Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS6245631B2 - - Google Patents
[go: Go Back, main page]

JPS6245631B2 - - Google Patents

Info

Publication number
JPS6245631B2
JPS6245631B2 JP8537480A JP8537480A JPS6245631B2 JP S6245631 B2 JPS6245631 B2 JP S6245631B2 JP 8537480 A JP8537480 A JP 8537480A JP 8537480 A JP8537480 A JP 8537480A JP S6245631 B2 JPS6245631 B2 JP S6245631B2
Authority
JP
Japan
Prior art keywords
magnetic
conductor pattern
transfer path
magnetic bubble
bubble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8537480A
Other languages
Japanese (ja)
Other versions
JPS5712474A (en
Inventor
Haruo Urai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP8537480A priority Critical patent/JPS5712474A/en
Publication of JPS5712474A publication Critical patent/JPS5712474A/en
Publication of JPS6245631B2 publication Critical patent/JPS6245631B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
    • G11C19/0875Organisation of a plurality of magnetic shift registers
    • G11C19/0883Means for switching magnetic domains from one path into another path, i.e. transfer switches, swap gates or decoders

Description

【発明の詳細な説明】 本発明は磁気バブルを用いる磁気バブル素子に
関する。更に詳しく述べれば、磁気バブルの転送
路の切換えを制御する導体パタンを有する磁気バ
ブル素子に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic bubble element using magnetic bubbles. More specifically, the present invention relates to a magnetic bubble element having a conductor pattern that controls switching of a magnetic bubble transfer path.

磁気バブル素子の情報アクセス時間の短縮を図
る方法として磁気バブル素子の構成をメジヤー/
マイナーループ構成とすることはよく知られてい
る。このメジヤー/マイナーループ構成とは、情
報蓄積用の多数のループ状磁気バブル転送路(マ
イナーループ)と、これらに共通な情報読み出し
又は、書き込み用磁気バブル転送路(メジヤール
ープ又はメジヤーライン、以下メジヤーラインと
称するときはメジヤーループも含む意味であ
る。)を有する構成であつて、マイナーループ内
の情報の平均アクセス時間の短縮及び磁気バブル
素子製造プロセスに起因する欠陥に対する大きな
許容性をもつメモリ構成である。
As a method to reduce the information access time of the magnetic bubble element, the structure of the magnetic bubble element is
It is well known to have a minor loop configuration. This major/minor loop configuration consists of a large number of loop-shaped magnetic bubble transfer paths (minor loops) for storing information, and a common magnetic bubble transfer path (major loop or major line, hereinafter referred to as major line) for reading or writing information. This memory structure has a structure in which the average access time of information in the minor loop is shortened and has a high tolerance to defects caused by the magnetic bubble element manufacturing process.

メジヤー/マイナーループ構成のバブル素子に
おいて必須の機能要素の一つはマイナーループの
情報を制御性よくメジヤーラインに移す機能また
はメジヤーライン上の情報を制御性よくマイナー
ループに移す機能である。これらの機能を果す要
素を通常トランスフアーゲートと呼称している。
トランスフアーゲート機能を制御するのは、通常
トランスフアーゲート動作制御用導体パタンとそ
れに通じる制御用電流パルスである。
One of the essential functional elements in a bubble element having a major/minor loop configuration is a function of transferring information of a minor loop to a major line with good controllability or a function of transferring information on a major line to a minor loop with good controllability. The elements that perform these functions are usually called transfer gates.
The transfer gate function is normally controlled by a conductor pattern for controlling the transfer gate operation and a control current pulse connected thereto.

従来のトランスフアーゲート制御用導体パタン
は、スミス等によつて1973年9月にアイ・イーイ
ー・イー・トランザクシヨン・オン・マグネテイ
クス誌第9巻第3号※285頁〜289頁(J.L.
Smithet al、IEEE Trans.on Mogn.MAG−9
(No.3)、285(1973))で発表されているような蛇
行した形状が一般的であつた。この様な蛇行導体
パタン寸法は、概ね、磁気バブルの直径程度であ
ることが一般的とされてきた。
The conventional conductor pattern for transfer gate control was described in September 1973 by Smith et al.
Smithet al, IEEE Trans.on Mogn.MAG−9
(No. 3), 285 (1973)) was common. It has generally been said that the size of such a meandering conductor pattern is approximately the diameter of a magnetic bubble.

磁気バブル素子の情報記憶容量を大きくするた
めに、小さな磁気バブルが用いられる様になる
と、それに応じて磁気バブルの転送パタンも小さ
くする必要がある。これに併ない、トランスフア
ーゲート動作制御用導体パタン寸法も細く、小さ
くする必要がある。しかし乍ら、導体パタンは通
常光学的リゾグラフイー技術で製造されている
が、このような光学的リゾグラフイーの技術で
は、2μm以下のパタンを形成することは、きわ
めて難しい。
When small magnetic bubbles are used to increase the information storage capacity of magnetic bubble elements, the transfer pattern of the magnetic bubbles must be made smaller accordingly. Along with this, the dimensions of the conductor pattern for controlling the transfer gate operation must also be made thinner and smaller. However, although conductor patterns are usually manufactured using optical lithography technology, it is extremely difficult to form patterns of 2 μm or less using such optical lithography technology.

本発明の目的は、このような欠点を取り除いた
トランスフアーゲート動作制御用導体パタンを有
する磁気バブル素子を提供することにある。
An object of the present invention is to provide a magnetic bubble element having a conductor pattern for controlling transfer gate operation, which eliminates such drawbacks.

次に本発明を従来例と比較しつつ、図面を用い
て詳細に説明する。本発明は第1図に示す様に磁
気バブルを保持し得るバブル磁区材料1とそのバ
ブル磁区材料上に設けた第1の磁気バブル転送路
2と、その近傍に設けた第2の磁気バブル転送路
3と第1の転送路2と第2の転送路3の間に設け
たトランスフアーゲート動作制御用導体パタン4
から構成される磁気バブル素子である。
Next, the present invention will be explained in detail using the drawings while comparing it with a conventional example. As shown in FIG. 1, the present invention comprises a bubble magnetic domain material 1 capable of holding magnetic bubbles, a first magnetic bubble transfer path 2 provided on the bubble magnetic domain material, and a second magnetic bubble transfer path provided in the vicinity thereof. conductor pattern 4 for controlling the transfer gate operation provided between the first transfer path 2 and the second transfer path 3;
It is a magnetic bubble element composed of.

次に、従来の磁気バブル素子におけるトランス
フアーゲート動作制御用導体パタンについて第2
図を用いて、もう少し詳しく説明する。従来の制
御用導体パタン4は、一般に図に示す様に磁気バ
ブルの直径程度の巾をもつ導体が蛇行して形成さ
れている。その具体的な形状は第2図よりも複雑
である場合が多い。この導体パタンを用いてゲー
ト動作を制御するには、ゲート動作制御電流60
を通じてやる。このときパタンのスリツトを形成
した部分41の5の部分には、磁気バブルを吸引
する方向のバイアス磁場成分が発生し、他のスリ
ツト状42の5′の部分には磁気バブルを反撥す
る方向のバイアス磁場成分が発生する。この発生
磁場を用いて磁気バブルを吸引又は反撥すること
で磁気バブルの転送方向を制御することができ
る。
Next, we will discuss the conductor pattern for controlling the transfer gate operation in the conventional magnetic bubble element in the second section.
This will be explained in more detail using figures. The conventional control conductor pattern 4 is generally formed of a meandering conductor having a width approximately equal to the diameter of a magnetic bubble, as shown in the figure. The specific shape is often more complicated than that shown in FIG. To control the gate operation using this conductor pattern, the gate operation control current 60
I'll do it through. At this time, a bias magnetic field component is generated in the direction 5 of the slit-formed part 41 of the pattern in the direction of attracting magnetic bubbles, and in the 5' part of the other slit-shaped part 42, the bias magnetic field component is generated in the direction of repelling the magnetic bubble. A bias magnetic field component is generated. By attracting or repelling the magnetic bubbles using this generated magnetic field, the transfer direction of the magnetic bubbles can be controlled.

情報記憶容量を大きくするために磁気バブルを
小さくし、記憶密度を大きくすると、それに比例
して磁気バブルの転送路パタンも小さくする必要
があり、更にそれに従つて、ゲート動作制御用導
体パタンも細く、くり返し周期を短くする必要が
あることは、前述の通りであるが、導体巾は、あ
まり細くは出来ない。何故なら、細くすると抵抗
値が増大し、消費電力が大きくなると同時に過電
流に対する導体断線に対して弱くなるからであ
る。しかも、例えば直径1μmの磁気バブルデバ
イスの場合、このトランスフアーゲート周期は、
ほぼ8μmである。
If we make the magnetic bubble smaller and increase the storage density in order to increase the information storage capacity, the transfer path pattern of the magnetic bubble must also be made smaller in proportion to that, and the conductor pattern for gate operation control must also be made thinner accordingly. As mentioned above, it is necessary to shorten the repetition period, but the conductor width cannot be made very thin. This is because when the conductor is made thinner, the resistance value increases, power consumption increases, and at the same time, the conductor becomes vulnerable to disconnection due to overcurrent. Moreover, for example, in the case of a magnetic bubble device with a diameter of 1 μm, this transfer gate period is
It is approximately 8 μm.

8μm周期で蛇行パタンを作るとパタン巾が2
μmスリツト部が2μm、またはパタン巾が3μ
m、スリツト部が1μmのような構成が考えられ
るが、現在の光学露光技術では2μm以下のパタ
ンを作ることは、かなり困難なことである。
When a meandering pattern is created with a period of 8 μm, the pattern width is 2.
μm slit part is 2μm or pattern width is 3μm
A configuration in which the size of the slit portion is 1 μm is conceivable, but with the current optical exposure technology, it is quite difficult to create a pattern of 2 μm or less.

第3図は本発明を説明する第1の実施例の図で
ある。本発明は導体中の電流分布は、トータルの
電気抵抗が最小になる様に分布する基本原理に基
くものである。第3図の導体パタン4にはスリツ
ト状部分43が櫛状を呈する様に設けられてい
る。この導体に電流を通じると、電流の流れ61
は、スリツト状部分43に挾まれた巾の広い導体
部70に拡がつて分布することによつて全抵抗を
下げようとするスリツト43の部分5の近傍での
電流分布は丁度第2図と同じ様になる。これに伴
ない発生する磁場分布も第2図と同様になる。
FIG. 3 is a diagram of a first embodiment illustrating the present invention. The present invention is based on the basic principle that the current distribution in a conductor is such that the total electrical resistance is minimized. The conductor pattern 4 shown in FIG. 3 is provided with a slit-like portion 43 so as to have a comb shape. When a current is passed through this conductor, the current flow 61
The current distribution in the vicinity of the portion 5 of the slit 43, which attempts to lower the total resistance by spreading and distributing over the wide conductor portion 70 sandwiched between the slit portions 43, is exactly as shown in Fig. 2. It will be the same. The magnetic field distribution generated along with this is also similar to that shown in FIG.

従つて、この磁場分布をもちいて磁気バブルの
転送路の切り換え制御が可能となる。
Therefore, using this magnetic field distribution, switching control of the magnetic bubble transfer path becomes possible.

本実施例に係るゲート動作制御用導体パタンは
1μm直径の磁気バブルを用いた磁気バブル素子
に対しては、前述のように約8μm周期でスリツ
ト状部分を設けるだけでよい。従つて、寸法精度
的には充分に余裕のある形状にすることが出来
る。例えば、2μm巾のスリツト部43を設けれ
ば、巾広の導体部70は6μmの寸法である。こ
れは現在の光学露光技術で充分に制作し得る寸法
である。
For a magnetic bubble element using magnetic bubbles with a diameter of 1 .mu.m, the gate operation control conductor pattern according to this embodiment only needs to be provided with slit-like portions at a period of about 8 .mu.m as described above. Therefore, it is possible to form a shape with sufficient margin in terms of dimensional accuracy. For example, if the slit portion 43 is provided with a width of 2 μm, the width of the wide conductor portion 70 is 6 μm. This is a size that can be sufficiently produced using current optical exposure technology.

第4図には、本発明の第2の実施例に係るゲー
ト動作制御用導体パタンを示す。本導体パタンは
基本的には、第3図に示す第1の実施例に係る導
体パタンと同じである。ただ、巾広導体部70に
スリツト部43の切れ込みと逆方向にパタンの欠
損部44を設けてある点が相違している。パタン
欠損部44が存在することによつて、導体パタン
4に電流を通じたとき、その電流分布は巾広パタ
ン部70に、より多くの電流が分布するようにな
る。このためスリツト部44の部分5での磁場発
生はより効率的となる。
FIG. 4 shows a gate operation control conductor pattern according to a second embodiment of the present invention. This conductor pattern is basically the same as the conductor pattern according to the first embodiment shown in FIG. However, the difference is that the wide conductor portion 70 is provided with a cutout portion 44 in the pattern in the opposite direction to the notch of the slit portion 43. Due to the presence of the pattern missing portion 44, when a current is passed through the conductor pattern 4, more current is distributed in the wide pattern portion 70. Therefore, the magnetic field generation in the portion 5 of the slit portion 44 becomes more efficient.

以上述べた様に、本発明に係るゲート動作制御
用導体パタンを用いれば、微少磁気バブルを用い
た高密度磁気バブル素子に於いても、パタン寸法
が大きく、パタン制作が容易な導体パタンを有す
る磁気バブル素子が実現することになる。
As described above, if the conductor pattern for gate operation control according to the present invention is used, even in a high-density magnetic bubble element using minute magnetic bubbles, the conductor pattern has a large pattern size and is easy to manufacture. A magnetic bubble element will be realized.

更に、以上の説明に於いては、主として磁気バ
ブルのゲート動作としてトランスフアーゲート動
作について述べてきたが、リプリケーター動作や
スワツプゲート動作に対する制御導体パタンとし
ても本発明に係る導体パタンを用いることが出来
るのは言うまでもない。
Further, in the above explanation, the transfer gate operation has been mainly described as the gate operation of the magnetic bubble, but the conductor pattern according to the present invention can also be used as a control conductor pattern for the replicator operation or the swap gate operation. Needless to say.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の構成を示す概略図、第2図は
トランスフアーゲート動作制御用導体パタンの従
来例を示す図、第3図は本発明の第1の実施例に
係るトランスフアーゲート動作制御用導体パタン
を示す図、第4図は本発明の第2の実施例に係る
トランスフアーゲート動作制御用導体パタンを示
す図である。 1はバブル磁区材料、2は第1の磁気バブル転
送路、3は第2の磁気バブル転送路、4はトラン
スフアーゲート動作制御用導体パタン、41,4
2,43は導体のスリツト状部分、44はパタン
欠損部分、5,5′は磁場発生部分、60,6
1,62は導体中の電流分布、70は導体パタン
の巾広部分で表わす。
FIG. 1 is a schematic diagram showing the configuration of the present invention, FIG. 2 is a diagram showing a conventional example of a conductor pattern for controlling transfer gate operation, and FIG. 3 is a diagram showing the transfer gate operation according to the first embodiment of the present invention. FIG. 4 is a diagram showing a conductor pattern for controlling a transfer gate operation according to a second embodiment of the present invention. 1 is a bubble magnetic domain material, 2 is a first magnetic bubble transfer path, 3 is a second magnetic bubble transfer path, 4 is a conductor pattern for controlling transfer gate operation, 41, 4
2 and 43 are slit-shaped portions of the conductor, 44 are pattern missing portions, 5 and 5' are magnetic field generation portions, 60 and 6
1 and 62 represent the current distribution in the conductor, and 70 represents the wide portion of the conductor pattern.

Claims (1)

【特許請求の範囲】[Claims] 1 磁気バブルを保持し得るバブル磁区材料上
に、磁気バブルを転送し得る第1の磁気バブル転
送路、その近傍に設けられた第2の磁気バブル転
送路及び磁気バブルの転送路を前記第1の転送路
から第2の転送路へ、または第2の転送路から第
1の転送路へと切り換えるトランスフアーゲート
動作制御用導体パターンを少くとも備えた磁気バ
ブル素子に於いて前記トランスフアーゲート動作
制御用導体パターンの形状が櫛状であることを特
徴とする磁気バブル素子。
1. On a bubble magnetic domain material capable of holding magnetic bubbles, a first magnetic bubble transfer path capable of transferring magnetic bubbles, a second magnetic bubble transfer path provided in the vicinity thereof, and a magnetic bubble transfer path The transfer gate operation is performed in a magnetic bubble element comprising at least a conductor pattern for controlling transfer gate operation for switching from the transfer path to the second transfer path or from the second transfer path to the first transfer path. A magnetic bubble element characterized in that a control conductor pattern has a comb-like shape.
JP8537480A 1980-06-24 1980-06-24 Magnetic bubble element Granted JPS5712474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8537480A JPS5712474A (en) 1980-06-24 1980-06-24 Magnetic bubble element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8537480A JPS5712474A (en) 1980-06-24 1980-06-24 Magnetic bubble element

Publications (2)

Publication Number Publication Date
JPS5712474A JPS5712474A (en) 1982-01-22
JPS6245631B2 true JPS6245631B2 (en) 1987-09-28

Family

ID=13856935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8537480A Granted JPS5712474A (en) 1980-06-24 1980-06-24 Magnetic bubble element

Country Status (1)

Country Link
JP (1) JPS5712474A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2613196B2 (en) * 1986-06-02 1997-05-21 株式会社日立製作所 Magnetic bubble memory device

Also Published As

Publication number Publication date
JPS5712474A (en) 1982-01-22

Similar Documents

Publication Publication Date Title
US3967002A (en) Method for making high density magnetic bubble domain system
US5982658A (en) MRAM design to reduce dissimilar nearest neighbor effects
US3832701A (en) Transfer circuit for single wall domains
JPS6245631B2 (en)
US4528645A (en) Magnetic bubble memory device
US3500344A (en) Superconductor data storage device
US4200924A (en) Logical operation circuit using magnetic bubbles
US4494216A (en) Magnetic bubble memory device
JPS5911985B2 (en) Bubble domain exchange circuit
US4156937A (en) Noncirculating register for bubble memory systems
US3441915A (en) Superconductive data storage device
JPS5847790B2 (en) Magnetic bubble information writing device
US4561069A (en) Magnetic bubble memory device gates
JPS5824870B2 (en) Propagation structure for moving magnetic bubble domains
JPS5916192A (en) Magnetic bubble element
JPS6150277A (en) Magnetic memory element and its manufacture
JPH01149285A (en) magnetic thin film memory element
JPH05799B2 (en)
JPS60179989A (en) Magnetic bubble transfer line
JPH03147592A (en) Magnetic storage element
JPS6346918B2 (en)
JPS592285A (en) Driving system of magnetic bubble memory
JPS6149755B2 (en)
JPS5829192A (en) Replicate transfer gate for magnetic bubble memory
JPS586575A (en) Switching circuit for magnetic bubble transfer path