JPS6237491B2 - - Google Patents
Info
- Publication number
- JPS6237491B2 JPS6237491B2 JP20134881A JP20134881A JPS6237491B2 JP S6237491 B2 JPS6237491 B2 JP S6237491B2 JP 20134881 A JP20134881 A JP 20134881A JP 20134881 A JP20134881 A JP 20134881A JP S6237491 B2 JPS6237491 B2 JP S6237491B2
- Authority
- JP
- Japan
- Prior art keywords
- varnish
- temperature
- tank
- heat medium
- coating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002966 varnish Substances 0.000 claims description 66
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 12
- 239000004020 conductor Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012943 hotmelt Substances 0.000 description 3
- 210000003298 dental enamel Anatomy 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 239000002320 enamel (paints) Substances 0.000 description 1
- 230000001932 seasonal effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Processes Specially Adapted For Manufacturing Cables (AREA)
Description
【発明の詳細な説明】
本考案はエナメル線構造の際に導体上に塗布、
焼付される特にワニスの温度制御方法に関する。[Detailed Description of the Invention] The present invention is applied by coating on a conductor during enameled wire structure.
The present invention relates to a method of controlling the temperature of varnishes, especially those to be baked.
一般にエナメル線は導体上へワニスの塗布焼付
けを複数回繰り返すことにより製造されており、
均一なエナメル線を製造するために粘度、濃度な
どを調整できるようにワニスは循環して使用され
ている。ところで従来、エナメル線焼付において
はワニス塗布装置内のワニス温度の変動がエナメ
ル線の仕上り外径に多大な影響をおよぼすため塗
布するワニスの温度制御が行なわれている。即ち
ワニス塗布装置内に送り込まれるタンク内のワニ
スは該タンクの周囲より水、油等（以下熱媒体と
称す）で間接的に加熱されており、前記タンク内
のワニスの温度を制御するために熱媒体の温度を
測定して温度調節計により熱媒体中に設置された
ヒータの加熱をPID制御するのが一般的なワニス
の温度制御である。この場合タンク内のワニス温
度を直接制御していないため、経験的にワニス温
度と熱媒体温度との関係を外部条件（例えば夏と
冬等の季節的条件）に応じて求め、熱媒体の温度
を設定しており、熱媒体の温度は一定に制御でき
ても、ワニスタンク内の温度は外部条件や新たな
ワニスがタンク内に入つてきたときは常に変化
し、±10℃以上の温度変化を生ずる上、目標値と
はオフセツトが発生するという問題点がある。 Generally, enamelled wire is manufactured by repeating coating and baking varnish on the conductor multiple times.
Varnish is used in cycles so that the viscosity, concentration, etc. can be adjusted to produce uniform enamelled wire. Conventionally, in enamelled wire baking, the temperature of the varnish to be applied has been controlled because fluctuations in the varnish temperature within the varnish applicator greatly affect the finished outer diameter of the enameled wire. That is, the varnish in the tank fed into the varnish applicator is indirectly heated by water, oil, etc. (hereinafter referred to as a heat medium) from the surroundings of the tank, and in order to control the temperature of the varnish in the tank, Typical varnish temperature control is to measure the temperature of the heat medium and use a temperature controller to perform PID control on the heating of a heater installed in the heat medium. In this case, since the varnish temperature in the tank is not directly controlled, the relationship between the varnish temperature and the heat medium temperature is empirically determined according to external conditions (for example, seasonal conditions such as summer and winter), and the temperature of the heat medium is Even if the temperature of the heating medium can be controlled at a constant level, the temperature inside the varnish tank will constantly change due to external conditions or when new varnish enters the tank, resulting in temperature changes of ±10°C or more. Moreover, there is a problem in that an offset occurs from the target value.
又、タンク内のワニス温度に基づき熱媒体中の
加熱ヒータを制御すると熱の伝達時間に遅れがあ
るため、ほとんどの場合熱媒体の温度が上昇しす
ぎワニスを加熱しすぎてしまい、いずれの場合に
おいても塗布装置内のワニス温度を正確に設定す
ることは困難であつた。さらに塗布装置内に熱源
を入れて塗布装置内のワニス温度を直接制御する
方法も考えられるが局部加熱などにより温度を均
一にするのが難しいという欠点がある。従つて、
塗布装置内のワニスの温度を一定にするのは従来
のいずれの方法においても困難でありエナメル線
の仕上り外径にはばらつきが生じていた。また、
溶剤型低粘度ワニスの代わりに所謂、ホツトメル
トの熱溶融性樹脂を用いて、大気にオープンする
場合の劣化を防止するため塗料タンクから塗布用
のヘツドに至るまでを密閉構造とし、樹脂塗料が
外気に触れることを防ぐと共に、塗料タンクから
塗布ヘツドまでの樹脂温度を劣化防止および最適
塗布粘度を得るために加熱するエナメル塗布装置
が知られている（実開昭55−35902号公報）。しか
しながら、このエナメル塗布装置はそもそもホツ
トメルトの熱溶融性樹脂を用い、塗料タンクから
塗布用のヘツドに至るまでを密閉構造としてこれ
を直接加熱する技法であり一般的なエナメルの塗
布には全く適用できない。 In addition, if the heater in the heat medium is controlled based on the varnish temperature in the tank, there is a delay in the heat transfer time, so in most cases the temperature of the heat medium will rise too much and the varnish will be heated too much. It was also difficult to accurately set the varnish temperature within the coating device. Furthermore, a method of directly controlling the varnish temperature within the coating apparatus by inserting a heat source into the coating apparatus is also considered, but this method has the disadvantage that it is difficult to make the temperature uniform due to local heating or the like. Therefore,
In any of the conventional methods, it is difficult to maintain a constant temperature of the varnish in the coating device, and the finished outer diameter of the enamelled wire varies. Also,
Instead of a solvent-based low viscosity varnish, a so-called hot-melt resin is used, and in order to prevent deterioration when exposed to the atmosphere, the area from the paint tank to the application head is sealed, so that the resin paint is not exposed to the outside air. There is known an enamel coating device that heats the resin from the paint tank to the coating head in order to prevent deterioration and obtain the optimum coating viscosity. However, this enamel applicator uses a hot-melt hot-melt resin and uses a technique that directly heats it in a closed structure from the paint tank to the applicator head, and cannot be applied to general enamel applications at all. .
本発明は上記難点に鑑みなされたもので、ワニ
スの温度制御を、タンク内のワニス温度と塗布装
置内のワニス温度と熱媒体の温度とを検出し、塗
布装置内のワニス温度が一定となる様にタンクの
熱媒体を加熱するヒータを制御する方法を提供す
るものである。 The present invention was made in view of the above-mentioned difficulties, and the varnish temperature is controlled by detecting the varnish temperature in the tank, the varnish temperature in the coating device, and the temperature of the heat medium, so that the varnish temperature in the coating device is kept constant. The present invention provides a method for controlling a heater that heats a heat medium in a tank.
以下、本発明を図面に示す一実施例につき説明
する。 The present invention will be described below with reference to an embodiment shown in the drawings.
本発明のワニス温度制御方法では第１図に示す
ように、エナメル線焼付炉に移送された導体上に
ワニスを塗布する塗布装置１のワニスの温度
T1、前記塗布装置にワニスを送るため加熱され
るタンク２内のワニスの温度T2とタンク２内の
ワニスを加熱する熱媒体３の温度T3の３点の温
度をそれぞれの温度検出器４，５，６、により検
出し、Ｉ／Ｏ装置７でＡ／Ｄ変換してCPU８に
入力し、下記に説明する方法により熱媒体３を加
熱するヒータ９を制御する制御出力をCPUから
発生する構成になつている。ここで、タンク２と
塗布装置１の間はポンプ１０によつて加熱された
ワニスを循環している。第２図に上記の制御方法
のブロツク線図を示す。予め設定する塗布ワニス
の設定温度S1と塗布装置１のワニスの測定温度
T1との差ε１により要素Ａにおける積分動作、
つまりＩ動作（Integral）、即ち修正動作の変化
する割合がε１の積分値に比例する制御動作で得
られた演算値とワニスの設定温度S1によりタンク
２内のワニスの設定温度S2を設定し、次に前記設
定温度S2とタンク２内のワニスの測定温度T2と
の差ε２により要素ＢにおけるＩ動作あるいは比
例＋積分動作、つまりPI動作（Proportional−
integral）、即ち制御動作信号とその積分値を一
定の割合で加え合わせて、これを調節信号とする
制御動作で得られた演算値とワニスの設定温度S1
により熱媒体３の設定温度S3を作り、更に前記設
定温度S3と熱媒体３の測定温度T3との差ε３に
より要素Ｃにおける比例＋積分＋微分動作、つま
りPID動作（Proportional−Integral−
Differential）、即ち制御動作信号と、それを微分
した信号および積分した信号を適当な比率で加え
合わせ、これを調節信号とする制御動作で前記ヒ
ータ９の操作量Ｓを出力して制御対称、即ち塗布
装置１内のワニス１１の温度を制御する。このよ
うに、周囲温度等による塗布ワニスの温度変化に
対して速かに応答し、該温度変化に対応する量を
加味した操作量Ｓを発生させ加熱ヒータを制御し
ているので塗布ワニスを設定どおり一定にでき
る。ここで、この方法による前記設定温度S2，S3
を決定する動作において各温度設定の上限を定
め、それを越えた場合は前記Ｉ動作を止める様に
する。 In the varnish temperature control method of the present invention, as shown in FIG.
T 1 , the temperature T 2 of the varnish in the tank 2 that is heated to send the varnish to the coating device, and the temperature T 3 of the heat medium 3 that heats the varnish in the tank 2 are detected by each temperature detector. Detected by 4, 5, 6, A/D converted by I/O device 7 and inputted to CPU 8, the CPU generates a control output to control the heater 9 that heats the heat medium 3 by the method explained below. It is configured to do this. Here, heated varnish is circulated between the tank 2 and the coating device 1 by a pump 10. FIG. 2 shows a block diagram of the above control method. The preset temperature S 1 of the applied varnish and the measured temperature of the varnish of the application device 1
Integral action in element A due to the difference ε 1 from T 1 ,
In other words, the set temperature S 2 of the varnish in the tank 2 is determined by the calculated value obtained in the I operation (Integral), that is, the control operation in which the rate of change of the correction operation is proportional to the integral value of ε 1 , and the set temperature S 1 of the varnish. Then, depending on the difference ε 2 between the set temperature S 2 and the measured temperature T 2 of the varnish in the tank 2, the I operation or proportional + integral operation in element B, that is, PI operation (Proportional -
integral), that is, the control operation signal and its integral value are added together at a constant rate, and this is used as the adjustment signal.The calculated value obtained by the control operation and the varnish set temperature S 1
The set temperature S 3 of the heat medium 3 is created by , and the difference ε 3 between the set temperature S 3 and the measured temperature T 3 of the heat medium 3 is used to create the proportional + integral + differential operation in element C, that is, the PID operation (Proportional-Integral −
Differential), that is, the control operation signal, its differentiated signal, and the integrated signal are added at an appropriate ratio, and this is used as an adjustment signal to output the manipulated variable S of the heater 9, and the control is symmetrical. The temperature of the varnish 11 in the coating device 1 is controlled. In this way, the applied varnish can be set by quickly responding to changes in the temperature of the applied varnish due to the ambient temperature, etc., and controlling the heater by generating the operation amount S that takes into account the amount corresponding to the temperature change. It can be kept constant. Here, the set temperatures S 2 and S 3 according to this method
The upper limit of each temperature setting is determined in the operation of determining the temperature, and if the upper limit is exceeded, the above-mentioned I operation is stopped.
以上の実施例からも明らかなように、本発明で
は塗布ワニスの温度を設定した後、該塗布ワニス
（塗布装置１内のワニス）とタンク２内のワニス
と熱媒体の測定温度を基にして塗布ワニスの温度
を制御するようにしているため、塗布装置内のワ
ニス温度を設定どおり一定にでき、夏期冬期の様
な外気温の変動にも影響されず、安定したエナメ
ル線焼付が可能となる。即ち、本発明の方法によ
れば、ワニス塗布装置内のワニス温度が目標温度
に制御され、かつ新たなワニスが入るような外乱
に対しても迅速に応答し、安定した制御が可能と
なり、従来のワニスタンクの熱媒体の温度をPID
制御する場合の±10℃以上の温度変化に比較し
て、約±４℃程度以下に制御することが可能とな
つた。 As is clear from the above examples, in the present invention, after setting the temperature of the applied varnish, the temperature is set based on the measured temperatures of the applied varnish (the varnish in the coating device 1), the varnish in the tank 2, and the heat medium. Since the temperature of the applied varnish is controlled, the varnish temperature inside the coating device can be kept constant as set, and stable enameled wire baking is possible without being affected by changes in outside temperature such as in summer and winter. . That is, according to the method of the present invention, the varnish temperature in the varnish applicator is controlled to the target temperature, and it also quickly responds to disturbances such as the introduction of new varnish, making it possible to perform stable control. PID the temperature of the heat medium in the varnish tank.
Compared to the temperature change of ±10°C or more when controlling the temperature, it has become possible to control the temperature to about ±4°C or less.
第１図は本発明の実施例を示した説明図、第２
図は第１図の制御方法を示したブロツク線図であ
る。
１……塗布装置、２……タンク、３……熱媒
体、４，５，６……温度測定器、７……Ｉ／Ｏ装
置、８……CPU、９……ヒータ、１０……ポン
プ、１１……ワニス、T1……塗布装置内のワニ
スの測定温度、T2……タンク内のワニスの測定
温度、T3……熱媒体の測定温度、S1……塗布装
置内のワニスの設定温度、S2……タンク内のワニ
スの設定温度、S3……熱媒体の設定温度、Ｓ……
ヒータの操作料、ε１……S1とT1との差の温
度、ε２……S2とT2との差の温度、ε３……S3
とT3との差の温度。
Figure 1 is an explanatory diagram showing an embodiment of the present invention, Figure 2 is an explanatory diagram showing an embodiment of the present invention.
The figure is a block diagram showing the control method of FIG. 1. 1... Application device, 2... Tank, 3... Heat medium, 4, 5, 6... Temperature measuring device, 7... I/O device, 8... CPU, 9... Heater, 10... Pump , 11... Varnish, T 1 ... Measured temperature of varnish in the coating device, T 2 ... Measured temperature of varnish in the tank, T 3 ... Measured temperature of heat medium, S 1 ... Varnish in the coating device Set temperature, S 2 ... Set temperature of varnish in the tank, S 3 ... Set temperature of heat medium, S...
Heater operation fee, ε 1 ... Temperature difference between S 1 and T 1 , ε 2 ... Temperature difference between S 2 and T 2 , ε 3 ... S 3
The temperature difference between and T 3 .
Claims (1)
スを塗布するワニス塗布装置内のワニスの設定温
度と測定温度との差を積分し、その演算値と前記
ワニスの設定温度により前記ワニス塗布装置にワ
ニスを送るタンク内のワニスの温度を設定し、該
タンク内のワニスの設定温度と測定温度との差を
積分動作あるいは比例＋積分動作により演算し、
その演算値と前記ワニスの設定温度により該タン
ク内のワニスを加熱する水、油等の熱媒体の温度
を設定し、該熱媒体の設定温度と測定温度との差
により該熱媒体を加熱するヒータを制御して前記
ワニス塗布装置内のワニス温度を所定の値にする
ようにしたことを特徴とするワニスの温度制御方
法。1 Integrate the difference between the set temperature of the varnish and the measured temperature in the varnish coating device that applies varnish onto the conductor transferred to the enameled wire baking furnace, and use the calculated value and the set temperature of the varnish to apply the varnish to the varnish coating device. Set the temperature of the varnish in the tank that sends the varnish, calculate the difference between the set temperature of the varnish in the tank and the measured temperature by integral operation or proportional + integral operation,
The temperature of a heat medium such as water or oil that heats the varnish in the tank is set based on the calculated value and the set temperature of the varnish, and the heat medium is heated based on the difference between the set temperature of the heat medium and the measured temperature. 1. A varnish temperature control method, comprising controlling a heater to bring the varnish temperature in the varnish applicator to a predetermined value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20134881A JPS58102415A (en) | 1981-12-14 | 1981-12-14 | Method of controlling temperature of varnish |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20134881A JPS58102415A (en) | 1981-12-14 | 1981-12-14 | Method of controlling temperature of varnish |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58102415A JPS58102415A (en) | 1983-06-18 |
| JPS6237491B2 true JPS6237491B2 (en) | 1987-08-12 |
Family
ID=16439540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20134881A Granted JPS58102415A (en) | 1981-12-14 | 1981-12-14 | Method of controlling temperature of varnish |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58102415A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0230675U (en) * | 1988-08-19 | 1990-02-27 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5279109B2 (en) * | 2007-02-09 | 2013-09-04 | 富士機械製造株式会社 | Component mounter |
-
1981
- 1981-12-14 JP JP20134881A patent/JPS58102415A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0230675U (en) * | 1988-08-19 | 1990-02-27 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58102415A (en) | 1983-06-18 |
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