JPS624328B2 - - Google Patents
Info
- Publication number
- JPS624328B2 JPS624328B2 JP21230382A JP21230382A JPS624328B2 JP S624328 B2 JPS624328 B2 JP S624328B2 JP 21230382 A JP21230382 A JP 21230382A JP 21230382 A JP21230382 A JP 21230382A JP S624328 B2 JPS624328 B2 JP S624328B2
- Authority
- JP
- Japan
- Prior art keywords
- solution
- alkali metal
- water
- liquid
- metal titanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000243 solution Substances 0.000 claims description 27
- 229910052783 alkali metal Inorganic materials 0.000 claims description 26
- -1 alkali metal titanate Chemical class 0.000 claims description 25
- 239000006185 dispersion Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000003513 alkali Substances 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 150000004820 halides Chemical class 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims 1
- 239000007788 liquid Substances 0.000 description 24
- 239000000843 powder Substances 0.000 description 14
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 6
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000001119 stannous chloride Substances 0.000 description 6
- 235000011150 stannous chloride Nutrition 0.000 description 6
- 238000010304 firing Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 4
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 4
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 3
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- WIVXEZIMDUGYRW-UHFFFAOYSA-L copper(i) sulfate Chemical compound [Cu+].[Cu+].[O-]S([O-])(=O)=O WIVXEZIMDUGYRW-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Conductive Materials (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Description
【発明の詳細な説明】
本発明は、プラスチツクス等に対する補強効果
が優れた導電性チタン酸アルカリ金属塩の製造法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a conductive alkali metal titanate having an excellent reinforcing effect on plastics and the like.
金属被膜を有する金属以外の粉体は、金属塊を
粉砕して得た粉末に比較し、省資源の面で有利な
だけでなく、芯部の素材によつては、プラスチツ
クスへの分散性、分散後の安定性や補強効果等に
おいて優れたものとなる。 Non-metal powders with metal coatings are not only advantageous in terms of resource conservation compared to powders obtained by pulverizing metal lumps, but depending on the material of the core, they are less dispersible in plastics. , it has excellent stability after dispersion, reinforcing effect, etc.
本発明者は、前記芯部の素材として、チタン酸
アルカリ金属塩が優れた性質を備えていることに
着目し、既にチタネート結晶については、これを
無電解メツキすることにより容易に金属被膜を有
するチタネートとなしうることを確認し、出願済
である。しかしながら、無電解メツキ法は、還元
形のチタネート結晶を金属で被覆して導電性化す
る際にはともかく、周知の結晶質チタン酸アルカ
リ金属塩を導電性化する際には、無電解メツキに
先だつて結晶質チタン酸アルカリ金属塩を活性化
処理しなければならないという問題があつた。 The present inventor has focused on the excellent properties of alkali metal titanate as a material for the core, and has already found that titanate crystals can be easily coated with metal by electroless plating. We have confirmed that it can be used as a titanate and have filed an application. However, the electroless plating method is not only used when coating reduced titanate crystals with metal to make it conductive, but also when making the well-known crystalline alkali metal titanate salt conductive. There was a problem in that the crystalline alkali metal titanate salt had to be activated first.
本発明者は、チタン酸アルカリ金属塩に金属被
膜を直接形成するという発想にかえ、チタン酸ア
ルカリ金属塩に導電性元素の化合物を沈着させる
という発想のもとに、鋭意研究の結果本発明に到
達した。 The present inventor has developed the present invention as a result of intensive research based on the idea of depositing a compound of a conductive element on an alkali metal titanate, instead of directly forming a metal coating on an alkali metal titanate. Reached.
即ち、本発明は、チタン酸アルカリ金属塩の水
分散液に、
(a) 錫、インジウム、アンチモン、銅及びニツケ
ルの化合物の群から選ばれる1種以上からなる
化合物の溶液、
(b) 水酸化アルカリ又はハロゲン化アルカリの水
溶液、
の両溶液を同時に加え、(a)溶液と(b)溶液の反応に
より生成する水不溶性成分を、チタン酸アルカリ
金属塩の表面に沈着させることを特徴とする、導
電性チタン酸アルカリ金属塩の製造法に係るもの
である。 That is, the present invention provides an aqueous dispersion of an alkali metal titanate, (a) a solution of one or more compounds selected from the group of compounds of tin, indium, antimony, copper, and nickel, and (b) hydroxide. An aqueous solution of an alkali or an alkali halide, characterized in that both solutions are added at the same time, and the water-insoluble component produced by the reaction of the (a) solution and (b) solution is deposited on the surface of the alkali metal titanate salt. The present invention relates to a method for producing a conductive alkali metal titanate.
ここにおいて、チタン酸アルカリ金属塩とは、
一般式M2O・nTiO2・mH2O(式中Mはアルカリ
金属、nは2〜12の整数、mは0又は4以下の正
の実数を意味する。)で表わされる周知の結晶質
チタン酸アルカリ金属塩をいう。 Here, the alkali metal titanate is
A well-known crystalline substance represented by the general formula M 2 O・nTiO 2・mH 2 O (wherein M is an alkali metal, n is an integer from 2 to 12, and m is 0 or a positive real number of 4 or less). Refers to an alkali metal titanate salt.
チタン酸アルカリ金属塩のうちでも特に一般式
K2O・n′TiO2・mH2O(式中n′は2〜8の整数
を、mは前記と同じものを意味する)で表わされ
るチタン酸カリウムは、耐熱性にすぐれ、比較的
製造も確立されたものであるため、本発明の目的
物を得る際の素材として有利である。 Among the alkali metal titanate salts, especially the general formula
Potassium titanate, represented by K 2 O・n′TiO 2・mH 2 O (in the formula, n′ is an integer from 2 to 8, and m means the same as above), has excellent heat resistance and is relatively Since its production has been established, it is advantageous as a material for obtaining the object of the present invention.
また、チタン酸カリウムは、粉末状だけでな
く、繊維状としても製造されるが、この繊維状の
チタン酸カリウムは、充填剤として補強性にも優
れるため、特に本発明の素材として望ましいもの
である。 In addition, potassium titanate is produced not only in powder form but also in fibrous form, and this fibrous potassium titanate is particularly desirable as a material for the present invention because it has excellent reinforcing properties as a filler. be.
錫、インジウム、アンチモン、銅又はニツケル
(以下これらを導電性元素という)の化合物とし
ては、導電性元素のハロゲン化塩、及び硫酸塩及
び酸化物等、水溶液とした際に酸性を示すものが
挙げられる。 Examples of compounds of tin, indium, antimony, copper, or nickel (hereinafter referred to as conductive elements) include those that exhibit acidity when made into an aqueous solution, such as halogenated salts, sulfates, and oxides of conductive elements. It will be done.
導電性元素の化合物として好ましいものとし
て、具体的には、塩化第1錫、塩化第2錫、塩化
インジウム、塩化アンチモン、塩化第2銅、塩化
第1ニツケル、塩化第2ニツケル等の塩化物の
他、硫酸第1銅、硫酸第2銅、酸化アンチモン等
が挙げられる。 Preferred examples of conductive element compounds include chlorides such as stannous chloride, stannic chloride, indium chloride, antimony chloride, cupric chloride, nickel chloride, and nickel chloride. Other examples include cuprous sulfate, cupric sulfate, antimony oxide, and the like.
これらの導電性元素の化合物は、労働安全性、
省資源等の観点から、水溶液として使用すること
が望ましいが、炭素数3以下のアルコール類、ア
セトン、エチレングリコール、プロピレングリコ
ール、ポリエチレングリコール、ポリプロピレン
グリコール、ポリオキシエチレン、オキシプロピ
レンブロツク共重合体、ジオキサン、グリセリ
ン、メチルセロソルブ、エチルセロソルブ、ブチ
ルセロソルブ、メチルセロソルブアセテート、エ
チルセロソルブアセテート、ブチルセロソルブア
セテート等の水溶性有機溶媒も、単独で使用し、
また併用することもできる。 Compounds of these conductive elements are important for occupational safety,
From the perspective of saving resources, it is desirable to use it as an aqueous solution, but alcohols with 3 or less carbon atoms, acetone, ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol, polyoxyethylene, oxypropylene block copolymers, dioxane , water-soluble organic solvents such as glycerin, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate are also used alone,
They can also be used together.
水酸化アルカリ、ハロゲン化アルカリとして
は、例えば、水酸化リチウム、水酸化ナトリウ
ム、水酸化カリウム、沃化リチウム、沃化ナトリ
ウム、沃化カリウム等、水溶液とした際にアルカ
リ性を示すものが挙げられる。 Examples of the alkali hydroxide and alkali halide include those that exhibit alkalinity when made into an aqueous solution, such as lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium iodide, sodium iodide, and potassium iodide.
チタン酸アルカリ金属塩の水分散液の調製にあ
たつては、濃度が0.01〜50重量%、好ましくは
0.1〜20重量%となるようにする。 When preparing an aqueous dispersion of alkali metal titanate, the concentration is 0.01 to 50% by weight, preferably
The content should be 0.1 to 20% by weight.
チタン酸アルカリ金属塩の水分散液に添加す
る、導電性元素の化合物の溶液〔(a)液〕及び水酸
化アルカリ又はハロゲン化アルカリの水溶液〔(b)
液〕の濃度は、特に限定されないが、濃度が低す
ぎると、液量が多くなつて取扱いに不便であり、
また装置も大型化するため、溶解度以下に調製す
る。溶解度以上に導電性元素の化合物を添加した
液や水酸化アルカリ又はハロゲン化アルカリを添
加した液を使用しても、導電性チタン酸アルカリ
金属塩は得られるが、添加量の増加の割には目的
物の導電性が向上せず、かえつて、水不溶性成分
のチタン酸アルカリ金属塩への均質な沈積を妨げ
るから不適当である。 A solution of a compound of a conductive element [liquid (a)] and an aqueous solution of an alkali hydroxide or alkali halide [(b)] to be added to an aqueous dispersion of an alkali metal titanate.
The concentration of the liquid] is not particularly limited, but if the concentration is too low, the amount of liquid will increase and it will be inconvenient to handle.
In addition, since the size of the equipment increases, the temperature must be adjusted to below the solubility. Conductive alkali metal titanates can be obtained even if a liquid containing a compound of a conductive element or alkali hydroxide or alkali halide is added above the solubility, but the increase in the amount added is This is unsuitable because it does not improve the conductivity of the target object and on the contrary prevents the homogeneous deposition of water-insoluble components into the alkali metal titanate.
チタン酸アルカリ金属塩の水分散液に(a)液、(b)
液を添加するにあたつては、チタン酸アルカリ金
属塩の水分散液を撹拌しつつ、且つ、PH値が余り
極端に強アルカリや強酸性領域に移行しないよう
にPH6〜9に保ちながら、徐々になすことが望ま
しい。 In the aqueous dispersion of alkali metal titanate, (a) liquid, (b)
When adding the liquid, while stirring the aqueous dispersion of alkali metal titanate, and keeping the pH value at 6 to 9 so as not to shift too much to the strongly alkaline or strongly acidic range, It is preferable to do it gradually.
(a)液の総添加量は、導電性元素の重量に換算
し、チタン酸アルカリ金属塩100重量部当り、お
よそ300重量部以下の範囲内におさめ、所望する
導電性の目的物を得ればよい。実際には、300重
量部を越える(a)液を添加した場合にも、これに相
応して(b)液を添加すれば水不溶性成分を生成させ
ることができるが、当該過量分の水不溶性成分
は、チタン酸アルカリ金属塩の表面へ、水洗によ
つて離脱する程度に弱く付着している場合が多い
からである。(a)液、(b)液の具体的な組み合せによ
つてある程度異なるが、前記300重量部の範囲内
であれば、(a)液と(b)液との反応により生成する水
不溶性成分をチタン酸アルカリ金属塩の表面へ強
固に付着させることができるばかりか、廃液(
液)中に導電性元素の化合物が残存することもな
く、極めて好都合である。 (a) The total amount of liquid added should be within the range of approximately 300 parts by weight or less per 100 parts by weight of the alkali metal titanate in terms of the weight of the conductive element to obtain the desired conductive object. Bye. In reality, even if more than 300 parts by weight of liquid (a) is added, a water-insoluble component can be produced by adding liquid (b) correspondingly. This is because the components often adhere so weakly to the surface of the alkali metal titanate that they can be removed by washing with water. Although it varies to some extent depending on the specific combination of liquids (a) and (b), if it is within the above 300 parts by weight, the water-insoluble component produced by the reaction of liquid (a) and liquid (b) Not only can it firmly adhere to the surface of the alkali metal titanate salt, but also the waste liquid (
This is extremely advantageous since no conductive element compounds remain in the liquid.
(b)液の総添加量は、(a)液と(b)液とによる水不溶
性成分の生成反応が理論的で不明な場合でも、(a)
液で且つ、PH7.0±0.5で添加を終了させる如くす
れば、(a)液の総添加量から自然に決定することが
できる。 The total amount of liquid (b) to be added is determined by
If it is a liquid and the addition is terminated at pH 7.0±0.5, it can be naturally determined from the total amount of liquid (a) added.
(a)液と(b)液との反応は室温下に進行させればよ
い。 The reaction between liquid (a) and liquid (b) may be allowed to proceed at room temperature.
以上の操作後、ろ別すれば、本発明の目的物を
得るが、目的物の導電性を更に向上させるために
は、これを更に焼成又は還元処理することが望ま
しい。この際の焼成処理にあたつては、ろ取物を
例えば600〜800℃で1〜5時間焼成する。また、
還元処理にあたつては、水素ガス、一酸化炭素等
の還元ガスで直接還元するか、炭素粉末等と混合
した前記ろ取物を、非酸化系ガス雰囲気例えば、
窒素ガス、ヘリウムガス、炭酸ガスを90重量%以
上含む雰囲気下、200〜1000℃に加熱すればよ
い。 After the above operations, the object of the present invention is obtained by filtration, but in order to further improve the conductivity of the object, it is desirable to further perform firing or reduction treatment. In this firing treatment, the filtered material is fired at, for example, 600 to 800°C for 1 to 5 hours. Also,
In the reduction treatment, the filtrate is directly reduced with a reducing gas such as hydrogen gas or carbon monoxide, or the filtered material mixed with carbon powder etc. is placed in a non-oxidizing gas atmosphere, for example,
It may be heated to 200 to 1000°C in an atmosphere containing 90% by weight or more of nitrogen gas, helium gas, or carbon dioxide gas.
尚、本発明は、系の安定化を計る為の、界面活
性剤、消泡剤、更には、導電性を高める為のドー
ピング剤等、通常考えられる添加剤の添加を特に
排除するものではない。 Note that the present invention does not specifically exclude the addition of commonly thought of additives such as surfactants, antifoaming agents, and doping agents to increase conductivity in order to stabilize the system. .
以上の説明から明らかな如く、本発明はその実
施にあたり、特別な装置を必要としないため、工
業化が容易である。特に、(a)液の総添加量を、導
電性元素の重量に換算し、チタン酸アルカリ100
重量部当り、およそ30重量部以下の囲内におさめ
て本発明を適切に実施する際には、導電性元素を
ほとんど損失させることなく、水不溶性成分とし
てチタン酸アルカリ金属塩の表面に強固に付着さ
せることができるのであり、廃液処理の問題もな
く、極めて産業への利用性の高いものとなる。 As is clear from the above description, the present invention does not require any special equipment to carry out, and therefore can be easily industrialized. In particular, convert the total amount of liquid (a) added into the weight of the conductive element, and calculate the amount of alkali titanate 100
When carrying out the present invention appropriately within a range of approximately 30 parts by weight or less, the conductive element is firmly adhered to the surface of the alkali metal titanate as a water-insoluble component with almost no loss. Therefore, there is no problem of waste liquid treatment, making it extremely useful for industry.
実施例
1 繊維状チタン酸カリウム(TISMO―L)5
gを水500c.c.に分散し、撹拌機にて5分間撹拌
した。次にこの分散液の撹拌を続けながら、塩
化第1錫(SnCl2・2H2O)7.5gをエタノール
50c.c.に溶解した溶液を、分散液中において、
5W%水酸化カリウム溶液の同時滴下により中
和反応させ、PH値を6〜7に保ちながら約20分
間かけて滴下した。最後に分散液のPH値を7に
調整した後10分間撹拌を続けた。その後別、
洗浄し、100℃にて1昼夜乾燥した。次に800℃
にて4時間焼成した。焼成後の収量は9.9gで
あつた。この粉体の抵抗値を測定した結果3×
104Ω・cmの値を得た。Example 1 Fibrous potassium titanate (TISMO-L) 5
g was dispersed in 500 c.c. of water and stirred for 5 minutes using a stirrer. Next, while continuing to stir this dispersion, 7.5 g of stannous chloride (SnCl 2 2H 2 O) was added to ethanol.
A solution dissolved in 50 c.c. is placed in a dispersion liquid,
Neutralization reaction was carried out by simultaneously dropping a 5W% potassium hydroxide solution, which was added dropwise over about 20 minutes while maintaining the pH value at 6 to 7. Finally, the pH value of the dispersion was adjusted to 7, and stirring was continued for 10 minutes. After that, another
It was washed and dried at 100°C for one day and night. Then 800℃
It was baked for 4 hours. The yield after baking was 9.9g. The result of measuring the resistance value of this powder is 3×
A value of 10 4 Ω·cm was obtained.
2 塩化第1錫(SnCl2・2H2O)15gをエタノー
ル液100c.c.に溶解した溶液を使用し、実施例1
同様の操作を行なつた。焼成後の収量は14.8g
であつた。この粉体の抵抗値を測定した結果2
×103Ω・cmの値を得た。2 Using a solution of 15 g of stannous chloride (SnCl 2 2H 2 O) dissolved in 100 c.c. of ethanol solution, Example 1
A similar operation was performed. Yield after baking is 14.8g
It was hot. Results of measuring the resistance value of this powder 2
A value of ×10 3 Ω·cm was obtained.
3 塩化第1錫(SnCl2・2H2O)7.5gと、塩化
アンチモン(SbCl3)0.4gをエタノール100c.c.
に溶解した溶液を使用し、実施例1同様の操作
を行なつた。焼成後の収量は9.9gでありやや
青みをおびていた。この粉末の抵抗値を測定し
た結果1.5×104Ω・cmの値を得た。3 Add 7.5 g of stannous chloride (SnCl 2 2H 2 O) and 0.4 g of antimony chloride (SbCl 3 ) to 100 c.c. of ethanol.
The same operation as in Example 1 was carried out using a solution dissolved in . The yield after firing was 9.9 g, and the color was slightly bluish. As a result of measuring the resistance value of this powder, a value of 1.5×10 4 Ω·cm was obtained.
4 塩化インジウム(InCl3)8gを水50c.c.に溶
解した溶液を使用し、実施例1と同様の操作を
行なつた。焼成後の収量は9.9gであつた。こ
の粉体の抵抗値を測定した結果1.2×104Ω.cm
の値を得た。4 The same operation as in Example 1 was carried out using a solution in which 8 g of indium chloride (InCl 3 ) was dissolved in 50 cc of water. The yield after baking was 9.9g. The resistance value of this powder was measured and was 1.2×10 4 Ω. cm
obtained the value of
5 塩化インジウム(InCl3)8gを水50c.c.に溶
解した溶液及び塩化第1錫(SnCl2・2H2O)
0.4gをエタノール10c.c.に溶解した溶液を使用
し、塩化インジウム溶液と塩化化第1錫溶液の
分散液への滴下が均一になる様塩化第1錫溶液
の滴下量に注意しながら操作した。5W%水酸
化カリウムによる分散液のPH値維持等他の操作
は実施例1と同様に行なつた。焼成後の収量は
9.9gであつた。この粉体の抵抗値を測定した
結果2.6×102Ω・cmの値を得た。5 A solution of 8 g of indium chloride (InCl 3 ) dissolved in 50 c.c. of water and stannous chloride (SnCl 2 2H 2 O)
Using a solution of 0.4 g dissolved in 10 c.c. of ethanol, operate while paying attention to the amount of the tin chloride solution added so that the dropwise addition to the dispersion of the indium chloride solution and the stannous chloride solution is uniform. did. Other operations such as maintaining the pH value of the dispersion using 5W% potassium hydroxide were carried out in the same manner as in Example 1. The yield after firing is
It was 9.9g. As a result of measuring the resistance value of this powder, a value of 2.6×10 2 Ω·cm was obtained.
6 TISMO―L5gを、6W%亜硫酸36gを水で
500gとした溶液に分散し、撹拌機にて5分間
撹拌した。次にこの分散液の撹拌を続けながら
硫酸銅(CuSO4・5H2O)6.6gを水100c.c.に溶
解した溶液及び沃化カリウム(KI)8.7gを水
100c.c.に溶解した溶液を同時に等量づつ約20分
間かけて滴下した。その後この分散液の色が淡
黄色程度になるまで撹拌を続けた。次に別洗
浄し、50℃にて1昼夜乾燥した。収量は9.8g
であり淡黄色をおびていた。抵抗値を測定した
結果1.8×105Ω・cmの値を得た。6 TISMO-L5g and 6W% sulfite 36g with water
It was dispersed in a solution weighing 500 g and stirred for 5 minutes using a stirrer. Next, while continuing to stir this dispersion, a solution of 6.6 g of copper sulfate (CuSO 4 .5H 2 O) dissolved in 100 c.c. of water and 8.7 g of potassium iodide (KI) were added to the water.
A solution dissolved in 100 c.c. was simultaneously added dropwise in equal amounts over about 20 minutes. Thereafter, stirring was continued until the color of this dispersion liquid became pale yellow. Next, it was washed separately and dried at 50°C for one day and night. Yield: 9.8g
It was pale yellow in color. As a result of measuring the resistance value, a value of 1.8×10 5 Ω·cm was obtained.
7 硫酸銅(CuSO4・5H2O)13.2gを水150c.c.に
溶解した溶液及び沃化カリウム(KI)17.4gを
水150c.c.に溶解した溶液を使用し、実施例6同
様の操作を行なつた。収量は、14.5gでありう
すい橙黄色をおびていた。抵抗値測定の結果
8.7×102Ω・cmの値を得た。7 Same as Example 6 using a solution of 13.2 g of copper sulfate (CuSO 4 5H 2 O) dissolved in 150 c.c. of water and a solution of 17.4 g of potassium iodide (KI) dissolved in 150 c.c. of water. I performed the following operations. The yield was 14.5 g, with a pale orange-yellow color. Resistance measurement results
A value of 8.7×10 2 Ω·cm was obtained.
8 TISMO―L5gを水50c.c.に分散し撹拌機にて
5分間撹拌した。次にこの分散液の撹拌を続け
ながら塩化銅(CuCl2・2H2O)13.4gを水100
c.c.に溶解した溶液を分散液中において5W%水
酸化カリウム溶液の同時滴下により中和反応さ
せ、PH値を6〜7に保ちながら約20分間かけて
滴下した。最後に分散液のPH値を7に調整した
後10分間撹拌を続けた。その後別洗浄し100
℃に1昼夜乾燥、黄緑色の粉体を得た。次にこ
の粉体を400℃にて1時間焼成し黒茶色の粉体
を得た。収量は11.2gであつた。この粉体を石
英管につめH2ガスを通流しながら350℃で30分
間水素還元した。得られた粉体は銅色となつて
いた。抵抗値を測定した結果1.5×103Ω・cmの
値を得た。8 5 g of TISMO-L was dispersed in 50 c.c. of water and stirred for 5 minutes using a stirrer. Next, while continuing to stir this dispersion, 13.4 g of copper chloride (CuCl 2 2 H 2 O) was added to 100 ml of water.
cc solution was simultaneously added dropwise to the dispersion liquid to cause a neutralization reaction, and the solution was added dropwise over about 20 minutes while maintaining the pH value at 6 to 7. Finally, the pH value of the dispersion was adjusted to 7, and stirring was continued for 10 minutes. Then wash separately 100
After drying at ℃ for 1 day, a yellow-green powder was obtained. Next, this powder was calcined at 400°C for 1 hour to obtain a black-brown powder. The yield was 11.2g. This powder was packed in a quartz tube and hydrogen-reduced at 350°C for 30 minutes while passing H 2 gas through it. The obtained powder had a copper color. As a result of measuring the resistance value, a value of 1.5×10 3 Ω·cm was obtained.
9 塩化銅(CuCl2・2H2O)26.8gを水150c.c.に
溶解した溶液を使用し実施例8同様の操作を行
なつた。400℃で1時時間焼成後の収量は17.4
gであつた。この粉体の一部を実施例8同様の
操作で水素還元し、抵抗値1.7×102Ω・cmの値
を得た。9 The same operation as in Example 8 was carried out using a solution in which 26.8 g of copper chloride (CuCl 2 .2H 2 O) was dissolved in 150 cc of water. Yield after baking at 400℃ for 1 hour is 17.4
It was hot at g. A part of this powder was reduced with hydrogen in the same manner as in Example 8, and a resistance value of 1.7×10 2 Ω·cm was obtained.
10 塩化ニツケル(NiCl2・6H2O)20.2gを水
100c.c.に溶解した溶液を使用し、実施例8同様
の操作を行なつた。焼成後の収量は11.2gであ
りやや灰緑色をおびていた。次に実施例8同様
の操作で水素還元し、抵抗値1.9×103Ω・cmの
値を得た。10 Add 20.2g of nickel chloride (NiCl 2.6H 2 O) to water.
The same operation as in Example 8 was carried out using a solution dissolved in 100 c.c. The yield after firing was 11.2 g, which had a slightly gray-green color. Next, hydrogen reduction was performed in the same manner as in Example 8, and a resistance value of 1.9×10 3 Ω·cm was obtained.
Claims (1)
ルの化合物の群から選ばれる1種以上からなる
化合物の溶液、 (b) 水酸化アルカリ又はハロゲン化アルカリの水
溶液、 の両溶液を同時に加え、(a)溶液と(b)溶液との反応
により生成する水不溶性成分を、チタン酸アルカ
リ金属塩の表面に沈積させることを特徴とする、
導電性チタン酸アルカリ金属塩の製造法。[Scope of Claims] 1. In an aqueous dispersion of an alkali metal titanate, (a) a solution of one or more compounds selected from the group of compounds of tin, indium, antimony, copper, and nickel; (b) water; An aqueous solution of an alkali oxide or an alkali halide is added at the same time, and the water-insoluble component produced by the reaction between the (a) solution and (b) solution is deposited on the surface of the alkali metal titanate salt. do,
Method for producing conductive alkali metal titanate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21230382A JPS59102820A (en) | 1982-12-02 | 1982-12-02 | Method for producing conductive alkali metal titanate salt |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21230382A JPS59102820A (en) | 1982-12-02 | 1982-12-02 | Method for producing conductive alkali metal titanate salt |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59102820A JPS59102820A (en) | 1984-06-14 |
| JPS624328B2 true JPS624328B2 (en) | 1987-01-29 |
Family
ID=16620334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21230382A Granted JPS59102820A (en) | 1982-12-02 | 1982-12-02 | Method for producing conductive alkali metal titanate salt |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59102820A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60264326A (en) * | 1984-06-12 | 1985-12-27 | Otsuka Chem Co Ltd | Electrically-conductive titanate derivative and its preparation |
| JPH0635675B2 (en) * | 1984-07-30 | 1994-05-11 | 大塚化学株式会社 | Resin composition for electric plating |
| JPS6155218A (en) * | 1984-08-23 | 1986-03-19 | Hinode Kagaku Kogyo Kk | Electroconductive potassium titanate fiber and its production |
| JPH0633527B2 (en) * | 1985-01-14 | 1994-05-02 | 大塚化学株式会社 | Method for producing conductive alkali long-fiber titanate fiber |
| JPS61286221A (en) * | 1985-06-07 | 1986-12-16 | Ishihara Sangyo Kaisha Ltd | Preparation of white electroconductive powder |
| JPS61286224A (en) * | 1985-06-12 | 1986-12-16 | Ishihara Sangyo Kaisha Ltd | Production of electroconductive fine powder |
-
1982
- 1982-12-02 JP JP21230382A patent/JPS59102820A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59102820A (en) | 1984-06-14 |
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