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JPS6241387B2 - - Google Patents
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JPS6241387B2 - - Google Patents

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Publication number
JPS6241387B2
JPS6241387B2 JP634382A JP634382A JPS6241387B2 JP S6241387 B2 JPS6241387 B2 JP S6241387B2 JP 634382 A JP634382 A JP 634382A JP 634382 A JP634382 A JP 634382A JP S6241387 B2 JPS6241387 B2 JP S6241387B2
Authority
JP
Japan
Prior art keywords
waveguide
cut
main
heating chamber
sub
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP634382A
Other languages
Japanese (ja)
Other versions
JPS58123690A (en
Inventor
Shigeru Komai
Yoshio Yasuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP634382A priority Critical patent/JPS58123690A/en
Publication of JPS58123690A publication Critical patent/JPS58123690A/en
Publication of JPS6241387B2 publication Critical patent/JPS6241387B2/ja
Granted legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)

Description

【発明の詳細な説明】 本発明は高周波加熱装置に関する。[Detailed description of the invention] The present invention relates to a high frequency heating device.

近年、庫内の有効利用の観点からスタラ、ター
ンテーブルを取除き、そのかわりに複数の給電口
よりマイクロ波を供給して加熱ムラが生じること
を防ぐ高周波加熱装置が提案されている。
In recent years, high-frequency heating devices have been proposed that eliminate the stirrer and turntable and instead supply microwaves from a plurality of power ports to prevent uneven heating from occurring in order to effectively utilize the inside of the refrigerator.

第1図及び第2図は既に提案されたこの種装置
を示し、1は主給電口2及び副給電口3を備えた
加熱室、4は主給電口3を介して加熱室1と連通
する主導波管、5は該主導波管の一側面に穿設さ
れた2つの結合孔6,6と副給電口3とを連結す
る副導波管であり、上記結合孔6,6は距離lだ
け離間して配されている。7は主導波管4の一端
に配されたマグネトロンである。
1 and 2 show a device of this kind that has already been proposed, in which 1 is a heating chamber equipped with a main power supply port 2 and a sub power supply port 3, and 4 is in communication with the heating chamber 1 via the main power supply port 3. The main waveguide 5 is a sub waveguide that connects the sub power feeding port 3 with two coupling holes 6, 6 bored on one side of the main waveguide, and the coupling holes 6, 6 are separated by a distance l. They are placed at a distance from each other. 7 is a magnetron arranged at one end of the main wave tube 4.

斯る装置では周知の方向性結合器の理論に基づ
いて上記結合孔6,6の大きさ及び距離lを適当
に選ぶことにより主給電口2と副給電口3の各々
より加熱室1にマイクロ波を供給することが可能
である。
In such a device, by appropriately selecting the size and distance l of the coupling holes 6, 6 based on the theory of a well-known directional coupler, a micrometer can be connected to the heating chamber 1 from each of the main power supply port 2 and the sub power supply port 3. It is possible to supply waves.

しかし乍ら、斯る装置では加熱室1内の負荷
(被加熱物)量が一定しているならば各給電口よ
り夫々マイクロ波を供給することが可能である
が、通常このような装置の負荷量は一定していな
いので上記各給電口より同時に給電されない場合
も生じ、また加熱中のマグネトロン7から見たイ
ンピーダンスは一定であるので各給電口から夫々
供給されるマイクロ波量は一定となり、従つて複
数口給電といえども加熱室1内に定在波がたつて
しまう。
However, with such a device, if the amount of load (subject to be heated) in the heating chamber 1 is constant, it is possible to supply microwaves from each power supply port, but normally with such a device, microwaves can be supplied from each power supply port. Since the amount of load is not constant, there may be cases where power is not supplied from each of the above-mentioned power supply ports at the same time, and since the impedance seen from the magnetron 7 during heating is constant, the amount of microwaves supplied from each power supply port is constant, Therefore, standing waves are generated within the heating chamber 1 even when power is supplied from multiple ports.

第3図及び第4図は斯る点に鑑みて既に提案さ
れている高周波加熱装置を示し、その特徴はフエ
ライト型サーキユレータを用いて複数の給電口に
強制的にマイクロ波を供給することである。
Figures 3 and 4 show a high-frequency heating device that has already been proposed in view of this point, and its feature is that it uses a ferrite-type circulator to forcibly supply microwaves to multiple power ports. .

図中、11は主給電口12及び副給電口13を
備えた加熱室、14は該加熱室と主給電口12を
介して連通する主導波管であり、該主導波管は一
側面に結合孔15が穿設されている。16は結合
孔15と副給電口13とを連結する副導波管、1
7は主導波管14の結合孔15付近に配されたフ
エライト型サーキユレータであり、該サーキユレ
ータは主導波管14の結合孔15付近に相対向す
るように設けられたフエライト素子18,18と
斯るフエライト素子18,18と夫々相対向する
ように設けられた磁界発生装置(例えば電磁石
等)19,19とからなる。20は主導波管14
の一端に設けられたマグネトロンである。
In the figure, 11 is a heating chamber equipped with a main power feed port 12 and a sub power feed port 13, 14 is a main wave pipe that communicates with the heating chamber via the main power feed port 12, and the main wave pipe is coupled to one side. A hole 15 is bored. 16 is a sub-waveguide connecting the coupling hole 15 and the sub-power feeding port 13;
Reference numeral 7 denotes a ferrite type circulator disposed near the coupling hole 15 of the main wave pipe 14, and the circulator is connected to ferrite elements 18, 18 disposed near the coupling hole 15 of the main wave pipe 14 so as to face each other. It consists of ferrite elements 18, 18 and magnetic field generating devices (for example, electromagnets, etc.) 19, 19 provided to face each other, respectively. 20 is the main wave tube 14
It is a magnetron installed at one end of the.

斯る装置では上記サーキユレータ17によりフ
エライト素子18,18の対向方向に磁界が与え
られる。すなわち、フエライト素子18,18に
上記磁界が与えられない場合は、マグネトロン2
0からのマイクロ波は主給電口12と副給電口1
3とから加熱室11内に供給され、またフエライ
ト素子18,18に上記磁界が与えられた場合
は、マグネトロン20からのマイクロ波は上記磁
界に偏向されて副給電口13からのみ加熱室11
内に供給される。
In such a device, a magnetic field is applied by the circulator 17 in the direction in which the ferrite elements 18, 18 face each other. That is, when the above magnetic field is not applied to the ferrite elements 18, 18, the magnetron 2
The microwave from 0 is sent to the main power supply port 12 and the sub power supply port 1.
3 into the heating chamber 11, and when the magnetic field is applied to the ferrite elements 18, 18, the microwaves from the magnetron 20 are deflected by the magnetic field and are supplied to the heating chamber 11 only from the sub-power feeding port 13.
supplied within.

従つて、上記サーキユレータ17をオン−オフ
することにより、上述したマイクロ波給電を交互
に行え、これにより加熱室11内に均一な電界分
布が得られる。
Therefore, by turning on and off the circulator 17, the microwave power feeding described above can be performed alternately, thereby obtaining a uniform electric field distribution within the heating chamber 11.

ところが、このような均一な電界を得るために
は上記主給電口12及び副給電口13を所定の位
置、つまりサーキユレータ17がオンされた際の
給電とオフ時の給電との夫々において加熱室11
内にたつて定在波モードが一致しないようにする
位置に穿設しなければならない。従つて給電口の
穿設位置が上記の理由で固定されるため、例えば
加熱室天面の略中央に配置しなければならない赤
外線センサ等の配置場所と上記給電口の穿設位置
とが重なつてしまうこととなるといつた問題が生
じる。
However, in order to obtain such a uniform electric field, the main power supply port 12 and the sub power supply port 13 must be placed at predetermined positions, that is, when the circulator 17 is turned on and when the circulator 17 is turned off, the heating chamber 11 is
The holes must be drilled in a position that prevents standing wave modes from coinciding with each other. Therefore, since the drilling position of the power supply port is fixed for the above-mentioned reason, the location of the infrared sensor, etc., which must be placed approximately in the center of the top surface of the heating chamber, overlaps with the drilling position of the power supply port. A problem arises when this happens.

また加熱室11内の負荷量により定在波モード
は異なるので、負荷量に関係なく常に上記両定在
波モードが一致しないような位置に各給電口を設
けることは非常に難しい。更に上記サーキユレー
タ17は高価であるためコスト高となるという問
題もあり実用的ではない。
Furthermore, since the standing wave mode differs depending on the amount of load in the heating chamber 11, it is very difficult to provide each power feed port at a position where the two standing wave modes do not always coincide regardless of the amount of load. Furthermore, since the circulator 17 is expensive, it is not practical due to the problem of high cost.

本発明は上述した諸問題点に鑑みてなされたも
ので、複数の給電口より給電される各マイクロ波
量をアナログ的に変化させて給電することにより
加熱室の電界を均一にする高周波加熱装置を提供
せんとするものである。以下実施例に基づき本発
明を説明する。
The present invention has been made in view of the above-mentioned problems, and is a high-frequency heating device that uniformizes the electric field in a heating chamber by changing the amount of microwaves fed from a plurality of power ports in an analog manner. We aim to provide the following. The present invention will be explained below based on Examples.

第5図及び第6図は本発明の一実施例を示し、
21は主給電口22及び副給電口23が穿設され
た加熱室、24は主給電口22を介して斯る加熱
室21と連通する通過形のTE10モード主導波
管、25は該主導波管24の一端に配された高周
波供給手段としてのマグネトロン、26は該マグ
ネトロン25から発したマイクロ波に対してカツ
トオフとなるカツトオフ導波管であり、該カツト
オフ導波管の一端は主導波管24の一側面に穿設
された結合孔27を介して主導波管24と連通
し、他端は副給電口23を介して加熱室21と連
通している。28,28……は上記カツトオフ導
波管26内に配された誘電体共振器であり、該誘
電体共振器のうち最も結合孔27に近い誘電体共
振器28Aは回動手段としてのモータ29により
回転面が加熱室21天面と平行となるように回動
される。
5 and 6 show an embodiment of the present invention,
21 is a heating chamber in which a main power feed port 22 and a sub power feed port 23 are formed; 24 is a pass-through TE10 mode main wave tube communicating with the heating chamber 21 via the main power feed port 22; and 25 is the main wave tube. The magnetron 26 is a cut-off waveguide that serves as a cut-off for the microwaves emitted from the magnetron 25, and one end of the cut-off waveguide is connected to the main waveguide 24. It communicates with the main waveguide 24 through a coupling hole 27 bored in one side, and the other end communicates with the heating chamber 21 through a sub-power feed port 23 . 28, 28... are dielectric resonators disposed within the cut-off waveguide 26, and among the dielectric resonators, the dielectric resonator 28A closest to the coupling hole 27 is connected to the motor 29 as a rotating means. The rotating surface is rotated so that it becomes parallel to the top surface of the heating chamber 21.

次に第7図を用いて本実施例の動作原理を説明
する。
Next, the operating principle of this embodiment will be explained using FIG. 7.

第7図において、31は例えば周波数fのマイ
クロ波を伝播するTE10モードの通過形の第1導
波管であり、該導波管は第5図における主導波管
24に相当する。32は第6図の結合孔27に相
当する連通孔33を介して上記第1導波管31と
連通する第2導波管であり、該第2導波管32は
周波数fのマイクロ波をカツトオフするもので第
5図のカツトオフ導波管26に相当する。34,
34……は第2導波管32内に配された誘電体共
振器であり、また最も第1導波管31側に配され
た誘電体共振器34Aは紙面と平行に回転駆動さ
れる。
In FIG. 7, reference numeral 31 denotes a TE10 mode pass-through first waveguide that propagates, for example, a microwave of frequency f, and this waveguide corresponds to the main waveguide 24 in FIG. 32 is a second waveguide that communicates with the first waveguide 31 through a communication hole 33 corresponding to the coupling hole 27 in FIG. It is cut-off and corresponds to the cut-off waveguide 26 in FIG. 34,
34... are dielectric resonators disposed within the second waveguide 32, and the dielectric resonator 34A disposed closest to the first waveguide 31 is driven to rotate parallel to the plane of the paper.

通常、上記第2導波管32は図中矢印35方向
に進行する周波数fのマイクロ波を伝播しない。
しかし第1導波管31との結合付近においてリア
クテイブでかつ指数関数的に減衰するエバネツセ
ントエネルギが存在する。尚図中上記マイクロ波
の磁力線36は点線で示してある。
Normally, the second waveguide 32 does not propagate microwaves of frequency f traveling in the direction of arrow 35 in the figure.
However, there is evanescent energy that is reactive and decays exponentially near the coupling with the first waveguide 31. In the figure, the magnetic lines of force 36 of the microwave are indicated by dotted lines.

ところが第7図の如く第2導波管32内に誘電
体共振器34を適当に載置すれば上記エバネツセ
ントエネルギーの存在により連通孔33付近のマ
イクロ波の磁力線36が誘電体共振器34Aと結
合する。このとき結合するエネルギー強度は連通
孔33と該連通孔33に最も近い誘電体共振器3
4Aとの距離tにより決まり、t=0のとき最大
となる。また、上記結合強度は誘電体共振器34
Aとマイクロ波との結合方向によつても変化す
る。つまり第8図に示した高さa、長さb、幅c
の誘電体共振器40がa×c面に垂直な方向に進
むマイクロ波Aと最も強く結合する時、他の方向
に進むマイクロ波との結合は上記結合力より弱い
かもしくは全く結合しない結果となる。
However, if the dielectric resonator 34 is appropriately placed inside the second waveguide 32 as shown in FIG. combine with At this time, the energy intensity coupled is between the communication hole 33 and the dielectric resonator 3 closest to the communication hole 33.
It is determined by the distance t from 4A, and is maximum when t=0. Furthermore, the above coupling strength is determined by the dielectric resonator 34.
It also changes depending on the coupling direction of A and the microwave. In other words, the height a, length b, and width c shown in Figure 8
When the dielectric resonator 40 of is most strongly coupled with the microwave A traveling in the direction perpendicular to the axc plane, the coupling with the microwave traveling in other directions is weaker than the above coupling force or results in no coupling at all. Become.

従つて第1導波管31に最も近い位置に配され
た誘電体共振器34Aを除く他の共振器34,3
4……を第2導波管32の延在方向に進むマイク
ロ波と最も強く結合するように配すれば、第2導
波管32は帯域通過フイルタとなり誘電体共振器
34Aと結合したマイクロ波を伝播する。また、
連通孔33近傍に位置する誘電体共振器34Aは
回動しているのでその結合量はアナログ的に変化
し、従つて第2導波管32を通過するマイクロ波
量もアナログ的に変化する。
Therefore, other resonators 34 and 3 except for the dielectric resonator 34A disposed closest to the first waveguide 31
4... is arranged so as to be most strongly coupled to the microwave traveling in the extending direction of the second waveguide 32, the second waveguide 32 becomes a band pass filter and the microwave coupled to the dielectric resonator 34A is propagate. Also,
Since the dielectric resonator 34A located near the communication hole 33 is rotating, its coupling amount changes in an analog manner, and therefore the amount of microwaves passing through the second waveguide 32 also changes in an analog manner.

本実施例ではマグネトロン25から発せられる
マイクロ波の周波数が2450MHzであるので、カ
ツトオフ導波管26は斯るマイクロ波をカツトオ
フするように幅Aを2cmとした。また、誘電体共
振器28,28……は比誘電率εr=90のチタン
酸バリウムからなり、結合孔27の近傍に配され
た誘電体共振器28Aは高さa=15mm、長さb=
11.5mm、幅c=6mmでb×c面が上記モータ29
の回転軸に対して垂直となるように装着されてい
る。他の誘電体共振器28,28……はカツトオ
フ導波管の底面に垂直な方向の長さa=7.5mm、
斯る導波管の延在方向の長さb=11.5mm、斯る導
波管の幅方向の長さc=6mmであり、b×c面の
一つの面が斯るカツトオフ導波管26の底面に固
着されている。また誘電体共振器28間の面間最
短距離は各々25mmとした。
In this embodiment, the frequency of the microwave emitted from the magnetron 25 is 2450 MHz, so the cut-off waveguide 26 has a width A of 2 cm so as to cut off the microwave. Further, the dielectric resonators 28, 28, .
11.5mm, width c = 6mm, b x c plane is the above motor 29
It is mounted perpendicular to the axis of rotation. The other dielectric resonators 28, 28... have a length a = 7.5 mm in the direction perpendicular to the bottom surface of the cut-off waveguide.
The length in the extending direction of the waveguide is b = 11.5 mm, the length in the width direction of the waveguide is c = 6 mm, and one of the b x c planes is the cut-off waveguide 26. is fixed to the bottom of the. Further, the shortest distance between the surfaces of the dielectric resonators 28 was set to 25 mm.

従つて、本実施例の高周波加熱装置ではマグネ
トロン25を発振すると共にモータ29を駆動し
誘電体共振器28Aを回転させると、主給電口2
2より加熱室21内にマイクロ波が給電されると
共に誘電体共振器28Aとの結合量により副給電
口33からもマイクロ波が供給される。
Therefore, in the high frequency heating device of this embodiment, when the magnetron 25 is oscillated and the motor 29 is driven to rotate the dielectric resonator 28A, the main power feed port 2
2 into the heating chamber 21, microwaves are also supplied from the sub-power feeding port 33 depending on the amount of coupling with the dielectric resonator 28A.

またこのとき誘電体共振器28Aはモータ29
により回転駆動されているので斯る共振器28A
のマイクロ波結合量はアナログ的に変化し従つて
主給電口22及び副給電口23から供給されるマ
イクロ波量もアナログ的に変化するので加熱室内
のマイクロ波をスタラで撹拌した時と同様に加熱
室内の電界分布は均一となる。
Also, at this time, the dielectric resonator 28A is connected to the motor 29.
Since the resonator 28A is rotationally driven by
The amount of microwave coupling changes in an analog manner, and therefore the amount of microwaves supplied from the main power supply port 22 and the sub power supply port 23 also changes in an analog manner, similar to when the microwaves in the heating chamber are stirred with a stirrer. The electric field distribution within the heating chamber becomes uniform.

第9図は本発明の他の実施例を示し、第1の実
施例との相違点は上記カツトオフ導波管26と副
給電口23との間にTE01モードで通過形の副導
波管31を設けたことである。尚第6図と同一箇
所には同一番号が付されている。
FIG. 9 shows another embodiment of the present invention, and the difference from the first embodiment is that a pass-through auxiliary waveguide 31 is provided between the cut-off waveguide 26 and the auxiliary feed port 23 in the TE01 mode. This is because we have established the following. Note that the same parts as in FIG. 6 are given the same numbers.

斯る装置では、カツトオフ導波管26より副導
波管31に伝播されたマイクロ波は副給電口23
を介して加熱室21に供給されるものであり、第
1の実施例と同様に主給電口22及び副給電口2
3から供給されるマイクロ波量はモータ29(第
9図では図示せず)により回転される誘電体共振
器28Aの回転に伴つてアナログ的に変化するの
で加熱室21内の電界分布は均一になる。
In such a device, the microwave propagated from the cut-off waveguide 26 to the sub-waveguide 31 is transmitted through the sub-feed port 23.
The power is supplied to the heating chamber 21 through the main power supply port 22 and the sub power supply port 2 as in the first embodiment.
Since the amount of microwaves supplied from the heating chamber 21 changes analogously with the rotation of the dielectric resonator 28A rotated by the motor 29 (not shown in FIG. 9), the electric field distribution in the heating chamber 21 is uniform. Become.

上記両実施例装置共に各給電口からのマイクロ
波供給量をアナログ的に変化させて電界を均一に
なすものであるので各給電口を任意の位置に設け
ることが可能である。尚上記両実施例ではカツト
オフ導波管26内に複数の誘電体共振器28を配
したが、例えばカツトオフ導波管26を短くして
モータ29の回転軸に装着された誘電体共振器2
8Aのみとすることも可能である。
In both of the apparatuses of the above-mentioned embodiments, the electric field is made uniform by changing the amount of microwave supplied from each power supply port in an analog manner, so each power supply port can be provided at an arbitrary position. In both of the above embodiments, a plurality of dielectric resonators 28 are disposed within the cut-off waveguide 26, but for example, the cut-off waveguide 26 may be shortened and the dielectric resonator 2 mounted on the rotating shaft of the motor 29 may be used.
It is also possible to use only 8A.

また、本実施例では副給電口を1つとしたが、
これに限るものではなく、上記カツトオフ導波管
を複数設けることにより複数の給電口より同時マ
イクロ波を供給することも可能である。
In addition, in this embodiment, there is one sub-power feeding port, but
The present invention is not limited to this, and by providing a plurality of cut-off waveguides, it is also possible to simultaneously supply microwaves from a plurality of power supply ports.

以上の説明から明らかな如く、本発明の高周波
加熱装置では複数の給電口からのマイクロ波供給
量をアナログ的に可変となすので加熱室内の電界
分布は均一となり、また上記複数の給電口は任意
の位置に設けられるので設計上非常に好都合であ
る。
As is clear from the above explanation, in the high-frequency heating device of the present invention, the amount of microwaves supplied from the plurality of power supply ports is varied in an analog manner, so that the electric field distribution in the heating chamber is uniform, and the number of the plurality of power supply ports is arbitrary. This is very convenient in terms of design.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第4図は従来例を示し、第1、第3図
は側面断面図、第2、第4図は平面断面図、第5
図及び第6図は本発明の一実施例装置を示す側面
断面図及び平面断面図、第7図は本発明の動作原
理を説明するための平面断面図、第8図は誘電体
共振器を示す斜視図、第9図は他の実施例を示す
平面断面図である。 21……加熱室、22……主給電口、23……
副給電口、24……主導波管、26……カツトオ
フ導波管、27……結合孔、28,28……誘電
体共振器、29……モータ(可変手段)、31…
…副導波管。
Figures 1 to 4 show conventional examples, where Figures 1 and 3 are side sectional views, Figures 2 and 4 are plan sectional views, and Figures 5 and 4 are side sectional views.
6 are a side sectional view and a plan sectional view showing an embodiment of the device of the present invention, FIG. 7 is a plan sectional view for explaining the operating principle of the present invention, and FIG. 8 is a dielectric resonator. FIG. 9 is a plan sectional view showing another embodiment. 21...Heating chamber, 22...Main power supply port, 23...
Sub-power feeding port, 24... Main waveguide, 26... Cut-off waveguide, 27... Coupling hole, 28, 28... Dielectric resonator, 29... Motor (variable means), 31...
...Sub waveguide.

Claims (1)

【特許請求の範囲】 1 主給電口及び少なくとも1つの副給電口を備
えた加熱室、該加熱室に主給電口を介してマイク
ロ波を伝播すると共に少なくとも1つの結合孔を
有する主導波管、上記副給電口と上記結合孔とを
連結すると共に上記マイクロ波に対してカツトオ
フとなるカツトオフ導波管、該カツトオフ導波管
内において上記マイクロ波のエバネツセントエネ
ルギと結合可能な位置に配された誘電体共振器、
該誘電体共振器と上記エバネツセントエネルギと
の結合エネルギを可変にする可変手段からなるこ
とを特徴とする高周波加熱装置。 2 主給電口及び少なくとも一つの副給電口を備
えた加熱室、該加熱室に主給電口を介してマイク
ロ波を伝播すると共に少なくとも1つの結合孔を
有する主導波管、上記結合口を介して上記主導波
管と連通すると共に上記マイクロ波に対してカツ
トオフとなるカツトオフ導波管、該カツトオフ導
波管内において上記マイクロ波のエバネツセント
エネルギと結合可能な位置に配された誘電体共振
器、該誘電体共振器と上記エバネツセントエネル
ギとの結合エネルギを可変となす可変手段、上記
カツトオフ導波管と副給電口とを連通する副導波
管からなることを特徴とする高周波加熱装置。
[Claims] 1. A heating chamber equipped with a main power supply port and at least one sub power supply port, a main waveguide that propagates microwaves in the heating chamber through the main power supply port and has at least one coupling hole; a cut-off waveguide that connects the sub-power feeding port and the coupling hole and serves as a cut-off for the microwave; a cut-off waveguide is arranged in the cut-off waveguide at a position capable of coupling with the evanescent energy of the microwave; dielectric resonator,
A high-frequency heating device comprising variable means for varying the coupling energy between the dielectric resonator and the evanescent energy. 2. A heating chamber equipped with a main power feed port and at least one sub power feed port, a main wave pipe that propagates microwaves into the heating chamber through the main power feed port and has at least one coupling hole, and a main wave pipe that propagates microwaves through the main power feed port and has at least one coupling hole. a cut-off waveguide that communicates with the main waveguide and is cut-off to the microwave; a dielectric resonator disposed within the cut-off waveguide at a position capable of coupling with the evanescent energy of the microwave; A high-frequency heating device comprising a variable means for varying the coupling energy between the dielectric resonator and the evanescent energy, and a sub-waveguide communicating the cut-off waveguide and the sub-power feeding port.
JP634382A 1982-01-18 1982-01-18 High frequency heating device Granted JPS58123690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP634382A JPS58123690A (en) 1982-01-18 1982-01-18 High frequency heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP634382A JPS58123690A (en) 1982-01-18 1982-01-18 High frequency heating device

Publications (2)

Publication Number Publication Date
JPS58123690A JPS58123690A (en) 1983-07-22
JPS6241387B2 true JPS6241387B2 (en) 1987-09-02

Family

ID=11635716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP634382A Granted JPS58123690A (en) 1982-01-18 1982-01-18 High frequency heating device

Country Status (1)

Country Link
JP (1) JPS58123690A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4572213B2 (en) * 2007-04-25 2010-11-04 株式会社日立製作所 Microwave irradiation device

Also Published As

Publication number Publication date
JPS58123690A (en) 1983-07-22

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