JPS622025B2 - - Google Patents
Info
- Publication number
- JPS622025B2 JPS622025B2 JP21079884A JP21079884A JPS622025B2 JP S622025 B2 JPS622025 B2 JP S622025B2 JP 21079884 A JP21079884 A JP 21079884A JP 21079884 A JP21079884 A JP 21079884A JP S622025 B2 JPS622025 B2 JP S622025B2
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- copper
- based alloy
- plating
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 52
- 238000007747 plating Methods 0.000 claims description 32
- 229910052759 nickel Inorganic materials 0.000 claims description 26
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 25
- 229910052802 copper Inorganic materials 0.000 claims description 25
- 239000010949 copper Substances 0.000 claims description 25
- 229910045601 alloy Inorganic materials 0.000 claims description 21
- 239000000956 alloy Substances 0.000 claims description 21
- 238000000137 annealing Methods 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000005260 corrosion Methods 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 238000005097 cold rolling Methods 0.000 description 7
- 238000005336 cracking Methods 0.000 description 7
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 239000010956 nickel silver Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Inorganic materials [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229940074404 sodium succinate Drugs 0.000 description 1
- ZDQYSKICYIVCPN-UHFFFAOYSA-L sodium succinate (anhydrous) Chemical compound [Na+].[Na+].[O-]C(=O)CCC([O-])=O ZDQYSKICYIVCPN-UHFFFAOYSA-L 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
〔産業上の利用分野〕
本発明はニツケルめつき銅基合金(銅も含
む。)の製造法に関し、さらに詳しくは、水晶振
動子のキヤン、トランジスターのキヤツプ、電池
用のケース、ボタンおよび装飾具等に代表される
深絞り加工製品に適した、特に、深絞り加工時に
耳の発生が少なく、また、ニツケルめつき層の割
れ発生或いは剥離のない銅基合金の製造法に関す
るものである。
〔従来技術〕
一般に、水晶振動子のキヤン、トランジスター
のキヤツプには主として洋白が使用されてきてい
るが、耐蝕性および耐応力腐蝕割れ性を考慮して
製品の表面にニツケルめつきを施していた。ま
た、ボタン、装飾具等は深絞り加工にニツケルめ
つきが施され、耐蝕性および耐摩耗性を向上させ
ていた。
さらに、電池のケースには鉄を深絞り加工後、
その製品の両面にニツケルめつきを施したものが
使用されてきている。
このように、水晶振動子のキヤン、トランジス
ターのキヤツプ、電池用のケース、ボタンおよび
装飾具等は、深絞り加工後にニツケルめつきが施
されているが、形状が複雑なためにめつき層が不
均一となり、歩留りが低下すると共にめつきに多
くの時間を必要とするので生産性は非常に低いの
である。
〔発明が解決しようとする問題点〕
本発明は上記に説明したように、従来技術にお
ける種々の形状の深絞り加工において、この加工
後にニツケルめつきを施すことによる問題点に鑑
みなされたものであり、即ち、本発明者が鋭意研
究を行なつた結果、予じめニツケルめつきした条
でめつきが剥離することなく深絞り加工を行なう
ことができるニツケルめつきを施した銅基合金条
を製造する方法を開発したのである。
〔問題点を解決するための手段〕
本発明に係るニツケルめつき銅基合金の製造法
の特徴とするところは、銅もしくは銅基合金の素
条に0.5〜10μの厚さのニツケルめつきを施し、
500〜800℃の温度において5〜30秒間焼鈍し、次
いで、25〜45%の冷間圧延を行なつた後、500〜
800℃の温度において5〜30秒間焼鈍することに
ある。
従つて、耳率2%以下の深絞り加工性の良好
な、かつ、めつき剥離することがないニツケルめ
つき銅基合金条の製造法である。
本発明に係るニツケルめつき銅基合金の製造法
について以下詳細に説明する。
本発明に係るニツケルめつき銅基合金の製造法
における(1)めつき厚さ、(2)焼鈍温度および焼鈍時
間、(3)冷間圧延および(4)焼鈍温度および時間につ
いて具体的に説明する。
(1) めつき厚さについて。
ニツケルめつき厚さの下限を0.5μに抑えた
のは、その後の冷間圧延さらには深絞り加工に
よつて少なくとも0.3μ以上のめつきの厚さを
保持させて、ニツケルの耐蝕性、耐応力腐蝕割
れ性を発揮させるためであり、また、ニツケル
めつき厚さの上限を10μとしたのは、それ以上
の厚さでは耐蝕性および耐応力腐蝕割れ性もそ
れ程向上せず、経済的にも無駄である。よつ
て、ニツケルめつきの厚さは0.5〜10μとる。
(2) 焼鈍温度および焼鈍時間について。
ニツケルめつきを施した直後に、500〜800℃
の温度において5〜30秒間の焼鈍を行なうので
あるが、焼鈍温度が500℃未満では焼鈍時間を
30秒間としてもニツケルめつき層が軟化せず、
その後の圧延でめつき層に割れを生じ、かつ、
銅基合金条自身が軟化せず、焼鈍温度が800℃
を越えると5秒間の保持時間でニツケルめつき
層および母材の銅合金条は充分軟化するがエネ
ルザーの無駄であり、さらに、ニツケルめつき
層の酸化皮膜が硬く緻密になり、酸洗除去が困
難となり経済的でない。次に、焼鈍時間を5秒
を下限としたのは、5秒未満では焼鈍時の銅基
合金条の板厚方向の温度分布が不均一となり、
中央部が軟化せず、軟化後の強度および伸びが
中央部と端部で異なるようになり、また、30秒
を越えると焼鈍は生産性の面から好ましくな
い。
(3) 冷間圧延について。
焼鈍後の冷間圧延の加工率は25〜40%とする
のがよく、銅基合金条の深絞り加工時の耳率を
2%以下に抑えるために必要であり、耳率が2
%を越えると表面のニツケルめつき層に局部的
な割れおよび剥離が生じ易くなり、さらに、こ
の冷間圧延によつてニツケルめつき層は中に含
まれている空隙が激減し、ニツケ箔ヲクラツド
したようになり、耐蝕性および耐応力腐蝕割れ
性が向上する。よつて、冷間圧延は25〜40%の
加工率で行なうのである。
(4) 最終焼鈍温度および時間について。
この最終焼鈍は、ニツケルめつき層と銅基合
金条の軟質化とめつき層の密着性の強化と深絞
り加工時に生じる耳率を2%以下とするために
必須の熱処理工程であり、焼鈍温度および時間
については(1)焼鈍温度および焼鈍時間において
説明したところと全く同じである。
なお、本発明に係るニツケルめつき銅基合金条
の製造法において対象となる銅もしくは銅基合金
条として、深絞り加工に適した成形加工性の良好
なものであれば何れの銅もしくは銅基合金でもよ
いが、代表例としては、CDA72500(Cu―9wt
%Ni―2.3wt%Sn)、JIS C7521(Cu―18wt%Ni
―18wt%Zn)およびJIS C2680(Cu―35wt%
Zn)等が挙げられる。
なお、ニツケルめつきは、燐その他の不純物元
素の混入を防ぐためと銅合金条のめつきという点
を考慮して電気めつきを適用するのがよく、無電
解酸性ニツケルめつき浴としては、塩化ニツケル
または硫酸ニツケルと次亜燐酸ナトリウムを必須
成分とし、次亜燐酸ナトリウム、オキシ酢酸ナト
リウム、酢酸ナトリウム、クエン酸ナトリウム、
コハク酸ナトリウム、リンゴ酸、ホウ酸等の何れ
かを含むものが挙げられ、また、無電解アルカリ
ニツケルめつき浴としては、塩化ニツケル、次亜
燐酸ナトリウムおよび塩化アンモニウムを必須成
分としたものが挙げられる。しかし、これらの無
電解めつきにおいては、次亜燐酸を使用するため
ニツケルめつき層に含有されるPが4〜5wt%
以上にもなり、屑理用の面から無電解めつきは推
められない。即ち、電解めつき浴としては、硫酸
ニツケル、塩化ニツケル、ホウ酸等を含むワツト
浴等が挙げられる。
〔実施例〕
本発明に係るニツケルめつき銅基合金条の製造
法について実施例を説明する。
実施例
CDA72500、JISC7521およびJISC2680の何れ
も加工率60%以上の銅基合金素条を、硫酸―過酸
化水素混液により清浄化した後、アルカリ電解脱
脂を行ない、硫酸ニツケル300g/、塩化ニツケ
ル45g/、ホウ酸35g/のワツト浴による電解
めつきを行なつて第1表に示す試料を調整した。
[Industrial Application Field] The present invention relates to a method for manufacturing nickel-plated copper-based alloys (including copper), and more specifically, to crystal oscillator cans, transistor caps, battery cases, buttons, and decorative items. The present invention relates to a method for producing a copper-based alloy that is suitable for deep-drawn products such as, etc., and in particular has fewer selvages during deep-drawing and does not cause cracking or peeling of the nickel plating layer. [Prior art] Generally, nickel silver has been mainly used for the caps of crystal resonators and transistors, but the surface of the product is plated with nickel in consideration of its corrosion resistance and stress corrosion cracking resistance. Ta. In addition, buttons, ornaments, etc. were deep drawn and nickel plated to improve their corrosion and abrasion resistance. Furthermore, the battery case is made of iron after deep drawing.
Products with nickel plating on both sides have been used. In this way, crystal oscillator caps, transistor caps, battery cases, buttons, decorative items, etc. are plated with nickel after deep drawing, but due to their complex shapes, the plating layer is difficult to coat. This results in non-uniformity, lowering the yield, and requiring a lot of time for plating, resulting in very low productivity. [Problems to be Solved by the Invention] As explained above, the present invention has been made in view of the problems caused by applying nickel plating after deep drawing of various shapes in the prior art. That is, as a result of intensive research by the present inventors, a nickel-plated copper-based alloy strip that can be deep-drawn without the plating peeling off has been developed. He developed a method for manufacturing it. [Means for Solving the Problems] The method for producing a nickel-plated copper-based alloy according to the present invention is characterized by applying nickel plating to a thickness of 0.5 to 10 μm on a copper or copper-based alloy strip. alms,
After annealing for 5 to 30 seconds at a temperature of 500 to 800 °C, and then cold rolling by 25 to 45%,
The method consists of annealing at a temperature of 800°C for 5 to 30 seconds. Therefore, this is a method for producing a nickel-plated copper-based alloy strip that has a selvage ratio of 2% or less, has good deep drawing workability, and does not cause peeling of the plating. The method for producing a nickel-plated copper-based alloy according to the present invention will be described in detail below. A detailed explanation of (1) plating thickness, (2) annealing temperature and time, (3) cold rolling, and (4) annealing temperature and time in the method for producing a nickel-plated copper-based alloy according to the present invention. do. (1) Regarding plating thickness. The reason why the lower limit of the nickel plating thickness was suppressed to 0.5μ was that the plating thickness was maintained at least 0.3μ through subsequent cold rolling and deep drawing, thereby improving the corrosion resistance and stress resistance of nickel. This is in order to exhibit corrosion cracking resistance, and the reason why the upper limit of the nickel plating thickness was set at 10 μm is because the corrosion resistance and stress corrosion cracking resistance will not improve significantly if the thickness is higher than that, and it is economically disadvantageous. It's a waste. Therefore, the thickness of the nickel plating should be 0.5 to 10μ. (2) Regarding annealing temperature and annealing time. Immediately after applying nickel plating, heat at 500 to 800℃.
Annealing is performed for 5 to 30 seconds at a temperature of
The nickel plating layer does not soften even after 30 seconds.
Cracks occur in the plating layer during subsequent rolling, and
The copper-based alloy strip itself does not soften, and the annealing temperature is 800℃.
If the holding time exceeds 5 seconds, the nickel plating layer and the base copper alloy strip will be sufficiently softened, but it will be a waste of energy, and furthermore, the oxide film on the nickel plating layer will become hard and dense, making it difficult to remove by pickling. It is difficult and uneconomical. Next, the reason why the annealing time was set at the lower limit of 5 seconds is because if it is less than 5 seconds, the temperature distribution in the thickness direction of the copper-based alloy strip during annealing will be uneven.
The center part is not softened, and the strength and elongation after softening become different between the center part and the ends, and annealing for more than 30 seconds is not preferable from the viewpoint of productivity. (3) Regarding cold rolling. The working ratio of cold rolling after annealing is preferably 25 to 40%, which is necessary to keep the selvage ratio at 2% or less during deep drawing of copper-based alloy strips.
%, the nickel plating layer on the surface is likely to cause local cracking and peeling, and furthermore, this cold rolling drastically reduces the voids contained in the nickel plating layer, making it difficult to cover the nickel foil. As a result, corrosion resistance and stress corrosion cracking resistance are improved. Therefore, cold rolling is performed at a processing rate of 25 to 40%. (4) Final annealing temperature and time. This final annealing is an essential heat treatment process for softening the nickel plating layer and the copper-based alloy strip, strengthening the adhesion between the plating layer, and reducing the selvage rate generated during deep drawing to 2% or less. The annealing temperature and time are exactly the same as explained in (1) annealing temperature and annealing time. In addition, as the target copper or copper-based alloy strip in the method for manufacturing the nickel-plated copper-based alloy strip according to the present invention, any copper or copper-based alloy strip that is suitable for deep drawing and has good formability can be used. Alloys may be used, but a typical example is CDA72500 (Cu-9wt
%Ni-2.3wt%Sn), JIS C7521(Cu-18wt%Ni
-18wt%Zn) and JIS C2680 (Cu-35wt%
Zn), etc. For nickel plating, it is best to use electroplating in order to prevent the contamination of phosphorus and other impurity elements and to plate copper alloy strips.As an electroless acid nickel plating bath, The essential ingredients are nickel chloride or nickel sulfate and sodium hypophosphite, including sodium hypophosphite, sodium oxyacetate, sodium acetate, sodium citrate,
Examples include those containing sodium succinate, malic acid, boric acid, etc. Electroless alkaline nickel plating baths include those containing nickel chloride, sodium hypophosphite, and ammonium chloride as essential components. It will be done. However, in these electroless plating methods, since hypophosphorous acid is used, the P content in the nickel plating layer is 4 to 5 wt%.
Given the above, electroless plating is not recommended from the perspective of waste disposal. That is, examples of electrolytic plating baths include Watt baths containing nickel sulfate, nickel chloride, boric acid, and the like. [Example] Examples of the method for manufacturing a nickel-plated copper-based alloy strip according to the present invention will be described. Examples CDA72500, JISC7521, and JISC2680 copper-based alloy strips with a processing rate of 60% or more were cleaned with a sulfuric acid-hydrogen peroxide mixture, and then subjected to alkaline electrolytic degreasing to produce nickel sulfate 300g/nickel chloride 45g/ The samples shown in Table 1 were prepared by electroplating using a Watts bath containing 35 g of boric acid.
【表】
この第1表に示す試料を第2表に示す条件で、
500℃未満の温度は硝石炉で、500℃を越える温度
な塩浴炉で焼鈍し、さらに、厚さ0.60mmに圧延
し、ニツケルめつき層の圧延後の状況を調査し
た。[Table] The samples shown in Table 1 were tested under the conditions shown in Table 2.
It was annealed in a saltpeter furnace at a temperature below 500°C and in a salt bath furnace at a temperature above 500°C, and then rolled to a thickness of 0.60 mm, and the condition of the nickel plated layer after rolling was investigated.
【表】
試料No.1、2、3、4、5、6についてはニツ
ケルめつき後に、焼鈍条件を650℃の温度におい
て20秒間、試料No.7、8、9については、600℃
の温度において15秒間の熱処理を行ない、夫々の
厚さの条を厚さ0.60mmまで冷間圧延し、さらに、
試料No.1〜6については650℃の温度で20秒間、
試料No.7〜9については、600℃の温度で15秒間
の最終焼鈍を行なつた。
このように調整した試料をエリクセン試験機に
より深絞り加工を行なつた。
試料のブランク径71.7mmとし、絞りは54%と定
め、ポンチ径33.0mm、ポンチR4.5mm、ダイス径
34.5mm、ダイスR3.0mmR、皺押え圧力200Kg、潤
滑油はジヨンソンワツクスと水とを1対3で稀釈
して使用し、絞り速度7.8mm/秒で絞り成品を作
製して評価した。
作製された絞り材の平均山の高さHmmと平均谷
の深さhmmを測定し、
(H−h)/{(H+h)/2}×100(%)
により耳率を算出した。
その結果を第3表に示す。[Table] Samples Nos. 1, 2, 3, 4, 5, and 6 were annealed at a temperature of 650℃ for 20 seconds after nickel plating, and samples Nos. 7, 8, and 9 were annealed at 600℃.
Heat treatment was performed for 15 seconds at a temperature of
For samples No. 1 to 6, at a temperature of 650℃ for 20 seconds,
Samples Nos. 7 to 9 were subjected to final annealing at a temperature of 600° C. for 15 seconds. The sample thus prepared was deep drawn using an Erichsen testing machine. The blank diameter of the sample was 71.7 mm, the aperture was set as 54%, the punch diameter was 33.0 mm, the punch radius was 4.5 mm, and the die diameter was
34.5mm, die radius 3.0mmR, wrinkle pressing pressure 200Kg, lubricating oil was diluted 1:3 with Johnson wax and water, and a drawing product was prepared and evaluated at a drawing speed of 7.8mm/sec. The average peak height Hmm and average valley depth hmm of the produced drawing material were measured, and the selvage rate was calculated by (H-h)/{(H+h)/2}×100(%). The results are shown in Table 3.
以上説明したように、本発明に係るニツケルめ
つき銅基合金条の製造法は上記の構成を有してい
るものであるから、製造された製品には割れの発
生がなく、また、めつき層の剥離もない優れたも
ので、さらに、耐蝕性および耐応力腐蝕割れ性に
も優れ、深絞り加工後にめつきするという工程を
省略することができ、生産性にも優れているとい
う効果を有するものである。
As explained above, since the method for manufacturing a nickel-plated copper-based alloy strip according to the present invention has the above-mentioned configuration, the manufactured product does not have cracks, and has no plating. It is an excellent material with no peeling of layers, has excellent corrosion resistance and stress corrosion cracking resistance, and can omit the plating process after deep drawing, resulting in excellent productivity. It is something that you have.
Claims (1)
さのニツケルめつきを施し、500〜800℃の温度に
おいて5〜30秒間焼鈍し、次いで、25〜45%の冷
間圧延を行なつた後、500〜800℃の温度において
5〜30秒間焼鈍することを特徴とする耳率2%以
下の深絞り加工性の良好なめつきの剥離しないニ
ツケルめつき銅基合金の製造法。1 Nickel plating with a thickness of 0.5 to 10μ is applied to a copper or copper-based alloy strip, annealed at a temperature of 500 to 800°C for 5 to 30 seconds, and then cold rolled by 25 to 45%. 1. A method for producing a nickel-plated copper-based alloy with an selvedge ratio of 2% or less, good deep drawing workability, and no peeling of the plating, which is characterized by annealing for 5 to 30 seconds at a temperature of 500 to 800°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21079884A JPS6187857A (en) | 1984-10-08 | 1984-10-08 | Manufacture of nickel-plated bar of copper-base alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21079884A JPS6187857A (en) | 1984-10-08 | 1984-10-08 | Manufacture of nickel-plated bar of copper-base alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6187857A JPS6187857A (en) | 1986-05-06 |
| JPS622025B2 true JPS622025B2 (en) | 1987-01-17 |
Family
ID=16595305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21079884A Granted JPS6187857A (en) | 1984-10-08 | 1984-10-08 | Manufacture of nickel-plated bar of copper-base alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6187857A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4810310A (en) * | 1986-05-27 | 1989-03-07 | Olin Corporation | Composites having improved resistance to stress relaxation |
| CN101886280B (en) * | 2010-07-30 | 2012-02-22 | 福建师范大学 | A method for preparing nickel-plated alloy aluminum lugs by electroplating with different current wave patterns |
| CN101899694B (en) * | 2010-07-30 | 2012-02-22 | 福建师范大学 | Preparation method of bright nickel-plated aluminum lug |
-
1984
- 1984-10-08 JP JP21079884A patent/JPS6187857A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6187857A (en) | 1986-05-06 |
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