JPS6157682B2 - - Google Patents
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- Publication number
- JPS6157682B2 JPS6157682B2 JP5489281A JP5489281A JPS6157682B2 JP S6157682 B2 JPS6157682 B2 JP S6157682B2 JP 5489281 A JP5489281 A JP 5489281A JP 5489281 A JP5489281 A JP 5489281A JP S6157682 B2 JPS6157682 B2 JP S6157682B2
- Authority
- JP
- Japan
- Prior art keywords
- thermistor
- foil
- insulating substrate
- brazing
- support container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Measuring Temperature Or Quantity Of Heat (AREA)
- Thermistors And Varistors (AREA)
Description
【発明の詳細な説明】
本発明は、温度を検出すべき対象物と機械的に
接触して温度を検出するサーミスタ、たとえば鍋
物調理をする際鍋底を通して鍋内部の調理物の温
度を検出するサーミスタに関するものである。Detailed Description of the Invention The present invention relates to a thermistor that detects temperature by mechanically contacting an object whose temperature is to be detected, such as a thermistor that detects the temperature of food inside a pot through the bottom of the pot when cooking food in a pot. It is related to.
従来、この種温度検出は第1図に示す如く鍋底
1に熱電対2を機械的に接触せしめ、前記熱電対
2の熱起電力を検出することによつてなされてい
た。この時熱電対2を鍋底1に機械的に強固に接
触せしめる為に熱電対2は支持容器3に固定され
ていた。しかし熱起電力は通常小さな値しか得ら
れないという欠点があつた。たとえばアルメルー
クロメル熱電対は耐熱性(空気中500〜1000℃)
に優れ、また安価であるが、〜40μV/℃の起電
力しか発生しない。銅―コンスタンタン熱電対、
白金―白金・ロジウム熱電対もその熱起電力は
(30〜60)μV/℃しか得られないのみならず、
耐熱性が小さい(銅―コンスタンタン熱電対)、
高価である(白金―白金ロジウム熱電対)などの
欠点があつた。その他種々の熱電対が存在する
が、いずれも上記の如き欠点を有していた。上記
の如く小さな熱起電力を電気的に検出して、熱源
の発熱量を制御する場合電気的に大きな増巾をし
なければならないので高価が高くなる、複雑な電
気回路が必要になるなどの欠点も派生した。 Conventionally, this type of temperature detection has been carried out by mechanically bringing a thermocouple 2 into contact with a pot bottom 1 and detecting the thermoelectromotive force of the thermocouple 2, as shown in FIG. At this time, the thermocouple 2 was fixed to the support container 3 in order to bring the thermocouple 2 into strong mechanical contact with the pot bottom 1. However, the drawback is that thermoelectromotive force usually only has a small value. For example, Almeru Cromel thermocouples are heat resistant (500-1000℃ in air)
Although it is excellent in performance and inexpensive, it only generates an electromotive force of ~40 μV/°C. copper-constantan thermocouple,
Platinum-platinum-rhodium thermocouples not only provide a thermoelectromotive force of only (30 to 60) μV/℃;
Low heat resistance (copper-constantan thermocouple),
It had drawbacks such as being expensive (platinum-platinum-rhodium thermocouple). Various other thermocouples exist, but all of them have the drawbacks mentioned above. As mentioned above, when controlling the amount of heat generated by a heat source by electrically detecting a small thermoelectromotive force, a large electrical amplification is required, which increases the cost and requires a complicated electrical circuit. Shortcomings also emerged.
他方上記熱電対に代つてサーミスタを用いて温
度検出をする場合、抵抗値の温度に対する変化率
は(1〜7%/℃)の大きな値を得られる。従つ
て複雑な電気回路を必必要とせず、また抵価格に
なるなどの長所を有する。この場合サーミスタ素
子はできるだけ小さくして、熱容量を小さくした
ものが選ばれる。これは小型化により熱応答性を
速くできるからである。この様な小型のサーミス
タ素子には、Fe,Ni,Co,Mnなどの複合酸化物
焼結体を感温抵抗体に用いたビード型サーミスタ
素子、あるいは上記複合酸化物、Ge,Si,SiCな
どの薄膜を感温抵抗体に用いた薄膜サーミスタ素
子がある。しかしビード型サーミスタ素子は、通
常、球形もしくは回転楕円体に類似した形状を有
するので、支持容器3にこのサーミスタ素子を固
定しても熱抵抗が大きくなるという欠点があつ
た。すなわち、サーミスタ素子自身の熱容量は小
さくても、その複雑な形状のために支持容器3と
の接続部での熱抵抗を小さくすることが困難であ
り、この結果熱応答性が遅くなるという欠点があ
つた。 On the other hand, when temperature is detected using a thermistor instead of the thermocouple, the rate of change of resistance value with respect to temperature can be as large as (1 to 7%/°C). Therefore, it does not require a complicated electric circuit and has the advantage of being inexpensive. In this case, the thermistor element is selected to be as small as possible and to have a low heat capacity. This is because miniaturization allows for faster thermal response. Such small thermistor elements include bead-type thermistor elements that use composite oxide sintered bodies such as Fe, Ni, Co, and Mn as the temperature-sensitive resistor, or composite oxides such as those mentioned above, Ge, Si, SiC, etc. There is a thin film thermistor element that uses a thin film of However, bead-type thermistor elements usually have a shape similar to a sphere or a spheroid, so even if the thermistor element is fixed to the support container 3, it has a drawback of increasing thermal resistance. That is, even though the heat capacity of the thermistor element itself is small, it is difficult to reduce the thermal resistance at the connection part with the support container 3 due to its complicated shape, and as a result, the thermal response becomes slow. It was hot.
他方、薄膜サーミスタ素子は第2図に示す如く
支持容器3とロウ付接続できるので、高速応答性
が得られるという利点があつた。しかしこの場合
次のような欠点も同時に生じていた。すなわち、
一般的な薄膜サーミスタ素子は通常、アルミなど
の平板状絶縁基板4の一方の表面に電極膜5およ
び前述した薄膜感温抵抗体膜6を形成し、さらに
リード線7を電極膜5に接続して構成されるが、
このままでは薄膜サーミスタ素子を支持容器3
(通常、ステンレス鋼などの耐熱金属で構成され
る)にロウ付できないので、絶縁基板4の他の表
面にW,Moなどのメタライズ膜8を形成して、
支持容器3とロウ材層9を介してロウ付接続され
ていた。しかし、W,Moなどの金属は、高融点
を有し、また酸化され易いので、メタライズ膜8
は通常、H2などを含む還元性雰囲気中で1400℃
以上の高温下で形成される。このため、製造行程
が複雑で、特別な設備を必要とするのみならず高
価格になるという欠点があつた。また電極膜5は
耐熱性の優れた厚膜電極膜がよく用いられるが、
厚膜電極膜は還元性雰囲気下では劣化し易く、ま
た耐熱性も空気中で1000℃以下であるので、厚膜
電極膜はメタライズ膜の形成工程に適合せず、ま
た逆に、メタライズ膜も厚膜電極膜の形成工程
(通常、空気中で600〜1000℃の高温下で焼成す
る)に適合しない。従つて、第2図に示した構成
では、電極膜5にもメタライズ膜を用いなければ
ならない。このため、高価格になるのみならず、
電極膜5にリード線7を接続する際、メタライズ
膜は高融点であるので、通常よく用いられる溶接
接続が困難になるという欠点もあつた。 On the other hand, since the thin film thermistor element can be connected to the support container 3 by brazing as shown in FIG. 2, it has the advantage of providing high-speed response. However, in this case, the following drawbacks also occurred. That is,
A general thin film thermistor element usually has an electrode film 5 and the aforementioned thin film temperature sensitive resistor film 6 formed on one surface of a flat insulating substrate 4 made of aluminum or the like, and further connects a lead wire 7 to the electrode film 5. It is composed of
If this continues, the thin film thermistor element will be placed in the support container 3.
(Usually made of heat-resistant metal such as stainless steel) cannot be brazed, so a metallized film 8 of W, Mo, etc. is formed on the other surface of the insulating substrate 4.
The support container 3 and the brazing material layer 9 were connected to each other by brazing. However, since metals such as W and Mo have high melting points and are easily oxidized, the metallized film 8
Usually at 1400℃ in a reducing atmosphere containing H2 etc.
Formed at higher temperatures. For this reason, the manufacturing process is complicated and requires special equipment, as well as being expensive. Further, as the electrode film 5, a thick film electrode film with excellent heat resistance is often used.
Thick film electrode films easily deteriorate in reducing atmospheres, and their heat resistance is below 1000°C in air, so thick film electrode films are not suitable for the process of forming metallized films, and conversely, metallized films are also It is not compatible with the thick electrode film formation process (usually fired in air at a high temperature of 600 to 1000°C). Therefore, in the configuration shown in FIG. 2, a metallized film must also be used for the electrode film 5. For this reason, not only is the price high,
Since the metallized film has a high melting point when connecting the lead wire 7 to the electrode film 5, there is also the drawback that it is difficult to perform the commonly used welding connection.
本発明はこれら従来の欠点を解消したサーミス
タを提供するもので、その構成を第3図に示す。
本発明の要旨は、平板状セラミツク絶縁基板4の
一方の表面に電極膜5と感温抵抗体膜6とを形成
して成る薄膜サーミスタチツプと支持容器3とを
接続して構成されるサーミスタにおいて、少なく
とも、前記セラミツク絶縁基板4の他の表面と支
持容器との間にTi箔10もしくはZr箔10を介
在させて両者をロウ付接続する点にある。 The present invention provides a thermistor which eliminates these conventional drawbacks, and its configuration is shown in FIG.
The gist of the present invention is a thermistor constructed by connecting a thin film thermistor chip formed by forming an electrode film 5 and a temperature-sensitive resistor film 6 on one surface of a flat ceramic insulating substrate 4 to a support container 3. At least, a Ti foil 10 or a Zr foil 10 is interposed between the other surface of the ceramic insulating substrate 4 and the support container, and the two are connected by brazing.
以下Ti箔10を用いた実例について本発明を
詳述する。 The present invention will be described in detail below using an example using Ti foil 10.
セラミツク絶縁基板4と保護容器3とはTi箔
10を介在させてロウ材層9,11を通してロウ
付接続される。Ti箔10と支持容器3とのロウ
付接続は、ロウ材層9を通して金属結合によりロ
ウ付接続される。セラミツク絶縁基板4にはアル
ミナ、ムライト、ステアタイトなどが用いられ
る。このセラミツク絶縁基板4とTi箔10とは
ロウ材層11を通してロウ付接続される。通常、
アルミナなどのセラミツク絶縁基板4とロウ材層
11とは、互いに濡れ合わない、すなわち化学的
な結合力は両者の間で殆んど存在しないので、セ
ラミツク絶縁基板4のロウ付接続は困難である。
しかしTi箔10もしくはZi箔10)とセラミツク
絶縁基板4との間にロウ材層11を形成したと
き、ロウ材層11とセラミツク基板4とは互いに
よく濡れ合い、Ti箔10とセラミツク基板4と
はロウ材層11を通して互いにロウ付接続され
る。この理由の詳細は不明であるが、ロウ材を液
相線温度以上まで加熱したとき、微量のTi原子
(もしくはZr原子)が溶融ロウ材層11を通して
拡散しセラミツク絶縁基板4の表面でロウ材層1
1とセラミツクとを化学的に結合させるものと思
われる。 The ceramic insulating substrate 4 and the protective container 3 are connected by brazing through the brazing metal layers 9 and 11 with a Ti foil 10 interposed therebetween. The brazing connection between the Ti foil 10 and the support container 3 is performed by metal bonding through the brazing material layer 9. Alumina, mullite, steatite, etc. are used for the ceramic insulating substrate 4. This ceramic insulating substrate 4 and Ti foil 10 are connected by brazing through a brazing material layer 11. usually,
The ceramic insulating substrate 4 made of alumina or the like and the brazing material layer 11 do not wet each other, that is, there is almost no chemical bonding force between them, so it is difficult to connect the ceramic insulating substrate 4 with brazing. .
However, when the brazing material layer 11 is formed between the Ti foil 10 or Zi foil 10) and the ceramic insulating substrate 4, the brazing material layer 11 and the ceramic substrate 4 wet each other well, and the Ti foil 10 and the ceramic substrate 4 are connected to each other by brazing through the brazing material layer 11. The details of this reason are unknown, but when the brazing filler metal is heated to a temperature higher than its liquidus temperature, a small amount of Ti atoms (or Zr atoms) diffuse through the molten brazing filler metal layer 11 and touch the brazing filler metal on the surface of the ceramic insulating substrate 4. layer 1
It is thought that 1 and ceramic are chemically bonded.
このように本発明のサーミスタでは、薄膜サー
ミスタチツプのセラミツク絶縁基板4と支持容器
3とをTi箔10を介在させることにより、ロウ
材層9,11を通して直接ロウ付接続している。
このため、90%熱応答時間、すなわち最初T1℃
に保たれた第1図鍋底温度が突然T2℃(>T1
℃)に変化したとき、薄膜サーミスタチツプの温
度がT1+0.9(T2−T1)℃になるに要する時間
で、T1=室温、T2=約100℃で測定した時間も3
〜5secで、第2図構成の場合とほぼ同じ高速応答
性を示した。またセラミツク絶縁基板4の支持容
器3に対する接着強度は100〜500g/mm2であり、
充分実用に耐え得る強度を示した。更に、第2図
構成においてはセラミツク絶縁基板4の他の表面
にメタライズ膜8を形成していたが、本発明のサ
ーミスタにおいては、この必要がない。従つて製
造工程は簡単であり、また特別な設備も必要な
い。これは、他方で電極膜5として、Au−pt、
Au,Ag,Ag−Pdなどの厚膜電極膜を用いるこ
とをも可能にしている。すなわち、メタライズ膜
8を形成する必要がないので、高温の還元性雰囲
気に電極膜5がさらされることがない。従つて厚
膜電極膜を第3図電極膜5として用いることがで
きる。このため、低価格になるのみならず、電極
膜5にリード線7を接続する際、溶接接続も容易
にできる。これらのことは、Ti箔の代りにZr箔
を用いても同じことは明らかであろう。 As described above, in the thermistor of the present invention, the ceramic insulating substrate 4 of the thin film thermistor chip and the support container 3 are directly brazed and connected through the brazing material layers 9 and 11 with the Ti foil 10 interposed.
For this reason, 90% thermal response time, i.e. first T1℃
The temperature at the bottom of the pot in Figure 1 , which had been maintained at
The time required for the temperature of the thin film thermistor chip to reach T 1 + 0.9 ( T 2 − T 1 )°C when the temperature changes to
~5 seconds, showing almost the same high-speed response as the configuration shown in Figure 2. Furthermore, the adhesive strength of the ceramic insulating substrate 4 to the support container 3 is 100 to 500 g/ mm2 ,
It showed sufficient strength for practical use. Further, in the configuration shown in FIG. 2, a metallized film 8 is formed on the other surface of the ceramic insulating substrate 4, but this is not necessary in the thermistor of the present invention. Therefore, the manufacturing process is simple and no special equipment is required. On the other hand, as the electrode film 5, Au-pt,
It also makes it possible to use thick electrode films such as Au, Ag, and Ag-Pd. That is, since it is not necessary to form the metallized film 8, the electrode film 5 is not exposed to a high-temperature reducing atmosphere. Therefore, a thick electrode film can be used as the electrode film 5 in FIG. Therefore, not only is the cost low, but also welding can be easily performed when connecting the lead wire 7 to the electrode film 5. It is clear that these things are the same even if Zr foil is used instead of Ti foil.
なお、セラミツク絶縁基板4の熱膨張係数は
(50〜90)×10-7/℃であるので、支持容器3のそ
れも類似の値であることが望ましく、従つて、支
持容器3はコバール合金、Ti,Ta,Zr、Mo,
W,Pt、ステンレス鋼、Fe―Ni合金などから選
ばれた材料で構成されることが望ましい。実際、
アルミナセラミツク絶縁基板4とステンレス鋼
(SUS―430)支持容器3とを第3図ロウ付接続
し、空気中350℃←→室温水中の熱衝撃試験を
1000サイクル行なつても、ロウ付接続部の機械的
劣化は観察されず、また熱応答性も殆んど変化し
なかつた。 Note that since the thermal expansion coefficient of the ceramic insulating substrate 4 is (50 to 90) x 10 -7 /°C, it is desirable that the support container 3 has a similar value. Therefore, the support container 3 is made of Kovar alloy. , Ti, Ta, Zr, Mo,
It is preferable to use a material selected from W, Pt, stainless steel, Fe--Ni alloy, etc. actual,
The alumina ceramic insulating substrate 4 and the stainless steel (SUS-430) support container 3 were connected with brazing as shown in Fig. 3, and a thermal shock test was conducted in air at 350℃←→room temperature water.
Even after 1000 cycles, no mechanical deterioration of the brazed joint was observed, and the thermal response remained almost unchanged.
またロウ材はAg―Cu共晶銀ロウが優れてい
る。これは、この銀ロウ材は箔状に加工するのが
容易であり、工業的にも箔状で利用されているの
で、本発明のサーミスタを形成するとき、支持容
器3とセラミツク絶縁基板4との間にTi箔10
もしくはZr箔10を介在させ、第3図ロウ材層
9,11の位置に箔状ロウ材を設置して加熱する
ことにより容易にロウ付接続することができるか
らである。 Also, Ag-Cu eutectic silver solder is excellent. This is because this silver brazing material is easy to process into a foil shape and is also used industrially in foil shape, so when forming the thermistor of the present invention, the support container 3 and the ceramic insulating substrate 4 are Ti foil between 10
Alternatively, by interposing the Zr foil 10, placing a foil brazing material at the position of the brazing material layers 9 and 11 in FIG. 3 and heating it, brazing connection can be easily achieved.
以上の如く、本発明のサーミスタは、従来の欠
点を解消し、産業上有用である。 As described above, the thermistor of the present invention eliminates the conventional drawbacks and is industrially useful.
第1図、第2図は従来のサーミスタの構成を示
す断面図、第3図は本発明の一実施例を示すサー
ミスタの構成を示す断面図である。
3……支持容器、4……セラミツク絶縁基板、
5……電極膜、6……感温抵抗体膜、7……リー
ド線、9,11……ロウ材層、10……Ti箔も
しくはZr箔。
1 and 2 are cross-sectional views showing the structure of a conventional thermistor, and FIG. 3 is a cross-sectional view showing the structure of a thermistor according to an embodiment of the present invention. 3... Support container, 4... Ceramic insulating substrate,
5... Electrode film, 6... Temperature sensitive resistor film, 7... Lead wire, 9, 11... Brazing material layer, 10... Ti foil or Zr foil.
Claims (1)
極膜と感温抵抗体膜とを形成して成る薄膜サーミ
スタチツプと支持容器とを接続して構成されるサ
ーミスタにおいて、少なくとも、前記セラミツク
絶縁基板の他の表面と支持容器との間にTi箔も
しくはZr箔を介在させて両者をロウ付接続したこ
とを特徴とするサーミスタ。 2 支持容器がコバール合金、Ti,Ta,Zr,
Mo,W,Pt、ステンレス鋼、Fe―Ni合金などか
ら選ばれた材料で構成されたことを特徴とする特
許請求の範囲第1項記載のサーミスタ。 3 ロウ材がAg―Cu共晶銀ロウであることを特
徴とする特許請求の範囲第1項記載のサーミス
タ。[Scope of Claims] 1. A thermistor constructed by connecting a thin film thermistor chip, which is formed by forming an electrode film and a temperature-sensitive resistor film on one surface of a flat ceramic insulating substrate, to a support container, at least: A thermistor characterized in that a Ti foil or a Zr foil is interposed between the other surface of the ceramic insulating substrate and the support container, and the two are connected by brazing. 2 The support container is made of Kovar alloy, Ti, Ta, Zr,
The thermistor according to claim 1, characterized in that it is made of a material selected from Mo, W, Pt, stainless steel, Fe--Ni alloy, etc. 3. The thermistor according to claim 1, wherein the brazing material is Ag--Cu eutectic silver brazing material.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56054892A JPS57169202A (en) | 1981-04-10 | 1981-04-10 | Thermistor |
| US06/363,498 US4424507A (en) | 1981-04-10 | 1982-03-30 | Thin film thermistor |
| EP82301808A EP0063445B1 (en) | 1981-04-10 | 1982-04-06 | A thin film thermistor |
| DE8282301808T DE3268363D1 (en) | 1981-04-10 | 1982-04-06 | A thin film thermistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56054892A JPS57169202A (en) | 1981-04-10 | 1981-04-10 | Thermistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57169202A JPS57169202A (en) | 1982-10-18 |
| JPS6157682B2 true JPS6157682B2 (en) | 1986-12-08 |
Family
ID=12983240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56054892A Granted JPS57169202A (en) | 1981-04-10 | 1981-04-10 | Thermistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57169202A (en) |
-
1981
- 1981-04-10 JP JP56054892A patent/JPS57169202A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57169202A (en) | 1982-10-18 |
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