethylaminobenzenediazonium zinc chloride salt or tetrafluoroborate, p-N
-Zinc chloride salt of ethyl-N-hydroxyaminobenzenediazonium, zinc chloride salt of a condensate of sodium 1,2-diazonaphthol-5-sulfonate or 4-diazodiphenylamine sulfate and formaldehyde, (d) Azide Photosensitizer 2,6-di-(4'-azitobenzal)cyclohexanone. In this invention, when the exposed dry image forming material is maintained at high temperature in the presence of moisture to promote image formation, the higher the temperature and the higher the moisture content, in other words, the higher the humidity, the faster the image formation. Time is reduced.
However, although the image forming time can be shortened to within a few seconds at a temperature of about 80° C. or higher, such short-time processing is not industrially or economically viable because of problems in terms of processing equipment. Therefore, generally about 40 to about 80
Preferably, the treatment is carried out at °C. In addition, the desired effect can be fully exhibited within 5 minutes of treatment time. As a specific processing method, the simplest and most effective method is to immerse the exposed dry image forming material in hot water maintained at a predetermined temperature for a certain period of time.
Alternatively, expose the image-forming material to 100% relative humidity.
Alternatively, it may be left in a similar atmosphere at a desired temperature for a certain period of time. However, in this process, it is necessary to prevent moisture leakage from the apparatus, and the temperature of the atmosphere tends to fluctuate. Next, the present invention will be explained with reference to the following examples. Example Copolymer of 86% vinyl chloride, 13% vinyl acetate, and 1% maleic anhydride (Vinyrite from UCC)
20 g (commercially available as UMCH) and 20 g of 4-(p-tolylmercapto)-2,5-diethoxybenzenediazonium tetrafluoroborate (from Daito Kogyo Co., Ltd.)
A photosensitive composition solution having a solid content of 20.63% was prepared by dissolving 0.8 g (commercially available as WH-1500) in 80 g of methyl ethyl ketone. Aluminum is vacuum deposited on one side of a 100μ thick polyethylene terephthalate film to increase the film thickness.
It was set to 100mμ. The photosensitive composition solution was applied onto an aluminum thin film using a wire bar and dried at 90° C. for 1 minute to obtain an image forming material having a photosensitive film thickness of 5 μm. A positive original made of silver salt lithium film was placed in close contact with the photosensitive film and exposed to light from a 3KW arc lamp 80cm away. The substrate was then immersed in warm water and the photosensitive film was peeled off to obtain a negative image of vapor-deposited aluminum on the substrate. The following table shows the relationship between exposure time, hot water temperature, immersion time, and image development.
【表】【table】
【表】
上記より、この発明により露光した画像形成材
料を温湯浸漬処理すれば、露光時間を短縮できる
ことおよび温湯温度が高い程浸漬時間は短時間で
よいことが判明する。
従来は露光後の画像形成にムラがあり、特に低
温、低湿の冬期には良好な画像が得難い欠点があ
つたが、この発明により外界の条件の変動とは関
係なく、常に良好な画像が露光時間、浸漬温度お
よび時間を適当に選択することにより得られる。[Table] From the above, it is clear that the exposure time can be shortened by immersing the image forming material exposed in accordance with the present invention in hot water, and that the higher the temperature of the hot water, the shorter the immersion time. Conventionally, there was unevenness in image formation after exposure, making it difficult to obtain a good image, especially in winter when the temperature is low and humidity is low.However, with this invention, a good image is always produced by exposure, regardless of changes in external conditions. This can be obtained by appropriately selecting the time, immersion temperature and duration.
Claims (1)
の薄膜および感光膜よりなり、該感光膜はバイン
ダー用高分子化合物およびキノン系、ジアゾ系、
アジド系またはベンゾフエノン感光剤よりなりか
つ露光したとき感光部位の金属または金属化合物
薄膜と感光膜との界面接着力を低下できる乾式画
像形成材料を所望のパターンを介して露光後、感
光膜を剥離して感光部位の金属または金属化合物
薄膜層の画像を形成する方法において、露光した
画像形成材料を水分の存在下に高温度に一定時間
保持することを特徴とする画像形成の促進法。 2 露光した画像形成材料を約40℃以上の温湯に
約5分以内浸漬することを特徴とする特許請求の
範囲1記載の画像形成の促進法。 3 露光した画像形成材料を約48ないし約68℃の
温湯に約5ないし180秒間浸漬することを特徴と
する特許請求の範囲1記載の画像形成の促進法。 4 露光後の画像形成材料を、飽和ないし準飽和
湿度で約40ないし80℃の雰囲気に約4分以内保持
することを特徴とする特許請求の範囲1記載の画
像形成の促進法。[Scope of Claims] 1 Consists of a base material, a thin film of a metal or metal compound provided thereon, and a photosensitive film, the photosensitive film comprising a binder polymer compound and a quinone-based, diazo-based,
A dry image forming material made of an azide-based or benzophenone photosensitizer and capable of reducing the interfacial adhesion between the metal or metal compound thin film in the photosensitive area and the photosensitive film when exposed to light is exposed through a desired pattern, and then the photosensitive film is peeled off. 1. A method for accelerating image formation, which is characterized in that the exposed image-forming material is held at high temperature for a certain period of time in the presence of moisture. 2. The method for accelerating image formation according to claim 1, characterized in that the exposed image forming material is immersed in hot water at about 40° C. or higher for about 5 minutes or less. 3. A method for accelerating image formation according to claim 1, characterized in that the exposed image forming material is immersed in hot water at a temperature of about 48 to about 68° C. for about 5 to 180 seconds. 4. The method for accelerating image formation according to claim 1, characterized in that the image forming material after exposure is held in an atmosphere of saturated to semi-saturated humidity and about 40 to 80° C. for about 4 minutes or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3720477A JPS53123130A (en) | 1977-04-01 | 1977-04-01 | Method of promoting formation of dried picture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3720477A JPS53123130A (en) | 1977-04-01 | 1977-04-01 | Method of promoting formation of dried picture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53123130A JPS53123130A (en) | 1978-10-27 |
| JPS6149657B2 true JPS6149657B2 (en) | 1986-10-30 |
Family
ID=12491047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3720477A Granted JPS53123130A (en) | 1977-04-01 | 1977-04-01 | Method of promoting formation of dried picture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53123130A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59198445A (en) * | 1983-04-27 | 1984-11-10 | Kimoto & Co Ltd | Image forming material by stripping |
| JPS60238826A (en) * | 1984-05-14 | 1985-11-27 | Kimoto & Co Ltd | Image forming material |
-
1977
- 1977-04-01 JP JP3720477A patent/JPS53123130A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53123130A (en) | 1978-10-27 |
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