JPS6242328B2 - - Google Patents
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- Publication number
- JPS6242328B2 JPS6242328B2 JP8095479A JP8095479A JPS6242328B2 JP S6242328 B2 JPS6242328 B2 JP S6242328B2 JP 8095479 A JP8095479 A JP 8095479A JP 8095479 A JP8095479 A JP 8095479A JP S6242328 B2 JPS6242328 B2 JP S6242328B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- polishing
- head
- loop
- magnetostriction constant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
本発明は、特にCo系の非晶質合金製磁気ヘツ
ドに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention particularly relates to a magnetic head made of a Co-based amorphous alloy.
結晶質材料を磁気ヘツド材料として用いる場合
には、高磁束密度を有する事は勿論であるが、そ
の他に結晶磁気異方性と磁歪定数の双方を可能な
限り零にする事が必要である。その点、非晶質合
金では、結晶磁気異方性が無いと考えられるの
で、磁歪定数のみを零にするか、若しくは零に近
づければ良いと考えられている。しかしながら、
従来では、零に近づける場合、磁歪定数の符号が
正又は負のどちらが望ましいかは何ら考慮される
事が無かつた。この非晶質合金は通常ロール急冷
法により、厚さ30〜60μm位の長いテープ状試料
の形で得られ、これからヘツドチツプ等を採取す
るに当り、高周波帯域での渦電流損の軽減や微細
精度要求の為に、後加工として、テープ表面の研
摩が施される場合が多い。この為、磁気ヘツド
は、磁歪定数が零でなければ、上述のような作製
過程でなされる種々の処理又は加工(例えば研摩
や接着、樹脂モールド等)により複雑な外的応力
が加わつた状態、即ちその外的応力が磁気ヘツド
内部に残留した状態で使用される。このような応
力は磁歪定数と結びついて複雑な方向の誘導磁気
異方性の原因となる為に、一般に、材料特性に見
合つたヘツド特性(特に透磁率)を再現せず、こ
れを劣化させる方向に導く。 When a crystalline material is used as a magnetic head material, it is necessary not only to have a high magnetic flux density, but also to make both the magnetocrystalline anisotropy and the magnetostriction constant as zero as possible. In this regard, since amorphous alloys are considered to have no magnetocrystalline anisotropy, it is considered that only the magnetostriction constant should be made zero or close to zero. however,
Conventionally, when approaching zero, no consideration was given to whether the sign of the magnetostriction constant was preferably positive or negative. This amorphous alloy is usually obtained in the form of a long tape sample with a thickness of about 30 to 60 μm using the roll quenching method. Due to demand, polishing of the tape surface is often performed as post-processing. Therefore, if the magnetostriction constant is not zero, the magnetic head will be in a state where complex external stress is applied due to various treatments or processing (e.g., polishing, adhesion, resin molding, etc.) performed during the manufacturing process as described above. That is, the magnetic head is used with the external stress remaining inside the magnetic head. Since such stress is combined with the magnetostriction constant and causes induced magnetic anisotropy in complex directions, it generally does not reproduce the head properties (especially magnetic permeability) that are commensurate with the material properties, but rather causes the head properties to deteriorate. lead to.
本発明は上述の問題点に鑑みてなされたもので
あつて、2.2×10-6以下で且つ正の磁歪定数を有
する非晶質磁性合金により形成されたコア半体を
非磁性ギヤツプを介して互いに突き合せて成る磁
気ヘツドに係るものである。 The present invention has been made in view of the above-mentioned problems, and consists of a core half made of an amorphous magnetic alloy having a positive magnetostriction constant of 2.2×10 -6 or less, and a core half formed by a non-magnetic gap. This relates to magnetic heads that are butted against each other.
本発明によつて規定した範囲の磁歪定数を有す
る非晶質合金を磁気ヘツドに用いることにより、
既述したようなヘツド作製時の外的応力に原因す
る複雑な方向の誘導磁気異方性が生じた場合で
も、これを磁気テープの摺動による誘導磁気異方
性が打ち消すと共に、この磁気テープの摺動によ
る研摩方向即ち磁路方向が磁化容易軸となつて、
優れた再生特性を有する磁気ヘツドを得ることが
出来る。即ち、非晶質磁性合金材料本体の特性
(高透磁率、高磁束密度等)を生かすことが出来
る。 By using an amorphous alloy having a magnetostriction constant within the range specified by the present invention for the magnetic head,
Even if induced magnetic anisotropy in a complicated direction occurs due to external stress during head fabrication as described above, the induced magnetic anisotropy due to the sliding of the magnetic tape cancels this out, and the magnetic tape The polishing direction due to sliding, that is, the magnetic path direction, becomes the axis of easy magnetization,
A magnetic head with excellent reproduction characteristics can be obtained. That is, the characteristics (high magnetic permeability, high magnetic flux density, etc.) of the amorphous magnetic alloy material body can be utilized.
本発明による磁気ヘツドの製造方法において、
好ましくは、非晶質合金の表面を約1.5μ若しく
はそれ以上エツチング除去するのが良い。又、こ
の方法は、Co系の非晶質合金に限らず、一般に
磁気ヘツド材として利用できる全ての低磁歪非晶
質合金に対して適用可能である。更に言えば、こ
の方法は、非晶質合金の厚みが約40μ以下の場合
に特に効果的である。 In the method for manufacturing a magnetic head according to the present invention,
Preferably, the surface of the amorphous alloy is etched away by about 1.5 microns or more. Furthermore, this method is applicable not only to Co-based amorphous alloys but also to all low magnetostriction amorphous alloys that can generally be used as magnetic head materials. Furthermore, this method is particularly effective when the thickness of the amorphous alloy is about 40 microns or less.
以下、本発明を実施例につき詳しく説明する。 Hereinafter, the present invention will be explained in detail with reference to examples.
まず後述する各組成(原子比)となるように、
Fe、Co、Si、B、及びNiを夫々秤量し、その混
合物を高周波加熱炉によつて溶解して母合金を作
成した。この母合金を原料として用い、本出願人
が先に特願昭52−22937号として提案した圧延急
冷装置により上記原料を急冷して、テープ状試料
を作成した。得られたテープ状試料がアモルフア
ス(非晶質)であることは、X線回折によつて確
認した。このテープ状試料から、超音波加工機に
よつて円板状試片を打抜き、ストレーンゲージ法
によりその磁歪を測定した。その際、磁歪定数λ
は、ゲージ方向及びそれと直角方向に磁界をかけ
た時の伸縮率を夫々(Δl/l)、(Δl/l)
⊥として、
λ=2/3{(Δl/l)−(Δl/l)⊥)}
なる一般式から求めた。 First of all, so that each composition (atomic ratio) will be described later,
Fe, Co, Si, B, and Ni were each weighed, and the mixture was melted in a high-frequency heating furnace to create a master alloy. Using this master alloy as a raw material, the raw material was quenched using a rolling quenching device previously proposed by the applicant in Japanese Patent Application No. 52-22937 to prepare a tape-shaped sample. It was confirmed by X-ray diffraction that the obtained tape-shaped sample was amorphous. A disk-shaped sample was punched out from this tape-shaped sample using an ultrasonic processing machine, and its magnetostriction was measured using a strain gauge method. At that time, the magnetostriction constant λ
are the expansion and contraction rates when a magnetic field is applied in the gauge direction and in the direction perpendicular to it, respectively (Δl/l) and (Δl/l)
As ⊥, it was determined from the general formula: λ=2/3 {(Δl/l)−(Δl/l)⊥)}.
次に、上記テープ状試料から角片を切出し、研
摩紙でこの角片表面を一方向に研摩した。更に、
研摩面の反射率を良くすべく、微粒径アルミナを
コートしたテープで上述したと同方向に研摩し
た。そして、磁気−光・カー(Kerr)効果装置
によつて、50Hzの励磁々界をかけて研摩面の磁化
過程を調べた。 Next, a corner piece was cut out from the tape-shaped sample, and the surface of this corner piece was polished in one direction with abrasive paper. Furthermore,
In order to improve the reflectance of the polished surface, polishing was performed in the same direction as described above using a tape coated with fine-grained alumina. Then, a 50 Hz excitation field was applied using a magneto-optical Kerr effect device to investigate the magnetization process of the polished surface.
実施例 1
Fe7Co73Si4B16なる組成について、研摩方向と
平行及びそれと直角方向に励磁々界をかけた時の
カーヒステリシスループを第1図及び第2図に
夫々示した。磁歪定数はλ〓2.2×10-6であつ
た。Example 1 For a composition of Fe 7 Co 73 Si 4 B 16 , the Kerr hysteresis loops when an excitation field is applied parallel to and perpendicular to the polishing direction are shown in FIGS. 1 and 2, respectively. The magnetostriction constant was λ〓2.2×10 -6 .
第1図に示される非常に角型性の良いループ及
び第2図に示される折れ曲つたループから、研摩
によつて、その研摩方向が磁化容易軸となるよう
な磁気異方性を生じる事が分かる。このような性
質のループは試験片の表面全域でみられた。又、
検討の結果、この研摩によつて発生する磁気異方
性の容易軸は、研摩方向が原非晶質テープに対し
どのような方向であつても生ずることが確認され
た。 From the very square loop shown in Figure 1 and the bent loop shown in Figure 2, magnetic anisotropy is produced by polishing, with the polishing direction being the axis of easy magnetization. I understand. Loops of this nature were observed all over the surface of the specimen. or,
As a result of the study, it was confirmed that the easy axis of magnetic anisotropy generated by this polishing occurs regardless of the polishing direction relative to the original amorphous tape.
実施例 2
Fe4.7Co70.3Si15B10なる組成について、研摩方
向と平行及びそれと直角方向に励磁々界をかけた
時のカーヒステリシスループを第3図及び第4図
に夫々示した。磁歪定数λは殆ど零か又はわずか
に正であつた。Example 2 For the composition Fe 4 . 7 Co 70 . 3 Si 15 B 10 , the Kerr hysteresis loops when an excitation field is applied parallel to and perpendicular to the polishing direction are shown in Figs. 3 and 4, respectively. Ta. The magnetostriction constant λ was almost zero or slightly positive.
第3図及び第4図から、実施例1で述べたと同
様の結果、即ち、研摩方向に磁化容易軸を持つよ
うな磁気異方性の発生がみられた。 From FIGS. 3 and 4, results similar to those described in Example 1 were observed, that is, the occurrence of magnetic anisotropy having an axis of easy magnetization in the polishing direction.
また研摩方向が一方向でないランダムな研摩の
場合には、第5図に示すようなループが観測磁界
方向に殆んど依存せずに観測された。 Further, in the case of random polishing in which the polishing direction was not unidirectional, a loop as shown in FIG. 5 was observed almost independently of the direction of the observed magnetic field.
実施例 3
Fe4.7Co75.3Si4B16なる組成について測定し、実
施例1及び実施例2と同様の結果を得た(図示せ
ず)。磁歪定数はλ〓0.6×10-6であつた。Example 3 The composition Fe 4 . 7 Co 75 . 3 Si 4 B 16 was measured, and the same results as in Examples 1 and 2 were obtained (not shown). The magnetostriction constant was λ〓0.6×10 -6 .
比較例 1
Fe4.7Co70.3Ni4Si9B12なる組成について測定し
た。磁歪定数はλ〓−1.0×10-6であつた。測定
の結果、この試料では、研摩面の形状、抗磁力が
場所によつて異なり、又、研摩方向に特定の依存
性を示さないヒステリシスループが観測された
(図示せず)。この事は、上述の実施例と異なり、
本例の組成物質では研摩効果が殆ど無い事を示し
ている。Comparative Example 1 A composition of Fe 4 . 7 Co 70 . 3 Ni 4 Si 9 B 12 was measured. The magnetostriction constant was λ〓−1.0×10 −6 . As a result of the measurement, in this sample, the shape of the polished surface and the coercive force varied depending on the location, and a hysteresis loop was observed that showed no specific dependence on the polishing direction (not shown). This is different from the above embodiment,
This shows that the composition of this example has almost no polishing effect.
比較例 2
Fe3Co77Si4B16なる組成について、研摩方向と
平行及びそれと直角方向に励磁々界をかけた時の
カーヒステリシスループを第6図及び第7図に
夫々示した。磁歪定数λ〓=−1.4×10-6であつ
た。Comparative Example 2 For a composition of Fe 3 Co 77 Si 4 B 16 , the Kerr hysteresis loops when an excitation field is applied parallel to and perpendicular to the polishing direction are shown in FIGS. 6 and 7, respectively. The magnetostriction constant λ = −1.4×10 -6 .
本例では、第6図及び第7図に示すように、測
定磁界が研摩方向と同方向の時に第2図又は第4
図と類似した角型の悪いループが得られ、一方、
磁界が研摩方向に対して直角方向の時に角型性の
良いループが観測された。この事は、本例の組成
物質では、実施例1〜3とは逆に、研摩方向が磁
化困難軸となる(即ち、その直角方向が磁化容易
軸となる)ような磁気異方性が発生した事を示し
ている。 In this example, as shown in FIGS. 6 and 7, when the measurement magnetic field is in the same direction as the polishing direction,
A poorly squared loop similar to the one in the figure is obtained, while
A loop with good squareness was observed when the magnetic field was perpendicular to the polishing direction. This means that in the composition material of this example, magnetic anisotropy occurs such that the polishing direction is the axis of hard magnetization (that is, the direction perpendicular to it is the axis of easy magnetization), contrary to Examples 1 to 3. It shows what you did.
比較例 3
Co75Mo3Si8B14なる組成について測定した。磁
歪定数はλ〓−2.5×10-6であつた。測定の結果
本例においても比較例2と類似したループが観測
された。即ち、測定磁界が研摩方向と直角の時に
角型性の極めて良いループが得られ(図示せ
ず)、磁界が研摩方向と同方向の時は第8図に示
すような角型性の極めて悪いループが観測され
た。従つて、本例の組成物質においても、研摩に
よつて、研摩方向に磁化困難軸を持つ(直角方向
が磁化容易軸)磁気異方性が発生した事が分か
る。Comparative Example 3 A composition of Co 75 Mo 3 Si 8 B 14 was measured. The magnetostriction constant was λ〓−2.5×10 −6 . As a result of the measurement, a loop similar to that of Comparative Example 2 was observed in this example as well. That is, when the measuring magnetic field is perpendicular to the polishing direction, a loop with extremely good squareness is obtained (not shown), and when the magnetic field is in the same direction as the polishing direction, a loop with extremely poor squareness as shown in Fig. 8 is obtained. A loop was observed. Therefore, it can be seen that magnetic anisotropy with an axis of hard magnetization in the polishing direction (the axis of easy magnetization is perpendicular to the direction) was generated in the composition material of this example due to polishing.
以上説明した実施例及び比較例から分かるよう
に、磁歪定数λが比較的小さな(2.2×10-6以
下)正若しくは殆ど零の材料では、研摩によつて
その研摩方向に磁気異方性が発生し、λが負の材
料では研摩方向と直角に発生してテープ摺動方向
に磁化困難となる。 As can be seen from the examples and comparative examples described above, in materials whose magnetostriction constant λ is relatively small (2.2×10 -6 or less) positive or almost zero, magnetic anisotropy occurs in the polishing direction by polishing. However, in materials where λ is negative, magnetization occurs perpendicularly to the polishing direction, making it difficult to magnetize in the tape sliding direction.
上述の実施例におけるアモルフアス合金試料の
研摩は、実際の使用において、非晶質のリボン状
合金材料からヘツドチツプを採取し、これらを積
層等して磁気ヘツドとなし、テープを摺動させた
時にヘツドチツプの受ける効果と同質のものと考
えられる。従つて、上記実施例1〜3のように磁
歪定数λが正の材料では、テープの摺動によつて
ヘツドのギヤツプ方向に磁化容易軸を持つような
磁気異方性を生ずることが期待される。このよう
なヘツドギヤツプ近傍での磁路長(ヘツドチツプ
又はヘツドの)方向への磁気異方性の発生は、λ
≠0の場合に、ヘツド作製時の加工、接着、樹脂
モールド等による外部応力及び材料自身の有する
内部応力とこのλとの結合によつて磁気ヘツドの
ギヤツプ近傍に生じている、ヘツド性能の劣化に
つながる複雑な方向性の磁気異方性を打ち消す
(改善する)方向に作用する。なお、このような
打ち消し効果は、ヘツド若しくはヘツドチツプの
深さが短いほど大きい。 In actual use, the polishing of the amorphous alloy sample in the above example involves collecting head chips from an amorphous ribbon-shaped alloy material, laminating them, etc. to form a magnetic head, and when the tape is slid, the head chips It is thought that the effect is the same as that of Therefore, in materials with a positive magnetostriction constant λ as in Examples 1 to 3 above, it is expected that sliding of the tape will produce magnetic anisotropy with an axis of easy magnetization in the direction of the gap of the head. Ru. The occurrence of magnetic anisotropy in the direction of the magnetic path length (head chip or head) near the head gap is caused by λ
When ≠0, head performance deterioration occurs near the gap of the magnetic head due to external stress due to processing, adhesion, resin molding, etc. during head fabrication, and internal stress of the material itself coupled with this λ. It acts in the direction of canceling (improving) the complex directional magnetic anisotropy that leads to. Note that such a canceling effect is greater as the depth of the head or head chip becomes shorter.
実施例 4
Fe4.7Co70.3Si15B10なる組成の実施例2と同様
の試験片について、塩酸と塩化第二鉄溶液とを含
むエツチング液を用いて表面をエツチングした
後、ヒステリシスループを観測した。エツチング
速度は約0.5μm/minで、エツチング厚は、別
に用意した方向性研摩済試験片(長さ約7cm)の
(i)重量変化、(ii)特定の場所での厚み測定の2法
を、ある場合は併用して求めた。エツチング厚が
数μmの時の(i)(ii)法の測定評価結果の一致は良か
つた。Example 4 A test piece similar to Example 2 having a composition of Fe 4 . 7 Co 70 . A loop was observed. The etching speed was approximately 0.5 μm/min, and the etching thickness was determined using a separately prepared directionally polished test piece (approximately 7 cm in length).
Two methods, (i) weight change and (ii) thickness measurement at specific locations, were used in combination in some cases. When the etching thickness was several micrometers, the measurement and evaluation results of methods (i) and (ii) agreed well.
エツチング厚を約0.5μm、約1μm、約1.5μ
m、約2μm、約3μm、約4μm、約6μmと
増していつた時のヒステリシスループの測定結果
をまとめると、エツチング厚〓1.5μmでは、実
施例2で述べた研摩によるヒステリシスループの
特徴が消えず、エツチング厚〓1.5μmでは消失
した。略1.5μm若しくはそれ以上エツチングし
た後の試験片のヒステリシスループの例を第9図
に、又同じ試験片の別の場所でのヒステリシスル
ープを第10図に夫々示す。この第9図及び第1
0図から明らかなように、一般に抗磁力がかなり
減少し、又角型比も第3図及び第4図等と比べて
かなり異なつており、しかも試験片の場所によつ
てもループの形は異なつている。 Etching thickness: approx. 0.5μm, approx. 1μm, approx. 1.5μm
To summarize the measurement results of the hysteresis loop as the etching thickness increased from about 2 μm, about 3 μm, about 4 μm, to about 6 μm, it was found that when the etching thickness was 1.5 μm, the characteristics of the hysteresis loop due to polishing described in Example 2 did not disappear. , disappeared when the etching thickness was 1.5 μm. An example of the hysteresis loop of a test piece after etching of approximately 1.5 μm or more is shown in FIG. 9, and a hysteresis loop of the same test piece at another location is shown in FIG. 10, respectively. This figure 9 and 1
As is clear from Figure 0, the coercive force is generally considerably reduced, and the squareness ratio is also quite different compared to Figures 3 and 4. Moreover, the shape of the loop varies depending on the location of the specimen. It's different.
実施例5、比較例5
Fe7Co73Si4B16及びFe3Co77Si4B16なる組成につ
いて実施例4と同様の測定を行なつたが、エツチ
ング厚とヒステリシスループとの関係について
は、やはり実施例4と同様の結果が得られた。Example 5, Comparative Example 5 The same measurements as in Example 4 were made for the compositions Fe 7 Co 73 Si 4 B 16 and Fe 3 Co 77 Si 4 B 16 , but the relationship between etching thickness and hysteresis loop was Again, the same results as in Example 4 were obtained.
第1図はFe7Co73Si4B16なる組成の非晶質合金
について、研摩方向と平行に励磁々界をかけた時
のカーヒステリシスループを示すグラフ、第2図
は第1図の試料について、研摩方向と直角に励
磁々界をかけた場合の第1図と同様のグラフ、第
3図はFe4.7Co70.3Si15B10なる組成について、研
摩方向と平行に励磁々界をかけた場合の第1図と
同様のグラフ、第4図は第3図の試料について、
研摩方向と直角に励磁々界をかけた場合の第1図
と同様のグラフ、第5図は第3図と同様な試料に
ついて、研摩方向をランダムとした場合の第1図
と同様のグラフ、第6図はFe3Co77Si4B16なる組
成について、研摩方向と平行に励磁々界をかけた
場合の第1図と同様のグラフ、第7図は第6図の
試料について、研摩方向と直角に励磁々界をかけ
た場合の第1図と同様のグラフ、第8図は
Co75Mo3Si8B14なる組成について、研摩方向と平
行に励磁々界をかけた場合の第1図と同様のグラ
フ、第9図は第3図と同様の試料について、表面
をエツチングした後のカーヒステリシスループを
示すグラフ、第10図は第9図の試料の別の場所
におけるカーヒステリシスループを示すグラフで
ある。
Figure 1 is a graph showing the Kerr hysteresis loop when an excitation magnetic field is applied parallel to the polishing direction for an amorphous alloy with the composition Fe 7 Co 73 Si 4 B 16 , and Figure 2 is a graph of the sample shown in Figure 1. Figure 3 is a graph similar to Figure 1 when an excitation field is applied perpendicular to the polishing direction, and Figure 3 is a graph for the composition Fe 4 . 7 Co 70 . A graph similar to Figure 1 when a field is applied, Figure 4 is for the sample in Figure 3,
A graph similar to Fig. 1 when an excitation field is applied perpendicular to the polishing direction; Fig. 5 is a graph similar to Fig. 1 when the polishing direction is random for the same sample as Fig. 3; Figure 6 is a graph similar to Figure 1 for the composition Fe 3 Co 77 Si 4 B 16 when an excitation field is applied parallel to the polishing direction, and Figure 7 is a graph for the sample in Figure 6, but in the polishing direction. Figure 8 is a graph similar to Figure 1 when an excitation field is applied at right angles to
A graph similar to Fig. 1 is obtained for the composition Co 75 Mo 3 Si 8 B 14 when an excitation field is applied parallel to the polishing direction, and Fig. 9 is a graph obtained by etching the surface of a sample similar to Fig. 3. FIG. 10 is a graph showing the Kerr hysteresis loop at another location in the sample of FIG. 9.
Claims (1)
非晶質磁性合金により形成されたコア半体を非磁
性ギヤツプを介して互いに突き合せて成る磁気ヘ
ツド。1. A magnetic head consisting of core halves made of an amorphous magnetic alloy having a positive magnetostriction constant of 2.2×10 -6 or less and butted against each other via a non-magnetic gap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8095479A JPS567219A (en) | 1979-06-27 | 1979-06-27 | Amorphous alloy magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8095479A JPS567219A (en) | 1979-06-27 | 1979-06-27 | Amorphous alloy magnetic head and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS567219A JPS567219A (en) | 1981-01-24 |
| JPS6242328B2 true JPS6242328B2 (en) | 1987-09-08 |
Family
ID=13732892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8095479A Granted JPS567219A (en) | 1979-06-27 | 1979-06-27 | Amorphous alloy magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS567219A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02108437U (en) * | 1989-02-16 | 1990-08-29 | ||
| JPH06132754A (en) * | 1992-10-22 | 1994-05-13 | Rohm Co Ltd | Manufacture of piezoelectric oscillator |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56156917A (en) * | 1980-05-06 | 1981-12-03 | Matsushita Electric Ind Co Ltd | Magnetic head |
-
1979
- 1979-06-27 JP JP8095479A patent/JPS567219A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02108437U (en) * | 1989-02-16 | 1990-08-29 | ||
| JPH06132754A (en) * | 1992-10-22 | 1994-05-13 | Rohm Co Ltd | Manufacture of piezoelectric oscillator |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS567219A (en) | 1981-01-24 |
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