JPS6154273B2 - - Google Patents
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- Publication number
- JPS6154273B2 JPS6154273B2 JP54148264A JP14826479A JPS6154273B2 JP S6154273 B2 JPS6154273 B2 JP S6154273B2 JP 54148264 A JP54148264 A JP 54148264A JP 14826479 A JP14826479 A JP 14826479A JP S6154273 B2 JPS6154273 B2 JP S6154273B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor pressure
- pressure transducer
- diaphragm
- semiconductor
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/50—Devices controlled by mechanical forces, e.g. pressure
Landscapes
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Description
【発明の詳細な説明】
この発明は半導体圧力変換装置に関し、特にシ
リコンなどの半導体のピエゾ抵抗効果を利用した
半導体圧力変換装置の構造の改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor pressure transducer, and more particularly to an improvement in the structure of a semiconductor pressure transducer that utilizes the piezoresistance effect of a semiconductor such as silicon.
第1図は従来の半導体圧力変換装置の一例の断
面構造図である。図面を参照して従来の半導体圧
力変換装置の構造を説明すると、半導体単結晶か
ら成る基板をダイアフラム状に加工してダイアフ
ラム1を作り、このダイアフラム1の一方面(図
示では上面)にゲージ抵抗2および金属電極3を
形成する。そして、ダイアフラム1の他方面(図
示では下側)には、断面凹状に形成された支持台
4が接合される。このダイアフラム1と支持台4
とで半導体圧力変換素子を構成する。ダイアフラ
ム1と支持台4とが一体接合された半導体圧力変
換素子は、絶縁パツケージ5の上面に載せられ、
固着される。この絶縁パツケージ5の上面の半導
体圧力変換素子の両側には、外部電極リード6が
半導体圧力変換素子を挾む両側に固着される。こ
の外部電極リード6と金属電極3とが金属電線
(リード線)7で電気的に接続される。 FIG. 1 is a cross-sectional structural diagram of an example of a conventional semiconductor pressure transducer. To explain the structure of a conventional semiconductor pressure transducer with reference to the drawings, a diaphragm 1 is made by processing a substrate made of a semiconductor single crystal into a diaphragm shape, and a gauge resistor 2 is attached to one surface (the upper surface in the figure) of the diaphragm 1. and metal electrode 3 is formed. A support base 4 having a concave cross-section is joined to the other surface (lower side in the drawing) of the diaphragm 1. This diaphragm 1 and support base 4
and constitute a semiconductor pressure transducer element. A semiconductor pressure transducer element in which the diaphragm 1 and the support base 4 are integrally joined is placed on the upper surface of the insulating package 5,
Fixed. External electrode leads 6 are fixed to both sides of the semiconductor pressure transducer on the upper surface of the insulating package 5, sandwiching the semiconductor pressure transducer. The external electrode lead 6 and the metal electrode 3 are electrically connected by a metal wire (lead wire) 7.
このようにして構成された従来の半導体圧力変
換装置は、その使用目的および場所に大きな制限
があつた。それは、ダイアフラム1上に形成され
たゲージ抵抗2、金属電極3、金属電線7が、そ
れぞれ被測定ガス成分によつて影響を受け、腐食
などの劣化を生じるためである。これを防止する
ために、後述の第2図に示すものが提案されてい
る。 The conventional semiconductor pressure transducer configured in this manner has significant limitations in its intended use and location. This is because the gauge resistor 2, metal electrode 3, and metal wire 7 formed on the diaphragm 1 are each affected by the gas component to be measured, causing deterioration such as corrosion. In order to prevent this, the method shown in FIG. 2, which will be described later, has been proposed.
第2図は従来の半導体圧力変換装置の他の例を
示す断面構造図である。第2図の半導体圧力変換
装置が第1図の半導体圧力変換装置と異なる点
は、外部電極リード6より外側の絶縁パツケージ
5上に外側充填用壁部材8を形成しかつ金属電極
3より内側のダイアフラム1上に内側充填用壁部
材8′を設け、両壁部材8,8′で囲まれる部分に
シリコンゴムなどの内部充填材9を充填したもの
である。このように、内部充填材9で金属電極3
や金属電線7や外部電極リード6などの腐食され
易い部分を覆うことにより、被測定ガス成分によ
つて腐食などの悪影響を防止していた。 FIG. 2 is a cross-sectional structural diagram showing another example of a conventional semiconductor pressure transducer. The semiconductor pressure transducer shown in FIG. 2 is different from the semiconductor pressure transducer shown in FIG. An inner filling wall member 8' is provided on the diaphragm 1, and the portion surrounded by both wall members 8, 8' is filled with an inner filler 9 such as silicone rubber. In this way, the metal electrode 3 is
By covering parts that are easily corroded, such as the metal wires 7 and the external electrode leads 6, adverse effects such as corrosion caused by the gas components to be measured are prevented.
第3図は従来の半導体圧力変換装置のさらに他
の例の断面構造図である。第3図に示す圧力変換
装置は、内側充填用壁部材8′を用いることな
く、通常金属酸化物で覆われているゲージ抵抗2
のあるダイアフラム1の上面部分にも、充填材9
を充填することにより、さらにパツシベーシヨン
効果を大きくしたものである。これによつて、パ
ツシベーシヨン効果が飛躍的に延びる。 FIG. 3 is a cross-sectional structural diagram of still another example of a conventional semiconductor pressure transducer. The pressure transducer shown in FIG.
The filler material 9 is also placed on the upper surface of the diaphragm 1.
The passivation effect is further increased by filling the material with . This dramatically increases the passivation effect.
第4図は従来の半導体圧力変換装置のさらに他
の例を示す断面構造図である。第4図に示す半導
体圧力変換装置は、外部電極リード6の両外側の
半導体圧力変換素子を囲む部分に側壁8を形成し
かつ該側壁8で囲まれる部分にシリコンオイルな
どの液体10を入れ、その上面を封止板11で封
止することにより、半導体圧力変換素子を液体1
0に浸した状態で外部圧力を該液体を介して伝え
るようにしたものである。ところが、第4図の構
造は、液体を封じ込めておく必要があるため、封
止板11が必要となり、かつ製作が大変困難とな
る欠点がある。 FIG. 4 is a cross-sectional structural diagram showing still another example of a conventional semiconductor pressure transducer. The semiconductor pressure transducer shown in FIG. 4 has side walls 8 formed on both outer sides of the external electrode lead 6 at the portions surrounding the semiconductor pressure transducer element, and a liquid 10 such as silicone oil placed in the portion surrounded by the side walls 8. By sealing the upper surface with the sealing plate 11, the semiconductor pressure transducer element is sealed with the liquid 1.
External pressure is transmitted through the liquid while the liquid is immersed in water. However, the structure shown in FIG. 4 has the disadvantage that the sealing plate 11 is required because it is necessary to contain the liquid, and that it is very difficult to manufacture.
また、前述の第1図ないし第4図に示す従来の
各半導体圧力変換装置は、その構造上から発生す
る種々の問題点があつた。すなわち、半導体圧力
変換装置の半導体圧力変換素子は、原則的に絶縁
パツケージ5に固着する必要があるが、半導体圧
力変換素子と絶縁パツケージとの熱膨張率の違い
により発生した熱歪み応力が半導体圧力変換素子
内に蓄積されることになり、温度特性上悪影響を
受ける問題点があつた。 Further, each of the conventional semiconductor pressure transducers shown in FIGS. 1 to 4 described above has various problems arising from their structure. In other words, the semiconductor pressure transducer element of the semiconductor pressure transducer needs to be fixed to the insulating package 5 in principle, but thermal strain stress generated due to the difference in thermal expansion coefficient between the semiconductor pressure transducer element and the insulating package causes the semiconductor pressure There was a problem in that the temperature characteristics were adversely affected by the accumulation in the conversion element.
このような問題点の解決方法として、一般的に
は半導体圧力変換素子と同じ熱膨張率またはそれ
に近い熱膨張率の物体を絶縁パツケージ5と半導
体圧力変換素子との間に挾み込み、半導体圧力変
換素子を固着する方法である。しかしながら、こ
のような方法においても、その固着状態が種々に
変化し、温度特性にばらつきが大きいことは否定
できない。 As a solution to these problems, generally an object having the same thermal expansion coefficient as the semiconductor pressure transducer or a thermal expansion coefficient close to it is inserted between the insulating package 5 and the semiconductor pressure transducer, and the semiconductor pressure transducer is This is a method of fixing the conversion element. However, even in such a method, it cannot be denied that the fixed state changes in various ways and the temperature characteristics vary widely.
それゆえ、この発明は上述のような従来のもの
の種々の問題点を解消するためになされたもの
で、温度変化による悪影響を受けることなく、外
部圧力を効率よく伝えるこができるような半導体
圧力変換装置を提供することを目的とする。 Therefore, this invention was made in order to solve the various problems of the conventional ones as described above, and it is a semiconductor pressure converter that can efficiently transmit external pressure without being adversely affected by temperature changes. The purpose is to provide equipment.
この発明の要旨は、温度変化によつて悪影響を
受ける原因が半導体圧力変換素子を絶縁パツケー
ジに固着する場合の異種金属間の熱膨張率の違い
から生じるものであることに鑑みてなされたもの
で、半導体圧力変換素子を熱膨張による変化を吸
収し得るような物質内に埋込んで構成したもので
ある。 The gist of this invention was made in view of the fact that the cause of adverse effects due to temperature changes is caused by the difference in coefficient of thermal expansion between different metals when a semiconductor pressure transducer element is fixed to an insulating package. , a semiconductor pressure transducer element is embedded in a material that can absorb changes due to thermal expansion.
第5図はこの発明の一実施例の半導体圧力変換
装置の断面構造図である。第5図を参照してこの
実施例の半導体圧力変換装置の具体的な構造を説
明すると、ダイアフラム1は単結晶の半導体基板
をダイアフラム状に加工して作られ、その他方面
(図示ではは下側)には支持台4が固着される。
このダイアフラム1と支持台4との接合部分に
は、空洞が形成される。この空洞の形成方法とし
て、図示のようにダイアフラム1の他方面の中心
部を窪み状に形成しかつ支持台4を平面状に形成
して両者を接合したもの、または前述の第1図な
いし第4図に示すようにダイアフラム1の他方面
を同一平面としかつ支持台4の上面側を凹部状に
形成したものであつてもよい。このダイアフラム
1と支持台4とを組合わせて、半導体圧力変換子
を構成する。一方、絶縁パツケージ5は、半導体
圧力変換素子の配置位置より外側に外部電極6を
固着しかつその外側に充填用壁部材8をその上面
に固着して構成し、または絶縁パツケージ5と充
填用壁部材8とを一体的に成形する。そして、充
填用壁部材8で囲まれる部分に、充填材9充填す
る。このとき、充填材9の充填はその中央部分に
半導体圧力変換素子を封入可能な空洞部を形成
し、該空洞部へ半導体圧力変換素子とシリコンオ
イルなどの液体10を封入することによつて行
う。このようにして、半導体圧力変換素子の全体
がシリコンオイルなどの液体に浸された状態で充
填材9によつて封止された構造となる。 FIG. 5 is a cross-sectional structural diagram of a semiconductor pressure transducer according to an embodiment of the present invention. The specific structure of the semiconductor pressure transducer of this embodiment will be explained with reference to FIG. 5. The diaphragm 1 is made by processing a single crystal semiconductor substrate into a diaphragm shape, ) is fixed to a support base 4.
A cavity is formed at the joint between the diaphragm 1 and the support base 4. As a method of forming this cavity, the center of the other side of the diaphragm 1 is formed into a hollow shape as shown in the figure, and the support base 4 is formed into a flat shape and the two are joined together, or the method shown in FIGS. As shown in FIG. 4, the other surface of the diaphragm 1 may be made the same plane, and the upper surface side of the support base 4 may be formed in a concave shape. This diaphragm 1 and support base 4 are combined to constitute a semiconductor pressure transducer. On the other hand, the insulating package 5 has an external electrode 6 fixed to the outside of the arrangement position of the semiconductor pressure transducer element and a filling wall member 8 fixed to the upper surface of the external electrode 6, or the insulating package 5 and the filling wall are fixed to the outside thereof. The member 8 is integrally molded. Then, the portion surrounded by the filling wall member 8 is filled with a filling material 9. At this time, filling of the filler 9 is carried out by forming a cavity in the center thereof into which a semiconductor pressure transducer can be enclosed, and filling the cavity with the semiconductor pressure transducer and a liquid 10 such as silicone oil. . In this way, a structure is obtained in which the entire semiconductor pressure transducer element is immersed in a liquid such as silicone oil and sealed with the filler material 9.
第5図の実施例のよつに構成すれば、絶縁パツ
ケージ5と半導体圧力変換素子(支持台)とが何
等接触せず、充填材または液体を介しているた
め、温度変化があつても熱膨張率の差異による悪
影響を防止できる利点がある。また、半導体圧力
変換素子が液体中に浮かんでおりかつこの液体を
内部充填材で封止しているため、外部からの振動
が加わつたとしても液体を包み込んでいる充填材
9がこれらの振動を吸収し、振動によつて悪影響
を受けない利点がある。また、温度特性において
も、半導体圧力変換素子が液体10内で浮いてい
る状態であるため、熱膨張張率の異なる部分が何
等接触せず、半導体圧力変換素子は完全に自由状
態となり、良好な温度特性が得られる利点があ
る。 If configured as in the embodiment shown in FIG. 5, the insulating package 5 and the semiconductor pressure transducing element (supporting base) do not come into contact with each other in any way, but through the filler or liquid, so even if there is a temperature change, heat will not be generated. This has the advantage of preventing adverse effects due to differences in expansion rates. Furthermore, since the semiconductor pressure transducer element is floating in the liquid and the liquid is sealed with an internal filling material, even if vibrations are applied from the outside, the filling material 9 surrounding the liquid will absorb these vibrations. It has the advantage of absorbing and not being adversely affected by vibrations. In addition, in terms of temperature characteristics, since the semiconductor pressure transducer is floating in the liquid 10, parts with different coefficients of thermal expansion do not come into contact with each other, and the semiconductor pressure transducer is in a completely free state, resulting in a good condition. It has the advantage of providing good temperature characteristics.
第6図はこの発明の他の実施例の半導体圧力変
換装置の断面構造図である。この実施例が第5図
と異なる点は、半導体圧力変換素子の一部(図示
ではダイアフラム1)が液体10に浸された状態
となり、他の部分(支持台4)が充填材で充填さ
れた状態に固定したものである。第6図のような
構造は、たとえば半導体圧力変換素子を絶縁パツ
ケージ5の面から浮かせた状態で充填材9を充填
し、途中で液体10をダイアフラム1上に入れ、
その周囲をさらに充填材で充填することによつ
て、ダイアフラム1が液体に接した状態で封止す
るように作られる。なお、第5図と同一部分は同
一参照符号で示し、その説明を省略する。 FIG. 6 is a cross-sectional structural diagram of a semiconductor pressure transducer according to another embodiment of the present invention. This embodiment differs from FIG. 5 in that a part of the semiconductor pressure transducer element (the diaphragm 1 in the figure) is immersed in the liquid 10, and the other part (the support base 4) is filled with a filler. It is fixed in a state. In the structure shown in FIG. 6, for example, the semiconductor pressure transducer element is suspended from the surface of the insulating package 5 and filled with a filler 9, and a liquid 10 is poured onto the diaphragm 1 midway.
By further filling the periphery with a filler material, the diaphragm 1 is made to be sealed in contact with the liquid. Note that the same parts as in FIG. 5 are indicated by the same reference numerals, and the explanation thereof will be omitted.
第6図の実施例のように構成すれば、半導体圧
力変換素子が充填材のゲル状物質によつて支えら
れるため、一層耐振動性を増加できる利点があ
る。 If the structure is as shown in the embodiment shown in FIG. 6, the semiconductor pressure transducer element is supported by the gel-like filler material, so there is an advantage that the vibration resistance can be further increased.
第7図はこの発明のさらに他の実施例の半導体
圧力変換装置の断面図である。この実施例では、
半導体圧力変換素子を絶縁パツケージ5の面から
浮かせた状態でかつダイアフラム1のすこし上面
まで充填材9で充填し、ダイアフラム1の上面だ
け液体10を封止するようにさらに充填材で充填
して構成したもである。なお、第5図と同一部分
は同一参照符号で示す。 FIG. 7 is a sectional view of a semiconductor pressure transducer according to still another embodiment of the present invention. In this example,
The semiconductor pressure transducer element is held floating above the surface of the insulating package 5 and filled with a filler 9 up to a slightly upper surface of the diaphragm 1, and further filled with a filler so as to seal the liquid 10 only on the upper surface of the diaphragm 1. It's a thing. Note that the same parts as in FIG. 5 are indicated by the same reference numerals.
第7図の実施例のように構成すれば、外部圧力
を効率よく半導体圧力変換素子のダイアフラム1
に伝えることができる利点がある。 If configured as in the embodiment shown in FIG. 7, the external pressure can be efficiently transferred to the diaphragm 1 of the semiconductor pressure converting element.
There are advantages that can be conveyed to
以上のように、この発明によれば、温度特性が
優れ、外部圧力を効率的に半導体圧力変換素子に
伝えらることができるような半導体圧力変換装置
が実現できる。 As described above, according to the present invention, it is possible to realize a semiconductor pressure transducer device that has excellent temperature characteristics and can efficiently transmit external pressure to a semiconductor pressure transducer element.
第1図、第2図、第3図、第4図は従来の半導
体圧力変換装置の断面構造図である。第5図はこ
の発明の一実施例の半導体圧力変換装置の断面構
造図である。第6図および第7図はこの発明の他
の実施例の半導体圧力変換装置の断面構造図であ
る。
図において、1はダイアフラム、2はゲージ抵
抗、3は金属電極、4は支持台、5は支持パツケ
ージ、6は外部電極リード、7は金属電線、8は
充填用壁部材、9は充填材、10は液体を示す。
1, 2, 3, and 4 are cross-sectional structural views of conventional semiconductor pressure transducers. FIG. 5 is a cross-sectional structural diagram of a semiconductor pressure transducer according to an embodiment of the present invention. 6 and 7 are cross-sectional structural views of a semiconductor pressure transducer according to another embodiment of the present invention. In the figure, 1 is a diaphragm, 2 is a gauge resistor, 3 is a metal electrode, 4 is a support base, 5 is a support package, 6 is an external electrode lead, 7 is a metal wire, 8 is a filling wall member, 9 is a filling material, 10 indicates liquid.
Claims (1)
状に加工しかつその一方面側の上面に拡散ゲージ
層を形成して成るダイアフラムと、該ダイアフラ
ムの他方面側に接合されかつ該ダイアフラムの他
方面側との間に空洞を形成するための支持台とか
ら構成される半導体圧力変換素子、 その一方端が前記半導体圧力変換素子に電気的
に接続される金属電線、 前記金属電線の他方端側に電気的に接続される
外部電極リード、 前記外部電極リードを電気的に絶縁支持しかつ
該外部電極リードより外側の前記半導体圧力変換
素子の配置周囲を囲む部分に壁部材を形成して成
る絶縁パツケージ、および 前記半導体圧力変換素子を前記絶縁パツケージ
内に入れた状態において、少なくとも半導体圧力
変換素子の一方面が液体に浸るように該半導体圧
力変換素子と液体とを一体的に封止する充填材を
備えた、半導体圧力変換装置。 2 前記充填材は、前記半導体圧力変換素子の全
体が液体に浸るように液体と半導体圧力変換素子
とを封止する、特許請求の範囲第1項記載の半導
体圧力変換装置。 3 前記充填材は、耐雰囲気材料である、特許請
求の範囲第1項または第2項記載の半導体圧力変
換装置。 4 前記充填材は、電気絶縁材料である、特許請
求の範囲第1項または第2項記載の半導体圧力変
換装置。 5 前記充填材は、可撓性材料である、特許請求
の範囲第1項または第2項記載の半導体圧力変換
装置。 6 半導体結晶装置から成る基板をダイアフラム
状に加工しかつその一方面側の上面に拡散ゲージ
層を形成して成るダイアフラムと、該ダイアフラ
ムの他方面側に接合さかつ該ダイアフラムの他方
面側との間に空洞を形成するための支持台とから
構成される半導体圧力変換素子、 その一方端が前記半導体圧力変換素子に電気的
に接続される金属電線、 前記金属電線の他方端側に電気的に接続される
外部電極リード、 前記外部電極リードを電気的に絶縁支持しかつ
該外部電極リードより外側の前記半導体圧力変換
素子の配置周囲を囲む部分に壁部材を形成して成
る絶縁パツケージ、および 前記半導体圧力変換素子を前記絶縁パツケージ
内へ入れた状態で該半導体圧力変換素子の周囲に
充填され、かつ該半導体圧力変換素子の一方面側
の上面に対向して半導体圧力変換素子と接しない
ように液体を封止した充填材を備えた、半導体圧
力変換装置。[Scope of Claims] 1. A diaphragm formed by processing a substrate made of a semiconductor crystal device into a diaphragm shape and forming a diffusion gauge layer on the upper surface of one side of the diaphragm, and a diaphragm bonded to the other side of the diaphragm. a support for forming a cavity between the semiconductor pressure transducer and the other surface of the semiconductor pressure transducer, a metal wire having one end electrically connected to the semiconductor pressure transducer, and the other end of the metal wire. an external electrode lead that is electrically connected to an end side; a wall member is formed in a portion that electrically insulates and supports the external electrode lead and surrounds a periphery of the semiconductor pressure transducing element outside the external electrode lead; an insulating package consisting of the semiconductor pressure transducing element, and integrally sealing the semiconductor pressure transducing element and the liquid so that at least one side of the semiconductor pressure transducing element is immersed in the liquid when the semiconductor pressure transducing element is placed in the insulating package. Semiconductor pressure transducer with filler. 2. The semiconductor pressure transducer device according to claim 1, wherein the filler seals the semiconductor pressure transducer between the liquid and the semiconductor pressure transducer so that the entire semiconductor pressure transducer is immersed in the liquid. 3. The semiconductor pressure transducer according to claim 1 or 2, wherein the filler is an atmosphere-resistant material. 4. The semiconductor pressure transducer device according to claim 1 or 2, wherein the filler is an electrically insulating material. 5. The semiconductor pressure transducer according to claim 1 or 2, wherein the filler is a flexible material. 6 A diaphragm formed by processing a substrate made of a semiconductor crystal device into a diaphragm shape and forming a diffusion gauge layer on the upper surface of one side of the diaphragm, and a diaphragm that is bonded to the other side of the diaphragm and formed on the other side of the diaphragm. a support base for forming a cavity therebetween; a metal electric wire having one end electrically connected to the semiconductor pressure conversion element; and an electric wire connected to the other end of the metal electric wire. an external electrode lead to be connected; an insulating package that electrically insulates and supports the external electrode lead and includes a wall member formed in a portion surrounding the arrangement of the semiconductor pressure transducing element outside the external electrode lead; Filled around the semiconductor pressure transducer while the semiconductor pressure transducer is placed in the insulating package, and facing the upper surface of one side of the semiconductor pressure transducer so as not to be in contact with the semiconductor pressure transducer. A semiconductor pressure transducer equipped with a liquid-sealed filling material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14826479A JPS5669849A (en) | 1979-11-12 | 1979-11-12 | Semiconductor pressure converting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14826479A JPS5669849A (en) | 1979-11-12 | 1979-11-12 | Semiconductor pressure converting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5669849A JPS5669849A (en) | 1981-06-11 |
| JPS6154273B2 true JPS6154273B2 (en) | 1986-11-21 |
Family
ID=15448874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14826479A Granted JPS5669849A (en) | 1979-11-12 | 1979-11-12 | Semiconductor pressure converting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5669849A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0530111Y2 (en) * | 1987-06-25 | 1993-08-02 | ||
| US6883380B2 (en) * | 2003-05-16 | 2005-04-26 | Rosemount Inc | Pressure sensor capsule |
| JP2006329883A (en) * | 2005-05-27 | 2006-12-07 | Hitachi Ltd | Gas pressure detector |
| JP4863372B2 (en) * | 2006-09-01 | 2012-01-25 | 日東工業株式会社 | Circuit breaker for wiring |
| JP5648586B2 (en) * | 2011-05-31 | 2015-01-07 | 株式会社デンソー | Pressure sensor |
-
1979
- 1979-11-12 JP JP14826479A patent/JPS5669849A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5669849A (en) | 1981-06-11 |
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