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JPS6227743B2 - - Google Patents
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JPS6227743B2 - - Google Patents

Info

Publication number
JPS6227743B2
JPS6227743B2 JP56139204A JP13920481A JPS6227743B2 JP S6227743 B2 JPS6227743 B2 JP S6227743B2 JP 56139204 A JP56139204 A JP 56139204A JP 13920481 A JP13920481 A JP 13920481A JP S6227743 B2 JPS6227743 B2 JP S6227743B2
Authority
JP
Japan
Prior art keywords
wafer
mounting plate
shaft
shafts
arm rod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56139204A
Other languages
Japanese (ja)
Other versions
JPS5840837A (en
Inventor
Junji Kutsuzawa
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP56139204A priority Critical patent/JPS5840837A/en
Publication of JPS5840837A publication Critical patent/JPS5840837A/en
Publication of JPS6227743B2 publication Critical patent/JPS6227743B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7608Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/707Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Weting (AREA)
  • Manipulator (AREA)
  • Clamps And Clips (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】 本発明はLSI或いは超LSI等の大集積回路を埋
設したチツプの製造に用いる半導体ウエハーに、
現象処理又はエツチングを施す場合などに好適す
るクランプ装置に関する。
[Detailed Description of the Invention] The present invention provides semiconductor wafers used for manufacturing chips in which large integrated circuits such as LSI or VLSI are embedded.
The present invention relates to a clamp device suitable for processing or etching.

従来から大集積回路を埋設したチツプを製造す
る工程として、半導体ウエハー上のホトレジスト
の現象或いは半導体ウエハー表面のウエツトエツ
チングをスプレー方式或いは浸漬方式等によつて
行なつており、これらの工程を行なう装置も種々
提案されている。
Conventionally, as a process for manufacturing chips in which large integrated circuits are embedded, photoresist on a semiconductor wafer or wet etching of the surface of the semiconductor wafer has been carried out using a spray method or a dipping method. Various devices have also been proposed.

また最近では、超LSI等の高集積化に伴つて超
微細パターンの形成が要求される一方、チツプを
大量且つ安価に提供すべくウエハーの大口径化が
進んでいる。このため本出願人が先に出願した特
願昭55−60670号若しくは実願昭54−174906号の
如きウエハーを下向きにして連続的に現象又はエ
ツチング処理する装置によつて、上記要望に応え
られるようになつた。
Recently, as the integration of ultra-LSIs and the like has increased, the formation of ultra-fine patterns has been required, and wafer diameters have been increasing in order to provide chips in large quantities at low cost. Therefore, it is possible to meet the above-mentioned needs by using an apparatus that continuously processes or etches the wafer with the wafer facing downward, as disclosed in Japanese Patent Application No. 55-60670 or Utility Application No. 54-174906, which was previously filed by the present applicant. It became like that.

しかしながら斯る装置においても、半導体ウエ
ハーに現象処理やウエツトエツチングを施す場合
にあつて、従来提案されてきたクランプ装置を用
いると、半導体ウエハーに傷をつけたり、割れた
り、或いは把持が確実でないので半導体ウエハー
が落下し破損する等の問題がある。したがつて半
導体ウエハーをクランプする装置が未解決の課題
として残されている。
However, even with such a device, when applying a phenomenon treatment or wet etching to a semiconductor wafer, using the previously proposed clamp device may damage or break the semiconductor wafer, or the grip may not be reliable. There are problems such as semiconductor wafers falling and being damaged. Therefore, an apparatus for clamping semiconductor wafers remains an unresolved problem.

本発明者等は上述の如き従来の問題点に鑑み、
これを有効に解決すべく本発明を成したものであ
り、その目的とする処は、半導体ウエハーに現象
処理或いはエツチングを施す際にウエハーを傷つ
けたり、割つたり或いは落下せしめて破損するこ
となく確実にクランプでき、且つ均一なる現像或
いはエツチングを行なうことができるクランプ装
置を提供するにある。
In view of the conventional problems as described above, the present inventors
The present invention was developed to effectively solve this problem, and its purpose is to prevent the wafer from being damaged by being damaged, cracked, or dropped when processing or etching the semiconductor wafer. It is an object of the present invention to provide a clamping device that can securely clamp and perform uniform development or etching.

斯る目的を達成すべく本発明は、ウエハーの載
置板の裏面に、少くとも一方に回動操作部を形成
した一対の軸を回動自在に取り付け、夫々の軸に
上記載置板に形成した孔から突出するクランプ用
爪を設けるとともに、夫々の軸に腕杆を挿着固定
し、これら腕杆をピン等を介して連結して夫々の
軸が連動して回動するようにし、更に弾性部材に
よつて上記クランプ用爪をクランプ方向に付勢し
たことをその要旨としている。
In order to achieve such an object, the present invention provides a method in which a pair of shafts each having a rotation operation section formed on at least one side are rotatably attached to the back surface of a wafer mounting plate, and each shaft is connected to the above-mentioned mounting plate. In addition to providing a clamping claw protruding from the formed hole, arm rods are inserted and fixed to each shaft, and these arm rods are connected via a pin or the like so that the respective shafts rotate in conjunction with each other. Furthermore, the gist is that the clamping claw is biased in the clamping direction by an elastic member.

以下に本発明の実施の一例を添付図面に従つて
詳述する。
An example of the implementation of the present invention will be described in detail below with reference to the accompanying drawings.

第1図は本発明に係るクランプ装置の全体斜視
図、第2図は同装置の要部の分解斜視図である。
FIG. 1 is an overall perspective view of a clamp device according to the present invention, and FIG. 2 is an exploded perspective view of essential parts of the device.

図中1は半導体ウエハーの載置板であり、この
載置板1は平面略々矩形状をなし、且つ隅部近傍
にはその長径方向が載置板の長さ方向と一致した
長孔2…を穿設し、更に一側端には操作棒3が出
入するための切欠4を形成している。
In the figure, reference numeral 1 denotes a mounting plate for semiconductor wafers, and this mounting plate 1 has a substantially rectangular shape when viewed from above, and near the corners there are long holes 2 whose major axis direction coincides with the length direction of the mounting plate. ..., and a notch 4 is formed at one end for the operation rod 3 to enter and exit.

そして載置板1の裏面の隅部近傍には保持体5
…を螺着し、この保持体5…間に第2図に示す如
く一対の軸6,7を架設している。即ち軸6,7
は夫々その両端部をもつて上記保持体5に穿設し
た孔5aに挿通され、回動自在に保持されてい
る。
A holder 5 is placed near the corner of the back surface of the mounting plate 1.
... are screwed together, and a pair of shafts 6, 7 are installed between these holding bodies 5, as shown in FIG. That is, shafts 6 and 7
are inserted into holes 5a formed in the holder 5 with both ends thereof, and are held rotatably.

また軸6,7の両側部には棒状のクランプ用爪
8…を一体的に取り付け、これらクランプ用爪8
…は上半部が上記載置板1に形成した長孔2…か
ら上方に突出するようになつている。そして上記
軸6には上記操作棒3と当接することにより軸6
を回動せしめる板状の回動操作部9を一体的に取
り付け、更に上記軸6,7の中間部には腕杆1
0,11を基端部をもつて挿着し、軸6,7と一
体的に回動するようにしている。
Further, bar-shaped clamping claws 8 are integrally attached to both sides of the shafts 6 and 7, and these clamping claws 8
... has an upper half that projects upward from a long hole 2 formed in the mounting plate 1. The shaft 6 is brought into contact with the operating rod 3 so that the shaft 6
A plate-shaped rotation operation part 9 for rotating the shaft is integrally attached, and an arm rod 1 is also provided at the intermediate part of the shafts 6 and 7.
0 and 11 are inserted with their base ends so that they rotate integrally with the shafts 6 and 7.

そして、上記軸6に挿着した腕杆10の先端部
にはピン14の挿通用の孔12を形成し、また軸
7に挿着した腕杆11の先端部には長孔13を形
成し、上記孔12で挿通したピン14をこの長孔
13に通すことで、腕杆10,11の先端部相互
が回動自在に連結するようにしている。
A hole 12 for inserting a pin 14 is formed at the tip of the arm rod 10 inserted into the shaft 6, and a long hole 13 is formed at the tip of the arm rod 11 inserted into the shaft 7. By passing the pin 14 inserted through the hole 12 through the elongated hole 13, the tips of the arm rods 10 and 11 are rotatably connected to each other.

更に上記ピン14には板バネ15を嵌着してい
る。即ち板バネ15は湾曲板状をなし、下端部を
ロールして嵌込み部15aを形成し、この嵌込み
部15aをもつて上記ピン14に嵌着されるとと
もに上端部が上記載置板1の下面に当接し、上記
ピン14と載置板1との間に縮装されるようにな
つている。
Further, a plate spring 15 is fitted onto the pin 14. That is, the leaf spring 15 has a curved plate shape, and its lower end is rolled to form a fitting part 15a, and the fitting part 15a is fitted to the pin 14, and the upper end is attached to the mounting plate 1. The pin 14 contacts the lower surface of the pin 14 and is compressed between the pin 14 and the mounting plate 1.

而して上記腕杆10,11の先端部は板バネ1
5によつて下方に弾圧され、この結果クランプ用
爪8…は夫々クランプ方向に付勢されることとな
る。
The tips of the arm rods 10 and 11 are connected to the leaf spring 1.
5, and as a result, the clamping claws 8 are urged in the clamping direction.

以上の如き構成からなるクランプ装置の作用を
第3図及び孫4図に基づいて説明する。
The operation of the clamping device constructed as above will be explained based on FIG. 3 and FIG. 4.

先ず載置板1が上昇してくると軸6に取り付け
た回動操作部9の上面が接作棒3の下端に当接す
る。そして更に載置板1が上昇すると回動操作部
9の先端部の位置はそのままであるので軸6は第
3図中反時計方向に回動し、軸6に取り付けたク
ランプ用爪8はアンクランプ方向に回動する。そ
してこの動作と同時に、腕杆10は軸6を中心と
して板バネ15の弾発力に抗して反時計方向に回
動する。更にこの腕杆10と腕杆11は先端部に
おいて連結しているので腕杆10の回動につれて
腕杆11は軸7を中心として時計方向に回動し、
この回動によつて軸7が時計方向に回動する。し
たがつて軸7に取り付けたクランプ用爪8も同時
にアンクランプ方向に回動し第3図に示す如き状
態となる。斯る状態において、図示しない搬送手
段により搬送されてきた半導体ウエハー16を載
置板1上に載せる。
First, when the mounting plate 1 rises, the upper surface of the rotation operation part 9 attached to the shaft 6 comes into contact with the lower end of the contact rod 3. When the mounting plate 1 further rises, the position of the tip of the rotating operation part 9 remains unchanged, so the shaft 6 rotates counterclockwise in FIG. 3, and the clamp claw 8 attached to the shaft 6 is released. Rotates in the clamp direction. Simultaneously with this operation, the arm rod 10 rotates counterclockwise about the shaft 6 against the elastic force of the leaf spring 15. Further, since the arm rod 10 and the arm rod 11 are connected at their tips, as the arm rod 10 rotates, the arm rod 11 rotates clockwise about the shaft 7.
This rotation causes the shaft 7 to rotate clockwise. Therefore, the clamping claw 8 attached to the shaft 7 also rotates in the unclamping direction at the same time, resulting in a state as shown in FIG. In this state, the semiconductor wafer 16, which has been transported by a transport means (not shown), is placed on the mounting plate 1.

次いで載置板1を下降せしめると、腕杆10,
11の先端部は板バネ15の弾発力によつて下方
へ押下げられ、これにつれて軸6は時計方向に、
軸7は反時計方向に回動し、これら軸6,7に取
り付けたクランプ用爪…はクランプ方向に回動し
第4図に示す如く半導体ウエハー16を確実に保
持することとなる。
Next, when the mounting plate 1 is lowered, the arm rods 10,
11 is pushed down by the elastic force of the leaf spring 15, and as a result, the shaft 6 moves clockwise.
The shaft 7 rotates counterclockwise, and the clamping claws attached to the shafts 6, 7 rotate in the clamping direction to securely hold the semiconductor wafer 16 as shown in FIG.

この後載置板1上にウエハー16をクランプし
たまま載置板1は約90゜回転して垂直状態とな
り、そのままの状態で図示しない現像槽或いはエ
ツチング処理槽等に入り、更に同一方向に90゜回
転してウエハーは下向きとなり、このウエハー1
6に処理を施す。そして現像処理等が済んだなら
ば、前記とは逆の動作により載置板1は上昇し、
操作棒3に回動操作部9が当接し、ウエハー16
をアンクランプ状態とする。その後搬送装置によ
り洗浄などの次工程へウエハーを送る。
After that, with the wafer 16 still clamped on the mounting plate 1, the mounting plate 1 rotates approximately 90 degrees to a vertical position, enters a developing tank or an etching processing tank (not shown), and then moves further in the same direction for 90 degrees. °The wafer rotates downward, and this wafer 1
6. After the development process, etc. is completed, the mounting plate 1 is raised by the reverse operation to the above.
The rotation operation part 9 comes into contact with the operation rod 3, and the wafer 16
is in the unclamped state. Thereafter, the wafer is sent to the next process such as cleaning using a transport device.

尚以上は図面に示した実施例について説明した
ものであり、本発明のクランプ装置は上記に限定
されるものではない。例えば図示例にあつては、
操作棒3を固定したものについて説明したが、操
作棒3が上下動することによつてクランプ用爪8
にクランプ及びアンクランプ動作をなさしめるよ
うにしてもよく、また図示例にあつては弾性部材
として板バネ15を示したがコイルスプリング等
でもよく、更にクランプ用爪8の数も任意であ
る。
The embodiments shown in the drawings have been described above, and the clamping device of the present invention is not limited to the above embodiments. For example, in the illustrated example,
Although the operation rod 3 is fixed in the explanation, the clamping claw 8 can be moved by moving the operation rod 3 up and down.
In the illustrated example, a plate spring 15 is shown as the elastic member, but a coil spring or the like may also be used.Furthermore, the number of clamp claws 8 may be arbitrary.

以上の説明で明らかな如く本発明によれば、半
導体ウエハーの載置板の裏面に、一方に回動操作
部を形成した一対の回転自在な軸を設け、夫々の
軸に上記載置板に形成した孔から突出するクラン
プ用爪を取り付けるとともに、夫々の軸に先端部
同士が連結する腕杆を挿着し、更に弾性部材を介
して上記クランプ用爪をクランプ方向に付勢せし
めるようにしたので、適当なる弾発力を有する弾
性部材を選択することにより、ウエハーを破損す
ることなく確実に保持することができ、また常に
クランプ用爪はクランプ方向に付勢されているの
で現像処理中などにウエハーが載置板から外れる
虞れがない。また装置全体として無駄なく合理的
であるので、その厚みを可及的に薄くでき、この
ため現像槽等の入口を狭くしても何ら支障なく現
像処理等が行なえる。そして更に装置の交換が容
易に行なえるので種々の径の半導体ウエハーに適
用できる等多大の利点を発揮する。
As is clear from the above description, according to the present invention, a pair of rotatable shafts, one of which is formed with a rotating operation part, is provided on the back surface of the semiconductor wafer mounting plate, and each shaft is connected to the mounting plate. A clamping claw protruding from the formed hole is attached, and an arm rod whose tips are connected to each other is inserted into each shaft, and the clamping claw is urged in the clamping direction via an elastic member. Therefore, by selecting an elastic member with an appropriate elastic force, it is possible to securely hold the wafer without damaging it, and since the clamping claw is always biased in the clamping direction, it is possible to hold the wafer reliably without damaging it. There is no risk of the wafer coming off the mounting plate. Furthermore, since the entire apparatus is efficient and efficient, its thickness can be made as thin as possible, and therefore, even if the entrance of the developer tank or the like is narrowed, development processing can be carried out without any problem. Further, since the device can be easily replaced, it has many advantages such as being applicable to semiconductor wafers of various diameters.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の好適一実施例を示すものであ
り、第1図は本発明に係るクランプ装置の全体斜
視図、第2図は同装置の要部を分解して示した斜
視図、第3図はアンクランプ状態にある同装置の
縦断側面図、第4図はクランプ状態にある同装置
の縦断側面図である。 尚図面中、1は載置板、2は孔、6,7は軸、
8はクランプ用爪、9は回動操作部、10,11
は腕杆、15は弾性部材、16はウエハーであ
る。
The drawings show a preferred embodiment of the present invention, and FIG. 1 is an overall perspective view of a clamp device according to the present invention, FIG. 2 is an exploded perspective view of the main parts of the device, and FIG. The figure is a longitudinal side view of the same device in an unclamped state, and FIG. 4 is a longitudinal side view of the same device in a clamped state. In the drawing, 1 is a mounting plate, 2 is a hole, 6 and 7 are shafts,
8 is a clamp claw, 9 is a rotating operation part, 10, 11
15 is an elastic member, and 16 is a wafer.

Claims (1)

【特許請求の範囲】[Claims] 1 ウエハーを載置する載置板の裏面に一対の軸
を回動自在に設け、これら軸の一方に回動操作部
を形成するとともに、夫々の軸に上記載置板に形
成した孔から突出してウエハーの側面に当接する
クランプ用爪を固着し、上記夫々の軸に腕杆を固
着し、一方の腕杆に取付けたピンと他方の腕杆に
形成した長孔とを係合して夫々の腕杆を取付けた
軸を連動せしめ、更に上記載置板の裏面と腕杆と
の間に介設した弾性部材にて上記クランプ用爪を
クランプ方向に付勢せしめてなるクランプ装置。
1. A pair of shafts are rotatably provided on the back surface of the mounting plate on which the wafer is placed, a rotation operation part is formed on one of these shafts, and a pair of shafts protruding from the holes formed in the above-mentioned mounting plate are formed on each shaft. A clamp claw that contacts the side surface of the wafer is fixed to the wafer, an arm rod is fixed to each of the above shafts, and a pin attached to one arm rod is engaged with a long hole formed in the other arm rod. A clamping device in which a shaft to which an arm rod is attached is interlocked, and the clamp claw is biased in the clamping direction by an elastic member interposed between the back surface of the placement plate and the arm rod.
JP56139204A 1981-09-02 1981-09-02 Clamping device Granted JPS5840837A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56139204A JPS5840837A (en) 1981-09-02 1981-09-02 Clamping device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56139204A JPS5840837A (en) 1981-09-02 1981-09-02 Clamping device

Publications (2)

Publication Number Publication Date
JPS5840837A JPS5840837A (en) 1983-03-09
JPS6227743B2 true JPS6227743B2 (en) 1987-06-16

Family

ID=15239970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56139204A Granted JPS5840837A (en) 1981-09-02 1981-09-02 Clamping device

Country Status (1)

Country Link
JP (1) JPS5840837A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0460591U (en) * 1990-10-01 1992-05-25

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JP3695971B2 (en) * 1998-12-22 2005-09-14 シャープ株式会社 Film forming apparatus and film forming method
US7667822B2 (en) * 2006-02-14 2010-02-23 Asml Netherlands B.V. Lithographic apparatus and stage apparatus
KR101156902B1 (en) * 2010-09-01 2012-06-21 삼성전기주식회사 The clamp for board clamping

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0460591U (en) * 1990-10-01 1992-05-25

Also Published As

Publication number Publication date
JPS5840837A (en) 1983-03-09

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