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JPS6156620B2 - - Google Patents
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JPS6156620B2 - - Google Patents

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Publication number
JPS6156620B2
JPS6156620B2 JP53068829A JP6882978A JPS6156620B2 JP S6156620 B2 JPS6156620 B2 JP S6156620B2 JP 53068829 A JP53068829 A JP 53068829A JP 6882978 A JP6882978 A JP 6882978A JP S6156620 B2 JPS6156620 B2 JP S6156620B2
Authority
JP
Japan
Prior art keywords
plating
diode
holding
electronic components
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53068829A
Other languages
Japanese (ja)
Other versions
JPS54160165A (en
Inventor
Yukio Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6882978A priority Critical patent/JPS54160165A/en
Publication of JPS54160165A publication Critical patent/JPS54160165A/en
Publication of JPS6156620B2 publication Critical patent/JPS6156620B2/ja
Granted legal-status Critical Current

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  • Coating With Molten Metal (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】 本発明は電子部品におけるリードを連続的にめ
つきする装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for continuously plating leads on electronic components.

一般にダイオード等の電子部品は配線基板等へ
の取り付けにあつて、電子部品のリードと配線基
板の端子との電気的接続を良好とすべく半田で両
者を固定する方法が採用されている。このため、
ダイオードのリードには半田めつきが施こされ
る。
Generally, when attaching electronic components such as diodes to wiring boards, etc., a method is adopted in which leads of the electronic components and terminals of the wiring board are fixed with solder in order to achieve good electrical connection between the leads and the terminals of the wiring board. For this reason,
The diode leads are soldered.

従来、これら半田めつき方法の一つに、溶融半
田浸漬法が知られている。これは、溶融半田内に
前処理を施こしたダイオードのリードを一時的に
浸漬させてリードを半田で被う方法である。めつ
き装置としては、(1)、単に溶融した半田を入れる
溶融型めつき装置、(2)、溶融状態の半田に振動を
与える超音波発振機構付めつき装置、(3)、溶融半
田をその液面よりも部分的に高く噴流させるフロ
ーソルダ型めつき装置等が知られている。
Conventionally, a molten solder dipping method is known as one of these solder plating methods. This is a method in which pretreated diode leads are temporarily immersed in molten solder to cover them with solder. The plating devices include (1) a molten type plating device that simply inserts molten solder, (2) a plating device with an ultrasonic oscillation mechanism that vibrates the molten solder, and (3) a plating device that applies molten solder. Flow solder type plating devices and the like are known in which the liquid is jetted partially higher than the liquid level.

しかし、(1)の装置では、リードに半田が良好に
付着するには、活性剤(めつき促進剤)となるフ
ラツクスを液中に投与しなければならない。この
フラツクスはめつき後は被処理物から除去する必
要があるため、めつき後に洗浄処理が必要とな
り、作業工程が増加する欠点がある。
However, in the device (1), in order for the solder to adhere well to the leads, flux, which serves as an activator (plating promoter), must be administered into the liquid. Since this flux needs to be removed from the object to be treated after plating, cleaning treatment is required after plating, which has the drawback of increasing the number of work steps.

(2)の装置では、超音波発振によつてリードと溶
融半田との接触面が活性化するため、フラツクス
は使用しなくともよく、めつき後に洗浄処理を行
なう必要もない利点はある。しかし、溶融半田の
液面部分は空気と接触するため酸化し易く、容易
に酸化物が発生してしまい、この酸化物が液面全
体を被う。このため、酸化防止剤(ピーナツツ
油、バーム油等)を用いない場合には、しばしば
機械的に液面に浮遊する酸化物を除去しなければ
ならない。したがつて、連続状態で被めつき物を
めつき槽内に入れることはできない欠点がある。
In the device (2), the contact surface between the lead and the molten solder is activated by ultrasonic oscillation, so there is no need to use flux and there is no need for cleaning after plating. However, since the liquid surface portion of the molten solder comes into contact with air, it is easily oxidized and oxides are easily generated, and this oxide covers the entire liquid surface. Therefore, when antioxidants (peanut oil, balm oil, etc.) are not used, oxides floating on the liquid surface often have to be mechanically removed. Therefore, there is a drawback that the object to be plated cannot be continuously placed in the plating tank.

(3)の装置では、噴流口から順次酸化されていな
い溶融半田が流出し、涌き出した溶融半田が空気
に触れて一部に酸化を生じても、これら酸化物は
ガイド16の外に流れ出るため、被めつき物には
酸化物が付着しにくい。このため、酸化物除去を
行なわなくともよいので、被めつき物の連続的な
浸漬も可能であるが、この装置では被めつき物へ
の半田の付着を良好とするためにはフラツクスを
溶融半田中に混入させなければならない。
In the device (3), unoxidized molten solder sequentially flows out from the jet port, and even if the molten solder that flows out comes into contact with air and is partially oxidized, these oxides flow out of the guide 16. Therefore, oxides are less likely to adhere to coated objects. For this reason, there is no need to remove oxides, so it is possible to continuously immerse the object to be plated, but in order to improve the adhesion of solder to the object with this device, it is necessary to melt the flux. It must be mixed into the solder.

また、これらのめつき装置を用いてダイオード
のリードに半田めつきを施こす場合には、従来、
ダイオードのガラス外囲器から両方向に突出する
リードをそれぞれ別々にめつきするため、めつき
処理の作業性が低い難点もあつた。
In addition, when applying solder plating to diode leads using these plating devices, conventionally,
Since the leads protruding in both directions from the diode's glass envelope were plated separately, the workability of the plating process was low.

したがつて、本発明の目的は、めつき後の洗浄
処理を必要とせず、かつ連続的に効率よく被めつ
き部分を複数有する被めつき物に良好なめつきを
施こすことのできるめつき装置を提供することに
ある。
Therefore, an object of the present invention is to provide a plating method that does not require cleaning treatment after plating and can continuously and efficiently apply good plating to a plated object having a plurality of plated parts. The goal is to provide equipment.

このような目的を達成するために本発明は、直
列状態に配設される2つのめつき槽上を自動的に
被めつき物を供給、搬出される搬送機構を移動さ
せ、搬送機構の各保持部に磁力で保持された被め
つき物を一方のめつき槽で被めつき物の一部をめ
つきし、他方のめつき槽で被めつき物の他の部分
をめつきするものであり、かつそれぞれのめつき
槽にあつては溶融半田液面から盛り上がつた半田
部分は超音波振動が加えられるフローソルダ構造
とするとともに、搬送機構にあつては2つのめつ
き槽間で保持部における被めつき物の保持状態を
上下に変換する反転機構を有するものであつて、
以下実施例により本発明を説明する。
In order to achieve such an object, the present invention moves a conveying mechanism that automatically supplies and carries out plating objects on two plating tanks arranged in series, and each of the conveying mechanisms A device that uses one plating tank to plate a part of the plated object that is magnetically held in the holding part, and then plate the other part of the plated object in the other plating tank. In addition, each plating tank has a flow solder structure in which ultrasonic vibration is applied to the solder part that rises from the molten solder liquid level, and the transfer mechanism has a It has an inversion mechanism that changes the holding state of the covered object in the holding part up and down,
The present invention will be explained below with reference to Examples.

第1図〜第4図は本発明の電子部品におけるリ
ード連続めつき装置の一実施例を示し、第1図は
その概要を示す外観図、第2図はめつき状態を示
す一部断面図、第3図はダイオードの搬送機構の
一部を示す分解斜視図、第4図はダイオードの反
転機構を示す一部断面平面図である。第1図には
直列状態に配設される第1めつき槽1および第2
めつき槽2が示されている。これらのめつき槽は
いずれも同一構造のめつき槽であつて、ヒータを
底部に有するめつき槽3を水平方向に延びる隔離
板4で上室5、下室6に分けるとともに、この隔
離板4の2箇所に孔を明け、一方の孔には回転機
構7によつて回転するインペラを嵌め込み、イン
ペラの回転によつて上室5のめつき液(たとえば
溶融半田)8を下室6内に流し込ませ、高圧状態
となる溶融半田を他方の孔(噴流口9)から隔離
板4の上方に噴き上げる構造となつている。ま
た、前記噴流口9の周縁は溶融半田液面よりも高
く突出し噴流半田の流れのガイド10となつてい
ることから、噴流半田は溶融半田液面よりも高く
噴流することになる。また、ガイド10の一部に
は、斜上方から2台の超音波発振機構11の発振
子12が貫通して入り込み、発振子12の振動に
よつてガイド10内の噴流半田を超音波振動させ
るようになつている。
1 to 4 show an embodiment of the continuous lead plating device for electronic components of the present invention, FIG. 1 is an external view showing the outline thereof, and FIG. 2 is a partial sectional view showing the plating state. FIG. 3 is an exploded perspective view showing a part of the diode transport mechanism, and FIG. 4 is a partially sectional plan view showing the diode reversing mechanism. FIG. 1 shows a first plating tank 1 and a second plating tank arranged in series.
A plating tank 2 is shown. All of these plating tanks have the same structure, and a plating tank 3 having a heater at the bottom is divided into an upper chamber 5 and a lower chamber 6 by a horizontally extending separator 4, and this separator Holes are made in two places in 4, and an impeller rotated by a rotating mechanism 7 is fitted into one of the holes, and the plating liquid (for example, molten solder) 8 in the upper chamber 5 is transferred into the lower chamber 6 by the rotation of the impeller. The structure is such that the molten solder flows into the separator plate 4, and the molten solder under high pressure is blown up from the other hole (jet port 9) above the separator plate 4. Furthermore, since the peripheral edge of the jet port 9 protrudes higher than the molten solder liquid level and serves as a guide 10 for the flow of the jet solder, the jet solder is jetted higher than the molten solder liquid level. Further, the oscillators 12 of two ultrasonic oscillation mechanisms 11 penetrate and enter a part of the guide 10 from diagonally above, and the vibrations of the oscillators 12 cause the solder jet inside the guide 10 to vibrate ultrasonically. It's becoming like that.

一方、両めつき槽3の上方には第1図に示すよ
うにチエン機構からなる無限軌道を描いて動く第
1・第2搬送機構13,14がそれぞれ配設され
ている。これら搬送機構13,14は第2図およ
び第3図に示すような構造の保持機構15を有し
ている。すなわち、この保持機構15はコの字形
の非磁性材からなる保持ブロツク16と、この保
持ブロツク16の窪みに取り付けられた永久磁石
17とからなり、前記保持ブロツク16はねじ1
8によつてチエン19に取り付けられるアタツチ
メント20に固定される。また、保持ブロツク1
6の側面(チエンの側面と平行ね面)には鉛直方
向に沿つて延びる3本の収容溝21が設けられて
いる。これらの収容溝21は底部がV字溝底とな
る長溝となつていて、被めつき物であるたとえば
ダイオード22のガラス部分23および金属から
なるリード24も入ることができるようになつて
いる。また、収容溝21が設けられる収容面25
の一側縁は薄い遮弊片26となつて収容面25の
延長上に延びている。また、この遮弊片26の厚
さaと同一寸法のbだけ他側縁は部分的に窪んだ
窪み27を形作つていて隣りの保持ブロツク16
の遮弊片26が臨むようになつている。これは隣
り合う保持ブロツク26がチエン19の屈曲によ
つてもその間に隙間が生じたりしないために設け
たものであり、特に保持ブロツク16の収容溝2
1にダイオード22を磁力によつて吸着する際、
ダイオード22が隣接する保持ブロツク間に挾ま
れないように配慮された結果である。
On the other hand, above both plating tanks 3, as shown in FIG. 1, first and second conveyance mechanisms 13 and 14, which are composed of chain mechanisms and move in endless tracks, are respectively disposed. These transport mechanisms 13 and 14 have a holding mechanism 15 having a structure as shown in FIGS. 2 and 3. That is, this holding mechanism 15 consists of a U-shaped holding block 16 made of a non-magnetic material, and a permanent magnet 17 attached to a recess of this holding block 16.
8 to an attachment 20 attached to the chain 19. Also, holding block 1
Three housing grooves 21 extending in the vertical direction are provided on the side surface of the chain 6 (a surface parallel to the side surface of the chain). These housing grooves 21 are long grooves with a V-shaped groove bottom, and are adapted to accommodate a plated object such as a glass portion 23 of a diode 22 and a lead 24 made of metal. In addition, a housing surface 25 in which the housing groove 21 is provided.
One side edge serves as a thin shielding piece 26 that extends on the extension of the accommodation surface 25. Further, the other side edge of the shielding piece 26 forms a partially recessed recess 27 by the same dimension b as the thickness a, so that the adjacent holding block 16
The shielding piece 26 of the screen is made to face. This is provided to prevent gaps from forming between adjacent holding blocks 26 even when the chain 19 is bent.
When attracting the diode 22 to 1 by magnetic force,
This is the result of consideration being taken so that the diode 22 is not sandwiched between adjacent holding blocks.

前記第1搬送機構13は28〜35で示すガイ
ド(ガイドローラ)に沿つて移動する。28およ
び29のガイド間は水平移動部であり、ローダ部
36を横切り、ローダ部36に保持されているダ
イオード22を保持機構15の各収容溝21に収
容するようになつている。ローダ部36はコの字
形断面となり、上下に平行に磁力線が走つてい
る。したがつて、この中ではダイオード22のリ
ード24は磁化されて互いに離れて上下方向に延
びる。29,30のガイド間では下り勾配となる
とともに、その上部にはチエンの傾斜よりも急な
傾斜を有する位置修正板37が配設され、保持機
構15に吸着保持されたダイオード22の上端が
下降に伴なつて下方に押し下げられ、ダイオード
22が位置修正板37から外れた時点では常に保
持ブロツク16に対するダイオード22の位置は
一定となるようになつている。すなわち、第2図
で示すように収容溝21内にはダイオード22の
上部のリード24のみが入り、下部のリード24
はめつきし易いように保持ブロツク16の下端よ
りも下方に突出する。30,31のガイド間では
再び水平に移動し、この間で第2図に示づように
下部のリード24を噴流半田液中に浸漬するよう
になつている。31,32のガイド間では上り勾
配で上昇し、32,33のガイド間で再び水平移
動となる。また、33,34のガイド間ではチエ
ンが反転状態となつて水平に移動する。このた
め、めつきされたリード24が上方に位置し、め
つきを施こされていないリード24が下方に位置
する。また、第4図に示すように、この移動域を
斜に横切つて除去棒38が配設されている。この
除去棒38はチエンが前進するにつれて、収容溝
21内のダイオード22がその底から入口部に向
かつて移動するようになつている。そして、保持
機構15から外れたダイオード22は鉛直方向に
平行磁束を形作る移換ストツカ39内に入り、磁
界中に保持される。また、この移換ストツカ39
の各部の磁力は不均一であつて、第4図に示すよ
うに、ダイオード22は順次矢印の方向に進むよ
うに磁力は徐々に強くなつている。また、34,
35のガイド間では上り勾配となり28のガイド
の上縁の高さと同じ高さとし、35,28のガイ
ド間では再び水平移動部となつている。そして、
この水平移動部は管状のヒータ40内を通るよう
になつていて、保持したダイオード22を予備加
熱するべくチエンが予備加熱されるようになつて
いる。
The first conveyance mechanism 13 moves along guides (guide rollers) indicated by 28 to 35. Between the guides 28 and 29 is a horizontally moving part, which crosses the loader part 36 and accommodates the diode 22 held by the loader part 36 in each accommodation groove 21 of the holding mechanism 15. The loader section 36 has a U-shaped cross section, and lines of magnetic force run vertically in parallel. Therein, therefore, the leads 24 of the diode 22 are magnetized and extend vertically away from each other. There is a downward slope between the guides 29 and 30, and a position correction plate 37 having a slope steeper than that of the chain is disposed above the guide, and the upper end of the diode 22 held by the holding mechanism 15 is lowered. The position of the diode 22 with respect to the holding block 16 is always constant at the time when the diode 22 is pushed downward and removed from the position correction plate 37. That is, as shown in FIG. 2, only the upper lead 24 of the diode 22 enters the accommodation groove 21, and the lower lead 24
It protrudes below the lower end of the holding block 16 to facilitate fitting. The guides 30 and 31 are again moved horizontally, and during this time the lower leads 24 are immersed in the jet soldering liquid, as shown in FIG. Between the guides 31 and 32, it rises at an upward slope, and between the guides 32 and 33, it moves horizontally again. Further, between the guides 33 and 34, the chain is inverted and moves horizontally. Therefore, the plated leads 24 are located at the top, and the unplated leads 24 are located at the bottom. Further, as shown in FIG. 4, a removal rod 38 is disposed diagonally across this moving area. This removal rod 38 is arranged so that as the chain moves forward, the diode 22 in the receiving groove 21 moves from the bottom toward the entrance. The diode 22 removed from the holding mechanism 15 enters the transfer stocker 39 that forms parallel magnetic flux in the vertical direction, and is held in the magnetic field. Also, this transfer stocker 39
The magnetic force at each part is non-uniform, and as shown in FIG. 4, the magnetic force gradually becomes stronger as the diode 22 sequentially moves in the direction of the arrow. Also, 34,
Between the guides 35 and 28 there is an upward slope and the height is the same as the upper edge of the guide 28, and between the guides 35 and 28 there is again a horizontal movement section. and,
This horizontally moving section passes through a tubular heater 40, and the chain is preheated to preheat the diode 22 held therein.

他方、前記第2搬送機構14は41〜46で示
すガイド(ガイドローラ)に沿つて移動する。こ
の第2搬送機構14は前記第1搬送機構13とほ
とんど同じである。すなわち、41,42のガイ
ド間の水平移動域は前記移換ストツカ39の磁力
が強い領域を通過し、上部リードを半田めつきし
たダイオード22を保持ブロツク16に磁力で吸
着保持して進む。また、42,43のブロツク間
では位置修正板47によつて保持ブロツク16の
下端面よりも下方に下方のリードを突出するよう
に修正され、43,44のガイド間で下方のリー
ド24を噴流半田液中に入れてめつきし、44,
45のガイド間で上昇し、45,46間の水平移
動域でチエンと交差するように配設された除去棒
48に引つ掛つてダイオード22は収容溝21か
ら外れて脱落し、下方のシユータ49内に入り、
このシユータ49によつて所望の位置に運ばれる
ようになつている。また、46,41のガイド間
は再び水平移動域となるとともに、この移動域は
管状のヒータ50内を通過し、予備加熱されるよ
うになつている。
On the other hand, the second transport mechanism 14 moves along guides (guide rollers) indicated by 41 to 46. This second transport mechanism 14 is almost the same as the first transport mechanism 13. That is, the horizontal movement range between the guides 41 and 42 passes through an area where the magnetic force of the transfer stocker 39 is strong, and the diode 22 whose upper lead is soldered is attracted and held by the holding block 16 by the magnetic force. Further, between the blocks 42 and 43, the lower lead 24 is corrected by the position correction plate 47 so as to protrude below the lower end surface of the holding block 16, and the lower lead 24 is moved between the guides 43 and 44. Put it in solder liquid and plate it, 44,
The diode 22 rises between the guides 45 and 48, and is caught by the removal rod 48 disposed to intersect with the chain in the horizontal movement area between 45 and 46, and the diode 22 is detached from the housing groove 21 and falls off. Enter 49,
The shutter 49 allows it to be carried to a desired position. Moreover, the area between the guides 46 and 41 becomes a horizontal movement area again, and this movement area passes through the tubular heater 50 and is preheated.

このような実施例によれば、被めつき物である
ダイオードは第1搬送機構によつて連続搬送され
ている間に一方のリードを半田めつきされ、反転
して移換ストツカ39内に入れられた一方をめつ
きされたダイオードは第2搬送機構によつて連続
搬送されている間に残りの他方のリードを半田め
つきされる。したがつて作業性がよい。また、め
つき槽は噴流構造であり、かつ噴流めつき液は超
音波振動状態にある。このため、フラツクスや酸
化防止剤等をめつき液中に混入させなくとも所望
のめつきが行なえる。また、これらの添加液を用
いないことから、従来必要としていためつき後の
洗浄作業も不要となる。
According to this embodiment, one lead of the diode to be plated is soldered while being continuously transported by the first transport mechanism, and the diode is reversed and placed in the transfer stocker 39. While the diode which has been plated on one side is continuously transported by the second transport mechanism, the remaining lead on the other side is solder-plated. Therefore, workability is good. Further, the plating bath has a jet structure, and the jet plating liquid is in an ultrasonic vibration state. Therefore, desired plating can be performed without mixing flux, antioxidant, etc. into the plating solution. Furthermore, since these additives are not used, the cleaning operation after staining that was conventionally required is also unnecessary.

なお、本発明は前記実施例に限定されない。す
なわち、実施例では2組(2本)のチエンを用い
たが、一本のチエンを2つのめつき槽上に配設し
てもよい。この場合には、途中でチエンを180度
捩つてダイオードの上下を変えればよい。
Note that the present invention is not limited to the above embodiments. That is, although two sets (two chains) of chains were used in the embodiment, one chain may be disposed on two plating tanks. In this case, just twist the chain 180 degrees midway to change the top and bottom of the diode.

また、第5図に示すように、めつき槽3の上部
をカバー51で被い、このカバー内に供給管52
から窒素ガスを供給するようにしてもよい。ま
た、カバー51には被めつき物を挿入する挿入口
53を設けておく。この結果、めつき液は酸素に
触れることはないので、酸化することはなく、良
質のめつきが得られる利点がある。
Further, as shown in FIG. 5, the upper part of the plating tank 3 is covered with a cover 51, and a supply pipe 52
Nitrogen gas may also be supplied from. Further, the cover 51 is provided with an insertion opening 53 into which a covered object is inserted. As a result, the plating solution does not come into contact with oxygen, so it does not oxidize and has the advantage of providing high-quality plating.

さらに、本発明のめつき装置によれば、被めつ
き物としては磁力で吸着できる電子部品ならば、
ダイオードに限らない。
Furthermore, according to the plating apparatus of the present invention, as long as the object to be plated is an electronic component that can be attracted by magnetic force,
Not limited to diodes.

以上のように、本発明の電子部品におけるリー
ド連続めつき装置によれば、めつき後の洗浄処理
を必要とせず、かつ連続的に効率よく被めつき部
分を複数有する被めつき物に良好なめつきを施こ
すことができる。
As described above, the continuous lead plating device for electronic components of the present invention does not require cleaning treatment after plating, and is suitable for continuous and efficient plating of objects having a plurality of plated parts. Can be tanned.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のダイオードにおけるリードの
連続めつき装置の一実施例を示す斜視図、第2図
は同じくめつき状態を示す断面図、第3図は同じ
くダイオードを保持搬送する搬送機構の一部分解
斜視図、第4図は同じくダイオードの反転機構の
断面図、第5図は本発明の他の実施例による一部
断面図である。 1……第1めつき槽、2……第2めつき槽、3
……めつき槽、4……隔離板、5……上室、6…
…下室、7……回転機構、8……めつき液(溶融
半田)、9……噴流口、10……ガイド、11…
…超音波発振機構、12……発振子、13……第
1搬送機構、14……第2搬送機構、15……保
持機構、16……保持ブロツク、17……永久磁
石、18……ねじ、19……チエン、20……ア
タツチメント、21……収容溝、22……ダイオ
ード、23……ガラス部分、24……リード、2
5……収容面、26……遮弊片、27……窪み、
28〜35……ガイド、36……ローダ部、37
……位置修正板、38……除去棒、39………移
換ストツカ、40……ヒータ、41〜46……ガ
イド、47……位置修正板、48……除去棒、4
9……シユータ、50……ヒータ、51……カバ
ー、52……供給管、53……挿入口。
FIG. 1 is a perspective view showing an embodiment of the continuous lead plating device for diodes of the present invention, FIG. 2 is a sectional view showing the same plating state, and FIG. 3 is a conveyance mechanism for holding and conveying the diodes. FIG. 4 is a partially exploded perspective view, FIG. 4 is a sectional view of the diode reversing mechanism, and FIG. 5 is a partially sectional view according to another embodiment of the present invention. 1...First plating tank, 2...Second plating tank, 3
...Plating tank, 4...Separation plate, 5...Upper chamber, 6...
... lower chamber, 7 ... rotation mechanism, 8 ... plating liquid (molten solder), 9 ... jet port, 10 ... guide, 11 ...
... Ultrasonic oscillation mechanism, 12 ... Oscillator, 13 ... First transport mechanism, 14 ... Second transport mechanism, 15 ... Holding mechanism, 16 ... Holding block, 17 ... Permanent magnet, 18 ... Screw , 19... Chain, 20... Attachment, 21... Housing groove, 22... Diode, 23... Glass portion, 24... Lead, 2
5... Accommodation surface, 26... Obstruction piece, 27... Recess,
28-35...Guide, 36...Loader section, 37
... Position correction plate, 38 ... Removal rod, 39 ... Transfer stocker, 40 ... Heater, 41 to 46 ... Guide, 47 ... Position correction plate, 48 ... Removal rod, 4
9... Shooter, 50... Heater, 51... Cover, 52... Supply pipe, 53... Insertion port.

Claims (1)

【特許請求の範囲】[Claims] 1 電子部品を磁力で吸着保持する保持部を連続
的に有し、無限軌道を描いて移動する搬送機構
と、搬送機構の下方に直列に配設される2つのめ
つき槽と、搬送機構の一端部に配設され保持部に
電子部品を供給する供給機構と、搬送機構の他端
部に配設され保持部から電子部品を取り外す搬出
機構とを有し、前記めつき槽はフローソルダ構造
であり、かつ盛り上がつためつき液を振動する超
音波振動発振機構を有し、前記搬送機構は2つの
めつき槽間で保持部における電子部品の上下を変
換する反転機構を有し、さらにそれぞれのめつき
槽の供給側には保持部における電子部品の保持位
置を修正する位置修正機構が設けられてなる電子
部品におけるリードの連続めつき装置。
1. A transport mechanism that continuously has a holding part that magnetically attracts and holds electronic components and moves in an endless trajectory, two plating tanks arranged in series below the transport mechanism, and a transport mechanism that moves in an endless trajectory. The plating tank has a flow solder structure, and has a supply mechanism disposed at one end to supply electronic components to the holding section, and a carry-out mechanism disposed at the other end of the conveyance mechanism to remove the electronic components from the holding section. and has an ultrasonic vibration oscillation mechanism that vibrates the plating liquid that swells up, the conveyance mechanism has an inversion mechanism that converts the electronic component in the holding part up and down between the two plating tanks, and further A continuous plating device for leads in electronic components, which is provided with a position correction mechanism for correcting the holding position of the electronic component in the holding section on the supply side of each plating tank.
JP6882978A 1978-06-09 1978-06-09 Continuous plating device for lead of electronic parts Granted JPS54160165A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6882978A JPS54160165A (en) 1978-06-09 1978-06-09 Continuous plating device for lead of electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6882978A JPS54160165A (en) 1978-06-09 1978-06-09 Continuous plating device for lead of electronic parts

Publications (2)

Publication Number Publication Date
JPS54160165A JPS54160165A (en) 1979-12-18
JPS6156620B2 true JPS6156620B2 (en) 1986-12-03

Family

ID=13384975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6882978A Granted JPS54160165A (en) 1978-06-09 1978-06-09 Continuous plating device for lead of electronic parts

Country Status (1)

Country Link
JP (1) JPS54160165A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5886753A (en) * 1981-09-25 1983-05-24 Hitachi Ltd Method and device for surface treating

Also Published As

Publication number Publication date
JPS54160165A (en) 1979-12-18

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