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JPS6240814B2 - - Google Patents
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JPS6240814B2 - - Google Patents

Info

Publication number
JPS6240814B2
JPS6240814B2 JP55139842A JP13984280A JPS6240814B2 JP S6240814 B2 JPS6240814 B2 JP S6240814B2 JP 55139842 A JP55139842 A JP 55139842A JP 13984280 A JP13984280 A JP 13984280A JP S6240814 B2 JPS6240814 B2 JP S6240814B2
Authority
JP
Japan
Prior art keywords
lens
electron
sample
generation circuit
signal generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55139842A
Other languages
Japanese (ja)
Other versions
JPS5765656A (en
Inventor
Hiroyoshi Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55139842A priority Critical patent/JPS5765656A/en
Publication of JPS5765656A publication Critical patent/JPS5765656A/en
Publication of JPS6240814B2 publication Critical patent/JPS6240814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Description

【発明の詳細な説明】 本発明は電子線装置の制限視野回折像装置の改
良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a selected area diffraction imaging device for an electron beam device.

第1図は従来の制限視野回折像装置のブロツク
図である。電子銃1より発生した電子ビームは水
平偏向レンズ2、垂直偏向レンズ3によつて偏向
されるが、電子レンズ4によつて反対方向に偏向
されて試料5上の一点を照射する。この場合に偏
向レンズ2,3の位置を電子レンズ4の物点位置
とし、試料5上の一点を像点の関係になるように
設定すれば、偏向レンズ2,3によつて如何なる
方向に電子ビームを偏向させても試料5上の同一
点を電子ビームが照射し、いわゆる角度走査させ
ることができる。
FIG. 1 is a block diagram of a conventional selected area diffraction imager. The electron beam generated by the electron gun 1 is deflected by a horizontal deflection lens 2 and a vertical deflection lens 3, and is deflected in the opposite direction by an electron lens 4 to irradiate a point on a sample 5. In this case, if the positions of the deflection lenses 2 and 3 are set as the object point positions of the electron lens 4, and one point on the sample 5 is set as the image point, the electrons can be directed in any direction by the deflection lenses 2 and 3. Even if the beam is deflected, the same point on the sample 5 can be irradiated with the electron beam, allowing so-called angular scanning.

このようにして試料5から発生した二次電子等
の信号は検出器6によつて検知されて陰極線管7
のグリツドに輝度変調信号として与えられる。一
方、水平偏向レンズ2と垂直偏向レンズ3に加え
る偏向電流は水平偏向信号発生回路11および垂
直偏向信号発生回路12の出力を増幅器8,9で
増幅している。また、水平偏向信号発生回路11
および垂直偏向信号発生回路12の出力は補正信
号発生回路14に供給して補正信号を出力させ、
これを可変抵抗器16で調節して加算器13にお
いて直流信号発生回路15の出力に加算してい
る。この加算器13の出力は増幅器10で増幅し
て電子レンズ4に供給している。
Signals such as secondary electrons generated from the sample 5 in this way are detected by the detector 6 and the cathode ray tube 7
grid as a brightness modulation signal. On the other hand, the outputs of the horizontal deflection signal generation circuit 11 and the vertical deflection signal generation circuit 12 are amplified by amplifiers 8 and 9 to generate deflection currents applied to the horizontal deflection lens 2 and the vertical deflection lens 3. In addition, the horizontal deflection signal generation circuit 11
and the output of the vertical deflection signal generation circuit 12 is supplied to a correction signal generation circuit 14 to output a correction signal,
This is adjusted by a variable resistor 16 and added to the output of the DC signal generation circuit 15 by an adder 13. The output of this adder 13 is amplified by an amplifier 10 and supplied to the electron lens 4.

このように構成された従来の制限視野回折像装
置においては、補正信号発生回路14の出力信号
値を可変抵抗器16により手動で調整していた。
即ち、前記の角度走査条件を満足するように、か
つ、電子ビームの偏向角の大きさに関連する収差
を補正することを手動により試行錯誤的に修正し
ていたので、長時間を要していた。更に、試料5
を交換するごとに電子レンズ4の焦点距離を変化
させるために電流を変化させる必要があり、調整
段階で多大の時間を要して実験能率が低下すると
いう欠点をもつていた。
In the conventional selected area diffraction imager configured as described above, the output signal value of the correction signal generation circuit 14 was manually adjusted using the variable resistor 16.
In other words, it took a long time to manually correct the aberrations related to the deflection angle of the electron beam in order to satisfy the above-mentioned angle scanning conditions and to correct the aberrations related to the magnitude of the deflection angle of the electron beam. Ta. Furthermore, sample 5
It is necessary to change the current in order to change the focal length of the electron lens 4 each time the electron lens 4 is replaced, which has the drawback of requiring a large amount of time in the adjustment stage and reducing experimental efficiency.

本発明は調整が容易で高性能な制限視野回折像
装置を提供することを目的とし、その特徴とする
ところは、電子レンズに流す直流電流の大きさに
よつて偏向レンズに流す電流に同期した補正電流
の値を設定し、この補正電流を電子レンズに流す
電流に重畳させることによつて制限視野回折像を
得るごとく構成したことにある。
The purpose of the present invention is to provide a high-performance selected area diffraction imager that is easy to adjust. The structure is such that a selected area diffraction image is obtained by setting the value of the correction current and superimposing this correction current on the current flowing through the electron lens.

第2図は電子レンズの結像関係を説明する図で
ある。電子線を角度走査させるためには上記のご
とく次の条件が成立していることが必要である。
FIG. 2 is a diagram illustrating the imaging relationship of the electron lens. In order to angularly scan the electron beam, the following conditions must be met as described above.

a-1+b-1=f-1 ……(1) 但し、 aは電子レンズ4と水平偏向レンズ2および垂
直偏向レンズ3との間隔 bは電子レンズ4と試料5の表面との間隔 fは電子レンズ4の焦点距離 とする。また、電子レンズ4による球面収差ds
は偏向角αの3乗に比例する。
a -1 +b -1 = f -1 ...(1) However, a is the distance between the electron lens 4 and the horizontal deflection lens 2 and vertical deflection lens 3 b is the distance between the electron lens 4 and the surface of the sample 5 f is Let it be the focal length of the electronic lens 4. Also, the spherical aberration ds due to the electron lens 4
is proportional to the cube of the deflection angle α.

ds=Kfα ……(2) 但し、Kは係数である。即ち、破線で示す近軸
電子線を試料5の表面で光軸と交わらせるように
すると、電子レンズ4の周辺部を通つた電子線は
試料5の表面よりも手前のP点で光軸と交わり、
試料5の表面では光軸からdsだけ離れた位置に
到達する。このdsを球面収差と呼んでおり、電
子レンズ4の電子線が通過する光軸よりの高さを
γとすると、球面収差dsはγに比例し、近似
的にはαに比例している。
ds= Kfα3 ...(2) However, K is a coefficient. That is, if the paraxial electron beam shown by the broken line is made to intersect with the optical axis on the surface of the sample 5, the electron beam passing through the periphery of the electron lens 4 will intersect with the optical axis at a point P in front of the surface of the sample 5. fellowship,
On the surface of sample 5, it reaches a position ds away from the optical axis. This ds is called spherical aberration, and if the height of the electron lens 4 from the optical axis through which the electron beam passes is γ, then the spherical aberration ds is proportional to γ 3 , approximately proportional to α 3 . There is.

物点Oと試料5の表面との距離が一定である場
合に球面収差dsを除去するには、ds=Oとなる
ように電子レンズ4の焦点距離fを調節すればよ
い。そのためのΔfを求めると、 Δf=f/bΔb ……(3) Δb≒ds/α=Csα=Cs(γ/b)であるので
、 (3)式は、 Δf=(fCs/b)γ ……(4) 即ち(4)式を満足するようにfを調節すればよい。
いま、レンズ電流をIとすればΔfは近似的にI
に比例するので、(4)式は次のように表わされる。
In order to remove the spherical aberration ds when the distance between the object point O and the surface of the sample 5 is constant, the focal length f of the electron lens 4 may be adjusted so that ds=O. Calculating Δf for this, Δf=f 2 /b 2 Δb...(3) Δb≒ds/α=Csα 2 =Cs(γ/b) 2 , so equation (3) becomes Δf=(f 2 Cs/b 4 ) γ 2 ...(4) That is, f may be adjusted so as to satisfy equation (4).
Now, if the lens current is I, Δf is approximately I
Since it is proportional to , equation (4) can be expressed as follows.

I∝γ ……(5) また、水平偏向電流をIh、垂直偏向電流をIv
とすれば I∝Ih +Iv ……(6) 即ち、偏向電流の2乗に比例して電子レンズ4の
レンズ電流を制御すれば、球面収差を補正して試
料5の面上の一点を角度走査することができる。
I∝γ 2 ...(5) Also, the horizontal deflection current is I h and the vertical deflection current is I v
Then, I∝I h 2 + I v 2 ...(6) That is, if the lens current of the electron lens 4 is controlled in proportion to the square of the deflection current, the spherical aberration can be corrected and the One point can be angularly scanned.

第3図は本発明の一実施例である制限視野回折
像装置のブロツク図で、第1図と同じ部分には同
一符号を付してある。この場合は可変抵抗器16
の代りにスイツチ18を設置してあり、直流信号
発生回路15の信号を補正信号発生回路17に出
力させている。
FIG. 3 is a block diagram of a selected area diffraction imager according to an embodiment of the present invention, in which the same parts as in FIG. 1 are given the same reference numerals. In this case, variable resistor 16
A switch 18 is installed in place of the switch 18 to output the signal from the DC signal generation circuit 15 to the correction signal generation circuit 17.

第4図は第3図の補正信号発生回路17の内容
を説明する図である。第3図の水平偏向信号発生
回路11の出力xは2乗器19で2乗されて加算
器21に送られる。一方、垂直偏向信号発生回路
11の出力yは2乗器20で2乗されて加算器2
1に送られる。加算器21ではx2+y2の値を求め
て乗算器22に送り、直流信号発生回路15から
の直流信号に比例する比例定数出力kを乗算して
加算器13に出力している。以上のことは(6)式を
実行していることになるので、この加算器13の
出力を増幅して電子レンズ4に流す電流とすれば
自動的に球面収差が除去され、偏向角αの如何に
拘わらず試料5上の一点を正確に角度走査するこ
とができる。
FIG. 4 is a diagram illustrating the contents of the correction signal generation circuit 17 of FIG. 3. The output x of the horizontal deflection signal generation circuit 11 in FIG. 3 is squared by a squarer 19 and sent to an adder 21. On the other hand, the output y of the vertical deflection signal generation circuit 11 is squared by a squarer 20 and is then squared by an adder 2.
Sent to 1. The adder 21 calculates the value of x 2 +y 2 and sends it to the multiplier 22 , which multiplies the DC signal from the DC signal generation circuit 15 by a proportionality constant output k proportional to it and outputs it to the adder 13 . The above is equivalent to executing equation (6), so if the output of the adder 13 is amplified and used as a current to flow through the electron lens 4, spherical aberration is automatically removed and the deflection angle α is One point on the sample 5 can be accurately angularly scanned regardless of the angle.

また、電子レンズ4に流す直流電流に比例した
補正電流はスイツチ18を介して加算器13に重
畳させている。このようにすれば試料5の表面位
置の変化(試料5を交換した時は必らず生ずると
見られる)するごとに電子レンズ4に加える補正
電流を調節する操作が不要となり、角度走査の操
作が極めて簡単となる。したがつて、補正信号発
生回路17と加算器13との間には可変抵抗器1
6は不要となり、オン−オフスイツチ18でよい
ことになる。このスイツチ18は上記の補正を行
つた場合と補正しない場合の制限視野回折像を陰
極線管7上で瞬時に切換えて観察することが可能
となるが、このことは試料5の観察領域と回折像
との対応が容易になるという利点を生じている。
Further, a correction current proportional to the direct current flowing through the electronic lens 4 is superimposed on the adder 13 via a switch 18. In this way, it becomes unnecessary to adjust the correction current applied to the electron lens 4 every time the surface position of the sample 5 changes (which seems to always occur when the sample 5 is replaced), and the angle scanning operation becomes unnecessary. becomes extremely simple. Therefore, the variable resistor 1 is connected between the correction signal generation circuit 17 and the adder 13.
6 is no longer necessary, and an on-off switch 18 is sufficient. This switch 18 makes it possible to instantly switch and observe the selected area diffraction image with and without the above correction on the cathode ray tube 7. This has the advantage of making it easier to deal with

本実施例の制限視野回折像装置は、直流信号発
生回路15の比例定数出力を補正信号発生回路1
7内で乗算して加算器13に直接出力するように
構成することによつて、電子レンズ4に流す直流
信号を変化させたときでも補正信号の調整は不要
となり、観察能率を大幅に向上させることができ
るという効果が得られる。
In the selected area diffraction imager of this embodiment, the proportional constant output of the DC signal generation circuit 15 is corrected by the correction signal generation circuit 1.
By configuring the multiplier in 7 and directly outputting it to the adder 13, there is no need to adjust the correction signal even when the DC signal fed to the electron lens 4 is changed, greatly improving observation efficiency. You can get the effect that you can.

上記実施例においては、補正電流を電子レンズ
4に流したが、この電子レンズ4と等価な補助レ
ンズを設けてこれに補正電流を流しても同様な効
果が得られる。したがつて、特許請求の範囲にお
ける対物レンズとはこの補助レンズをも含むもの
と理解されたい。また、第4図に示すように乗算
器22を用いて直流信号に比例した補正信号を発
生させているが、直流信号と補正信号の大きさを
変化させる可変抵抗器を連ね、連動可変抵抗器と
して用いても同等の作用効果が得られる。この場
合の電気回路は更に簡略化させるという利点があ
る。
In the above embodiment, the correction current is passed through the electron lens 4, but the same effect can be obtained by providing an auxiliary lens equivalent to the electron lens 4 and passing the correction current through it. Therefore, the objective lens in the claims should be understood to include this auxiliary lens. Further, as shown in FIG. 4, a multiplier 22 is used to generate a correction signal proportional to the DC signal, but variable resistors that change the magnitude of the DC signal and the correction signal are connected in series, and an interlocking variable resistor is used. The same effect can be obtained even if it is used as This has the advantage that the electrical circuit is further simplified.

本発明の制限視野回折像装置は、簡単な操作で
高性能な制限視野回折像が得られるという効果を
もつている。
The selected area diffraction image device of the present invention has the advantage that a high performance selected area diffraction image can be obtained with simple operation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の制限視野回折像装置のブロツク
図、第2図は電子レンズの結像関係の説明図、第
3図は本発明の一実施例である制限視野回折像装
置のブロツク図、第4図は第3図の補正信号発生
回路の内容を説明する図である。 1……電子銃、2……水平偏向レンズ、3……
垂直偏向レンズ、4……電子レンズ、5……試
料、6……検出器、7……陰極線管、8,9,1
0……増幅器、11……水平偏向信号発生回路、
12……垂直偏向信号発生回路、13,21……
加算器、14,17……補正信号発生回路、15
……直流信号発生回路、18……スイツチ、1
9,20……2乗器、22……乗算器。
Fig. 1 is a block diagram of a conventional selected area diffraction imager, Fig. 2 is an explanatory diagram of the imaging relationship of an electron lens, and Fig. 3 is a block diagram of a selected area diffraction imager which is an embodiment of the present invention. FIG. 4 is a diagram illustrating the contents of the correction signal generation circuit of FIG. 3. 1...Electron gun, 2...Horizontal deflection lens, 3...
Vertical deflection lens, 4...electron lens, 5...sample, 6...detector, 7...cathode ray tube, 8,9,1
0...Amplifier, 11...Horizontal deflection signal generation circuit,
12... Vertical deflection signal generation circuit, 13, 21...
Adder, 14, 17... Correction signal generation circuit, 15
...DC signal generation circuit, 18...Switch, 1
9, 20... squarer, 22... multiplier.

Claims (1)

【特許請求の範囲】[Claims] 1 電子銃から発生した電子ビームを偏向レンズ
と電子レンズとで試料の同一点を中心として角度
走査すると共に前記電子レンズに前記偏向レンズ
に流す電流に同期した球面収差補正信号を流し、
前記試料からの信号を検出して陰極線管に表示す
る制限視野回折像装置において、前記球面収差補
正信号の比例定数を、前記対物レンズに流す電流
を変更したとき自動的にそれに比例して変更する
ように構成されていることを特徴とする制限視野
回折像装置。
1. An electron beam generated from an electron gun is angularly scanned by a deflection lens and an electron lens around the same point on the sample, and a spherical aberration correction signal is sent to the electron lens in synchronization with the current flowing through the deflection lens.
In the selected area diffraction imager that detects the signal from the sample and displays it on a cathode ray tube, the proportionality constant of the spherical aberration correction signal is automatically changed in proportion to the current flowing through the objective lens. A selected area diffraction imaging device characterized in that it is configured as follows.
JP55139842A 1980-10-08 1980-10-08 Limited view diffraction image device Granted JPS5765656A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55139842A JPS5765656A (en) 1980-10-08 1980-10-08 Limited view diffraction image device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55139842A JPS5765656A (en) 1980-10-08 1980-10-08 Limited view diffraction image device

Publications (2)

Publication Number Publication Date
JPS5765656A JPS5765656A (en) 1982-04-21
JPS6240814B2 true JPS6240814B2 (en) 1987-08-31

Family

ID=15254777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55139842A Granted JPS5765656A (en) 1980-10-08 1980-10-08 Limited view diffraction image device

Country Status (1)

Country Link
JP (1) JPS5765656A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63182516U (en) * 1987-05-19 1988-11-24

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6050850A (en) * 1983-08-31 1985-03-20 Jeol Ltd Scanning electron microscope
JP2008112748A (en) * 2008-02-04 2008-05-15 Hitachi Ltd Scanning charged particle microscope and astigmatism correction method for scanning charged particle microscope

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5945173A (en) * 1982-09-08 1984-03-13 Victor Co Of Japan Ltd Thermotransfer type color printer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63182516U (en) * 1987-05-19 1988-11-24

Also Published As

Publication number Publication date
JPS5765656A (en) 1982-04-21

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