JPS623776B2 - - Google Patents
Info
- Publication number
- JPS623776B2 JPS623776B2 JP9976379A JP9976379A JPS623776B2 JP S623776 B2 JPS623776 B2 JP S623776B2 JP 9976379 A JP9976379 A JP 9976379A JP 9976379 A JP9976379 A JP 9976379A JP S623776 B2 JPS623776 B2 JP S623776B2
- Authority
- JP
- Japan
- Prior art keywords
- mol
- glass
- glass composition
- melting point
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 57
- 239000000203 mixture Substances 0.000 claims description 52
- 238000002844 melting Methods 0.000 claims description 23
- 230000008018 melting Effects 0.000 claims description 22
- 239000005392 opalescent glass Substances 0.000 claims description 17
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 3
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 20
- 239000002994 raw material Substances 0.000 description 19
- 238000010304 firing Methods 0.000 description 16
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 15
- 239000003513 alkali Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 229910052742 iron Inorganic materials 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000011787 zinc oxide Substances 0.000 description 8
- 235000014692 zinc oxide Nutrition 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- 230000004580 weight loss Effects 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 210000003298 dental enamel Anatomy 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000010454 slate Substances 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000004017 vitrification Methods 0.000 description 3
- 239000004254 Ammonium phosphate Substances 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 2
- 235000019289 ammonium phosphates Nutrition 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 239000000378 calcium silicate Substances 0.000 description 2
- 229910052918 calcium silicate Inorganic materials 0.000 description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 239000011667 zinc carbonate Substances 0.000 description 2
- 235000004416 zinc carbonate Nutrition 0.000 description 2
- 229910000010 zinc carbonate Inorganic materials 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 241000254158 Lampyridae Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-L Phosphate ion(2-) Chemical compound OP([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-L 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- 241000256103 Simuliidae Species 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 206010000496 acne Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005262 decarbonization Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004534 enameling Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000011044 quartzite Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000005394 sealing glass Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- RIUWBIIVUYSTCN-UHFFFAOYSA-N trilithium borate Chemical compound [Li+].[Li+].[Li+].[O-]B([O-])[O-] RIUWBIIVUYSTCN-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
この発明は、ガラス、スレート板、ケイ酸カル
シウム板等の高温で変形したり、強度が低下した
りする基板に低温で焼付けることができるコーテ
イング用の低融点乳白ガラス組成物に関するもの
である。
従来、コーテイング用ガラス組成物としては、
例えば、鉄板用ほうろうフリツトあるいは一般低
融点フリツトなどが知られている。しかし、これ
らは種々の欠点を有している。すなわち、鉄板用
ほうろうフリツトは、一般に焼成温度が高く
(800〜850℃)、最低のものでも750℃程度であつ
た。そのため、薄物鉄板への適用はできなかつ
た。これはそのような基板がほうろう焼成温度に
おいて熱変形するためである。また、高温焼成の
ため、鉄と水との反応により生じた水素ガスの鉄
板に吸収される量が多く、ツマトビが起こり易い
ことも起因している。一方、一般の低融点フリツ
トは、鉛、カドミウム等を含んでいるので毒性が
あり、製造工程中廃棄されるものの処理がむづか
しいという欠点があつた。以上の他に、一般封着
用ガラスも知られているが、これも有毒物質を含
んでいたり、タリウム、銀など高価な金属を使用
しているので高価であつた。
この発明は、このような事情に鑑みなされたも
ので、水を除く組成の98モル%以上の組成物が、
P2O5:2〜20モル%
SiO2:3〜25モル%
Al2O3:14〜25モル%
B2O3:10〜40モル%
RO:5〜25モル%
R2O:12〜24モル%
〔ただし、
ROは、CaO、ZnO、BaOおよびMgOのうちの
少なくともCaOからなり、かつ
CaO≧3モル%
R2Oは、Li2O、Na2OおよびK2Oの少なくとも
一つからなる。〕
からなる母ガラス100モルに対して、SnO2、
TiO2およびZrO2の少なくとも一つが、1.0〜15.0
モル〔ただし、SnO2:0〜10.0モル〕の割合で
含有され、かつ上記の酸化物(SnO2、TiO2およ
びZrO2も酸化物のなかに含める)の一部が、F2
に換算して母ガラス100モルに対して3〜15モル
となるようにフツ化物に置換されている低融点乳
白ガラス組成物をその要旨とするものである。
すなわち、このように構成された低融点乳白ガ
ラス組成物は、基板上に低温で焼成でき、無毒
で、安価である。
つぎに、この発明において、組成物が前記のよ
うに限定された理由について説明する。すなわ
ち、
P2O5は、低融点化成分であり、このものが増
加するに従つて組成物が低融点化され、また、組
成物がLi2Oを含むときは、組成物が焼付けるこ
とにより形成されるガラス皮膜の耐酸性も向上す
る。しかし、P2O5が20モル%を超えると結晶化
が著しくなりガラス化しなくなる。逆に2モル%
未満では使用の効果が発揮されなくなる。
SiOは、ガラス組成物を焼付けることにより形
成されるガラス皮膜の耐アルカリ性向上成分であ
り、その増加によりガラス皮膜の耐アルカリ性が
向上する。特にSiO2が3モル%以上になると市
販のほうろう並の耐アルカリ性を示すようにな
る。しかし、SiO2は反面軟化温度を上げる傾向
があり、25モル%を超えるようになると軟化温度
がおおむね500℃以上になつて低温焼成に不向き
となる。また、SiO2が5モル%未満では、耐ア
ルカリ性向上効果が発揮されなくなる。他方、耐
アルカリ性向上成分としてCaOがあるが、CaOは
SiO2に比べて生成ガラス皮膜の熱膨張率を大き
くする傾向があるため、その使用量には制限があ
る。
Al2O3は、ガラス組成物を焼付けることにより
形成されるガラス皮膜の耐酸性向上成分であり、
その増加によりガラス皮膜の耐酸性が向上する。
特にAl2O3が18モル%以上になると市販のほうろ
う並の耐酸性を示すようになる。しかし、Al2O3
はSiO2と同様に軟化温度を徐々に上げる傾向が
あり、25モル%を超えるようになると軟化温度が
高くなりすぎて低温焼成に不向きとなる。逆に、
Al2O3が14モル%未満になると耐酸性向上効果が
発揮されなくなり、ガラス皮膜の光沢もなくなる
ようになる。
B2O3は、ガラス化成分として必要な成分であ
り、焼付けの際に平滑なガラス皮膜を形成する作
用をする。しかし、B2O3が10モル%未満になる
とガラス化しなくなり、40モル%を超えるとガラ
ス皮膜の表面性能が悪くなる。
ROは、ガラス組成物を焼付けることにより形
成されるガラス皮膜の耐アルカリ性を向上させる
とともに熱膨張率を大きくし、かつガラス組成物
の軟化温度を低める成分である。CaO、ZnO、
BaO、MgOのそれぞれの効果はつぎのとおりで
ある。
耐アルカリ性を向上させる作用は、CaO>
MgO>ZnO≒BaOの順になり、
熱膨張率を高める作用は、CaO≒BaO>ZnO
>MgOの順になり、
軟化温度を低下させる作用は、ZnO≒BaO>
MgO>CaOの順になる。
さらにROは、ガラス皮膜の耐熱水性も向上さ
せるのである。しかし、ROが5モル%未満にな
ると上記の効果が発揮されなくなり、逆に25モル
%を超えると熱膨張率が大きくなりすぎる。した
がつて、ROは5〜25モル%の範囲内に設定する
必要がある。ただし、この場合、CaOは、ZnO、
BaOおよびMgOの少なくとも一方と併用される
場合でも、3モル%以上ないと耐アルカリ性が悪
くなるのである。
R2Oは、低融点化成分であるが、同時に熱膨張
率を大きくする。すなわち、R2Oが12〜18モル%
であると、熱膨張率が60〜95×10-7/℃となり、
18〜24モル%であると90〜110×10-7/℃とな
る。したがつて、R2Oを18〜24モル%に選ぶと熱
膨張率が鉄板の熱膨張率に近くなるため、鉄板の
コーテイングに最適となるのである。また、R2O
を12〜18モル%に選ぶと熱膨張率がガラス、スレ
ート板等の低膨張率基板の熱膨張率に近くなるた
め、それらのコーテイングに最適となるのであ
る。R2Oが12モル%未満になると軟化温度が高く
なりすぎ、逆に24モル%を超えると熱膨張率が大
きくなりすぎ、目的とするガラス組成物にならな
くなる。
SnO2、TiO2、ZrO2は、いずれも乳白化成分で
あり、単独でまたは併せて用いられる。乳白化効
果は、SnO2,TiO2およびZrO2のうちの少なくと
も一つが、母ガラス100モルに対して1モルにな
つたところから発揮され、使用量の増加に比例し
て大きくなる。しかし、15モルを超えるとガラス
性が失われたり、軟化点、焼成温度が高くなるた
め、目的とするガラス組成物にならなくなる。そ
して、乳白化成分のうち、特にSnO2が10モルを
超えると急激に結晶化し、ガラス性が失われるよ
うになるのである。なお、これらの乳白化成分の
うち、SnO2のみはなくてもよい場合がある。
フツ化物に由来するFは、軟化温度低下成分で
あり、F2は換算して母ガラス100モルに対して3
〜15モルの範囲で顕著な効果を発揮し、ガラス組
成物の軟化温度を著しく低くして低温焼成を可能
ならしめる。しかしながら、このような効果は、
3モル未満では殆ど発揮されず、5モルから著し
く発揮され始め10モルでほぼ一定となる。そして
15モルを超えると生成ガラス皮膜の耐酸性の低下
を招くようになるのである。
つぎに、この発明の低融点乳白ガラス組成物の
原材料について説明する。
この発明ガラス組成物を構成する成分の原料と
しては、焼成により、前記成分の酸化物もしくは
それらの酸化物の混合物を生ずる原料、または焼
成により前記成分の酸化物の一部をフツ化物にす
るためのフツ素を生ずる原料であればどんなもの
でもよい。例えば、焼成により酸化物もしくはそ
れらの酸化物の混合物を生ずる原料として、無水
ケイ酸、ケイ酸アルミニウム、炭酸ナトリウム、
硫酸ナトリウム、塩化ナトリウム、ケイ酸ナトリ
ウム、ホウ酸、ホウ酸ナトリウム、水酸化アルミ
ニウム、炭酸カルシウム、炭酸亜鉛、重リン酸亜
鉛、炭酸マグネシウム、リン酸、リン酸カルシウ
ム、ホウ酸リチウム、炭酸リチウム、亜鉛華、硝
酸ナトリウム、水酸化亜鉛、リン酸アンモニウ
ム、リン酸ナトリウム(正リン酸塩、縮合リン酸
塩)、ホウ酸亜鉛、酸化スズ、酸化ジルコニウ
ム、酸化チタン、ケイ酸ジルコニウム、炭酸カリ
ウム、ケイ酸カリウム、炭酸バリウム等があげら
れ、焼成により前記酸化物の一部をフツ化物にす
るためのフツ素を発生する原料として、フツ化ア
ルミニウム、水晶石、フツ化ナトリウム、フツ化
リチウム、フツ化カリウム、ホタル石、ケイフツ
化ナトリウム、ケイフツ化カリウム等があげられ
る。
つぎに、この発明の低融点乳白ガラス組成物の
製造方法について説明する。すなわち、この発明
の低融点乳白ガラス組成物はつぎのようにして製
造される。
(イ) 前述の原材料から適宜の原材料を選び、それ
らを常温で、要すれば加熱して充分粉砕混合す
る。もちろん粉砕混合せずにガラス熔融を行わ
せてもよい。
(ロ) 上記混合物を炉中で加熱焼成して熔融ガラス
化せしめる。
(ハ) ガラス熔融の最終段階では800〜1300℃で1
〜4時間熔融させる。必要があれば途中で撹拌
する。
(ニ) なお、ガラス熔融に際して、要すれば前焼成
を行つてもよい。例えば、リン酸、炭酸ナトリ
ウム、ホウ酸、酸化亜鉛を用いた場合、まず常
温で原料を充分に混合反応させる。この際要す
れば加熱する。つぎに、150〜500℃で1〜3時
間反応させつつ脱水する。このようにして固形
物を得る。つぎに粉砕する。つぎに(ハ)のガラス
熔融を行うのである。このようにすればガラス
熔融時に脱水、脱炭酸ガスがほとんど起こらな
いためにるつぼ中よりふきこぼれなどが起こら
ず安全かつ好都合である。
(ホ) 以上の他、原料として第1リン酸ナトリウ
ム、第1リン酸亜鉛、炭酸亜鉛、リン酸アンモ
ニウム等の水を含むものや、炭酸塩、アンモニ
ウム塩を用いた場合は、熔融する前に上記(ニ)の
前焼成を行うのが好ましい。
(ヘ) 熔融したガラスは水中に投じて急冷するか、
厚い鉄板の上に流して冷却する。
(ト) 得られたガラスはポツトミル、振動ミル、ら
いかい機などで微粉砕する。このようにして目
的とする低融点乳白ガラス組成物が得られる。
つぎに、このようにして得られたガラス組成物
を基板にコーテイングする場合について説明す
る。すなわち、乾式施釉の場合は、ガラス組成物
を顔料と混合し、湿式施釉の場合は、常法に従い
必要に応じて顔料、カルボキシメチルセルロー
ス、アラビアゴムなどの添加物を加え、水系のス
リツプにして施釉し、要すれば乾燥した後、焼成
する。焼成温度はガラス組成によつて異るがほぼ
軟化温度より150〜200℃高い温度が適当である。
これらの場合において、上記例示以外の操作、あ
るいは他の附随的操作、補助的操作を含んでもよ
い。例えば、ガラス基板の上にコーテイングする
場合は徐冷を原則にし、最高温度530〜650℃で3
分〜10分程度保持するように配慮すべきである。
あるいはフリツト粉末の塗装に当つては流動浸漬
法を採用してもよい。その場合、コーテイングす
べき基板を予めフリツトの軟化点以上の温度に予
熱する必要があり、またフリツトも軟化点よりや
や低い温度まで予熱しておくと都合がよい。
以上のように、この発明の低融点乳白ガラス組
成物は、焼成温度が低いため、焼成コストが安
く、薄物鉄板、ガラス、スレート板、ケイ酸カル
シウム板等の高温で変形したり強度が低下したり
する基板に焼付けることができる。そして、焼付
けにより、耐水性ばかりでなく、耐候性、耐酸
性、耐アルカリ性に富む乳白ガラス皮膜を形成し
うるものである。また、この発明の低融点乳白ガ
ラス組成物は、生成乳白ガラス皮膜の熱膨張率を
薄物鉄板等の基板に近似させることができるた
め、乳白ガラス皮膜と基板の密着性を向上させる
ことができる。また、この発明のガラス組成物に
よれば、高温焼成の場合に生ずる欠点、例えば、
ツマトビ、酸化スケールの発生を解消することが
できる。さらに、この発明のガラス組成物は、有
害物質および高価な物質を含まないため、毒性等
の問題が起こらず、安価である。
つぎに、実施について説明する。
第1表のような配合により原料配合を行つた。
なお、第1表(その2)は第1表(その1)に
おける原料配合を酸化物のモル%表示に改めたも
のである。
The present invention relates to a low-melting-point opalescent glass composition for coating, which can be baked at low temperatures on substrates that deform or lose strength at high temperatures, such as glass, slate plates, and calcium silicate plates. Conventionally, as a glass composition for coating,
For example, enamel frits for iron plates and general low melting point frits are known. However, these have various drawbacks. That is, enamel frit for iron plates generally has a high firing temperature (800 to 850°C), with the lowest firing temperature being about 750°C. Therefore, it could not be applied to thin iron plates. This is because such substrates undergo thermal deformation at the enameling firing temperature. In addition, due to the high temperature firing, a large amount of hydrogen gas generated by the reaction between iron and water is absorbed by the iron plate, which is also a cause of the tendency for pimples to occur. On the other hand, general low-melting point frits are toxic because they contain lead, cadmium, etc., and have the disadvantage that they are difficult to dispose of even though they are discarded during the manufacturing process. In addition to the above, general sealing glasses are also known, but they are also expensive because they contain toxic substances and use expensive metals such as thallium and silver. This invention was made in view of these circumstances, and the composition, excluding water, contains 98 mol% or more of P 2 O 5 : 2 to 20 mol % SiO 2 : 3 to 25 mol % Al 2 O 3 : 14 to 25 mol% B2O3 : 10 to 40 mol% RO: 5 to 25 mol% R2O : 12 to 24 mol% [However, RO is at least one of CaO, ZnO, BaO, and MgO . It consists of CaO and CaO≧3 mol% R 2 O consists of at least one of Li 2 O, Na 2 O and K 2 O. ] SnO 2 ,
At least one of TiO 2 and ZrO 2 is 1.0 to 15.0
mol [however, SnO 2 :0 to 10.0 mol], and some of the above oxides (SnO 2 , TiO 2 and ZrO 2 are also included in the oxides) are F 2
The gist thereof is a low melting point opalescent glass composition in which fluoride is substituted in an amount of 3 to 15 moles per 100 moles of mother glass. That is, the low melting point opalescent glass composition configured in this manner can be fired onto a substrate at a low temperature, is non-toxic, and is inexpensive. Next, the reason why the composition is limited as described above in this invention will be explained. That is, P 2 O 5 is a component that lowers the melting point, and as the content of P 2 O 5 increases, the melting point of the composition is lowered, and when the composition contains Li 2 O, the composition is baked. The acid resistance of the glass film formed by this is also improved. However, if P 2 O 5 exceeds 20 mol %, crystallization will become significant and vitrification will not occur. On the other hand, 2 mol%
If it is less than that, the effect of use will not be exhibited. SiO is a component that improves the alkali resistance of the glass film formed by baking the glass composition, and its increase improves the alkali resistance of the glass film. In particular, when the SiO 2 content is 3 mol % or more, the alkali resistance becomes comparable to that of commercially available enamel. However, SiO 2 tends to raise the softening temperature, and when it exceeds 25 mol %, the softening temperature becomes approximately 500°C or higher, making it unsuitable for low-temperature firing. Moreover, if SiO 2 is less than 5 mol %, the effect of improving alkali resistance will not be exhibited. On the other hand, CaO is an ingredient that improves alkali resistance;
Since it tends to increase the thermal expansion coefficient of the resulting glass film compared to SiO 2 , there are limits to its usage. Al 2 O 3 is a component that improves the acid resistance of the glass film formed by baking the glass composition,
This increase improves the acid resistance of the glass film.
In particular, when the Al 2 O 3 content is 18 mol % or more, it exhibits acid resistance comparable to commercially available enamel. However , Al2O3
Similar to SiO2 , SiO2 tends to gradually increase the softening temperature, and when it exceeds 25 mol%, the softening temperature becomes too high and it becomes unsuitable for low-temperature firing. vice versa,
When Al 2 O 3 is less than 14 mol%, the effect of improving acid resistance is no longer exhibited, and the glass film loses its luster. B 2 O 3 is a necessary component as a vitrification component, and acts to form a smooth glass film during baking. However, if B 2 O 3 is less than 10 mol %, vitrification will not occur, and if it exceeds 40 mol %, the surface performance of the glass film will deteriorate. RO is a component that improves the alkali resistance of the glass film formed by baking the glass composition, increases the coefficient of thermal expansion, and lowers the softening temperature of the glass composition. CaO, ZnO,
The respective effects of BaO and MgO are as follows. The effect of improving alkali resistance is CaO>
The order is MgO>ZnO≒BaO, and the effect of increasing the coefficient of thermal expansion is CaO≒BaO>ZnO.
>MgO, and the effect of lowering the softening temperature is ZnO≒BaO>
The order is MgO>CaO. Furthermore, RO also improves the hot water resistance of the glass coating. However, if the RO content is less than 5 mol%, the above effects will not be exhibited, and conversely, if it exceeds 25 mol%, the coefficient of thermal expansion will become too large. Therefore, RO needs to be set within the range of 5 to 25 mol%. However, in this case, CaO is ZnO,
Even when used in combination with at least one of BaO and MgO, alkali resistance deteriorates unless it is 3 mol % or more. R 2 O is a component that lowers the melting point, but at the same time increases the coefficient of thermal expansion. i.e. 12-18 mol% R2O
, the coefficient of thermal expansion is 60 to 95×10 -7 /℃,
When it is 18 to 24 mol%, it is 90 to 110×10 −7 /°C. Therefore, if R 2 O is selected to be 18 to 24 mol %, the coefficient of thermal expansion will be close to that of the iron plate, making it optimal for coating iron plates. Also, R 2 O
When 12 to 18 mol% is selected, the coefficient of thermal expansion becomes close to that of low-expansion coefficient substrates such as glass and slate plates, making it optimal for coating them. If R 2 O is less than 12 mol %, the softening temperature will be too high, and if it exceeds 24 mol %, the thermal expansion coefficient will be too large, making it impossible to obtain the desired glass composition. SnO 2 , TiO 2 , and ZrO 2 are all opacifying components, and are used alone or in combination. The opacification effect is exhibited when at least one of SnO 2 , TiO 2 and ZrO 2 reaches 1 mol per 100 mol of the mother glass, and increases in proportion to the increase in the amount used. However, if the amount exceeds 15 moles, glass properties will be lost and the softening point and firing temperature will become high, making it impossible to obtain the desired glass composition. Among the opacifying components, particularly when SnO 2 exceeds 10 moles, it rapidly crystallizes and loses its glassiness. Note that among these opacifying components, only SnO 2 may be omitted in some cases. F derived from fluoride is a component that lowers the softening temperature, and F2 is converted to 3% per 100 moles of mother glass.
It exhibits a remarkable effect in the range of ~15 mol, significantly lowering the softening temperature of the glass composition and making low-temperature firing possible. However, such effects
At less than 3 moles, it is hardly exerted, and at 5 moles, it starts to be noticeably exerted, and becomes almost constant at 10 moles. and
If the amount exceeds 15 mol, the acid resistance of the resulting glass film will decrease. Next, the raw materials for the low melting point opalescent glass composition of the present invention will be explained. The raw materials for the components constituting the glass composition of this invention include raw materials that produce oxides of the components or mixtures of these oxides when fired, or raw materials that convert part of the oxides of the components into fluorides when fired. Any raw material that produces fluorine may be used. For example, raw materials that produce oxides or mixtures of oxides by firing include silicic anhydride, aluminum silicate, sodium carbonate,
Sodium sulfate, sodium chloride, sodium silicate, boric acid, sodium borate, aluminum hydroxide, calcium carbonate, zinc carbonate, zinc biphosphate, magnesium carbonate, phosphoric acid, calcium phosphate, lithium borate, lithium carbonate, zinc white, Sodium nitrate, zinc hydroxide, ammonium phosphate, sodium phosphate (orthophosphate, condensed phosphate), zinc borate, tin oxide, zirconium oxide, titanium oxide, zirconium silicate, potassium carbonate, potassium silicate, Examples include barium carbonate, and raw materials that generate fluorine for converting some of the oxides into fluorides by firing include aluminum fluoride, quartzite, sodium fluoride, lithium fluoride, potassium fluoride, and firefly. Examples include stone, sodium silica, potassium silica, etc. Next, a method for producing the low melting point opalescent glass composition of the present invention will be explained. That is, the low melting point opalescent glass composition of the present invention is produced as follows. (b) Select appropriate raw materials from the above raw materials and thoroughly grind and mix them at room temperature, heating if necessary. Of course, the glass may be melted without pulverization and mixing. (b) The above mixture is heated and fired in a furnace to melt and vitrify it. (c) At the final stage of glass melting, 1
Allow to melt for ~4 hours. Stir in between if necessary. (d) In addition, when melting the glass, pre-firing may be performed if necessary. For example, when using phosphoric acid, sodium carbonate, boric acid, and zinc oxide, the raw materials are first thoroughly mixed and reacted at room temperature. At this time, heat if necessary. Next, the mixture is dehydrated while reacting at 150 to 500°C for 1 to 3 hours. In this way a solid is obtained. Next, crush it. Next, (c) glass melting is performed. This method is safe and convenient since almost no dehydration or decarbonization occurs during glass melting, and no boiling over from the inside of the crucible occurs. (e) In addition to the above, if raw materials containing water such as dibasic sodium phosphate, dibasic zinc phosphate, zinc carbonate, ammonium phosphate, etc., or carbonates or ammonium salts are used, before melting. Preferably, the above (d) pre-firing is performed. (F) Either throw the molten glass into water and let it cool quickly.
Pour onto a thick iron plate to cool. (g) The obtained glass is pulverized using a pot mill, vibratory mill, sieve machine, etc. In this way, the desired low melting point opalescent glass composition is obtained. Next, the case where a substrate is coated with the glass composition obtained in this manner will be described. That is, in the case of dry glazing, the glass composition is mixed with a pigment, and in the case of wet glazing, pigments, additives such as carboxymethylcellulose, gum arabic, etc. are added as necessary according to conventional methods, and the glass composition is made into a water-based slip and glazed. Then, if necessary, after drying, it is fired. The firing temperature varies depending on the glass composition, but a temperature approximately 150 to 200°C higher than the softening temperature is appropriate.
In these cases, operations other than those exemplified above, or other incidental operations or auxiliary operations may be included. For example, when coating a glass substrate, slow cooling should be used as a general rule, and the maximum temperature should be 530 to 650℃.
Consideration should be given to holding it for about 10 minutes.
Alternatively, a fluidized dipping method may be used for coating the frit powder. In this case, it is necessary to preheat the substrate to be coated to a temperature above the softening point of the frit, and it is also convenient to preheat the frit to a temperature slightly lower than the softening point. As described above, the low melting point opalescent glass composition of the present invention has a low firing temperature, so the firing cost is low, and it does not deform or reduce the strength of thin iron plates, glass, slate plates, calcium silicate plates, etc. at high temperatures. It can be printed on any substrate. Then, by baking, it is possible to form an opalescent glass film that is not only water resistant but also weather resistant, acid resistant, and alkali resistant. In addition, the low melting point opalescent glass composition of the present invention can approximate the coefficient of thermal expansion of the opalescent glass coating to that of a substrate such as a thin iron plate, so it is possible to improve the adhesion between the opalescent glass coating and the substrate. Further, according to the glass composition of the present invention, drawbacks that occur during high-temperature firing, such as
It can eliminate the occurrence of black flies and oxidized scale. Furthermore, since the glass composition of the present invention does not contain harmful or expensive substances, it does not cause problems such as toxicity and is inexpensive. Next, implementation will be explained. The raw materials were mixed as shown in Table 1. In Table 1 (Part 2), the raw material formulations in Table 1 (Part 1) have been changed to represent the mol% of oxides.
【表】【table】
【表】
つぎに、以上の原料配合物を、1200〜1300℃に
設定した電気炉中においてアルミナるつぼを用い
て熔融した。この場合、ガラス組成物用原料配合
物のアルミナるつぼへの投入は、2、3回に分け
て行つた。そして、原料配合物を全て投入し終え
たのち、約1時間清澄し、ついで水中に投入し急
冷したのちポツトミルで粉砕し低融点乳白ガラス
組成物を得た。得られた低融点乳白ガラス組成物
の物性は第2表のとおりであつた。[Table] Next, the above raw material mixture was melted using an alumina crucible in an electric furnace set at 1200 to 1300°C. In this case, the raw material mixture for the glass composition was charged into the alumina crucible in two or three times. After all the raw material mixtures were added, the mixture was clarified for about 1 hour, then poured into water, rapidly cooled, and crushed in a pot mill to obtain a low melting point milky white glass composition. The physical properties of the obtained low melting point opalescent glass composition were as shown in Table 2.
【表】
なお、ガラス組成物の物性測定方法は以下のと
おりである。
(1) 熱膨張率および軟化温度
径約3mmの棒状ガラス組成物を試料とし昇温
速度約20℃/minで膨張を変位計により測定し
た。軟化温度は、ガラスが膨張から変形による
収縮に変る点を記録紙から読み取つた。
(2) 煮沸減量
ガラス組成物の粒度を32〜60メツシユに揃え
て3gを精秤し300c.c.のナスフラスコに50c.c.の熱
水とともに入れ、還流しつつ60分間煮沸する。
煮沸した試料は1G3のガラスフイルターでろ過
し煮沸前後の重量を秤量することにより煮沸減
量を求め、煮沸前の重量に対する百分率で表わ
した。
(3) 耐酸減量
32〜52メツシユに粒径を揃えたガラス組成物
粉末2000gを100c.c.のビーカーに入れ、1N―塩
酸水溶液50c.c.とともに、スターラーにより室温
において15分間撹拌したのち、1G1ガラスフイ
ルターcm2吸引ろ過し残渣を秤量することにより
耐酸減量を算出した。
耐酸減量=(1−残渣/2000)×100(%)
(4) 耐アルカリ減量
32メツシユ〜60メツシユに粒径を揃えたガラ
ス組成物粉末2000gを100c.c.のビーカーに入れ
1N―NaOH水溶液(30℃)50c.c.とともにスター
ラーにより室温において15分間撹拌したのち、
1G1ガラスフイルターで吸引過し残渣を秤量
することにより耐アルカリ減量を算出した。
耐アルカリ減量=(1−残渣/2000)×100(%)
つぎに、前記のようにして得られたガラス組成
物(粉末状)に対して分散剤および水を添加して
フリツプ化し、第3表に示す基板(ガラス板、鋼
板)に塗装し、同表に示す条件で焼成し乳白ガラ
ス皮膜化した。この乳白ガラス皮膜の性能を同表
に示す。[Table] The method for measuring the physical properties of the glass composition is as follows. (1) Coefficient of thermal expansion and softening temperature A rod-shaped glass composition with a diameter of about 3 mm was used as a sample, and its expansion was measured using a displacement meter at a heating rate of about 20° C./min. The softening temperature was determined from the recording paper at the point at which the glass changes from expansion to contraction due to deformation. (2) Boiling loss Adjust the particle size of the glass composition to 32 to 60 mesh, accurately weigh 3 g, put it in a 300 c.c. eggplant flask with 50 c.c. of hot water, and boil for 60 minutes while refluxing.
The boiled sample was filtered through a 1G3 glass filter, and the weight before and after boiling was measured to determine the loss in boiling, which was expressed as a percentage of the weight before boiling. (3) Acid resistance weight loss 2000 g of glass composition powder with a uniform particle size of 32 to 52 mesh was placed in a 100 c.c. beaker, and after stirring with 50 c.c. of 1N hydrochloric acid aqueous solution at room temperature using a stirrer for 15 minutes, The acid resistance weight loss was calculated by suction filtration using a 1G1 glass filter cm 2 and weighing the residue. Acid resistance weight loss = (1-residue/2000) x 100(%) (4) Alkali resistance weight loss 2000g of glass composition powder with a uniform particle size of 32 mesh to 60 mesh was placed in a 100 c.c. beaker.
After stirring with a stirrer at room temperature for 15 minutes with 50c.c. of 1N-NaOH aqueous solution (30℃),
The alkali resistance weight loss was calculated by suctioning through a 1G1 glass filter and weighing the residue. Alkali resistance loss = (1-residue/2000) x 100(%) Next, a dispersant and water are added to the glass composition (powdered) obtained as described above to form a flip. It was coated on the substrates (glass plate, steel plate) shown in the table and fired under the conditions shown in the table to form a milky white glass film. The performance of this opalescent glass film is shown in the same table.
【表】
なお、第3表の性能試験方法は以下のとおりで
ある。
(1) 耐酸性
5%クエン酸水溶液を浸透させた3cm×3cm
角の紙3枚を重ねて試料の上に置き、時計皿
をかぶせて15分間放置したのち紙を除き、水
洗し乾燥した。そして表面の侵食度をAA、
A、B、C、Dの5断階で評価した。AAが侵
食度が小さく最良であり、Dが最悪である。
(2) 耐アルカリ性
10%炭酸ナトリウム水溶液を用い、操作およ
び評価は耐酸性と同様に行つた。
(3) 耐熱水性
10cm×10cmの試料を沸騰水中に5時間浸漬し
たのち、外観の変化を調べた。
(4) ウエザオメーター
300時間試験したのちの状態を調べた。
なお、第1表に示すように、実施例1〜10で
は、炭酸バリウムのようなBaO生成原料および炭
酸カリウムのようなK2O生成原料を用いていない
が、上記のような原料を用いた場合でも実施例1
〜10と同様の効果が得られることが確認されてい
る。[Table] The performance test method in Table 3 is as follows. (1) Acid resistance 3cm x 3cm impregnated with 5% citric acid aqueous solution
Three pieces of corner paper were placed on top of the sample, covered with a watch glass, and left for 15 minutes, then the paper was removed, washed with water, and dried. And the degree of surface erosion is AA,
Evaluation was made on 5 scales: A, B, C, and D. AA is the best with the least degree of erosion, and D is the worst. (2) Alkali resistance Using a 10% aqueous sodium carbonate solution, operations and evaluations were performed in the same manner as for acid resistance. (3) Hot water resistance A 10 cm x 10 cm sample was immersed in boiling water for 5 hours, and changes in appearance were examined. (4) Weatherometer The condition was examined after testing for 300 hours. As shown in Table 1, in Examples 1 to 10, BaO-generating raw materials such as barium carbonate and K 2 O-generating raw materials such as potassium carbonate were not used, but the above-mentioned raw materials were used. Example 1 even if
It has been confirmed that effects similar to ~10 can be obtained.
Claims (1)
少なくともCaOからなり、かつ CaO≧3モル% R2Oは、Li2O、Na2OおよびK2Oの少なくとも
一つからなる。〕 からなる母ガラス100モルに対して、SnO2、
TiO2およびZrO2の少なくとも一つが、1.0〜15.0
モル〔ただし、Sn2O:0〜10.0モル〕の割合で
含有され、かつ上記の酸化物(SnO2、TiO2およ
びZrO2も酸化物のなかに含める)の一部が、F2
に換算して母ガラス100モルに対して3〜15モル
となるようにフツ化物に置換されている低融点乳
白ガラス組成物。 2 R2Oが、18〜24モル%の範囲内に選ばれてい
る特許請求の範囲第1項記載の低融点乳白ガラス
組成物。 3 R2Oが、12〜18モル%の範囲内に選ばれてい
る特許請求の範囲第1項記載の低融点乳白ガラス
組成物。[Claims] 1 Composition: P 2 O 5 : 2 to 20 mol % SiO 2 : 3 to 25 mol % Al 2 O 3 : 14 to 25 mol % B 2 O 3 : 10 to 40 mol % RO: 5 to 25 mol% R 2 O: 12 to 24 mol % [However, RO consists of at least CaO of CaO, ZnO, BaO and MgO, and CaO≧3 mol % R 2 O is Li 2 O, Consists of at least one of Na 2 O and K 2 O. ] SnO 2 ,
At least one of TiO 2 and ZrO 2 is 1.0 to 15.0
mol [however, Sn 2 O: 0 to 10.0 mol], and some of the above oxides (SnO 2 , TiO 2 and ZrO 2 are also included in the oxides) are F 2
A low melting point opalescent glass composition in which fluoride is substituted in an amount of 3 to 15 moles per 100 moles of mother glass. 2. The low melting point opalescent glass composition according to claim 1, wherein 2R2O is selected within the range of 18 to 24 mol%. 3. The low melting point opalescent glass composition according to claim 1, wherein R2O is selected within the range of 12 to 18 mol%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9976379A JPS5626745A (en) | 1979-08-04 | 1979-08-04 | Low melting point milk glass composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9976379A JPS5626745A (en) | 1979-08-04 | 1979-08-04 | Low melting point milk glass composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5626745A JPS5626745A (en) | 1981-03-14 |
| JPS623776B2 true JPS623776B2 (en) | 1987-01-27 |
Family
ID=14256007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9976379A Granted JPS5626745A (en) | 1979-08-04 | 1979-08-04 | Low melting point milk glass composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5626745A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7378006B1 (en) * | 2023-06-23 | 2023-11-10 | Tomatec株式会社 | Low-temperature melting glass frit composition and adhesives and coating materials containing the same |
-
1979
- 1979-08-04 JP JP9976379A patent/JPS5626745A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5626745A (en) | 1981-03-14 |
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