JPS6247295B2 - - Google Patents
Info
- Publication number
- JPS6247295B2 JPS6247295B2 JP18266180A JP18266180A JPS6247295B2 JP S6247295 B2 JPS6247295 B2 JP S6247295B2 JP 18266180 A JP18266180 A JP 18266180A JP 18266180 A JP18266180 A JP 18266180A JP S6247295 B2 JPS6247295 B2 JP S6247295B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- image
- image forming
- development
- forming layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000011161 development Methods 0.000 claims description 100
- 229910052751 metal Inorganic materials 0.000 claims description 49
- 239000002184 metal Substances 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 47
- 239000000463 material Substances 0.000 claims description 28
- 230000009467 reduction Effects 0.000 claims description 25
- 239000003638 chemical reducing agent Substances 0.000 claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 20
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 15
- 239000011230 binding agent Substances 0.000 claims description 13
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 claims description 12
- 150000002736 metal compounds Chemical class 0.000 claims description 9
- 229910021645 metal ion Inorganic materials 0.000 claims description 7
- 239000002923 metal particle Substances 0.000 claims description 6
- 230000018109 developmental process Effects 0.000 description 87
- 239000007864 aqueous solution Substances 0.000 description 24
- 238000006722 reduction reaction Methods 0.000 description 24
- 150000003839 salts Chemical class 0.000 description 24
- 239000000243 solution Substances 0.000 description 16
- 239000003112 inhibitor Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 11
- 229910052753 mercury Inorganic materials 0.000 description 11
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 10
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 10
- 229910001385 heavy metal Inorganic materials 0.000 description 10
- -1 iron ions Chemical class 0.000 description 10
- 108010010803 Gelatin Proteins 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 239000008273 gelatin Substances 0.000 description 9
- 229920000159 gelatin Polymers 0.000 description 9
- 235000019322 gelatine Nutrition 0.000 description 9
- 235000011852 gelatine desserts Nutrition 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000007772 electroless plating Methods 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 101150003085 Pdcl gene Proteins 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- JBANFLSTOJPTFW-UHFFFAOYSA-N azane;boron Chemical compound [B].N JBANFLSTOJPTFW-UHFFFAOYSA-N 0.000 description 5
- 229910000085 borane Inorganic materials 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 5
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 5
- 239000011592 zinc chloride Substances 0.000 description 5
- 235000005074 zinc chloride Nutrition 0.000 description 5
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 239000001119 stannous chloride Substances 0.000 description 4
- 235000011150 stannous chloride Nutrition 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
- 150000001989 diazonium salts Chemical class 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 230000002401 inhibitory effect Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000001630 malic acid Substances 0.000 description 3
- 235000011090 malic acid Nutrition 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000012279 sodium borohydride Substances 0.000 description 3
- 229910000033 sodium borohydride Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- 239000011975 tartaric acid Substances 0.000 description 3
- 235000002906 tartaric acid Nutrition 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- KRPUDHQXDFRBGF-UHFFFAOYSA-N 1-azido-4-(4-azidophenyl)sulfonylbenzene Chemical compound C1=CC(N=[N+]=[N-])=CC=C1S(=O)(=O)C1=CC=C(N=[N+]=[N-])C=C1 KRPUDHQXDFRBGF-UHFFFAOYSA-N 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical compound CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 2
- SDJOUGYEUFYPLL-UHFFFAOYSA-N 4-azidobenzaldehyde Chemical compound [N-]=[N+]=NC1=CC=C(C=O)C=C1 SDJOUGYEUFYPLL-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- 235000003704 aspartic acid Nutrition 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 2
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 2
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 150000002730 mercury Chemical class 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 2
- 229940074439 potassium sodium tartrate Drugs 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000003378 silver Chemical class 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 2
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 2
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- KSCNHKPMMKUPLO-UHFFFAOYSA-N ($l^{1}-boranylamino)boron Chemical compound [B]N[B] KSCNHKPMMKUPLO-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-LNVDRNJUSA-N (3r,5r)-1,3,4,5-tetrahydroxycyclohexane-1-carboxylic acid Chemical compound O[C@@H]1CC(O)(C(O)=O)C[C@@H](O)C1O AAWZDTNXLSGCEK-LNVDRNJUSA-N 0.000 description 1
- PQMFVUNERGGBPG-UHFFFAOYSA-N (6-bromopyridin-2-yl)hydrazine Chemical compound NNC1=CC=CC(Br)=N1 PQMFVUNERGGBPG-UHFFFAOYSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- FSAONUPVUVBQHL-UHFFFAOYSA-N 1,3-bis(4-azidophenyl)prop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C=CC(=O)C1=CC=C(N=[N+]=[N-])C=C1 FSAONUPVUVBQHL-UHFFFAOYSA-N 0.000 description 1
- OQZQDGSYKKFLTE-UHFFFAOYSA-N 1-(4-azidophenyl)-3-phenylprop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C(=O)C=CC1=CC=CC=C1 OQZQDGSYKKFLTE-UHFFFAOYSA-N 0.000 description 1
- HYRIDYFBEXCCIA-UHFFFAOYSA-N 1-(4-azidophenyl)ethanone Chemical compound CC(=O)C1=CC=C(N=[N+]=[N-])C=C1 HYRIDYFBEXCCIA-UHFFFAOYSA-N 0.000 description 1
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- YKUDHBLDJYZZQS-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one Chemical compound OC1=NC(Cl)=NC(Cl)=N1 YKUDHBLDJYZZQS-UHFFFAOYSA-N 0.000 description 1
- JQPFYXFVUKHERX-UHFFFAOYSA-N 2-hydroxy-2-cyclohexen-1-one Natural products OC1=CCCCC1=O JQPFYXFVUKHERX-UHFFFAOYSA-N 0.000 description 1
- RXTHAGCVCGSZLO-UHFFFAOYSA-O 2-hydroxybenzenediazonium Chemical class OC1=CC=CC=C1[N+]#N RXTHAGCVCGSZLO-UHFFFAOYSA-O 0.000 description 1
- IQKPRZPVTQHVOY-UHFFFAOYSA-N 2-methylpentanedial Chemical compound O=CC(C)CCC=O IQKPRZPVTQHVOY-UHFFFAOYSA-N 0.000 description 1
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- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002924 oxiranes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- PVGBHEUCHKGFQP-UHFFFAOYSA-N sodium;n-[5-amino-2-(4-aminophenyl)sulfonylphenyl]sulfonylacetamide Chemical compound [Na+].CC(=O)NS(=O)(=O)C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 PVGBHEUCHKGFQP-UHFFFAOYSA-N 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/58—Processes for obtaining metallic images by vapour deposition or physical development
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
- H05K3/106—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam by photographic methods
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
本発明は物理現像により可視画像を得る型の画
像形成材料ならびにこれを用いる画像形成方法に
関する。
物理現像は、潜像をなす微細金属核を被還元性
の金属イオンと還元剤とを含む現像液(以下、し
ばしば「物理現像液」と称する)で処理して成長
した金属粒子からなる可視画像を与える過程を云
い、一般には銀画像を形成する手段として知られ
ている。
近年、銀塩の資源的有限性から、非銀塩画像形
成材料が見直されてきているが、物理現像を利用
する画像形成法として実用化されているものは、
プリント基板への導体パターン形成法があるに過
ぎない。
従来より提案されている物理現像を用いる画像
形成法としては、第2鉄イオンが光照射により第
1鉄イオンになる反応を利用して、生成した第1
鉄イオンにより貴金属イオンを還元して金属現像
核をつくり、これを物理現像する方法がある。こ
の方法に用いられる現像核形成系には、鉄―金
系、鉄―水銀系、鉄―銀系(すなわちブラウンプ
リントを与える系)などがある。
又、光還元剤として有機化合物を利用する方法
も提案されている。例えば一つの方法では、ジア
ゾスルホネートと核形成可能な水溶性水銀化合物
との組合せからなる感光剤系を使用するもので、
この系に露光すると、ジアゾスルホネートの亜硫
酸イオンが遊離し、これが一価の水銀塩を不均化
し、O価の水銀が出来、銀の物理現像液に触れさ
せると、その水銀核に銀が析出し、可視像を得
る。ジアゾスルホネートの代りに、CN-,
CNS-,NO-,S2O3 2-イオンを遊離するような感
光化合物を用いても画像が得られるとされてい
る。(特公昭37−3319号公報)
しかしながら、これらの方法は水銀を用いるこ
となどから廃液処理、操作上に問題がある。
他の方法としては、特殊なジアゾニウム塩例え
ばヒドロキシベンゼンジアゾニウム塩と核形成可
能な硝酸銀との組合せからなる、感光剤系を使用
するもので、この系に露光するとジアゾニウム塩
が分解してフエノールとなりそのフエノールの還
元力によつて銀核を形成し、銀の物理現像液に触
れさせることにより可視像を得る。これは銀を用
いる例である。
一方、すでに物理現像と感光性樹脂を組合せる
方法を発明者等は提案している。すなわちこの方
法では、感光性樹脂の塗布層に露光ならびに現像
処理を行い、選択的に樹脂を溶出させてレリーフ
像を形成するとともに、レリーフ像中に金属核を
含ましめ、次いで物理現像する。レリーフ像中に
金属核を形成するためには、例えばレリーフ像
を、まず塩化パラジウム酸性水溶液、次いで塩化
第一スズ酸性水溶液で処理して金属パラジウム核
を形成する。
この方法は、感光性樹脂自体のレリーフ・パタ
ーン形成能を使用して金属潜像をパターン化する
ものであるが、レリーフ像とするため、充分な解
像性が得られないという難点がある。
又、光還元性物質として、酸化チタン(米国特
許第2738272号、同第2929709号各明細書)、アン
スラキノン(米国特許第2504593号明細書)、塩化
スズ(Plating58,786(1971))などを使用する
方法も知られ、実用化されているが、これらはい
ずれもプリント基板へのパターン形成法として利
用されるに過ぎない。
酸化チタンを用いた場合、非画像部が透明なも
のが得られない点があり、アンスラキノン―2,
6―ジスルホン酸ナトリウムを用いたものはすで
にプリント基板作製に実用化されているがこれは
ギ酸銅、グルコン酸銅のような二価の銅塩と塩化
ニツケル、塩化コバルト硫酸鉄との組合せに限ら
れている。又塩化スズを使用した場合、塩化第1
スズが大気中の酸素によつて容易に酸化され、寿
命が短いこと、感光波長が250nm付近でパワーの
ある光源が利用出来ないことなどの問題点があ
る。
本発明の目的は、物理現像を利用しつつ、上記
した従来の画像形成方法とは異なる原理で働く新
規な画像形成方法とこれに用いる画像形成材料を
提供することにある。
本発明者等は上述の目的で種々の検討の結果、
金、白金パラジウム、銀、鉄、銅などの金属の核
を現像核とする物理現像がそれ自体光分解性であ
るジアゾ基又はアジド基を持つ化合物により効果
的に抑制されることを見出した。
この現像の機構については明確ではないがジア
ゾ基又はアジド基を持つ化合物自体或いはこれら
の化合物の物理現像液処理によつて得られた反応
生成物により物理現像が効果的に抑制されると推
定できる。この物理現像液処理によつて得られた
化合物の構造は明確ではないが、物理現像後には
ジアゾ又はアジド基を持つ化合物が光によつて分
解をしない点からみて、何らかの化学的変化をお
こしているものと推定される。
本発明の画像形成材料は、上述の知見に基づく
ものであり、より詳しくは、支持体上に画像形成
層を設けてなり、該画像形成層が、還元されて金
属現像核となる金属化合物とジアゾ基又はアジド
基を有する化合物とを含有する親水性バインダー
層からなることを特徴とするものである。
上記画像形成材料は、その画像形成層につい
て、還元による金属現像核の形成工程、パターン
露光工程ならびに物理現像工程を実施することに
より可視画像を与える。しかして、その金属現像
核の形成には、露光は本質的に関与しない。すな
わち、金属現像核の形成のための還元処理は、露
光工程の前または後のいずれに行つてもよい。
したがつて本発明の画像形成方法の第1は、上
記画像形成材料の画像形成層に、パターン露光を
行い、その後、該画像形成層を還元剤と接触させ
て画像形成核を形成する第1現像工程(金属現像
核形成工程)と、該画像形成層を被還元性の金属
イオンと還元剤とを含む物理現像液と接触させて
露光部に金属現像核を中心として前記被還元性の
金属イオンの還元により析出成長した金属粒子か
らなる画像を形成する第2現像工程(物理現像工
程)とを実施することを特徴とするものである。
この場合、第1現像工程と第2現像工程とは、反
応機構的には逐次に進むものと考えられるが、操
作的には、この順序で逐次に行つてもよいし、物
理現像液中に比較的強い還元剤を用いることによ
り実質的に同時に行うことも可能である。
また、本発明の画像形成方法の第2は、上記画
像形成材料の画像形成層に、まず還元剤を接触さ
せて画像形成層中に金属現像核を形成し、次いで
パターン露光を行い、更に物理現像液と接触させ
て画像を形成することを特徴とするものである。
本発明の画像形成方法におけるパターン露光工
程は、画像形成層の露光部において、選択的に物
理現像抑制剤としてのジアゾ基又はアジド基を有
する化合物を分解して、その物理現像抑制効果を
奪う効果を有する。したがつて、その後の物理現
像に際しては、金属現像核の存在のもとに、物理
現像液中の金属イオンが金属として析出成長す
る。これに対し、非露光部では、このような金属
の析出成長が起らず、結果的に露光部に選択的に
成長した金属粒子からなる可視画像が得られる。
このように、従来は、露光工程において金属現像
核を発生させていたのに対して、本発明では金属
現像核は露光とは無関係に還元により発生させ、
露光工程では物理現像抑制剤の分解を行う点に本
発明の画像形成法の最大の特徴がある。
ジアゾ基又はアジド基を有する化合物又は物理
現像液処理後の化合物(以下、「現像抑制剤」と
総称する)の物理現像抑制効果は、以下に述べる
現象から明らかである。
イ 本発明の画像形成層から、現像抑制剤を除い
たものに、還元処理して金属現像核を形成後、
露光を行わずに物理現像処理を行つた場合に
は、全面で物理現像が行われる。
ロ 現像抑制剤を含む本発明の画像形成層に露光
を行わずに還元処理および物理現像処理を行つ
た場合には物理現像効果が得られない。
ハ 本発明の画像形成層にまず還元処理を行い、
次いでパターン露光および物理現像処理を行つ
た場合(すなわち、本発明の第2の画像形成法
を実施した場合)にも所望の画像が得られる。
ニ 本発明の画像形成層に、パターン露光、還元
処理および物理現像処理を逐次に行つた場合
(すなわち本発明の第1の画像形成法の典型的
な態様を実施した場合)には所望の画像が得ら
れる。
ホ 本発明の画像形成層に、パターン露光および
物理現像処理を行つて、金属現像核発生のため
の還元処理を別個に行わなかつた場合には、物
理現像処理が同時に金属化合物を還元して金属
現像核を形成できる程度に強い還元剤を含むと
きのみ所望の画像が得られる。
上述したジアゾ基又はアジド基或いは現像液処
理後の化合物を有する化合物の物理現像抑制効果
は、本発明者らが初めて見出したものである。な
お、本発明で云う金属現像核は、安定的に形成さ
れた微細な金属粒子であり、それ自体は肉眼では
不可視であるが、既に物理現像核として作用する
ものである。
以下、本発明を更に詳細に説明する。以下の記
載において、「%」および「部」は、特に断らな
い限り重量基準とする。
第1図は本発明の画像形成材料の一実施例を概
念的に示す、その厚み方向断面図である。
第1図に一例を示すように、本発明の画像形成
材料Aは、支持体1上に、画像形成層2を設けて
なる。
支持体1としては、ガラス、木、紙、プラスチ
ツクフイルム、織布、不織布等の任意の固体材料
が用いられるが、なかでもポリエステルフイル
ム、トリアセテートフイルムなどのプラスチツク
フイルムが特に好ましく用いられる。これら支持
体1には、必要に応じて、コロナ放電処理、プラ
イマー処理などの接着性改良のための前処理をし
てから、画像形成層2を設ける。
画像形成層2は、親水性バインダー層中に、還
元されて金属現像核となる金属化合物および現像
抑制剤を分散、好ましくは溶解させてなる。
バインダーとしては、たとえば、ゼラチン、カ
ゼイン、グルー、アラビアゴム、セラツクなどの
天然高分子、カルボキシメチルセルロース、卵白
アルブミン、ポリビニルアルコール(部分ケン化
ポリ酢酸ビニル)、ポリアクリル酸、ポリアクリ
ルアミド、ポリビニルピロリドン、ポリエチレン
オキシド、無水マレイン酸共重合体などが用いら
れるが、水溶性ないし親水性樹脂である限りにお
いて、上記以外のものも使用可能である。バイン
ダーに必要な親水性の程度は、画像形成層2を形
成して、物理現像液と接触させるときに、物理現
像液が画像形成層2に浸透して物理現像が可能と
なる程度である。
還元されて金属現像核を与える金属化合物とし
ては、パラジウム、金、銀、白金、銅等の貴なる
金属の塩化物、硝酸塩などの水溶性塩、たとえば
無電解メツキのアクチベーター液中に含まれる塩
化パラジウム、硝酸銀、4塩化水素金などの水溶
性塩が用いられる。なかでもパラジウム、金、白
金、銅の水溶性塩、特にパラジウムの水溶性塩が
好ましく用いられる。
画像形成層2は、好ましくは上述した金属化合
物の水溶液(市販される無電解メツキ用のアクチ
ベーター液をそのまま用いることができる)を、
現像抑制剤とともにバインダー水溶液と混合し
て、塗布に適した粘度10〜1000センチポイズ程度
の液とし、これを支持体1上に塗布し、乾燥する
ことにより、通常0.1〜30μの塗膜として得られ
る。溶媒としては上述した水以外にも、水と低級
アルコール、ケトン、エーテル等の水混和性溶媒
との混合溶媒も用いられる。
現像抑制剤として用いるジアゾ基又はアジド基
を有する化合物としては、たとえば、ジアゾ基を
有するものとして、ジアゾ基を有する水溶性の塩
化亜鉛複塩、硫酸塩、リン酸塩あるいはこれらか
ら得られるジアゾ樹脂が好ましく用いられる。よ
り具体的には、p―N,N―ジエチルアミノベン
ゼンジアゾニウムクロリド塩化亜鉛複塩、p―N
―エチル―N―β―ヒドロキシエチルアミノベン
ゼンジアゾニウムクロリド塩化亜鉛複塩、p―
N,N―ジメチルアミノベンゼンジアゾニウムク
ロリド塩化亜鉛複塩、4―モルフオリノベンゼン
ジアゾニウムクロリド塩化亜鉛複塩、4―モルフ
オリノ―2,5―ジエトキシベンゼンジアゾニウ
ムクロリド塩化亜鉛複塩、4―モルフオリノ―
2,5―ジブトキシベンゼンジアゾニウムクロリ
ド塩化亜鉛複塩、4―ベンゾイルアミノ―2,5
―ジエトキシベンゼンジアゾニウムクロリド塩化
亜鉛複塩、4―(4′―メトキシベンゾイルアミ
ノ)―2,5―ジエトキシベンゼンジアゾニウム
クロリド塩化亜鉛複塩、4―(p―トルイルメル
カプト)―2,5―ジメトキシベンゼンジアゾニ
ウムクロリド塩化亜鉛複塩、4―ジアゾジフエニ
ルアミン塩化亜鉛複塩、4―ジアゾ―4′―メトキ
シジフエニルアミン塩化亜鉛複塩、4―ジアゾ―
3―メトキシ―ジフエニルアミン塩化亜鉛複塩、
上記塩化亜鉛複塩に対応する硫酸塩ならびにリン
酸塩など、ならびにこれらジアゾニウム化合物と
パラホルムアルデヒドの反応生成物であるジアゾ
樹脂などが好適に使用できる。またアジド化合物
としては、例えば、p―アジドベンザルアルデヒ
ド、p―アジドアセトフエノン、p―アジド安息
香酸、p―アジドベンザルアセトフエノン、p―
アジドベンザルアセトン、4,4′―ジアジドカル
コン、2,6―ビス―(4′―アジドベンザル)―
アセトン、4,4′―ジアジドスチルベン―2,
2′―ジスルホン酸、p―アジドベンゾイルクロリ
ド、3―アジド無水フタル酸、4,4′―ジアジド
ジフエニルスルホン、p―アジド桂皮酸、4,
4′―ジアジドベンゾイルアセトン―2,2′―スル
ホン酸ナトリウムなどが用いられる。
また、現像抑制剤としては、水溶性でジアゾ基
またはアジド基を有する限りにおいて上記以外の
化合物を用いることもできる。
画像形成層2中には、上記したバインダー100
部に対して:金属化合物を0.1〜100部、特に1〜
10部、現像抑制剤を1〜100部、特に20〜50部の
割合で含ませることが好ましい。
画像形成層2を形成後、物理現像処理中の現像
液へのバインダーの溶出を抑制するため、望まし
くは硬膜処理を行う。硬膜処理は、例えば下記の
化合物を画像形成層2の形成用塗布液中にバイン
ダー100部に対してたとえば0.1〜50部の割合で混
合するか、あるいはその水溶液を画像形成層上に
塗布することにより行われる:
カリ明バン、アンモニウム明バン等のAl化合
物;クロム明バン、硫酸クロム等のCr化合物;
ホルムアルデヒド、グリオキザル、グルタルアル
デヒド、2―メチルグルタルアルデヒド、サクシ
ナルデヒド等のアルデヒド類;O―ベンゾキノ
ン、p―ベンゾキノン、シクロヘキサン―1,2
―ジオン、シクロペンタン―1,2―ジオン、ジ
アセチル、2,3―ペンタンジオン、2,5―ヘ
キサンジオン、2,5―ヘキセンジオン等のジケ
トン;トリグリシジルイソシアヌル酸塩などのエ
ポキシド;テトラフタロイルクロリド、4,4′―
ジフエニルメタンジスルフオニルクロリド、4,
4′―ジフエニルメタンジスルフオニルクロリドな
どの酸無水物;タンニン酸、没食子酸、2,4―
ジクロロ―6―ヒドロキシ―S―トリアジン、な
らびに一般式 R2NPOX2、(R2N)oPOX3-o、
The present invention relates to an image forming material of the type that obtains a visible image by physical development, and an image forming method using the same. Physical development is a visible image made of metal particles grown by treating fine metal nuclei forming a latent image with a developer containing reducible metal ions and a reducing agent (hereinafter often referred to as "physical developer"). It is generally known as a means of forming silver images. In recent years, non-silver salt image forming materials have been reconsidered due to the limited resources of silver salts, but the ones that have been put into practical use as image forming methods that utilize physical development are:
There is only a method for forming conductor patterns on printed circuit boards. An image forming method using physical development that has been proposed so far utilizes the reaction of ferric ions to become ferrous ions when irradiated with light.
There is a method of reducing noble metal ions with iron ions to create metal development nuclei and physically developing them. Development nucleation systems used in this method include iron-gold systems, iron-mercury systems, and iron-silver systems (that is, systems that give brown prints). Furthermore, a method using an organic compound as a photoreducing agent has also been proposed. For example, one method uses a photosensitizer system consisting of a combination of a diazosulfonate and a nucleating water-soluble mercury compound;
When exposed to this system, the sulfite ion of the diazosulfonate is liberated, which disproportionates the monovalent mercury salt to form O-valent mercury, and when exposed to a physical silver developer, silver precipitates from the mercury nucleus. and obtain a visible image. Instead of diazosulfonate, CN - ,
It is said that images can also be obtained using photosensitive compounds that liberate CNS - , NO - , and S 2 O 3 2- ions. (Japanese Patent Publication No. 37-3319) However, since these methods use mercury, there are problems in waste liquid treatment and operation. Another method is to use a photosensitive system consisting of a combination of a special diazonium salt, such as a hydroxybenzenediazonium salt, and nucleating silver nitrate; upon exposure to this system, the diazonium salt decomposes to form a phenol. A silver nucleus is formed by the reducing power of phenol, and a visible image is obtained by contacting it with a physical silver developer. This is an example using silver. On the other hand, the inventors have already proposed a method of combining physical development and photosensitive resin. That is, in this method, a coated layer of photosensitive resin is exposed and developed, the resin is selectively eluted to form a relief image, metal nuclei are included in the relief image, and then physical development is performed. In order to form metal nuclei in the relief image, for example, the relief image is first treated with an acidic aqueous solution of palladium chloride and then with an acidic aqueous solution of stannous chloride to form metal palladium nuclei. This method uses the relief pattern forming ability of the photosensitive resin itself to pattern a metal latent image, but since it is a relief image, it has the disadvantage that sufficient resolution cannot be obtained. In addition, as photoreducing substances, titanium oxide (U.S. Patent Nos. 2738272 and 2929709), anthraquinone (U.S. Patent No. 2504593), tin chloride (Plating 58 , 786 (1971)), etc. Methods using the above are also known and have been put into practical use, but all of these methods are only used as methods for forming patterns on printed circuit boards. When titanium oxide is used, it is difficult to obtain a transparent non-image area, and anthraquinone-2,
Sodium 6-disulfonate has already been put to practical use in the production of printed circuit boards, but this is limited to combinations of divalent copper salts such as copper formate and copper gluconate with nickel chloride, cobalt chloride, and iron sulfate. It is being Also, when using tin chloride, stannous chloride
Problems include that tin is easily oxidized by oxygen in the atmosphere, has a short lifespan, and that a powerful light source cannot be used because the photosensitive wavelength is around 250 nm. An object of the present invention is to provide a novel image forming method that utilizes physical development and operates on a principle different from the conventional image forming methods described above, and an image forming material used therein. As a result of various studies for the above-mentioned purpose, the present inventors have
It has been found that physical development using metal nuclei such as gold, platinum palladium, silver, iron, and copper as development nuclei can be effectively suppressed by a compound having a diazo group or an azide group that is itself photodegradable. Although the mechanism of this development is not clear, it can be assumed that the physical development is effectively suppressed by the compounds themselves having diazo groups or azide groups or by the reaction products obtained by treating these compounds with physical developers. . Although the structure of the compound obtained by this physical developer treatment is not clear, it is likely that some chemical change occurs, considering that compounds with diazo or azide groups are not decomposed by light after physical development. It is estimated that there are. The image-forming material of the present invention is based on the above-mentioned findings, and more specifically, the image-forming material is formed by providing an image-forming layer on a support, and the image-forming layer contains a metal compound that is reduced to become a metal development nucleus. It is characterized by comprising a hydrophilic binder layer containing a compound having a diazo group or an azide group. The above image forming material provides a visible image by subjecting the image forming layer to a step of forming metal development nuclei by reduction, a pattern exposure step, and a physical development step. Therefore, exposure is essentially not involved in the formation of metal development nuclei. That is, the reduction treatment for forming metal development nuclei may be performed either before or after the exposure step. Therefore, the first image forming method of the present invention is a first step of exposing the image forming layer of the image forming material in a pattern, and then bringing the image forming layer into contact with a reducing agent to form image forming nuclei. A developing step (metal development nucleus formation step) is performed in which the image forming layer is brought into contact with a physical developer containing reducible metal ions and a reducing agent to form the reducible metal in the exposed area centering around the metal development nuclei. This method is characterized by carrying out a second development step (physical development step) in which an image is formed of metal particles precipitated and grown by reduction of ions.
In this case, the first development step and the second development step are considered to proceed sequentially in terms of reaction mechanism, but operationally, they may be carried out sequentially in this order, or they may be carried out in a physical developer. It is also possible to carry out substantially simultaneously by using a relatively strong reducing agent. The second image forming method of the present invention is to first contact the image forming layer of the image forming material with a reducing agent to form metal development nuclei in the image forming layer, then perform pattern exposure, and then physically It is characterized by forming an image by contacting it with a developer. The pattern exposure step in the image forming method of the present invention has the effect of selectively decomposing a compound having a diazo group or an azide group as a physical development inhibitor in the exposed area of the image forming layer to remove its physical development inhibitory effect. has. Therefore, during the subsequent physical development, metal ions in the physical developer precipitate and grow as metals in the presence of metal development nuclei. On the other hand, in the non-exposed areas, such precipitation and growth of metal does not occur, and as a result, a visible image consisting of metal particles selectively grown in the exposed areas is obtained.
In this way, conventionally, metal development nuclei were generated during the exposure process, but in the present invention, metal development nuclei are generated by reduction regardless of exposure,
The most distinctive feature of the image forming method of the present invention is that the physical development inhibitor is decomposed in the exposure step. The physical development inhibiting effect of a compound having a diazo group or an azide group or a compound treated with a physical developer (hereinafter collectively referred to as a "development inhibitor") is clear from the phenomenon described below. B. After the image forming layer of the present invention from which the development inhibitor has been removed is subjected to reduction treatment to form metal development nuclei,
When physical development is performed without exposure, physical development is performed on the entire surface. (b) If the image forming layer of the present invention containing a development inhibitor is subjected to reduction treatment and physical development treatment without being exposed to light, no physical development effect can be obtained. C. First, the image forming layer of the present invention is subjected to a reduction treatment,
A desired image can also be obtained when pattern exposure and physical development are then carried out (that is, when the second image forming method of the present invention is carried out). (d) When the image forming layer of the present invention is sequentially subjected to pattern exposure, reduction treatment, and physical development treatment (that is, when a typical embodiment of the first image forming method of the present invention is carried out), a desired image is formed. is obtained. (e) When pattern exposure and physical development are performed on the image forming layer of the present invention, and reduction treatment for generating metal development nuclei is not separately performed, the physical development treatment simultaneously reduces the metal compound and the metal. A desired image can be obtained only when the reducing agent is strong enough to form development nuclei. The physical development inhibiting effect of a compound having the above-mentioned diazo group or azide group or a compound treated with a developer was discovered for the first time by the present inventors. The metal development nuclei referred to in the present invention are fine metal particles that are stably formed, and although they themselves are invisible to the naked eye, they already act as physical development nuclei. The present invention will be explained in more detail below. In the following description, "%" and "part" are based on weight unless otherwise specified. FIG. 1 is a sectional view in the thickness direction conceptually showing one embodiment of the image forming material of the present invention. As an example shown in FIG. 1, the image forming material A of the present invention comprises a support 1 and an image forming layer 2 provided thereon. As the support 1, any solid material such as glass, wood, paper, plastic film, woven fabric, non-woven fabric can be used, and among them, plastic films such as polyester film and triacetate film are particularly preferably used. These supports 1 are provided with the image forming layer 2 after being pretreated to improve adhesion, such as corona discharge treatment and primer treatment, if necessary. The image forming layer 2 is formed by dispersing, preferably dissolving, in a hydrophilic binder layer, a metal compound that is reduced to become metal development nuclei and a development inhibitor. Examples of binders include natural polymers such as gelatin, casein, glue, gum arabic, and shellac, carboxymethylcellulose, egg albumin, polyvinyl alcohol (partially saponified polyvinyl acetate), polyacrylic acid, polyacrylamide, polyvinylpyrrolidone, and polyvinyl pyrrolidone. Ethylene oxide, maleic anhydride copolymers, etc. are used, but other resins than the above can also be used as long as they are water-soluble or hydrophilic resins. The degree of hydrophilicity required for the binder is such that when the image forming layer 2 is formed and brought into contact with a physical developer, the physical developer permeates into the image forming layer 2 to enable physical development. Metal compounds that are reduced to give metal development nuclei include water-soluble salts such as chlorides and nitrates of noble metals such as palladium, gold, silver, platinum, and copper, such as those contained in the activator solution for electroless plating. Water-soluble salts such as palladium chloride, silver nitrate, and gold tetrachloride are used. Among these, water-soluble salts of palladium, gold, platinum, and copper, particularly water-soluble salts of palladium, are preferably used. The image forming layer 2 is preferably made of an aqueous solution of the metal compound mentioned above (a commercially available activator liquid for electroless plating can be used as it is),
It is mixed with a binder aqueous solution along with a development inhibitor to form a liquid with a viscosity of about 10 to 1000 centipoise suitable for coating, which is coated onto the support 1 and dried to obtain a coating film of usually 0.1 to 30 μm. . In addition to the water mentioned above, a mixed solvent of water and a water-miscible solvent such as a lower alcohol, ketone, or ether may also be used as the solvent. Examples of compounds having a diazo group or an azide group used as development inhibitors include water-soluble zinc chloride double salts, sulfates, and phosphates having a diazo group, or diazo resins obtained from these. is preferably used. More specifically, p-N,N-diethylaminobenzenediazonium chloride zinc chloride double salt, p-N
-Ethyl-N-β-hydroxyethylaminobenzenediazonium chloride zinc chloride double salt, p-
N,N-dimethylaminobenzenediazonium chloride zinc chloride double salt, 4-morpholinobenzenediazonium chloride zinc chloride double salt, 4-morpholino-2,5-diethoxybenzenediazonium chloride zinc chloride double salt, 4-morpholino-
2,5-dibutoxybenzenediazonium chloride zinc chloride double salt, 4-benzoylamino-2,5
-Diethoxybenzenediazonium chloride zinc chloride double salt, 4-(4'-methoxybenzoylamino)-2,5-diethoxybenzenediazonium chloride zinc chloride double salt, 4-(p-toluylmercapto)-2,5-dimethoxy Benzenediazonium chloride zinc chloride double salt, 4-diazodiphenylamine zinc chloride double salt, 4-diazo-4'-methoxydiphenylamine zinc chloride double salt, 4-diazo-
3-methoxy-diphenylamine zinc chloride double salt,
Sulfates and phosphates corresponding to the above zinc chloride double salt, and diazo resins which are reaction products of these diazonium compounds and paraformaldehyde can be suitably used. Examples of the azide compounds include p-azidobenzaldehyde, p-azidoacetophenone, p-azidobenzoic acid, p-azidobenzalacetophenone, and p-azidobenzaldehyde.
Azidobenzalacetone, 4,4'-diazidochalcone, 2,6-bis-(4'-azidobenzal)-
Acetone, 4,4'-diazidostilbene-2,
2'-disulfonic acid, p-azidobenzoyl chloride, 3-azido phthalic anhydride, 4,4'-diazido diphenyl sulfone, p-azido cinnamic acid, 4,
Sodium 4'-diazidobenzoylacetone-2,2'-sulfonate and the like are used. Further, as the development inhibitor, compounds other than those mentioned above can also be used as long as they are water-soluble and have a diazo group or an azide group. The image forming layer 2 contains the binder 100 described above.
part: 0.1 to 100 parts of metal compound, especially 1 to 100 parts
It is preferable to include 1 to 100 parts, particularly 20 to 50 parts of a development inhibitor. After forming the image forming layer 2, a hardening process is desirably performed in order to suppress elution of the binder into the developer during physical development. For hardening, for example, the following compound is mixed in the coating solution for forming the image forming layer 2 at a ratio of 0.1 to 50 parts per 100 parts of the binder, or an aqueous solution thereof is applied onto the image forming layer. It is carried out by: Al compounds such as potassium alum and ammonium alum; Cr compounds such as chromium alum and chromium sulfate;
Aldehydes such as formaldehyde, glyoxal, glutaraldehyde, 2-methylglutaraldehyde, succinaldehyde; O-benzoquinone, p-benzoquinone, cyclohexane-1,2
-dione, cyclopentane-1,2-dione, diketones such as diacetyl, 2,3-pentanedione, 2,5-hexanedione, 2,5-hexenedione; epoxides such as triglycidyl isocyanurate; tetraphthaloyl Chloride, 4,4'-
Diphenylmethane disulfonyl chloride, 4,
Acid anhydrides such as 4'-diphenylmethanedisulfonyl chloride; tannic acid, gallic acid, 2,4-
Dichloro-6-hydroxy-S-triazine, as well as general formulas R 2 NPOX 2 , (R 2 N) o POX 3-o ,
【式】およびR―
N=C=N―R′(ここでRは炭素2〜6のアル
キル基、R′は(CH3)3N+(CH3)3X-基、XはF又
はCl、nは1又は2)で表わされるリン化合物
又はカルボジイミド;スチレン/マレイン酸共重
合体、ビニルピロリドン/マレイン酸共重合体、
ビニルメチルエーテル/マレイン酸共重合体、エ
チレンイミン/マレイン酸共重合体、メタクリル
酸/メタクリロニトリル共重合体、ポリメタクリ
ルアミド、メタクリル酸エステル共重合体等の樹
脂類。ジカルボン酸としてグルタル酸、コハク
酸、ヒドロキシカルボン酸としてりんご酸、乳
酸、クエン酸、アスパラギン酸、グルコール酸、
酒石酸等の有機カルボン酸も使用出来る。
次に上記のようにして形成された本発明の画像
形成材料を用いて行う本発明の画像形成方法につ
いて説明する。
本発明の第一の画像形成方法に従えば、まず画
像形成層2にたとえば第2図に示すように透過原
稿3を介して、パターン露光を行う。これによ
り、露光部2Aにおいて、選択的に且つ露光量に
応じた程度に現像抑制剤を分壊させる。光源とし
ては、前記したジアゾ化合物またはアジド化合物
を分壊できる光源ならば任意のものが用いられ
る。例えば、超高圧水銀灯、高圧水銀灯、低圧水
銀灯、メタルハライド灯、アーク灯、ケミカルラ
ンプ、キセノン灯、Arレーザーなどが使用でき
る。所望の画像階調に応じて、たとえば中心波長
が405nmの紫外光を用いた場合、1w/m2〜
300w/m2の強度で10〜200秒露光すればよい。
次いでこのようにしてパターン露光により、現
像抑制剤がパターン状に分壊された潜像を有する
画像形成層2に還元剤水溶液を浸漬ないしは塗布
により接触させて画像形成層2中にほぼ一様に金
属現像核を発生させる。還元剤としては、塩化第
1スズ、硫酸第1スズ、水素化ホウ素ナトリウ
ム、ジメチルアミンボラザン、ジエチルアミンボ
ラザン、トリメチルアミンボラザン、その他ボラ
ザン誘導体、ボラン、ジボラン、メチルジボラン
等のボラン誘導体、ヒドラジン等を用いることが
できる。特に望ましくは、酸性塩化第1スズ溶
液、硫酸第1スズ溶液(Weiss液)あるいは市販
の無電解メツキ用のセンシタイザー液などが用い
られるが、一般には強力な還元剤であればすべて
使用できる。この還元処理は、還元剤の強度によ
つても異るが一般に還元剤を0.1〜50g/の濃
度で含む還元剤溶液を用い、常温ないし加温下で
10秒〜400秒程度行われる。
更に、このようにして得られた金属現像核と現
像抑制剤の選択的分解による潜像を有する画像形
成層2に、物理現像液を浸漬ないし塗布により接
触させて、露光部に金属現像核を中心として現像
液中の金属が還元により析出した第3図に示すよ
うな可視像2Bを形成する。
物理現像液としては、水溶性の被還元性重金属
塩および還元剤を含む水溶液が必要に応じて加温
した状態で使用される。
被還元性重金属塩としては、例えばニツケル、
コバルト、鉄及びクロム等のVIb族金属、銅等の
Ib族金属の水溶性塩が単独で又は混合して使用さ
れる。適当な水溶性の被還元性重金属塩として
は、例えば以下のものが用いられる。
塩化第一コバルト、ヨウ化第一コバルト、臭化
第一鉄、塩化第一鉄、臭化第二クロム、ヨウ化第
二クロメム、塩化第二銅等の重金属ハライド;硫
酸ニツケル、硫酸第一鉄、硫酸第一コバルト、硫
酸第二クロム、硫酸第二銅等の重金属硫酸塩;硝
酸ニツケル、硝酸第一鉄、硝酸第一コバルト、硝
酸第二クロム、硝酸第二銅等の重金属硝酸塩;フ
エラスアセテート、コバルタスアセテート、クロ
ミツクアセテート、キユープリツクフオルメート
等の重金属の有機酸塩。
これら被還元性重金属塩は物理現像液中に、た
とえば10〜100g/の割合で含まれる。
還元剤としては、例えば次亜リン酸、次亜リン
酸ナトリウム、水素化ホウ素ナトリウム、ヒドラ
ジン、ホルマリン、ジエチルアミンボラン、ジメ
チルアミンボラン、トリメチルアミンボラン、ボ
ラン、ジボラン、メチルジボラン、ジボラザン、
ボラゼン、ボラジン、t―ブチルアミンボラザ
ン、ピリジンボラン、2,6―ルチジンボラン、
エチレンジアミンボラン、ヒドラジンジボラン、
ジメチルホスフインボラン、フエニルホスフイン
ボラン、ジメチルアルジンボラン、フエニルアル
ジンボラン、ジメチルスチビンボラン、ジエチル
スチビンボランなどが使用できる。
これら還元剤は、物理現像液中に、たとえば
0.1〜50g/の割合で用いられる。
物理現像液中に有効な還元剤のいくつかは、金
属現像核の発生のための還元剤と重複するもので
ある。したがつて、比較的強い還元剤を含む物理
現像液を用いる場合は、露光後に金属現像核発生
のための還元処理を行わず、直接に物理現像液で
処理して、金属現像核の発生と物理現像を実質的
に同時に行うこともできる。ただし、二段階に分
けて行うと、還元反応と金属析出反応をそれぞれ
温度、反応時間で正確にコントロール出来る利点
がある。
物理現像液中には、前記した被還元性重金属塩
の溶解により生成する重金属イオンが水酸化物と
して沈澱するのを防止するために、たとえばモノ
カルボン酸;ジカルボン酸;リンゴ酸、乳酸等の
ヒドロキシカルボン酸;コハク酸、クエン酸、ア
スパラギン酸、グリコール酸、酒石酸、エチレン
ジアミンテトラ酢酸、グルコン酸、糖酸、キニン
酸等の有機カルボン酸からなる錯塩化剤の一種又
は二種以上を含ませることができる。これら錯塩
化剤は、物理現像液中にたとえば1〜100g/
の割合で用いられる。
更に、物理現像液には、現像液の保存性および
操作性ならびに得られる画像の質を改善するため
に、酸及び塩基等のPH調節剤、緩衝剤、防腐剤、
増白剤、界面活性剤などが常法に従い必要に応じ
て添加される。
次に本発明の第2の画像形成法によれば、第1
図に示したような画像形成材料に、金属現像核発
生のための還元処理、パターン露光処理、物理現
像処理をこの順序で逐次に行う。個々の処理工程
は第1の画像形成法による場合と特に異るもので
はない。この方法のように金属現像核発生のため
の還元処理を露光前に行うことは、前述したよう
に、金属現像核発生のために露光を必須とした従
来の各種方法では考えられなかつたことである。
この方法は、第1の画像形成法に比べて、露光前
に水洗乾燥が必要なため、工程が多くなるという
問題があるが、いずれも同様の画像が得られる。
このようにして、本発明の画像形成方法によれ
ば、第1の方法および第2の方法のいずれの場合
も透過光学濃度が4以上もあり必要に応じて階調
のある黒色画像が形成可能であり、現像抑制剤の
溶解液を用いるため解像力も高く、銀塩写真法に
よる画像と代替し得る画像が得られる。又、画像
は、金属画像であるため、赤血塩とチオ硫酸ナト
リウムからなるフアーマー減力液、コダツクR―
4などの減力液を用いて修正が可能である。この
ような特徴を生かして本発明法により得られる画
像材料は、リスフイルムの代替物あるいはマスク
材などとして使用可能である。また物理現像を、
たとえば第1現像をホウ素系還元剤を用いたニツ
ケルメツキ浴で、第2現像を次亜リン酸ナトリウ
ムを還元剤を用いた65℃から90℃の高温ニツケル
メツキ浴又は銅メツキで高速メツキする条件で行
えば、バインダー表面に金属光沢を持つ金属画像
を形成できる。しかも得られた画像を、たとえば
塩酸5%又は硝酸の5%水溶液で5分間処理する
ことにより非画像部のバインダーを選択的に除去
できるためプリント基板としても使用が可能であ
る。
以下、実施例により本発明をより具体的に説明
する。
実施例 1
PdCl22gを、HCl20mlとともに水1000c.c.中に溶
解し、得られたPdCl2液の20gを用いて下記組成
の感材(画像形成層形成用塗布液)を調製した。
上記組成のPdCl2液 20g
ゼラチン(新田ゼラチン製p―2151) 30%水
溶液 10g
ジアゾレジン(シンコー技研D―011) 20%
水溶液 2.5g
グルタル酸 0.12g
上記感材を30℃〜40℃に温度調整し、あらかじ
めプラズマ処理を行なつたポリエステルフイルム
(東レ・ルミラーS・100#)に塗布し乾燥して5
μの塗膜を得た。
上記で得られた感材フイルム(画像形成材料)
に超高圧水銀灯2kWプリンター(光源からの距
離100cm)を用い2分間ネガフイルムを密着露光
した。次いで30℃の下記還元浴に1分間浸漬して
還元処理した。
SnCl2 1g
HCl 40ml
H2O 100c.c.
次いで、下記組成の90℃の物理現像液で処理し
て金属を析出せしめ、黒色の画像を形成した。
塩化ニツケル 30g
次亜リン酸ナトリウム 10g
オキシ酢酸ナトリウム 50g
水 900g
同じ感材フイルムを用いて、還元浴(30℃)に
浸漬し水洗乾燥した後、超高圧水銀灯2kWプリ
ンター(光源からの距離100cm)を用い2分間ネ
ガフイルムを密着露光した。
次いで下記に組成を示す90℃の物理現像液(無
電解メツキ液)により処理を行なつて金属を析出
せしめ、黒色の画像を得た。
硫酸ニツケル 30g
次亜リン酸ナトリウム 10g
クエン酸ナトリウム 10g
水 950g
同様の感材フイルムを超高圧水銀灯2kWプリ
ンター(光源からの距離100cm)を用い2分間ネ
ガフイルムを密着して露光した。次いで特別の還
元処理を行うことなく65℃のホウ素―ニツケル系
メツキ浴(シバニツケル原液、奥野製薬製)に50
秒間浸漬し現像し乾燥した。
得られた画像は黒色で300線4%網点を解像し
た。この現像処理では還元と現像が同時に行なわ
れている。以下2つほど同様の例をあげる。
実施例 2
実施例1と同様にして感材フイルムを作成し、
ネガフイルムを介して露光した後、下記の組成の
物理現像液に30℃で2分間浸漬して現像し、黒色
画像を得た。
塩化ニツケル 0.1モル
ジメチルアミンボラン 0.1モル
コハク酸 0.5モル
NaOHでPHを7.0に調節した。
実施例 3
実施例1と同様にして感材フイルムを作成なら
びに露光し、下記の組成のA液とB液を使用直前
に1:1で混合して得た物理現像液(Narcussの
無電解メツキ浴)に22℃で10分間浸漬して現像
し、黒色画像を得た。
A 液
硫酸銅 60g/
硫酸ニツケル 15g/
硫酸ヒドラジン 45g/
B 液
硫酸化ナトリウム 45g/
酒石酸カリウムナトリウム 180g/
炭酸ナトリウム 15g/
実施例 4
実施例1と同様に作製した感材フイルムを塩酸
ヒドラジン(N2H2・HCl)を1.0mol/の割合で
含む還元浴に40℃で1分間浸漬した。
その感材フイルムを水洗乾燥し、超高圧水銀灯
2kWプリンター(光源からの距離100cm)を用い
2分間露光した。次いで下記に示す無電解メツキ
液で8分間処理をして金属光沢のある画像を得
た。
塩化ニツケル 50g/
次亜リン酸ナトリウム 10g/
クエン酸ナトリウム 10g/
同様に
実施例1の感材フイルムを、超高圧水銀灯
2kWプリンター(光源からの距離100cm)を用
い、2分間露光した。次いでN2H2・HClの
1.0mol/濃度・溶液により40℃で1分間処理
し、更に下記の組成でPH5.5の無電解メツキ液に
より21℃で2分間処理した。
次亜リン酸ニツケル 26g/
ホウ酸 12g/
硫酸アンモニウム 2.6g/
酢酸ナトリウム 20g/
以上の操作により均一で黒色の画像を得た。
実施例 5
実施例1と同様にして作製したPdCl2塩酸水溶
液を用い下記の組成にて感材を調製し、以下、実
施例1と同様にしてポリエステルフイルム上に塗
布し、乾燥して感材フイルムを作製した。
PdCl2塩酸水溶液(日本カニゼン) 20g
ゼラチン(新田ゼラチン製p―2151) 30%水
溶液 10g
ジアゾレジン(シンコー技研D―011) 20%
水溶液 2.5g
グルタルアルデヒド 50%水溶液 0.05g
この感材フイルムに超高圧水銀灯2kWプリン
ター(光源からの距離100cm)を用い2分間ネガ
フイルムを密着露光し、次いで65℃のホウ素―ニ
ツケルメツキ浴(シバニツケル原液、奥野製薬
製)に150秒間浸漬し現像し乾燥した。
現像時間が実施例1よりも長くなるが、膜の密
着性が良く現像中に手で膜面をこすつても膜が剥
離することがない。画質は良好で300線4%網点
を解像した。
実施例 6
下記組成にて感材を調製し、これから実施例1
と同様に感材フイルムを作製した。
PdCl2塩酸水溶液(日本カニゼン レツドシユ
ーマ) 20g
PVA(日本合成ゴーセノールNH―14) 10%
水溶液 20g
ジアゾレジン(シンコー技研D―013) 20%
水溶液 2.5g
りんご酸 0.08g
上記の感材フイルムをジアゾコピー用ランプ
(リコーハイスタート4)で40秒間ネガフイルム
と重ね合せて露光し、SnCl21%塩酸水溶液(日
本カニゼンピンクシユーマ)からなる還元浴に常
温で1分浸漬して全面に物理現像核を形成した。
次に物理現像浴として、次亜リン酸系無電解メ
ツキ液ブルーシユーマー(奥野製薬製)を用い65
℃で2分間処理し、露光部に黒色の画像を得た。
同様に、上記感材フイルムについて上記還元浴
にあらかじめ処理してから水洗乾燥してジアゾコ
ピー用のランプでパターン露光を行ないその後ブ
ルーシユーマーにて現像処理を行なつても露光部
に黒色の画像を得た。
また上記感材フイルムに露光後、還元浴処理を
行なわないで下記の現像浴(NaOHによりPHを
12.5に調節。温度40〜50℃)で3分間処理するこ
とにより一浴で還元および物理現像を行い良好な
黒色の画像を得た。
硫酸ニツケル 20g
酒石酸カリウムナトリウム 40g
水素化ホウ素ナトリウム 2.3g
水 1000g
実施例 7
下記の組成感材を用いて感光性フイルムを実施
例1と同様に作製した。
HAuCl4・4H2O 1%塩酸水溶液 20g
ゼラチン(新田ゼラチン製p―2222) 30%水
溶液 6.7g
ジアゾレジン(シンコー技研D―011) 20%
水溶液 2.5g
酒石酸 0.05g
露光条件、還元浴条件、現像浴条件すべて実施
例1と同様にして行なつた結果、3通りの方法の
いずれを用いた場合も黒色の画像が得られる。
実施例 8
下記の組成にて感材を作成し、実施例1と同様
に感材フイルムを作製した。
レツドシユーマー 20g
ゼラチン(p―2152B新田ゼラチン) 20%水
溶液 10g
4,4′―ジアジドジフエニルスルホン 20%水
溶液 2.0g
ムコクロル酸 0.06g
露光条件、還元条件、現像条件はすべて実施例
1と同様に行なつた結果、3通りの方法のいずれ
を用いた場合も黒色の画像が得られた。[Formula] and R- N=C=N-R' (where R is an alkyl group having 2 to 6 carbon atoms, R' is a (CH 3 ) 3 N + (CH 3 ) 3 X - group, and X is F or Cl, n is 1 or 2) Phosphorus compound or carbodiimide; styrene/maleic acid copolymer, vinylpyrrolidone/maleic acid copolymer,
Resins such as vinyl methyl ether/maleic acid copolymer, ethyleneimine/maleic acid copolymer, methacrylic acid/methacrylonitrile copolymer, polymethacrylamide, and methacrylic acid ester copolymer. Glutaric acid, succinic acid as dicarboxylic acids, malic acid, lactic acid, citric acid, aspartic acid, glycolic acid, as hydroxycarboxylic acids.
Organic carboxylic acids such as tartaric acid can also be used. Next, the image forming method of the present invention using the image forming material of the present invention formed as described above will be described. According to the first image forming method of the present invention, the image forming layer 2 is first subjected to pattern exposure through a transparent original 3, as shown in FIG. Thereby, in the exposure section 2A, the development inhibitor is selectively broken down to a degree corresponding to the amount of exposure. As the light source, any light source can be used as long as it can decompose the diazo compound or azide compound described above. For example, an ultra-high-pressure mercury lamp, a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, an arc lamp, a chemical lamp, a xenon lamp, an Ar laser, etc. can be used. Depending on the desired image gradation, for example, when using ultraviolet light with a center wavelength of 405 nm, the
It is sufficient to expose for 10 to 200 seconds at an intensity of 300w/ m2 . Then, by pattern exposure, the reducing agent aqueous solution is brought into contact with the image forming layer 2 having a latent image in which the development inhibitor is broken up in a pattern by dipping or coating, so that the development inhibitor is almost uniformly distributed in the image forming layer 2. Generates metal development nuclei. Examples of reducing agents include stannous chloride, stannous sulfate, sodium borohydride, dimethylamine borazane, diethylamine borazane, trimethylamine borazane, other borazane derivatives, borane derivatives such as borane, diborane, and methyldiborane, hydrazine, etc. can be used. Particularly preferably, an acidic stannous chloride solution, a stannous sulfate solution (Weiss solution), or a commercially available sensitizer solution for electroless plating is used, but in general, any strong reducing agent can be used. This reduction treatment generally uses a reducing agent solution containing a reducing agent at a concentration of 0.1 to 50 g/kg, and is carried out at room temperature or under heating, although it varies depending on the strength of the reducing agent.
It takes about 10 seconds to 400 seconds. Furthermore, the image forming layer 2 having a latent image formed by selective decomposition of the metal development nuclei and the development inhibitor thus obtained is brought into contact with a physical developer by dipping or coating to form metal development nuclei in the exposed areas. A visible image 2B as shown in FIG. 3 is formed in which the metal in the developer is precipitated by reduction at the center. As the physical developer, an aqueous solution containing a water-soluble reducible heavy metal salt and a reducing agent is used, if necessary, in a heated state. Examples of reducible heavy metal salts include nickel,
Group VIb metals such as cobalt, iron and chromium, copper etc.
Water-soluble salts of Group Ib metals are used alone or in mixtures. As suitable water-soluble reducible heavy metal salts, for example, the following can be used. Heavy metal halides such as cobaltous chloride, cobaltous iodide, ferrous bromide, ferrous chloride, chromic bromide, chromic iodide, cupric chloride; nickel sulfate, ferrous sulfate , heavy metal sulfates such as cobaltous sulfate, chromic sulfate, cupric sulfate; heavy metal nitrates such as nickel nitrate, ferrous nitrate, cobaltous nitrate, chromic nitrate, cupric nitrate; ferras Organic acid salts of heavy metals such as acetate, cobalt acetate, chromic acetate, and chromic fluorate. These reducible heavy metal salts are contained in the physical developer at a rate of, for example, 10 to 100 g/g. Examples of reducing agents include hypophosphorous acid, sodium hypophosphite, sodium borohydride, hydrazine, formalin, diethylamine borane, dimethylamine borane, trimethylamine borane, borane, diborane, methyldiborane, diborazane,
Borazene, borazine, t-butylamine borazane, pyridine borane, 2,6-lutidine borane,
Ethylenediamineborane, hydrazinediborane,
Dimethylphosphine borane, phenylphosphine borane, dimethylaldine borane, phenylaldine borane, dimethylstibine borane, diethylstivine borane, etc. can be used. These reducing agents can be added to the physical developer, e.g.
It is used at a rate of 0.1 to 50g/. Some of the reducing agents available in the physical developer are those for the generation of metal development nuclei. Therefore, when using a physical developer containing a relatively strong reducing agent, the reduction treatment for generating metal development nuclei is not performed after exposure, and the process is directly performed with the physical developer to prevent the generation of metal development nuclei. Physical development can also be performed substantially simultaneously. However, if the reaction is carried out in two stages, there is an advantage that the reduction reaction and the metal precipitation reaction can be controlled accurately by adjusting the temperature and reaction time, respectively. In order to prevent the heavy metal ions generated by dissolving the above-mentioned reducible heavy metal salts from precipitating as hydroxides, the physical developer contains, for example, monocarboxylic acids; dicarboxylic acids; hydroxyl acids such as malic acid and lactic acid. Carboxylic acid; may contain one or more complexing agents consisting of organic carboxylic acids such as succinic acid, citric acid, aspartic acid, glycolic acid, tartaric acid, ethylenediaminetetraacetic acid, gluconic acid, sugar acid, and quinic acid. can. For example, 1 to 100 g of these complex chloride agents may be added to the physical developer.
used at a rate of Furthermore, the physical developer contains PH regulators such as acids and bases, buffers, preservatives, etc. to improve the storage stability and operability of the developer and the quality of the resulting images.
Brighteners, surfactants, etc. are added as necessary according to conventional methods. Next, according to the second image forming method of the present invention, the first
An image forming material as shown in the figure is sequentially subjected to a reduction treatment for generating metal development nuclei, a pattern exposure treatment, and a physical development treatment in this order. The individual processing steps are not particularly different from those in the first image forming method. As mentioned above, performing the reduction treatment to generate metal development nuclei before exposure as in this method was unthinkable in the various conventional methods that required exposure to generate metal development nuclei. be.
Compared to the first image forming method, this method requires washing with water and drying before exposure, so there is a problem that the number of steps is increased, but similar images can be obtained in both cases. In this way, according to the image forming method of the present invention, in both the first method and the second method, it is possible to form a black image with a transmission optical density of 4 or more and a gradation as necessary. Since a solution of a development inhibitor is used, the resolution is high, and images that can be substituted for images obtained by silver salt photography can be obtained. Also, since the image is a metal image, Kodatsu R-
Correction is possible using a reducing fluid such as No. 4. Taking advantage of these characteristics, the image material obtained by the method of the present invention can be used as a substitute for lithographic film or as a mask material. In addition, physical development
For example, the first development is performed in a nickel plating bath using a boron-based reducing agent, and the second development is performed in a high-temperature nickel plating bath at 65 to 90°C using a reducing agent with sodium hypophosphite, or high-speed copper plating. For example, a metallic image with metallic luster can be formed on the binder surface. Furthermore, by treating the obtained image with, for example, a 5% aqueous solution of hydrochloric acid or 5% nitric acid for 5 minutes, the binder in the non-image area can be selectively removed, so that it can also be used as a printed circuit board. Hereinafter, the present invention will be explained in more detail with reference to Examples. Example 1 2 g of PdCl 2 was dissolved in 1000 c.c. of water together with 20 ml of HCl, and 20 g of the resulting two PdCl solutions were used to prepare a sensitive material (coating solution for forming an image forming layer) having the following composition. PdCl 2 liquid with the above composition 20g Gelatin (Nitta Gelatin p-2151) 30% aqueous solution 10g Diazoresin (Shinko Giken D-011) 20%
Aqueous solution 2.5g Glutaric acid 0.12g The temperature of the above sensitive material was adjusted to 30°C to 40°C, applied to a polyester film (Toray Lumirror S, 100#) that had been subjected to plasma treatment in advance, and dried.
A coating film of μ was obtained. Sensitive film (image forming material) obtained above
The negative film was exposed for 2 minutes using a 2 kW ultra-high pressure mercury lamp printer (distance 100 cm from the light source). Next, it was immersed in the following reduction bath at 30°C for 1 minute for reduction treatment. SnCl 2 1 g HCl 40 ml H 2 O 100 c.c. Next, the sample was treated with a physical developer having the following composition at 90° C. to precipitate metal and form a black image. Nickel chloride 30g Sodium hypophosphite 10g Sodium oxyacetate 50g Water 900g Using the same sensitive film, immerse it in a reduction bath (30°C), wash and dry it, and then use an ultra-high pressure mercury lamp 2kW printer (distance 100cm from the light source). The negative film was exposed to light for 2 minutes. Next, a treatment was performed using a physical developer (electroless plating solution) at 90° C. having the composition shown below to deposit metal and obtain a black image. Nickel sulfate 30g Sodium hypophosphite 10g Sodium citrate 10g Water 950g A similar sensitive film was exposed for 2 minutes using a 2kW ultra-high pressure mercury lamp printer (distance 100cm from the light source) with the negative film in close contact. Then, without performing any special reduction treatment, it was placed in a boron-nickel plating bath (Shibanitsukel stock solution, manufactured by Okuno Pharmaceutical) at 65℃ for 50 minutes.
It was immersed for a second, developed, and dried. The resulting image was black with 300 lines and 4% halftone dots resolved. In this development process, reduction and development are performed simultaneously. Below are two similar examples. Example 2 A sensitive film was prepared in the same manner as in Example 1,
After exposure through a negative film, the film was developed by immersing it in a physical developer having the composition shown below at 30° C. for 2 minutes to obtain a black image. Nickel chloride 0.1 mol Dimethylamine borane 0.1 mol Succinic acid 0.5 mol The pH was adjusted to 7.0 with NaOH. Example 3 A sensitive film was prepared and exposed in the same manner as in Example 1, and a physical developer (Narcuss electroless plating solution) obtained by mixing liquids A and B having the following compositions at a ratio of 1:1 immediately before use was used. The film was developed by immersing it in a bath for 10 minutes at 22°C to obtain a black image. A: Copper sulfate 60g / Nickel sulfate 15g / Hydrazine sulfate 45g / B: Sodium sulfate 45g / Potassium sodium tartrate 180g / Sodium carbonate 15g / Example 4 A sensitive film prepared in the same manner as in Example 1 was diluted with hydrazine hydrochloride (N 2 The sample was immersed for 1 minute at 40°C in a reduction bath containing 1.0 mol/ H2HCl ). The sensitive film was washed with water, dried, and exposed using an ultra-high pressure mercury lamp.
Exposure was performed for 2 minutes using a 2kW printer (distance 100cm from the light source). Then, it was treated with an electroless plating solution shown below for 8 minutes to obtain an image with metallic luster. Nickel chloride 50g / Sodium hypophosphite 10g / Sodium citrate 10g / Similarly, the sensitive film of Example 1 was heated using an ultra-high pressure mercury lamp.
Exposure was performed for 2 minutes using a 2kW printer (distance 100cm from the light source). Then N 2 H 2 · HCl
It was treated with a 1.0 mol/concentration solution at 40°C for 1 minute, and further treated with an electroless plating solution having the following composition and pH 5.5 at 21°C for 2 minutes. Nickel hypophosphite 26g/boric acid 12g/ammonium sulfate 2.6g/sodium acetate 20g/A uniform black image was obtained by the above operations. Example 5 A photosensitive material was prepared with the following composition using a PdCl dihydrochloric acid aqueous solution prepared in the same manner as in Example 1, and then coated on a polyester film in the same manner as in Example 1, and dried to form a photosensitive material. A film was produced. PdCl dihydrochloric acid aqueous solution (Nippon Kanigen) 20g Gelatin (Nitta Gelatin p-2151) 30% aqueous solution 10g Diazoresin (Shinko Giken D-011) 20%
Aqueous solution 2.5g Glutaraldehyde 50% aqueous solution 0.05g This sensitive film was closely exposed to negative film for 2 minutes using an ultra-high pressure mercury lamp 2kW printer (distance 100cm from the light source), and then a 65°C boron-nickel plating bath (shiba nickel stock solution, (manufactured by Okuno Pharmaceutical) for 150 seconds, developed, and dried. Although the development time is longer than in Example 1, the film has good adhesion and does not peel off even if the film surface is rubbed by hand during development. The image quality was good, resolving 300 lines and 4% halftone dots. Example 6 A sensitive material was prepared with the following composition and used in Example 1.
A sensitive film was prepared in the same manner. PdCl dihydrochloric acid aqueous solution (Nippon Kanigen Retschuma) 20g PVA (Nippon Synthetic Gohsenol NH-14) 10%
Aqueous solution 20g Diazoresin (Shinko Giken D-013) 20%
Aqueous solution 2.5g Malic acid 0.08g The above-mentioned sensitive film was exposed for 40 seconds using a diazocopy lamp (Ricoh Hi-Start 4) by superimposing it on a negative film, and was then exposed to a 1% SnCl 2 hydrochloric acid aqueous solution (Nippon Kanigen Pink Schuma). Physical development nuclei were formed on the entire surface by immersing the sample in a reducing bath at room temperature for 1 minute. Next, as a physical development bath, hypophosphorous acid-based electroless plating solution Blue Shoumer (manufactured by Okuno Pharmaceutical Co., Ltd.) was used.
C. for 2 minutes to obtain a black image in the exposed area. Similarly, even if the above-mentioned sensitive film is pre-treated in the above-mentioned reducing bath, washed with water, dried, pattern-exposed using a diazocopy lamp, and then developed using a blue chemist, there will be no black color in the exposed areas. Got the image. In addition, after exposing the above-mentioned photosensitive film, without performing reduction bath treatment, use the following developing bath (with NaOH to reduce pH).
Adjusted to 12.5. By processing at a temperature of 40 to 50° C. for 3 minutes, reduction and physical development were performed in one bath, and a good black image was obtained. Nickel sulfate 20g Potassium sodium tartrate 40g Sodium borohydride 2.3g Water 1000g Example 7 A photosensitive film was prepared in the same manner as in Example 1 using the photosensitive material having the composition shown below. HAuCl 4・4H 2 O 1% hydrochloric acid aqueous solution 20g Gelatin (Nitta Gelatin p-2222) 30% aqueous solution 6.7g Diazoresin (Shinko Giken D-011) 20%
Aqueous solution 2.5g Tartaric acid 0.05g The exposure conditions, reducing bath conditions, and developing bath conditions were all the same as in Example 1. As a result, a black image was obtained using any of the three methods. Example 8 A photosensitive material was prepared with the following composition, and a photosensitive film was prepared in the same manner as in Example 1. Redshumer 20g Gelatin (p-2152B Nitta Gelatin) 20% aqueous solution 10g 4,4'-Diazidodiphenylsulfone 20% aqueous solution 2.0g Mucochloric acid 0.06g All exposure conditions, reduction conditions, and development conditions were the same as in Example 1. As a result, black images were obtained using any of the three methods.
第1図は、本発明の画像形成材料の積層構造を
示す厚み方向模式断面図、第2図および第3図は
第1図図示の画像形成材料を用いる本発明の画像
形成方法の中間工程を示すための同様な模式断面
図である。
1……支持体、2……画像形成層(2A……露
光部、2B……可視像、)、3……透過原稿、A…
…画像形成材料。
FIG. 1 is a schematic cross-sectional view in the thickness direction showing the laminated structure of the image forming material of the present invention, and FIGS. 2 and 3 show intermediate steps of the image forming method of the present invention using the image forming material shown in FIG. FIG. DESCRIPTION OF SYMBOLS 1...Support, 2...Image forming layer (2A...Exposed area, 2B...Visible image), 3...Transparent original, A...
...Image forming material.
Claims (1)
形成層が、還元されて金属現像核となる金属化合
物とジアゾ基又はアジド基を有する化合物とを含
有する親水性バインダー層からなることを特徴と
する、画像形成材料。 2 支持体上に画像形成層を設けてなり、該画像
形成層が還元されて金属現像核となる金属化合物
とジアゾ基又はアジド基を有する化合物とを含有
する親水性バインダー層からなる画像形成材料
の、該画像形成層にパターン露光を行ない、その
後、該画像形成層を還元剤と接触させて画像形成
層中に金属現像核を形成させる第1現像工程と、
該画像形成層を被還元性の金属イオンと還元剤と
を含む物理現像液と接触させて露光部に金属現像
核を中心として前記被還元性の金属イオンの還元
により析出成長した金属粒子からなる画像を形成
する第2現像工程とを実施することを特徴とす
る、画像形成方法。 3 パターン露光後、前記第1現像工程および第
2現像工程を、この順序で逐次に行う上記第2項
の方法。 4 パターン露光後、画像形成層を前記物理現像
液と接触させて物理現像液中の還元剤の作用によ
り金属現像核を発生させることにより、第1現像
工程と第2現像工程を実質的に同時に行う上記第
2項の方法。 5 支持体上に画像形成層を設けてなり、該画像
形成層が還元されて金属現像核となる金属化合物
とジアゾ基又はアジド基を有する化合物とを含有
する親水性バインダー層からなる画像形成材料
の、該画像形成層に、還元剤を接触させて画像形
成層中に金属現像核を形成し、次いでパターン露
光を行い、更に被還元性の金属イオンと還元剤と
を含む現像液と接触させて露光部に金属現像核を
中心として前記被還元性金属イオンの還元により
析出成長した金属粒子からなる画像を形成するこ
とを特徴とする、画像形成法。[Scope of Claims] 1 An image forming layer is provided on a support, and the image forming layer is hydrophilic and contains a metal compound that becomes a metal development nucleus when reduced, and a compound having a diazo group or an azide group. An image forming material comprising a binder layer. 2. An image-forming material comprising an image-forming layer provided on a support, and a hydrophilic binder layer containing a metal compound that becomes a metal development nucleus when the image-forming layer is reduced and a compound having a diazo group or an azide group. A first development step of exposing the image forming layer to pattern light, and then bringing the image forming layer into contact with a reducing agent to form metal development nuclei in the image forming layer;
The image forming layer is brought into contact with a physical developer containing reducible metal ions and a reducing agent, and the metal particles are deposited and grown around metal development nuclei in the exposed area by reduction of the reducible metal ions. An image forming method characterized by performing a second developing step of forming an image. 3. The method according to item 2 above, wherein after pattern exposure, the first development step and the second development step are sequentially performed in this order. 4. After the pattern exposure, the image forming layer is brought into contact with the physical developer and metal development nuclei are generated by the action of the reducing agent in the physical developer, thereby performing the first development step and the second development step substantially simultaneously. The method described in item 2 above. 5. An image-forming material comprising an image-forming layer provided on a support, and a hydrophilic binder layer containing a metal compound that becomes a metal development nucleus when the image-forming layer is reduced and a compound having a diazo group or an azide group. The image forming layer is brought into contact with a reducing agent to form metal development nuclei in the image forming layer, followed by pattern exposure, and further brought into contact with a developer containing reducible metal ions and a reducing agent. An image forming method comprising the step of forming an image consisting of metal particles deposited and grown by reduction of the reducible metal ions centering on metal development nuclei in an exposed area.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18266180A JPS57104929A (en) | 1980-12-23 | 1980-12-23 | Image-forming material and image-forming method using this material |
| US06/468,689 US4579804A (en) | 1980-12-23 | 1983-02-22 | Method and material for image formation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18266180A JPS57104929A (en) | 1980-12-23 | 1980-12-23 | Image-forming material and image-forming method using this material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57104929A JPS57104929A (en) | 1982-06-30 |
| JPS6247295B2 true JPS6247295B2 (en) | 1987-10-07 |
Family
ID=16122214
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18266180A Granted JPS57104929A (en) | 1980-12-23 | 1980-12-23 | Image-forming material and image-forming method using this material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57104929A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59171952A (en) * | 1983-03-18 | 1984-09-28 | Dainippon Printing Co Ltd | Ink for forming image forming materials with improved stability over time |
| JPS6033347U (en) * | 1983-08-15 | 1985-03-07 | 大日本印刷株式会社 | Glass drying plate for physical development |
-
1980
- 1980-12-23 JP JP18266180A patent/JPS57104929A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57104929A (en) | 1982-06-30 |
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