JPS6221255B2 - - Google Patents
Info
- Publication number
- JPS6221255B2 JPS6221255B2 JP17061579A JP17061579A JPS6221255B2 JP S6221255 B2 JPS6221255 B2 JP S6221255B2 JP 17061579 A JP17061579 A JP 17061579A JP 17061579 A JP17061579 A JP 17061579A JP S6221255 B2 JPS6221255 B2 JP S6221255B2
- Authority
- JP
- Japan
- Prior art keywords
- dielectric ceramic
- electrode film
- electrode
- wax
- laminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 34
- 239000000919 ceramic Substances 0.000 claims description 32
- 230000002093 peripheral effect Effects 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 14
- 229920005989 resin Polymers 0.000 claims description 14
- 239000003985 ceramic capacitor Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 239000000243 solution Substances 0.000 description 15
- 239000001993 wax Substances 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000007654 immersion Methods 0.000 description 5
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 235000019808 microcrystalline wax Nutrition 0.000 description 3
- 239000004200 microcrystalline wax Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000010721 machine oil Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
【発明の詳細な説明】
本発明は超音波を利用して誘電体磁器基板の端
面周縁部に電極マージンを形成するようにした磁
器コンデンサの電極形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming electrodes of a ceramic capacitor in which an electrode margin is formed at the peripheral edge of an end face of a dielectric ceramic substrate using ultrasonic waves.
一般に、磁器コンデンサにおいては、第1図に
示すように、電極1および2には、誘電体磁器基
板3の両端面の周縁部で夫々電極マージン4,4
を設け、上記電極1と2との間の沿面距離を大き
くして所定の絶縁耐力を得るようにしている。 Generally, in a ceramic capacitor, as shown in FIG.
is provided, and the creepage distance between the electrodes 1 and 2 is increased to obtain a predetermined dielectric strength.
従来、この種の磁器コンデンサの電極形成方法
としては、第2図aに示すように、誘電体磁器基
板11の全面に無電解メツキ法等によつて電極膜
12を形成し、上記誘電体磁器基板11を多数積
層し、第2図bに示すように、全体をワツクスも
しくは樹脂で被覆して棒状の積層体13を形成
し、該積層体13の外周面の電極膜12′および
その外側のワツクスもしくは樹脂を、第2図cに
示すようにセンタレス研削等により除去して上記
各電極膜12を夫々2つの電極12a,12bに
分離した後、これを50℃ないし65℃の希塩酸もし
くは希硝酸とフツ化水素酸の混合溶解液に浸漬し
て各誘電体磁器基板11の端面周縁部の電極膜1
2を溶解させ、その後、誘電体磁器基板11間の
ワツクスもしくは樹脂を溶解して、第2図dに示
すように、誘電体磁器基板11の端面周縁部に電
極マージン14,14を有する電極12a,12
bを形成するようにしたものが知られている。 Conventionally, as shown in FIG. 2a, as a method for forming electrodes of this type of ceramic capacitor, an electrode film 12 is formed on the entire surface of a dielectric ceramic substrate 11 by an electroless plating method, etc. A large number of substrates 11 are stacked, and as shown in FIG. 2b, the entire body is coated with wax or resin to form a rod-shaped laminate 13, and the electrode film 12' on the outer peripheral surface of the laminate 13 and the electrode film 12' on the outside thereof are coated with wax or resin. After removing the wax or resin by centerless grinding or the like as shown in FIG. The electrode film 1 on the peripheral edge of the end surface of each dielectric ceramic substrate 11 is immersed in a mixed solution of
2, and then the wax or resin between the dielectric ceramic substrates 11 is melted to form an electrode 12a having electrode margins 14, 14 on the peripheral edge of the end face of the dielectric ceramic substrate 11, as shown in FIG. 2d. ,12
There are known ones that form b.
上記の電極形成方法は、上記混合溶解液の濃度
や浸漬時間等を調整することにより、電極マージ
ン14,14の大きさを任意に設定することがで
き、かつ、上記電極マージン14,14の大きさ
も等しくなつて電極12aと電極12bとの対向
面積が大きくなり、容量も大きくすることができ
る利点を有しているが、電極膜12の厚みは通常
1μmないし2μmと薄く、第3図に示すように
ワツクスもしくは樹脂と誘電体磁器基板11との
間の間隙が狭くなるため電極膜12の溶解液が浸
入し難くなり、電極マージン14,14を必要な
大きさとするには、溶解液の濃度および温度を高
くするとともに、浸漬時間を長くする必要があ
る。 The above electrode forming method allows the size of the electrode margins 14, 14 to be arbitrarily set by adjusting the concentration of the mixed solution, immersion time, etc. This has the advantage that the opposing area between the electrodes 12a and 12b becomes larger and the capacitance can also be increased, but the thickness of the electrode film 12 is usually as thin as 1 μm to 2 μm, as shown in FIG. As the gap between the wax or resin and the dielectric ceramic substrate 11 becomes narrower, it becomes difficult for the solution of the electrode film 12 to penetrate. Also, it is necessary to increase the temperature and lengthen the soaking time.
しかしながら、このようにすると、第4図に
示すように、溶解液が誘電体磁器基板11そのも
のを侵食する、ワツクスや樹脂は高い温度に耐
えるものが必要となり材料が限定される。電極
マージン14,14の形成に時間がかゝる、等の
不具合が生ずる。 However, if this is done, as shown in FIG. 4, the wax or resin must be able to withstand high temperatures, at which the dissolving liquid corrodes the dielectric ceramic substrate 11 itself, and the materials are limited. Problems arise, such as the time it takes to form the electrode margins 14, 14.
本発明は従来の磁器コンデンサの電極形成方法
における上記の不具合を除去すべくなされたもの
であつて、全面に電極膜を被着した誘電体磁器基
板を積層してワツクスもしくは樹脂で被覆した棒
状の積層体の外周面のワツクスもしくは樹脂を除
去した後、超音波振動を与えた上記電極膜の溶解
液に上記積層体を浸漬するとともに回転させて各
誘電体磁器基板の外周面近傍を除く両平面の電極
膜を残してその余の電極膜を除去することによ
り、電極膜の溶解液に超音波振動を与えて電極マ
ージン部分の電極膜の溶解を促進し、電極マージ
ンの形成に必要な時間の短縮を図る一方、濃度お
よび温度の低い溶解液を使用し、誘電体磁器基板
の溶解液による侵食を防止するとともに、溶解液
の温度によるワツクスもしくは樹脂材料の制限を
緩和するようにした磁器コンデンサの電極形成方
法を提供することを目的としている。 The present invention has been made to eliminate the above-mentioned problems in the conventional method of forming electrodes for ceramic capacitors. After removing the wax or resin on the outer peripheral surface of the laminate, the laminate is immersed in a solution of the electrode film that has been subjected to ultrasonic vibrations and rotated to separate both planes of each dielectric ceramic substrate except for the vicinity of the outer periphery. By removing the remaining electrode film while leaving the remaining electrode film, ultrasonic vibrations are applied to the solution of the electrode film to promote dissolution of the electrode film in the electrode margin area, reducing the time required to form the electrode margin. While aiming to shorten the time, we have developed a ceramic capacitor that uses a solution with low concentration and temperature to prevent erosion of the dielectric ceramic substrate by the solution, and to alleviate the limitations of wax or resin materials due to the temperature of the solution. The object of the present invention is to provide a method for forming an electrode.
以下、本発明の実施例を示す第5図aからdを
参照して具体的に説明する。 Hereinafter, an embodiment of the present invention will be explained in detail with reference to FIGS. 5a to 5d.
先ず、円板状に焼成加工した誘電体磁器基板1
1を無電解ニツケルメツキ液に浸漬して、第5図
aに示すように、上記誘電体磁器基板11の全面
にニツケルの金属膜12を形成する。 First, a dielectric ceramic substrate 1 is fired into a disk shape.
1 is immersed in an electroless nickel plating solution to form a nickel metal film 12 on the entire surface of the dielectric ceramic substrate 11, as shown in FIG. 5a.
上記のように、全面にニツケルの金属膜12を
形成した多数の誘電体磁器基板11,…,11を
同軸に積み重ねて積層させ、融解したマイクロク
リスタリンワツクス等に浸漬して、第5図bに示
すように全体をマイクロクリスタリンワツクス1
5で被覆して丸棒状の積層体13を形成する。 As mentioned above, a large number of dielectric ceramic substrates 11, . As shown in the figure, coat the entire body with microcrystalline wax 1.
5 to form a round bar-shaped laminate 13.
このようにして作成した積層体13を図示しな
いセンタレスグラインダにかけ、第5図cに示す
ように、上記積層体13の外周部分のマイクロク
リスタリンワツクス15を除去するとともに、誘
電体磁器基板11,…,11の各外周面を研削
し、各誘電体磁器基板11の電極膜12を2つの
電極12aおよび12bに夫々分離する。 The thus produced laminate 13 is applied to a centerless grinder (not shown) to remove the microcrystalline wax 15 on the outer periphery of the laminate 13, as shown in FIG. , 11 are ground, and the electrode film 12 of each dielectric ceramic substrate 11 is separated into two electrodes 12a and 12b, respectively.
この場合、上記誘電体磁器基板11,…,11
の研削量によつて上記電極12aと12bとの対
向面積を調整し、製作する磁器コンデンサが所望
の容量を持つようにする。 In this case, the dielectric ceramic substrates 11,..., 11
The opposing area of the electrodes 12a and 12b is adjusted by the amount of grinding, so that the ceramic capacitor to be manufactured has a desired capacity.
次に、第5図cのように加工した積層体13
は、第5図dに示すように、他の同様の積層体1
3,…,13とともに、周面に多数の孔をあけた
バレル16内に収容して、約20%に希釈した超音
波振動子17によつて超音波振動18を与えた塩
化第2鉄の水溶液19中に浸漬し、上記バレル1
6を矢印方向に回転させて各積層体13,…,1
3を回転させて、各誘電体磁器基板11の両端面
周縁部の電極膜12を夫々溶解する。 Next, the laminated body 13 processed as shown in FIG.
As shown in FIG. 5d, another similar laminate 1
3,..., 13, the ferric chloride was housed in a barrel 16 with many holes in its circumferential surface and subjected to ultrasonic vibrations 18 by an ultrasonic vibrator 17 diluted to about 20%. The above barrel 1 is immersed in an aqueous solution 19.
6 in the direction of the arrow, each laminate 13,...,1
3 to melt the electrode films 12 on the peripheral edges of both end faces of each dielectric ceramic substrate 11.
その後、上記積層体13,…,13を引きあげ
て水で充分洗浄し、最後にマイクロクリスタリン
ワツクス15をトリクロロエチレンで洗浄して各
誘電体磁器基板11,…,11を分離して、第2
図dと同様の磁器コンデンサ素子を得た。 Thereafter, the laminates 13, . . . , 13 are pulled up and thoroughly washed with water, and finally the microcrystalline wax 15 is washed with trichlorethylene to separate the dielectric ceramic substrates 11, .
A ceramic capacitor element similar to that shown in Figure d was obtained.
磁器コンデンサの電極12a,12bを上記の
ようにして形成した場合、浸漬時間に対する電極
マージン14,14の寸法は、塩化第2鉄の水溶
液19の温度が25℃の場合、第6図の曲線g1のよ
うになり、例えば、浸漬時間が10分で電極マージ
ン14,14の寸法が約0.27mmとなる。この場
合、水溶液19に与える超音波の振動数は
28KHzであつた。 When the electrodes 12a and 12b of the ceramic capacitor are formed as described above, the dimensions of the electrode margins 14 and 14 with respect to the immersion time are as shown by the curve g in FIG. 6 when the temperature of the ferric chloride aqueous solution 19 is 25°C. 1 , and for example, when the immersion time is 10 minutes, the dimensions of the electrode margins 14, 14 are about 0.27 mm. In this case, the frequency of the ultrasonic wave applied to the aqueous solution 19 is
It was 28KHz.
これに対して、塩化第2鉄の水溶液19の温度
が50℃および25℃で超音波振動を与えない場合に
は夫々第6図の曲線g2およびg3のようになり、浸
漬時間が10分で電極マージン14,14は、上記
温度が50℃では約0.07mm、25℃では約0.04mmとな
る。 On the other hand, when the temperature of the ferric chloride aqueous solution 19 is 50°C and 25°C and no ultrasonic vibration is applied, the curves g 2 and g 3 in Fig. 6 are obtained, respectively, and the immersion time is 10°C. The electrode margins 14, 14 are about 0.07 mm when the temperature is 50°C and about 0.04 mm when the temperature is 25°C.
従つて、上記水溶液19の温度が25℃程度の低
い温度であつても、上記水溶液19に超音波振動
を与えた場合、電極マージン14,14の寸法
は、超音波振動を与えない場合と比較して約4倍
ないし7倍(浸漬時間10分)程度の値となり、電
極マージン14,14を形成する時間が大巾に短
縮されることが分る。 Therefore, even if the temperature of the aqueous solution 19 is as low as about 25° C., when ultrasonic vibration is applied to the aqueous solution 19, the dimensions of the electrode margins 14, 14 will be different compared to when no ultrasonic vibration is applied. It can be seen that the value is about 4 to 7 times (immersion time 10 minutes), and the time for forming the electrode margins 14, 14 is greatly shortened.
また、本実施例においては、バレル6を回転さ
せて積層体13を回転させているため、電極12
a,12bは均一に溶解し、電極マージン14,
14の寸法が不均一となることはない。このこと
は、積層体13を静止させた状態で超音波振動を
与えると、誘電体磁器基板11の端面周縁部を均
一に溶解できないことを意味する。 Further, in this embodiment, since the barrel 6 is rotated to rotate the stacked body 13, the electrode 12 is rotated.
a, 12b are uniformly dissolved, and the electrode margins 14,
The dimensions of 14 will not be non-uniform. This means that if ultrasonic vibration is applied while the laminate 13 is stationary, the peripheral edge of the end face of the dielectric ceramic substrate 11 cannot be uniformly melted.
以上の実施例では、センタレスグラインダで誘
電体磁器基板11の外周面の電極膜12′を研削
したが、この外周面の電極膜12′を残すように
研削してもよい。この場合、外周面の電極12′
は後の工程で超音波振動を与えながら、端面周縁
部の電極膜の溶解と同時に除去してもよい。つま
り、誘電体磁器基板の外周面を露出させるに当つ
ては、電極膜を残すかあるいは除去してしまうか
のいずれでもよい。 In the above embodiment, the electrode film 12' on the outer peripheral surface of the dielectric ceramic substrate 11 was ground using a centerless grinder, but it may be ground so as to leave the electrode film 12' on the outer peripheral surface. In this case, the electrode 12' on the outer peripheral surface
may be removed at the same time as the electrode film on the peripheral edge of the end face is melted while applying ultrasonic vibration in a later step. That is, when exposing the outer peripheral surface of the dielectric ceramic substrate, the electrode film may be left or removed.
以上の実施例において、積層体13は外周部表
面のワツクスを完全に除去した後に塩化第2鉄の
溶解液19中に浸漬しているが、研削後において
余剰のワツクスまたは機械油、磁器粉をアルコー
ル、アセトン、トリクロロエチレンなどの溶剤で
洗浄したのち希酸中に浸漬すると、溶液がよごれ
たりしないので、メツキ金属の溶解力の向上、溶
解能力の持続性向上につながる。 In the above embodiments, the laminate 13 is immersed in the ferric chloride solution 19 after completely removing the wax on the surface of the outer circumference, but after grinding, excess wax, machine oil, and porcelain powder are removed. If the solution is washed with a solvent such as alcohol, acetone, or trichlorethylene and then immersed in dilute acid, the solution will not get dirty, leading to improved dissolving power and sustainability of the dissolving ability of the plated metal.
また実施例ではニツケルメツキについて説明し
たが、他の金属メツキ、例えば銀、錫、銅メツキ
などについても同様であり、本発明の意図から逸
脱するものでなく、またさらに電極膜の除去は過
酸化物、希酸などでも同様の効果が得られるもの
である。またメツキされた誘電体磁器基板外周部
の有機物の除去は機械的研削によらず、当該有機
物を溶解する溶液で溶解除去するという方法でも
同様の結果が得られる。 Furthermore, although nickel plating has been described in the examples, the same applies to other metal platings, such as silver, tin, copper plating, etc., and does not depart from the intent of the present invention. Similar effects can be obtained with dilute acids, etc. Furthermore, the removal of organic matter from the outer periphery of the plated dielectric ceramic substrate does not involve mechanical grinding, but the same result can be obtained by dissolving and removing the organic matter with a solution that dissolves the organic matter.
以上、詳細に説明したことからも明らかなよう
に、本発明は、ワツクスもしくは樹脂で被覆する
とともに外周部を除去して誘電体磁器基板の外周
面を露出させた積層体を回転させつつ超音波振動
を与えた溶解液中に浸漬して上記誘電体磁器基板
の端面周縁部に電極マージンを形成するようにし
たから、超音波の使用により溶解液の濃度およ
び水温が低くても処理できるため、ワツクスや樹
脂に対する温度上の制限が緩和されて材料コスト
が低下するとともに誘電体磁器基板の侵食が少く
なる、超音波振動により短時間に必要な電極マ
ージンを形成することができるため、生産性が向
上するとともに、上記誘電体磁器基板の侵食もさ
らに小さくなる、超音波出力を調整して電極マ
ージンの調整を行うことができるため、溶解液の
温度管理が容易となり、生産設備コストの低減お
よび省エネルギ化を図ることができる、等その効
果はきわめて大である。 As is clear from the above detailed explanation, the present invention provides ultrasonic waves while rotating a laminate which is coated with wax or resin and whose outer periphery is removed to expose the outer periphery of a dielectric ceramic substrate. Since electrode margins are formed around the edge of the dielectric ceramic substrate by immersing it in a vibrating solution, the treatment can be performed even at low concentrations and water temperatures of the solution using ultrasonic waves. Temperature restrictions on waxes and resins are eased, reducing material costs and erosion of dielectric ceramic substrates. Ultrasonic vibrations can form the necessary electrode margins in a short time, increasing productivity. At the same time, erosion of the dielectric ceramic substrate is further reduced. Ultrasonic output can be adjusted to adjust the electrode margin, making it easier to control the temperature of the solution, reducing production equipment costs and savings. The effects are extremely large, such as being able to generate energy.
第1図は磁器コンデンサの構造を示す断面図、
第2図aからdは夫々従来の磁器コンデンサの電
極形成方法の説明図、第3図は電極マージンの形
成過程の説明図、第4図は誘電体磁器基板の侵食
を示す説明図、第5図aからdは夫々本発明に係
る磁器コンデンサの電極形成方法の説明図、第6
図は誘電体磁器基板の外周部を研削したのち溶解
液に浸漬した時間と電極マージンの寸法との相関
関係図である。
11…誘電体磁器基板、12…電極膜、12
a,12b…電極、13…積層体、14…電極マ
ージン、16…バレル、17…超音波振動子。
Figure 1 is a cross-sectional view showing the structure of a ceramic capacitor.
Figures 2a to d are explanatory diagrams of a conventional method for forming electrodes of a ceramic capacitor, Figure 3 is an explanatory diagram of the process of forming an electrode margin, Figure 4 is an explanatory diagram showing erosion of a dielectric ceramic substrate, and Figure 5 is an explanatory diagram of the formation process of an electrode margin. Figures a to d are explanatory diagrams of the method for forming electrodes of a ceramic capacitor according to the present invention, respectively.
The figure is a diagram showing the correlation between the time for immersing the dielectric ceramic substrate in a solution after grinding its outer circumference and the dimensions of the electrode margin. 11... Dielectric ceramic substrate, 12... Electrode film, 12
a, 12b...electrode, 13...laminate, 14...electrode margin, 16...barrel, 17...ultrasonic transducer.
Claims (1)
し、これら誘電体磁器基板を積層して全体をワツ
クスもしくは樹脂で被覆して棒状の積層体を形成
し、該積層体の外周面のワツクスもしくは樹脂、
あるいは該積層体の外周面のワツクスもしくは樹
脂および誘電体基板の外周面上の電極膜を除去
し、超音波振動を与えた上記電極膜の溶解液に上
記積層体を浸漬して回転させることにより、各誘
電体磁器基板の外周面近傍を除く両平面の電極膜
を残してその余の電極膜を除去した後、誘電体磁
器基板間のワツクスもしくは樹脂を除去して各誘
電体磁器基板を分離することを特徴とする磁器コ
ンデンサの電極形成方法。1. An electrode film is deposited on the entire surface of a plate-shaped dielectric ceramic substrate, and these dielectric ceramic substrates are laminated and the whole is coated with wax or resin to form a rod-shaped laminate, and the outer peripheral surface of the laminate is coated with an electrode film. wax or resin,
Alternatively, the wax or resin on the outer peripheral surface of the laminate and the electrode film on the outer peripheral surface of the dielectric substrate are removed, and the laminate is immersed in a solution of the electrode film subjected to ultrasonic vibration and rotated. , After removing the remaining electrode film leaving the electrode film on both planes except near the outer peripheral surface of each dielectric ceramic substrate, the wax or resin between the dielectric ceramic substrates is removed to separate each dielectric ceramic substrate. A method for forming electrodes of a ceramic capacitor, characterized by:
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17061579A JPS5694616A (en) | 1979-12-27 | 1979-12-27 | Method of forming electrode of porcelain condenser |
| GB8041131A GB2067017B (en) | 1979-12-27 | 1980-12-23 | Method of forming electrodes for ceramic capacitors |
| DE19803049304 DE3049304A1 (en) | 1979-12-27 | 1980-12-29 | METHOD FOR FORMING ELECTRODES ON CERAMIC CAPACITORS |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17061579A JPS5694616A (en) | 1979-12-27 | 1979-12-27 | Method of forming electrode of porcelain condenser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5694616A JPS5694616A (en) | 1981-07-31 |
| JPS6221255B2 true JPS6221255B2 (en) | 1987-05-12 |
Family
ID=15908139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17061579A Granted JPS5694616A (en) | 1979-12-27 | 1979-12-27 | Method of forming electrode of porcelain condenser |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5694616A (en) |
| DE (1) | DE3049304A1 (en) |
| GB (1) | GB2067017B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3137592C2 (en) * | 1981-09-22 | 1983-12-08 | Draloric Electronic GmbH, 8672 Selb | Process for the production of electrical capacitors and an apparatus used in carrying out the process |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1037011B (en) * | 1951-08-13 | 1958-08-21 | Quartz & Silice Sa | Process for the production of capacitors composed of ceramic discs provided with a silver coating |
| FR1309725A (en) * | 1962-01-08 | 1962-11-16 | Improvements in acid pickling processes using ultrasound, and in devices for their application | |
| DE1564692A1 (en) * | 1966-08-24 | 1970-11-26 | ||
| US3627278A (en) * | 1970-01-05 | 1971-12-14 | Gen Electric | Vibratory treatment apparatus |
| US3767491A (en) * | 1970-10-27 | 1973-10-23 | Cogar Corp | Process for etching metals employing ultrasonic vibration |
-
1979
- 1979-12-27 JP JP17061579A patent/JPS5694616A/en active Granted
-
1980
- 1980-12-23 GB GB8041131A patent/GB2067017B/en not_active Expired
- 1980-12-29 DE DE19803049304 patent/DE3049304A1/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| GB2067017A (en) | 1981-07-15 |
| DE3049304A1 (en) | 1981-09-17 |
| JPS5694616A (en) | 1981-07-31 |
| GB2067017B (en) | 1983-09-14 |
| DE3049304C2 (en) | 1992-07-02 |
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