JPS6242215B2 - - Google Patents
Info
- Publication number
- JPS6242215B2 JPS6242215B2 JP57104248A JP10424882A JPS6242215B2 JP S6242215 B2 JPS6242215 B2 JP S6242215B2 JP 57104248 A JP57104248 A JP 57104248A JP 10424882 A JP10424882 A JP 10424882A JP S6242215 B2 JPS6242215 B2 JP S6242215B2
- Authority
- JP
- Japan
- Prior art keywords
- heating chamber
- heated
- mounting table
- heating
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/6402—Aspects relating to the microwave cavity
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Constitution Of High-Frequency Heating (AREA)
- Electric Ovens (AREA)
Description
【発明の詳細な説明】
本発明は、加熱室内に収容された被加熱物を誘
電加熱する高周波加熱装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a high frequency heating device for dielectrically heating an object to be heated housed in a heating chamber.
従来の例えば高周波加熱装置である電子レンジ
は、加熱室内に供給された高周波の分布特性をよ
くして、被加熱物を均一に加熱するために、加熱
室内にスタラーフアンや反射板を設けたり、ある
いは被加熱物を載せる載置台を回転させたりする
構成となつている。しかしスタラーフアン及び反
射板近傍における被加熱物の誘電加熱は良好であ
るのに対して、スタラーフアンや反射板から離れ
た部分においては加熱むらが生じやすいため、更
に回転する載置台をも設けることが考えられる
が、加熱室内の容積が小さくなつたり、あるいは
本体の外形が必要以上に大きくなるなど、コスト
の面や設置スペースの面からも好ましくない。 Conventional microwave ovens, which are high-frequency heating devices, for example, are equipped with a stirrer fan or a reflector inside the heating chamber in order to improve the distribution characteristics of the high-frequency waves supplied into the heating chamber and uniformly heat the object to be heated. The structure is such that the mounting table on which the object to be heated is placed can be rotated. However, while the dielectric heating of the object to be heated near the stirrer fan and reflector is good, uneven heating tends to occur in areas away from the stirrer fan and reflector, so it may be a good idea to also provide a rotating mounting table. However, this is undesirable from the viewpoint of cost and installation space, as the volume inside the heating chamber becomes smaller or the external shape of the main body becomes larger than necessary.
また加熱室の形状が立方体又は直方体に構成さ
れているため、高周波発生装置から加熱室内へ供
給された高周波の大部分は加熱室内壁で幾度も反
射した後、被加熱物に吸収されるので加熱効率が
悪くなるとともに、反射された高周波の位置によ
つて加熱室内に定在波が生じ、この定在波に応じ
て加熱むらが生じる。 In addition, since the heating chamber has a cubic or rectangular parallelepiped shape, most of the high frequency waves supplied from the high frequency generator into the heating chamber are reflected many times on the walls of the heating chamber and then absorbed by the object to be heated. In addition to deteriorating efficiency, standing waves are generated within the heating chamber depending on the position of the reflected high frequency waves, and uneven heating occurs in response to these standing waves.
このような被加熱物の加熱むらを防ぐために加
熱室を回転楕円体とし、一方の焦点に高周波発生
装置を、他方の焦点に被加熱物を置けば、理論的
に高周波が反射後相互の干渉がなくなり、被加熱
物に効率よく吸収されるが、このような加熱室は
立方体、直方体の加熱室と比べて作成が難かしく
量産ができないため、コスト高になるという不都
合があつた。 In order to prevent uneven heating of the heated object, if the heating chamber is made into a spheroid and a high frequency generator is placed at one focal point and the heated object is placed at the other focal point, theoretically the high frequency waves will interfere with each other after being reflected. However, compared to cubic or rectangular parallelepiped heating chambers, such heating chambers are difficult to create and cannot be mass-produced, resulting in high costs.
また第3図に示すように加熱室後壁から開口部
3側にかけて加熱室上壁12に傾斜を設ければ、
開口部3側の高さlを目安にして被加熱物9を加
熱室2内の載置台7に載せるため、載置台7が回
転した時に被加熱物9が加熱室上壁12のm点に
当り、スムーズに回転させることができなくなる
という欠点があつた。 Further, as shown in FIG. 3, if the heating chamber upper wall 12 is sloped from the rear wall of the heating chamber to the opening 3 side,
Since the object to be heated 9 is placed on the mounting table 7 in the heating chamber 2 using the height l on the side of the opening 3 as a guide, the object to be heated 9 is placed at point m on the upper wall 12 of the heating chamber when the mounting table 7 rotates. There was a drawback that it could not be rotated smoothly if it hit.
本発明は上記従来の欠点を解消するもので、被
加熱物の加熱むらをなくし、加熱室内に被加熱物
の出し入れのしやすい高周波加熱装置を提供する
ことを目的とする。 SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional drawbacks, and aims to provide a high-frequency heating device that eliminates uneven heating of a heated object and that allows the heated object to be easily taken in and out of a heating chamber.
上記目的を達するため、本発明の高周波加熱装
置は、被加熱物を収容する加熱室と、この加熱室
内へ高周波を供給する高周波発生装置と、前記加
熱室内に回転自在に設けられた載置台とを備え前
記加熱室の上壁を、加熱室の後方から開口部に向
つて傾斜を設け、かつ前記載置台の中心部から開
口部間の任意の位置で上方へ折曲する構成とする
ことにより、加熱室内に供給された高周波の分布
特性をよくし、被加熱物の加熱むらをなくすとと
もに、被加熱物が加熱室内に出し入れしやすくな
るという効果を有するものである。 In order to achieve the above object, the high-frequency heating device of the present invention includes a heating chamber that accommodates an object to be heated, a high-frequency generator that supplies high-frequency waves into the heating chamber, and a mounting table rotatably provided within the heating chamber. The upper wall of the heating chamber is inclined from the rear of the heating chamber toward the opening, and is bent upward at any position between the center of the mounting table and the opening. This has the effect of improving the distribution characteristics of the high frequency waves supplied into the heating chamber, eliminating uneven heating of the object to be heated, and making it easier for the object to be heated to be taken in and out of the heating chamber.
以下、本発明の一実施例を第1図、第2図に基
づいて説明する。 An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.
第1図において、1は高周波加熱装置の本体
で、この本体1内に設けられた加熱室2の開口部
3に扉4が開閉自在に設けられている。5は本体
1の前面に設けられた操作部で、この操作部5に
は調理時間を設定するタイマのつまみ6や複数個
の操作スイツチが設けられている。7は加熱室底
壁8の略中央に回転自在に設けられた低誘電体損
失の載置台で、この載置台7に被加熱物9が載置
されている。10は高周波発生装置の一例として
用いたマグネトロンで、このマグネトロン10で
発生した高周波は、導波管11を経て加熱室上壁
12に設けられた給電口13から加熱室2内へ供
給され、被加熱物9を誘電加熱する。この加熱室
上壁12は加熱室2の後方から開口部3側の載置
台7と対向する位置まで若干上方へ傾斜してお
り、載置台7の中心部と端部間の任意の位置で上
方へ折曲し第2図に示す如く開口周縁板14に固
定されている。15は加熱室上壁12の給電口1
3に設けられた封口カバーで、低誘電体損失から
なる材料で構成されている。 In FIG. 1, reference numeral 1 denotes a main body of a high-frequency heating device, and a door 4 is provided in an opening 3 of a heating chamber 2 provided in the main body 1 so as to be openable and closable. Reference numeral 5 denotes an operation section provided on the front surface of the main body 1, and this operation section 5 is provided with a timer knob 6 for setting the cooking time and a plurality of operation switches. Reference numeral 7 denotes a low dielectric loss mounting table which is rotatably provided substantially in the center of the bottom wall 8 of the heating chamber, and the object to be heated 9 is placed on this mounting table 7. Reference numeral 10 denotes a magnetron used as an example of a high-frequency generator. The high-frequency waves generated by this magnetron 10 are supplied into the heating chamber 2 from a power supply port 13 provided on the upper wall 12 of the heating chamber through a waveguide 11, and then The heating object 9 is dielectrically heated. This heating chamber upper wall 12 is inclined slightly upward from the rear of the heating chamber 2 to a position facing the mounting table 7 on the side of the opening 3, and is tilted upward at an arbitrary position between the center and the end of the mounting table 7. It is bent and fixed to the opening peripheral plate 14 as shown in FIG. 15 is the power supply port 1 on the heating chamber upper wall 12
3, which is made of a material with low dielectric loss.
以下、上記構成における動作について説明す
る。まず扉4を開いて被加熱物9を加熱室2内の
載置台7に載せ、扉4を閉じて加熱時間をタイマ
のつまみ6でセツトし、高周波出力の操作釦及び
調理開始釦を押すと、マグネトロン10が動作し
て高周波が加熱室2内へ供給され、載置台7に載
せられた被加熱物9が回転しながら誘電加熱され
る。そしてタイマに設定した時間間が経過する
と、タイマによりマグネトロン10の動作が停止
され、加熱調理が終了する。しかし、この調理過
程において加熱室上壁12を加熱室2後方から開
口部3に向つて若干上方へ傾斜を設け、更に載置
台7の中心部から端部の任意の位置で上方へ折曲
したことにより、載置台7と加熱室上壁12との
距離は、加熱室開口部3側をl、載置台7の中央
部をo、後壁側をmとすれば、l>o>mとな
り、加熱室2内に供給された高周波の反射角度が
各々異なるため、高周波の分布特性を略均一にす
ることができるとともに、被加熱物9が回転され
るため、被加熱物9の加熱むらを防止することが
できる。 The operation of the above configuration will be explained below. First, open the door 4, place the object to be heated 9 on the mounting table 7 inside the heating chamber 2, close the door 4, set the heating time with the timer knob 6, and press the high frequency output operation button and the cooking start button. , the magnetron 10 operates to supply high frequency waves into the heating chamber 2, and the object to be heated 9 placed on the mounting table 7 is dielectrically heated while rotating. Then, when the time set in the timer has elapsed, the timer stops the operation of the magnetron 10, and the heating cooking ends. However, during this cooking process, the upper wall 12 of the heating chamber was slightly inclined upward from the rear of the heating chamber 2 toward the opening 3, and was further bent upward at an arbitrary position from the center to the end of the mounting table 7. Therefore, the distance between the mounting table 7 and the heating chamber upper wall 12 is l>o>m, where l is on the heating chamber opening 3 side, o is the center of the mounting table 7, and m is on the rear wall side. Since the reflection angles of the high-frequency waves supplied into the heating chamber 2 are different, the distribution characteristics of the high-frequency waves can be made approximately uniform, and since the object to be heated 9 is rotated, uneven heating of the object to be heated 9 can be prevented. It can be prevented.
また載置台7の中心部と端部間に対向して加熱
室上壁12を上方へ折曲したことにより、加熱室
2内に設けられた載置台7の周縁部が突出してい
ても、載置台7に被加熱物9を載せたり、取り出
したりしやすくなるとともに、載置台7に載せた
被加熱物9をスムーズに回転させることができる
という効果を有する。 Furthermore, by bending the upper wall 12 of the heating chamber upward so as to face the center and end portions of the mounting table 7, even if the peripheral edge of the mounting table 7 provided in the heating chamber 2 protrudes, the This has the effect that the object to be heated 9 can be easily placed on and taken out from the mounting table 7, and the object to be heated 9 placed on the mounting table 7 can be rotated smoothly.
以上のように本発明によれば次の効果を得るこ
とができる。 As described above, according to the present invention, the following effects can be obtained.
1 加熱室上壁を、加熱室後方から開口部へ向つ
て上方へ傾斜を設け、更に載置台の中心部から
開口部間の任意の位置で上方へ折曲したことに
より、被加熱物の出し入れがしやすく、しかも
加熱室内に供給された高周波の反射角度が後壁
側から前壁側に向かつて異なつているので高周
波の分布特性が向上し、載置台を回転して加熱
調理を行うので、より一層むらのない加熱調理
を行うことができる。1 The upper wall of the heating chamber is sloped upward from the rear of the heating chamber toward the opening, and is further bent upward at any position between the center of the mounting table and the opening, making it easy to take in and out the heated object. Moreover, since the reflection angle of the high frequency waves supplied into the heating chamber is different from the rear wall side to the front wall side, the high frequency distribution characteristics are improved, and the cooking table can be rotated to perform cooking. Cooking can be done even more evenly.
2 加熱室上壁の折曲部を載置台の中心部よりも
開口部側に設けたことにより、被加熱物を載置
台に載せる前に高さを規制することができる。
従つて載置台に載せた被加熱物をスムーズに回
転させることが可能となる。2. By providing the bent portion of the upper wall of the heating chamber closer to the opening than the center of the mounting table, the height of the object to be heated can be regulated before placing it on the mounting table.
Therefore, it becomes possible to smoothly rotate the object to be heated placed on the mounting table.
第1図は本発明の一実施例を示す高周波加熱装
置の側断面図、第2図は同第1図のA−A′線に
おける平断面図、第3図は従来例を示す高周波加
熱装置の側断面図である。
2……加熱室、7……載置台、10……マグネ
トロン(高周波発生装置)、12……加熱室上
壁。
Fig. 1 is a side cross-sectional view of a high-frequency heating device showing an embodiment of the present invention, Fig. 2 is a plan cross-sectional view taken along line A-A' in Fig. 1, and Fig. 3 is a high-frequency heating device showing a conventional example. FIG. 2... Heating chamber, 7... Mounting table, 10... Magnetron (high frequency generator), 12... Upper wall of heating chamber.
Claims (1)
へ高周波を供給する高周波発生装置と、前記加熱
室内に回転自在に設けられた載置台とを備え、前
記加熱室の上壁を、加熱室の後方から開口部側へ
向つて上方へ傾斜を設け、かつ前記載置台の中心
部から開口部間の任意の位置で上方へ折曲する構
成とした高周波加熱装置。1. A heating chamber that accommodates an object to be heated, a high frequency generator that supplies high frequency waves into the heating chamber, and a mounting table that is rotatably provided in the heating chamber, and the upper wall of the heating chamber is connected to the heating chamber. The high-frequency heating device is configured to be inclined upward from the rear toward the opening side, and bent upward at any position between the center of the mounting table and the opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57104248A JPS58221329A (en) | 1982-06-16 | 1982-06-16 | High frequency heating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57104248A JPS58221329A (en) | 1982-06-16 | 1982-06-16 | High frequency heating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58221329A JPS58221329A (en) | 1983-12-23 |
| JPS6242215B2 true JPS6242215B2 (en) | 1987-09-07 |
Family
ID=14375629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57104248A Granted JPS58221329A (en) | 1982-06-16 | 1982-06-16 | High frequency heating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58221329A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5221461U (en) * | 1975-08-04 | 1977-02-15 |
-
1982
- 1982-06-16 JP JP57104248A patent/JPS58221329A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58221329A (en) | 1983-12-23 |
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