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JPS6213816B2 - - Google Patents
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JPS6213816B2 - - Google Patents

Info

Publication number
JPS6213816B2
JPS6213816B2 JP60050443A JP5044385A JPS6213816B2 JP S6213816 B2 JPS6213816 B2 JP S6213816B2 JP 60050443 A JP60050443 A JP 60050443A JP 5044385 A JP5044385 A JP 5044385A JP S6213816 B2 JPS6213816 B2 JP S6213816B2
Authority
JP
Japan
Prior art keywords
power supply
semiconductor wafer
wafer
power
aging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60050443A
Other languages
Japanese (ja)
Other versions
JPS60220938A (en
Inventor
Kinori Koizumi
Hiroshi Kozai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60050443A priority Critical patent/JPS60220938A/en
Publication of JPS60220938A publication Critical patent/JPS60220938A/en
Publication of JPS6213816B2 publication Critical patent/JPS6213816B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/80Electrical treatments, e.g. for electroforming

Landscapes

  • Testing Of Individual Semiconductor Devices (AREA)

Description

【発明の詳細な説明】 本発明は半導体ウエーハへの給電構造に係り特
に半導体のウエーハレベルで行なう通電エージン
グに好適な半導体ウエーハの給電構造に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a power supply structure for semiconductor wafers, and more particularly to a power supply structure for semiconductor wafers suitable for conductive aging performed at the wafer level of semiconductors.

電子計算機等に於ては、IC等の半導体部品が
多量に使用されている。この為機器の信頼性を向
上させるには使用する半導体部品の信頼性を向上
させることが不可欠である。一般に半導体部品は
製造工程に於て種々の選別、検査工程を経て一定
の品質レベルで出荷されるが、さらに高信頼度を
必要とする場合には部品組立後、メーカー、或い
はユーザに於て“通電エージング”と称するスク
リーニングを行ない製造欠陥による初期不良品の
摘出除去を行ない信頼性の向上を計つている。
2. Description of the Related Art Semiconductor components such as ICs are used in large quantities in electronic computers and the like. Therefore, in order to improve the reliability of equipment, it is essential to improve the reliability of the semiconductor components used. Generally, semiconductor parts go through various sorting and inspection processes during the manufacturing process and are shipped at a certain level of quality. However, if even higher reliability is required, after the parts are assembled, the manufacturer or user We conduct a screening process called ``electrification aging'' to identify and remove early defective products due to manufacturing defects in order to improve reliability.

しかし従来の通電エージング法に於ては、部品
組立後、あるいは部品をプリント基板等に組込後
エージングを実施するため、不良が発生した時に
は部品完成品を捨てたりあるいは交換する等の無
駄を生じ、歩留り次第では相当の原価上昇とな
る。またエージング品の外形寸法が大きくなり大
量に試験を行なうには試験装置が大がかりになる
という欠点があつた。
However, in the conventional energization aging method, aging is carried out after the parts are assembled or after the parts are installed on a printed circuit board, etc., so when a defect occurs, there is waste such as discarding or replacing the finished part. , depending on the yield, the cost will rise considerably. Another drawback is that the external dimensions of the aged product become large, and testing equipment becomes large-scale in order to conduct tests in large quantities.

この様な欠点を解決するには半導体をウエーハ
レベルで通電エージング出来れば非常に有効であ
る。しかし従来に於ては半導体ウエーハ上の各チ
ツプに同時に給電する良好な手段がなくやむを得
ず部品完成後に通電エージングを実施していた。
In order to solve these drawbacks, it would be very effective if semiconductors could be subjected to electrical aging at the wafer level. However, in the past, there was no good means for simultaneously supplying power to each chip on a semiconductor wafer, so energization aging had to be carried out after the parts were completed.

本発明の目的は半導体ウエーハの通電エージン
グに適した給電構造を提供することにある。
An object of the present invention is to provide a power supply structure suitable for energization aging of semiconductor wafers.

一般に1枚の半導体ウエーハは数百以上のチツ
プ群より構成されており、ウエーハレベルの通電
エージングを行なう為には各チツプの給電端子に
同時給電する必要がある。この場合各チツプの給
電端子に機械的プローブで給電する方法はスペー
ス的に非常に困難である。本考案は上記問題点を
解決する為、ウエーハ周辺部に設けた給電パータ
ーンにソケツトを介して一括給電後、ウエーハ内
の配線パターンより個々のICチツプに給電する
方法を提供する。
In general, one semiconductor wafer is made up of several hundred or more chips, and in order to perform wafer-level current aging, it is necessary to simultaneously supply power to the power supply terminals of each chip. In this case, it is very difficult to supply power to the power supply terminals of each chip using a mechanical probe due to space limitations. In order to solve the above-mentioned problems, the present invention provides a method for supplying power to individual IC chips from the wiring pattern inside the wafer after supplying power to the power supply pattern provided around the wafer all at once via a socket.

図1に本発明の給電方式に適した半導体ウエー
ハを示す。シリコンウエーハ1の周辺部には外部
より電源を受電する為の電源パーターン4が円弧
状に配線され、またその上にはソケツト接触子と
の接触を良好にする為の複数個の給電パツト5が
設けられている。尚給電パツト5は電源パターン
部4より厚目に作るのが好ましい。給電パターン
5とICチツプ2間は給電線6で接続されており
各ICチツプの電源端子に接続される。
FIG. 1 shows a semiconductor wafer suitable for the power supply system of the present invention. Around the periphery of the silicon wafer 1, a power supply pattern 4 for receiving power from the outside is wired in an arc shape, and on top of that is a plurality of power supply patterns 5 for making good contact with the socket contacts. It is provided. It is preferable that the power supply pad 5 be made thicker than the power supply pattern section 4. The power supply pattern 5 and the IC chip 2 are connected by a power supply line 6, which is connected to the power terminal of each IC chip.

図2は本発明による給電方法を示したものであ
る。絶縁体で成型された枠状のハウジング6内に
は接触子7を収納する為の収納溝7aが設けられ
ている。接触子7は断面が円形の金属材料でシリ
コンウエーハの給電パターン4の形状に合せた円
弧状の形をしている。尚接触子の材料はシリコン
ウエーハに損傷を与えない為、インジウム、鉛、
の様な軟質の金属が好ましい。シリコンウエーハ
1は配線面を下に向けて接触子7の上に位置決め
して乗せられる。シリコンウエハ1はその背面よ
り、シリコンゴム等の緩衝部材9が貼り付けられ
た押圧板8で押圧され、給電パツト5の部分で接
触子7と接触する。押圧板7はスプリング部材1
0でハウジング6と固定される。
FIG. 2 shows a power supply method according to the present invention. A storage groove 7a for storing a contactor 7 is provided in a frame-shaped housing 6 made of an insulator. The contactor 7 is made of a metal material with a circular cross section and has an arcuate shape matching the shape of the power supply pattern 4 on the silicon wafer. The material of the contact is indium, lead, etc. to avoid damaging the silicon wafer.
A soft metal such as is preferable. The silicon wafer 1 is positioned and placed on the contact 7 with the wiring surface facing down. The silicon wafer 1 is pressed from its back side by a pressing plate 8 to which a buffer member 9 made of silicone rubber or the like is attached, and comes into contact with the contact 7 at the power supply pad 5 portion. The pressing plate 7 is the spring member 1
It is fixed to the housing 6 at 0.

本発明によれば半導体チツプの通電エージング
をウエーハ単位でできるので次のような効果が得
られる。
According to the present invention, since the current aging of semiconductor chips can be performed on a wafer basis, the following effects can be obtained.

(1) ICパツケージ組立前に初期不良が摘出され
るため、後工程後の歩留りが良くなり原価低減
が出来る。特に大規模なLSIに於てはチツプ交
換作業も含めて極めて効果が大きい。
(1) Since initial defects are removed before IC package assembly, the yield after post-processing is improved and costs can be reduced. Particularly in large-scale LSIs, it is extremely effective, including chip replacement work.

(2) 多数のチツプを同時に通電エージング出来る
ため作業そのものが能率的である。
(2) The work itself is efficient because many chips can be energized and aged at the same time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明実施に適したシリコンウエーハ
の平面図、第2図は本発明による半導体ウエーハ
の給電構造を示す平面図及び断面図である。 1…シリコンウエーハ、2…ICチツプ、3…
分断線、4…給電パターン、5…給電パツト、6
…給電線、7…接触子、8…押圧板、9…緩衝部
材、10…スプリング部材。
FIG. 1 is a plan view of a silicon wafer suitable for implementing the present invention, and FIG. 2 is a plan view and a sectional view showing a power supply structure for a semiconductor wafer according to the present invention. 1... Silicon wafer, 2... IC chip, 3...
Parting line, 4...Power supply pattern, 5...Power supply part, 6
... Power supply line, 7... Contact, 8... Pressing plate, 9... Buffer member, 10... Spring member.

Claims (1)

【特許請求の範囲】[Claims] 1 半導体ウエーハの表面周辺部に設けられた給
電パターンに押圧されて電気的に接触される円弧
状の一対の接触子と、該接触子と半導体ウエーハ
を収容し位置決めする枠状の絶縁ハウジングと、
接触子を半導体ウエーハに押圧する押圧部材とか
ら成るソケツトにより、半導体ウエーハに給電す
ることを特徴とする半導体ウエーハの給電構造。
1. A pair of arc-shaped contacts that are pressed and electrically contacted by a power supply pattern provided around the surface of a semiconductor wafer, and a frame-shaped insulating housing that accommodates and positions the contacts and the semiconductor wafer.
A power supply structure for a semiconductor wafer, characterized in that power is supplied to the semiconductor wafer by a socket comprising a contactor and a pressing member for pressing the semiconductor wafer.
JP60050443A 1985-03-15 1985-03-15 Power feed structure for semiconductor wafer Granted JPS60220938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60050443A JPS60220938A (en) 1985-03-15 1985-03-15 Power feed structure for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60050443A JPS60220938A (en) 1985-03-15 1985-03-15 Power feed structure for semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS60220938A JPS60220938A (en) 1985-11-05
JPS6213816B2 true JPS6213816B2 (en) 1987-03-28

Family

ID=12859002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60050443A Granted JPS60220938A (en) 1985-03-15 1985-03-15 Power feed structure for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS60220938A (en)

Also Published As

Publication number Publication date
JPS60220938A (en) 1985-11-05

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