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JPS6230416B2 - - Google Patents
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JPS6230416B2 - - Google Patents

Info

Publication number
JPS6230416B2
JPS6230416B2 JP9925079A JP9925079A JPS6230416B2 JP S6230416 B2 JPS6230416 B2 JP S6230416B2 JP 9925079 A JP9925079 A JP 9925079A JP 9925079 A JP9925079 A JP 9925079A JP S6230416 B2 JPS6230416 B2 JP S6230416B2
Authority
JP
Japan
Prior art keywords
diazo
acid
copying
derivatives
copying material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9925079A
Other languages
Japanese (ja)
Other versions
JPS5624341A (en
Inventor
Shuhei Shiraishi
Toshinaga Nishizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP9925079A priority Critical patent/JPS5624341A/en
Publication of JPS5624341A publication Critical patent/JPS5624341A/en
Publication of JPS6230416B2 publication Critical patent/JPS6230416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

本発明は成分型ゞアゟ耇写材料の改良に関す
るものであ぀お、さらに詳しくは耇写前に斌おは
保存性ず珟像性に優れ、耇写埌に斌おは日光堅牢
床の高い鮮明な耇写画像を䞎え埗る成分型耇写
材料に係る。 支持䜓䞊の感光局にゞアゟ化合物ずカツプリン
グ成分を䜵有させた埓来の成分型ゞアゟ耇写材
料にあ぀おは、鮮明で日光堅牢床に優れた耇写画
像を埗る目的で、感光局䞭にチオ尿玠又はその誘
導䜓ず塩化亜鉛を含有させた耇写材料が知られお
いる。しかしながら、この皮の耇写材料は䞀般に
その珟像性が必ずしも良奜でない。䜕故なら、チ
オ尿玠又はその誘導䜓を含有する耇写材料は、保
存䞭にチオ尿玠などの酞化分解によ぀おプレカツ
プリングを起しやすいので、耇写材料の保存性を
保蚌するために比范的倚量の酞安定剀が配合され
おいるからである。぀たり、耇写画像の日光堅牢
床を向䞊させる目的でチオ尿玠又はその誘導䜓を
甚いた堎合には、プレカツプリングを防止するう
えで比范的倚量の酞安定剀を䜿甚しなければなら
ないために、耇写材料の珟像性の䜎䞋は、どうし
おもこれを避けるこずができないのである。 然るに、ゞアゟ耇写材料はその珟像方法の劂䜕
を問わず、できるだけ少量のアルカリで珟像でき
るこずが、公害防止乃至は省資源を達成するうえ
で望たしい蚳であるから、䞊蚘した珟像性の䜎䞋
は是非ずも改善しなければならない。 本発明は満足すべき保存性を備えたうえに珟像
性も良奜で、しかも鮮明な日光堅牢床のある耇写
画像を圢成し埗る成分型ゞアゟ耇写材料を提䟛
せんずするものであ぀お、その特城ずするずころ
は、ゞアゟ化合物ずカツプリング成分を含有する
支持䜓䞊の感光局䞭に、ベンゟトリアゟヌル又は
その誘導䜓ず、無機酞の金属塩ずを共存させるこ
ずにある。 本発明で䜿甚されるベンゟトリアゟヌル又はそ
の誘導䜓は、有機酞又は無機酞の金属塩ず協同し
お、耇写画像の鮮明さず日光堅牢床の向䞊に寄䞎
するが、これは䞊蚘化合物が金属むオンず共に錯
䜓を圢成し、アゟ染料の金属キレヌト圢成に有効
に䜜甚するためず掚察される。そしおベンゟトリ
アゟヌル及びその誘導䜓は、埓来のチオ尿玠乃至
はその誘導䜓に比范しお酞化分解しにくいため、
少量の酞安定剀を配合するだけで耇写材料の保存
性を保蚌するこずができ、埓぀お耇写材料の珟像
性も栌別損われるこずがない。 本発明のベンゟトリアゟヌル誘導䜓は、ベンゟ
トリアゟヌルのアルキル化誘導䜓、ハロゲン化誘
導䜓、又はヒドロキシル化誘導䜓を包含し、䟋え
ば―メチルベンゟトリアゟヌル、―クロロベ
ンゟトリアゟヌル、―クロロベンゟトリアゟヌ
ル、―ヒドロキシベンゟトリアゟヌル、―メ
チル――ヒドロキシベンゟトリアゟヌルなどは
本発明で䜿甚可胜なベンゟトリアゟヌル誘導䜓の
具䜓䟋である。これらの各ベンゟトリアゟヌル誘
導䜓ずベンゟトリアゟヌルはそれぞれ単独で䜿甚
するこずができる倖、誘導䜓同志䜵甚するこず
も、たた誘導䜓ずベンゟトリアゟヌルを䜵甚する
こずも可胜である。しかし、䜕れの堎合でも感光
局䞭に存圚するベンゟトリアゟヌルずその誘導䜓
の合蚈量は、0.1〜2.0m2奜たしくは0.3〜0.6
m2の範囲にあるこずを可ずする。 䞀方、無機酞の金属塩ずしおは、塩酞、硫酞な
どの無機酞のCu塩、Mg塩、Ca塩、Ba塩、Zn
塩、Cd塩、Hg塩、Al塩、Sn塩、Co塩、Ni塩な
どが䜕れも䜿甚可胜である。塩化マグネシりム、
塩化カルシりム、塩化亜鉛、硫酞マグネシりム、
硫酞亜鉛、硫酞アルミニりム、などは、本発明で
䜿甚しお有効な金属塩の兞型䟋である。本発明に
斌おは皮以䞊の金属塩を䜵甚するこずもできれ
ば、皮を単独で䜿甚するこずもできるが、䜕れ
にしおも感光局䞭の金属塩の存圚量は0.1〜2.0
m2の皋床にあるこずが奜たしい。 ゞアゟ化合物には、成分型ゞアゟ耇写材料に
䜿甚可胜な公知のゞアゟニりム塩が本発明でも䜿
甚される。そうしたゞアゟニりム塩を䟋瀺すれ
ば、次の通りである。 ◎パラプニレンゞアミン眮換化合物系ゞ
アゟニりム塩 䞀般匏 アニオン R′R″脂肪族炭化氎玠基 ベンれン栞に導入できる基 ―ゞアゟ――ゞメチルアニリン ―ゞアゟ――ゞ゚チルアニリン ―ゞアゟ――゚チル――β―ヒドロ
キシ゚チルアニリン ―ゞアゟ――ビス―β―ヒドロキシア
ニリン ―ゞアゟ――メチル――β―ヒドロキシ
゚チルアニリン ―ゞアゟ――゚チル――β―ヒドロキシ
プロピルアニリン ―ゞアゟ――゚チル――β―ゞ゚チル
アミノ―゚チルアニリン ―ゞアゟ――クロロ――ゞ゚チルア
ニリン ―ゞアゟ――メチル――ゞ゚チルア
ニリン ―ゞアゟ――アむオド――ゞ゚チル
アニリン ―ゞアゟ――トリフルオロメチル―
―ゞ゚チルアニリン ―ゞアゟ――゚チル――ベンゞルアニリ
ン ―ゞアゟ――メチル――ベンゞルアニリ
ン ◎アミノハむドロキノン゚ヌテル系ゞアゟニりム
å¡© 䞀般匏 R′及びR″アルキル基又はアリヌル
基 ―ゞアゟ――ゞブトキシ――ゞ
゚チルアニリン ―ゞアゟ――ゞ゚トキシ――ベンゟ
むルアニリン ―ゞアゟ――ゞ゚トキシ――゚チル
――ベンゟむルアニリン ―ゞアゟ――ゞベンゞルオキシ――
ベンゟむルアニリン ―ゞアゟ――クロロ――メトキシ――
ベンゟむルアニリン ―ゞアゟ――ゞ゚トキシ――ベンゟ
むルメチルアニリン ―ゞアゟ――ゞ゚トキシ――ベンゟ
むルオキシメチルアニリン その他、―ゞアゟ――ゞオキシアルキ
ル又はゞオキシアリヌル――アルキル
又はアリヌル化合物及びその誘導䜓 ◎アミノゞプニル、アミノゞプニルアミン及
び類䌌化合物系ゞアゟニりム塩 䞀般匏 N2―――R′ 及び N2――――N2X ゞアリヌルアミン〔―NH―〕 ゞプニル〔単結合〕 ゞプニルオキサむド〔――〕ゞアリ
ヌルメタン〔―CH2―〕 スチルベン〔―CHCH―〕 ゞアリヌル又はアリヌルアルキルサルフアむド パラゞアゟゞプニルアミン ―ゞアゟ―4′―トリ゚トキシゞプ
ニルアミン ―ゞアゟ――トリ゚トキシゞプ
ニル ―ビスゞアゟ―2′5′―テトラ
ヒドロキシゞプニルメタン ビスゞアゟ―3′―ゞクロロ―5′―ゞメ
トキシベンチゞン ―ゞアゟ――ゞメトキシプニル゚チ
ルサルフアむド ―ゞアゟ――ゞ゚トキシ―4′―メチル
―ゞプニルサルフアむド ◎耇玠環匏アミン誘導䜓系ゞアゟニりム塩 䞀般匏 モルホリン系、チオモルホリ
ン系、メチレン基プニルピペリゞン系、単
結合プニルピロリゞン系 ―ゞアゟ――ゞブトキシ――プニ
ルモルホリン ―ゞアゟ――ゞ゚トキシ――プニ
ルモルホリン ―ゞアゟ――メトキシ――チオモルホリ
ン ―ゞアゟ――プニルピペリゞン ―ゞアゟ――プニルピロリゞン ―ゞアゟ―――ブトキシ――プ
ニルピペリゞン その他、―ゞアゟ――プニル耇玠環匏ア
ミン誘導䜓 ◎オル゜プニレンゞアミン眮換化合物の
誘導䜓及びオル゜アミノプノヌルの誘導䜓系
ゞアゟニりム塩 ―ゞアゟ――メチルメルカプト―
N′―ゞメチルアニリン ―ゞアゟ――ベンゟむルアミノ―
N′―ゞメチルアニリン ―ゞアゟ――ナフトヌル――スルホン酞 以䞊䟋瀺した各ゞアゟニりム塩は䜕れも硫酞
塩、塩酞塩又は北化ホり玠酞塩ずしお䜿甚できる
倖、塩化亜鉛、塩化錫、硫酞アンモニりムなどず
の耇塩の圢でも䜿甚可胜である。 本発明のカツプリング成分には、前蚘したゞア
ゟ化合物ずカツプリング可胜な化合物カプラ
ヌが䜕れも䜿甚可胜である。そうしたカプラヌ
ずしおは、プノヌル誘導䜓、オキシナフタレン
誘導䜓、掻性メチレン基を含む化合物、耇玠環匏
化合物が挙げられるが、その具䜓䟋を列挙すれば
次の通りである。 ◎プノヌル誘導䜓 ピロカテコヌル レゟルシン フロログリシン ピロガロヌル レゟルシンモノグリコヌル゚ヌテル レゟルシングリコヌル゚ヌテル メタアミノプノヌル パラアミノプノヌル ゞ゚チルアミノプノヌル ―トリメチルプノヌル ―ヒドロキシメチルプノヌル β――ヒドロキシプニル―プロピオン
酾 ―ω―プニルアミノメチル―プノヌ
ル β――メチル――ヒドロキシプニル
―グルタル酞 ―ゞメチル―――ゞメチルアミノ
メチル―プノヌル ピロガロヌルの―ゞメチル゚ヌテル ―ラりリル―パラ―アミノプノヌル ―アシル―メタ―アミノプノヌル メタヒドロキシアセトアニリド オルト――ヒドロゞプノヌル―モノ―グア
ニゞン パラ――ヒドロゞプノヌル―ビ―グアニゞ
ン ―ゞメチル――モルホリノメチルプ
ノヌル ―メチル――む゜プロピル――モルホリ
ノメチルプノヌル ―モルホリンメチルレゟルシノヌルモノメチ
ル゚ヌテル 3′―トリヒドロキシゞプニル 3′5′―テトラヒドロキシゞプニル 2′4′―テトラヒドロキシゞプニル 4′―トリヒドロキシゞプニル―2′―
スルホン酞 3′5′―ペンタヒドロキシゞプ
ニル 2′4′―テトラヒドロキシゞプニル
サルフアむド ◎オキシナフタレン誘導䜓 ―ゞオキシナフタレン β―ナフトヌル ―ナフトヌル ―ゞオキシナフタレン ―ゞオキシナフタレン ―ヒドロキシナフタレン――スルホン
酾 ―ナフトヌル――ゞスルホン酞 ―ゞヒドロキシナフタレン――スルホ
ン酞 ―ゞヒドロキシナフタレン――スルホ
ン酞 ―ゞヒドロキシナフタレン――スルホ
ン酞 ―アミノナフトヌル――スルホン酞 ―ゞヒドロキシ――ゞスルホン酞 ―ベンゟむルアミノナフトヌル――ス
ルホン酞 ―ゞヒドロキシナフタレン――スルホ
ン酞 ―ヒドロキシ――ナフト゚酞――β―ヒ
ドロキシ゚チルアミド ―ヒドロキシ――ナフト゚酞――ビ
ス―β―ヒドロキシ゚チルアミド ―ヒドロキシ――ナフト゚酞―ヒドロキシ
゚チルアミド ――カルボ゚トキシメチルアミノ―
―ナフトヌル――スルホン酞 ―パラ―ニトロ―ベンズアミド――ナ
フトヌル ―ヒドロキシナフチヌル――プニルグア
ニゞン ―ヒドロキシナフチヌル――ビグアニゞン ―ナフトヌル―――β―ヒドロ゚チ
ル―スルホンアミド ―ナフトヌル――――メトキシプ
ニル―スルホンアミド ビス―〔―オキシ――スルホナフチル(2)〕
アミン ―ビス〔―オキシ――スルホナフチ
ル(6)〕―チオ尿玠 ◎掻性メチレン基を含む化合物 ―プニル――メチルピラゟロン(5)―アセ
ト酢酞アニリド ―プニル――カルボキシピラゟロン―ア
セト酢酞シクロヘキシルアミド アセト酢酞ベンゞルアミド シアノアセトアニリド シアノアセトモルホリン ◎耇玠環匏化合物 ―3′―スルホアミド―プニル――メ
チルピロゟロン― ―4′―カルボキシ―゚チルプニル―
―ドデシル―ピラゟロン― ―ヒドロキシ――ナフチむミダゟヌル ―メチル――ヒドロキシベンズむミダゟヌ
ル ―メチル――ヒドロキシベンゟチアゟヌル ―ゞメチル――ヒドロキシ―ベンゟト
リアゟヌル 本発明の成分型ゞアゟ耇写材料は、埓来のチ
オ尿玠又はその誘導䜓に代えお、ベンゟトリアゟ
ヌル又はその誘導䜓を䜿甚しおいるずは蚀え、圓
該化合物も倚少は酞化分解しおアンモニアを発生
するので、耇写材料の保存性を高めるために、ク
゚ン酞、酒石酞、シペり酞、ホり酞などで代衚さ
れる公知の酞安定剀を感光局に配合するこずが奜
たしい。しかし、その配合量は埓来の耇写材料に
比范しお少量でプレカツプリングを充分に防止で
き、埓぀お本発明のゞアゟ耇写材料はその珟像性
が損われるこずがない。 進んで実斜䟋を瀺しお本発明をさらに具䜓的に
説明する。 実斜䟋  ゞアゟ化合物ずしおN′―ゞ゚チルアミノ
ベンれンゞアゟニりムクロラむドを、カツプリン
グ成分ずしお―ゞヒドロキシナフタレン―
―スルホン酞゜ヌダをそれぞれ䜿甚し、衚―
に瀺す組成の各感光液を調補した。
The present invention relates to an improvement of a two-component type diazo copying material, and more specifically, it provides excellent preservability and developability before copying, and provides clear copied images with high sunlight fastness after copying. The present invention relates to a two-component copying material obtained. In conventional two-component type diazo copying materials in which the photosensitive layer on the support contains both a diazo compound and a coupling component, thiosulfur is added to the photosensitive layer in order to obtain a clear copy image with excellent sunlight fastness. Copying materials containing urea or its derivatives and zinc chloride are known. However, this type of copying material generally does not have good developability. This is because copying materials containing thiourea or its derivatives are prone to pre-coupling during storage due to oxidative decomposition of thiourea, etc. This is because it contains an acid stabilizer. In other words, when thiourea or its derivatives are used for the purpose of improving the sunlight fastness of reproduced images, a relatively large amount of acid stabilizer must be used to prevent precoupling. Deterioration in the developability of the material cannot be avoided. However, regardless of the developing method, it is desirable for diazo copying materials to be developed with as little alkali as possible in order to prevent pollution and save resources, so the above-mentioned deterioration in developability is inevitable. Must improve. An object of the present invention is to provide a two-component diazo copying material that has satisfactory storage stability, good developability, and is capable of forming copied images with clear sunlight fastness. The feature is that benzotriazole or a derivative thereof and a metal salt of an inorganic acid coexist in a photosensitive layer on a support containing a diazo compound and a coupling component. The benzotriazole or its derivative used in the present invention, in cooperation with a metal salt of an organic or inorganic acid, contributes to improving the clarity and sunlight fastness of reproduced images, but this is because the above compound is complexed with metal ions. It is presumed that this is because it effectively acts on the metal chelate formation of the azo dye. And benzotriazole and its derivatives are less susceptible to oxidative decomposition compared to conventional thiourea or its derivatives.
By adding a small amount of acid stabilizer, the shelf life of the copying material can be guaranteed, and the developability of the copying material is not particularly impaired. The benzotriazole derivatives of the present invention include alkylated, halogenated, or hydroxylated derivatives of benzotriazole, such as 5-methylbenzotriazole, 5-chlorobenzotriazole, 6-chlorobenzotriazole, 1-hydroxybenzotriazole, etc. Triazole, 5-methyl-1-hydroxybenzotriazole, and the like are specific examples of benzotriazole derivatives that can be used in the present invention. Each of these benzotriazole derivatives and benzotriazole can be used alone, as well as in combination with each other, or in combination with a derivative and benzotriazole. However, in any case, the total amount of benzotriazole and its derivatives present in the photosensitive layer is 0.1 to 2.0 g/m2, preferably 0.3 to 0.6 g/ m2 .
g/m 2 range. On the other hand, metal salts of inorganic acids include Cu salts, Mg salts, Ca salts, Ba salts, and Zn salts of inorganic acids such as hydrochloric acid and sulfuric acid.
Salt, Cd salt, Hg salt, Al salt, Sn salt, Co salt, Ni salt, etc. can all be used. magnesium chloride,
Calcium chloride, zinc chloride, magnesium sulfate,
Zinc sulfate, aluminum sulfate, etc. are typical examples of metal salts useful in the present invention. In the present invention, two or more types of metal salts can be used together, or one type can be used alone, but in any case, the amount of metal salts present in the photosensitive layer is 0.1 to 2.0.
Preferably it is on the order of g/m 2 . As the diazo compound, known diazonium salts that can be used in two-component diazo copying materials are used in the present invention. Examples of such diazonium salts are as follows. ◎Paraphenylenediamine N,N-substituted compound diazonium salt General formula (X: anion R′, R″: aliphatic hydrocarbon group Z, Y: group that can be introduced into the benzene nucleus) 4-Diazo-N,N-dimethylaniline 4-Diazo-N,N-diethylaniline 4-Diazo- N,N-ethyl-N-β-hydroxyethylaniline 4-diazo-N,N-bis-β-hydroxyaniline 4-diazo-N-methyl-N-β-hydroxyethylaniline 4-diazo-N-ethyl- N-β-hydroxypropylaniline 4-diazo-N-ethyl-N-(β-diethylamino)-ethylaniline 4-diazo-2-chloro-N,N-diethylaniline 4-diazo-2-methyl-N,N -diethylaniline 4-diazo-2-iodo-N,N-diethylaniline 4-diazo-2-trifluoromethyl-N,N
-Diethylaniline 4-Diazo-N-ethyl-N-benzylaniline 4-Diazo-N-methyl-N-benzylaniline ◎Aminohydroquinone ether diazonium salt General formula (R, R′ and R″: alkyl group or aryl group) 4-diazo-2,5-dibutoxy-N,N-diethylaniline 4-diazo-2,5-diethoxy-N-benzoylaniline 4-diazo-2 ,5-diethoxy-N-ethyl-N-benzoylaniline 4-diazo-2,5-dibenzyloxy-N-
Benzoylaniline 4-diazo-2-chloro-5-methoxy-N-
Benzoylaniline 4-Diazo-2,5-diethoxy-N-benzoylmethylaniline 4-Diazo-2,5-diethoxy-N-benzoyloxymethylaniline Others, 4-diazo-2,5-dioxyalkyl (or dioxy (aryl)-N-alkyl (or aryl) compounds and their derivatives ◎Aminodiphenyl, aminodiphenylamine and similar compound-based diazonium salts General formula: XN 2 -R-A-R' and XN 2 -R-A-A-N 2 X (diarylamine [A: -NH-] diphenyl [A: single bond] diphenyl oxide [A: -O-]) (diarylmethane [A: -CH 2 -] stilbene [A: -CH=CH-] ) Diaryl or arylalkyl sulfide paradiazodiphenylamine 4-diazo-2,5,4'-triethoxydiphenylamine 4-diazo-2,5,4-triethoxydiphenyl 4,4-bisdiazo-2, 2',5,5'-tetrahydroxydiphenylmethane bisdiazo-3,3'-dichloro-5,5'-dimethoxybenzidine 4-diazo-2,5-dimethoxyphenylethyl sulfide 4-diazo-2, 5-Diethoxy-4'-methyl-diphenylsulfide ◎Heterocyclic amine derivative diazonium salt General formula (A: O (morpholine type), S (thiomorpholine type), methylene group (phenylpiperidine type), single bond (phenylpyrrolidine type)) 4-Diazo-2,5-dibutoxy-N-phenylmorpholine 4 -Diazo-2,5-diethoxy-N-phenylmorpholine 4-diazo-2-methoxy-N-thiomorpholine 4-diazo-N-phenylpiperidine 4-diazo-N-phenylpyrrolidine 4-diazo-2, 5-n-butoxy-N-phenylpiperidine and others, 4-diazo-N-phenyl heterocyclic amine derivatives ◎ Orthophenylenediamine N,N-substituted compound derivatives and orthoaminophenol derivative diazonium salts 2-diazo- 4-methylmercapto-N,
N'-dimethylaniline 2-diazo-5-benzoylamino-N,
N'-dimethylaniline 2-diazo-1-naphthol-5-sulfonic acid Each of the diazonium salts listed above can be used as a sulfate, hydrochloride, or fluoroborate, as well as zinc chloride, tin chloride, ammonium sulfate, etc. It can also be used in the form of a double salt. As the coupling component of the present invention, any of the above-mentioned diazo compounds and compounds capable of coupling (couplers) can be used. Examples of such couplers include phenol derivatives, oxynaphthalene derivatives, compounds containing active methylene groups, and heterocyclic compounds, and specific examples thereof are as follows. ◎Phenol derivatives Pyrocatechol resorcinol Phloroglycine Pyrogallol resorcinol Monoglycol ether Resorcinol Glycol ether Meta-aminophenol Para-aminophenol Diethylaminophenol 2,5,6-Trimethylphenol 2-Hydroxymethylphenol β-(2-Hydroxyphenyl)-Propionic acid 2- (ω-phenylaminomethyl)-phenol β-(4-methyl-2-hydroxyphenyl)
-Glutaric acid 2,5-dimethyl-6-(N-dimethylaminomethyl)-phenol 1,3-dimethyl ether of pyrogallol N-lauryl-para-aminophenol N-acyl-meta-aminophenol metahydroxyacetanilide ortho-N- Hydrodiphenol-mono-guanidine Para-N-hydrodiphenol-bi-guanidine 2,5-dimethyl-4-morpholinomethylphenol 2-methyl-5-isopropyl-4-morpholinomethylphenol 4-morpholinemethylresorcinol monomethyl ether 3 ,3',5-trihydroxydiphenyl 3,3',5,5'-tetrahydroxydiphenyl 2,2',4,4'-tetrahydroxydiphenyl 2,4,4'-trihydroxydiphenyl- 2′-
Sulfonic acid 2,4,6,3',5'-pentahydroxydiphenyl 2,2',4,4'-tetrahydroxydiphenyl sulfide ◎Oxynaphthalene derivative 2,3-dioxynaphthalene β-naphthol n- Naphthol 1,6-dioxynaphthalene 2,7-dioxynaphthalene 2,3-hydroxynaphthalene-6-sulfonic acid 2-naphthol-3,6-disulfonic acid 2,7-dihydroxynaphthalene-3-sulfonic acid 2,8 -Dihydroxynaphthalene-6-sulfonic acid 1,8-dihydroxynaphthalene-8-sulfonic acid 1,8-aminonaphthol-5-sulfonic acid 2,7-dihydroxy-3,6-disulfonic acid 1,8-benzoylaminonaphthol- 2-Sulfonic acid 1,8-dihydroxynaphthalene-6-sulfonic acid 2-hydroxy-3-naphthoic acid-N-β-hydroxyethylamide 2-hydroxy-3-naphthoic acid-N,N-bis-β-hydroxyethyl Amide 8-hydroxy-2-naphthoic acid-hydroxyethylamide 1-(N-carboethoxymethylamino)-8
-Naphthol-4-sulfonic acid 5-(para-nitro)-benzamide-1-naphthol 1-hydroxynaphthyl-7-phenylguanidine 2-hydroxynaphthyl-8-biguanidine 1-naphthol-3-(N-β -hydroethyl)-sulfonamide 1-naphthol-3-(N-O-methoxyphenyl)-sulfonamide bis-[5-oxy-7-sulfonaphthyl(2)]
Amine N,N-bis[1-oxy-3-sulfonaphthyl(6)]-thiourea ◎Compound containing active methylene group 1-phenyl-3-methylpyrazolone(5)-acetoacetanilide 1-phenyl-3- Carboxypyrazolone - acetoacetic acid cyclohexylamide acetoacetic acid benzylamide cyanoacetanilide cyanoacetomorpholine ◎Heterocyclic compound 1-(3'-sulfoamide)-phenyl-3-methylpyrozolone-5 1-(4'-carboxy-ethyl phenyl)-3
-Dodecyl-pyrazolone-5 8-hydroxy-1,2-naphthiimidazole 2-methyl-4-hydroxybenzimidazole 7-methyl-4-hydroxybenzothiazole 1,7-dimethyl-4-hydroxy-benzotriazole 2 of the present invention Although component-type diazo copying materials use benzotriazole or its derivatives instead of conventional thiourea or its derivatives, this compound also undergoes oxidative decomposition to some extent and generates ammonia, so it is difficult to use the copying materials. In order to improve storage stability, it is preferable to incorporate known acid stabilizers such as citric acid, tartaric acid, oxalic acid, and boric acid into the photosensitive layer. However, precoupling can be sufficiently prevented with a smaller amount than in conventional copying materials, and therefore the developability of the diazo copying material of the present invention is not impaired. The present invention will now be described in more detail with reference to Examples. Example 1 N,N'-diethylaminobenzenediazonium chloride was used as the diazo compound and 2,3-dihydroxynaphthalene was used as the coupling component.
6-Sodium sulfonate was used, Table 1
Each photosensitive solution having the composition shown below was prepared.

【衚】 䞊蚘皮の感光液をそれぞれ68m2のゞアゟ
感光玙原玙に塗垃し塗垃量玄10mlm2、也燥
しお皮のゞアゟ耇写材料を埗た。次に各耇写材
料に透過原皿を合わせおゞアゟ也匏耇写機リコ
ピヌSM―1500で露光珟像し、埗られたコピヌ
の最倧濃床ず最小濃床をホトボルト蚈で枬定しお
各耇写材料の珟像性ずコピヌの耐色性を䞋蚘の方
法で評䟡した。 (1) 珟像性― 䞍完党珟像時の最倧濃床完党珟像時の最倧濃床×10
0珟像率 䞍完党珟像 䜿甚耇写機の最高スピヌドで珟像
した堎合 完党珟像  䜿甚耇写機の最䜎スピヌドで珟像
した堎合 (2) 耐色性― プヌドメヌタヌスガ詊隓機株匏䌚瀟補
でコピヌに光を時間照射し、照射前埌のコピ
ヌ濃床を枬定しおその差を求める。 たた露光珟像前の䞊蚘皮の耇写材料それぞ
れを50℃、50RHの暗所に24時間攟眮した
埌、䞊ず同様にしお露光珟像を行ない、埗られ
たコピヌの最倧濃床ず最小濃床をホトボルト蚈
で枬定し、暗所攟眮せずに埗たコピヌの最倧濃
床及び最小濃床からの倉化量を求めお各耇写材
料の保存性を評䟡した。結果を衚―に瀺す。
[Table] The three types of photosensitive solutions mentioned above were applied to 68 g/m 2 of diazo photosensitive paper base paper (approximately 10 ml/m 2 coating amount) and dried to obtain three types of diazo copying materials. Next, each copying material is combined with a transparent original, exposed and developed using a diazo dry copying machine (Recopy SM-1500), and the maximum and minimum densities of the resulting copies are measured using a photovoltmeter to determine the developability of each copying material. The brownness of the copies was evaluated by the following method. (1) Developability: - Maximum density at incomplete development/Maximum density at complete development x 10
0 = Development rate (%) Incomplete development...When developing at the maximum speed of the copying machine used Complete development...When developing at the lowest speed of the copying machine used (2) Brownness: - Fade meter (Suga Test Instruments Co., Ltd.) company)
The copy is irradiated with light for 5 hours, and the copy density before and after irradiation is measured to determine the difference. In addition, each of the above three types of copy materials before exposure and development was left in a dark place at 50°C and 50% RH for 24 hours, and then exposed and developed in the same manner as above, and the maximum and minimum densities of the resulting copies were determined. The storage stability of each copying material was evaluated by measuring with a photovoltmeter and determining the amount of change from the maximum density and minimum density of copies obtained without being left in the dark. The results are shown in Table-2.

【衚】 䞊蚘から明らかな通り、本発明の耇写材料は、
珟像性にもたた保存性にも優れおいるのに察し、
チオ尿玠を甚いた比范䟋の耇写材料は保存性が
悪く、これを改善すべく酒石酞量を倍にした比
范䟋の耇写材料は珟像性が著しく悪化する。 実斜䟋  ゞアゟ化合物ずしお―ゞ゚トキシ――
モルホリノベンれンゞアゟニりムクロラむド塩化
亜鉛耇塩を、カツプリング成分ずしお―ヒドロ
キシ――ナフト゚酞モルホリノ゚チルアミドを
䜿甚しお、衚―に瀺す組成の各感光液を調敎し
た。
[Table] As is clear from the above, the copying material of the present invention is
While it has excellent developability and storage stability,
The copying material of Comparative Example 1, which uses thiourea, has poor storage stability, and the copying material of Comparative Example 2, in which the amount of tartaric acid is doubled in order to improve this problem, has significantly poor developability. Example 2 2,5-diethoxy-4- as a diazo compound
Each photosensitive solution having the composition shown in Table 3 was prepared using morpholinobenzenediazonium chloride zinc chloride double salt and 2-hydroxy-3-naphthoic acid morpholinoethylamide as a coupling component.

【衚】【table】

【衚】 次にこれらの感光液をそれぞれ68m2のゞア
ゟ感光玙原玙に塗垃し塗垃量玄10mlm2、也
燥しお皮類のゞアゟ耇写材料を埗た。次いで埗
られた各耇写材料を䜿甚しお実斜䟋ず同䞀内容
の詊隓を同䞀手順で行ない、衚―に瀺す結果を
埗た。䜆し、耇写機にはリコピヌSM―1500に代
えおリコピヌスヌパヌドラむ205を䜿甚した。
[Table] Next, each of these photosensitive solutions was coated on 68 g/m 2 of diazo photosensitive paper base paper (approximately 10 ml/m 2 coating amount) and dried to obtain two types of diazo copying materials. Next, using each of the obtained copying materials, the same test as in Example 1 was carried out using the same procedure, and the results shown in Table 4 were obtained. However, the copy machine used was a Ricopy Super Dry 205 instead of the Ricopy SM-1500.

【衚】 衚―から明らかな通り、本発明の耇写材料は
珟像性、保存性が共に優れおいたが、比范䟋の
耇写材料はク゚ン酞量を倍に増量したにも拘ら
ず、保存性が悪い。尚、念のため付蚀するず、比
范䟋の感光液に斌お、ク゚ン酞量を1.0ずし
た以倖は比范䟋ず同䞀の感光液を調補し、この
感光液にお耇写材料を詊䜜したずころ、圓該耇写
材料はプレカツプリングが極めお著しく、到底実
甚に䟛し埗ないものであ぀た。 実斜䟋  ゞアゟ化合物ずしお―ゞ゚トキシ――
モルホリノベンれンゞアゟニりム四北化ホり玠耇
塩を、カツプリング成分ずしお2′4′―
テトラヒドロキシゞプニルサルフアむドを䜿甚
しお、衚―に瀺す組成の感光液を調補した。
[Table] As is clear from Table 4, the copying material of the present invention had excellent developability and storage stability, but the copying material of Comparative Example 3 had three times the amount of citric acid. Poor storage stability. As a precaution, the same photosensitive solution as Comparative Example 3 was prepared except that the amount of citric acid was changed to 1.0 g, and a copying material was prototyped using this photosensitive solution. However, the copying material had extremely severe pre-coupling and could not be put to practical use. Example 3 2,5-diethoxy-4- as a diazo compound
Morpholinobenzenediazonium boron tetrafluoride double salt is used as a coupling component of 2,2',4,4'-
A photosensitive solution having the composition shown in Table 5 was prepared using tetrahydroxydiphenyl sulfide.

【衚】 埗られた皮の感光液それぞれを、70m2の
トレヌシングペヌパヌに塗垃し塗垃量玄20
m2、也燥しお第原図甚耇写材料を䜜成した。
次に䞡耇写材料の珟像性、耐色性及び保存性を、
実斜䟋ず同じ方法で評䟡し、衚―に瀺す結果
を埗た。
[Table] Each of the two types of photosensitive liquids obtained was applied to a 70g/m 2 tracing paper (approximately 20g/m 2 coating amount).
m 2 ) and dried to prepare a second original copy material.
Next, the developability, brownness, and storage stability of both copying materials were evaluated.
Evaluation was performed in the same manner as in Example 1, and the results shown in Table 6 were obtained.

【衚】 衚―は比范䟋の耇写材料が保存性の点で䞍
満足であるのに察し、実斜䟋の耇写材料は保存
性に優れ、しかも比范䟋の耇写材料を凌ぐ珟像
性に備えおいるこずを瀺しおいる。
[Table] Table 6 shows that the copying material of Comparative Example 5 is unsatisfactory in terms of storage stability, while the copying material of Example 3 has excellent storage stability and has better developability than the copying material of Comparative Example 3. It shows that you are prepared.

Claims (1)

【特蚱請求の範囲】[Claims]  支持䜓䞊の感光局がゞアゟ化合物ずカツプリ
ング成分を䜵甚する成分型ゞアゟ耇写材料に斌
お、その感光局䞭にベンゟトリアゟヌル又はその
アルキル化誘導䜓、ハロゲン化誘導又はヒドロキ
シル化誘導䜓ず、無機酞の金属塩ずを共存させる
こずを特城ずする成分型ゞアゟ耇写材料。
1. In a two-component diazo copying material in which the photosensitive layer on the support contains a combination of a diazo compound and a coupling component, the photosensitive layer contains benzotriazole or its alkylated, halogenated or hydroxylated derivative, and an inorganic acid. A two-component type diazo copying material characterized by coexisting with a metal salt.
JP9925079A 1979-08-03 1979-08-03 Two-component type diazo copying material Granted JPS5624341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9925079A JPS5624341A (en) 1979-08-03 1979-08-03 Two-component type diazo copying material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9925079A JPS5624341A (en) 1979-08-03 1979-08-03 Two-component type diazo copying material

Publications (2)

Publication Number Publication Date
JPS5624341A JPS5624341A (en) 1981-03-07
JPS6230416B2 true JPS6230416B2 (en) 1987-07-02

Family

ID=14242453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9925079A Granted JPS5624341A (en) 1979-08-03 1979-08-03 Two-component type diazo copying material

Country Status (1)

Country Link
JP (1) JPS5624341A (en)

Also Published As

Publication number Publication date
JPS5624341A (en) 1981-03-07

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