JPS6220675B2 - - Google Patents
Info
- Publication number
- JPS6220675B2 JPS6220675B2 JP55171393A JP17139380A JPS6220675B2 JP S6220675 B2 JPS6220675 B2 JP S6220675B2 JP 55171393 A JP55171393 A JP 55171393A JP 17139380 A JP17139380 A JP 17139380A JP S6220675 B2 JPS6220675 B2 JP S6220675B2
- Authority
- JP
- Japan
- Prior art keywords
- frequency
- radiation source
- heated
- heating chamber
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Constitution Of High-Frequency Heating (AREA)
Description
【発明の詳細な説明】
本発明は多量の被加熱物を同時に高周波加熱す
るために、加熱室内に被加熱物を載置する載置棚
を上下に2段設置する高周波加熱装置において、
上下各段相互間の加熱むらを低減するようにした
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention provides a high-frequency heating apparatus in which two shelves for placing objects to be heated are installed in a heating chamber, one above the other, in order to simultaneously perform high-frequency heating on a large amount of objects to be heated.
This is to reduce uneven heating between the upper and lower stages.
従来の高周波加熱装置において、被加熱物を載
置する載置棚を加熱室底面近くに1枚設置するの
が一般的である。この場合、載置棚が一枚なの
で、多量の被加熱物を加熱処理するには、何回に
も分ける必要があり、手間が掛かつていた。その
ため、一つの加熱室内で一回の加熱処理量を増や
す手段として加熱室内に載置棚を2段設置するこ
とも考えられるが、上下各段相互間の加熱むらが
大きく、2段同時に仕上がらないという欠点があ
つた。 In conventional high-frequency heating devices, it is common to install one shelf near the bottom of the heating chamber on which the object to be heated is placed. In this case, since there is only one shelf, in order to heat treat a large amount of objects to be heated, it is necessary to heat the objects several times, which is time-consuming. Therefore, as a means to increase the amount of heat processed in one heating chamber, it is possible to install two stages of mounting shelves in the heating chamber, but the heating unevenness between the upper and lower stages is large, making it impossible to finish the two stages at the same time. There was a drawback.
そこで本発明は、加熱室内へ高周波エネルギー
を放射する放射源(たとえば回転アンテナ)を加
熱室の上部および下部に設け、それら放射源から
高周波発振器のアンテナ部までの導波管内での伝
送経路、およびそれら放射源と被加熱物との距離
を適切に選ぶことにより上記欠点を解消しようと
するものである。 Therefore, the present invention provides radiation sources (for example, rotating antennas) that radiate high-frequency energy into the heating chamber at the upper and lower parts of the heating chamber, and a transmission path within the waveguide from the radiation sources to the antenna section of the high-frequency oscillator. The above-mentioned drawbacks are attempted to be overcome by appropriately selecting the distance between the radiation source and the object to be heated.
以下、本発明の高周波加熱装置の一実施例を図
図により説明する。 DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the high-frequency heating device of the present invention will be described below with reference to drawings.
実施例の構成は図の如くであり、1は高周波エ
ネルギーを発生する高周波発振器で、コの字形の
導波管2を介して加熱室3内に高周波エネルギー
を放射する回転アンテナの放射源4a,4bに高
周波エネルギーを供給する。上部の放射源4aの
回転軸は加熱室3の上面中央を貫通する金属軸5
aと、導波管2を貫通する誘電体製の駆動軸6a
とから形成されている。下部放射源4bの回転軸
は加熱室3の下面中央を貫通する金属軸5bと、
導波管2を貫通する誘電体製の駆動軸6bとから
形成されている。なお放射源4aと4bの形成を
同一とし、高周波放射パターンを同じにしてい
る。7a被加熱物8aを載置する載置棚で、高周
波透過性の誘電体からなる。7bは7aと同様に
被加熱物8bを載置する載置棚で、高周波透過性
の誘電体から成る。載置棚7a,7bはそれぞれ
棚支持具9a,9bにより加熱室3内の上段およ
び下段に保持されている。上部放射源4aと上段
の載置棚7aとの距離Aを、下部放射源4bと下
段の載置棚7bとの距離Bよりもλ/20〜λ/2
(λ:高周波の波長)だけ大きくしている。ま
た、高周波発振器1のアンテナ部1aをコの字形
の導波管2の上下の中心、あるいは中心から管内
波長の1/2の整数倍の位置に取付けている。すな
わち、高周波発振器1のアンテナ部1aから上部
放射源4aの回転アンテナ、または下部の放射源
4bの取付部までの導波管内の伝送経路長a,b
において、aとbとを等しくするかもしくはaと
bとの差を管内波長の1/2の整数倍になるように
構成する。 The configuration of the embodiment is as shown in the figure. Reference numeral 1 denotes a high-frequency oscillator that generates high-frequency energy, and a radiation source 4a of a rotating antenna that radiates high-frequency energy into the heating chamber 3 through a U-shaped waveguide 2. 4b is supplied with high frequency energy. The rotation axis of the upper radiation source 4a is a metal shaft 5 passing through the center of the upper surface of the heating chamber 3.
a, and a dielectric drive shaft 6a that passes through the waveguide 2.
It is formed from. The rotation axis of the lower radiation source 4b is a metal shaft 5b passing through the center of the lower surface of the heating chamber 3,
It is formed from a dielectric drive shaft 6b that passes through the waveguide 2. Note that the radiation sources 4a and 4b are formed in the same manner and have the same high-frequency radiation pattern. 7a A shelf on which the object to be heated 8a is placed, and is made of a dielectric material that is transparent to high frequencies. Similarly to 7a, 7b is a shelf on which the object to be heated 8b is placed, and is made of a dielectric material that is transparent to high frequencies. The mounting shelves 7a and 7b are held at the upper and lower stages in the heating chamber 3 by shelf supports 9a and 9b, respectively. The distance A between the upper radiation source 4a and the upper mounting shelf 7a is λ/20 to λ/2 longer than the distance B between the lower radiation source 4b and the lower mounting shelf 7b.
(λ: wavelength of high frequency). Further, the antenna section 1a of the high-frequency oscillator 1 is attached to the vertical center of the U-shaped waveguide 2, or at a position an integral multiple of 1/2 of the guide wavelength from the center. That is, the transmission path lengths a and b in the waveguide from the antenna part 1a of the high-frequency oscillator 1 to the rotating antenna of the upper radiation source 4a or the attachment part of the lower radiation source 4b
In this case, a and b are made equal, or the difference between a and b is configured to be an integral multiple of 1/2 of the tube wavelength.
次に、本発明の高周波加熱装置の動作を説明す
る。高周波発振器1から発生する高周波エネルギ
ーは導波管2を介して上下の放射源4a,4bに
供給されると、それぞれの放射源4a,4bは高
周波エネルギーを放射し、加熱室3内の被加熱物
8a,8bを誘電加熱する。放射源4a,4bの
回転アンテナを同一の形状および寸法とし、距離
AをBよりもλ/20〜λ/2だけ大きくすると、被
加熱物8aと8bとの加熱パターンもほぼ一致す
ることが確認されている。さらに高周波発振器1
のアンテナ部1aを導波管2の中心、あるいは中
心から管内波長の1/2の整数倍の位置に取付ける
と、アンテナ部1aから上方を見た負荷条件と下
方を見た負荷条件とがほぼ等しいので、放射源4
aと4bから放射される高周波エネルギーの量が
等しくなる。したがつて、上下2段の被加熱物8
aと8bとの相互間の加熱むらが少なく、かつ同
時に仕上がることになる。 Next, the operation of the high frequency heating device of the present invention will be explained. When the high-frequency energy generated from the high-frequency oscillator 1 is supplied to the upper and lower radiation sources 4a and 4b via the waveguide 2, each radiation source 4a and 4b emits high-frequency energy to Objects 8a and 8b are dielectrically heated. When the rotating antennas of the radiation sources 4a and 4b have the same shape and dimensions, and the distance A is made larger than B by λ/20 to λ/2, it is confirmed that the heating patterns of the heated objects 8a and 8b almost match. has been done. Furthermore, high frequency oscillator 1
When the antenna section 1a is installed at the center of the waveguide 2, or at a position an integral multiple of 1/2 of the guide wavelength from the center, the load condition when looking upward from the antenna section 1a and the load condition when looking down from the antenna section 1a are approximately the same. Since they are equal, the radiation source 4
The amount of high frequency energy radiated from a and 4b becomes equal. Therefore, the objects to be heated 8 in the upper and lower stages
There is little uneven heating between a and 8b, and they are finished at the same time.
以上のように、本発明によると、加熱室3の上
下に放射源4a,4bを設け、載置棚を上下2段
に設置し、上部の放射源4aと上段の載置棚7a
との距離Aを、下部の放射源4bと下段の載置棚
7bとの距離Bよりもλ/20〜λ/2だけ大きく
し、かつ放射源4aと4bとを同一形状、同一放
射電力にしているので、上下の被加熱物8a,8
b相互間の加熱むらが少なく、上下同時に仕上が
り、多量の被加熱物を容易に加熱処理できる効果
がある。さらに本発明は、高周波加熱装置本体の
床面積に対して被加熱物の載置面積を大きくとれ
るので、特に狭い調理場を持つレストランやスナ
ツク喫茶店などの業務用はもちろん、家庭用とし
ても1台で2台分の働きをし、使い勝手のよい高
周波加熱装置である。 As described above, according to the present invention, the radiation sources 4a and 4b are provided above and below the heating chamber 3, and the mounting shelves are installed in two stages, the upper radiation source 4a and the upper mounting shelf 7a.
The distance A between the lower radiation source 4b and the lower mounting shelf 7b is made larger by λ/20 to λ/2, and the radiation sources 4a and 4b are made to have the same shape and the same radiated power. Therefore, the upper and lower heated objects 8a, 8
(b) There is little heating unevenness between each other, the upper and lower surfaces can be finished at the same time, and a large amount of objects to be heated can be easily heat-treated. Furthermore, the present invention allows a large area for placing the heated object relative to the floor area of the high-frequency heating device itself, so it can be used not only for commercial purposes such as restaurants and snack cafes with particularly small cooking areas, but also for home use. It is an easy-to-use high-frequency heating device that does the work of two machines.
図面は本発明の高周波加熱装置の一実施例を示
す断面図である。
3……加熱室、4a,4b……放射源(回転ア
ンテナ)、7a,7b……載置棚、8a,8b…
…被加熱物。
The drawing is a sectional view showing an embodiment of the high frequency heating device of the present invention. 3...Heating chamber, 4a, 4b...Radiation source (rotating antenna), 7a, 7b...Placement shelf, 8a, 8b...
...Object to be heated.
Claims (1)
一形状、かつ同一高周波電力を放射する放射源4
a,4bを設け、加熱室3内に被加熱物8a,8
bを載置する載置棚7a,7bを上下2段に設置
し、上部放射源4aと上段載置棚7aとの距離A
を、下部放射源4bと下部載置棚7bとの距離B
よりもλ/20〜λ/2(λ=高周波の波長)相当分
だけ大きくしたことを特徴とする高周波加熱装
置。1 Radiation sources 4 having the same shape and emitting the same high-frequency power at the upper center and lower center of the heating chamber 3, respectively.
a, 4b are provided, and objects to be heated 8a, 8 are placed in the heating chamber 3.
The mounting shelves 7a and 7b on which the rays b are placed are installed in two stages, upper and lower, and the distance A between the upper radiation source 4a and the upper mounting shelf 7a is
, the distance B between the lower radiation source 4b and the lower mounting shelf 7b
A high-frequency heating device characterized in that it is larger by an amount equivalent to λ/20 to λ/2 (λ = wavelength of high frequency).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17139380A JPS5795095A (en) | 1980-12-04 | 1980-12-04 | High frequency heater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17139380A JPS5795095A (en) | 1980-12-04 | 1980-12-04 | High frequency heater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5795095A JPS5795095A (en) | 1982-06-12 |
| JPS6220675B2 true JPS6220675B2 (en) | 1987-05-08 |
Family
ID=15922324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17139380A Granted JPS5795095A (en) | 1980-12-04 | 1980-12-04 | High frequency heater |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5795095A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS603594U (en) * | 1983-06-17 | 1985-01-11 | 松下電器産業株式会社 | High frequency heating device |
| JPH02160395A (en) * | 1988-12-14 | 1990-06-20 | Mitsubishi Electric Corp | High frequency heating device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410450A (en) * | 1977-06-24 | 1979-01-26 | Hitachi Heating Appliance Co Ltd | Door sealing device for high-frequency heating apparatus |
-
1980
- 1980-12-04 JP JP17139380A patent/JPS5795095A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5795095A (en) | 1982-06-12 |
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