JPS622387B2 - - Google Patents
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- Publication number
- JPS622387B2 JPS622387B2 JP54006929A JP692979A JPS622387B2 JP S622387 B2 JPS622387 B2 JP S622387B2 JP 54006929 A JP54006929 A JP 54006929A JP 692979 A JP692979 A JP 692979A JP S622387 B2 JPS622387 B2 JP S622387B2
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- JP
- Japan
- Prior art keywords
- cylindrical
- magnetic
- domain
- transfer path
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Description
【発明の詳細な説明】
本発明は円筒磁区を利用した磁気記憶素子に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic memory element using cylindrical magnetic domains.
ガーネツトのような一軸磁気異方性を有する磁
気媒体を磁化容易軸に垂直に結晶成長させ、磁化
容易軸方向に適当な大きさの均一なバイアス磁場
を加えると磁気媒体内に周辺部と磁化の方向が反
対の単一磁壁で囲まれた円筒磁区の出来ることが
知られている。この磁気媒体に磁場勾配を与える
と磁場勾配に沿つて円筒磁区を移動させることが
出来、この性質を用いることにより磁気記憶素子
を実現することが可能である。円筒磁区を移動さ
せるための磁場勾配を与える手段にはコンダクタ
パタンを用いる電流駆動法や軟磁性パタンを用い
る磁界駆動法が知られているが、もつぱら構成の
容易さから後者の磁界駆動法が良く用いられてい
る。磁界駆動法は磁気媒体膜面内に回転磁界を加
えることにより磁気媒体膜面内に設けられている
パーマロイ等の軟磁性膜からなる円筒磁区転送パ
タン内に円筒磁区を誘引する磁極が発生、移動し
それに伴なつて円筒磁区を移動させる方法であ
る。この磁極の移動が磁界の順次回転する方向に
合わせて行なわれ繰り返しパタンによつて円筒磁
区が一定方向へ移動するように転送パタンの形状
が決められる。すでにこのような目的に適つた軟
磁性膜パタンの形状としてT―バー、Y―バー、
シエブロン、Y―Y、非対称ハーフデイスク形等
が考案されている。前二者は1ビツト2パタンで
円筒磁区は回転磁場が1周期回転する間に2ケ所
のパタン間隙を通過することになるのに対し、後
三者は1ビツト1パタンで円筒磁区は回転磁場が
1周期回転する間に1ケ所のパタン間隙しか通過
しない。最近は下記の理由により1ビツト1パタ
ンからなる転送パタンがよく用いられている。転
送パタンは写真蝕刻法によつて形成されるが円筒
磁区径が3μm、2μmと狭くなり、高度の微細
加工技術が要求されてくる。従つてT―バーなど
の1ビツト2パタンからなる転送パタンはその最
小パターン間隙がシエブロンなどの1ビツト1パ
タンからなる転送パタンのそれの約1/2となつて
加工精度、再現性の悪さのために使用されなくな
つてきていて、パタン間隙の少ない1ビツト1パ
タンなる転送パタンがよく用いられている。 When a magnetic medium with uniaxial magnetic anisotropy such as garnet is grown as a crystal perpendicular to the axis of easy magnetization, and a uniform bias magnetic field of an appropriate magnitude is applied in the direction of the easy axis of magnetization, the periphery and the magnetization change in the magnetic medium. It is known that a cylindrical magnetic domain surrounded by a single domain wall with opposite directions is formed. When a magnetic field gradient is applied to this magnetic medium, the cylindrical magnetic domain can be moved along the magnetic field gradient, and by using this property, it is possible to realize a magnetic memory element. Current drive methods using conductor patterns and magnetic field drive methods using soft magnetic patterns are known as means for applying magnetic field gradients to move cylindrical magnetic domains, but the latter magnetic field drive method is preferred due to its ease of configuration. It is often used. The magnetic field driving method generates and moves magnetic poles that attract cylindrical magnetic domains within a cylindrical domain transfer pattern made of a soft magnetic film such as permalloy provided in the plane of the magnetic media film by applying a rotating magnetic field within the plane of the magnetic media film. In this method, the cylindrical magnetic domain is moved accordingly. The shape of the transfer pattern is determined so that the movement of the magnetic pole is performed in accordance with the direction in which the magnetic field sequentially rotates, and the cylindrical magnetic domain moves in a fixed direction by the repeated pattern. There are already soft magnetic film pattern shapes suitable for this purpose such as T-bar, Y-bar,
Chevron, Y-Y, asymmetrical half-disc shapes, etc. have been devised. The first two have 1 bit and 2 patterns, and the cylindrical magnetic domain passes through two pattern gaps during one cycle of rotation of the rotating magnetic field, whereas the latter three have 1 bit and 1 pattern, and the cylindrical magnetic domain passes through the pattern gap in two places during one cycle of rotation of the rotating magnetic field. It passes through only one pattern gap during one period of rotation. Recently, a transfer pattern consisting of one bit per pattern is often used for the following reasons. The transfer pattern is formed by photolithography, but the diameter of the cylindrical magnetic domain is as narrow as 3 μm or 2 μm, requiring advanced microfabrication technology. Therefore, the minimum pattern gap for a transfer pattern consisting of two 1-bit patterns such as a T-bar is approximately 1/2 that of a transfer pattern consisting of 1-bit 1 pattern such as a chevron, resulting in poor processing accuracy and reproducibility. Therefore, the transfer pattern is becoming less and less used, and a 1-bit 1-pattern transfer pattern with a small pattern gap is often used.
しかしながら、1ビツト1パタンなる転送パタ
ンにおいてもパタン間隙部の存在が問題となる。
転送パタンのうちでもつとも微細な箇所であると
いうこともさることながら、円筒磁区転送動作を
考察すると、その動作領域やパタン欠陥に敏感
で、素子としての動作余裕度や歩留りを決定して
いるのがこのパタン間隙部だからである。そのた
め転送パタンに非対称性をもたせて間隙部通過の
動作領域を拡げ間隙を大きくし、且つそのゆらぎ
に強い間隙余裕度のある転送パタンも考案されて
いるが、間隙が存在することに変わりなく依然と
して該部の出来如何が素子の特性を左右してい
る。 However, even in a transfer pattern consisting of one bit and one pattern, the existence of pattern gaps poses a problem.
In addition to being the most minute part of the transfer pattern, considering the cylindrical magnetic domain transfer operation, it is sensitive to the operating area and pattern defects, and it determines the operating margin and yield of the device. This is because this is the pattern gap. For this reason, transfer patterns have been devised in which the transfer pattern is made asymmetrical to widen the operating area for passing through the gap and the gap is made larger, and the transfer pattern has a gap margin that is resistant to fluctuations, but the gap still exists. The quality of this part determines the characteristics of the element.
本発明の目的は間隙部の存在しない円筒磁区転
送路を提供し、高密度、高歩留り、低磁界駆動が
可能な円筒磁区記憶素子を実現することにある。 An object of the present invention is to provide a cylindrical magnetic domain transfer path without any gaps, and to realize a cylindrical magnetic domain storage element capable of high density, high yield, and low magnetic field driving.
すなわち本発明は円筒磁区を保持することので
きる磁気媒体とこの磁気媒体の膜面に垂直なバイ
アス磁界を与える手段と前記磁気媒体の膜面に平
行な回転磁界を与える手段と前記磁気媒体の膜面
上に記憶素子としての必要な機能部とを具備した
円筒磁区記憶素子において円筒磁区転送路の中心
軸を横切つて到達する位置が他のいかなる位置よ
り、転送路中心軸を横切る前の位置に対し磁気的
に近距離となるような無間隙円筒磁区転送路を備
えることによつて達成される。 That is, the present invention provides a magnetic medium capable of holding a cylindrical magnetic domain, means for applying a bias magnetic field perpendicular to the film surface of the magnetic medium, means for applying a rotating magnetic field parallel to the film surface of the magnetic medium, and a film of the magnetic medium. In a cylindrical magnetic domain storage element that has functional parts necessary as a storage element on its surface, the position reached by crossing the central axis of the cylindrical magnetic domain transfer path is a position that is earlier than any other position before crossing the central axis of the transfer path. This is achieved by providing a gapless cylindrical domain transfer path that is magnetically close to the magnetic field.
次に本発明の主旨についてシエブロン形状を基
本とするパタンを例にとつて説明する。 Next, the gist of the present invention will be explained using a pattern based on a chevron shape as an example.
第1図は従来の1ビツト1パタンからなるシエ
ブロン形状円筒磁区転送路の一部を示す図で11
は軟磁性膜からなるシエブロンパタンである。第
2図は1/8周期の分割で表示したAi→Bi→Ci→
Di→Ei→Fi→Gi→Hiの順に反時計方向に回転
する回転磁界を示す図でサフイツクスiは周期数
を表わすもので、ある周期をiとすれば次の周期
はi+1となる。矢印の方向に円筒磁区が誘引さ
れるようにバイアス磁場の極性が決められてお
り、第1図、第2図に示された符号は夫々対応し
ている。第1図から判るように回転磁場によつて
発生するシエブロンパタン11中の磁極が、円筒
磁区の移動する方向に各磁極の距離に長短の違い
はあるもののAi→Bi→Ci→Di→Ei→Fi→Gi→
Hi→の順序に並んでいて円筒磁区の転送を可能
ならしめている。このシエブロンパタン11を単
に連続的に接続した無間隙転送路31を第1図と
同様の形式で示したのが第3図である。回転磁界
とともに磁極はAi→Bi→Ci→Di→Ei→Fi→と
移動していくが、間隙部がないためDi→Ei→Fi
の磁極発生位置が第1図と異なり円筒磁区移動方
向と逆の順番に並んでいる。それ故さらに回転磁
界が進んだ時に円筒磁区はGiを経由せずにGi′を
経由して再び一周期前のHi+1の位置へ戻り、以
下Ai→Bi→Ci→Di→Ei→Fi→Gi′→Hi+1とい
う局部的往復運動いわゆる“アイドリング現象”
を繰り返すのみで一方向へ転送されない。無間隙
円筒磁区転送路を設計する際にこのアイドリング
現象を如何に防ぐかが重要な要素の一つとなる。 Figure 1 shows a part of a conventional chevron-shaped cylindrical domain transfer path consisting of 1 bit and 1 pattern.
is a chevron pattern made of a soft magnetic film. Figure 2 shows A i → B i → C i → divided into 1/8 periods.
This diagram shows a rotating magnetic field that rotates counterclockwise in the order of D i → E i → F i → G i → H i . The suffix i represents the number of periods. If one period is i, the next period is i+1. becomes. The polarity of the bias magnetic field is determined so that the cylindrical magnetic domain is attracted in the direction of the arrow, and the symbols shown in FIGS. 1 and 2 correspond to each other. As can be seen from FIG. 1, the magnetic poles in the chevron pattern 11 generated by the rotating magnetic field are A i → B i → C i → D i →E i →F i →G i →
They are arranged in the order H i →, making it possible to transfer cylindrical magnetic domains. FIG. 3 shows a gapless transfer path 31 in which the chevron patterns 11 are simply connected continuously, in the same format as FIG. 1. Along with the rotating magnetic field, the magnetic pole moves as A i →B i →C i →D i →E i →F i →, but since there is no gap, D i →E i →F i
Unlike FIG. 1, the magnetic pole generation positions are arranged in the opposite order to the moving direction of the cylindrical magnetic domain. Therefore, when the rotating magnetic field further advances, the cylindrical magnetic domain passes through G i ' without passing through G i and returns to the position of H i +1 one cycle earlier, and hereafter A i → B i → C i → Local reciprocating motion of D i →E i →F i →G i ′→H i+1 , so-called “idling phenomenon”
It only repeats , but it is not transferred in one direction. When designing a gapless cylindrical domain transfer path, one of the important factors is how to prevent this idling phenomenon.
第3図のパタンではFiからGiへ到達するのに
転送路中心軸1を横切らなければならないのに対
しGi′へ到達するには横切る必要がなく、従つて
円筒磁区は転送容易なGi′へ向つて移動しアイド
リング現象を起こす。 In the pattern shown in Fig. 3, it is necessary to cross the transfer path center axis 1 to reach from F i to G i , but there is no need to cross it to reach G i ′, so the cylindrical magnetic domain is easily transferred. It moves towards G i ' and causes an idling phenomenon.
なお転送路中心軸とは無間隙転送路における転
送路幅方向の中心を結んだ線を指す。一般に無間
隙転送路において一定方向に円筒磁区が移動する
ためには回転磁界の一周期内に二回転送路中心軸
を横切ることになるアイドリング現象は本来円筒
磁区が転送路中心軸を横切つて到達すべき位置
が、他のいづれかの位置に比べて転送路中心軸を
横切る前の位置に対し磁気的にほゞ等距離か又は
遠距離にあり、他のいづれかの該位置が転送路中
心軸を横切らずに到達できる位置に存在している
ために発生する。従つてアイドリング現象を防ぐ
には、転送路中心軸を横切る前の位置に対し、横
切つた後の位置が他のいずれかの位置と磁気的に
ほゞ等距離又は遠距離にある時に円筒磁区が転送
路中心軸を横切らないようにし、転送路中心軸を
横切る場合には本来移動して到達すべき位置の方
が、他のいかなる位置より磁気的に充分近距離と
なるようなパタン設計を行なえばよいことが判
る。なおここでいう“磁気的距離”とは位置的距
離rだけでなく転送パタンの磁極の強さMをも加
味した距離を指し、r2/Mに比例して長くなるも
のである。 Note that the transfer path center axis refers to a line connecting the centers of the transfer path in the width direction of the gapless transfer path. Generally, in order for a cylindrical magnetic domain to move in a fixed direction in a gapless transfer path, it crosses the center axis of the transfer path twice within one cycle of the rotating magnetic field.The idling phenomenon originally occurs when the cylindrical magnetic domain crosses the center axis of the transfer path. The position to be reached is magnetically equidistant or far away from the previous position before crossing the transfer path central axis compared to any other position, and any other position is closer to the transfer path center axis. This occurs because it is located in a position that can be reached without crossing the road. Therefore, in order to prevent the idling phenomenon, the cylindrical magnetic domain is The pattern should be designed such that it does not cross the central axis of the transfer path, and in the case of crossing the central axis of the transfer path, the position that it should originally move to reach is magnetically sufficiently closer than any other position. I know what I should do. Note that the "magnetic distance" herein refers to a distance that takes into account not only the positional distance r but also the strength M of the magnetic pole of the transfer pattern, and increases in proportion to r 2 /M.
次に本発明の詳細について実施例を用いて説明
する。 Next, details of the present invention will be explained using examples.
第4図はアイドリング現象を無くした無間隙円
筒磁区転送路41を示す図で第1図と同様の図示
形式で示してある。本パタンによると第1図の間
隙部に相当する端部をずらして接続したため転送
路中心軸1を横切る時はCi→Di→とEi→Fiであ
りどちらも他のいかなる位置よりも磁気的に近距
離でありアイドリング現象は起きず一方向への転
送が可能となつている。なおすでに考案されてい
る無間隙転送路の一つにコンテイギユアスデイス
クパタンがあるが、このパタンでは円筒磁区は転
送路中心軸を横切ることなく転送されるため本発
明による無間隙転送路とは区別されるものであ
る。 FIG. 4 shows a gapless cylindrical magnetic domain transfer path 41 that eliminates the idling phenomenon, and is shown in the same format as FIG. 1. According to this pattern, since the ends corresponding to the gaps in Figure 1 are shifted and connected, when crossing the central axis 1 of the transfer path, C i → D i → and E i → F i , both of which are relative to any other position. Because the distance is magnetically close, idling phenomenon does not occur and transfer in one direction is possible. One of the gapless transfer paths that has already been devised is a contiguous disk pattern, but in this pattern, the cylindrical magnetic domain is transferred without crossing the center axis of the transfer path. are distinct.
第5図は本発明による円筒磁区記憶素子のう
ち、特に円筒磁区転送路の一部の詳細を示す図で
通常の円筒磁区記憶素子として必要な機能部、円
筒磁区を保持する磁気的手段、円筒磁区を転送す
る磁気的手段は省略されている。ハードバブル抑
制の処理が為された(Ysmluca)3(FeGe)5O12ガ
ーネツト膜上にスペーシング用絶縁膜を介して
NiFeからなる無間隙転送パタン51が形成され
ている。第5図のパタンは転送動作がさらに安定
に行なわれるように改善したものである。いづれ
のパタンも基本的には同じ原理に基づいている。
第5図に示した転送パタンは、無間隙であるた
め、動作バイアス磁場領域が拡大され、特にバイ
アス上限値が間隙を有するパタンに比べ大幅に改
善された。又駆動磁界も低減でき、消費電力の節
約も可能となつた。さらに欠陥サイズの許容値が
大きくなり歩留りが向上した。 FIG. 5 is a diagram showing the details of a part of the cylindrical domain transfer path in the cylindrical domain storage element according to the present invention, in particular the functional parts necessary for a normal cylindrical domain storage element, the magnetic means for holding the cylindrical domain, and the cylindrical domain transfer path. Magnetic means for transferring magnetic domains have been omitted. Hard bubble suppression treatment was performed on the (Ysmluca) 3 (FeGe) 5 O 12 garnet film via a spacing insulating film.
A gapless transfer pattern 51 made of NiFe is formed. The pattern shown in FIG. 5 has been improved so that the transfer operation can be performed more stably. Both patterns are basically based on the same principle.
Since the transfer pattern shown in FIG. 5 has no gaps, the operating bias magnetic field region is expanded, and in particular, the bias upper limit value is significantly improved compared to the pattern with gaps. Furthermore, the driving magnetic field can be reduced, making it possible to save power consumption. Furthermore, the tolerance for defect size was increased and the yield was improved.
以上の二つの実施例での無間隙転送路はその繰
り返し(ビツト)単位形状にいかなる鏡映対称軸
も有しない、いわゆる非対称なパタンであるが、
本発明の原理に基づくものであれば非対称なパタ
ンに限られるものではない。 The gapless transfer path in the above two embodiments has a so-called asymmetric pattern in which the repeating (bit) unit shape does not have any axis of reflection symmetry.
The pattern is not limited to an asymmetric pattern as long as it is based on the principles of the present invention.
以上説明したように本発明によれば高性能で低
コストの円筒磁区記憶素子を実現することができ
る。 As explained above, according to the present invention, a high-performance, low-cost cylindrical domain storage element can be realized.
第1図は従来の円筒磁区転送パタンの一例を示
す図、第2図は回転磁場の1/8周期毎の方向を示
す図、第3図は本発明の主旨説明のために引用し
た図、第4図、第5図は本発明による円筒磁区記
憶素子の実施例を示す図である。
1……円筒磁区転送路中心軸、11……シエブ
ロンパタン、31,41,51……無間隙円筒磁
区転送路。
FIG. 1 is a diagram showing an example of a conventional cylindrical magnetic domain transfer pattern, FIG. 2 is a diagram showing the direction of each 1/8 period of a rotating magnetic field, and FIG. 3 is a diagram cited for explaining the gist of the present invention. FIG. 4 and FIG. 5 are diagrams showing an embodiment of a cylindrical domain storage element according to the present invention. 1... Central axis of cylindrical magnetic domain transfer path, 11... Chevron pattern, 31, 41, 51... Gapless cylindrical domain transfer path.
Claims (1)
と、この磁気媒体の膜面垂直なバイアス磁界を与
える手段と前記磁気媒体の膜面上に記憶素子とし
ての必要な機能部および円筒磁区転送路とを具備
した円筒磁区記憶素子において、前記円筒磁区転
送路がその繰返し単位要素に鏡映対称軸、間〓部
および異種膜厚を一切含まず、かつ転送路中心軸
を横切つて本来到達すべき位置が、繰返し単位の
一周期手前の該位置に比べて転送路中心軸を横切
る前の位置に対し磁気的に近距離となるような無
間〓円筒磁区転送路を備えたことを特徴とする円
筒磁区記憶素子。1. A magnetic medium capable of holding a cylindrical magnetic domain, means for applying a bias magnetic field perpendicular to the film surface of the magnetic medium, and a functional section necessary as a storage element and a cylindrical domain transfer path on the film surface of the magnetic medium. In the cylindrical magnetic domain storage element, the cylindrical domain transfer path does not include any mirror symmetry axis, interspace, or different film thickness in its repeating unit element, and crosses the central axis of the transfer path to the position that it should originally reach. A cylindrical magnetic domain characterized by having an endless cylindrical magnetic domain transfer path such that the magnetic domain is magnetically closer to the position before crossing the transfer path central axis than the position before one cycle of the repeating unit. memory element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP692979A JPS55101183A (en) | 1979-01-23 | 1979-01-23 | Cylindrical magnetic domain memory element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP692979A JPS55101183A (en) | 1979-01-23 | 1979-01-23 | Cylindrical magnetic domain memory element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55101183A JPS55101183A (en) | 1980-08-01 |
| JPS622387B2 true JPS622387B2 (en) | 1987-01-19 |
Family
ID=11651929
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP692979A Granted JPS55101183A (en) | 1979-01-23 | 1979-01-23 | Cylindrical magnetic domain memory element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55101183A (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5189358A (en) * | 1975-02-03 | 1976-08-05 | ||
| JPS5811717B2 (en) * | 1975-11-27 | 1983-03-04 | 富士通株式会社 | bubble jikkoshi |
| JPS52122442A (en) * | 1976-04-07 | 1977-10-14 | Fujitsu Ltd | Bubble magnetic domain unit |
-
1979
- 1979-01-23 JP JP692979A patent/JPS55101183A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55101183A (en) | 1980-08-01 |
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