JPS6224229B2 - - Google Patents
Info
- Publication number
- JPS6224229B2 JPS6224229B2 JP13530682A JP13530682A JPS6224229B2 JP S6224229 B2 JPS6224229 B2 JP S6224229B2 JP 13530682 A JP13530682 A JP 13530682A JP 13530682 A JP13530682 A JP 13530682A JP S6224229 B2 JPS6224229 B2 JP S6224229B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- plate
- thin plate
- roller
- brush
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005498 polishing Methods 0.000 claims description 45
- 238000007494 plate polishing Methods 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【発明の詳細な説明】
本発明は板研磨装置に関し、特に板厚の薄いプ
リント基板の研磨装置構造の改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plate polishing apparatus, and particularly to an improvement in the structure of a polishing apparatus for thin printed circuit boards.
従来、プリント基板などの板状物体を自動的に
研磨する場合には、第1図に示すようにプリント
基板を一方向に回転する研磨ブラシと研磨ブラシ
に対向する位置に設けた金属製のバツクアツプロ
ーラの両端に適当な間隔を保持して上下一対に設
けたピンチローラはさみこんだ状態で移送しなが
ら研磨する手段を取つていた。しかし第2図aに
示すように厚さの薄いプリント基板(以下薄板と
称す)を研磨処理するためにピンチローラの左端
に隣接設置した送行コンベアー3上から研磨ブラ
シ2までの間に設けた複数のピンチローラ4の間
を渡りきれずに薄板9の先端部が垂れさがつて下
側のピンチローラ4の下にもぐり込んでしまつた
り、第2図b,cのように薄板9は研磨ブラシ2
とバツクアツプローラ14からなる研磨部との間
に到達した際に研磨ブラシ2の回転方向が一方向
のみであるため、薄板9の後端部がピンチローラ
4をはなれると研磨ブラシ2の回転力で先端部を
挾んでいたピンチローラ4側に強く押し込む力が
働くため板の中央が折れ曲がつたり(第2図b)
薄板9の後端部が研磨部から解放されたとき、は
ね上がり板端部に傷や折れが生じて薄板9を連続
的に研磨することができなかつた。そのため、薄
板9を研磨する場合には厚い添え板に密接させて
処理したり、平板上の手研磨を行なつたり、サン
ドペーパーの付けたバイブレーターで研磨してい
た。しかしこのような従来手段では両面を同時に
研磨することができなかつた。また研磨にむらが
生じ、かつキズ、折れ曲がりが出る等の研磨にバ
ラツキを生じて品質的に均一な研摩面を得ること
が出来なかつた。 Conventionally, when automatically polishing a plate-shaped object such as a printed circuit board, as shown in Figure 1, a polishing brush that rotates the printed circuit board in one direction and a metal bag placed opposite the polishing brush are used. A means was provided for polishing while transporting the pinch rollers, which were placed in a pair of upper and lower ends at an appropriate distance from each other at both ends of the up roller. However, as shown in Figure 2a, in order to polish a thin printed circuit board (hereinafter referred to as a thin board), a plurality of polishing brushes are provided between the conveyor 3 installed adjacent to the left end of the pinch roller and the polishing brush 2. The tip of the thin plate 9 may not be able to cross between the pinch rollers 4, and the tip of the thin plate 9 may hang down and get under the pinch roller 4 on the lower side. 2
Since the rotation direction of the polishing brush 2 is only in one direction when the polishing brush 2 reaches between the back end and the polishing section consisting of the back-up roller 14, when the rear end of the thin plate 9 leaves the pinch roller 4, the polishing brush 2 rotates. The center of the plate was bent and bent due to a strong pushing force acting on the pinch roller 4 side that was holding the tip (Figure 2 b).
When the rear end of the thin plate 9 was released from the polishing section, the thin plate 9 could not be polished continuously because the end of the plate would be scratched or bent. Therefore, when polishing the thin plate 9, it has been done by placing it in close contact with a thick splint, by hand polishing on a flat plate, or by using a vibrator with sandpaper attached. However, with such conventional means, it was not possible to polish both sides at the same time. In addition, uneven polishing occurred, and variations in polishing such as scratches and bends occurred, making it impossible to obtain a polished surface of uniform quality.
一方、装置的な面では研磨ブラシとバツクアツ
プローラ14と14の間に薄板9の入つていない
状態の時には、研磨ブラシ2とバツクアツプロー
ラ14とは常に両者が接触しているため、研磨ブ
ラシ2によつてバツクアツプローラ14の表面が
削られてしまう。そのためバツクアツプローラ1
4の平面均一度が早期に悪化し、薄板9の品質が
低下する欠点もあつた。 On the other hand, in terms of equipment, when the thin plate 9 is not inserted between the polishing brush 2 and the backup rollers 14, the polishing brush 2 and the backup roller 14 are always in contact with each other. The surface of the back-up roller 14 is scraped by the brush 2. Therefore, Backup Prora 1
There was also a drawback that the plane uniformity of the thin plate 4 deteriorated early and the quality of the thin plate 9 deteriorated.
本発明の目的はかかる従来欠点を除去した板研
磨装置を提供することにある。 An object of the present invention is to provide a plate polishing apparatus that eliminates such conventional drawbacks.
本発明によれば被研磨板を水平移動する走行ロ
ーラと、走行ローラ間に所定の間隔を保持して介
挿設置したバツクアツプローラと、バツクアツプ
ローラに近接して設けた正逆転機構を有する研磨
ブラシからなる研磨機構と、研磨機構の前後に被
処理板の走行間隙を有して上下に併設したガイド
板と、研磨機構の前後に被処理板の走行間隙を有
して上下に併設したガイド板と、ガイド板と研磨
機構との間に斜行上下動する反り矯正板とを具備
したことを特徴とする板研磨装置が得られる。 According to the present invention, there is provided a running roller that horizontally moves the plate to be polished, a back-up roller inserted between the running rollers with a predetermined interval maintained, and a forward/reverse mechanism provided close to the back-up roller. A polishing mechanism consisting of a polishing brush, a guide plate installed above and below the polishing mechanism with a running gap for the plate to be processed before and after the polishing mechanism, and a guide plate installed above and below the polishing mechanism with a running gap for the plate to be processed before and after the polishing mechanism. A plate polishing device is obtained, which includes a guide plate and a warp correcting plate that moves diagonally up and down between the guide plate and the polishing mechanism.
以下、本発明による板研磨装置の実施例を第3
図、第4図により説明する。 Hereinafter, a third embodiment of the plate polishing apparatus according to the present invention will be described.
This will be explained with reference to FIG.
第3図は第1の実施例で水洗バルブ1を開校し
て、発熱防止と薄板9の研磨時に出る銅粉を除去
するための水を研磨ブラシ2にかける。次に薄板
9を送行する送りコンベア3とピンチローラ4を
駆動するモーター5の入力スイツチ6を入れ、送
りコンベアー3とピンチローラ4を回転する。次
にサーボモータ7の入力スイツチ8を入れ研磨ブ
ラシ2を回転させ薄板9が進行する方向、すなわ
ち反射計廻りへ回転(正転)する。 FIG. 3 shows the first embodiment, in which the flushing valve 1 is opened and water is applied to the polishing brush 2 to prevent heat generation and to remove copper powder produced when polishing the thin plate 9. Next, the input switch 6 of the motor 5 that drives the feed conveyor 3 that transports the thin plate 9 and the pinch roller 4 is turned on, and the feed conveyor 3 and the pinch roller 4 are rotated. Next, the input switch 8 of the servo motor 7 is turned on and the polishing brush 2 is rotated to rotate in the direction in which the thin plate 9 advances, that is, around the reflector (normal rotation).
次に薄板9を送行コンベアー3上へおくと、薄
板9は研磨ブラシ2aへ向つて回転している上下
一対のピンチローラ4に挾持されながら上下一対
に併設されたガイド板10の走行間隙を通過して
研磨ブラシ2aの方向へ板端の反りを矯正されて
送られる。このとき薄板9の先端部分が薄板9の
通過を検知する検知器11の下へ到達すると、こ
の薄板9の通過を検知した信号により、薄板9の
先端がピンチローラ4bに到達するまでタイマー
12の遅延時間がカウントを開始する。さらに薄
板9が進んで研磨ブラシ2aに接触する直前で研
摩ブラシ2aの外周に沿つて斜行上下するように
配置した反り矯正板13は薄板9の厚さに応じた
間隙を有する位置まで自動的に下降して薄板9の
先端の反りを矯正しながら研磨ブラシ2aとバツ
クアツプローラ14の間へスムーズに挿入されて
進み薄板9の先端が後部のピンチローラ4に完全
に挾みこまれる位置に到達すると前述した検知器
11の信号で作動開始したタイマー12は0に戻
り接点部が切れて研磨ブラシ2は逆転動作を開始
する。 Next, when the thin plate 9 is placed on the conveyor 3, the thin plate 9 passes through the running gap between the pair of upper and lower guide plates 10 while being held between the pair of upper and lower pinch rollers 4 rotating toward the polishing brush 2a. Then, the warp at the end of the plate is corrected and the plate is sent toward the polishing brush 2a. At this time, when the tip of the thin plate 9 reaches below the detector 11 that detects the passage of the thin plate 9, a signal detecting the passage of the thin plate 9 causes the timer 12 to start until the tip of the thin plate 9 reaches the pinch roller 4b. The delay time starts counting. Further, just before the thin plate 9 advances and comes into contact with the polishing brush 2a, the warping correction plate 13, which is arranged to move diagonally up and down along the outer periphery of the polishing brush 2a, automatically moves to a position with a gap corresponding to the thickness of the thin plate 9. Then, the thin plate 9 is smoothly inserted between the polishing brush 2a and the back-up roller 14 while correcting the warpage of the tip of the thin plate 9, and advances to a position where the tip of the thin plate 9 is completely pinched by the rear pinch roller 4. When the timer 12 reaches the point, the timer 12 which started operating based on the signal from the detector 11 described above returns to 0, the contact section is cut off, and the polishing brush 2 starts reverse operation.
さらに薄板9の後端が検知器11を通過するま
で進むとこの信号でタイマー12が再びカウント
を開始して薄板9の後端が研磨ブラシ2aを通過
した時点でタイマー12は0に戻り切れて研磨ブ
ラシ2aは元の正回転動作に戻る。 When the rear end of the thin plate 9 continues to advance until it passes the detector 11, the timer 12 starts counting again based on this signal, and the timer 12 returns to 0 when the rear end of the thin plate 9 passes the polishing brush 2a. The polishing brush 2a returns to its original normal rotating operation.
以上、本発明により次の効果がある。 As described above, the present invention has the following effects.
(i) 非常に薄いプリント基板でも損傷なく、連続
的に研磨することができる。(i) Even very thin printed circuit boards can be polished continuously without damage.
(ii) 研摩面が均一にでき、かつ研磨工数が節減で
きる。(ii) The polished surface can be made uniform and the number of polishing steps can be reduced.
なお、第4図のように複数の研磨ブラシを配置
することにより薄板の研磨面はより均一に研磨す
ることができる。 By arranging a plurality of polishing brushes as shown in FIG. 4, the polished surface of the thin plate can be polished more uniformly.
また研磨ブラシ上下に配置することによつて薄
板の両面を同時に研磨することができることは勿
論である。 Furthermore, by arranging the polishing brushes above and below, it is of course possible to polish both sides of the thin plate at the same time.
第1図、第2図は従来の研磨機の側断面図。第
3図、第4図は本発明の板研磨装置の側断面図。
1……水洗バルブ、2……研磨ブラシ、3……
送りコンベアー、4……ピンチローラ、5……駆
動モーター、6,8……入力スイツチ、7……サ
ーボモーター、9……薄板、10……ガイド板、
11……検知器、12……タイマー、13……反
り矯正板、14……バツクアツプローラ。
1 and 2 are side sectional views of a conventional polishing machine. 3 and 4 are side sectional views of the plate polishing apparatus of the present invention. 1...Washing valve, 2...Polishing brush, 3...
Feed conveyor, 4... pinch roller, 5... drive motor, 6, 8... input switch, 7... servo motor, 9... thin plate, 10... guide plate,
11...detector, 12...timer, 13...warp correction plate, 14...backup roller.
Claims (1)
走行ローラ間に所定の間隔を保持して介挿設置し
たバツクアツプローラとバツクアツプローラに近
接して設け正逆転機構を有する研磨ブラシからな
る研磨機構と、前記研摩機構の前後に被処理板の
走行間隙を有して上下に併設したガイド板と、前
記ガイド板と研磨機構との間に斜行上下動する反
り矯正板とを有することを特徴とする板研摩装
置。1 Polishing consisting of a running roller that horizontally moves the plate to be processed, a back-up roller inserted between the running rollers with a predetermined interval maintained, and an abrasive brush provided close to the back-up roller and having a forward/reverse mechanism. A mechanism, a guide plate disposed above and below the polishing mechanism with a running gap for the plate to be processed before and after the polishing mechanism, and a warpage correcting plate that moves diagonally up and down between the guide plate and the polishing mechanism. Features of plate polishing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13530682A JPS5924951A (en) | 1982-08-03 | 1982-08-03 | Plate polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13530682A JPS5924951A (en) | 1982-08-03 | 1982-08-03 | Plate polishing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5924951A JPS5924951A (en) | 1984-02-08 |
| JPS6224229B2 true JPS6224229B2 (en) | 1987-05-27 |
Family
ID=15148629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13530682A Granted JPS5924951A (en) | 1982-08-03 | 1982-08-03 | Plate polishing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5924951A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004268249A (en) * | 2003-02-21 | 2004-09-30 | Marugen Tekkosho:Kk | Apparatus and method for polishing plate-shaped work |
| JP4307354B2 (en) * | 2004-09-27 | 2009-08-05 | 日本メクトロン株式会社 | Printed circuit board polishing equipment |
| CN112091816B (en) * | 2020-09-05 | 2021-12-07 | 张家港市盛港绿色防火建材有限公司 | Plate processing device |
-
1982
- 1982-08-03 JP JP13530682A patent/JPS5924951A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5924951A (en) | 1984-02-08 |
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