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JPS6216501B2 - - Google Patents
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JPS6216501B2 - - Google Patents

Info

Publication number
JPS6216501B2
JPS6216501B2 JP54082458A JP8245879A JPS6216501B2 JP S6216501 B2 JPS6216501 B2 JP S6216501B2 JP 54082458 A JP54082458 A JP 54082458A JP 8245879 A JP8245879 A JP 8245879A JP S6216501 B2 JPS6216501 B2 JP S6216501B2
Authority
JP
Japan
Prior art keywords
filament
wehnelt electrode
thermal expansion
support member
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54082458A
Other languages
Japanese (ja)
Other versions
JPS567339A (en
Inventor
Takeshi Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP8245879A priority Critical patent/JPS567339A/en
Publication of JPS567339A publication Critical patent/JPS567339A/en
Publication of JPS6216501B2 publication Critical patent/JPS6216501B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/07Eliminating deleterious effects due to thermal effects or electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)

Description

【発明の詳細な説明】 本発明はウエーネルト電極の熱膨脹に基づくビ
ーム電流のドリフトを抑えることのできる電子銃
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron gun that can suppress beam current drift caused by thermal expansion of a Wehnelt electrode.

電子顕微鏡等においては、第1図に示すような
熱電子放出型電子銃が広く使用されている。即ち
フイラメント台1によりフイラメント2を支持せ
しめ、前記フイラメント台1を押しネジ3a,3
bにより基体4内の突出部4a部分に固定せし
め、電子線通過孔5を有するウエーネルト電極6
をその端部に形成されたネジ7によりフイラメン
ト2を囲むように基体4に固定せしめるようにし
ている。該基体4は図示外の電子銃室に設置され
た碍子8に固定される。而して、かかる電子銃に
おいては、電子放出のためのフイラメント7の通
電加熱により、該フイラメント2からの輻射熱、
および熱伝導によつて、前記ウエーネルト電極6
および前記基体4が加熱され、長時間にわたり
余々に膨脹する。そのためフイラメント2とウエ
ーネルト電極6の電子線通過孔5との距離が変化
し、第2図中実線で示す様に長期に渡つて(1時
間以上)ビーム電流のドリフトを生じる。尚ここ
で第2図中実線aに示すビーム電流の変化はフイ
ラメント2の線膨脹によるものであり、又図中実
線bに示す長期のビーム電流の変化が前述したウ
エーネルト電極6の膨脹に基づくフイラメント2
とウエーネルト電極の電子線通過孔5との距離変
化によるものである。
In electron microscopes and the like, a thermionic emission type electron gun as shown in FIG. 1 is widely used. That is, the filament 2 is supported by the filament stand 1, and the filament stand 1 is pressed by screws 3a, 3.
A Wehnelt electrode 6 is fixed to the protrusion 4a in the base 4 by b and has an electron beam passage hole 5.
is fixed to the base 4 so as to surround the filament 2 by means of screws 7 formed at its ends. The base body 4 is fixed to an insulator 8 installed in an electron gun chamber (not shown). In such an electron gun, radiant heat from the filament 2 is generated by heating the filament 7 with electricity for electron emission.
and heat conduction, the Wehnelt electrode 6
Then, the base body 4 is heated and expands excessively over a long period of time. Therefore, the distance between the filament 2 and the electron beam passage hole 5 of the Wehnelt electrode 6 changes, causing a drift of the beam current over a long period of time (more than one hour) as shown by the solid line in FIG. Note that the change in beam current shown by the solid line a in FIG. 2
This is due to a change in the distance between the electron beam passage hole 5 of the Wehnelt electrode and the electron beam passage hole 5 of the Wehnelt electrode.

本発明は斯かるビーム電流の長期変化を防止す
ることを目的とするもので、以下第3図に示す実
施例装置に基づき詳説する。尚第3図において第
1図と同一番号は同一構成要素を示す。
The present invention aims to prevent such long-term changes in beam current, and will be explained in detail below based on the embodiment shown in FIG. In FIG. 3, the same numbers as in FIG. 1 indicate the same components.

即ち本発明においては、フイラメント2を保持
するフイラメント台1を従来のように直接基体4
内に固定することなく、第3図で示すように筒状
の支持部材9を介して基体4内の突出部4aに押
しネジ3a,3bにて固定することに特徴があ
る。10a及び10bはフイラメント台1を支持
部材9の先端に固定するための押しネジである。
That is, in the present invention, the filament stand 1 holding the filament 2 is directly attached to the base 4 as in the conventional case.
It is characterized in that it is fixed to a protrusion 4a inside the base body 4 via a cylindrical support member 9 with set screws 3a and 3b, as shown in FIG. 3, without being fixed inside. 10a and 10b are push screws for fixing the filament stand 1 to the tip of the support member 9.

斯様な構成において、支持部材9としてその熱
膨脹αがウエーネルト電極6を構成する部材の
熱膨脹αより大きいものを使用すれば、ウエー
ネルト電極6の熱膨脹を支持部材9の熱膨脹で補
正することができる。以下この点について少しく
説明する。
In such a configuration, if a support member 9 whose thermal expansion α 1 is larger than the thermal expansion α 2 of the member constituting the Wehnelt electrode 6 is used, the thermal expansion of the Wehnelt electrode 6 can be corrected by the thermal expansion of the support member 9. can. This point will be briefly explained below.

先ず、かかる構成におけるウエーネルト電極6
側とフイラメント2側の熱膨脹に関する基点は基
体4に対する支持部材9の固定部、つまり基体4
の突出部4aと支持部材9との係合面Cとなる。
First, the Wehnelt electrode 6 in such a configuration
The base point for thermal expansion on the side and the filament 2 side is the fixed part of the support member 9 to the base body 4, that is, the base point on the base body 4
This serves as an engagement surface C between the protrusion 4a and the support member 9.

そこで、ウエーネルト電極6の電子線通過孔5
部分はウエーネルト電極6及び基体4の上端部、
つまり係合面Cからウエーネルト電極6の先端f
までの長さl2に相当する熱膨脹(伸び)の分だけ
上方に移動する。又、フイラメント2の先端はフ
イラメント2、フイラメント支持電極棒の突出部
分及び支持部材9の熱膨脹の分だけ同じく上方に
移動する。従つて、ウエーネルト電極及び基体の
上端部の熱膨脹による移動量とフイラメント、フ
イラメント支持電極棒及び支持部材の熱膨脹によ
る伸びとを互いに等しくすれば、ウエーネルト電
極の電子線通過孔とフイラメント先端との距離を
常に一定に保つことができるため、ビーム電流の
ドリフトを低く抑えることができる。
Therefore, the electron beam passing hole 5 of the Wehnelt electrode 6
The parts are the Wehnelt electrode 6 and the upper end of the base 4,
In other words, from the engagement surface C to the tip f of the Wehnelt electrode 6
move upward by the amount of thermal expansion (elongation) corresponding to the length l 2 . Further, the tip of the filament 2 similarly moves upward by the amount of thermal expansion of the filament 2, the protruding portion of the filament supporting electrode rod, and the support member 9. Therefore, if the amount of movement due to thermal expansion of the Wehnelt electrode and the upper end of the base is made equal to the elongation due to thermal expansion of the filament, the filament supporting electrode rod, and the support member, the distance between the electron beam passage hole of the Wehnelt electrode and the tip of the filament is Since it can always be kept constant, the drift of the beam current can be kept low.

ここで、ウエーネルト電極6の電子線通過孔5
部分の移動を考えて見ると、基体4とウエーネル
ト電極6とは通常同一の金属材料で形成されてい
るため、基体の上端は実質的にウエーネルト電極
の一部と見做すことができる。一方、フイラメン
ト先端側の移動においては、先ずフイラメント2
は短時間である一定の高温度に達してしまうた
め、第2図中実線aで示したようにその影響も短
時間で収まり、長時間のビーム電流の変動に対し
ては無視することができる。又、フイラメント支
持電極棒の突出部分はその長さが非常に短いた
め、該突出部分の熱膨脹も無視することができ、
従つて、フイラメント先端の移動は実質的に支持
部材9だけの熱膨脹で決定されると見做すことが
できる。このとき、支持部材9はウエーネルト電
極6の内側に置かれるため、支持部材の長さはウ
エーネルト電極よりも短かくなり、しかも支持部
材とウエーネルト電極との温度は略同程度に保た
れる。その結果、支持部材の熱膨脹率をウエーネ
ルト電極の熱膨脹率よりも大きく選定し、係合面
cから支持部材とフイラメント台1との係合面e
までの長さl1に相当する支持部材の熱膨脹によつ
てl2の長さに相当するウエーネルト電極の熱膨脹
を補正するようになせば良い。
Here, the electron beam passage hole 5 of the Wehnelt electrode 6
Considering the movement of the parts, since the base body 4 and the Wehnelt electrode 6 are usually formed of the same metal material, the upper end of the base body can be substantially regarded as a part of the Wehnelt electrode. On the other hand, when moving the filament tip side, first the filament 2
Since the beam reaches a certain high temperature in a short period of time, its influence subsides in a short period of time, as shown by the solid line a in Figure 2, and can be ignored against long-term beam current fluctuations. . Furthermore, since the length of the protruding portion of the filament-supported electrode rod is very short, the thermal expansion of the protruding portion can be ignored.
Therefore, it can be considered that the movement of the filament tip is substantially determined by the thermal expansion of the support member 9 alone. At this time, since the support member 9 is placed inside the Wehnelt electrode 6, the length of the support member is shorter than the Wehnelt electrode, and the temperatures of the support member and the Wehnelt electrode are maintained at approximately the same level. As a result, the coefficient of thermal expansion of the support member is selected to be larger than the coefficient of thermal expansion of the Wehnelt electrode, and the engagement surface e between the support member and the filament base 1 is selected from the engagement surface c.
The thermal expansion of the Wehnelt electrode corresponding to the length l2 may be compensated for by the thermal expansion of the support member corresponding to the length l1 .

以上詳述した本考案においては、ウエーネルト
電極内部にフイラメントを支持するにあたり、間
にウエーネルト電極の熱膨脹率よりも大きな熱膨
脹率を有する支持部材を介在させているため、ウ
エーネルト電極の熱膨脹を支持部材の熱膨脹で補
正することが可能となり、ウエーネルト電極の電
子線通過孔とフイラメント先端との距離を常に一
定に保つことができる。そのため、第2図中破線
で示すようにビーム電流のドリフトを低く抑える
ことができ、ビーム電流を長時間にわたつて安定
に保つことが可能となる。
In the present invention described in detail above, when supporting the filament inside the Wehnelt electrode, a support member having a coefficient of thermal expansion larger than that of the Wehnelt electrode is interposed, so that the thermal expansion of the Wehnelt electrode is controlled by the support member. This can be corrected by thermal expansion, and the distance between the electron beam passage hole of the Wehnelt electrode and the filament tip can always be kept constant. Therefore, as shown by the broken line in FIG. 2, the drift of the beam current can be suppressed to a low level, and the beam current can be kept stable for a long time.

第4図は本発明の他の実施例を示すもので、該
実施例では、ウエーネルト電極6の基体4への固
定位置と支持部材9の基体4への固定位置を略同
一平面上に設置した場合を示すものである。
FIG. 4 shows another embodiment of the present invention, in which the Wehnelt electrode 6 is fixed to the base 4 and the support member 9 is fixed to the base 4 on substantially the same plane. It shows the case.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は熱電子放出型電子銃を示す断面図、第
2図はビーム電流のドリフトを示す図、第3図は
本発明の一実施例を示す断面図、第4図は本発明
の他の実施例を示す断面図である。 1:フイラメント台、2:フイラメント、3
a,3b,10a及び10b:押しネジ、4:基
体、5:電子線通過孔、6:ウエーネルト電極、
8:碍子、9:支持部材。
FIG. 1 is a cross-sectional view showing a thermionic emission type electron gun, FIG. 2 is a view showing beam current drift, FIG. 3 is a cross-sectional view showing an embodiment of the present invention, and FIG. 4 is a cross-sectional view showing an embodiment of the present invention. FIG. 1: Filament stand, 2: Filament, 3
a, 3b, 10a and 10b: push screw, 4: base, 5: electron beam passage hole, 6: Wehnelt electrode,
8: Insulator, 9: Support member.

Claims (1)

【特許請求の範囲】[Claims] 1 筒状の基体4と、電子を放出するフイラメン
ト2と、一端に該フイラメントを実質的に保持
し、他端が前記基体の内側に取り付けられた筒状
の支持部材9と、前記フイラメントを囲むように
前記基体の先端に取り付けられたウエーネルト電
極6と備え、前記フイラメント加熱に基づく熱膨
張によるウエーネルト電極と支持部材との伸びが
前記基体と支持部材との固定点を基点として同方
向となるようになし、かつ前記支持部材の熱膨張
率をウエーネルト電極を構成する部材の熱膨張率
よりも大きくすることにより前記基点からのウエ
ーネルト電極先端の伸びとフイラメント先端の伸
びとを略等しくするように構成したことを特徴と
する電子銃。
1 A cylindrical base 4, a filament 2 that emits electrons, a cylindrical support member 9 that substantially holds the filament at one end and is attached to the inside of the base at the other end, and surrounds the filament. A Wehnelt electrode 6 is attached to the tip of the base body so that the Wehnelt electrode and the support member elongate in the same direction with respect to the fixed point between the base body and the support member due to thermal expansion caused by heating the filament. None, and by making the coefficient of thermal expansion of the supporting member larger than the coefficient of thermal expansion of the member constituting the Wehnelt electrode, the elongation of the Wehnelt electrode tip from the base point and the elongation of the filament tip are made approximately equal. An electron gun characterized by the following.
JP8245879A 1979-06-29 1979-06-29 Electron gun Granted JPS567339A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8245879A JPS567339A (en) 1979-06-29 1979-06-29 Electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8245879A JPS567339A (en) 1979-06-29 1979-06-29 Electron gun

Publications (2)

Publication Number Publication Date
JPS567339A JPS567339A (en) 1981-01-26
JPS6216501B2 true JPS6216501B2 (en) 1987-04-13

Family

ID=13775061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8245879A Granted JPS567339A (en) 1979-06-29 1979-06-29 Electron gun

Country Status (1)

Country Link
JP (1) JPS567339A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016027575A1 (en) * 2014-08-20 2016-02-25 株式会社島津製作所 Electron source and x-ray tube equipped therewith

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137660A (en) * 1977-05-09 1978-12-01 Hitachi Ltd Electron gun

Also Published As

Publication number Publication date
JPS567339A (en) 1981-01-26

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