JPS622944B2 - - Google Patents
Info
- Publication number
- JPS622944B2 JPS622944B2 JP54160952A JP16095279A JPS622944B2 JP S622944 B2 JPS622944 B2 JP S622944B2 JP 54160952 A JP54160952 A JP 54160952A JP 16095279 A JP16095279 A JP 16095279A JP S622944 B2 JPS622944 B2 JP S622944B2
- Authority
- JP
- Japan
- Prior art keywords
- copies
- abrasive
- polishing
- photosensitive drum
- drum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 8
- 229910052711 selenium Inorganic materials 0.000 claims description 8
- 239000011669 selenium Substances 0.000 claims description 8
- 239000003082 abrasive agent Substances 0.000 claims description 7
- 239000002270 dispersing agent Substances 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 229910052580 B4C Inorganic materials 0.000 claims description 4
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910003460 diamond Inorganic materials 0.000 claims description 2
- 239000010432 diamond Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 125000003158 alcohol group Chemical group 0.000 claims 1
- 238000005498 polishing Methods 0.000 description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 239000007788 liquid Substances 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 108091008695 photoreceptors Proteins 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【発明の詳細な説明】
本発明は電子写真装置等に使用されるセレン感
光体の研磨材に関するものである。一般にセレン
感光体はドラム状基体表面にガラス質セレンを蒸
着せしめて構成され、該ドラムを回動せしめて該
ガラス質セレン表面で帯電―露光―現像―転写―
除電―クリーニング処理を施し複写に供されてい
る。係る電子写真用セレン感光ドラムは、複写を
繰り返す間に、その表面に現像剤の成分であるポ
リスチレン等の有機樹脂被膜が形成される為、表
面電位の低下をきたし、実複写画像の濃度低下、
クズレ等の劣化を引き起こす。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an abrasive material for selenium photoreceptors used in electrophotographic devices and the like. In general, a selenium photoreceptor is constructed by depositing vitreous selenium on the surface of a drum-shaped substrate, and by rotating the drum, the vitreous selenium surface is charged, exposed, developed, transferred, etc.
It is subjected to static elimination and cleaning treatment before being used for copying. During repeated copying, an organic resin film such as polystyrene, which is a component of the developer, is formed on the surface of such electrophotographic selenium photosensitive drums, resulting in a decrease in surface potential and a decrease in the density of the actual copied image.
This causes deterioration such as cracking.
このような状態になつた感光ドラムはその表面
を、一般に適当な研磨材を分散させた研磨液を布
に塗布し、軽く研磨して、再び複写可能な表面状
態として再使用に供されている。 The surface of a photosensitive drum in such a state is generally lightly polished by applying a polishing liquid containing an appropriate abrasive dispersed on a cloth, and the surface is reused to make the surface ready for copying. .
実験によると、未使用感光ドラムでは、樹脂被
膜形成による画像の劣化をきたす迄に、20000〜
30000枚程度の複写が可能である。しかし、粗の
粒子の混入した研磨液により使用済感光ドラムを
研磨し、再生した場合は、再び樹脂被膜形成によ
る画像の劣化をきたす迄に、5000枚程度の複写し
かできない欠点がある。本発明は係る点を鑑み感
光体表面の研磨に好適な研磨材を提供し、これに
よつて感光体の複写枚数の大巾な増加を計るよう
にしたものである。 According to experiments, an unused photosensitive drum can be used for up to 20,000 hours before the image deteriorates due to the formation of a resin film.
Approximately 30,000 copies can be made. However, if a used photosensitive drum is recycled by polishing it with a polishing liquid containing coarse particles, it has the disadvantage that only about 5,000 copies can be made before the image deteriorates due to the formation of a resin film again. In view of these points, the present invention provides an abrasive material suitable for polishing the surface of a photoreceptor, thereby greatly increasing the number of copies of the photoreceptor.
本発明者等の表面研磨実験によれば、セレン感
光ドラムの表面に樹脂被膜を形成し、複写画像の
劣化を起す迄の複写枚数は、研磨後の感光ドラム
の表面に粗さに依存すること、及び複写を繰り返
す間の画像の劣化は現像剤による樹脂被膜の形成
と共に、紙との接触、キヤリアー付着等による傷
の発生に起因することが判明した。従つて、複写
枚数を増加せしめるのに効果的な表面状態は粗さ
が小さいこと及び傷が除去されることである。本
発明はガラス質セレン表面に対し良好な研磨作用
を有する研磨材とこれの分散剤を含む感光体用研
磨材を用いて良好な表面状態を得て再生複写枚数
の増加を計るようにしたものである。以下、実施
例について説明する。 According to surface polishing experiments conducted by the present inventors, the number of copies until a resin film is formed on the surface of a selenium photosensitive drum and the number of copies until deterioration of the copied image occurs depends on the roughness of the surface of the photosensitive drum after polishing. It has been found that the deterioration of the image during repeated copying is due to the formation of a resin film by the developer as well as the occurrence of scratches due to contact with paper, carrier adhesion, etc. Therefore, effective surface conditions for increasing the number of copies are low roughness and removal of scratches. The present invention aims to increase the number of reproduced copies by obtaining a good surface condition by using an abrasive material for a photoconductor containing an abrasive material having a good abrasive action on the glassy selenium surface and a dispersant thereof. It is. Examples will be described below.
実施例に先だつて先ず比較の実験として、新品
のドラム(研磨しない)について測定した所、表
面粗さは0.01μm以下であり、画像劣化迄の複写
枚数は20000〜30000枚であつた。 Prior to the Examples, first, as a comparative experiment, a new drum (not polished) was measured, and the surface roughness was 0.01 μm or less, and the number of copies before image deterioration was 20,000 to 30,000.
実施例 1
研磨材として、粒径0.05μmの酸化アルミニウ
ムを単独で用い、分散剤はイソプロピルアルコー
ル20%水30%とし、研磨液中の酸化アルミニウム
の割合が20%の研磨液で使用済みの感光ドラムを
研磨した場合、表面の粗さは0.05μm程度であ
り、画像劣化迄の複写数15000〜20000枚である。
また浅い傷もとれた。Example 1 Aluminum oxide with a particle size of 0.05 μm was used alone as the abrasive, the dispersant was 20% isopropyl alcohol and 30% water, and a used photosensitive material was used with a polishing solution in which the proportion of aluminum oxide in the polishing solution was 20%. When the drum is polished, the surface roughness is about 0.05 μm, and the number of copies is 15,000 to 20,000 before the image deteriorates.
A shallow wound was also removed.
実施例 2
研磨材として、粒径0.5μmの酸化アルミニウ
ムを用い、分散剤はイソプロピルアルコール70
%、水30%とし、研磨液中の酸化アルミニウムの
割合が20%の研磨液で使用済みの感光ドラムを研
磨した場合、表面の粗さは0.5μm程度であり、
画像劣化迄の複写枚数は7000〜10000枚であつ
た。Example 2 Aluminum oxide with a particle size of 0.5 μm was used as the abrasive, and isopropyl alcohol 70 was used as the dispersant.
%, water is 30%, and when a used photosensitive drum is polished with a polishing solution containing 20% aluminum oxide, the surface roughness is approximately 0.5 μm.
The number of copies before image deterioration was 7,000 to 10,000.
実施例 3
研磨材として、粒径0.5μmの炭化硅素を用
い、分散剤はイソプロピルアルコール70%、水30
%とし、研磨液中の炭化硅素の割合が20%の研磨
液で、0.5〜1μmの深さの傷の入つた使用済み
感光ドラムを研磨した場合、実施例2と同様の結
果を得た。また同一の研磨液で研磨した感光ドラ
ム表面を更に実施例1の研磨液で該ドラム表面を
研磨した場合、表面の粗さは0.05μm程度であ
り、傷もとれ、画像劣化迄の複写枚数は15000〜
20000枚である。Example 3 Silicon carbide with a particle size of 0.5 μm was used as the abrasive, and the dispersant was 70% isopropyl alcohol and 30% water.
%, and the same results as in Example 2 were obtained when a used photosensitive drum having scratches with a depth of 0.5 to 1 μm was polished with a polishing liquid in which the proportion of silicon carbide in the polishing liquid was 20%. Furthermore, when the surface of the photosensitive drum polished with the same polishing liquid was further polished with the polishing liquid of Example 1, the surface roughness was about 0.05 μm, scratches were removed, and the number of copies before image deterioration was 15,000. ~
It is 20,000 pieces.
以上の実施例からわかるように研磨材として、
ダイヤモンドパウダー(C)、酸化硅素(SiO2)
炭化硅素(SiC)、酸化アルミニウム(α―
Al2O3、γ―Al2O3)、炭化硼素(BoC)ガラスパ
ウダーのいずれかを用いることが可能である。ま
た、その粒度を0.5μm以下の間で選択すること
により、使用済み感光ドラムの表面の状態に応じ
た調整が可能となる。 As can be seen from the above examples, as an abrasive,
Diamond powder (C), silicon oxide (SiO 2 )
Silicon carbide (SiC), aluminum oxide (α-
It is possible to use either Al 2 O 3 , γ-Al 2 O 3 ), or boron carbide (BoC) glass powder. Further, by selecting the particle size within a range of 0.5 μm or less, adjustment can be made depending on the surface condition of the used photosensitive drum.
上記の研磨材はいずれも粉体であり、使用する
上で溶液中によい状態で分散させることが必要で
ある。そこで分散剤としてはアルコール類20〜80
%、水20〜80%を混合し、研磨液中これらの割合
を10〜50%とすることにより、良好な分散状態を
得ることができた。以上の説明から明らかなよう
に本発明の研磨材によれば、使用済ドラムの樹脂
被膜が除去され、傷等の除去も可能であり、研磨
後も新品ドラムとほぼ同様な複写枚数が得られ、
しかも分散状態もよく、取り扱いが容易である等
実用上の効果は大きい。 All of the above-mentioned abrasives are powders, and must be dispersed in a solution in a good condition before use. Therefore, as a dispersant, alcohol 20 to 80%
A good dispersion state could be obtained by mixing 20 to 80% of water and adjusting the proportion of these in the polishing liquid to 10 to 50%. As is clear from the above description, according to the abrasive material of the present invention, the resin coating of the used drum can be removed, and it is also possible to remove scratches, etc., and the number of copies made can be almost the same as that of a new drum even after polishing. ,
Furthermore, it has a good dispersion state, is easy to handle, and has great practical effects.
Claims (1)
(SiO2)炭化硅素(SiC)、酸化アルミニウム(α
―Al2O3、γ―Al2O3)、炭化硼素(BoC)及びガ
ラスパウダの群から選ばれた1以上の粒径0.5μ
m以下の研磨剤と、アルコール類を主成分とする
分散剤を含むことを特徴とするセレン感光体用研
磨材。1 Diamond powder (C), silicon oxide (SiO 2 ), silicon carbide (SiC), aluminum oxide (α
-Al 2 O 3 , γ-Al 2 O 3 ), boron carbide (BoC), and glass powder with a particle size of 0.5μ
An abrasive material for a selenium photoconductor, characterized in that it contains an abrasive of m or less and a dispersant whose main component is an alcohol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16095279A JPS5682868A (en) | 1979-12-12 | 1979-12-12 | Abrasive for selenium photosensitizing body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16095279A JPS5682868A (en) | 1979-12-12 | 1979-12-12 | Abrasive for selenium photosensitizing body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5682868A JPS5682868A (en) | 1981-07-06 |
| JPS622944B2 true JPS622944B2 (en) | 1987-01-22 |
Family
ID=15725740
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16095279A Granted JPS5682868A (en) | 1979-12-12 | 1979-12-12 | Abrasive for selenium photosensitizing body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5682868A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61209453A (en) * | 1985-03-13 | 1986-09-17 | Konishiroku Photo Ind Co Ltd | Method for regenerating substrate of electrophotographic sensitive body |
| JPS63220189A (en) * | 1987-03-09 | 1988-09-13 | Fuji Electric Co Ltd | Method for cleaning and polishing electrophotographic sensitive body |
| US4932165A (en) * | 1987-09-03 | 1990-06-12 | Fuji Xerox Co., Ltd. | Method of polishing the surface of electrophotographic photoreceptor |
| CN103897607B (en) * | 2014-03-25 | 2015-08-19 | 山东天岳晶体材料有限公司 | A kind of carborundum machine polishing liquor and adopt it to carry out the method for mechanical polishing |
| CN107955545A (en) * | 2017-12-21 | 2018-04-24 | 山东银丰纳米新材料有限公司 | A kind of A is to sapphire polishing agent and preparation method thereof |
-
1979
- 1979-12-12 JP JP16095279A patent/JPS5682868A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5682868A (en) | 1981-07-06 |
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