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JPS621333B2 - - Google Patents
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JPS621333B2 - - Google Patents

Info

Publication number
JPS621333B2
JPS621333B2 JP55090643A JP9064380A JPS621333B2 JP S621333 B2 JPS621333 B2 JP S621333B2 JP 55090643 A JP55090643 A JP 55090643A JP 9064380 A JP9064380 A JP 9064380A JP S621333 B2 JPS621333 B2 JP S621333B2
Authority
JP
Japan
Prior art keywords
exhaust
gas
reaction vessel
optical fiber
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55090643A
Other languages
Japanese (ja)
Other versions
JPS5717439A (en
Inventor
Katsuyuki Imoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Hitachi Ltd
Original Assignee
Hitachi Cable Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd, Hitachi Ltd filed Critical Hitachi Cable Ltd
Priority to JP9064380A priority Critical patent/JPS5717439A/en
Publication of JPS5717439A publication Critical patent/JPS5717439A/en
Publication of JPS621333B2 publication Critical patent/JPS621333B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/0144Means for after-treatment or catching of worked reactant gases
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • C03B37/0142Reactant deposition burners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/04Multi-nested ports
    • C03B2207/06Concentric circular ports
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/04Multi-nested ports
    • C03B2207/08Recessed or protruding ports
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/70Control measures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Description

【発明の詳細な説明】 従来の光フアイバ母材の製造方法を第1図に示
す。これは火炎加水分解バーナ1でガラス微粒子
を含んだ火炎5を発生させ、これを矢印8方向に
回転しながら矢印7方向へ移動するターゲツト4
に吹付けてロツド状の多孔質ガラス母材2を成長
させる。その後加熱源3で焼結して透明な光フア
イバ母材にする方法である。そして光フアイバ母
材の屈折率分布および外径の変動を抑制するため
に、反応容器6内の圧力を圧力検出装置15で検
出し、その出力信号を制御部18を通してバルブ
開閉装置16にフイードバツクさせて排気量を制
御する構成になつている。ところがこの方法につ
いて検討した結果、次のような問題点があること
がわかつた。
DETAILED DESCRIPTION OF THE INVENTION A conventional method for manufacturing an optical fiber preform is shown in FIG. This is a flame hydrolysis burner 1 that generates a flame 5 containing fine glass particles, and a target 4 that moves in the direction of arrow 7 while rotating in the direction of arrow 8.
to grow a rod-shaped porous glass base material 2. This method is followed by sintering with a heat source 3 to form a transparent optical fiber base material. In order to suppress fluctuations in the refractive index distribution and outer diameter of the optical fiber base material, the pressure inside the reaction vessel 6 is detected by the pressure detection device 15, and the output signal is fed back to the valve opening/closing device 16 through the control section 18. The structure is such that the displacement is controlled by However, as a result of examining this method, the following problems were found.

(1) 排気装置17の排気速度の変動に敏感であ
る。
(1) It is sensitive to fluctuations in the pumping speed of the pumping device 17.

(2) 排気ガスは塩素ガスなどの腐蝕性ガスを含
み、かつ高温であるために、バルブ開閉装置1
6(通常、バタフライバルブを使用。)を腐蝕
し易く、装置の性能劣化がある。
(2) Since the exhaust gas contains corrosive gases such as chlorine gas and is high temperature, the valve opening/closing device 1
6 (usually a butterfly valve is used) is easily corroded, resulting in deterioration of equipment performance.

(3) この方法は排気管の断面積を変えることによ
り圧力を制御する方法であるために、排気ガス
中に含まれているガラス微粒子がバルブ開閉装
置に付着して圧力を変動させ易い。
(3) Since this method controls the pressure by changing the cross-sectional area of the exhaust pipe, glass particles contained in the exhaust gas tend to adhere to the valve opening/closing device and cause the pressure to fluctuate.

(4) バタフライバルブを使用した場合、圧力を広
範囲にわたつて直線性よく変えることがむずか
しい。
(4) When using a butterfly valve, it is difficult to vary the pressure linearly over a wide range.

上記問題点を解決させるために本発明者は、先
に排気ガスの流れ方向に沿つてバイアス用のガス
を流し、そのガス流量を調節することによつて反
応容器内の圧力を制御する方法を提案し、特許出
願を行なつた。(第2図、第3図参照)。この方法
は排気管側に排気ガス流量調節用バルブ開閉装置
を設けていないので、従来法のような問題が生じ
ない。またガス供給調節装置19の操作により、
反応容器6内の圧力を広範囲にわたつて直線性よ
く変えることができ、制御性がよい。その一例を
第4図に示す。これは矢印21′方向へ流す内圧
制御用ガスFC(この場合、N2を使用したが、
Ar、He、O2、空気などでもよい。)と反応容器
6内の圧力ΔP(これは大気圧との差圧値)との
関係を示したものである。この結果はFCを20
/minに保ち、ΔPをそれぞれ、−0.5、−1、−
1.5、−2mmAqとなるように排気装置17で設定
した状態(図中の〓印)において、FCを変えて
ΔPを測定したものである。ところがこの方法に
おいて、反応容器6内への入力供給ガス流量FI
(バーナ1から噴射させるガス流量、矢印11′方
向へ流すガス流量、さらに第2図には図示してい
ないがバーナ外周に沿つて流している火炎保護用
のガスなどを含む。)が変化するとΔPが敏感に
変わるということがあり、このΔPや変動させな
いためにFIを高精度に制御する必要があつた。
第5図にFIとΔPとの関係の一例を示す。これ
はFCを20/minに保ち、FIの初期値をそれぞ
れ、10/min、30/minとしてΔPを−0.5、
−1mmAqとなるように排気装置17で設定した
状態(図中の〓印)から、FIを変えてΔPを測
定したものである。このようにFIのわずかの変
化でΔPが変り易い。したがつて、FIのわずか
の変化に対してもΔPが敏感に応答しないような
方法があると極めて望ましい。
In order to solve the above problems, the present inventor developed a method of controlling the pressure inside the reaction vessel by first flowing a bias gas along the flow direction of exhaust gas and adjusting the gas flow rate. We made a proposal and filed a patent application. (See Figures 2 and 3). Since this method does not include a valve opening/closing device for controlling the flow rate of exhaust gas on the exhaust pipe side, the problems of the conventional method do not occur. In addition, by operating the gas supply adjustment device 19,
The pressure inside the reaction vessel 6 can be varied linearly over a wide range, resulting in good controllability. An example is shown in FIG. This is an internal pressure control gas F C (in this case, N 2 was used, but
Ar, He, O 2 , air, etc. may also be used. ) and the pressure ΔP in the reaction vessel 6 (this is the differential pressure value from atmospheric pressure). This result makes F C 20
/min, and set ΔP to -0.5, -1, -, respectively.
∆P was measured while changing F C with the exhaust device 17 set to 1.5 and -2 mmAq (marked with a cross in the figure). However, in this method, the input supply gas flow rate F I into the reaction vessel 6
(This includes the gas flow rate injected from the burner 1, the gas flow rate flowing in the direction of the arrow 11', and the flame protection gas flowing along the outer circumference of the burner, which is not shown in FIG. 2). Since ΔP changes sensitively, it is necessary to control FI with high precision in order to prevent ΔP from fluctuating.
FIG. 5 shows an example of the relationship between FI and ΔP. This keeps F C at 20/min, initial values of F I are 10/min and 30/min, respectively, and ΔP is -0.5.
ΔP was measured by changing F I from a state in which the exhaust device 17 was set to -1 mmAq (≦ mark in the figure). In this way, ΔP tends to change with a slight change in FI . Therefore, it is highly desirable to have a method in which ΔP does not respond sensitively to even slight changes in F I .

本発明は、反応容器内への入力供給ガス流量の
変化に対してΔPが敏感に応答しにくい方法、か
つ圧力調節用装置の操作に対して直線性よく圧力
を制御する方法を提案することにある。すなわち
排気側の排気管に大気中の空気を吸い込んで排気
ガスにバイアスを加えるような空気吸入量調節機
構を設けて所望の空気を吸入させるようにし、か
つ排気ガスの流れ方向、あるいは反応容器内へ供
給するガスの流れ方向に沿つてガスを供給し調節
する機能をもつたガス供給調節装置を設け、その
調節装置を操作することによつて反応容器内の圧
力を制御する方法である。
The present invention proposes a method in which ΔP is less likely to respond sensitively to changes in the input supply gas flow rate into a reaction vessel, and a method in which pressure is controlled with good linearity with respect to the operation of a pressure regulating device. be. In other words, an air intake amount adjustment mechanism that sucks air from the atmosphere into the exhaust pipe on the exhaust side and applies a bias to the exhaust gas is provided to suck in the desired air, and the flow direction of the exhaust gas or the inside of the reaction vessel is adjusted. In this method, a gas supply regulating device is provided that has the function of supplying and regulating gas along the flow direction of the gas supplied to the reactor, and the pressure inside the reaction vessel is controlled by operating the regulating device.

以下に実施例を用いて本発明の方法を説明す
る。
The method of the present invention will be explained below using Examples.

第6図に本発明の内圧制御法の概略図を示す。
これには2つの内圧制御法が示されている。一つ
は圧力検出器15で反応容器6内の内圧を検出
し、この検出信号を制御部18を通してガス供給
調節装置19にフイードバツクさせる方法であ
る。この場合、矢印21″,21,23,2
3′,23″方向へ送り込むガス流量は一定とし
た。24は大気中の空気を排気管13内に吸い込
ませるための穴であり、矢印25,25′,2
5″は上記穴を通して排気管13内へ吸い込まれ
る空気の流れ方向を示したものである。矢印14
は排気ガスの流れ方向を示し、矢印26は排気ガ
スに吸入空気がバイアスされたガスの流れ方向を
示したものである。この空気吸入用穴24の大き
さ、数量はそれが大きいほど、またその数量が多
いほど空気吸入量が多くなり、入力供給ガス流量
Iの変動に対する圧力の変動は緩和され易くな
る。穴の形状は円、四角、長方形などいずれでも
よく、またスリツト状のものさらには管を枝状に
多数本設けたものでもよい。またこの穴の位置は
排気装置に近い方でもよく、あるいはガス供給管
20に設けてもよい。さらには排気管13に全体
にわたつて設ければ排気管内壁へのガラス微粒子
の付着を抑制することができ効果的である。次に
この方法の具体例について述べる。
FIG. 6 shows a schematic diagram of the internal pressure control method of the present invention.
It shows two internal pressure control methods. One method is to detect the internal pressure in the reaction vessel 6 with the pressure detector 15 and feed back this detection signal to the gas supply adjustment device 19 through the control section 18. In this case, arrows 21″, 21, 23, 2
The gas flow rate sent in the directions 3' and 23'' was constant. 24 is a hole for sucking air from the atmosphere into the exhaust pipe 13, and arrows 25, 25', 2
5'' indicates the flow direction of air sucked into the exhaust pipe 13 through the hole. Arrow 14
indicates the flow direction of exhaust gas, and arrow 26 indicates the flow direction of gas in which the intake air is biased against the exhaust gas. The larger the size and number of the air suction holes 24, and the larger the number, the larger the amount of air suction, and the easier it is to alleviate pressure fluctuations in response to fluctuations in the input supply gas flow rate FI . The shape of the hole may be circular, square, rectangular, etc., or it may be slit-shaped or may have a number of branched tubes. Further, this hole may be located closer to the exhaust device, or may be provided in the gas supply pipe 20. Furthermore, if it is provided throughout the exhaust pipe 13, it is effective to suppress the adhesion of glass particles to the inner wall of the exhaust pipe. Next, a specific example of this method will be described.

第7図、第8図に具体的実施例の特性を示す。
まず第7図は矢印21方向へO2ガスを10/
minし、また矢印23,23′,23″方向へそれ
ぞれ一定流量(数/min〜10数/min)を流
し、かつ矢印21′方向へ流す内圧制御用ガスFC
(N2ガス)を20/minに保つた状態でΔPを−
0.5mmAqとなるように排気装置17で設定(図中
の〓印)しておき、その後FCを変えてΔPを測
定した特性である。そして排気管13へ設けた穴
(この場合5mmの直径とした。)をパラメータにし
たものである。穴の数が多くなるにつれてFC
ΔP曲線の勾配はゆるやかになつている。実際の
多孔質ガラス母材の堆積中のΔPの変動は最大2
〜3割程度であるので、上記第7図の場合の穴の
数が24ケの場合でも直線性よく制御することがで
きる。次に第8図の結果は、矢印21方向へ流
すガスFI(この場合O2ガスを用いた。)を10
/minに保ち、また矢印23,23′,23″方
向へそれぞれ一定流量(数/min〜10数/
min)を流し、かつFCを20/minに保つた状態
でΔPを−0.5mmAqとなるように排気装置17で
設定(図中の〓印)しておき、その後FIを変え
てΔPを測定した特性である。そして排気管13
へ設けた穴(この場合5mmの直径とした。)をパ
ラメータにしたものである。穴の数が多くなるに
つれてFIの変化に対してΔPの変化量は小さく
なるという好ましい結果である。すなわち、FI
のわずかの変化に対してΔPが敏感に応答しにく
くなつてくるという本発明の効果が得られてい
る。
FIGS. 7 and 8 show characteristics of specific embodiments.
First of all, in Figure 7, O 2 gas is pumped in the direction of arrow 21 at 10%
internal pressure control gas F
( N2 gas) is kept at 20/min and ΔP is -
The characteristics are obtained by setting the exhaust device 17 to 0.5 mmAq (marked with a cross in the figure), and then changing FC and measuring ΔP. The hole provided in the exhaust pipe 13 (in this case, the diameter was 5 mm) was used as a parameter. As the number of holes increases, F C
The slope of the ΔP curve is gradual. The variation of ΔP during deposition of actual porous glass matrix is up to 2
Since it is about 30%, it is possible to control with good linearity even when the number of holes is 24 in the case shown in FIG. 7 above. Next, the results shown in Figure 8 show that the gas F I (in this case O 2 gas was used) flowing in the direction of arrow 21 is 10
/min, and maintain a constant flow rate (number/min to 10 number/min) in the directions of arrows 23, 23', and 23''.
Set the exhaust device 17 so that ΔP is -0.5 mmAq (marked with – in the figure) while flowing FC (minimum min) and keeping F C at 20/min, then change F This is a measured characteristic. and exhaust pipe 13
The hole (in this case, the diameter was 5 mm) was used as a parameter. This is a desirable result in that as the number of holes increases, the amount of change in ΔP becomes smaller with respect to the change in FI . That is, F I
The effect of the present invention is that ΔP becomes less sensitive to small changes in ΔP.

第9図の結果はガス供給管20の側面に大気中
の空気を吸入させる穴(この場合3.8mmの直径と
した。)を設けない場合と設けた場合(数量9
ケ)のFI−ΔP特性曲線を示したものである。
この場合も第8図の結果と同様に、穴を設けるこ
とによつてFIの変化に対するΔPの変化量を小
さくすることができることを示している。
The results shown in Figure 9 are for the case where a hole (in this case, the diameter was 3.8 mm) for inhaling air from the atmosphere is not provided on the side of the gas supply pipe 20, and when it is provided (the number of holes is 9 mm).
f) shows the F I -ΔP characteristic curve.
In this case as well, similar to the results shown in FIG. 8, it is shown that the amount of change in ΔP with respect to the change in FI can be reduced by providing the holes.

次に第6図のもう一つの内圧制御法について述
べる。これは圧力検出器15で反応容器6内の内
圧を検出し、この検出信号を制御部18を通して
入力供給ガス調節装置19′にフイードバツクさ
せる方法である。ただしこの場合、矢印23,2
3′,23″方向へ送り込むガス流量は一定とす
る。そして、矢印21方向へは一定流量のガスを
送り込んでもよく、あるいは穴24と同じように
大気中の空気を吸入させるようにしてもよい。し
たがつて、19は供給ガス流量調節装置、あるい
は空気吸入量調節装置としての機能をもたせてあ
る。入力供給ガス調節装置19′を操作して矢印
21方向へ流すガス流量調節することによりΔ
Pを制御できることは第5図、第8図、第9図の
結果からも明らかである。この方法の特徴は排気
装置17の排気速度の変動に対してΔPが大きく
変動しないことである。第10図はその一例であ
る。これは排気装置17側の排気管に排気量を乱
すためのバタフライバルブを設け、そのバルブを
回転させることによつてΔPがどの程度変動する
かを測定した結果である。ΔPはあまり大きく変
化していないことがわかる。すなわち、外乱に対
して安定で、かつ制御性が良い。
Next, another internal pressure control method shown in FIG. 6 will be described. This is a method in which the pressure detector 15 detects the internal pressure in the reaction vessel 6, and this detection signal is fed back through the control section 18 to the input supply gas regulating device 19'. However, in this case, arrows 23, 2
The flow rate of gas sent in the directions 3' and 23'' is constant.A constant flow rate of gas may be sent in the direction of the arrow 21, or air from the atmosphere may be sucked in as in the hole 24. Therefore, 19 has a function as a supply gas flow rate adjustment device or an air suction amount adjustment device.By operating the input supply gas adjustment device 19' to adjust the gas flow rate in the direction of arrow 21, Δ
It is clear from the results shown in FIGS. 5, 8, and 9 that P can be controlled. A feature of this method is that ΔP does not vary greatly with variations in the exhaust speed of the exhaust device 17. FIG. 10 is an example. This is the result of providing a butterfly valve in the exhaust pipe on the exhaust device 17 side to disturb the exhaust volume, and measuring how much ΔP changes by rotating the valve. It can be seen that ΔP does not change much. That is, it is stable against disturbances and has good controllability.

次に実施例に用いた制御部の一例を第11図に
示す。Viは圧力検出器の検出信号、VrはΔPの
基準設定値に相当する電圧(この場合、−1mmAq
で0.1Vとした。)、Voは出力信号である。このVo
は19、あるいは19′のガス流量調節装置のDC
モータ駆動電圧である。19あるいは19′はニ
ードルバルブ付流量計のバルブ軸にDCモータを
直結させた構成のもの、あるいは回転円板の軸に
DCモータを直結させた構成のものを用いた。圧
力検出器には、最大±10mmAqまで測定可能なス
トロンゲージ型(増幅器付)のものを使用し、出
力に最大±1V生ずるようになつている。反応容
器には外径175mm、長さ500mmのものを、また排気
管には内径48mmのものを使用した。
Next, FIG. 11 shows an example of the control section used in the example. Vi is the detection signal of the pressure detector, Vr is the voltage corresponding to the reference setting value of ΔP (in this case, -1 mmAq
It was set to 0.1V. ), Vo is the output signal. This Vo
is the DC of the gas flow regulator at 19 or 19'.
This is the motor drive voltage. 19 or 19' is a flow meter with a needle valve with a DC motor directly connected to the valve shaft, or a rotating disk shaft.
A configuration in which a DC motor was directly connected was used. The pressure detector used is a strong gauge type (with amplifier) that can measure up to ±10 mmAq, and is designed to generate a maximum output of ±1 V. The reaction vessel used was one with an outer diameter of 175 mm and a length of 500 mm, and the exhaust pipe used was one with an inner diameter of 48 mm.

上記構成で多孔質ガラス母材を作成しながら、
約8時間の間、内圧制御を行なつた。その結果、
内圧は±1%以下に制御することができ、多孔質
ガラス母材の外径、光フアイバ母材の屈折率分布
がその軸方向にわたつて極めて一様(数%以下)
であることを確認した。
While creating a porous glass base material with the above configuration,
Internal pressure control was carried out for about 8 hours. the result,
The internal pressure can be controlled to ±1% or less, and the outer diameter of the porous glass base material and the refractive index distribution of the optical fiber base material are extremely uniform in the axial direction (several percent or less).
It was confirmed that

本発明は上記実施例に限定されない。たとえば
圧力検出器の位置は反応容器内、あるいは排気管
内でもよい。反応容器形状も円筒状、球形状のも
のでもよく、その大きさも任意のものでもよい。
母材2は直接透明ガラスを作る場合でもよい。ま
た多孔質ガラス母材とガラス化を別工程で行なう
場合でもよい。保護管22′,22″,22はさ
らに同心多重管でもよく、あるいはなくてもよ
い。バーナ1は一本でも複数本の場合でもよい。
矢印23,23′,23″から流すガスはなくても
よい。バーナ1の位置は第6図の場合以外にはな
なめから吹きつけるようにしてもよい。排気管1
3は一本だけでなく複数本としてもよい。母材2
は光フアイバ用以外に単なるガラス(たとえば
SiO2ガラス)でもよい。矢印21″,23,2
3′,23″方向へ送り込むガスはN2、He、Ar、
O2、空気、あるいはこれらの混合ガスでもよ
い。さらに上記実施例では排気ガスにバイアスさ
せるガスとして穴24から吸い込まれる大気中の
空気としたが、穴24から強制的に空気、O2
N2、Ar、Heなどのガスを送り込んでもよい。
The invention is not limited to the above embodiments. For example, the pressure detector may be located within the reaction vessel or within the exhaust pipe. The shape of the reaction container may be cylindrical or spherical, and its size may be arbitrary.
The base material 2 may be directly made into transparent glass. Alternatively, the porous glass base material and the vitrification may be performed in separate steps. The protection tubes 22', 22'', 22 may further be concentric multiple tubes or may not be provided.The burner 1 may have one or more burners.
There is no need for gas to flow from the arrows 23, 23', 23''.The position of the burner 1 may be such that the gas is blown diagonally other than in the case shown in Fig. 6.Exhaust pipe 1
3 may be not only one but multiple. Base material 2
is not only for optical fiber but also for simple glass (e.g.
(SiO 2 glass) may also be used. Arrow 21″, 23, 2
The gases sent in the 3′ and 23″ directions are N 2 , He, Ar,
O 2 , air, or a mixture thereof may be used. Furthermore, in the above embodiment, atmospheric air is sucked in from the hole 24 as the gas to bias the exhaust gas, but air, O 2 ,
Gases such as N 2 , Ar, and He may also be introduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の光フアイバ母材の製造方法を説
明する概略断面図、第2図および第3図は先願の
光フアイバ母材の製造方法を説明する概略断面
図、第4図は先願の光フアイバ母材の製造方法を
用いた場合の内圧制御用ガス流量と反応容器内圧
力との関係を示すグラフ、第5図は先願の光フア
イバ母材の製造方法を用いた場合の入力供給ガス
流量と反応容器内圧力との関係を示すグラフ、第
6図は本発明の光フアイバ母材の製造方法を説明
する概略断面図、第7図は本発明の一実施列にお
ける内圧制御用ガス流量と反応容器内圧力との関
係を示すグラフ、第8図および第9図は本発明の
他の実施例における入力供給ガス流量と反応容器
内圧力との関係を示すグラフ、第10図は本発明
の他の実施例における排気管のバルブ開度と反応
容器内圧力との関係を示すグラフ、第11図は本
発明の実施例において用いた制御部の回路図であ
る。 1……火炎加水分解バーナ、2……多孔質ガラ
ス母材、3……加熱源、5……火炎、15……圧
力検出器、17……排気装置、18……制御部、
19……ガス供給調節装置、19′……入力供給
ガス調節装置、24……穴。
FIG. 1 is a schematic cross-sectional view explaining the conventional method for manufacturing an optical fiber base material, FIGS. 2 and 3 are schematic cross-sectional views explaining the method for manufacturing the optical fiber base material of the prior application, and FIG. Figure 5 is a graph showing the relationship between the internal pressure control gas flow rate and the internal pressure of the reaction vessel when the manufacturing method of the optical fiber base material of the earlier application is used. A graph showing the relationship between the input supply gas flow rate and the internal pressure of the reaction vessel, FIG. 6 is a schematic cross-sectional view illustrating the method for manufacturing the optical fiber base material of the present invention, and FIG. 7 is the internal pressure control in one embodiment of the present invention. FIGS. 8 and 9 are graphs showing the relationship between input supply gas flow rate and reaction vessel internal pressure in other embodiments of the present invention, and FIG. 10 is a graph showing the relationship between input supply gas flow rate and reaction vessel internal pressure. 11 is a graph showing the relationship between the valve opening degree of the exhaust pipe and the pressure inside the reaction vessel in another embodiment of the present invention, and FIG. 11 is a circuit diagram of the control unit used in the embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Flame hydrolysis burner, 2... Porous glass base material, 3... Heat source, 5... Flame, 15... Pressure detector, 17... Exhaust device, 18... Control unit,
19... Gas supply regulator, 19'... Input supply gas regulator, 24... Hole.

Claims (1)

【特許請求の範囲】 1 排気装置に連接された排気口を有する反応容
器内にターゲツトを配置し、火炎加水分解バーナ
によつて合成されたガラス微粒子をこのターゲツ
トに吹付け、その軸方向に多孔質ガラス母材を成
長させる方法において、上記排気口と排気装置と
の間で、排気管内を流れる排気ガスの流れ方向に
沿つてバイアスガスを強制的に供給し、該バイア
スガスの合流点と上記排気口との間の排気管に大
気中の空気を吸入させる少なくとも1つの穴を設
けたことを特徴とする光フアイバ母材の製造方
法。 2 特許請求の範囲第1項において、前記バイア
スガスが前記反応容器内の圧力変動に応じて流量
調節されることを特徴とする光フアイバ母材の製
造方法。 3 特許請求の範囲第2項において、前記圧力変
動は、前記反応容器の内部に設けた圧力検出器に
よつて検出されることを特徴とする光フアイバ母
材の製造方法。
[Claims] 1. A target is placed in a reaction vessel having an exhaust port connected to an exhaust device, glass fine particles synthesized by a flame hydrolysis burner are sprayed onto the target, and porous holes are formed in the axial direction of the target. In the method for growing a quality glass base material, a bias gas is forcibly supplied between the exhaust port and the exhaust device along the flow direction of the exhaust gas flowing in the exhaust pipe, and the confluence point of the bias gas and the above-mentioned A method for manufacturing an optical fiber base material, characterized in that an exhaust pipe between the exhaust port and the exhaust port is provided with at least one hole for sucking air from the atmosphere. 2. The method for manufacturing an optical fiber preform according to claim 1, wherein the flow rate of the bias gas is adjusted according to pressure fluctuations within the reaction vessel. 3. The method for manufacturing an optical fiber preform according to claim 2, wherein the pressure fluctuation is detected by a pressure detector provided inside the reaction vessel.
JP9064380A 1980-07-04 1980-07-04 Manufacture of base material for optical fiber Granted JPS5717439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9064380A JPS5717439A (en) 1980-07-04 1980-07-04 Manufacture of base material for optical fiber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9064380A JPS5717439A (en) 1980-07-04 1980-07-04 Manufacture of base material for optical fiber

Publications (2)

Publication Number Publication Date
JPS5717439A JPS5717439A (en) 1982-01-29
JPS621333B2 true JPS621333B2 (en) 1987-01-13

Family

ID=14004180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9064380A Granted JPS5717439A (en) 1980-07-04 1980-07-04 Manufacture of base material for optical fiber

Country Status (1)

Country Link
JP (1) JPS5717439A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135147A (en) * 1982-02-08 1983-08-11 Hitachi Ltd Preparation of base material for optical fiber
JPS60246232A (en) * 1984-05-18 1985-12-05 Nippon Sheet Glass Co Ltd Manufacture of optical fiber preform
JP2803510B2 (en) * 1993-02-10 1998-09-24 住友電気工業株式会社 Method and apparatus for manufacturing glass preform for optical fiber
JP5102591B2 (en) * 2007-11-29 2012-12-19 コバレントマテリアル株式会社 Synthetic silica glass production equipment
JP2009132549A (en) * 2007-11-29 2009-06-18 Covalent Materials Tokuyama Corp Synthetic quartz glass production device
JP5615314B2 (en) * 2012-03-28 2014-10-29 コバレントマテリアル株式会社 Synthetic silica glass manufacturing apparatus and synthetic silica glass manufacturing method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626737A (en) * 1979-08-14 1981-03-14 Nippon Telegr & Teleph Corp <Ntt> Exhaust adjuster for optical fiber base material manufacturing apparatus

Also Published As

Publication number Publication date
JPS5717439A (en) 1982-01-29

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