Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS6238854B2 - - Google Patents
[go: Go Back, main page]

JPS6238854B2 - - Google Patents

Info

Publication number
JPS6238854B2
JPS6238854B2 JP57061062A JP6106282A JPS6238854B2 JP S6238854 B2 JPS6238854 B2 JP S6238854B2 JP 57061062 A JP57061062 A JP 57061062A JP 6106282 A JP6106282 A JP 6106282A JP S6238854 B2 JPS6238854 B2 JP S6238854B2
Authority
JP
Japan
Prior art keywords
shaft
wafer
guide hole
pushing
push
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57061062A
Other languages
Japanese (ja)
Other versions
JPS58178533A (en
Inventor
Katsuyoshi Kudo
Fumio Shibata
Norio Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57061062A priority Critical patent/JPS58178533A/en
Publication of JPS58178533A publication Critical patent/JPS58178533A/en
Publication of JPS6238854B2 publication Critical patent/JPS6238854B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7626Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft

Landscapes

  • Jigs For Machine Tools (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】 本発明は、ウエーハ押圧げ装置に係り、特に位
置決めされたウエーハを押上げるのに好適なウエ
ーハ押圧げ装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a wafer pushing device, and more particularly to a wafer pushing device suitable for pushing up a positioned wafer.

従来、エツチング装置等の半導体製造装置の処
理室に具設されている予備室に設けられているウ
エーハ押上げ装置を第1図により説明する。
A wafer lifting device conventionally provided in a preliminary chamber of a processing chamber of a semiconductor manufacturing device such as an etching device will be explained with reference to FIG.

第1図で、予備室10の底部には、ホルダ11
が気密に設けられている。ホルダ11の上部に
は、フランジ12を介し押え板13が設けられて
いる。ホルダ11の下部には、ブラケツト14が
設けられたブラケツト15が垂設されている。ブ
ラケツト14には、駆動初期時に不安定作動する
駆動装置、例えば、空気シリンダー16が設けら
れている。空気シリンダー16のピストン17の
一端には、カツプリング18の下端が螺合されて
いる。カツプリング18の上部には、プツシユ1
9を介し押え板13で昇降を支持される軸20の
下端が設けられている。軸20の上端には、ウエ
ーハ21が載置されるテーブル22が設けられて
いる。テーブル22の表面外周には、滑り止め用
のOリング23が設けられている。フランジ12
と軸20とには、軸20の一部を包囲して気密保
持用のベローズ24が跨設されている。
In FIG. 1, there is a holder 11 at the bottom of the preliminary chamber 10.
is set up airtight. A press plate 13 is provided on the top of the holder 11 with a flange 12 interposed therebetween. At the bottom of the holder 11, a bracket 15, on which a bracket 14 is provided, is provided vertically. The bracket 14 is provided with a drive device, such as an air cylinder 16, which operates unstably at the beginning of the drive. A lower end of a coupling ring 18 is screwed into one end of the piston 17 of the air cylinder 16. At the top of the coupling ring 18, there is a push button 1.
A lower end of a shaft 20 is provided which is supported in elevation by a presser plate 13 via a shaft 9 . A table 22 on which a wafer 21 is placed is provided at the upper end of the shaft 20. An O-ring 23 for preventing slipping is provided on the outer periphery of the surface of the table 22. Flange 12
A bellows 24 for airtightness is provided between the shaft 20 and the shaft 20, surrounding a part of the shaft 20.

他の搬送手段(図示省略)で搬送され位置決め
されたウエーハ21は、空気シリンダー16を駆
動し軸20を介しテーブル22を上昇させること
で、テーブル22に載置されて押上げられる。そ
の後、押上げられたウエーハ21は、更に他の搬
送手段(図示省略)で受取られ予備室10から処
理室(図示省略)へ搬送される。更に他の搬送手
段でウエーハ21を取除かれたテーブル22は、
空気シリンダー16により軸20を介し降下され
て元の位置に戻される。
The wafer 21 that has been transported and positioned by another transport means (not shown) is placed on the table 22 and pushed up by driving the air cylinder 16 and raising the table 22 via the shaft 20. Thereafter, the pushed-up wafer 21 is further received by another transport means (not shown) and transported from the preliminary chamber 10 to the processing chamber (not shown). Furthermore, the table 22 from which the wafer 21 has been removed by another conveying means is
It is lowered by the air cylinder 16 via the shaft 20 and returned to its original position.

このようなウエーハ押上げ装置では、空気シリ
ンダーが駆動初期時に不安定作動するため、テー
ブルを滑らかに上昇させることができず、位置決
めされたウエーハのテーブルへの載置並びに押上
げ時にウエーハの位置ずれが生じるといつた欠点
があつた。
In such a wafer lifting device, the air cylinder operates unstablely at the initial stage of operation, making it impossible to raise the table smoothly. There was a drawback that this occurred.

本発明の目的は、上記した従来技術における欠
点を除去して位置決めされたウエーハのテーブル
への載置並びに押上げ時のウエーハの位置ずれを
防止できるウエーハ押上げ装置を提供することに
ある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a wafer pushing device that eliminates the drawbacks of the prior art described above and can prevent a wafer from shifting when a positioned wafer is placed on a table and pushed up.

本発明は、ウエーハ押上げ装置を、ウエーハが
載置されるテーブルが設けられた軸と下部から上
下方向に案内孔が形成され前記軸に設けられた案
内体とでなる昇降可能な軸手段と、該軸手段を弾
性力で下降させる駆動手段と、押上げ面を上端面
に有し前記案内孔内に昇降可能に設けられた押上
げ手段と、該押上げ手段を昇降させると共に前記
駆動手段の弾性力に抗し前記押上げ手段を介して
前記軸手段を上昇させる昇降駆動手段と、該昇降
駆動手段による下降を停止した方向押上げ手段の
押上げ面と前記駆動手段により下降させられる前
記案内体の前記案内孔の前記押上げ面と対向する
面との間に作動不感帯空間を保持して前記軸手段
の下降を停止させるストツパ手段とを具備したも
のとすることにより、昇降駆動手段が駆動初期時
に不安定作動しても、テーブルへの載置並びに押
上げ時のウエーハの位置ずれが生じないようにし
たものである。
The present invention provides a wafer lifting device with a shaft means capable of being raised and lowered, which comprises a shaft provided with a table on which a wafer is placed, and a guide body provided on the shaft with a guide hole formed in the vertical direction from the bottom. , a drive means for lowering the shaft means with elastic force; a push-up means having a push-up surface on an upper end face and provided in the guide hole so as to be movable up and down; and a drive means for raising and lowering the push-up means. an elevating drive means for raising the shaft means via the push-up means against the elastic force of the elevating means; a pushing surface of the directional push-up means that stops the lowering by the elevating drive means; and a stopper means for stopping the lowering of the shaft means by maintaining an actuation dead zone space between the pushing-up surface and the opposing surface of the guide hole of the guide body, so that the lifting drive means can be Even if the wafer operates unstablely at the initial stage of driving, the wafer will not be misaligned when it is placed on the table or when it is pushed up.

本発明の一実施例を第2図により説明する。 An embodiment of the present invention will be explained with reference to FIG.

第2図は、本発明によるウエーハ押上げ装置を
エツチング装置等の半導体製造装置の処理室に具
設されている予備室に適用した場合の縦断面図
で、なお、第2図で、第1図と同一装置等は同一
符号で示し説明を省略する。
FIG. 2 is a longitudinal cross-sectional view of a wafer lifting device according to the present invention applied to a preliminary chamber provided in a processing chamber of a semiconductor manufacturing device such as an etching device. Devices and the like that are the same as those in the figures are designated by the same reference numerals and their explanations will be omitted.

第2図で、軸手段は、軸20と案内体27とで
構成されている。昇降駆動手段は、例えば、空気
シリンダー16である。押上げ手段は、鍔28と
案内棒29とで構成されている。軸手段を下降さ
せる駆動手段は、例えば、バネ32である。スト
ツパ手段は、ストツパー31である。案内体27
には、内壁に突起25を有する案内孔26が形成
されている。鍔28は、突起25に係合可能、か
つ、案内孔26の内壁と非接触可能な形状、大き
さであり、中心を案内棒29の軸心と一致させて
案内棒29の上端に設けられている。この状態
で、鍔28が案内孔26内で昇降可能に案内棒2
9は案内孔26に挿設されている。従つて、この
場合、鍔28の上面が押上げ手段の上端面とな
る。軸20の下端には、案内体27がセツトボル
ト30で設けられている。この場合、軸20の軸
心と案内孔26の軸心とは一致し、軸20の下端
面は鍔28の上面と対向して案内孔26内に露出
させられている。従つて、この場合、軸20の下
端面が、軸手段の押上げ手段上端面と対向する下
端面となる。案内体27は、その降下をブラケツ
ト15に設けられたストツパー31で停止されて
いる。ホルダ11と案内体27との間には、上昇
した案内体27を降下させ、その下端面をストツ
パー31に当接させるバネ32が設けられてい
る。カツプリング18の上部には、案内棒29の
下部が螺合されている。この場合、空気シリンダ
ー16での下降を停止した鍔28の上面とバネ3
2での下降をストツパー31で停止された軸20
の下端面との間には、案内孔26内で作動不感帯
空間が保持される。この作動不感帯空間の深さ
は、空気シリンダー16が安定作動するまで鍔2
8の上面が軸20の下端面に当接しない深さとな
つている。
In FIG. 2, the shaft means is composed of a shaft 20 and a guide body 27. The elevating drive means is, for example, an air cylinder 16. The push-up means is composed of a collar 28 and a guide rod 29. The driving means for lowering the shaft means is, for example, a spring 32. The stopper means is a stopper 31. Guide body 27
A guide hole 26 having a protrusion 25 on the inner wall is formed in the guide hole 26 . The collar 28 has a shape and size that allows it to engage with the protrusion 25 and not come into contact with the inner wall of the guide hole 26, and is provided at the upper end of the guide rod 29 with its center aligned with the axis of the guide rod 29. ing. In this state, the guide rod 2 allows the collar 28 to move up and down within the guide hole 26.
9 is inserted into the guide hole 26. Therefore, in this case, the upper surface of the collar 28 becomes the upper end surface of the push-up means. A guide body 27 is provided at the lower end of the shaft 20 with a set bolt 30. In this case, the axial center of the shaft 20 and the axial center of the guide hole 26 coincide, and the lower end surface of the shaft 20 faces the upper surface of the collar 28 and is exposed within the guide hole 26. Therefore, in this case, the lower end surface of the shaft 20 becomes the lower end surface facing the upper end surface of the pushing-up means of the shaft means. The lowering of the guide body 27 is stopped by a stopper 31 provided on the bracket 15. A spring 32 is provided between the holder 11 and the guide body 27 to lower the raised guide body 27 and bring its lower end surface into contact with the stopper 31. The lower part of the guide rod 29 is screwed into the upper part of the coupling ring 18. In this case, the upper surface of the collar 28 that has stopped descending in the air cylinder 16 and the spring 3
The shaft 20 whose descent at step 2 is stopped by the stopper 31
An operating dead zone space is maintained within the guide hole 26 between the lower end surface of the guide hole 26 and the lower end surface of the guide hole 26 . The depth of this operation dead zone space is determined by the tsuba 2 until the air cylinder 16 operates stably.
The depth is such that the upper surface of the shaft 8 does not come into contact with the lower end surface of the shaft 20.

他の搬送手段(図示省略)で搬送され位置決め
されたウエーハ(図示省略)をテーブル(図示省
略)に載置し押上げる場合には、まず、空気シリ
ンダー16を駆動する。空気シリンダー16の駆
動後、一定時間経過した後にピストン17は急激
に上昇を開始し、案内棒29はカツプリング18
を介し案内孔26内を急激に上昇する。その後、
ピストン17の上昇が安定した時点で鍔28が軸
20の下端に当接し、軸20は、案内体27と共
にバネ32のバネ力に抗して滑らかに上昇する。
この結果、位置決めされたウエーハは滑らかに上
昇するテーブルに載置されて押上げられる。ま
た、押上げられたウエーハが更に他の搬送手段
(図示省略)で受取られた後は、案内棒29をカ
ツプリング18を介し空気シリンダー16だ案内
孔26内を降下させると共に、バネ32のバネ力
で案内体27を押下げストツパー31に当接させ
ることで、テーブルは軸20を介して元の位置ま
で戻される。
When a wafer (not shown) that has been transported and positioned by another transport means (not shown) is placed on a table (not shown) and pushed up, the air cylinder 16 is first driven. After a certain period of time elapses after the air cylinder 16 is driven, the piston 17 starts to rise rapidly, and the guide rod 29 moves toward the coupling 18.
It rises rapidly in the guide hole 26 through the guide hole 26. after that,
When the piston 17 has stabilized in its upward movement, the collar 28 comes into contact with the lower end of the shaft 20, and the shaft 20 moves upward together with the guide body 27 against the spring force of the spring 32.
As a result, the positioned wafer is placed on a smoothly rising table and pushed up. Further, after the pushed-up wafer is received by another conveyance means (not shown), the guide rod 29 is lowered through the coupling ring 18 into the air cylinder 16 and the guide hole 26, and the spring force of the spring 32 is lowered. By pressing down the guide body 27 and bringing it into contact with the stopper 31, the table is returned to its original position via the shaft 20.

本実施例のようなウエーハ押上げ装置では、空
気シリンダーの駆動初期時の急激な上昇が、軸の
下端面と鍔の上面との間に保持された作動不感帯
空間の作用により軸に伝動されることがなくテー
ブルを滑らかに上昇させることができるので、位
置決めされたウエーハのテーブルへの載置並びに
押上げを滑らかに行うことができ載置並びに押上
げ時のウエーハの位置ずれを防止することができ
る。
In the wafer lifting device of this embodiment, the sudden rise of the air cylinder at the initial stage of driving is transmitted to the shaft by the action of the actuation dead zone space maintained between the lower end surface of the shaft and the upper surface of the flange. Since the table can be raised smoothly without any problems, the positioned wafer can be placed on the table and pushed up smoothly, and the position of the wafer can be prevented from shifting when being placed or pushed up. can.

本発明によれば、位置決めされたウエーハのテ
ーブルへの載置並びに押上げを滑らかに行うこと
ができるので、テーブルへの載置並びに押上げ時
のウエーハの位置ずれを防止できる効果がある。
According to the present invention, it is possible to smoothly place a positioned wafer on a table and push it up, so that it is possible to prevent the wafer from shifting when it is placed on the table and pushed up.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来のウエーハ押上げ装置の縦断面
図、第2図は、本発明によるウエーハ押上げ装置
の一実施例を示す部分縦断面図である。 16……空気シリンダー、17……ピストン、
20……軸、22……テーブル、25……突起、
26……案内孔、27……案内体、28……鍔、
29……案内棒。
FIG. 1 is a vertical sectional view of a conventional wafer lifting device, and FIG. 2 is a partial vertical sectional view showing an embodiment of the wafer lifting device according to the present invention. 16...Air cylinder, 17...Piston,
20...shaft, 22...table, 25...protrusion,
26... Guide hole, 27... Guide body, 28... Tsuba,
29... Guide rod.

Claims (1)

【特許請求の範囲】[Claims] 1 ウエーハが載置されるテーブルが設けられた
軸と下部から上下方向に案内孔が形成され前記軸
に設けられた案内体とでなる昇降可能な軸手段
と、該軸手段を弾性力で下降させる駆動手段と、
押上げ面を上端面に有し前記案内孔内に昇降可能
に設けられた押上げ手段と、該押上げ手段を昇降
させると共に前記駆動手段の弾性力に抗し前記押
上げ手段を介して前記軸手段を上昇させる昇降駆
動手段と、該昇降駆動手段による下降を停止した
前記押上げ手段の押上げ面と前記駆動手段により
下降させられる前記案内体の前記案内孔の前記押
上げ面と対向する面との間に作動不感帯空間を保
持して前記軸手段の下降を停止させるストツパ手
段とを具備したことを特徴とするウエーハ押上げ
装置。
1 A vertically movable shaft means consisting of a shaft provided with a table on which a wafer is placed and a guide body provided on the shaft with a guide hole formed in the vertical direction from the bottom, and the shaft means lowered by elastic force. a driving means for causing
a push-up means that has a push-up surface on its upper end face and is provided in the guide hole so as to be able to rise and fall; A lifting drive means for raising the shaft means, a pushing-up surface of the pushing-up means that has stopped descending by the lifting-driving means, and a pushing-up surface of the guide hole of the guide body that is lowered by the driving means, facing the pushing-up surface. A wafer lifting device comprising: a stopper means for stopping the descent of the shaft means by maintaining an actuation dead zone space between the shaft means and the surface.
JP57061062A 1982-04-14 1982-04-14 Wafer push-up device Granted JPS58178533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57061062A JPS58178533A (en) 1982-04-14 1982-04-14 Wafer push-up device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57061062A JPS58178533A (en) 1982-04-14 1982-04-14 Wafer push-up device

Publications (2)

Publication Number Publication Date
JPS58178533A JPS58178533A (en) 1983-10-19
JPS6238854B2 true JPS6238854B2 (en) 1987-08-20

Family

ID=13160299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57061062A Granted JPS58178533A (en) 1982-04-14 1982-04-14 Wafer push-up device

Country Status (1)

Country Link
JP (1) JPS58178533A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH054282Y2 (en) * 1984-12-04 1993-02-02
JPS63308337A (en) * 1987-06-10 1988-12-15 Teru Kyushu Kk Spinner
JP5306065B2 (en) * 2009-06-04 2013-10-02 株式会社荏原製作所 Dressing apparatus and dressing method
CN110246783B (en) * 2019-06-10 2021-06-15 宁波润华全芯微电子设备有限公司 A degumming machine clamping spindle

Also Published As

Publication number Publication date
JPS58178533A (en) 1983-10-19

Similar Documents

Publication Publication Date Title
TWI390658B (en) Substrate lifting device and substrate processing device
CN102203930B (en) Tactile wafer lifter and methods for operating the same
CN107591356A (en) Wafer mounting apparatus and its application method
JPS6238854B2 (en)
CN115954317B (en) A multi-stage lifting structure and crystal bonding equipment
CN115083965A (en) Process chamber of semiconductor equipment
JP3132496B2 (en) Die bonding equipment
US12243767B2 (en) Substrate support assembly and substrate processing apparatus
JP3326124B2 (en) Adsorption system and adsorption device used for it
JPH0666031U (en) Wafer lifting device
WO2022123645A1 (en) Pickup device for semiconductor die
CN114649254A (en) Manipulator for conveying workpiece
JP3986018B2 (en) Suction device with suction pad
JPH04310331A (en) Nut liftup device
KR100530756B1 (en) Press for minute shape of lead frame
JPH01166836A (en) Mold work holding structure
JP2002187619A (en) Non-electric automatic picking device
KR900007415Y1 (en) Production emit apparatus for press mold
KR100935754B1 (en) Wafer Chuck in Process Chamber
JPS62263899A (en) Die set for powder molding press
JPH0737318Y2 (en) Wafer holding mechanism for single wafer processing equipment
KR20230143468A (en) Die ejector and method of control the same
KR20000073431A (en) Wafer lifting apparatus of vacuum chamber
JPH0527231Y2 (en)
JPH11265927A (en) Chip push-up device